JP2003147051A - Resin composition, method for producing the same, and prepreg for printed wiring board using the same - Google Patents
Resin composition, method for producing the same, and prepreg for printed wiring board using the sameInfo
- Publication number
- JP2003147051A JP2003147051A JP2001344839A JP2001344839A JP2003147051A JP 2003147051 A JP2003147051 A JP 2003147051A JP 2001344839 A JP2001344839 A JP 2001344839A JP 2001344839 A JP2001344839 A JP 2001344839A JP 2003147051 A JP2003147051 A JP 2003147051A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- epoxy resin
- resin composition
- amine compound
- primary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000003822 epoxy resin Substances 0.000 claims abstract description 56
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 55
- -1 secondary amine compound Chemical class 0.000 claims abstract description 31
- 239000005011 phenolic resin Substances 0.000 claims abstract description 20
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 229920005989 resin Polymers 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 150000003141 primary amines Chemical class 0.000 claims description 7
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 6
- 229920001568 phenolic resin Polymers 0.000 claims description 6
- 239000004793 Polystyrene Substances 0.000 claims description 4
- 238000006482 condensation reaction Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229920002223 polystyrene Polymers 0.000 claims description 4
- 239000007859 condensation product Substances 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 18
- 239000002184 metal Substances 0.000 abstract description 18
- 239000000853 adhesive Substances 0.000 abstract description 16
- 230000001070 adhesive effect Effects 0.000 abstract description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 12
- 239000011889 copper foil Substances 0.000 abstract description 12
- 239000011888 foil Substances 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 16
- 239000004593 Epoxy Substances 0.000 description 13
- 229920003986 novolac Polymers 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 150000001412 amines Chemical class 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 239000004020 conductor Substances 0.000 description 9
- 239000002313 adhesive film Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000002966 varnish Substances 0.000 description 7
- 230000009477 glass transition Effects 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical group CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- GLLJEXIFFRQOQX-UHFFFAOYSA-N n-[2-(benzenesulfonamido)-4,5-dimethylphenyl]benzenesulfonamide Chemical compound C=1C=CC=CC=1S(=O)(=O)NC=1C=C(C)C(C)=CC=1NS(=O)(=O)C1=CC=CC=C1 GLLJEXIFFRQOQX-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- ODLMAHJVESYWTB-UHFFFAOYSA-N propylbenzene Chemical compound CCCC1=CC=CC=C1 ODLMAHJVESYWTB-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- PFYHYHZGDNWFIF-UHFFFAOYSA-N (+)-DMDP Natural products OCC1NC(CO)C(O)C1O PFYHYHZGDNWFIF-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- PFYHYHZGDNWFIF-KVTDHHQDSA-N 2,5-bis(hydroxymethyl)-3,4-dihydroxypyrrolidine Chemical compound OC[C@H]1N[C@H](CO)[C@@H](O)[C@@H]1O PFYHYHZGDNWFIF-KVTDHHQDSA-N 0.000 description 1
- PFYHYHZGDNWFIF-OMMKOOBNSA-N 2R,5R-Dihydroxymethyl-3R,4R-dihydroxy-pyrrolidine Natural products OC[C@@H]1N[C@@H](CO)[C@H](O)[C@@H]1O PFYHYHZGDNWFIF-OMMKOOBNSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 102100029203 F-box only protein 8 Human genes 0.000 description 1
- 101100334493 Homo sapiens FBXO8 gene Proteins 0.000 description 1
- 101001024616 Homo sapiens Neuroblastoma breakpoint family member 9 Proteins 0.000 description 1
- 102100037013 Neuroblastoma breakpoint family member 9 Human genes 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000005007 epoxy-phenolic resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は金属箔との接着性、
耐熱性、電気絶縁性に優れた樹脂組成物およびその製造
方法、並びにそれを用いた印刷配線板用プリプレグに関
する。TECHNICAL FIELD The present invention relates to adhesiveness with a metal foil,
The present invention relates to a resin composition having excellent heat resistance and electric insulation, a method for producing the resin composition, and a prepreg for a printed wiring board using the resin composition.
【0002】[0002]
【従来の技術】近年の電子機器の小型化、多機能化に伴
い、プリント配線板もますます高密度化、小型化が進ん
でいる。これに伴って、プリント配線板にはより微細な
配線が求められている。この際、絶縁層を形成する樹脂
組成物は耐熱性、吸水性などにおいて高い信頼性が求め
られることはもとより、回路を形成する銅箔との高い接
着力が必要となる。また、回路の微細化が進むと共に、
樹脂との接着力を向上させるために行われている金属箔
の粗化処理もより細かくなる傾向にある。このため、絶
縁層を形成する樹脂は、回路を形成する金属箔との接着
力をさらに向上することが望まれる。一方、接着フィル
ムやプリント配線板などには、現在、主にエポキシ樹脂
が使用されている。この際、樹脂の耐熱性や銅箔との接
着性の観点から、併せて芳香族アミンやフェノール樹
脂、ジシアンジアミドなどの硬化剤が使われている。し
かしながら、硬化剤としてフェノール樹脂を用いた場合
には耐熱性に優れるものの、金属箔との接着力に劣る。
一方、ジシアンジアミドや芳香族アミンなどアミン系の
硬化剤を用いると、耐熱性や耐湿性、耐電食性などに問
題があった。2. Description of the Related Art With the recent miniaturization and multi-functionalization of electronic equipment, printed wiring boards are becoming more dense and compact. Along with this, finer wiring is required for printed wiring boards. At this time, the resin composition forming the insulating layer is required to have high reliability in heat resistance, water absorption, and the like, as well as to have high adhesive strength with the copper foil forming the circuit. In addition, as circuits become finer,
The roughening treatment of the metal foil, which is performed to improve the adhesive force with the resin, tends to be finer. Therefore, it is desired that the resin forming the insulating layer further enhances the adhesive force with the metal foil forming the circuit. On the other hand, epoxy resins are currently mainly used for adhesive films and printed wiring boards. At this time, a curing agent such as an aromatic amine, a phenol resin, or dicyandiamide is also used from the viewpoint of the heat resistance of the resin and the adhesiveness with the copper foil. However, when a phenolic resin is used as the curing agent, the heat resistance is excellent, but the adhesive strength with the metal foil is poor.
On the other hand, when an amine-based curing agent such as dicyandiamide or an aromatic amine is used, there are problems in heat resistance, moisture resistance, electrolytic corrosion resistance and the like.
【0003】[0003]
【発明が解決しようとする課題】本発明は、かかる現状
に鑑みなされたもので、金属箔、特に銅箔との接着力に
優れ、かつ耐熱性、耐湿性、耐電食性にも優れる樹脂組
成物およびその製造方法、並びにそれらを用いた印刷配
線板用プリプレグを提供するものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and is a resin composition having excellent adhesive strength to metal foil, particularly copper foil, and also excellent heat resistance, moisture resistance and electrolytic corrosion resistance. The present invention also provides a method for producing the same, and a printed wiring board prepreg using the same.
【0004】[0004]
【課題を解決するための手段】本発明者は上記の欠点を
解消すべく、金属箔との接着性、耐熱性、耐湿性、耐電
食性に優れた樹脂組成物およびその製造方法、ならびに
それらを用いた印刷配線板用プリプレグに関して鋭意検
討を続けた結果、本発明に到達した。In order to solve the above-mentioned drawbacks, the present inventor has proposed a resin composition having excellent adhesiveness to a metal foil, heat resistance, moisture resistance, and electrolytic corrosion resistance, a method for producing the same, and a method for producing the same. The present invention has been achieved as a result of continuing intensive studies on the used prepreg for a printed wiring board.
【0005】本発明は次のものに関する。
(1) (A)1級および/または2級アミン化合物と
エポキシ樹脂の縮合物(B)エポキシ樹脂(C)フェノ
ール樹脂を必須成分とする樹脂組成物。
(2) 1級および/または2級アミン化合物とエポキ
シ樹脂の縮合物として、標準ポリスチレン換算における
重量平均分子量が1000以上である縮合物を用いるこ
とを特徴とする請求項1に記載の樹脂組成物。
(3) (D)1級および/または2級アミン化合物と
エポキシ樹脂の縮合物0.1〜100重量部(E)エポ
キシ樹脂1〜100重量部(F)フェノール樹脂1〜1
00重量部を必須成分とする樹脂組成物。
(4) 1級および/または2級アミン化合物として、
ジアミン化合物を用いることを特徴とする(1)〜
(3)のいずれかに記載の樹脂組成物。
(5) (1)〜(4)に記載の樹脂組成物を基材に含
浸させた後、加熱乾燥して得られる印刷配線板用プリプ
レグ。
(6) (G)1級および/または2級アミン化合物
(H)エポキシ樹脂(I)フェノール樹脂を配合してな
る樹脂組成物の製造方法において、1級および/または
2級アミン化合物とエポキシ樹脂を予め縮合反応を行う
ことを特徴とする樹脂組成物の製造方法。The present invention relates to the following: (1) A resin composition containing (A) a condensation product of a primary and / or secondary amine compound and an epoxy resin (B) an epoxy resin (C) a phenol resin as an essential component. (2) The resin composition according to claim 1, wherein a condensate having a weight average molecular weight of 1000 or more in terms of standard polystyrene is used as a condensate of the primary and / or secondary amine compound and the epoxy resin. . (3) (D) Condensate of primary and / or secondary amine compound and epoxy resin 0.1 to 100 parts by weight (E) Epoxy resin 1 to 100 parts by weight (F) Phenolic resin 1-1
A resin composition containing 100 parts by weight as an essential component. (4) As the primary and / or secondary amine compound,
(1) characterized by using a diamine compound
The resin composition according to any one of (3). (5) A prepreg for a printed wiring board obtained by impregnating a substrate with the resin composition according to (1) to (4), followed by heating and drying. (6) (G) Primary and / or secondary amine compound (H) Epoxy resin (I) In the method for producing a resin composition containing a phenol resin, a primary and / or secondary amine compound and an epoxy resin are used. A method for producing a resin composition, which comprises performing a condensation reaction in advance.
【0006】[0006]
【発明の実施の形態】本発明ではエポキシ樹脂に対し
て、硬化剤としてフェノール樹脂、アミン化合物を配合
して、樹脂組成物を得る。この際、我々は予めエポキシ
樹脂とアミン化合物との縮合反応を行うことで、金属導
体に対して優れた接着力を持つ樹脂組成物が得られるこ
とを見いだした。BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, a resin composition is obtained by mixing a phenol resin and an amine compound as a curing agent with an epoxy resin. At this time, we found that a resin composition having an excellent adhesive force to a metal conductor can be obtained by previously conducting a condensation reaction between an epoxy resin and an amine compound.
【0007】本発明における樹脂組成物は、(A)1級
および/または2級アミン化合物とエポキシ樹脂の縮合
物(B)エポキシ樹脂(C)フェノール樹脂を必須成分
とする樹脂組成物であり、金属導体に対する接着性、耐
熱性、耐湿性、耐電食性のいずれにも優れ、電気絶縁材
料として優れた特性を有する熱硬化性樹脂である。The resin composition in the present invention is a resin composition containing (A) a primary and / or secondary amine compound and an epoxy resin condensate (B) an epoxy resin (C) a phenol resin as essential components, It is a thermosetting resin that is excellent in adhesion to metal conductors, heat resistance, moisture resistance, and electrolytic corrosion resistance and has excellent properties as an electrical insulating material.
【0008】本発明では予めアミン化合物とエポキシ樹
脂を反応させることによって、高分子量化を行う。これ
によって、エポキシ樹脂に対して効率的にアミンを導入
し、金属導体に対して接着力の高い樹脂組成物とするこ
とが出来る。In the present invention, the molecular weight is increased by previously reacting an amine compound with an epoxy resin. As a result, the amine can be efficiently introduced into the epoxy resin, and the resin composition having high adhesive strength to the metal conductor can be obtained.
【0009】この際、用いるアミン化合物については特
に限定されないが、エポキシ樹脂と反応して高分子量化
する必要があるため、1級アミンないし2級アミン、ま
たはその混合物を用いることが好ましい。また、高分子
量化しやすく、かつ反応の制御が容易であることから、
分子中に2個のアミノ基を有する化合物(ジアミン化合
物)であることが好ましく、2個の1級アミノ基を有す
るジアミン化合物が特に好ましい。このようなアミン化
合物としては、m―フェニレンジアミン、p―フェニレ
ンジアミン、m−トルイレンジアミン、m−キシリレン
ジアミン、4,4'−ジアミノベンズアニリド(以下、
DABZと略す)、4,4'−ジアミノジフェニルエー
テル、3,3'−ジメチル−4,4'−ジアミノビフェニ
ル、2,2'−ジメチル−4,4'−ジアミノビフェニル
(以下、DMDBと略す)、2,2'−ビス[4−(4
−アミノフェノキシ)フェニルプロパン]などの芳香族
ジアミンに加え、エチレンジアミン、ヘキサメチレンジ
アミンなど脂肪族ジアミン、尿素などが例示できる。ま
た、アミン化合物として両末端がアミノ化されたオリゴ
マ、もしくはポリマを用いることも出来る。例えば、両
末端アミノ化ポリエチレンテレフタラート、両末端アミ
ノ化ポリプロピレン、両末端アミノ化ジメチルポリシロ
キサン、両末端アミノ化ポリアミドなどを用いることも
可能である。これら中でも、芳香族ジアミンは耐熱性の
点でより好ましく、中でもDMDP、DABZは得られ
る樹脂組成物の特性バランスの点でほかのジアミンより
も特に好ましい。At this time, the amine compound to be used is not particularly limited, but it is preferable to use a primary amine or a secondary amine, or a mixture thereof, because it is necessary to react with an epoxy resin to increase the molecular weight. In addition, since it is easy to increase the molecular weight and the reaction is easily controlled,
A compound (diamine compound) having two amino groups in the molecule is preferable, and a diamine compound having two primary amino groups is particularly preferable. Such amine compounds include m-phenylenediamine, p-phenylenediamine, m-toluylenediamine, m-xylylenediamine, 4,4′-diaminobenzanilide (hereinafter,
DABZ), 4,4'-diaminodiphenyl ether, 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl (hereinafter abbreviated as DMDB), 2,2'-bis [4- (4
In addition to aromatic diamines such as -aminophenoxy) phenylpropane], aliphatic diamines such as ethylenediamine and hexamethylenediamine, and urea can be exemplified. Further, as the amine compound, an oligomer or polymer whose both ends are aminated can also be used. For example, both-end aminated polyethylene terephthalate, both-end aminated polypropylene, both-end aminated dimethylpolysiloxane, both-end aminated polyamide and the like can be used. Among these, aromatic diamines are more preferable in terms of heat resistance, and among them, DMDP and DABZ are particularly preferable over other diamines in terms of the property balance of the resulting resin composition.
【0010】また、アミン化合物と縮合反応を行うエポ
キシ樹脂に関しても限定はなく、例えばビスフェーノー
ルA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂
等のビスフェノール型エポキシ樹脂、フェノールノボラ
ック型エポキシ樹脂、クレゾールノボラック型エポキシ
樹脂、ビスフェノールAノボラック型エポキシ樹脂、等
のノボラック型エポキシ樹脂、ジシクロペンタジエン型
エポキシ樹脂などを用いることが出来る。中でも、ビス
フェノール型エポキシ樹脂は反応が制御しやすく、得ら
れた樹脂組成物の金属導体に対する接着力が高いことの
ために好ましく、同様の理由からビスフェノールA型エ
ポキシ樹脂が特に好ましい。There is no limitation on the epoxy resin that undergoes the condensation reaction with the amine compound, and for example, bisphenol type epoxy resin such as bisphenol A type epoxy resin and bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin. Epoxy resin, novolak type epoxy resin such as bisphenol A novolac type epoxy resin, dicyclopentadiene type epoxy resin and the like can be used. Among them, the bisphenol type epoxy resin is preferable because the reaction is easily controlled and the adhesive strength of the obtained resin composition to the metal conductor is high, and the bisphenol A type epoxy resin is particularly preferable for the same reason.
【0011】本発明では、前記アミン化合物と前記エポ
キシ樹脂を予め反応させて縮合物を合成する。この際、
得られた生成物の分子量は重要である。得られた生成物
の分子量が低すぎると金属導体への接着力向上の効果が
低いため、縮合物の分子量は標準ポリスチレン換算の重
量平均分子量で300以上、とりわけ1000以上とす
ることが好ましい。また、配合し、ワニスとしたときの
相溶性等を考慮すると重量平均分子量が30万以下であ
ることが好ましく、10万以下であることが特に好まし
い。In the present invention, the amine compound and the epoxy resin are reacted in advance to synthesize a condensate. On this occasion,
The molecular weight of the product obtained is important. If the molecular weight of the obtained product is too low, the effect of improving the adhesive strength to the metal conductor is low. Therefore, the molecular weight of the condensate is preferably 300 or more, and particularly preferably 1000 or more in terms of standard polystyrene equivalent weight average molecular weight. Further, in consideration of compatibility and the like when blended into a varnish, the weight average molecular weight is preferably 300,000 or less, and particularly preferably 100,000 or less.
【0012】反応温度や反応時間は用いるアミンやエポ
キシ樹脂の種類やモル比によって異なるが、通常0〜1
50℃、好ましくは室温〜100℃の温度において、3
0分間以上反応させると好ましい。また、上記反応は、
例えばアセトン、メチルエチルケトン、トルエン、キシ
レン、酢酸エチル、ジメチルホルムアミド、ジメチルア
セトアミドなどの溶媒中で行うことが好ましい。反応濃
度は特に限定されないが、高いと生成したポリマーが溶
解しにくく、低いと反応が進行しにくいことのため0.
1〜90%が好ましい。また、ジメチルアセトアミドは
生成するポリマーの溶解性が高いことのために好まし
い。また、反応に際しては窒素雰囲気下で行うと、副反
応が起こらないので好ましい。The reaction temperature and reaction time vary depending on the type and molar ratio of the amine and epoxy resin used, but are usually 0 to 1.
3 at a temperature of 50 ° C., preferably room temperature to 100 ° C.
It is preferable to react for 0 minutes or more. In addition, the above reaction is
For example, it is preferably carried out in a solvent such as acetone, methyl ethyl ketone, toluene, xylene, ethyl acetate, dimethylformamide, dimethylacetamide. The reaction concentration is not particularly limited, but if it is high, the produced polymer is difficult to dissolve, and if it is low, the reaction is difficult to proceed.
1 to 90% is preferable. In addition, dimethylacetamide is preferable because the resulting polymer has high solubility. Further, it is preferable to carry out the reaction in a nitrogen atmosphere because side reactions do not occur.
【0013】このようにして得られたアミン化合物とエ
ポキシの縮合物を熱硬化性樹脂に配合することによっ
て、金属導体、とりわけ銅箔との接着力に優れた熱硬化
性樹脂とすることが出来る。By blending the thus obtained amine compound-epoxy condensate with a thermosetting resin, it is possible to obtain a thermosetting resin having excellent adhesion to a metal conductor, especially a copper foil. .
【0014】用いる熱硬化性樹脂としては、ポリイミド
樹脂、ビスマレイミド樹脂、エポキシ樹脂、フェノール
樹脂などが例示されるが、コストと特性のバランスの点
で、エポキシ樹脂が特に好ましい。この際に用いるエポ
キシ樹脂の種類には特に制限はなく、例えばビスフェー
ノールA型エポキシ樹脂、ビスフェノールF型エポキシ
樹脂、フェノールノボラック型エポキシ樹脂、クレゾー
ルノボラック型エポキシ樹脂、ジシクロペンタジエン型
エポキシ樹脂などを用いることが出来る。また、樹脂の
耐熱性を向上させるために硬化剤としてフェノール樹脂
を配合する必要がある。用いるフェノール樹脂として
は、例えばフェノールノボラック、クレゾールノボラッ
ク、ビスフェノールAノボラック等が挙げられる。これ
らの中でも、コストと特性のバランスからフェノールノ
ボラックが好ましい。Examples of the thermosetting resin to be used include polyimide resin, bismaleimide resin, epoxy resin, phenol resin and the like, but epoxy resin is particularly preferable from the viewpoint of cost and property balance. The type of epoxy resin used at this time is not particularly limited, and examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and dicyclopentadiene type epoxy resin. Can be used. Further, it is necessary to blend a phenol resin as a curing agent in order to improve the heat resistance of the resin. Examples of the phenol resin used include phenol novolac, cresol novolac, and bisphenol A novolac. Of these, phenol novolac is preferred from the viewpoint of cost and property balance.
【0015】配合量に関しては特に制限はないが、アミ
ン化合物とエポキシの縮合物は、少なすぎると金属導体
に対する接着力が十分でなく、また多すぎると耐熱性や
耐湿性が悪くなる傾向があるため、エポキシ樹脂100
重量部に対して、縮合物0.1〜100重量部、好まし
くは1〜30重量配合するのがよい。また、フェノール
樹脂は少なすぎると耐熱性が十分でなく、多すぎると金
属導体との接着性が悪くなることから、0.5〜300
重量部、好ましくは1〜100重量部配合するのがよ
い。また、イミダゾール誘導体等の硬化促進剤やタル
ク、シリカ、水酸化アルミ、酸化アンチモン等の無機充
填剤あるいは他の成分を必要に応じて配合することもで
きることは言うまでもない。これらの成分を配合した
後、室温で30分以上攪拌すると好ましい。このように
して得られた樹脂組成物はそのままワニスとして用いる
ことが出来る。The amount of the compound is not particularly limited, but if the amount of the amine compound-epoxy condensate is too small, the adhesive force to the metal conductor will be insufficient, and if it is too large, the heat resistance and moisture resistance will tend to be poor. Therefore, epoxy resin 100
It is preferable to add 0.1 to 100 parts by weight, preferably 1 to 30 parts by weight, of the condensate to the parts by weight. If the amount of the phenol resin is too small, the heat resistance is not sufficient, and if it is too large, the adhesion with the metal conductor deteriorates.
It is preferable to add 1 part by weight, preferably 1 to 100 parts by weight. Needless to say, a curing accelerator such as an imidazole derivative, an inorganic filler such as talc, silica, aluminum hydroxide or antimony oxide, or other components can be added as necessary. After mixing these components, it is preferable to stir at room temperature for 30 minutes or more. The resin composition thus obtained can be used as it is as a varnish.
【0016】得られた樹脂組成物はそのままワニスとし
て用いることも出来るが、銅箔などの金属箔や、ポリエ
チレンテレフタラート、ポリイミド、アラミドなどの支
持フィルムに塗布し、加熱乾燥を行って接着フィルムと
することも出来る。また、ガラス繊維や紙、有機繊維を
用いた基材に樹脂組成物を含浸した後、加熱乾燥を行っ
て、印刷配線板用のプリプレグとすることも可能であ
る。これらの接着フィルムや印刷配線板用のプリプレグ
は、プレス等によって金属箔等と一緒に加圧加熱を行
い、印刷配線板を製造することが出来る。The obtained resin composition can be used as it is as a varnish, but it is applied to a metal foil such as a copper foil or a supporting film such as polyethylene terephthalate, polyimide or aramid and dried by heating to form an adhesive film. You can also do it. It is also possible to impregnate a resin composition into a substrate made of glass fiber, paper, or organic fiber and then heat-dry it to obtain a prepreg for a printed wiring board. These adhesive films and prepregs for printed wiring boards can be manufactured by pressurizing and heating together with a metal foil or the like by a press or the like to produce a printed wiring board.
【0017】[0017]
【実施例】(エポキシ樹脂/フェノール樹脂の配合)攪
拌器付きの1リットルフラスコに、以下の配合にしたが
って各成分を投入し、1時間よく攪拌した。得られたワ
ニスは12時間以上静置して脱法した後用いた。
臭素化ビスフェノールA型エポキシ樹脂 30重量部
(住友化学工業株式会社製 ESB400T、エポキシ当量400)
オルソクレゾールノボラック型エポキシ樹脂 70重量部
(住友化学工業株式会社製 ESCN−195、エポキシ当量195)
フェノールノボラック 100重量部
(日立化成工業株式会社製 HP−850、水酸基当量106)
2−エチル−4−メチルイミダゾール 0.5重量部
ジメチルホルムアミド 134重量部[Embodiment] (Epoxy resin / phenolic resin mixture) Into a 1-liter flask equipped with a stirrer, each component was added according to the following formulation, and well stirred for 1 hour. The obtained varnish was left standing for 12 hours or more to remove it, and then used. Brominated bisphenol A type epoxy resin 30 parts by weight (ESB400T manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent 400) Orthocresol novolac type epoxy resin 70 parts by weight (ESCN-195 manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent 195) Phenol novolac 100 Parts by weight (HP-850 manufactured by Hitachi Chemical Co., Ltd., hydroxyl equivalent 106) 2-ethyl-4-methylimidazole 0.5 parts by weight dimethylformamide 134 parts by weight
【0018】(アミン/エポキシ縮合物の合成)攪拌
器、温度計、窒素導入管を連結した500mlの3つ口
フラスコに、所定量の2,2'−ジメチル−4,4'−ジ
アミノビフェニル(和歌山精化株式会社製m−TBHG
(商品名)、以下、DMDBと略す)、ビスフェノール
A型エポキシ樹脂(東都化成株式会社製YD−8125
(商品名)、エポキシ当量172、以下、bis−A−
EPと略す)を投入し、ジメチルアセトアミドで20%
に希釈した後、窒素雰囲気下において70℃で2時間反
応を行った。得られたワニスを50mg採取し、ジメチ
ルホルムアミド/テトラヒドロフラン=1/1(容量
比、リン酸0.06M、臭化リチウム0.03M含有)
溶液5mlを加え、GPCにより測定し、ポリマの分子
量を標準ポリスチレンに換算して求めた。用いたDMD
B、bis−A−EPの量と得られたポリマの分子量を
表1に示した。(Synthesis of amine / epoxy condensate) A predetermined amount of 2,2'-dimethyl-4,4'-diaminobiphenyl ( Wakayama Seika Co., Ltd. m-TBHG
(Trade name), hereinafter abbreviated as DMDB), bisphenol A type epoxy resin (YD-8125 manufactured by Tohto Kasei Co., Ltd.)
(Trade name), epoxy equivalent 172, and below, bis-A-
20% with dimethylacetamide.
After diluting with, the reaction was carried out at 70 ° C. for 2 hours in a nitrogen atmosphere. 50 mg of the obtained varnish was collected, and dimethylformamide / tetrahydrofuran = 1/1 (volume ratio, phosphoric acid 0.06 M, lithium bromide 0.03 M contained).
The solution was added with 5 ml and measured by GPC, and the molecular weight of the polymer was calculated by converting it to standard polystyrene. DMD used
The amounts of B and bis-A-EP and the molecular weight of the obtained polymer are shown in Table 1.
【0019】[0019]
【表1】表 1 [Table 1] Table 1
【0020】(実施例1〜5)攪拌器付きの500ml
フラスコに上記のエポキシ/フェノール樹脂100g
(固形分)とNo.1〜5のアミン/エポキシ縮合物5
g(固形分)を入れ、30分間攪拌した後、12時間以
上静置脱泡して、実施例1〜5のワニスを得た。これら
のワニスを厚さ18μmの銅箔(GTS−18、古川サ
ーキットフォイル株式会社)に塗布し、160℃で7分
間乾燥して接着剤付き銅箔を得た。得られた接着剤付き
銅箔を、樹脂面を内側にして2枚重ね合わせ、プレス圧
2.5MPa、175℃で1時間プレスを行うことによ
って、両面銅張り接着フィルムを得た。この両面銅張り
接着フィルムを幅10mmに切り、厚さ10mmのガラ
ス板の上に接着剤(アラルダイト、チバ・ガイギー株式
会社製)で固定した後、樹脂と銅箔の界面を剥がして、
90度ピール強度を測定した。結果を表2に示した。ま
た、同様にして両面銅張りフィルムを作製した後、銅箔
をエッチングして得た樹脂フィルムについて、DVE広
域動的粘弾性測定装置(測定周波数10Hz)によりt
anδの最大値からガラス転移温度を測定した。結果を
表2に示した。(Examples 1 to 5) 500 ml with a stirrer
100 g of the above epoxy / phenolic resin in a flask
(Solid content) and No. 1 to 5 amine / epoxy condensate 5
g (solid content) was added, and the mixture was stirred for 30 minutes, and then degassed by standing for 12 hours or more to obtain varnishes of Examples 1 to 5. These varnishes were applied to a 18 μm thick copper foil (GTS-18, Furukawa Circuit Foil Co., Ltd.) and dried at 160 ° C. for 7 minutes to obtain a copper foil with an adhesive. Two copper foils with an adhesive were laminated with the resin surface inside and pressed at a pressure of 2.5 MPa and 175 ° C. for 1 hour to obtain a double-sided copper-clad adhesive film. This double-sided copper-clad adhesive film is cut into a width of 10 mm, fixed on a glass plate having a thickness of 10 mm with an adhesive (Araldite, manufactured by Ciba-Geigy Co., Ltd.), and then the interface between the resin and the copper foil is peeled off,
The 90 degree peel strength was measured. The results are shown in Table 2. Further, a double-sided copper-clad film was prepared in the same manner, and then the resin film obtained by etching the copper foil was subjected to t by a DVE wide range dynamic viscoelasticity measuring device (measurement frequency 10 Hz).
The glass transition temperature was measured from the maximum value of an δ. The results are shown in Table 2.
【0021】(比較例1)実施例1〜5の比較例とし
て、アミン/エポキシ縮合物を含まないエポキシ/フェ
ノール樹脂を用いて、実施例1と同様の方法で両面銅張
り接着フィルムを作製し、90度ピール強度とガラス転
移温度を測定した。結果を表2に示した。(Comparative Example 1) As a comparative example of Examples 1 to 5, a double-sided copper-clad adhesive film was prepared in the same manner as in Example 1 using an epoxy / phenolic resin containing no amine / epoxy condensate. The 90 degree peel strength and the glass transition temperature were measured. The results are shown in Table 2.
【0022】(比較例2)実施例1の比較例として、上
記のエポキシ/フェノール樹脂を用い、実施例1で用い
たのと等量のDADBとbis−A−EPを予め縮合す
ることなく配合し、樹脂組成物を得た。これを用いて、
実施例1と同様の方法で両面銅張り接着フィルムを作製
し、90度ピール強度とガラス転移温度を測定した。結
果を表2に示した。(Comparative Example 2) As a comparative example of Example 1, the above epoxy / phenol resin was used, and DADB and bis-A-EP in the same amount as used in Example 1 were compounded without precondensation. Then, a resin composition was obtained. With this,
A double-sided copper-clad adhesive film was prepared in the same manner as in Example 1, and the 90-degree peel strength and glass transition temperature were measured. The results are shown in Table 2.
【0023】(比較例3)実施例1〜5の比較例とし
て、上記のアミン/エポキシ縮合物5g(固形分)と臭
素化ビスフェノールA型エポキシ樹脂 30g(住友化
学工業株式会社製ESB400T、エポキシ当量40
0)、オルソクレゾールノボラック型エポキシ樹脂 7
0g(住友化学工業株式会社製 ESCN−195、エ
ポキシ当量195)、2−エチル−4−メチルイミダゾ
ール 0.5g、ジメチルホルムアミド 134gを配
合し、フェノール樹脂を用いないで、実施例1と同様の
方法で両面銅張り接着フィルムを作製し、90度ピール
強度とガラス転移温度を測定した。結果を表2に示し
た。Comparative Example 3 As a comparative example of Examples 1 to 5, 5 g (solid content) of the above amine / epoxy condensate and 30 g of brominated bisphenol A type epoxy resin (ESB400T manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent). 40
0), orthocresol novolac type epoxy resin 7
0 g (ESCN-195 manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent 195), 0.5 g of 2-ethyl-4-methylimidazole and 134 g of dimethylformamide were blended, and the same method as in Example 1 was used without using a phenol resin. Then, a double-sided copper-clad adhesive film was produced, and 90-degree peel strength and glass transition temperature were measured. The results are shown in Table 2.
【0024】[0024]
【表2】表 2 [Table 2] Table 2
【0025】表2の実施例1〜7はいずれも本発明で得
られた樹脂組成物を用いたものであり、いずれも高いガ
ラス転移温度と高い90度ピール強度を併せ持ってい
た。一方、アミン/エポキシ縮合物を用いなかった比較
例1や、アミンとエポキシを予め縮合することなしに用
いた比較例2は、いずれも90度ピール強度が低く接着
力が十分でなかった。また、フェノール樹脂を用いなか
った比較例3はガラス転移温度が低く、耐熱性が十分で
なかった。Examples 1 to 7 in Table 2 all use the resin composition obtained by the present invention, and all have a high glass transition temperature and a high 90-degree peel strength. On the other hand, in both Comparative Example 1 in which the amine / epoxy condensate was not used and Comparative Example 2 in which the amine and the epoxy were not condensed in advance, the 90-degree peel strength was low and the adhesive strength was insufficient. Further, Comparative Example 3 in which the phenol resin was not used had a low glass transition temperature and had insufficient heat resistance.
【0026】[0026]
【発明の効果】本発明は金属導体、とりわけ銅箔との接
着力に優れた樹脂組成物であり、絶縁樹脂としての信頼
性も高い。このため、印刷配線板用の絶縁樹脂として最
適であるのみならず、実装用の絶縁樹脂や、接着剤、封
止材などにも適用することが出来、応用範囲が広い。INDUSTRIAL APPLICABILITY The present invention is a resin composition having excellent adhesion to a metal conductor, especially a copper foil, and has high reliability as an insulating resin. Therefore, it is not only optimal as an insulating resin for a printed wiring board, but also applicable to an insulating resin for mounting, an adhesive, a sealing material, etc., and has a wide range of applications.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 63:00 C08L 63:00 (72)発明者 水野 康之 茨城県下館市大字小川1500番地 日立化成 工業株式会社総合研究所内 Fターム(参考) 4F072 AA07 AB02 AB03 AB09 AD23 AD31 AE01 AG03 AG19 AH21 AK05 AL13 4J036 AA01 AA05 AD01 AD08 AF01 AF06 AJ08 DC02 DC03 DC04 DC06 DC10 FB07 JA08 JA11─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) // C08L 63:00 C08L 63:00 (72) Inventor Yasuyuki Mizuno 1500 Ogawa Ogawa, Shimodate-shi, Ibaraki Hitachi Chemical Industrial Research Institute, Research Institute F-term (reference) 4F072 AA07 AB02 AB03 AB09 AD23 AD31 AE01 AG03 AG19 AH21 AK05 AL13 4J036 AA01 AA05 AD01 AD08 AF01 AF06 AJ08 DC02 DC03 DC04 DC06 DC10 FB07 JA08 JA11
Claims (6)
合物とエポキシ樹脂の縮合物(B)エポキシ樹脂(C)
フェノール樹脂を必須成分とする樹脂組成物。1. A condensation product of (A) a primary and / or secondary amine compound and an epoxy resin (B) an epoxy resin (C)
A resin composition containing a phenol resin as an essential component.
エポキシ樹脂の縮合物として、標準ポリスチレン換算に
おける重量平均分子量が1000以上である縮合物を用
いることを特徴とする請求項1に記載の樹脂組成物。2. The resin according to claim 1, wherein a condensate having a weight average molecular weight of 1000 or more in terms of standard polystyrene is used as a condensate of a primary and / or secondary amine compound and an epoxy resin. Composition.
合物とエポキシ樹脂の縮合物0.1〜100重量部
(E)エポキシ樹脂1〜100重量部(F)フェノール
樹脂1〜100重量部を必須成分とする樹脂組成物。3. (D) Condensate of primary and / or secondary amine compound and epoxy resin 0.1 to 100 parts by weight (E) Epoxy resin 1 to 100 parts by weight (F) Phenolic resin 1 to 100 parts by weight A resin composition containing as an essential component.
して、ジアミン化合物を用いることを特徴とする請求項
1〜3のいずれかに記載の樹脂組成物。4. The resin composition according to claim 1, wherein a diamine compound is used as the primary and / or secondary amine compound.
に含浸させた後、加熱乾燥して得られる印刷配線板用プ
リプレグ。5. A prepreg for a printed wiring board, which is obtained by impregnating a base material with the resin composition according to any one of claims 1 to 4 and then heating and drying it.
合物(H)エポキシ樹脂(I)フェノール樹脂を配合し
てなる樹脂組成物の製造方法において、1級および/ま
たは2級アミン化合物とエポキシ樹脂を予め縮合反応を
行うことを特徴とする樹脂組成物の製造方法。6. A method for producing a resin composition comprising (G) a primary and / or secondary amine compound (H) epoxy resin (I) phenol resin, and a primary and / or secondary amine compound. A method for producing a resin composition, which comprises subjecting an epoxy resin to a condensation reaction in advance.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001344839A JP2003147051A (en) | 2001-11-09 | 2001-11-09 | Resin composition, method for producing the same, and prepreg for printed wiring board using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001344839A JP2003147051A (en) | 2001-11-09 | 2001-11-09 | Resin composition, method for producing the same, and prepreg for printed wiring board using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003147051A true JP2003147051A (en) | 2003-05-21 |
Family
ID=19158297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001344839A Pending JP2003147051A (en) | 2001-11-09 | 2001-11-09 | Resin composition, method for producing the same, and prepreg for printed wiring board using the same |
Country Status (1)
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---|---|
JP (1) | JP2003147051A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7462651B2 (en) | 2005-04-04 | 2008-12-09 | National Starch And Chemical Investment Holding Corporation | Radiation-curable desiccant-filled adhesive/sealant |
JP2010235922A (en) * | 2009-02-24 | 2010-10-21 | Hitachi Chem Co Ltd | Varnish, prepreg, film with resin, metal foil-clad laminate, printed wiring board |
WO2011104905A1 (en) * | 2010-02-24 | 2011-09-01 | 日立化成工業株式会社 | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
WO2013001726A1 (en) * | 2011-06-28 | 2013-01-03 | 住友ベークライト株式会社 | Prepreg, laminated plate, semiconductor package, and method for producing laminated plate |
-
2001
- 2001-11-09 JP JP2001344839A patent/JP2003147051A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7462651B2 (en) | 2005-04-04 | 2008-12-09 | National Starch And Chemical Investment Holding Corporation | Radiation-curable desiccant-filled adhesive/sealant |
JP2010235922A (en) * | 2009-02-24 | 2010-10-21 | Hitachi Chem Co Ltd | Varnish, prepreg, film with resin, metal foil-clad laminate, printed wiring board |
JP2013036041A (en) * | 2009-02-24 | 2013-02-21 | Hitachi Chemical Co Ltd | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed wiring board |
US9265145B2 (en) | 2009-02-24 | 2016-02-16 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
US10465089B2 (en) | 2009-02-24 | 2019-11-05 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
WO2011104905A1 (en) * | 2010-02-24 | 2011-09-01 | 日立化成工業株式会社 | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
WO2013001726A1 (en) * | 2011-06-28 | 2013-01-03 | 住友ベークライト株式会社 | Prepreg, laminated plate, semiconductor package, and method for producing laminated plate |
JPWO2013001726A1 (en) * | 2011-06-28 | 2015-02-23 | 住友ベークライト株式会社 | Prepreg, laminated board, semiconductor package, and laminated board manufacturing method |
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