JP2003140351A5 - - Google Patents

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Publication number
JP2003140351A5
JP2003140351A5 JP2001341933A JP2001341933A JP2003140351A5 JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5 JP 2001341933 A JP2001341933 A JP 2001341933A JP 2001341933 A JP2001341933 A JP 2001341933A JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5
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JP
Japan
Prior art keywords
compound
group
general formula
substituent
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2001341933A
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English (en)
Japanese (ja)
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JP2003140351A (ja
JP3963708B2 (ja
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Priority to JP2001341933A priority Critical patent/JP3963708B2/ja
Priority claimed from JP2001341933A external-priority patent/JP3963708B2/ja
Publication of JP2003140351A publication Critical patent/JP2003140351A/ja
Publication of JP2003140351A5 publication Critical patent/JP2003140351A5/ja
Application granted granted Critical
Publication of JP3963708B2 publication Critical patent/JP3963708B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001341933A 2001-11-07 2001-11-07 ポジ型レジスト組成物 Expired - Fee Related JP3963708B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001341933A JP3963708B2 (ja) 2001-11-07 2001-11-07 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001341933A JP3963708B2 (ja) 2001-11-07 2001-11-07 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003140351A JP2003140351A (ja) 2003-05-14
JP2003140351A5 true JP2003140351A5 (cg-RX-API-DMAC7.html) 2005-04-07
JP3963708B2 JP3963708B2 (ja) 2007-08-22

Family

ID=19155878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001341933A Expired - Fee Related JP3963708B2 (ja) 2001-11-07 2001-11-07 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3963708B2 (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4510695B2 (ja) * 2005-05-10 2010-07-28 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
US8962779B2 (en) * 2013-07-16 2015-02-24 Dow Global Technologies Llc Method of forming polyaryl polymers
US9410016B2 (en) * 2013-07-16 2016-08-09 Dow Global Technologies Llc Aromatic polyacetals and articles comprising them
WO2016068261A1 (ja) * 2014-10-31 2016-05-06 株式会社堀場エステック 自己組織化用高分子材料、自己組織化膜、自己組織化膜の製造方法及び凹凸パターン

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