JP2003136389A - Polishing device, and rotary pressing roller for polishing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve durability of a pressing means to press a polishing means to the surface of subject. SOLUTION: A polishing tape 3 from a supply reel 4 is supplied to a rotary roller 5 provided close to the surface of a magnetic disc 2. A spring 62 pressurizes the rotary roller 5 through a movable part 62a, a load cell 64, and an arm 63, so that a rotary arm 61 is rotated around its axis 61a. The rotary roller 5 is moved to press the polishing tape 3 to the surface of the magnetic disc 2. The rotary roller 5 comprises elastic material such as nitrile rubber and neoprene rubber, and it has a space inside. The rotary roller 5 can have a large deformation quantity even under low pressure. Change of load due to change of pressing quantity is small under a low pressure, while change of load due to change of pressing quantity is large under a high pressure.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing device for polishing the surface of an object to be polished, and a pressing rotary roller for a polishing device that presses the polishing means against the surface of the object to be polished. The present invention relates to a polishing apparatus suitable for polishing an extremely thin object to be polished such as an optical disk and a pressing rotation roller for the polishing apparatus.

[0002]

2. Description of the Related Art In recent years, magnetic disks used as information recording media for computers and the like have been required to have higher storage densities, and accordingly, films such as magnetic layers and protective films formed on the surface have become thinner. As an example of the manufacturing process of a magnetic disk, first, both surfaces of a substrate made of glass, aluminum alloy, or the like is polished to have an average surface roughness of 1 nm.
Mirror finish to some extent. Next, the surface of the substrate is made of Ni-P alloy or the like to have a thickness of 5 to 20 m by electroless plating or the like.
A non-magnetic metal underlayer is formed to a degree, and the surface layer is polished to a surface roughness of about 2 to 5 μm by polishing.
a Mirror-finished to about 20 to 50Å. Next, after performing texture processing to form fine grooves, a metal underlayer of chromium, copper, NiAl, etc. having a thickness of about 50 to 2000 Å is formed by a sputtering method or the like, and then a cobalt-based ferromagnetic material is formed by a sputtering method or the like. Thickness consisting of alloy thin film 100-100
A magnetic layer of about 0Å is formed, and further, for example, a carbon film,
Thickness 1 consisting of hydrogenated carbon film, nitrogenated carbon film, etc.
Form a protective film of about 0 to 150Å. After forming the protective film in such a manufacturing process, tape cleaning of the surface of the magnetic disk is performed by a polishing device in order to remove small projections generated in the film forming process and clean the surface.

The tape cleaning of the surface of the magnetic disk is to polish the surface of the magnetic disk by pressing a tape-shaped abrasive against the surface of the rotating magnetic disk. Conventionally, in order to press the abrasive on the surface of the magnetic disk, air pressure or, for example, Japanese Patent Laid-Open No. 2-106264 is used.
A roller has been used as described in Japanese Patent Laid-Open No. 2001-71249. In addition, Japanese Patent Laid-Open No. 2001-67
Japanese Patent No. 655 discloses a technique of pressing an abrasive against the surface of a magnetic disk by using a foam of a soft polymer material. The force pressing the abrasive material against the surface of the magnetic disk was about 50 to 75 g in the device using the spring force as described in, for example, Japanese Patent Laid-Open No. 2-106264. JP 2001-67655 A describes that the pressing force is usually 30 to 200 g, preferably 50 to 150 g, and more preferably 50 to 100 g. JP 200
In Japanese Patent Publication No. 1-71249, there is a description such as 10 g.

[0004]

As the protective film and the like become thinner due to the higher storage density of the magnetic disk, the force of pressing the abrasive against the surface of the magnetic disk becomes lower in order to prevent damage to the protective film and the like to be polished. Will be required. Also, during polishing, the surface of the magnetic disk is deformed or waviness, surface wobbling during rotation of the magnetic disk, assembly alignment error of the polishing device,
The position of the surface of the magnetic disk changes due to factors such as vibration of the spindle that rotates the magnetic disk. Conventionally, an abrasive is pressed against the surface of a magnetic disk with low pressure, and
In order to absorb a change in the position of the surface of the magnetic disk to some extent, a soft material such as urethane foam is used as the pressing means for pressing the abrasive against the surface of the magnetic disk.

However, when a soft material is used for the pressing means, there is a problem that deformation, damage and deterioration become severe and durability becomes low. Further, in the conventional pressing means, the force for pressing the abrasive on the surface of the magnetic disk is proportional to the deformation amount of the pressing means, and if a soft material is used, the range of the force for pressing the abrasive on the surface of the magnetic disk becomes narrow. There was a problem.

An object of the present invention is to improve the durability of the pressing means for pressing the polishing means against the surface of the object to be polished.

Another object of the present invention is to widen the range of the force with which the pressing means presses the polishing means against the surface of the object to be polished.

[0008]

A polishing apparatus according to the present invention comprises a polishing means for polishing an object to be polished and a pressing means for pressing the polishing means against the surface of the object to be polished. The means includes a hollow rotating roller made of an elastic material.

Since the rotary roller of the present invention is made of an elastic material and has a space inside, it can take a large amount of deformation even at a low pressure. The force with which the rotating roller of the present invention presses the polishing means against the surface of the object to be polished is not proportional to the pressing amount of the rotating roller, the change due to the increase or decrease of the pressing amount is small at low pressure, and the change due to the increase or decrease of the pressing amount at high pressure. Is big.
Therefore, the polishing means can be pressed against the surface of the object to be polished in a wide pressure range from low pressure to high pressure. Especially at a low pressure, the force of the rotating roller pressing the polishing means against the surface of the object to be polished becomes stable. Further, since a large amount of deformation can be obtained even at a low pressure, as the elastic material, for example, nitrile rubber,
Hard materials such as neoprene rubber can be used, and durability is improved.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing a schematic configuration of a polishing apparatus according to an embodiment of the present invention. Also, FIG.
FIG. 3 is a diagram for explaining the operation of the polishing apparatus shown in FIG.
The polishing apparatus of the present embodiment includes a polishing tape 3, a supply reel 4, a rotating roller 5, a collecting reel 7, a motor 21, a spindle 22, a rotating arm 61, a spring 62, an arm 63, a load cell 64, and a bearing 65. It is configured. In FIG. 1, the motor 21 and the spindle 22 are
Is located in front of the device for polishing the right (or left) surface of the magnetic disk 2 in the drawing, but is not shown. On the other hand, in FIG. 2, the device for polishing the surface on the right side of the magnetic disk 2 shown in FIG. 1 is omitted, and the motor 21 and the spindle 22 positioned in front of them are shown.

In FIG. 2, the magnetic disk 2 to be polished is attached to the tip of the spindle 22 by a holding mechanism (not shown). A holding mechanism (not shown) holds the magnetic disk 2 so that the surface to be polished is arranged in the vertical direction. When the spindle 22 is rotated by the motor 21, the magnetic disk 2 is rotated.

In FIG. 1, rotating rollers 5 are provided on both sides near the surface of the magnetic disk 2.
The polishing tape 3 is a base film coated with abrasive particles, and is wound around a supply reel 4. The polishing tape 3 from the supply reel 4 is supplied to a rotating roller 5 provided near the surface of the magnetic disk 2 via a guide roller. The shaft 5a of the rotating roller 5 is attached to a vertically arranged rotating arm 61, and
1 is a magnetic disk 2 with a rotating roller 5 by gravity balance
It is supported parallel to the surface of.

A movable part 62a is connected to one end of the spring 62, and the arm 6 is connected to the movable part 62a via a load cell 64.
3 is connected. The arm 63 is movably held by a bearing 65, and the tip of the arm 63 is in contact with the shaft 5 a of the rotating roller 5. The spring 62 presses the rotating roller 5 via the movable portion 62a, the load cell 64, and the arm 63, and the rotating arm 61 rotates around its axis 61a, whereby the rotating roller 5 moves and the polishing tape 3 moves the magnetic tape 2 to the magnetic disk 2. Press on the surface of.

While the polishing tape 3 is pressed against both sides of the magnetic disk 2 by the rotating rollers 5 on both sides, the magnetic disk 2 is rotated by the motor 21 and the polishing tape 3 is run by the supply reel 4 and the guide roller. Thus, the polishing tape 3 polishes the surface of the magnetic disk 2 while the rotating roller 5 rotates. Rotating roller 5
The polishing tape 3 is wound around the collecting reel 7 via another guide roller and collected.

In FIG. 2, the position of the surface of the magnetic disk 2 depends on factors such as deformation and waviness of the surface of the magnetic disk 2, surface wobbling during rotation of the magnetic disk 2, assembly error of the apparatus, and vibration of the spindle 22. , In the direction indicated by arrow A. According to the present embodiment, when the position of the surface of the magnetic disk 2 changes, the change of the position of the surface of the magnetic disk 2 can be absorbed to some extent by the rotating roller 5 described later. It is possible to reduce fluctuations in the force pressing the magnetic disk 3 against the surface of the magnetic disk 2.

Further, according to the present embodiment, since the polishing tape 3 is pressed against the surface of the magnetic disk 2 by the rotating roller 5, the rotating roller 5 assists the running of the polishing tape 3 and the polishing tape 3 is supplied. It will be easy. Further, since the rotating roller 5 can take a wide contact surface with the polishing tape 3,
Less likely to be affected by the tension applied to the polishing tape 3.

Although the shaft 5a of the rotary roller 5 is pushed by the arm 63 in this embodiment, the rotary roller 5
Alternatively, the other part or the rotating arm 61 may be pushed. Further, the rotary roller 5 may be directly attached to the tip of the arm 63 without using the rotary arm 61. The pressurizing means for pressurizing the rotating roller 5 is not limited to the spring 62, and may be any device that generates a pressing force for pressing the rotating roller 5. The load cell 64 is a load sensor for measuring the load of the spring 62, but may be omitted if the measurement is not necessary.

3A and 3B are views showing a schematic structure of a rotary roller according to an embodiment of the present invention. FIG. 3A is a side view and FIG. 3B is a BB line in FIG. 3A. FIG.
The rotating roller 5 is a wheel 5 provided around the shaft 5a.
It is attached to b. The rotary roller 5 is made of an elastic material such as nitrile rubber or neoprene rubber and has a space inside. The outer shape of the rotating roller 5 is a ring shape having a cylindrical outer peripheral portion, and has an opening in the inner peripheral portion like a tire of an automobile.

The rotating roller 5 is made of an elastic material and has a space inside, so that the amount of deformation can be large even at a low pressure. The spring constant of the rotating roller 5 is 45 to 260 gf / m.
m is preferable, and 50 to 170 gf / mm is more preferable. The outer peripheral surface of the rotating roller 5 has a small surface roughness, and both ends of the outer peripheral surface are rounded so that the polishing tape 3 can escape. In order to suppress the force of the rotating roller 5 pressing the polishing tape 3 against the surface of the magnetic disk 2 from fluctuating due to surface wobbling, the concentricity of the outer and inner circumferences of the rotating roller 5 is increased, and the outer and inner circumferences are coaxial. It is desirable to increase the degree. Further, in order to follow the magnetic disk 2 rotating at a high speed, it is desirable that the rotating roller 5, the shaft 5a and the wheel 5b be lightweight.

4A and 4B are views showing a schematic structure of a rotary roller according to another embodiment of the present invention. FIG. 4A is a side view and FIG. 4B is a C-line in FIG. 4A. It is a C section sectional view.
The rotary roller 5 is made of an elastic material such as nitrile rubber or neoprene rubber and has a space inside. The outer shape of the rotating roller 5 is a ring shape with a cylindrical outer peripheral portion, and unlike the embodiment shown in FIG. 3, there is no opening in the inner peripheral portion. The other points are similar to those of the embodiment shown in FIG.

FIG. 5 is a diagram showing an example of the pressing amount and load of the pressing means of the prior art and the present invention. The horizontal axis of FIG. 5 shows the pressing amount of the pressing means of the conventional technology and the present invention (displacement of the pressing means when the polishing tape 3 contacts the surface of the magnetic disk 2 is zero), and the vertical axis shows the load (pressing means). Indicates the force with which the polishing tape 3 is pressed against the surface of the magnetic disk 2. The broken line D and the broken line E in FIG. 5 are the sponge pads whose pressing means are made of urethane foam material, and the solid line F is the rotating roller 5 whose pressing means is shown in FIG.
Is the case.

In the case where the pressing means is a sponge pad made of urethane foam material, the load is proportional to the pressing amount as indicated by broken line D or broken line E. When a soft urethane foam material is used for the sponge pad, the change in load is gradual as shown by the broken line D, but the range of load is narrowed. On the other hand, when a hard urethane foam material is used for the sponge pad, the load range widens as shown by the broken line E, but the load changes rapidly.

On the other hand, the pressing means is the rotating roller 5
In the case of, as indicated by the solid line F, the load is not proportional to the pressing amount, the change in the load due to the increase or decrease in the pressing amount is small at low pressure, and the change in the load due to the increase or decrease in the pressing amount is large at high pressure. Therefore, the polishing tape 3 can be pressed against the surface of the magnetic disk 2 in a wide pressure range from low pressure to high pressure. Especially at low pressure, the change in load is small, so
The force of pressing the polishing tape 3 against the surface of the magnetic disk 2 becomes stable. Since the rotating roller 5 is made of a hard elastic material such as nitrile rubber or neoprene rubber,
High durability.

The polishing apparatus of the present invention can be used not only for tape cleaning after forming a protective film on a magnetic disk, but also for polishing and texture processing in the magnetic disk manufacturing process.

[0025]

According to the present invention, it is possible to widen the range of the force with which the pressing means presses the polishing means against the surface of the object to be polished.

Further, according to the present invention, since a hard material can be used for the rotary roller, durability of the pressing means for pressing the polishing means against the surface of the object to be polished is improved.

[Brief description of drawings]

FIG. 1 is a diagram showing a schematic configuration of a polishing apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram for explaining the operation of the polishing apparatus shown in FIG.

FIG. 3 is a diagram showing a schematic configuration of a rotating roller according to an embodiment of the present invention.

FIG. 4 is a diagram showing a schematic configuration of a rotating roller according to another embodiment of the present invention.

FIG. 5 is a diagram showing an example of a pressing amount and a load of pressing means according to the related art and the present invention.

[Explanation of symbols]

2 ... magnetic disk, 3 ... polishing tape, 4 ... supply reel,
5 ... Rotating roller, 7 ... Recovery reel, 21 ... Motor, 22
... Spindle, 61 ... Rotating arm, 62 ... Spring, 63 ...
Arm, 64 ... Load cell, 65 ... Bearing

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Tokutomi Lighting             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. (72) Inventor Takahisa Ishida             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. (72) Inventor Kazuyuki Sonobe             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. (72) Inventor Yasunori Fukuyama             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. (72) Inventor Tsutomu Nagakura             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. F-term (reference) 3C058 AA05 AA09 CA01                 5D112 AA07 GA15

Claims (12)

[Claims] 1. A polishing apparatus comprising: a polishing means for polishing an object to be polished; and a pressing means for pressing the polishing means against the surface of the object to be polished, wherein the pressing means is a hollow rotary member made of an elastic material. A polishing device comprising a roller. 2. The polishing apparatus according to claim 1, wherein the outer shape of the hollow rotary roller is a ring shape having a cylindrical outer peripheral portion. 3. The polishing apparatus according to claim 1, wherein the outer shape of the hollow rotary roller has a circular ring shape with an outer peripheral portion and an opening in the inner peripheral portion. 4. The polishing apparatus according to claim 1, wherein the polishing means is a polishing tape. 5. The polishing apparatus according to claim 1, wherein the object to be polished is a magnetic disk. 6. A polishing tape for polishing an object to be polished, a rotating roller for pressing the polishing tape against a surface of the object to be polished, a supply reel for supplying the polishing tape to the rotating roller, and the rotating roller for supplying the polishing tape to the rotating roller. A polishing reel that collects a polishing tape, wherein the rotating roller is a hollow rotating roller made of an elastic material. 7. The polishing apparatus according to claim 6, wherein the object to be polished is a magnetic disk. 8. A polishing apparatus having polishing means for polishing an object to be polished and pressing means for pressing the polishing means against the surface of the object to be polished, wherein the pressing means is a hollow rotating roller made of an elastic material. A pressing rotation roller for a polishing apparatus, which is characterized in that 9. The pressing rotary roller for a polishing apparatus according to claim 8, wherein an outer shape of the hollow rotary roller is a ring shape having a cylindrical outer peripheral portion. 10. The pressing rotary roller for a polishing apparatus according to claim 8, wherein an outer shape of the hollow rotary roller is a circular ring shape having an outer peripheral portion and an opening is provided at an inner peripheral portion. 11. The pressing rotary roller for a polishing apparatus according to claim 8, 9, or 10, wherein said polishing means is a polishing tape. 12. The pressing rotation roller for a polishing apparatus according to claim 8, wherein the object to be polished is a magnetic disk.