JP2003103450A - Sealing method for slidably contacting part between fixed tank and turntable in dry fluid barrel polishing device and dry fluid barrel polishing device - Google Patents

Sealing method for slidably contacting part between fixed tank and turntable in dry fluid barrel polishing device and dry fluid barrel polishing device

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Publication number
JP2003103450A
JP2003103450A JP2001300534A JP2001300534A JP2003103450A JP 2003103450 A JP2003103450 A JP 2003103450A JP 2001300534 A JP2001300534 A JP 2001300534A JP 2001300534 A JP2001300534 A JP 2001300534A JP 2003103450 A JP2003103450 A JP 2003103450A
Authority
JP
Japan
Prior art keywords
fixed tank
fluidized bed
polishing
rotary disk
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001300534A
Other languages
Japanese (ja)
Inventor
Kazutoshi Nishimura
一敏 西村
Takao Ishida
喬男 石田
Shigekazu Sakai
茂和 境
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintobrator Ltd
Original Assignee
Sintobrator Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintobrator Ltd filed Critical Sintobrator Ltd
Priority to JP2001300534A priority Critical patent/JP2003103450A/en
Publication of JP2003103450A publication Critical patent/JP2003103450A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent biting of a thin workpiece to be polished with a thickness of <=1 mm or foreign matter such as small burrs peeled off a workpiece to be polished or fragments of abrasive occurring during a polishing process in a gap where a fixed tank and a turntable composing a polishing tank slidably contact in regard to a dry fluid barrel polishing device. SOLUTION: The gap 7 where the fixed tank 2 and the turntable 3 slidably contact during the polishing process is covered by a covering fluidized bed 16 formed by charging hard spherical particles 14, and a polishing fluidized bed 17 is formed by mixing the abrasive 13 and the workpiece 15 to be polished on a top face of the covering fluidized bed 16 to carry out the polishing process.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、円筒形状の固定槽
と該固定槽の下端開口円周部に摺接し回転する回転盤と
から成る研磨槽内に被研磨加工物と研磨材を装入し、前
記回転盤の回転により該被研磨加工物と研磨材とが研磨
流動層を形成し、該研磨流動層を形成する被研磨加工物
と研磨材の相対摩擦により被研磨加工物のバリ取り、丸
味付け、つや出し、スケール落とし等の研磨加工を行う
乾式流動型バレル研磨装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention charges a work to be polished and an abrasive material into a polishing tank which is composed of a cylindrical fixed tank and a rotary disk which rotates in sliding contact with the lower end opening of the fixed tank. Then, the object to be polished and the abrasive material form a polishing fluidized bed by the rotation of the rotary disk, and deburring of the object to be polished by the relative friction between the object to be polished and the abrasive material forming the polishing fluidized layer. The present invention relates to a dry-flow type barrel polishing device that performs polishing processing such as rounding, polishing, and scale removal.

【0002】[0002]

【従来の技術】従来の乾式流動型バレル研磨装置は、研
磨加工中に被研磨加工物から剥離した小さなバリ、研磨
材の破片などの異物、或いは、厚さが1mm以下の薄物の
被研磨加工物が研磨槽を構成する固定槽の下端開口内周
部と回転盤の外周部が摺接する隙間に噛み込み、局部的
に発熱して固定槽と回転盤の摺接部のライニング同士が
溶着することがあり、この様な場合には装置を停止させ
ライニングを取り外して補修、或いは新品と交換しなけ
ればならずメンテナンスに手間を要する問題点がある。
2. Description of the Related Art A conventional dry flow type barrel polishing apparatus is used for polishing small burrs separated from a workpiece to be polished during polishing, foreign matters such as fragments of abrasives, or a thin workpiece having a thickness of 1 mm or less. The object is caught in the gap where the inner circumference of the lower opening of the fixed tank and the outer circumference of the rotating disk that make up the polishing tank make sliding contact, and heat is generated locally to weld the linings of the sliding contact section of the fixed tank and the rotating disk. In such a case, the apparatus must be stopped and the lining must be removed for repair or replacement with a new one, which requires a troublesome maintenance.

【0003】[0003]

【発明が解決しようとする課題】前記、問題点を回避す
る方法として、特許第2859500号や、特開200
1−88006号が公知の技術として掲げられる。
As a method for avoiding the above problems, Japanese Patent No. 2859500 and Japanese Patent Laid-Open No. 200-200500 have been proposed.
No. 1-88006 is listed as a known technique.

【0004】前者(特許第2859500号)は、固定
槽と回転盤の摺接部の隙間に下から強制的に吹き上げ通
過させる圧縮エアーの供給装置とその吸引装置を設け、
該圧縮エアーの強制的な吹き上げにより固定槽と回転盤
の摺接部の隙間への噛み込みを確実に防止する方法であ
り、前記従来の技術に記載した問題点を解決し発明の目
的は達成されてはいるが装置として大掛かりとなる課題
が残されている。
The former (Japanese Patent No. 2859500) is provided with a compressed air supply device and a suction device for forcibly blowing it up from below in a gap between a sliding contact portion of a fixed tank and a rotary disk.
This is a method for surely preventing bites in the gap between the sliding contact portion between the fixed tank and the rotary disk by forcibly blowing up the compressed air, which solves the problems described in the prior art and achieves the object of the invention. Although it has been done, there is still a big problem as a device.

【0005】又、後者(特開2001−88006号)
は、固定槽と回転盤の隙間に圧縮エアーを下から吸引し
て通過させる吸引装置とその流量監視装置を設け、前記
隙間の変動と圧縮エアーの流量の変動が比例することか
ら、該隙間に異物が噛み込んだ場合に圧縮エアーの流量
変動を流量監視装置が感知して装置を停止させることで
固定槽と回転盤の摺接部のライニング同士が溶着するこ
とを防止する方法である。以上の様に、特開2001−
88006号の発明は、理論的にはライニング同士の溶
着は防止できるものであるが、従来の技術に記載した問
題点の一つである研磨途中で装置を停止せずに連続稼働
を可能とする点については課題が残されている。
The latter (Japanese Patent Laid-Open No. 2001-88006)
Is equipped with a suction device for sucking and passing compressed air from below in the gap between the fixed tank and the rotary disk and a flow rate monitoring device therefor, and since the variation of the gap and the variation of the flow rate of the compressed air are proportional, This is a method of preventing the linings of the sliding contact portions of the fixed tank and the rotary disk from being welded to each other by stopping the apparatus when the flow rate monitoring device senses the flow rate fluctuation of the compressed air when foreign matter is caught. As described above, Japanese Patent Laid-Open No. 2001-
The invention of No. 88006 can theoretically prevent welding of the linings, but enables continuous operation without stopping the device during polishing, which is one of the problems described in the prior art. With respect to points, there are challenges.

【0006】[0006]

【課題を解決するための手段】本発明は、前記の課題を
解決するために完成されたもので、請求項1に記載の発
明は、円筒形状の固定槽と該固定槽の下端開口内周部に
摺動可能に最小の隙間を有する皿盤状の回転盤とから成
る研磨槽内に、研磨材および嵩比重が前記研磨材と比較
して大であり、粒子径が前記固定槽と回転盤が摺接する
隙間より大径であって、且つ内部に空孔が存在しない球
形の硬質球状粒体を装入し、前記回転盤の回転速度を低
速回転域で調整して、該硬質球状粒体が前記固定槽と回
転盤が摺接する隙間を覆う被覆流動層を形成させると共
に、該被覆流動層の上面に前記研磨材が流動層を形成さ
せる。次に、研磨材の流動層に被研磨加工物を装入して
混合形成される研磨流動層が、前記固定槽と回転盤が摺
接する隙間に接触することなく研磨加工を可能としたこ
とを特徴とする。
The present invention has been completed to solve the above-mentioned problems. The invention according to claim 1 is a cylindrical fixed tank and the inner circumference of the lower end opening of the fixed tank. In the polishing tank, which consists of a plate-shaped rotating plate with a minimum gap so that it can slide, the polishing material and bulk specific gravity are larger than the above-mentioned polishing material, and the particle diameter rotates with the fixed tank. A spherical hard spherical particle having a diameter larger than that of the sliding contact of the disk and having no voids therein is charged, and the rotation speed of the rotary disk is adjusted in a low speed rotation range to obtain the hard spherical particle. The body forms a coated fluidized bed that covers a gap where the fixed tank and the rotary disk are in sliding contact with each other, and the abrasive forms a fluidized layer on the upper surface of the coated fluidized bed. Next, the polishing fluidized bed formed by charging the workpiece to be polished into the fluidized bed of the abrasive material and mixing and forming it can be polished without contacting with the gap where the fixed tank and the rotary disk are in sliding contact. Characterize.

【0007】請求項2に記載の発明は、請求項1に記載
の硬質球状粒体を、嵩比重が研磨材の3倍以上で、粒子
径が固定槽と回転盤が摺接する隙間の3倍以上とし、且
つ内部に空孔が存在しない硬質の球形のものにしたこと
を特徴とする。
According to a second aspect of the present invention, in the hard spherical particles of the first aspect, the bulk specific gravity is 3 times or more that of the abrasive, and the particle diameter is 3 times the gap between the fixed tank and the rotating disk. It is characterized in that it is made of a hard spherical material having no holes inside.

【0008】請求項3に記載の発明は、請求項1或いは
請求項2に記載の回転盤の回転周速度を低速域である1
50〜250m/minに設定したことを特徴とする。
According to a third aspect of the present invention, the rotational peripheral speed of the rotary disc according to the first or second aspect is in the low speed range.
It is characterized by being set to 50 to 250 m / min.

【0009】[0009]

【発明の実施の形態】以下、本発明に係る乾式流動型バ
レル研磨装置と該乾式流動型バレル研磨装置の被研磨加
工物が超薄物である外径が25mm、内径が12mm、厚さ
が0.1mmの平ワッシャーのバリ取り研磨加工の実施例
を、図面を基にして詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a dry fluidized barrel polishing apparatus according to the present invention and an object to be polished of the dry fluidized barrel polishing apparatus, which is an ultra thin material, has an outer diameter of 25 mm, an inner diameter of 12 mm and a thickness of An example of deburring and polishing a 0.1 mm flat washer will be described in detail with reference to the drawings.

【0010】本発明の乾式流動型バレル研磨装置は、図
1に示す様に円周方向に等間隔をおいて複数個の凸部1
2を有する円筒形状の固定槽Bライニング8を内面に付
設し、下端開口円周部に鍔部6を形成する固定槽Aライ
ニング9を前記固定槽Bライニング8に連設した固定槽
2と、前記固定槽Aライニング9の鍔部6の端面と0.
3〜0.4mmの隙間7を持たせ且つ上面を前記固定槽A
ライニング9の鍔部6上面の延長線上に一致させたドー
ナツ形状の回転盤Aライニング10を外周部に付設する
と共に、該回転盤Aライニング10のドーナツ形状中空
部に中心部より放射状に凸部5を有する回転盤Bライニ
ング11を嵌合付設した皿盤状の回転盤3と、該回転盤
3を回転させる駆動源4を一体とした研磨槽1から成る
ものである。尚、前記固定槽Aライニング9と回転盤A
ライニング10の材質は互いに摺接して隙間7を0.3
〜0.4mmに確保する加工精度が要求されるために耐摩
耗金属製とし、固定槽Bライニング8と回転盤Bライニ
ング11の材質は特に精密な加工精度を要求されるもの
でないため耐摩耗に優れたウレタンゴム製とする。
As shown in FIG. 1, the dry flow type barrel polishing apparatus of the present invention has a plurality of convex portions 1 at equal intervals in the circumferential direction.
A fixed tank 2 having a cylindrical fixed tank B lining 8 having 2 attached to the inner surface thereof, and a fixed tank A lining 9 forming a collar 6 at the lower end opening circumferential portion, which is continuously provided to the fixed tank B lining 8; The end face of the collar portion 6 of the fixed tank A lining 9 and 0.
A clearance 7 of 3 to 0.4 mm is provided and the upper surface is fixed tank A
A doughnut-shaped turntable A lining 10 aligned with an extension line of the upper surface of the collar 6 of the lining 9 is attached to the outer peripheral portion, and the donut-shaped hollow portion of the turntable A lining 10 has radial convex portions 5 from the center. It is composed of a polishing disk 1 in which a disk-shaped rotary disk 3 fitted with a rotary disk B lining 11 having the above and a drive source 4 for rotating the rotary disk 3 are integrated. The fixed tank A lining 9 and the turntable A
The materials of the lining 10 are in sliding contact with each other and the gap 7 is 0.3.
It is made of wear-resistant metal because a machining accuracy of ~ 0.4 mm is required, and the material of the fixed tank B lining 8 and the turntable B lining 11 does not require particularly precise machining accuracy, so it is wear-resistant. Made of excellent urethane rubber.

【0011】この様に構成された乾式流動型バレル研磨
装置において、内径を430mm、高さを300mmとし内
容量を約40リットルとした研磨槽1内に、外径寸法が
3〜4mm、嵩比重が1.1〜1.5の多角形状の研磨材
13を10〜14リットルと、粒子径が2.4mm、嵩比
重が3.5〜4.5の硬質球状粒体14を2.5〜3.
5リットル装入し、前記駆動源4の回転速度を前記回転
盤3の周速度が150〜250m/minとなる様に調節し
駆動させれば、前記研磨材13と硬質球状粒体14は回
転盤3の回転によって遠心力が付与され、図2に示す様
に嵩比重が大である硬質球状粒体14が回転盤3の回転
盤Bライニング11と回転盤Aライニング10及び固定
槽2の固定槽Aライニング9と固定槽Bライニング8に
至り被覆流動層16が円周方向に流動形成すると共に、
該被覆流動層16の上面に研磨材13の流動層が形成し
て、該被覆流動層16が前記固定槽Aライニング9と回
転盤Aライニング10の隙間7を常時覆う状態を保持す
る。
In the dry flow type barrel polishing apparatus having the above-mentioned structure, the outer diameter is 3 to 4 mm and the bulk specific gravity is in the polishing tank 1 having an inner diameter of 430 mm, a height of 300 mm and an internal volume of about 40 liters. Of 10 to 14 liters of the polygonal abrasive 13 having a particle size of 1.1 to 1.5, and a hard spherical particle 14 having a particle diameter of 2.4 mm and a bulk specific gravity of 3.5 to 4.5 of 2.5 to 3.
When 5 liters are charged and the rotational speed of the drive source 4 is adjusted and driven so that the peripheral speed of the rotary disk 3 is 150 to 250 m / min, the abrasive 13 and the hard spherical particles 14 rotate. Centrifugal force is applied by the rotation of the disk 3, and as shown in FIG. 2, the hard spherical particles 14 having a large bulk specific gravity fix the rotary disk B lining 11 and the rotary disk A lining 10 and the fixed tank 2 of the rotary disk 3. While reaching the tank A lining 9 and the fixed tank B lining 8, the coating fluidized bed 16 flows and forms in the circumferential direction,
A fluidized bed of the abrasive material 13 is formed on the upper surface of the coated fluidized bed 16, and the coated fluidized bed 16 maintains a state in which it constantly covers the gap 7 between the fixed tank A lining 9 and the rotary disc A lining 10.

【0012】尚、硬質球状粒体14に採用する素材は、
ステンレス球、炭素鋼球、ベアリング鋼球などの様に、
内部に空孔が存在せず研磨加工中に割れを生じない球状
粒を採用する。
The material used for the hard spherical particles 14 is
Like stainless steel balls, carbon steel balls, bearing steel balls,
Spherical particles that do not have voids inside and do not crack during polishing are used.

【0013】次に、被研磨加工物15の超薄物の平ワッ
シャーの装入量を約5,000枚(容量換算:約5リッ
トル)とし研磨槽1の中心上部より少量ずつ落下させな
がら装入すれば、該被研磨加工物15は被覆流動層16
と混合することなく研磨材13と混合し、図3の矢印に
示す様に回転盤3の回転によって遠心力が付与され被覆
流動層16上を固定槽2の内周壁の固定槽Bライニング
8側へ向かい放射状に拡散し、次いで固定槽Bライニン
グ8に沿って押し上げられ、固定槽Bライニング8の凸
部12に衝突した後、該固定槽2の内側へ折り返して下
降し、被研磨加工物15と研磨材13が螺旋状に捻れ流
動しながら、回転盤3の回転盤Bライニング11側へ到
達する研磨流動層17が形成され、該研磨流動層17に
おいて被研磨加工物15と研磨材13は相対摩擦を起こ
し被研磨加工物15のバリ取り研磨加工が行われる。そ
の間、図3に示す様に前記研磨流動層17と被覆流動層
16が混合されることなく該研磨流動層17と被覆流動
層16の形成率を約95%以上保持し、該被覆流動層1
6が前記固定槽Aライニング9と回転盤Aライニング1
0の隙間7を常時覆う状態を保持する。
Next, the loading amount of the flat washer of the ultra-thin work piece 15 to be polished is set to about 5,000 sheets (volume conversion: about 5 liters), and it is dropped from the upper center of the polishing tank 1 little by little. Once in, the work to be polished 15 is coated with the fluidized bed 16
3 is mixed with the abrasive material 13 without being mixed with, and centrifugal force is applied by the rotation of the rotary disk 3 as shown by the arrow in FIG. 3, and the coating fluidized bed 16 is placed on the inner wall of the fixed tank 2 on the fixed tank B lining 8 side. Toward the fixed tank B lining 8 and then is pushed up along the fixed tank B lining 8 to collide with the convex portion 12 of the fixed tank B lining 8 and then folded back to the inside of the fixed tank 2 to descend to the workpiece 15 to be polished. While the abrasive material 13 spirally twists and flows, a polishing fluidized layer 17 that reaches the rotary disk B lining 11 side of the rotary disk 3 is formed. In the polishing fluidized layer 17, the workpiece 15 and the abrasive material 13 are separated. Deburring and polishing of the workpiece 15 is performed by causing relative friction. Meanwhile, as shown in FIG. 3, the polishing fluidized bed 17 and the coating fluidized bed 16 are not mixed with each other and the formation rate of the polishing fluidized bed 17 and the coating fluidized bed 16 is maintained at about 95% or more.
6 is the fixed tank A lining 9 and the turntable A lining 1
The state of always covering the gap 7 of 0 is maintained.

【0014】前記の様に被覆流動層16が隙間7を常時
覆う状態を保持し、研磨流動層17と被覆流動層16が
混合することなく該研磨流動層17と被覆流動層16の
形成率を約95%以上保持させるための条件は、装入す
る硬質球状粒体14の粒径が隙間7より大径であること
は勿論のことであるが、第一に硬質球状粒体14の嵩比
重が研磨材13の3倍以上であり該硬質球状粒体14の
内部に空孔が存在せず、研磨途中で割れを生じない耐摩
耗性の球状粒体であること、第二に回転盤3の回転周速
度が低速域の150〜250m/minであることが必須条
件である。
As described above, the state in which the coating fluidized bed 16 constantly covers the gap 7 is maintained, and the rate of formation of the polishing fluidized bed 17 and the coating fluidized bed 16 can be controlled without mixing the polishing fluidized bed 17 and the coating fluidized bed 16. The condition for maintaining about 95% or more is, of course, that the particle diameter of the hard spherical particles 14 to be charged is larger than the gap 7, but first, the bulk specific gravity of the hard spherical particles 14 is large. Is at least three times as large as that of the abrasive material 13, has no pores inside the hard spherical particles 14, and is a wear-resistant spherical particle that does not crack during polishing. It is an essential condition that the peripheral speed of rotation is 150 to 250 m / min in the low speed range.

【0015】前記、第一の条件である硬質球状粒体14
の嵩比重が研磨材13の3倍以下の場合、即ち硬質球状
粒体14と研磨材13の嵩比重の差が少ない程、該研磨
流動層17と被覆流動層16の形成率が低下し、硬質球
状粒体14が研磨材13および被研磨加工物15と混合
する。然るが故に、固定槽2の固定槽Aライニング9と
回転盤3の回転盤Aライニング10が摺接する隙間7
に、バリ取り研磨加工中に発生する被研磨加工物15か
ら剥離した小さなバリや研磨材13の破片などの異物
や、或いは、厚さが1mm以下の被研磨加工物15の噛み
込みを防止することができず、また、前記硬質球状粒体
14が研磨途中で割れを生ずるとその破片が前記固定槽
2の固定槽Aライニング9と回転盤3の回転盤Aライニ
ング10が摺接する隙間7に噛み込む恐れがある。
The hard spherical particles 14 which is the first condition
When the bulk specific gravity of is less than 3 times that of the abrasive 13, that is, the smaller the difference in bulk specific gravity between the hard spherical particles 14 and the abrasive 13, the lower the formation rate of the polishing fluidized bed 17 and the coating fluidized bed 16, The hard spherical particles 14 mix with the abrasive 13 and the work piece 15. Therefore, the clearance 7 in which the fixed tank A lining 9 of the fixed tank 2 and the rotary disk A lining 10 of the rotary disk 3 are in sliding contact with each other
In addition, it is possible to prevent foreign matter such as small burrs and fragments of the abrasive material 13 which are separated from the work piece 15 to be generated during the deburring and polishing work, or the work piece 15 having a thickness of 1 mm or less from being caught. If the hard spherical granules 14 are cracked during polishing, the debris is generated in the gap 7 where the fixed tank A lining 9 of the fixed tank 2 and the rotary disk A lining 10 of the rotary disk 3 are in sliding contact with each other. There is a risk of biting.

【0016】前記、第二の条件である回転盤3の回転周
速度を250m/min以上に設定すると、被覆流動層16
の硬質球状粒体14に付与する遠心力が大となるために
該被覆流動層16の層厚が薄くなり固定槽2の固定槽A
ライニング9と回転盤3の回転盤Aライニング10が摺
接する隙間7を確実に覆うことができなくなり、研磨流
動層17の被研磨加工物15の小さなバリや研磨材13
の破片が前記隙間7に噛み込む恐れがあり、一方、回転
盤3の回転周速度を150m/min以下に設定すると、研
磨流動層17の研磨材13と被研磨加工材15に付与す
る遠心力が小となるためにバリ取り研磨加工の効率を低
減する。
When the rotating peripheral speed of the turntable 3 which is the second condition is set to 250 m / min or more, the coated fluidized bed 16
Since the centrifugal force applied to the hard spherical particles 14 becomes large, the layer thickness of the coating fluidized bed 16 becomes thin and the fixed tank A of the fixed tank 2 becomes
The gap 7 where the lining 9 and the rotary disk A lining 10 of the rotary disk 3 are in sliding contact cannot be reliably covered, and small burrs of the workpiece 15 in the polishing fluidized bed 17 and the polishing material 13 are formed.
When the rotational peripheral speed of the rotary disk 3 is set to 150 m / min or less, the centrifugal force applied to the abrasive material 13 of the polishing fluidized bed 17 and the material to be polished 15 is generated. As a result, the efficiency of deburring and polishing is reduced.

【0017】尚、前記固定槽Bライニング8に設ける複
数個の凸部12の高さ方向位置は、研磨槽1内に被研磨
加工物15と研磨材13を装入して形成する研磨流動層
17の容量に応じて設定すればよいものであり、又、前
記回転盤Bライニング11の中心部より放射状に設ける
凸部5は、研磨槽1内に硬質球状粒体14を装入して形
成する被覆流動層16が固定槽Aライニング9と回転盤
Aライニング10の隙間7のシール状態に乱れが生じる
場合に、該凸部5の形状変更、或いは無くしても良い。
The positions of the plurality of protrusions 12 provided in the fixed tank B lining 8 in the height direction are the polishing fluidized bed formed by charging the workpiece 15 and the polishing material 13 into the polishing tank 1. It may be set according to the capacity of 17, and the convex portion 5 provided radially from the central portion of the rotary disk B lining 11 is formed by charging the hard spherical particles 14 into the polishing tank 1. When the covering fluidized bed 16 to be disturbed disturbs the sealing state of the gap 7 between the fixed tank A lining 9 and the rotary disk A lining 10, the shape of the convex portion 5 may be changed or eliminated.

【0018】以上の様なことから、本実施例における回
転盤3の回転周速度が188m/minの条件下で研磨流動
層17と被覆流動層16が混合されることなく該研磨流
動層17と被覆流動層16の形成率を約95%以上保持
し、該被覆流動層16が固定槽2の固定槽Aライニング
9と回転盤3の回転盤Aライニング10との隙間7を常
時覆う状態を保持した状態が得られ、その加工時間が2
0min間で所望のバリ取り研摩加工効果を得ることがで
きる。
From the above, the polishing fluidized bed 17 and the coating fluidized bed 17 are not mixed with each other under the condition that the rotating peripheral speed of the rotating disk 3 in this embodiment is 188 m / min. The formation rate of the coating fluidized bed 16 is maintained at about 95% or more, and the coating fluidized bed 16 maintains a state in which it constantly covers the gap 7 between the fixed tank A lining 9 of the fixed tank 2 and the rotary disk A lining 10 of the rotary disk 3. And the processing time is 2
A desired deburring and polishing effect can be obtained within 0 min.

【0019】[0019]

【発明の効果】本発明は、装置の改造、或いは、設備を
大掛かりにせずに研磨流動層17と被覆流動層16が混
合されることなく該被覆流動層16が固定槽2の固定槽
Aライニング9と回転盤3の回転盤Aライニング10と
の隙間7を常時覆う状態を保持して被研磨加工物15の
バリ取り研磨加工ができるもので、前記従来の乾式流動
型バレル研磨装置において問題としていたバリ取り研磨
加工中に発生する被研磨加工物15から剥離した小さな
バリや研磨材13の破片などの異物、或いは、厚さが1
mm以下の被研磨加工物15が固定槽2の固定槽Aライニ
ング9と回転盤3の回転盤Aライニング10が摺接する
隙間7への噛み込みを確実に防止する方法であり、バリ
取り研磨加工途中で装置を停止することなく加工が行え
る乾式流動型バレル研磨装置における固定槽と回転盤と
の摺接部のシール方法および乾式流動型バレル研磨装置
として当業界に与える価値極めて大なものである。
According to the present invention, the coating fluidized bed 16 is fixed to the fixed vessel A lining of the fixed vessel 2 without mixing the polishing fluidized bed 17 and the coating fluidized bed 16 without remodeling the apparatus or making the equipment large. 9 is capable of deburring and polishing the workpiece 15 while maintaining a state in which the gap 7 between the rotary disc A and the rotary disc A lining 10 of the rotary disc 3 is constantly covered. This is a problem in the conventional dry flow type barrel polishing apparatus. The foreign matter such as small burrs peeled off from the work-to-be-polished workpiece 15 generated during the deburring polishing process, fragments of the polishing material 13, or the thickness of
This is a method for surely preventing a workpiece to be polished 15 mm or less from being caught in the gap 7 where the fixed tank A lining 9 of the fixed tank 2 and the rotary disk A lining 10 of the rotary disk 3 are in sliding contact with each other. It is extremely valuable to the industry as a method for sealing the sliding contact portion between the fixed tank and the rotary plate in a dry fluidized barrel polishing machine that can perform processing without stopping the equipment on the way, and as a dry fluidized barrel polishing machine. .

【図面の簡単な説明】[Brief description of drawings]

【図1】 乾式流動型バレル研磨装置を、正面から見た
部分断面図。
FIG. 1 is a partial cross-sectional view of a dry flow type barrel polishing device as seen from the front.

【図2】 乾式流動型バレル研磨装置の研磨槽に、研磨
材と硬質球状粒体を装入し、回転盤を回転させた状態を
示す部分詳細図。
FIG. 2 is a partial detailed view showing a state in which an abrasive and hard spherical particles are loaded into a polishing tank of a dry fluid type barrel polishing apparatus, and a turntable is rotated.

【図3】 乾式流動型バレル研磨装置に研磨槽に、研磨
材と硬質球状粒体、および被研磨加工物を装入し、回転
盤を回転させた状態を示す部分詳細図。
FIG. 3 is a partial detailed view showing a state in which an abrasive, hard spherical particles, and an object to be polished are loaded into a polishing tank in a dry fluidized barrel polishing apparatus, and a turntable is rotated.

【符号の説明】[Explanation of symbols]

1 研磨槽 2 固定槽 3 回転盤 4 駆動源 5 凸部 6 鍔部 7 隙間 8 固定槽Bライニング 9 固定槽Aライニング 10 回転盤Aライニング 11 回転盤Bライニング 12 凸部 13 研磨材 14 硬質球状粒体 15 被研磨加工物 16 被覆流動層 17 研磨流動層 1 polishing tank 2 fixed tank 3 turntable 4 drive source 5 convex 6 collar part 7 gap 8 Fixed tank B lining 9 Fixed tank A lining 10 Turntable A lining 11 Turntable B lining 12 convex 13 Abrasive 14 Hard spherical particles 15 Workpiece to be polished 16 coated fluidized bed 17 Polished fluidized bed

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 円筒形状の固定槽と該固定槽の下端開口
内周部に摺動可能に最小の隙間を有する皿盤状の回転盤
とから成る研磨槽内に、研磨材および嵩比重が前記研磨
材と比較して大であり、粒子径が前記固定槽と回転盤が
摺接する隙間より大径であって、且つ内部に空孔が存在
しない球形の硬質球状粒体を装入し、前記回転盤の回転
速度を低速回転域で調整して、該硬質球状粒体が前記固
定槽と回転盤が摺接する隙間を覆う被覆流動層を形成さ
せると共に、該被覆流動層の上面に前記研磨材が流動層
を形成させる。次に、研磨材の流動層に被研磨加工物を
装入して混合形成される研磨流動層が、前記固定槽と回
転盤が摺接する隙間に接触することなく研磨加工を可能
とした乾式流動型バレル研磨装置における固定槽と回転
盤との摺接部のシール方法およびその装置。
1. A polishing tank comprising a cylindrical fixed tank and a plate-shaped rotary disk having a minimum clearance slidably in the inner peripheral portion of the lower end opening of the fixed tank, wherein an abrasive and a bulk specific gravity are contained. Larger than the abrasive, the particle size is larger than the gap in which the fixed tank and the rotary disk are in sliding contact, and charged with spherical hard spherical particles having no holes inside, The rotation speed of the rotary disk is adjusted in a low speed rotation range to form a coated fluidized bed that covers a gap where the hard spherical particles are in sliding contact with the fixed tank and the rotary disk, and the polishing is performed on the upper surface of the coated fluidized bed. The material forms a fluidized bed. Next, a dry fluidized bed that allows polishing to be carried out without contacting the fluidized bed of the abrasive material into which the workpiece to be polished is mixed and formed, and does not come into contact with the gap in which the fixed tank and the rotary disk are in sliding contact. A method and apparatus for sealing a sliding contact portion between a fixed tank and a turntable in a die barrel polishing apparatus.
【請求項2】 嵩比重が研磨材の3倍以上で、粒子径が
固定槽と回転盤が摺接する隙間の3倍以上であり、且つ
内部に空孔が存在しない球形の硬質球状粒体を装入し、
該回転盤の回転時に固定槽と回転盤が摺接する隙間に対
して被覆流動層を形成したことを特徴とする請求項1に
記載の乾式流動型バレル研磨装置における固定槽と回転
盤との摺接部のシール方法およびその装置。
2. A spherical hard spherical particle having a bulk specific gravity of 3 times or more that of an abrasive, a particle size of 3 times or more of a gap in which a fixed tank and a rotary disk are in sliding contact, and having no pores inside. Charge
2. The sliding between the fixed tank and the rotary disk in the dry fluidized barrel polishing apparatus according to claim 1, wherein a coating fluidized bed is formed in a gap where the fixed tank and the rotary disk are in sliding contact with each other when the rotary disk rotates. Method and apparatus for sealing contact area.
【請求項3】 回転盤の回転周速度を150〜250m/
minに設定したことを特徴とする請求項1或いは請求項
2に記載の乾式流動型バレル研磨装置における固定槽と
回転盤との摺接部のシール方法およびその装置。
3. The rotating peripheral speed of the turntable is 150 to 250 m /
3. A method for sealing a sliding contact portion between a fixed tank and a rotary plate in a dry flow type barrel polishing apparatus according to claim 1 or 2, and the apparatus therefor, which is set to min.
JP2001300534A 2001-09-28 2001-09-28 Sealing method for slidably contacting part between fixed tank and turntable in dry fluid barrel polishing device and dry fluid barrel polishing device Pending JP2003103450A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001300534A JP2003103450A (en) 2001-09-28 2001-09-28 Sealing method for slidably contacting part between fixed tank and turntable in dry fluid barrel polishing device and dry fluid barrel polishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001300534A JP2003103450A (en) 2001-09-28 2001-09-28 Sealing method for slidably contacting part between fixed tank and turntable in dry fluid barrel polishing device and dry fluid barrel polishing device

Publications (1)

Publication Number Publication Date
JP2003103450A true JP2003103450A (en) 2003-04-08

Family

ID=19121089

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Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010207926A (en) * 2009-03-06 2010-09-24 Tipton Mfg Corp Barrel grinder
US7871307B2 (en) 2005-02-15 2011-01-18 Sintokogio, Ltd. Fluid barrel-polishing device and polishing method
JP2011176237A (en) * 2010-02-25 2011-09-08 Tdk Corp Method for manufacturing of chip-type electronic component
CN102909642A (en) * 2012-09-26 2013-02-06 成都四威高科技产业园有限公司 Magnetic grinding aid
CN104608041A (en) * 2015-01-16 2015-05-13 太原理工大学 Vortex type hole surface rolling-polishing finishing processing device and method
KR20190112554A (en) * 2018-03-26 2019-10-07 전순남 Barrel Finishing Machine with easily Replaceable Lining

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7871307B2 (en) 2005-02-15 2011-01-18 Sintokogio, Ltd. Fluid barrel-polishing device and polishing method
JP2010207926A (en) * 2009-03-06 2010-09-24 Tipton Mfg Corp Barrel grinder
JP2011176237A (en) * 2010-02-25 2011-09-08 Tdk Corp Method for manufacturing of chip-type electronic component
CN102909642A (en) * 2012-09-26 2013-02-06 成都四威高科技产业园有限公司 Magnetic grinding aid
CN104608041A (en) * 2015-01-16 2015-05-13 太原理工大学 Vortex type hole surface rolling-polishing finishing processing device and method
KR20190112554A (en) * 2018-03-26 2019-10-07 전순남 Barrel Finishing Machine with easily Replaceable Lining
KR102036444B1 (en) 2018-03-26 2019-10-24 전순남 Barrel Finishing Machine with easily Replaceable Lining

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