JP2003092327A5 - - Google Patents
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- Publication number
- JP2003092327A5 JP2003092327A5 JP2001283151A JP2001283151A JP2003092327A5 JP 2003092327 A5 JP2003092327 A5 JP 2003092327A5 JP 2001283151 A JP2001283151 A JP 2001283151A JP 2001283151 A JP2001283151 A JP 2001283151A JP 2003092327 A5 JP2003092327 A5 JP 2003092327A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001283151A JP4560254B2 (en) | 2001-09-18 | 2001-09-18 | Exposure apparatus, substrate carry-in / out apparatus, and semiconductor device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001283151A JP4560254B2 (en) | 2001-09-18 | 2001-09-18 | Exposure apparatus, substrate carry-in / out apparatus, and semiconductor device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003092327A JP2003092327A (en) | 2003-03-28 |
| JP2003092327A5 true JP2003092327A5 (en) | 2008-10-30 |
| JP4560254B2 JP4560254B2 (en) | 2010-10-13 |
Family
ID=19106689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001283151A Expired - Fee Related JP4560254B2 (en) | 2001-09-18 | 2001-09-18 | Exposure apparatus, substrate carry-in / out apparatus, and semiconductor device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4560254B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100967537B1 (en) * | 2008-01-22 | 2010-07-05 | (주)린데코리아 | Method and System for Exhaust Gases Recovery of Semiconductor Device Fabricating Equipment |
| EP2876674A1 (en) * | 2013-11-25 | 2015-05-27 | Roth & Rau AG | Apparatus for the recovery of inert gas from lock chambers |
| CN109384062B (en) | 2018-09-19 | 2020-02-18 | 武汉华星光电技术有限公司 | Exposure machine and method for conveying substrate by exposure machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001102281A (en) * | 1999-09-28 | 2001-04-13 | Canon Inc | Load lock room, chamber, semiconductor manufacturing device, and device manufacturing apparatus |
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2001
- 2001-09-18 JP JP2001283151A patent/JP4560254B2/en not_active Expired - Fee Related