JP2003091809A - Substrate for information carrier - Google Patents

Substrate for information carrier

Info

Publication number
JP2003091809A
JP2003091809A JP2001283005A JP2001283005A JP2003091809A JP 2003091809 A JP2003091809 A JP 2003091809A JP 2001283005 A JP2001283005 A JP 2001283005A JP 2001283005 A JP2001283005 A JP 2001283005A JP 2003091809 A JP2003091809 A JP 2003091809A
Authority
JP
Japan
Prior art keywords
information carrier
less
substrate
carrier substrate
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001283005A
Other languages
Japanese (ja)
Inventor
Shoji Kosaka
祥二 高坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001283005A priority Critical patent/JP2003091809A/en
Publication of JP2003091809A publication Critical patent/JP2003091809A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a substrate for an information carrier by which the deformation of the information carrier is lessened and the reliability of transfer is improved when the information carrier and a hard disk closely stuck to each other by superposition. SOLUTION: The substrate for the information carrier for forming a ferromagnetic body on the surface thereof for the purpose of transferring and recording a magnetization pattern of an information signal onto a magnetic recording medium consists of ceramics consisting essentially of silicon carbide and having <=0.1 mass% sum total content of iron, chromium and nickel expressed in terms of metal, <=0.1% porosity, <=1 μm of maximum pore size and >=350 GPa Young's modulus. The ceramics preferably has <=1 nT of magnetic susceptibility.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】 本発明は、磁気記録媒体に
所定の情報信号を記録するためのマスター情報担体に好
適に用いられる情報担体用基板に関する。
TECHNICAL FIELD The present invention relates to an information carrier substrate suitably used as a master information carrier for recording a predetermined information signal on a magnetic recording medium.

【0002】[0002]

【従来技術】近年、磁気記録再生装置は小型で大容量が
要求されているため、高密度記録が行われている。この
高密度記録を行なうためには、記録再生ヘッドの動きを
制御するために必要な位置情報(サーボ・パターン)を
正確にディスクに書き込むことが必要である。
2. Description of the Related Art In recent years, a magnetic recording / reproducing apparatus is required to have a small size and a large capacity, so that high density recording is performed. In order to perform this high density recording, it is necessary to accurately write the position information (servo pattern) necessary for controlling the movement of the recording / reproducing head to the disk.

【0003】一般には、サーボ・トラック・ライター装
置で記録再生ヘッドを除々に動かしながら、一本一本の
トラックに対応するサーボ・パターンをディスクに書き
込む。しかし、この方法では、逐次方式でヘッドを動か
してサーボ・パターンを書き込むため、書き込む位置の
精度が十分に得られないという欠点が有った。
Generally, a servo track writer device gradually moves a recording / reproducing head to write a servo pattern corresponding to each track on a disk. However, this method has a drawback that the accuracy of the writing position cannot be sufficiently obtained because the head is moved in a sequential manner to write the servo pattern.

【0004】そこで、基体の表面に、情報信号に対応す
るパターン形状で強磁性材料からなる磁性部を形成し
て、マスター情報担体とし、このマスター情報胆体の表
面を、強磁性薄膜あるいは強磁性粉塗布層が形成された
シート状もしくはディスク状磁気記録媒体の表面に接触
させ、所定の磁界をかけることにより、マスター情報担
体に形成した情報担体に形成した情報信号に対応するパ
ターン形状の磁気パターンを磁気記録媒体に記録する方
法が提案された。
Therefore, a magnetic portion made of a ferromagnetic material is formed on the surface of the base body in a pattern shape corresponding to the information signal to form a master information carrier, and the surface of this master information gallbladder is formed into a ferromagnetic thin film or a ferromagnetic thin film. A magnetic pattern having a pattern corresponding to the information signal formed on the information carrier formed on the master information carrier by contacting the surface of the sheet-shaped or disk-shaped magnetic recording medium on which the powder coating layer is formed and applying a predetermined magnetic field. There has been proposed a method of recording the data on a magnetic recording medium.

【0005】このような磁気転写技術を用いた情報記号
の記録において、マスター情報担体に設けられた情報信
号に対する配列パターンを磁化パターンとして磁気記録
媒体に一度に転写記録する方法であるため、磁気記録媒
体全体に亘って均一に安定して高密度の情報信号が記録
されることが重要である。
In the recording of information symbols using such a magnetic transfer technique, magnetic recording is a method in which an array pattern for an information signal provided on a master information carrier is transferred and recorded as a magnetization pattern onto a magnetic recording medium at once. It is important that a high density information signal is uniformly and stably recorded over the entire medium.

【0006】例えば、Si基板、ガラス基板、プラステ
ック基板などの非磁性材料をマスター情報担体として使
用し、この基体上に半導体製造プロセスに準じた方法に
て強磁性薄膜を形成するとともに、マスター情報担体と
磁気記録媒体との密着性を向上させるため、強磁性薄膜
の表面を略平坦にすることが特開平13−34938号
公報に記載されている。
For example, a non-magnetic material such as a Si substrate, a glass substrate, or a plastic substrate is used as a master information carrier, and a ferromagnetic thin film is formed on this substrate by a method conforming to the semiconductor manufacturing process. JP-A-13-34938 discloses that the surface of a ferromagnetic thin film is made substantially flat in order to improve the adhesion between the carrier and the magnetic recording medium.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、特開平
13−34938号公報に記載の方法では、この情報担
体をアルミニウムやガラス基板からなるハードディスク
に重ね合わせ、情報担体とハードディスクの隙間を真空
にして密着性を向上させてから転写を行なうため、真空
排気をするとマスター情報担体が変形してしまい、その
結果、転写記録の信頼性が低いという問題が有った。
However, according to the method disclosed in Japanese Patent Laid-Open No. 13-34938, this information carrier is superposed on a hard disk made of aluminum or a glass substrate, and the space between the information carrier and the hard disk is evacuated to make a close contact. Since the transfer is performed after improving the transferability, the master information carrier is deformed when the vacuum is exhausted, and as a result, the reliability of the transfer recording is low.

【0008】従って、本発明の目的は、情報担体とハー
ドディスクを重ね合わせで密着させた時に、情報担体の
変形を小さくし、転写の信頼性を改善した情報担体用基
体を提供することにある。
Therefore, an object of the present invention is to provide an information carrier substrate in which the deformation of the information carrier is reduced when the information carrier and the hard disk are superposed and brought into close contact with each other, and the reliability of transfer is improved.

【0009】[0009]

【課題を解決するための手段】本発明は、特性及び組織
を制御した炭化珪素を主体とする材料を情報担体用基体
に用いることで、転写時のマスター情報担体の変形を抑
制し、転写記録の信頼性を著しく改善できるという知見
に基づくものである。
According to the present invention, by using a material mainly composed of silicon carbide, the characteristics and texture of which are controlled, as a base material for an information carrier, deformation of a master information carrier at the time of transfer is suppressed, and transfer recording is performed. It is based on the finding that the reliability of can be significantly improved.

【0010】即ち、本発明の情報担体用基板は、情報信
号の磁化パターンを磁気記録媒体に転写記録するために
強磁性体を表面に形成するための情報担体用基板であっ
て、炭化珪素結晶を主体とし、鉄、クロム及びニッケル
の含有量の合計が金属換算で0.1質量%以下、気孔率
が0.1%以下、最大気孔径が1μm以下、ヤング率が
350GPa以上のセラミックスからなることを特徴と
するものである。
That is, the information carrier substrate of the present invention is an information carrier substrate for forming a ferromagnetic material on the surface for transferring and recording a magnetization pattern of an information signal on a magnetic recording medium, and is a silicon carbide crystal. And ceramics whose total content of iron, chromium and nickel is 0.1% by mass or less in terms of metal, porosity is 0.1% or less, maximum pore diameter is 1 μm or less, and Young's modulus is 350 GPa or more. It is characterized by that.

【0011】特に、前記セラミックスの磁化率が1nT
以下であることが好ましい。これにより、転写するとき
の外部磁場の乱れを少なくし、高信頼性の転写を行う事
ができる。
In particular, the magnetic susceptibility of the ceramic is 1 nT.
The following is preferable. As a result, the disturbance of the external magnetic field at the time of transfer can be reduced and highly reliable transfer can be performed.

【0012】また、前記炭化珪素結晶の平均短径が10
μm以下、平均長径が150μm以下であることことが
好ましい。これにより、情報担体用基板の強度を高め、
高信頼性の転写を行う事ができる。
The average minor axis of the silicon carbide crystals is 10
It is preferable that the average major axis is 150 μm or less. This increases the strength of the information carrier substrate,
Highly reliable transfer can be performed.

【0013】さらに、前記セラミックスの主面の表面粗
さRaが1nm以下であることが好ましい。これによ
り、担体上に高信頼性の強磁性体による配列パターンを
形成できる。
Furthermore, the surface roughness Ra of the main surface of the ceramic is preferably 1 nm or less. As a result, an array pattern of highly reliable ferromagnetic material can be formed on the carrier.

【0014】さらにまた、前記セラミックスの主面の平
面度が10μm以下であることが好ましい。これによ
り、情報担体用基板に高信頼性の強磁性体の配列パター
ンを形成できると共に、高信頼性の転写を行う事ができ
る。
Furthermore, the flatness of the main surface of the ceramic is preferably 10 μm or less. As a result, a highly reliable array pattern of ferromagnetic materials can be formed on the information carrier substrate, and highly reliable transfer can be performed.

【0015】[0015]

【発明の実態の形態】本発明の強磁性体形成用基体は、
情報信号の磁化パターンを磁気記録媒体に転写記録する
ためのマスター情報担体の強磁性体形成するための基体
に用いられるものであり、炭化珪素結晶を主体とするセ
ラミックスであることを特徴とする。
DETAILED DESCRIPTION OF THE INVENTION The ferromagnetic substance-forming substrate of the present invention comprises:
It is used as a substrate for forming a ferromagnetic material of a master information carrier for transferring and recording a magnetization pattern of an information signal on a magnetic recording medium, and is characterized by being a ceramic mainly composed of silicon carbide crystals.

【0016】そして、本発明によれば、上記の炭化珪素
結晶を主体とするセラミックスが、鉄、クロム及びニッ
ケルの含有量の合計が金属換算で0.1質量%以下であ
ることが重要である。これらの元素(鉄、クロム及びニ
ッケル)が多く含まれると、炭化珪素体の磁化率を上げ
るため、磁気情報を転写する場合に、誤った情報を記録
するからであり、このエラーをより少なくするため、上
記元素の含有量の合計が特に、0.01質量%以下、更
には0.001質量%以下であることが好ましい。
Further, according to the present invention, it is important that the total content of iron, chromium and nickel in the ceramic mainly composed of silicon carbide crystal is 0.1% by mass or less in terms of metal. . This is because if a large amount of these elements (iron, chromium and nickel) is contained, the magnetic susceptibility of the silicon carbide body is increased, so that incorrect information is recorded when magnetic information is transferred, and this error is reduced. Therefore, the total content of the above elements is preferably 0.01% by mass or less, and more preferably 0.001% by mass or less.

【0017】また、気孔率が0.1%以下であることも
重要である。気孔率が0.1%を越えると、最大気孔径
が大きくなると共に、表面粗さも大きくなり、マスター
情報担体として用いると、ディスク状磁気記録媒体の表
面に接触させた時に、実際に接触する部分が少なくな
り、強磁性体のよる配列パターンの転写に関する信頼性
が低下する。この信頼性を高めるため、気孔率は特に
0.05%以下が好ましい。
It is also important that the porosity is 0.1% or less. When the porosity exceeds 0.1%, the maximum pore diameter becomes large and the surface roughness also becomes large. When used as a master information carrier, when it is brought into contact with the surface of the disk-shaped magnetic recording medium, the portion actually contacted And the reliability of the transfer of the array pattern by the ferromagnetic material is reduced. In order to improve this reliability, the porosity is particularly preferably 0.05% or less.

【0018】さらに、セラミックスの最大気孔径が1μ
m以下であることも重要である。基体上に形成される強
磁性体のライン幅は書き込み時の信号パターンによって
も異なるが、数十nm〜0.5μmと微細である。そこ
で、最大気孔径を小さくすることで、担体上に形成され
た信号パターンの欠陥を少なくでき、マスター情報担体
としての信頼性を高めることができる。信頼性を向上す
るため、最大気孔率は、特に0.5μm以下であること
が好ましい。
Further, the maximum pore diameter of ceramics is 1 μm.
It is also important that it is m or less. The line width of the ferromagnetic material formed on the substrate varies depending on the signal pattern at the time of writing, but is as fine as several tens nm to 0.5 μm. Therefore, by reducing the maximum pore diameter, it is possible to reduce the defects of the signal pattern formed on the carrier and to enhance the reliability as the master information carrier. In order to improve reliability, the maximum porosity is particularly preferably 0.5 μm or less.

【0019】さらにまた、セラミックスのヤング率が3
50GPa以上であることも重要である。従来のSiの
ヤング率は約150GPa、ガラス基板に至っては、1
00GPa以下と小さい。そこで、ヤング率を350G
Paと約2.3〜3.5倍にすることによって、同じ応
力を印加したときの変形量を1/2以下にできるため、
基板の変形を小さくでき、その結果、転写の信頼性を高
めることができる。信頼性を向上するため、ヤング率
は、特に400GPa以上、更には450GPa以上で
あることが好ましい。
Furthermore, the Young's modulus of the ceramic is 3
It is also important that it is 50 GPa or more. The Young's modulus of conventional Si is approximately 150 GPa, and that of glass substrates is 1
It is as small as 00 GPa or less. Therefore, Young's modulus is 350G
By making Pa about 2.3 to 3.5 times, the amount of deformation when the same stress is applied can be reduced to 1/2 or less,
The deformation of the substrate can be reduced, and as a result, the reliability of transfer can be improved. In order to improve reliability, the Young's modulus is particularly preferably 400 GPa or more, further preferably 450 GPa or more.

【0020】また、本発明によれば、情報担体用基板と
して用いられる上記のセラミックスの磁化率は、1nT
(テスラ)以下、特に0.5nT以下、更には0.1n
T以下であることが好ましい。即ち、情報担体用基板上
に、例えば、Fe、Co、Fe−Co合金等の強磁性体
を形成するが、十分な記録磁界を発生させるためには、
磁性材料の磁化率が高いほど良く、1T以上の磁性材料
が用いられる。従って、情報担体用基板の磁化率を磁性
材料の10-9以下に抑えることで、転写するときの外部
磁場に対する漏れ磁場の乱れを少なくし、転写の信頼性
をより高くすることができる。
Further, according to the present invention, the magnetic susceptibility of the above ceramics used as the information carrier substrate has a magnetic susceptibility of 1 nT.
(Tesla) or less, particularly 0.5 nT or less, and further 0.1 n
It is preferably T or less. That is, for example, a ferromagnetic material such as Fe, Co, or Fe—Co alloy is formed on the information carrier substrate, but in order to generate a sufficient recording magnetic field,
The higher the magnetic susceptibility of the magnetic material, the better, and a magnetic material of 1T or more is used. Therefore, by suppressing the magnetic susceptibility of the information carrier substrate to 10 −9 or less of that of the magnetic material, it is possible to reduce the disturbance of the leakage magnetic field with respect to the external magnetic field at the time of transfer and further improve the reliability of transfer.

【0021】さらに、本発明の情報担体用基板を構成す
るセラミックスの主結晶である炭化珪素結晶の平均短径
が10μm以下、特に5μm以下、平均長径が150μ
m以下、特に50μm以下であることが好ましい。炭化
珪素結晶の粒子径は強度に関連し、平均短径が10μm
を越えると情報担体用基板を吸引したときの微量な変形
で亀裂が発生する事もある。さらに、平均長径が150
μmを越えると情報担体用基板を吸引したときの微量な
変形で亀裂が発生する事もある。従って、情報担体用基
板の強度を高め、高信頼性の転写を行うため、粒子径が
上記の範囲であることが望ましい。
Furthermore, the silicon carbide crystal, which is the main crystal of the ceramics constituting the information carrier substrate of the present invention, has an average minor axis of 10 μm or less, particularly 5 μm or less, and an average major axis of 150 μm.
It is preferably m or less, and particularly preferably 50 μm or less. The particle size of silicon carbide crystals is related to strength, and the average minor axis is 10 μm.
If it exceeds, the crack may occur due to a slight deformation when the information carrier substrate is sucked. Furthermore, the average major axis is 150
If it exceeds μm, a crack may occur due to a slight deformation when the information carrier substrate is sucked. Therefore, in order to increase the strength of the information carrier substrate and transfer with high reliability, it is desirable that the particle diameter be within the above range.

【0022】また、本発明の情報担体用基板の表面粗さ
Raが1nm以下、特に0.5nm以下であることが好
ましい。情報担体用基板上に形成される強磁性体膜の厚
み(d)が数10nm程度であるため、情報担体用基板
の表面粗さRaがd/10以下に制御することで、情報
担体上への配列パターン形成の信頼性を高めることがで
きる。
The surface roughness Ra of the information carrier substrate of the present invention is preferably 1 nm or less, more preferably 0.5 nm or less. Since the thickness (d) of the ferromagnetic film formed on the information carrier substrate is about several tens nm, the surface roughness Ra of the information carrier substrate is controlled to be d / 10 or less, so that the information carrier substrate The reliability of the formation of the array pattern can be improved.

【0023】さらに、上記のセラミックスの主面の平面
度が10μm以下、特に5μm以下であることことが好
ましい。情報担体から磁気記録媒体に情報信号を転写記
録する際に、情報担体の表面(以下、接触面と言う)に
磁気記録媒体を接触させるため、情報担体の接触面のゆ
がみや湾曲が大きいと端部における接触状態が悪化し、
情報が誤転写されることがあり、これを避けるため、平
面度は10μm以下であることが好ましい。従って、情
報担体の主体となる情報担体基板の主面が10μm以下
であることが好ましいのである。これにより、情報担体
用基板に高信頼性の強磁性体の配列パターンを形成でき
ると共に、高信頼性の転写を行う事ができる。
Furthermore, it is preferable that the flatness of the main surface of the above-mentioned ceramics is 10 μm or less, particularly 5 μm or less. When an information signal is transferred and recorded from the information carrier to the magnetic recording medium, the magnetic recording medium is brought into contact with the surface of the information carrier (hereinafter referred to as the contact surface). Contact condition in the part deteriorates,
Information may be erroneously transferred, and in order to avoid this, the flatness is preferably 10 μm or less. Therefore, it is preferable that the major surface of the information carrier substrate, which is the main body of the information carrier, be 10 μm or less. As a result, a highly reliable array pattern of ferromagnetic materials can be formed on the information carrier substrate, and highly reliable transfer can be performed.

【0024】このように、本発明の情報担体用基板は、
炭化珪素結晶を主体とするセラミックスからなり、高純
度、高ヤング率であるとともに、低気孔率で表面平滑性
にも優れ、また、半導体製造プロセスを用いた加工も可
能であることから、情報信号の磁化パターンを磁気記録
媒体に転写記録するための、マスター情報担体の基体と
して好適に用いることができる。
Thus, the information carrier substrate of the present invention is
It is made of ceramics mainly composed of silicon carbide crystals, has high purity and high Young's modulus, has low porosity and excellent surface smoothness, and can be processed using semiconductor manufacturing processes. It can be preferably used as a substrate of a master information carrier for transferring and recording the magnetization pattern of (1) on a magnetic recording medium.

【0025】次に、本発明の情報担体用基板の製造方法
について説明する。
Next, a method of manufacturing the information carrier substrate of the present invention will be described.

【0026】本発明によれば、情報担体用基板を構成
し、炭化珪素結晶を主結晶とするセラミックスは、鉄、
クロム及びニッケルの含有量の合計が金属換算で0.1
質量%以下、気孔率が0.1%以下、最大気孔径が1μ
m以下、ヤング率が350GPa以上であれば、その製
造方法は制限されるべきものではない。
According to the present invention, the ceramics which constitutes the information carrier substrate and has silicon carbide crystals as main crystals is iron,
The total content of chromium and nickel is 0.1 in terms of metal
Mass% or less, porosity 0.1% or less, maximum pore size 1μ
If the Young's modulus is m or less and the Young's modulus is 350 GPa or more, the manufacturing method thereof should not be limited.

【0027】例えば、ホットプレス法や通電しながら加
圧焼結を行うパルス通電焼結法等の方法により製造され
る微細な炭化珪素原料を用いた高純度焼結体、炭素及び
硼素、アルミナ又は希土類酸化物等を焼結助剤とする焼
結体、シリコンを炭化珪素に含浸して作製された焼結体
等を製造することができる。
For example, a high-purity sintered body using a fine silicon carbide raw material produced by a method such as a hot pressing method or a pulse energization sintering method in which pressure sintering is performed while energizing, carbon and boron, alumina or A sintered body using a rare earth oxide or the like as a sintering aid, a sintered body produced by impregnating silicon with silicon carbide, or the like can be manufactured.

【0028】また、CVD法(化学蒸着法)等の気相合
成法で炭化珪素結晶を主体とするセラミックスを製造す
ることもできる。
Further, it is also possible to manufacture ceramics mainly composed of silicon carbide crystals by a vapor phase synthesis method such as a CVD method (chemical vapor deposition method).

【0029】本発明の情報担体用基板は、均一な組織を
有するためイオンミリング及び反応性イオンエッチング
等のイオン照射加工や機械加工において平滑な面を得や
すく、高純度でもあり、鉄、クロム及びニッケルの含有
量を容易に低減でき、気孔を容易に除去できるという点
で、特にCVD法を用いることが好ましい。
Since the information carrier substrate of the present invention has a uniform structure, it is easy to obtain a smooth surface in ion irradiation processing such as ion milling and reactive ion etching and machining, and it is also highly pure. It is particularly preferable to use the CVD method because the nickel content can be easily reduced and the pores can be easily removed.

【0030】CVD法により作製されたセラミックス
は、基板の上に形成されるが、形成後に基板を除去して
上記セラミックスとして用いることができる。なお、C
VD法には、化学反応のために供給されるエネルギーの
供給形態で分類される熱CVD法、プラズマCVD法、
光CVD法、レーザーCVD法等の種々の手法がある
が、いずれの手法でも良い。
The ceramics produced by the CVD method are formed on a substrate, but the substrate can be removed after the formation and used as the above ceramics. Note that C
The VD method includes a thermal CVD method, a plasma CVD method, which are classified according to a supply form of energy supplied for a chemical reaction,
There are various methods such as a photo CVD method and a laser CVD method, but any method may be used.

【0031】これらの中で、基板を除去して1mm以上
の自立体を作製するため、特に熱CVDに代表される高
速成膜の可能な熱CVD法が好ましい。これにより、1
mm以上の厚みを有するセラミックスを短時間で製造す
ることができる。また、原料の効率を考慮し、低コスト
化のためコールドウォール型CVD装置が好ましく、ま
た、比較的大型製品に対して均一な膜形成が可能なホッ
トウォール型CVD装置も好ましい。
Of these, the thermal CVD method, which is capable of high-speed film formation represented by thermal CVD, is preferable because the substrate is removed to form a self-stereoscopic body of 1 mm or more. This gives 1
Ceramics having a thickness of mm or more can be manufactured in a short time. Further, in consideration of the efficiency of raw materials, a cold wall type CVD apparatus is preferable for cost reduction, and a hot wall type CVD apparatus capable of forming a uniform film on a relatively large product is also preferable.

【0032】以下に、本発明の情報担体用基板の製造方
法を、熱CVD法を用いた場合について説明する。
The method of manufacturing the information carrier substrate of the present invention will be described below using the thermal CVD method.

【0033】先ず、成膜用基板として円板形状の炭素基
板を準備する。この炭素基板は除去が容易なため好適で
あるが、成膜用基板としてはMo、W等の金属や金属化
合物等を用いてもかまわない。
First, a disk-shaped carbon substrate is prepared as a film forming substrate. This carbon substrate is suitable because it can be easily removed, but a metal such as Mo or W, a metal compound, or the like may be used as the film formation substrate.

【0034】次いで、炭素基板をCVD装置の反応炉内
に設置するとともに、反応ガスとして、珪素含有ガス、
炭素含有ガス及びキャリアーガスを準備する。
Next, the carbon substrate is placed in a reaction furnace of a CVD apparatus, and a silicon-containing gas is used as a reaction gas.
A carbon-containing gas and a carrier gas are prepared.

【0035】珪素含有ガスとしては、SiCl4、Si
4、SiHCl3等を用いればよい。炭素含有ガスとし
ては、CH4、C22、C24、C26、C38等を用
いればよい。また、珪素含有ガスが炭素をも含有してい
てもよく、例えば、CH3SiCl3、(CH32SiC
2、(CH34Si等をキャリアーガスと共に用いて
も良い。キャリアーガスとしては、水素、窒素、アルゴ
ン(Ar)、ヘリウム(He)等を用いることができ
る。
As the silicon-containing gas, SiCl 4 , Si
H 4 , SiHCl 3 or the like may be used. As the carbon-containing gas, CH 4 , C 2 H 2 , C 2 H 4 , C 2 H 6 , C 3 H 8 or the like may be used. The silicon-containing gas may also contain carbon, for example, CH 3 SiCl 3 , (CH 3 ) 2 SiC.
L 2 , (CH 3 ) 4 Si or the like may be used together with a carrier gas. As the carrier gas, hydrogen, nitrogen, argon (Ar), helium (He) or the like can be used.

【0036】以下は、炭素及び珪素の含有ガスとしてメ
チルトリクロルシラン(CH3SiCl3:以下、MTS
と言う)を、キャリアーガスとして水素(H2)を使用
した場合について説明する。
Methyltrichlorosilane (CH 3 SiCl 3 : as a gas containing carbon and silicon: hereinafter, MTS
The case of using hydrogen (H 2 ) as a carrier gas will be described.

【0037】CVDは、装置内を真空ポンプにより1P
a以下に排気した後、H2を流しながらCVD温度まで
昇温する。CVD温度は配向性を制御するため、120
0℃〜1800℃、特に1300〜1600℃が好まし
い。次に、反応炉をCVD温度に保ち、MTSを炉内に
導入し、炉内圧力を0.5〜40kPa、特に1〜15
kPaが高速成膜の点で好ましい。
In the case of CVD, the inside of the device is
After evacuation to a or less, the temperature is raised to the CVD temperature while flowing H 2 . Since the CVD temperature controls the orientation, 120
0 ° C. to 1800 ° C., particularly 1300 to 1600 ° C. are preferable. Next, the reaction furnace is kept at the CVD temperature, MTS is introduced into the furnace, and the furnace pressure is 0.5 to 40 kPa, especially 1 to 15
kPa is preferable in terms of high speed film formation.

【0038】そして、本発明の情報担体用基板を作製す
るCVD条件は、装置型式、基板大きさにもよるが、M
TS流量0.5〜5l/min、MTS/H2流量比
0.1〜1の範囲で条件を制御して作製することができ
る。この条件において、CVD反応が進み、成膜用基板
上に炭化珪素結晶を効率的に析出させることができる。
なお、得られた試料を、残留応力を低下させるため、所
望によりCVD温度以上の温度で加熱処理をすることが
できる。
The CVD conditions for producing the information carrier substrate of the present invention depend on the apparatus type and the substrate size, but M
It can be manufactured by controlling the conditions within a range of TS flow rate of 0.5 to 5 l / min and MTS / H 2 flow rate ratio of 0.1 to 1. Under these conditions, the CVD reaction proceeds, and silicon carbide crystals can be efficiently deposited on the film formation substrate.
Note that the obtained sample can be subjected to heat treatment at a temperature higher than the CVD temperature, if desired, in order to reduce the residual stress.

【0039】また、上記のように炭化珪素を成膜基体上
に形成した後、成膜用基板を除去し、成膜用基板との界
面から少なくとも0.1mm以上の領域に存在する炭化
珪素を機械加工又は酸化処理により除去し、前記セラミ
ック基板を作製する。このように界面付近の炭化珪素結
晶体を除去することにより、成膜初期に形成された、い
わば定常状態以前の組織を除去することにより、さらに
内部応力を低減できる。その結果、本発明の情報担体用
基板の表面の加工が容易になり、平面度10μmを容易
に得ることができる。
Further, after the silicon carbide is formed on the film-forming substrate as described above, the film-forming substrate is removed to remove silicon carbide existing in a region of at least 0.1 mm or more from the interface with the film-forming substrate. The ceramic substrate is manufactured by removing it by machining or oxidation. By removing the silicon carbide crystal near the interface as described above, the internal stress can be further reduced by removing the so-called pre-steady-state structure formed at the initial stage of film formation. As a result, the surface of the information carrier substrate of the present invention can be easily processed, and a flatness of 10 μm can be easily obtained.

【0040】なお、本発明に用いるCVD装置は特に限
定するものではないが、高速で成膜するためには、高周
波誘導加熱方式を採用し、高周波を吸収しにくい治具や
基体支持体を用い、基体及びその近傍のみを高温に維持
して原料を供給する型が好ましい。
Although the CVD apparatus used in the present invention is not particularly limited, in order to form a film at a high speed, a high frequency induction heating system is adopted, and a jig or a substrate support which does not easily absorb a high frequency is used. It is preferable to use a mold in which only the substrate and its vicinity are maintained at a high temperature to supply the raw material.

【0041】また、CVD法により製造した炭化珪素膜
は、表面を平滑にしやすいため、配向していることが好
ましい。特に、(111)又は(220)に配向してい
ることが好ましい。
The silicon carbide film produced by the CVD method is preferably oriented because the surface is likely to be smooth. In particular, it is preferably oriented in (111) or (220).

【0042】[0042]

【実施例】実施例1 平均結晶粒径が0.7μmで、純度が90%及び純度9
9.9%の2種類の炭化珪素粉末に対して、所望により
焼結助剤として、平均結晶粒径0.8μmのB 4Cとフ
ェノール樹脂(B,C)、平均粒子径0.2μmのアル
ミナと0.9μmの酸化イットリウム(Al)を加え、
公知の成形方法による成形後に常圧焼結法(NS)、ホ
ットプレス法(HP)及び通電加熱法(PAS)によ
り、表1の条件で焼成した。
[Example] Example 1 Average crystal grain size 0.7μm, purity 90% and purity 9
For two kinds of silicon carbide powder of 9.9%, if desired
As a sintering aid, B having an average crystal grain size of 0.8 μm FourC and F
Enol resin (B, C), Al with an average particle size of 0.2 μm
Mina and 0.9 μm yttrium oxide (Al) are added,
After the molding by the known molding method, the atmospheric pressure sintering method (NS),
Hot press method (HP) and electric heating method (PAS)
And was fired under the conditions of Table 1.

【0043】得られた焼結体中の鉄、クロム及びニッケ
ルの金属不純物量は、ICP発光分光分析によりそれぞ
れ測定し、その合計量を算出し、金属含有量とした。
The amounts of metallic impurities of iron, chromium and nickel in the obtained sintered body were measured by ICP emission spectroscopic analysis, and the total amount was calculated to obtain the metal content.

【0044】また、気孔率は、アルキメデス法を用いて
測定し、最大気孔径は、SEM観察にて320μm2
領域を10ヶ所観察し、最大径を求めた。
The porosity was measured by the Archimedes method, and the maximum pore diameter was determined by observing 10 areas of 320 μm 2 by SEM observation.

【0045】さらに、平板よりJIS R1601に基
づく試験片を切り出し、加工し、アルキメデス法によ
り、嵩密度を求め、JIS R1602に基づく超音波
パルス法により、室温でのヤング率を求めた。
Further, a test piece based on JIS R1601 was cut out from a flat plate, processed, the bulk density was determined by the Archimedes method, and the Young's modulus at room temperature was determined by the ultrasonic pulse method based on JIS R1602.

【0046】さらにまた、表面粗さは、原子間顕微鏡
(AFM)を用いてRaを測定した。
Furthermore, for the surface roughness, Ra was measured using an atomic force microscope (AFM).

【0047】また、平面度の評価は、直径30mmの吸
引口の上に試料を載置し、真空排気によって試料を装置
に固定する。真空排気をしながら、3次元測定器にて、
基板のたわみ量を測定した。
For the evaluation of flatness, the sample is placed on a suction port having a diameter of 30 mm, and the sample is fixed to the apparatus by evacuation. While evacuating, with a three-dimensional measuring device,
The amount of deflection of the substrate was measured.

【0048】次に、振動型試料磁力計(VSM)にて磁
化率を測定し、また、JIS R1601に基づく室温
での4点曲げ試験により、抗折強度を求めた。
Next, the magnetic susceptibility was measured with a vibrating sample magnetometer (VSM), and the bending strength was determined by a four-point bending test at room temperature based on JIS R1601.

【0049】また、結晶粒子の長径及び短径の測定は、
それぞれの表面を超平滑面になるまで研磨仕上げをし、
この面をNaOH+KNO3混合融体中でエッチング
し、走査電子顕微鏡(SEM)で写真を撮影し、その写
真から一粒子の最小径を短径、最大径を長径とした。粒
子30個について測定し、平均値を算出し、それぞれ長
径及び短径の値とした。
The major axis and minor axis of the crystal particles can be measured by
Polish each surface until it becomes a super smooth surface,
This surface was etched in a NaOH + KNO 3 mixed melt, and a photograph was taken with a scanning electron microscope (SEM). From the photograph, the minimum diameter of one particle was taken as the minor axis and the maximum diameter was taken as the major axis. The measurement was carried out on 30 particles, and the average value was calculated to be the values of the major axis and the minor axis, respectively.

【0050】さらに、結晶配向はX線回折により、Si
Cのピークを粉末X線と比較して決定した。結果を表1
に示した。
Further, the crystal orientation was determined by X-ray diffraction to be Si.
The C peak was determined by comparison with powder X-ray. The results are shown in Table 1.
It was shown to.

【0051】[0051]

【表1】 [Table 1]

【0052】本発明の試料No.1〜4及び8、10
は、金属含有量が0.09質量%以下、気孔率が0.1
%以下、最大気孔径が0.9μm以下、ヤング率が45
2GPa以上、且つ表面粗さが0.98nm以下、磁化
率が0.8nT以下で、たわみ量も67μm以下と小さ
かった。
Sample No. of the present invention. 1-4 and 8,10
Has a metal content of 0.09 mass% or less and a porosity of 0.1.
% Or less, maximum pore diameter is 0.9 μm or less, Young's modulus is 45
The surface roughness was 2 GPa or more, the surface roughness was 0.98 nm or less, the magnetic susceptibility was 0.8 nT or less, and the deflection amount was 67 μm or less.

【0053】一方、本発明の範囲外の試料No.5は、
たわみ量は69μmと小さかったが、気孔率が0.41
%、最大気孔径が1.2μm、表面粗さが1.27n
m、金属含有量が0.12質量%で、磁化率が1.1n
Tと大きく、エラーが発生しやすいため、情報担体用基
板としては不適当であった。
On the other hand, sample No. outside the range of the present invention. 5 is
Deflection was small at 69 μm, but porosity was 0.41
%, Maximum pore size 1.2 μm, surface roughness 1.27 n
m, the metal content is 0.12% by mass, and the magnetic susceptibility is 1.1 n.
Since it is large as T, and an error is likely to occur, it was unsuitable as a substrate for an information carrier.

【0054】また、本発明の範囲外の試料No.6、7
は、たわみ量は80μm以下と小さかったが、気孔率が
0.14%以上、最大気孔径が1.1μm以上、表面粗
さが1.12nm以上で、エラーが発生しやすく、情報
担体用基板としては不適当であった。
Further, sample No. outside the range of the present invention. 6, 7
Has a small deflection amount of 80 μm or less, but has a porosity of 0.14% or more, a maximum pore diameter of 1.1 μm or more, and a surface roughness of 1.12 nm or more, which easily causes an error and is a substrate for an information carrier. Was unsuitable as

【0055】さらに、本発明の範囲外の試料No.9
は、たわみ量は66μm以下と小さかったが、気孔率が
0.15%以上、平面度が22μmであるため、エラー
が発生しやすく、また、強度が230MPaと低いた
め、割れやすく情報担体用基板としては不適当であっ
た。 実施例2 成膜用基板として、純度99.99%のカーボン角板を
準備する。次いで、これらの試料をCVD炉中の反応室
内に配置し、反応ガスとして、MTSとH2を使用し、
表2に示した条件で成膜用基板上に約2mmの膜厚の炭
化珪素を成膜する。成膜終了後に炭化珪素からカーボン
を機械加工により除去し、両主面をダイヤモンド砥石及
びバフにより研磨を行った。
Further, sample No. outside the range of the present invention. 9
The deflection amount was as small as 66 μm or less, but the porosity was 0.15% or more and the flatness was 22 μm, so that an error was likely to occur, and the strength was low at 230 MPa, so that the substrate for information carrier was easily cracked. Was unsuitable as Example 2 A carbon square plate having a purity of 99.99% is prepared as a film formation substrate. Then, these samples were placed in a reaction chamber in a CVD furnace, using MTS and H 2 as reaction gases,
Under the conditions shown in Table 2, a silicon carbide film having a thickness of about 2 mm is formed on the film formation substrate. After completion of the film formation, carbon was removed from the silicon carbide by machining, and both main surfaces were polished with a diamond grindstone and a buff.

【0056】なお、試料No.17は、シリコンインゴ
ットから直径50mm、厚み1mmの円板を切り出した
シリコン製の基板である。
Sample No. Reference numeral 17 is a silicon substrate obtained by cutting a disk having a diameter of 50 mm and a thickness of 1 mm from a silicon ingot.

【0057】評価は実施例1と同様に行った。結果を表
2に示す。
Evaluation was carried out in the same manner as in Example 1. The results are shown in Table 2.

【0058】[0058]

【表2】 [Table 2]

【0059】本発明の試料11〜16は、いずれも(1
11)及び/又は(220)に配向しており、金属含有
量が0.05質量%以下、気孔率が0.05%以下、最
大気孔率が0.1μm以下、ヤング率が461GPa以
上でたわみ量も65μm以下と小かった。
Samples 11 to 16 of the present invention are all (1
11) and / or (220) oriented, metal content of 0.05 mass% or less, porosity of 0.05% or less, maximum porosity of 0.1 μm or less, Young's modulus of 461 GPa or more The amount was as small as 65 μm or less.

【0060】一方、シリコン結晶からなる本発明の範囲
外の試料No.17は、ヤング率が150GPaと小さ
く、たわみ量が200μm以上と大きく変形した。
On the other hand, the sample No. consisting of a silicon crystal and outside the scope of the present invention. The sample No. 17 had a small Young's modulus of 150 GPa and a large amount of deflection of 200 μm or more.

【0061】[0061]

【発明の効果】情報信号の磁化パターンを磁気記録媒体
に転写記録するためのマスター情報担体の強磁性体を形
成するためのセラミック基体として、不純物量、気孔
率、最大気孔径及びヤング率を制御することで、基体の
変形を小さくし、磁気パターンの転写の信頼性を高める
ことができる。
As a ceramic substrate for forming a ferromagnetic material of a master information carrier for transferring and recording a magnetization pattern of an information signal on a magnetic recording medium, the amount of impurities, the porosity, the maximum pore diameter and the Young's modulus are controlled. By doing so, the deformation of the substrate can be reduced and the reliability of the transfer of the magnetic pattern can be improved.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】情報信号の磁化パターンを磁気記録媒体に
転写記録するために強磁性体を表面に形成するための情
報担体用基板であって、炭化珪素結晶を主体とし、鉄、
クロム及びニッケルの含有量の合計が金属換算で0.1
質量%以下、気孔率が0.1%以下、最大気孔径が1μ
m以下、ヤング率が350GPa以上のセラミックスか
らなることを特徴とする情報担体用基板。
1. An information carrier substrate for forming a ferromagnetic material on a surface thereof for transferring and recording a magnetization pattern of an information signal on a magnetic recording medium, which is mainly composed of silicon carbide crystals, and iron,
The total content of chromium and nickel is 0.1 in terms of metal
Mass% or less, porosity 0.1% or less, maximum pore size 1μ
An information carrier substrate, which is made of a ceramic having a Young's modulus of 350 GPa or more and a m or less.
【請求項2】前記セラミックスの磁化率が1nT以下で
あることを特徴とする請求項1記載の情報担体用基板。
2. The information carrier substrate according to claim 1, wherein the magnetic susceptibility of the ceramics is 1 nT or less.
【請求項3】前記炭化珪素結晶の平均短径が10μm以
下、平均長径が150μm以下であることを特徴とする
請求項1又は2記載の情報担体用基板。
3. The information carrier substrate according to claim 1, wherein the silicon carbide crystal has an average minor axis of 10 μm or less and an average major axis of 150 μm or less.
【請求項4】前記セラミックスの主面の表面粗さRaが
1nm以下であることを特徴とする請求項1乃至3のい
ずれかに記載の情報担体用基板。
4. The information carrier substrate according to claim 1, wherein the main surface of the ceramic has a surface roughness Ra of 1 nm or less.
【請求項5】前記セラミックスの主面の平面度が10μ
m以下であることを特徴とする請求項1乃至4のいずれ
かに記載の情報担体用基板。
5. The flatness of the main surface of the ceramic is 10 μm.
The information carrier substrate according to any one of claims 1 to 4, wherein the substrate is m or less.
JP2001283005A 2001-09-18 2001-09-18 Substrate for information carrier Pending JP2003091809A (en)

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JP2007298322A (en) * 2006-04-28 2007-11-15 Japan Electronic Materials Corp Probe card
JP5819947B2 (en) * 2011-04-21 2015-11-24 株式会社ブリヂストン Ceramic sintered body and method for producing ceramic sintered body

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JPS63183623A (en) * 1987-01-23 1988-07-29 Sony Corp Method for contact magnetic field transfer to flexible disk
JPH10162360A (en) * 1996-12-04 1998-06-19 Hitachi Maxell Ltd Contact magnetic transfer device and magnetic transfer method
JPH11134630A (en) * 1997-10-30 1999-05-21 Kyocera Corp Substrate for magnetic disk and its production

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63183623A (en) * 1987-01-23 1988-07-29 Sony Corp Method for contact magnetic field transfer to flexible disk
JPH10162360A (en) * 1996-12-04 1998-06-19 Hitachi Maxell Ltd Contact magnetic transfer device and magnetic transfer method
JPH11134630A (en) * 1997-10-30 1999-05-21 Kyocera Corp Substrate for magnetic disk and its production

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007298322A (en) * 2006-04-28 2007-11-15 Japan Electronic Materials Corp Probe card
JP5819947B2 (en) * 2011-04-21 2015-11-24 株式会社ブリヂストン Ceramic sintered body and method for producing ceramic sintered body
US9522849B2 (en) 2011-04-21 2016-12-20 Bridgestone Corporation Ceramic sintered body and method of manufacturing ceramic sintered body

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