JP2003088816A - Simplified cleaning judgement system - Google Patents
Simplified cleaning judgement systemInfo
- Publication number
- JP2003088816A JP2003088816A JP2001286913A JP2001286913A JP2003088816A JP 2003088816 A JP2003088816 A JP 2003088816A JP 2001286913 A JP2001286913 A JP 2001286913A JP 2001286913 A JP2001286913 A JP 2001286913A JP 2003088816 A JP2003088816 A JP 2003088816A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- liquid
- tank
- contaminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 152
- 239000007788 liquid Substances 0.000 claims abstract description 66
- 238000002835 absorbance Methods 0.000 claims abstract description 9
- 238000011109 contamination Methods 0.000 claims abstract description 8
- 150000004820 halides Chemical class 0.000 claims description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000006864 oxidative decomposition reaction Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 238000010517 secondary reaction Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 239000011780 sodium chloride Substances 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 238000005695 dehalogenation reaction Methods 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 9
- 150000002896 organic halogen compounds Chemical class 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical class C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000003071 polychlorinated biphenyls Chemical group 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 102100038080 B-cell receptor CD22 Human genes 0.000 description 1
- 125000006414 CCl Chemical group ClC* 0.000 description 1
- 102100033040 Carbonic anhydrase 12 Human genes 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 101000884305 Homo sapiens B-cell receptor CD22 Proteins 0.000 description 1
- 101000867855 Homo sapiens Carbonic anhydrase 12 Proteins 0.000 description 1
- 101001078143 Homo sapiens Integrin alpha-IIb Proteins 0.000 description 1
- 102100025306 Integrin alpha-IIb Human genes 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 231100000704 bioconcentration Toxicity 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 231100000739 chronic poisoning Toxicity 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007673 developmental toxicity Effects 0.000 description 1
- 231100000415 developmental toxicity Toxicity 0.000 description 1
- 238000012850 discrimination method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 208000019423 liver disease Diseases 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007430 reference method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 208000017520 skin disease Diseases 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Processing Of Solid Wastes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ＰＣＢ含有物の洗
浄液汚染程度の判定を行う洗浄簡易判定システムに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning simple determination system for determining the degree of contamination of a cleaning liquid with PCB-containing substances.
【０００２】[0002]
【背景技術】近年では、ＰＣＢ（Polychlorinated biph
enyl, ポリ塩化ビフェニル：ビフェニルの塩素化異性体
の総称）が強い毒性を有することから、その製造および
輸入が禁止されている。このＰＣＢは、１９５４年頃か
ら国内で製造開始されたものの、カネミ油症事件をきっ
かけに生体・環境への悪影響が明らかになり、１９７２
年に行政指導により製造中止、回収の指示（保管の義
務）が出された経緯がある。BACKGROUND ART In recent years, PCB (Polychlorinated biph)
Since enyl, polychlorinated biphenyl: a generic term for chlorinated isomers of biphenyl) is highly toxic, its production and import are prohibited. Although this PCB was first manufactured in Japan around 1954, its adverse effects on the living body and environment became clear as a result of the Kanemi Yusho incident.
In the past year, there was a history of instructions to discontinue production and collection (duty of storage) due to administrative guidance.
【０００３】ＰＣＢは、ビフェニル骨格に塩素が１〜１
０個置換したものである。置換塩素の数や位置によって
理論的に２０９種類の異性体が存在し、現在、市販のＰ
ＣＢ製品において約１００種類以上の異性体が確認され
ている。また、この異性体間の物理・化学的性質や生体
内安定性および環境動体が多様であるため、ＰＣＢの化
学分析や環境汚染の様式を複雑にしているのが現状であ
る。さらに、ＰＣＢは、残留性有機汚染物質のひとつで
あって、環境中で分解されにくく、脂溶性で生物濃縮率
が高い。さらに半揮発性で大気経由の移動が可能である
という性質を持つ。また、水や生物など環境中に広く残
留することが報告されている。この結果、ＰＣＢは体内
で極めて安定であるので、体内に蓄積され慢性中毒（皮
膚障害、肝臓障害等）を引き起し、また発癌性、生殖・
発生毒性が認められている。PCB has 1 to 1 chlorine in the biphenyl skeleton.
It is a replacement of zero. There are theoretically 209 kinds of isomers depending on the number and position of substituted chlorine, and currently commercially available P
About 100 or more isomers have been confirmed in CB products. In addition, the physical and chemical properties among these isomers, the in vivo stability, and the environmental dynamics are so diverse that the chemical analysis of PCB and the mode of environmental pollution are complicated at present. Furthermore, PCB is one of persistent organic pollutants, is not easily decomposed in the environment, is fat-soluble, and has a high bioconcentration rate. Furthermore, it has the property of being semi-volatile and capable of moving through the atmosphere. In addition, it has been reported that it widely remains in the environment such as water and living things. As a result, since PCB is extremely stable in the body, it accumulates in the body and causes chronic poisoning (skin disorders, liver disorders, etc.), carcinogenicity, reproduction and reproduction.
Developmental toxicity is noted.
【０００４】ＰＣＢは、従来からトランスやコンデンサ
などの絶縁油として広く使用されてきた経緯があるの
で、ＰＣＢを処理する必要がある。このため、ＰＣＢを
無害化処理する種々の分解方法が提案されている（例え
ば特開平１１−２５３７９５号公報、特開平１１−２５
３７９６号公報、特開２０００−１２６５８８号公報他
参照）。Since PCB has been widely used as an insulating oil for transformers and capacitors, it is necessary to treat the PCB. Therefore, various decomposition methods for detoxifying the PCB have been proposed (for example, JP-A-11-253795 and JP-A-11-25).
3796, JP 2000-126588 A, etc.).
【０００５】ここで、上記ＰＣＢ無害化装置はＰＣＢの
みを処理するものであるが、一方のＰＣＢを抜き出した
ＰＣＢ汚染容器等は洗浄処理が施されて、容器の無害化
を図っている。Here, the PCB detoxifying device treats only the PCB, but the PCB-contaminated container or the like from which one PCB is extracted is subjected to a cleaning process to make the container harmless.
【０００６】しかしながら、ＰＣＢ汚染容器の洗浄が完
了したか否かの判定が困難である、という問題となる。However, there is a problem that it is difficult to judge whether or not the cleaning of the PCB-contaminated container is completed.
【０００７】例えば、拭き取り試験法ではＰＣＢの付着
量が０．１μｇ／１００ｃｍ2 以下（＝１０μｍ／ｍ2
以下）との規定があるが、そのような大面積を拭き取り
試験するには誤差が大きいという問題がある。For example, in the wiping test method, the adhesion amount of PCB is 0.1 μg / 100 cm 2 or less (= 10 μm / m 2
However, there is a problem that the error is large in the wiping test for such a large area.
【０００８】また、ＰＣＢ濃度を測定する方法として、
公定法が定められているが、その測定には前処理を含め
て２日以上を要し、迅速は判定をすることができないと
いう問題がある。As a method for measuring the PCB concentration,
Although the official method is stipulated, the measurement requires 2 days or more including the pretreatment, and there is a problem that it cannot be quickly determined.
【０００９】部材採取試験法においてもＰＣＢの付着量
が０．０１ｍｇ／ｋｇ以下という規定があるが、多量の
容器を連続して処理する場合には、簡易且つ迅速な判別
法が望まれている。The member sampling test method also specifies that the amount of adhered PCB is 0.01 mg / kg or less. However, when a large number of containers are continuously processed, a simple and quick discrimination method is desired. .
【００１０】このため、多量のＰＣＢ汚染容器を連続し
て処理するような場合には、洗浄の簡易・迅速な判定基
準方法が望まれている。Therefore, in the case where a large amount of PCB-contaminated containers are continuously processed, a simple and quick judgment reference method for cleaning is desired.
【００１１】本発明は、上記問題に鑑み、ＰＣＢ等の有
機ハロゲン化物に汚染した汚染容器等の洗浄の判定を迅
速に行うことができる洗浄簡易判定システムを提供する
ことを課題とする。In view of the above problems, it is an object of the present invention to provide a simple cleaning determination system which can quickly determine the cleaning of a contaminated container contaminated with an organic halide such as PCB.
【００１２】[0012]
【課題を解決するための手段】前述した課題を解決する
第１の発明は、有機ハロゲン化物に汚染された被処理物
を洗浄した洗浄液の汚染度合いを判定する洗浄簡易判定
システムにおいて、被処理物を洗浄する洗浄槽と、上記
洗浄槽からの汚染洗浄液を試料側とし、上記洗浄槽内に
供給する新規洗浄液を対照側として吸光度計測する吸光
光度計とを備えてなり、汚染洗浄液の濃度が基準値以下
であるときに、被処理物の洗浄が終了したことを判定す
ることを特徴とする洗浄簡易判定システムにある。A first invention for solving the above-mentioned problems is to provide a cleaning simple judgment system for judging the degree of contamination of a cleaning liquid for cleaning an object to be processed contaminated with an organic halide. And a spectrophotometer that measures the absorbance with the contaminated cleaning liquid from the cleaning tank as the sample side and the new cleaning liquid supplied into the cleaning tank as the control side, and the concentration of the contaminated cleaning liquid is the standard. A cleaning simple determination system is characterized in that when the value is equal to or less than a value, it is determined that the cleaning of the object to be processed is completed.
【００１３】第２の発明は、有機ハロゲン化物に汚染さ
れた被処理物を洗浄した洗浄液を管理する洗浄液管理シ
ステムの発明において、上記洗浄槽内に新規洗浄液を供
給する新規洗浄液供給ラインと、上記洗浄槽からの洗浄
液を一度外部へ取り出した後槽内に戻す洗浄液循環ライ
ンと、上記洗浄液循環ラインと上記新規洗浄液供給ライ
ンとに各々介装され、洗浄液の汚染度合いを測定する吸
光光度計と、を備えてなり、汚染洗浄液の濃度が基準値
以下であるときに、被処理物の洗浄が終了したことを判
定することを特徴とする洗浄簡易判定システムにある。A second invention is a cleaning liquid management system for managing a cleaning liquid for cleaning an object to be treated contaminated with an organic halide, wherein a new cleaning liquid supply line for supplying a new cleaning liquid into the cleaning tank, and A cleaning liquid circulation line that once takes out the cleaning liquid from the cleaning tank to the outside and then returns to the inside of the tank, and an absorptiometer for measuring the degree of contamination of the cleaning liquid, which is respectively installed in the cleaning liquid circulation line and the new cleaning liquid supply line. And a cleaning simple determination system characterized by determining that the cleaning of the object to be processed is completed when the concentration of the contaminated cleaning liquid is equal to or lower than the reference value.
【００１４】第３の発明は、第１又は２の発明におい
て、上記吸光光度計が紫外・可視吸光光度計又は赤外吸
収スペクトル計であることを特徴とする洗浄簡易判定シ
ステムにある。A third aspect of the invention is a simple cleaning determination system according to the first or second aspect of the invention, wherein the absorptiometer is an ultraviolet / visible absorptiometer or an infrared absorption spectrometer.
【００１５】第４の発明は、第１乃至４のいずれか一の
発明において、上記紫外・可視吸光光度計の測定波長が
２００〜２８０ｎｍ、赤外吸収スペクトル計の測定波長
が６００−１６００ｃｍ-1であることを特徴とする洗浄
簡易判定システムにある。A fourth invention is the invention according to any one of the first to fourth inventions, wherein the ultraviolet / visible absorptiometer has a measurement wavelength of 200 to 280 nm, and the infrared absorption spectrometer has a measurement wavelength of 600-1600 cm -1. The simple cleaning determination system is characterized by the following.
【００１６】第５の発明は、第１又は２の発明におい
て、上記被処理物がＰＣＢ含有絶縁油を内蔵したコンデ
ンサ、トランス、蛍光灯安定器又はこれらの構成部材で
あることを特徴とする洗浄簡易判定システムにある。A fifth invention is the cleaning according to the first or second invention, wherein the object to be treated is a condenser containing a PCB-containing insulating oil, a transformer, a fluorescent lamp ballast, or a constituent member thereof. It is in a simple judgment system.
【００１７】第６の発明は、第１乃至５の洗浄簡易判定
システムと、有機ハロゲン化物を解処理する処理設備と
を備えてなることを特徴とする有機ハロゲン化物処理シ
ステムにある。A sixth aspect of the present invention is an organic halide treatment system characterized by comprising the first to fifth cleaning simple judgment systems and a treatment facility for decomposing the organic halide.
【００１８】第７の発明は、第６の発明において、有機
ハロゲン化物を解処理する処理設備が、加熱・加圧され
た反応塔内において炭酸ナトリウム（Ｎａ2 ＣＯ3 ）の
存在下、有機ハロゲン化物の脱ハロゲン化反応および酸
化分解反応により塩化ナトリウム（ＮａＣｌ）、二酸化
炭素（ＣＯ2）等に分解させる水熱酸化分解装置である
ことを特徴とする有機ハロゲン化物処理システムにあ
る。A seventh aspect of the present invention is the method of the sixth aspect, wherein the treatment facility for decomposing the organic halide is organic halogen in the presence of sodium carbonate (Na 2 CO 3 ) in the heated and pressurized reaction tower. An organic halide treatment system is characterized in that it is a hydrothermal oxidative decomposition device for decomposing it into sodium chloride (NaCl), carbon dioxide (CO 2 ) and the like by dehalogenation reaction and oxidative decomposition reaction of the halide.
【００１９】第８の発明は、第７の発明において、上記
水熱酸化分解装置が、筒形状の一次反応塔と、油又は有
機溶媒，有機ハロゲン化物，水（Ｈ2Ｏ）及び水酸化ナ
トリウム（ＮａＯＨ）の各処理液を加圧する加圧ポンプ
と、当該水を予熱する予熱器と、配管を螺旋状に巻いた
構成の二次反応塔と、二次反応塔からの処理液を冷却す
る冷却器と、処理液を気液分離する気液分離手段と、減
圧弁とを備えてなることを特徴とする有機ハロゲン化物
処理システムにある。In an eighth aspect based on the seventh aspect, the hydrothermal oxidative decomposition apparatus comprises a cylindrical primary reaction tower, oil or an organic solvent, an organic halide, water (H 2 O) and sodium hydroxide. A pressurizing pump for pressurizing each processing solution of (NaOH), a preheater for preheating the water, a secondary reaction tower having a spirally wound pipe, and cooling the processing solution from the secondary reaction tower. The organic halide treatment system is characterized by comprising a cooler, a gas-liquid separating means for separating the treatment liquid into a gas and a liquid, and a pressure reducing valve.
【００２０】[0020]
【発明の実施の形態】本発明による洗浄液管理システム
の実施の形態を以下に説明するが、本発明はこれらの実
施の形態に限定されるものではない。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a cleaning liquid management system according to the present invention will be described below, but the present invention is not limited to these embodiments.
【００２１】［第１の実施の形態］図１に洗浄液管理シ
ステムの概略を示す。図１に示すように、本実施の形態
にかかる洗浄簡易判定システム３００は、有機ハロゲン
化物に汚染された被処理物（例えば容器等）１００３を
洗浄した洗浄液を管理する洗浄簡易判定システムにおい
て、被処理物を洗浄する洗浄槽１０１１と、上記洗浄槽
１０１１からの汚染洗浄液１０１２を試料側とし、上記
洗浄槽内に供給する新規洗浄液１０１０を対照側として
吸光度計測する吸光光度計３０３とを備えてなるもので
ある。なお、図中符号３０４は洗浄効率を向上させるた
めの超音波洗浄手段である。[First Embodiment] FIG. 1 schematically shows a cleaning liquid management system. As shown in FIG. 1, the cleaning simple determination system 300 according to the present embodiment is a simple cleaning determination system that manages a cleaning liquid for cleaning an object to be treated (eg, a container) 1003 contaminated with an organic halide. It comprises a cleaning tank 1011 for cleaning the processed material, and an absorptiometer 303 for measuring the absorbance with the contaminated cleaning solution 1012 from the cleaning tank 1011 as the sample side and the new cleaning solution 1010 supplied into the cleaning tank as the control side. It is a thing. Reference numeral 304 in the figure is an ultrasonic cleaning means for improving the cleaning efficiency.
【００２２】これにより、洗浄槽１０１１で被処理物１
００３を洗浄した際、洗浄液１０１０の汚染の度合いと
容器等に付着するＰＣＢ濃度とが一致するので、一定濃
度に平衡状態となったときに、上記洗浄槽１０１１内に
供給される新規洗浄液１０１０を対照として、汚染洗浄
液１０１２を一度外部へ取り出して試料側とし、汚染洗
浄液１０１２の吸光度を吸光光度計３０３で計測するこ
とで、洗浄液中のＰＣＢ濃度をオンラインで判定するこ
とができ、この濃度が容器に付着しているＰＣＢの濃度
と同一である結果、汚染洗浄液１０１２中のＰＣＢ濃度
が高い場合には、再度洗浄を行うようにし、新規洗浄液
１０１０に入れ替えて再洗浄するようにしている。As a result, the object to be processed 1 is placed in the cleaning tank 1011.
When cleaning 003, since the degree of contamination of the cleaning liquid 1010 and the concentration of PCB adhering to the container and the like match, when the equilibrium state is reached to a certain concentration, the new cleaning liquid 1010 supplied into the cleaning tank 1011 is As a control, the contaminated cleaning solution 1012 is once taken out to the sample side, and the absorbance of the contaminated cleaning solution 1012 is measured by an absorptiometer 303, whereby the PCB concentration in the cleaning solution can be determined online, and this concentration can be determined by the container. When the PCB concentration in the contaminated cleaning liquid 1012 is high as a result of the same concentration as the PCB adhering to, the cleaning is performed again and the cleaning liquid 1010 is replaced with new cleaning liquid 1010.
【００２３】なお、洗浄液中にはＰＣＢ以外の有害物質
も存在するが、ＰＣＢそれ自身が分解処理されるのでは
ないので、吸光光度計での計測によりＰＣＢ濃度が所定
値以下であるとすると、有害物質とＰＣＢとの合計の濃
度となるので、おのずとＰＣＢ濃度は所定値以下となっ
ていることになる。Although the cleaning liquid contains harmful substances other than PCB, the PCB itself is not decomposed. Therefore, if the PCB concentration is less than a predetermined value as measured by an absorptiometer, Since the total concentration of harmful substances and PCBs is reached, the PCB concentration naturally falls below a predetermined value.
【００２４】図２を参照して洗浄液のＰＣＢと洗浄剤と
の濃度分布の概念を示す。洗浄槽１０１１内で洗浄を続
けていくと、図２に示すように、洗浄液１０１２の有害
物質の存在が平衡状態となって、洗浄液（図中×）中の
ＰＣＢ存在量（図中、○）と容器付着ＰＣＢ存在量とが
同一となるので、その際に、汚染洗浄液１０１２を外部
へオンラインで取り出し、吸光光度計３０３のセル３０
３Ｅを通過する際に対照液である新規洗浄液１０１０を
セル３０３Ｒに入れて、下記式よりＰＣＢ濃度Ａが計測
される。その計測結果に応じて洗浄完了の有無を判断
し、洗浄が不十分の場合には、再度新規洗浄液を供給し
つつ洗浄を繰り返すことになる。
ＰＣＢ濃度（Ａ）＝ＡE −ＡN The concept of the concentration distribution between the PCB of the cleaning liquid and the cleaning agent will be described with reference to FIG. When the cleaning is continued in the cleaning tank 1011, as shown in FIG. 2, the presence of harmful substances in the cleaning liquid 1012 is in an equilibrium state, and the amount of PCB present in the cleaning liquid (× in the drawing) (◯ in the drawing). And the amount of PCB adhering to the container become the same, at that time, the contaminated cleaning liquid 1012 is taken out to the outside online, and the cell 30 of the absorptiometer 303 is used.
When passing through 3E, a new cleaning solution 1010 as a control solution is put in the cell 303R, and the PCB concentration A is measured by the following formula. Whether or not the cleaning is completed is judged according to the measurement result, and if the cleaning is insufficient, the cleaning is repeated while supplying a new cleaning liquid again. PCB concentration (A) = A E -A N
【００２５】上記吸光光度計２０３は紫外・可視吸光光
度計又は赤外吸収スペクトル計を用いることが好まし
く、その測定波長は特に限定されるものではないが、紫
外・可視吸光光度計の場合には、２００〜２８０ｎｍ、
赤外吸収スペクトル計の場合には、６００−１６００ｃ
ｍ-1とするのが好ましい。赤外吸収スペクトルの主要な
スペクトルとしては、Ｃ−Ｃｌの伸縮振動による吸収
（７００〜８００ｃｍ-1近傍），芳香族炭化水素のＣ＝
Ｃ伸縮振動、環Ｈの面内変角振動による吸収（１０００
〜１６００ｃｍ-1近傍）が挙げられる。As the absorptiometer 203, it is preferable to use an ultraviolet / visible absorptiometer or an infrared absorption spectrophotometer, and the measuring wavelength is not particularly limited, but in the case of an ultraviolet / visible absorptiometer. , 200-280 nm,
In the case of an infrared absorption spectrometer, 600-1600c
It is preferably m -1 . The main infrared absorption spectra are absorption due to stretching vibration of C-Cl (in the vicinity of 700 to 800 cm -1 ) and C = of aromatic hydrocarbons.
Absorption due to C stretching vibration and in-plane bending vibration of ring H (1000
-1600 cm -1 ).
【００２６】図３にＰＣＢ濃度と吸光度との関係図を示
す。測定波長は２５４ｎｍである。吸光光度計１０３で
求めた吸光度からＰＣＢ濃度を求めるようにすればよ
い。FIG. 3 shows the relationship between the PCB concentration and the absorbance. The measurement wavelength is 254 nm. The PCB concentration may be obtained from the absorbance obtained by the absorptiometer 103.
【００２７】上記被処理物１００１としては特に限定さ
れるものではないが、ＰＣＢ含有絶縁油を内蔵したコン
デンサ、トランス、蛍光灯安定器又はこれらの構成部材
等であり、例えばＰＣＢを抜き出した後の容器及びその
構成部材の洗浄処理をするものである。The object 1001 to be processed is not particularly limited, but it may be a capacitor containing a PCB-containing insulating oil, a transformer, a fluorescent lamp ballast, or components thereof, for example, after the PCB is extracted. The container and its constituent members are cleaned.
【００２８】また、例えばＰＣＢ等の有害物質を含有す
る塗料等を保存している保存容器を例示することができ
るが、これらに限定されるものではない。In addition, a storage container for storing a coating material containing a harmful substance such as PCB can be exemplified, but the storage container is not limited thereto.
【００２９】ここで、本発明において洗浄液とはＰＣＢ
等の有害物質を洗浄除去する機能を有する溶剤であれば
特に限定されるものではないが、例えばヘキサン、アセ
トン、トルエン、ジクロロメタン、ベンゼン、オクタ
ン、トリクロロエチレン、テトラクロロエチレン、炭化
水素、代替フロン等を挙げることができる。In the present invention, the cleaning liquid is PCB
The solvent is not particularly limited as long as it has a function of washing and removing harmful substances such as hexane, acetone, toluene, dichloromethane, benzene, octane, trichlorethylene, tetrachloroethylene, hydrocarbons, alternative CFCs, etc. You can
【００３０】[0030]
【実施例】図４を参照して本発明の実施例を説明する。
図４は洗浄システムの概略図である。図４において、粗
洗浄槽４０１内ではＰＣＢ液を抜いた容器を粗洗浄する
ものであり、この粗洗浄槽４０１に隣接して仕上洗浄槽
４０２が設けられている。上記仕上洗浄槽４０２には図
１に示す吸光光度計３０３が設けられており、洗浄液中
のＰＣＢ濃度を監視するようにしている。なお、図中、
符号４０３は乾燥器、４０４は洗浄液回収タンク、４０
５は溶剤再生装置、４０６は供給タンク、４０７は乾燥
器で使用する溶剤を蒸発させる蒸発器、４０８は乾燥器
で用いた溶剤蒸気４０９を回収する濃縮器を各々図示す
る。EXAMPLE An example of the present invention will be described with reference to FIG.
FIG. 4 is a schematic diagram of a cleaning system. In FIG. 4, a container from which the PCB liquid has been removed is roughly cleaned in the rough cleaning tank 401, and a finish cleaning tank 402 is provided adjacent to the rough cleaning tank 401. The finish cleaning tank 402 is provided with an absorptiometer 303 shown in FIG. 1 so as to monitor the PCB concentration in the cleaning liquid. In the figure,
Reference numeral 403 is a dryer, 404 is a cleaning liquid recovery tank, 40
5 is a solvent regenerator, 406 is a supply tank, 407 is an evaporator for evaporating the solvent used in the dryer, and 408 is a condenser for collecting the solvent vapor 409 used in the dryer.
【００３１】図５は判定のフロー図である。図４及び図
５に示すように、上記システムにおいて、仕上洗浄槽４
０２内に洗浄液（ＮＳ１００）を入れてＰＣＢを液抜き
したトランス容器１００３を洗浄する判定の一例を示
す。粗洗浄槽４０１において洗浄が終えた容器１００３
は仕上洗浄槽４０２に移され、該洗浄槽４０２内におい
て容器１００３の洗浄を所定時間行う（Ｓ−１）。その
後、洗浄液１０１２を吸光光度計３０３で計測し、０．
５ｍｇ／ｋｇ（５００ｐｐｂ）以下になっているか否か
を判定する（Ｓ−２）。洗浄液が５００ｐｐｂ以下にな
っている場合（Ｙｅｓ）には、容器に付着しているＰＣ
Ｂ量もそれ以下となっているので、洗浄が完了している
ことになる（Ｓ−３）。その後、容器を乾燥器４０６内
で乾燥させて洗浄を終了させる。一方、５００ｐｐｂ以
上になっている場合には（Ｎｏ）、容器１００３に付着
しているＰＣＢ量がそれ以上であるので、再度洗浄を繰
り返す（Ｓ−４）。FIG. 5 is a flow chart of the determination. As shown in FIGS. 4 and 5, in the above system, the finish cleaning tank 4
An example of determination for cleaning the transformer container 1003 in which the cleaning liquid (NS100) is put in 02 and the PCB is drained will be shown. Container 1003 that has been cleaned in the rough cleaning tank 401
Is transferred to the finish cleaning tank 402, and the container 1003 is cleaned in the cleaning tank 402 for a predetermined time (S-1). Then, the cleaning solution 1012 is measured by an absorptiometer 303,
It is determined whether it is 5 mg / kg (500 ppb) or less (S-2). If the cleaning liquid is less than 500 ppb (Yes), the PC attached to the container
Since the amount of B is also less than that, the cleaning is completed (S-3). After that, the container is dried in the dryer 406 to complete the cleaning. On the other hand, when it is 500 ppb or more (No), since the amount of PCB attached to the container 1003 is more than that, the cleaning is repeated again (S-4).
【００３２】なお、この判定は粗洗浄においても同様に
処理することができる。Note that this determination can be similarly processed in rough cleaning.
【００３３】このように、現時点での仕上洗浄の完了基
準である０．５ｍｇ／ｋｇ（５００ｐｐｂ）以下の濃度
であることを迅速にかつ簡易に計測できるので、その濃
度を判定の有無が容易となる。As described above, it is possible to quickly and easily measure that the concentration is 0.5 mg / kg (500 ppb) or less, which is the completion standard for finish cleaning at the present time. Therefore, it is easy to determine whether or not the concentration is determined. Become.
【００３４】[0034]
【発明の効果】以上の説明したように、本発明によれ
ば、有機ハロゲン化物に汚染された被処理物を洗浄した
洗浄液の汚染度合いを判定する洗浄簡易判定システムに
おいて、被処理物を洗浄する洗浄槽と、上記洗浄槽から
の汚染洗浄液を試料側とし、上記洗浄槽内に供給する新
規洗浄液を対照側として吸光度計測する吸光光度計とを
備えてなり、汚染洗浄液の濃度が基準値以下であるとき
に、被処理物の洗浄が終了したことを判定するので、現
時点での仕上洗浄の完了基準である０．５ｍｇ／ｋｇ
（５００ｐｐｂ）以下の濃度であることを迅速にかつ簡
易に計測でき、その濃度の判定の有無が容易となる。As described above, according to the present invention, the object to be processed is cleaned in the cleaning simple judgment system for judging the degree of contamination of the cleaning liquid for cleaning the object to be processed contaminated with the organic halide. A washing tank and an absorptiometer for measuring the absorbance with the contaminated cleaning liquid from the cleaning tank as the sample side and the new cleaning liquid supplied into the cleaning tank as the control side are provided, and the concentration of the contaminated cleaning liquid is below the reference value. At some point, it is determined that the cleaning of the object to be processed has been completed, so 0.5 mg / kg, which is the standard for completion of the final cleaning at the present time
It is possible to quickly and easily measure that the concentration is (500 ppb) or less, and it is easy to determine the concentration.
【図１】本実施の形態にかかる洗浄簡易判定システムの
概略図である。FIG. 1 is a schematic diagram of a cleaning simple determination system according to the present embodiment.
【図２】洗浄液のＰＣＢと洗浄剤との濃度分布の概念図
である。FIG. 2 is a conceptual diagram of concentration distributions of a cleaning liquid PCB and a cleaning agent.
【図３】ＰＣＢ濃度と吸光度との関係図である。FIG. 3 is a relationship diagram between PCB concentration and absorbance.
【図４】洗浄システムの概要図である。FIG. 4 is a schematic diagram of a cleaning system.
【図５】判定のフロー図である。FIG. 5 is a flow chart of determination.
３００ 洗浄簡易判定システム ３０３ 吸光光度計 ３０４ 超音波洗浄手段 １００３ ハロゲン化物に汚染された被処理物 １０１０ 新規洗浄液 １０１１ 洗浄槽 １０１２ 汚染洗浄液 300 Simple cleaning judgment system 303 Absorptiometer 304 Ultrasonic cleaning means 1003 Object to be treated contaminated with halide 1010 New cleaning solution 1011 cleaning tank 1012 Contaminated cleaning liquid
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｇ０１Ｎ 21/33 Ｇ０１Ｎ 21/35 Ｚ 21/35 Ｂ０９Ｂ 5/00 Ｚ (72)発明者 龍原 潔 長崎県長崎市深堀町五丁目717番１号 三 菱重工業株式会社長崎研究所内 Ｆターム(参考） 2G059 AA01 BB04 CC12 CC20 DD12 DD13 EE01 EE12 HH01 HH03 HH06 3B201 AA47 AB01 BB02 BB83 BB92 CC11 CC21 CD22 CD41 4D004 AA02 AA07 AA08 AB02 AB06 CA02 CA12 CA40 DA01 DA02 DA03 DA20 4G075 AA37 BA05 BA06 CA02 CA03 DA01 EA01 EB04 EB21 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) G01N 21/33 G01N 21/35 Z 21/35 B09B 5/00 Z (72) Inventor Kiyoshi Tatsuhara Nagasaki Prefecture F-term 5-171-1 Fukahori-cho, Nagasaki Sanryo Heavy Industries Co., Ltd. Nagasaki Research Institute F-term (reference) 2G059 AA01 BB04 CC12 CC20 DD12 DD13 EE01 EE12 HH01 HH03 HH06 3B201 AA47 AB01 BB02 BB83 BB92 CC11 CC21 CD22 CD41 4D004 AA02 AA A07 A02 AA07 A02 AB06 CA02 CA12 CA40 DA01 DA02 DA03 DA20 4G075 AA37 BA05 BA06 CA02 CA03 DA01 EA01 EB04 EB21
Claims (8)
を洗浄した洗浄液の汚染度合いを判定する洗浄簡易判定
システムにおいて、 被処理物を洗浄する洗浄槽と、 上記洗浄槽からの汚染洗浄液を試料側とし、上記洗浄槽
内に供給する新規洗浄液を対照側として吸光度計測する
吸光光度計と、 を備えてなり、 汚染洗浄液の濃度が基準値以下であるときに、被処理物
の洗浄が終了したことを判定することを特徴とする洗浄
簡易判定システム。1. A simple cleaning system for determining the degree of contamination of a cleaning liquid obtained by cleaning an object to be processed contaminated with an organic halide, a cleaning tank for cleaning the object to be processed, and a contaminated cleaning solution from the cleaning tank as a sample. And the absorptiometer for measuring the absorbance with the new cleaning liquid supplied into the cleaning tank as the control side, and when the concentration of the contaminated cleaning liquid is below the reference value, the cleaning of the treatment object is completed. A simple cleaning determination system characterized by determining that.
を洗浄した洗浄液を管理する洗浄液管理システムにおい
て、 上記洗浄槽内に新規洗浄液を供給する新規洗浄液供給ラ
インと、 上記洗浄槽からの洗浄液を一度外部へ取り出した後槽内
に戻す洗浄液循環ラインと、 上記洗浄液循環ラインと上記新規洗浄液供給ラインとに
各々介装され、洗浄液の汚染度合いを測定する吸光光度
計と、 を備えてなり、 汚染洗浄液の濃度が基準値以下であるときに、被処理物
の洗浄が終了したことを判定することを特徴とする洗浄
簡易判定システム。2. A cleaning liquid management system for managing a cleaning liquid for cleaning an object to be treated contaminated with an organic halide, comprising: a new cleaning liquid supply line for supplying a new cleaning liquid into the cleaning tank; and a cleaning liquid from the cleaning tank. It is equipped with a cleaning liquid circulation line that is once taken out to the outside and then returned to the tank, and an absorptiometer that is installed in the cleaning liquid circulation line and the new cleaning liquid supply line, and that measures the degree of contamination of the cleaning liquid. A simple cleaning determination system, which determines that cleaning of an object to be processed is completed when the concentration of the cleaning liquid is equal to or lower than a reference value.
ペクトル計であることを特徴とする洗浄簡易判定システ
ム。3. The cleaning simple determination system according to claim 1, wherein the absorptiometer is an ultraviolet / visible absorptiometer or an infrared absorption spectrometer.
ｎｍ、赤外吸収スペクトル計の測定波長が６００−１６
００ｃｍ-1であることを特徴とする洗浄簡易判定システ
ム。4. The measurement wavelength of the ultraviolet / visible absorptiometer according to any one of claims 1 to 4, which is from 200 to 280.
nm, the measurement wavelength of the infrared absorption spectrometer is 600-16
A simple cleaning determination system characterized by being 00 cm -1 .
サ、トランス、蛍光灯安定器又はこれらの構成部材であ
ることを特徴とする洗浄簡易判定システム。5. The cleaning simple determination system according to claim 1 or 2, wherein the object to be processed is a condenser, a transformer, a fluorescent lamp ballast having PCB-containing insulating oil built therein, or a component thereof.
と、 有機ハロゲン化物を解処理する処理設備とを備えてなる
ことを特徴とする有機ハロゲン化物処理システム。6. An organic halide treatment system comprising the cleaning simple determination system according to claim 1 and a treatment facility for decomposing an organic halide.
された反応塔内において炭酸ナトリウム（Ｎａ2 Ｃ
Ｏ3 ）の存在下、有機ハロゲン化物の脱ハロゲン化反応
および酸化分解反応により塩化ナトリウム（ＮａＣ
ｌ）、二酸化炭素（ＣＯ 2）等に分解させる水熱酸化分
解装置であることを特徴とする有機ハロゲン化物処理シ
ステム。7. The method according to claim 6, The processing equipment for decomposing organic halides is heated and pressurized.
Sodium carbonate (Na2C
O3Dehalogenation reaction of organic halides in the presence of
And sodium chloride (NaC
l), carbon dioxide (CO 2) Hydrothermal oxidative components that decompose into
Organic halide treatment system characterized by
Stem.
は有機溶媒，有機ハロゲン化物，水（Ｈ2Ｏ）及び水酸
化ナトリウム（ＮａＯＨ）の各処理液を加圧する加圧ポ
ンプと、当該水を予熱する予熱器と、配管を螺旋状に巻
いた構成の二次反応塔と、二次反応塔からの処理液を冷
却する冷却器と、処理液を気液分離する気液分離手段
と、減圧弁とを備えてなることを特徴とする有機ハロゲ
ン化物処理システム。8. The hydrothermal oxidative decomposition apparatus according to claim 7, wherein the hydrothermal oxidative decomposition apparatus includes a cylindrical primary reaction tower and oil or organic solvent, organic halide, water (H 2 O) and sodium hydroxide (NaOH). A pressure pump for pressurizing the treatment liquid, a preheater for preheating the water, a secondary reaction tower having a configuration in which a pipe is spirally wound, a cooler for cooling the treatment liquid from the secondary reaction tower, and a treatment. An organic halide treatment system comprising a gas-liquid separating means for separating a liquid into a liquid and a pressure reducing valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001286913A JP2003088816A (en) | 2001-09-20 | 2001-09-20 | Simplified cleaning judgement system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001286913A JP2003088816A (en) | 2001-09-20 | 2001-09-20 | Simplified cleaning judgement system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003088816A true JP2003088816A (en) | 2003-03-25 |
Family
ID=19109808
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001286913A Pending JP2003088816A (en) | 2001-09-20 | 2001-09-20 | Simplified cleaning judgement system |
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| Country | Link |
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| JP (1) | JP2003088816A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106896165A (en) * | 2017-01-19 | 2017-06-27 | 完美（中国）有限公司 | A kind of method of test equipment cleaning degree |
| WO2018147178A1 (en) * | 2017-02-13 | 2018-08-16 | 株式会社エアレックス | Cleaning-performance evaluation system |
| CN114653706A (en) * | 2020-12-24 | 2022-06-24 | 中国科学院微电子研究所 | Semiconductor single wafer type cleaning device and method |
-
2001
- 2001-09-20 JP JP2001286913A patent/JP2003088816A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106896165A (en) * | 2017-01-19 | 2017-06-27 | 完美（中国）有限公司 | A kind of method of test equipment cleaning degree |
| WO2018147178A1 (en) * | 2017-02-13 | 2018-08-16 | 株式会社エアレックス | Cleaning-performance evaluation system |
| JP2018132301A (en) * | 2017-02-13 | 2018-08-23 | 株式会社エアレックス | Cleaning performance evaluation system |
| KR20190118499A (en) * | 2017-02-13 | 2019-10-18 | 가부시키가이샤 에아렉크스 | Cleaning performance evaluation system |
| US10712267B2 (en) | 2017-02-13 | 2020-07-14 | Airex Co., Ltd. | Cleaning-performance evaluation system |
| KR102312577B1 (en) | 2017-02-13 | 2021-10-13 | 가부시키가이샤 에아렉크스 | Cleaning performance evaluation system |
| CN114653706A (en) * | 2020-12-24 | 2022-06-24 | 中国科学院微电子研究所 | Semiconductor single wafer type cleaning device and method |
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