JP2003010798A - Method for reusing cleaning liquid and cleaning apparatus using the method - Google Patents
Method for reusing cleaning liquid and cleaning apparatus using the methodInfo
- Publication number
- JP2003010798A JP2003010798A JP2001198561A JP2001198561A JP2003010798A JP 2003010798 A JP2003010798 A JP 2003010798A JP 2001198561 A JP2001198561 A JP 2001198561A JP 2001198561 A JP2001198561 A JP 2001198561A JP 2003010798 A JP2003010798 A JP 2003010798A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- main
- cleaning liquid
- tank
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Processing Of Solid Wastes (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、洗浄液の再利用方
法及びこれを使用する洗浄装置に関し、特に、トランス
やコンデンサ等のＰＣＢ汚染機器類の洗浄を行う場合に
適用すると有効である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for reusing a cleaning liquid and a cleaning apparatus using the same, and is particularly effective when applied to cleaning PCB-contaminated equipment such as transformers and capacitors.
【０００２】[0002]
【従来の技術】例えば、ＰＣＢ（Polychlorinated biph
enyl, ポリ塩化ビフェニル：ビフェニルの塩素化異性体
の総称）の付着したトランスやコンデンサの容器等の無
機物製の部材を洗浄する際に使用されている従来の洗浄
装置を図３に示す。2. Description of the Related Art For example, PCB (Polychlorinated biph)
FIG. 3 shows a conventional cleaning apparatus used for cleaning an inorganic material such as a transformer or a container of a capacitor to which enyl, polychlorinated biphenyl: a general term for chlorinated isomers of biphenyl) is attached.
【０００３】図３に示すように、第一の本洗浄槽１１
１、第二の本洗浄槽１１２、仕上洗浄槽１１３内には、
有機溶剤からなる洗浄液１００が貯溜すると共に、図示
しない超音波発振器が設けられている。仕上洗浄槽１１
３には、当該仕上洗浄槽１１３内に新規の洗浄液１００
を供給する洗浄液供給源１１４が連結されている。仕上
洗浄槽１１３の下部は、送給ポンプ１１５の受入口に連
結している。送給ポンプ１１５の送出口は、第二の本洗
浄槽１１２内に連結している。第二の本洗浄槽１１２の
下部は、送給ポンプ１１６の受入口に連結している。送
給ポンプ１１６の送出口は、第一の本洗浄槽１１１内に
連結している。As shown in FIG. 3, a first main cleaning tank 11 is provided.
In the first and second main cleaning tanks 112 and the finishing cleaning tank 113,
A cleaning liquid 100 made of an organic solvent is stored and an ultrasonic oscillator (not shown) is provided. Finishing cleaning tank 11
3 includes a new cleaning liquid 100 in the finish cleaning tank 113.
Is connected to a cleaning liquid supply source 114. The lower portion of the finish cleaning tank 113 is connected to the receiving port of the feed pump 115. The outlet of the feed pump 115 is connected to the inside of the second main cleaning tank 112. The lower part of the second main cleaning tank 112 is connected to the receiving port of the feed pump 116. The outlet of the feed pump 116 is connected to the inside of the first main cleaning tank 111.
【０００４】第一の本洗浄槽１１１の下部は、送給ポン
プ１１７の受入口に連結している。送給ポンプ１１７の
送出口は、蒸留器１２１の受入口に連結している。蒸留
器１２１の蒸気送出口は、冷却器１２２の受入口に連結
している。冷却器１２２の送出口は、送給ポンプ１１８
の受入口に連結している。送給ポンプ１１８の送出口
は、仕上洗浄槽１１３内に連結している。蒸留器１２１
の残留分送出口は、回収タンク１２５に連結している。The lower part of the first main cleaning tank 111 is connected to the receiving port of the feed pump 117. The outlet of the feed pump 117 is connected to the inlet of the distiller 121. The vapor outlet of the distiller 121 is connected to the inlet of the cooler 122. The outlet of the cooler 122 is the feed pump 118.
Is connected to the entrance. The delivery port of the delivery pump 118 is connected to the finish cleaning tank 113. Still 121
The residual delivery port of is connected to the recovery tank 125.
【０００５】このような洗浄装置１１０を使用して、Ｐ
ＣＢの付着したトランスやコンデンサの容器等の部材
（被処理物）を洗浄するには、当該被処理物１を第一の
本洗浄槽１１１内に入れて洗浄液１００中に浸漬すると
共に前記超音波発振器を作動させ、当該被処理物１に付
着しているＰＣＢを洗浄液１００中に溶解して被処理物
１から除去する。所定時間経過したら、被処理物１を第
二の本洗浄槽１１２内に移し入れて洗浄液１００中に浸
漬すると共に前記超音波発振器を作動させ、当該被処理
物１に残留しているＰＣＢを洗浄液１００中に溶解して
被処理物１から除去する。所定時間経過したら、被処理
物１を仕上洗浄槽１１３内に移し入れて洗浄液１００中
に浸漬すると共に前記超音波発振器を作動させて仕上洗
浄を行う。Using such a cleaning device 110, P
To clean a member (object to be processed) such as a transformer or a capacitor container to which CB is adhered, the object to be processed 1 is placed in the first main cleaning tank 111, immersed in the cleaning liquid 100, and the ultrasonic wave is applied. The oscillator is operated to dissolve the PCB adhering to the object to be processed 1 in the cleaning liquid 100 and remove it from the object to be processed 1. After a lapse of a predetermined time, the object to be processed 1 is transferred into the second main cleaning tank 112, immersed in the cleaning solution 100, and the ultrasonic oscillator is activated to clean the PCB remaining on the object to be processed 1 with the cleaning solution. It is dissolved in 100 and removed from the object 1. After a lapse of a predetermined time, the object to be processed 1 is transferred into the finish cleaning tank 113, immersed in the cleaning liquid 100, and the ultrasonic oscillator is operated to perform the finish cleaning.
【０００６】所定時間経過したら、被処理物１を仕上洗
浄槽１１３内から取り出して乾燥させた後、ＰＣＢ付着
残留評価試験を行い、基準値をクリアした場合には、後
工程へ送り出され、基準値をクリアできなかった場合に
は、再び洗浄処理される。After a lapse of a predetermined time, the object to be treated 1 is taken out of the finish cleaning tank 113 and dried, and then a PCB adhesion residual evaluation test is conducted. If the value cannot be cleared, the cleaning process is performed again.
【０００７】このようにして被処理物１を次々に洗浄し
ていき、仕上洗浄槽１１３内の洗浄液１００中のＰＣＢ
濃度が基準値（０．５ｐｐｍ）に近くなった時点で（例
えば０．４ｐｐｍ）、前記送給ポンプ１１７を作動して
第一の本洗浄装置１１１内の洗浄液１００を蒸留器１２
１内に送給して蒸留する一方、前記送給ポンプ１１６を
作動して第二の本洗浄槽１１２内の洗浄液１００を第一
の本洗浄槽１１１内に移し入れると共に、前記送給ポン
プ１１５を作動して仕上洗浄槽１１３内の洗浄液１００
を第二の本洗浄槽１１２内に移し入れる。In this way, the object 1 to be processed is cleaned one after another, and the PCB in the cleaning liquid 100 in the finish cleaning tank 113 is washed.
When the concentration becomes close to the reference value (0.5 ppm) (for example, 0.4 ppm), the feed pump 117 is operated to remove the cleaning liquid 100 in the first main cleaning device 111 from the distiller 12.
In the meanwhile, while feeding and distilling the cleaning liquid 100 in the first main cleaning tank 112 into the first main cleaning tank 111, the feed pump 116 is operated to move the cleaning liquid 100 in the second main cleaning tank 112 into the first main cleaning tank 111. To activate the cleaning liquid 100 in the finishing cleaning tank 113.
Are transferred into the second main cleaning tank 112.
【０００８】前記蒸留器１２１で生成した蒸気は、冷却
器１２２で液化されて、ＰＣＢをほとんど除去された
（０．０５ｐｐｍ以下）洗浄液１００として送給ポンプ
１１８により仕上洗浄槽１１３内に送給される。さら
に、仕上洗浄槽１１３内の洗浄液１００の不足分は、洗
浄液供給源１１４から供給される新たな洗浄液１００に
より補充される。一方、前記蒸留器１２１内に残留した
洗浄液１００（ＰＣＢ高濃度含有）は、回収タンク１２
５に回収され、後工程で無害化処理される。The steam generated in the distiller 121 is liquefied in the cooler 122 and is sent to the finish cleaning tank 113 by the feed pump 118 as the cleaning liquid 100 in which most of the PCB is removed (0.05 ppm or less). It Further, the shortage of the cleaning liquid 100 in the finish cleaning tank 113 is replenished with new cleaning liquid 100 supplied from the cleaning liquid supply source 114. On the other hand, the cleaning liquid 100 (containing a high concentration of PCB) remaining in the distiller 121 is collected in the recovery tank 12
It is recovered in No. 5 and is detoxified in a later process.
【０００９】このように被処理物１を洗浄すると共に洗
浄液１００を再生処理することにより、被処理物１の無
害化を行うと共に、洗浄液１００を有効利用して洗浄液
１００の廃棄量および処理コストの削減を図るようにし
ている。By thus cleaning the object to be processed 1 and regenerating the cleaning liquid 100, the object to be processed 1 is rendered harmless, and the cleaning liquid 100 is effectively used to reduce the amount of waste of the cleaning liquid 100 and the processing cost. We are trying to reduce it.
【００１０】[0010]
【発明が解決しようとする課題】前述したような従来の
洗浄装置１１０においては、第一の本洗浄槽１１１で使
用してＰＣＢを高濃度で含有する洗浄液１００を仕上洗
浄槽１１３での仕上洗浄に使用できる濃度（０．５ｐｐ
ｍ以下）にまで高精製する必要があるため、前記蒸留器
１２１が多段の非常に大がかりなものとなってしまい、
設備コストが高くなってしまっていた。In the conventional cleaning apparatus 110 as described above, the cleaning liquid 100 containing PCB at a high concentration, which is used in the first main cleaning tank 111, is finally cleaned in the finishing cleaning tank 113. Concentration that can be used for (0.5pp
(m or less), the distiller 121 becomes a multi-stage and very large scale,
The equipment cost had risen.
【００１１】このような問題は、ＰＣＢの付着したトラ
ンスやコンデンサの容器等の部材を洗浄する場合に限ら
ず、廃棄塗料や廃棄燃料や有害薬品等を貯蔵した容器な
どのように、汚染物の付着した被処理物を洗浄処理する
場合であれば、上述した場合と同様に起こり得ることで
ある。Such a problem is not limited to the case of cleaning the member such as the container of the transformer or the capacitor to which the PCB is adhered, and the contaminant such as a container storing waste paint, waste fuel, harmful chemicals, etc. If the adhered object to be treated is to be washed, it can occur in the same manner as in the case described above.
【００１２】このようなことから、本発明は、洗浄液の
再利用を低コストで実施することができる洗浄液の再利
用方法及びこれを使用する洗浄装置を提供することを目
的とする。In view of the above, an object of the present invention is to provide a cleaning liquid reuse method and a cleaning apparatus using the same, which makes it possible to reuse the cleaning liquid at low cost.
【００１３】[0013]
【課題を解決するための手段】前述した課題を解決する
ための、第一番目の発明による洗浄液の再利用方法は、
汚染物の付着した被処理物を本洗浄する本洗浄工程で使
用した洗浄液と、前記本洗浄工程で洗浄された前記被処
理物を仕上洗浄する仕上洗浄工程で使用した洗浄液とを
蒸留精製して再利用する洗浄液の再利用方法であって、
前記本洗浄工程で使用した前記洗浄液と前記仕上洗浄工
程で使用した前記洗浄液とをそれぞれ別個に蒸留精製
し、上記本洗浄工程で使用されて蒸留精製された上記洗
浄液を当該本洗浄工程で再利用する一方、上記仕上洗浄
工程で使用されて蒸留精製された上記洗浄液を当該仕上
洗浄工程で再利用するようにしたことを特徴とする。[Means for Solving the Problems] A method for reusing a cleaning solution according to the first aspect of the invention for solving the above-mentioned problems is as follows:
By distilling and purifying the cleaning liquid used in the main cleaning step for the main cleaning of the object to which the contaminants adhere, and the cleaning liquid used in the finishing cleaning step for the final cleaning of the object to be processed cleaned in the main cleaning step. A method of reusing a cleaning liquid to be reused,
The cleaning liquid used in the main cleaning step and the cleaning liquid used in the finishing cleaning step are separately distilled and purified, and the cleaning liquid used in the main cleaning step and purified by distillation is reused in the main cleaning step. On the other hand, it is characterized in that the cleaning liquid used in the finish cleaning step and purified by distillation is reused in the finish cleaning step.
【００１４】第二番目の発明による洗浄液の再利用方法
は、第一番目の発明において、前記本洗浄工程の前記洗
浄液の不足分を、前記仕上洗浄工程で使用されて蒸留精
製した前記洗浄液の残留分で補うようにしたことを特徴
とする。The method of reusing the cleaning liquid according to the second aspect of the present invention is the method of reusing the cleaning liquid according to the first aspect, wherein the insufficient amount of the cleaning liquid in the main cleaning step is used in the finishing cleaning step and purified by distillation. It is characterized in that it is made up with minutes.
【００１５】第三番目の発明による洗浄液の再利用方法
は、第一番目または第二番目の発明において、前記仕上
洗浄工程の前記洗浄液の不足分を、新規の洗浄液で補う
ようにしたことを特徴とする。A method of reusing a cleaning liquid according to a third invention is characterized in that, in the first or second invention, a shortage of the cleaning liquid in the finish cleaning step is supplemented with a new cleaning liquid. And
【００１６】第四番目の発明による洗浄液の再利用方法
は、第一番目から第三番目の発明のいずれかにおいて、
前記汚染物が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品
のうちの少なくとも一種であることを特徴とする。A method of reusing a cleaning solution according to a fourth aspect of the invention is the method according to any one of the first to third aspects,
The contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals.
【００１７】第五番目の発明による洗浄液の再利用方法
は、第一番目から第三番目の発明のいずれかにおいて、
前記被処理物が、ＰＣＢを含有したトランスまたはコン
デンサを構成する部材であることを特徴とする。A method of reusing a cleaning liquid according to a fifth aspect of the invention is the method according to any one of the first to third aspects,
The object to be processed is a member that constitutes a transformer or a capacitor containing PCB.
【００１８】また、前述した課題を解決するための、第
六番目の発明による洗浄装置は、内部に洗浄液を貯溜
し、汚染物の付着した被処理物を本洗浄する本洗浄槽
と、内部に洗浄液を貯溜し、前記本洗浄槽で本洗浄され
た前記被処理物を仕上洗浄する仕上洗浄槽と、前記本洗
浄槽で使用された前記洗浄液を蒸留精製する本洗浄用蒸
留精製手段と、前記仕上洗浄槽で使用された前記洗浄液
を蒸留精製する仕上洗浄用蒸留精製手段と、前記本洗浄
用蒸留精製手段で蒸留精製された前記洗浄液を前記本洗
浄槽に戻す本洗浄用洗浄液送給手段と、前記仕上洗浄用
蒸留精製手段で蒸留精製された前記洗浄液を前記仕上洗
浄槽に戻す仕上洗浄用洗浄液送給手段とを備えたことを
特徴とする。Further, in order to solve the above-mentioned problems, a cleaning apparatus according to a sixth aspect of the present invention stores therein a cleaning liquid, and a main cleaning tank for main cleaning an object to be treated with contaminants attached to the main cleaning tank. A final cleaning tank for storing the cleaning liquid, and a final cleaning tank for finishing cleaning the object to be main cleaned in the main cleaning tank; a distillation purification means for main cleaning for distilling and purifying the cleaning liquid used in the main cleaning tank; A final cleaning distillation purification means for distilling and purifying the cleaning liquid used in the final cleaning tank, and a main cleaning cleaning liquid feeding means for returning the cleaning liquid distilled and purified by the main cleaning distillation purification means to the main cleaning tank. A cleaning liquid feeding device for finishing cleaning, which returns the cleaning liquid distilled and purified by the distillation cleaning device for finishing cleaning to the finishing cleaning tank, is provided.
【００１９】第七番目の発明による洗浄装置は、第六番
目の発明において、前記仕上洗浄用蒸留精製手段で生成
した前記洗浄液の残留分を前記本洗浄用蒸留手段および
前記本洗浄槽の少なくとも一方に送給する本洗浄用洗浄
液補充手段を備えたことを特徴とする。A cleaning device according to a seventh invention is the cleaning device according to the sixth invention, wherein the residual portion of the cleaning liquid produced by the distillation / purification means for finish cleaning is at least one of the distillation means for main cleaning and the main cleaning tank. A cleaning liquid replenishing means for main cleaning is provided.
【００２０】第八番目の発明による洗浄装置は、第六番
目または第七番目の発明において、前記仕上洗浄槽内に
新規の洗浄液を補充する仕上洗浄用洗浄液補充手段を備
えたことを特徴とする。A cleaning device according to an eighth invention is the cleaning device according to the sixth or seventh invention, characterized in that it comprises a cleaning liquid replenishing means for finishing cleaning, which replenishes the new cleaning liquid in the finishing cleaning tank. .
【００２１】第九番目の発明による洗浄装置は、第六番
目から第八番目の発明のいずれかにおいて、前記汚染物
が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品のうちの少
なくとも一種であることを特徴とする。The cleaning apparatus according to the ninth invention is the cleaning apparatus according to any one of the sixth to eighth inventions, wherein the contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals. Is characterized by.
【００２２】第十番目の発明による洗浄装置は、第六番
目から第八番目の発明のいずれかにおいて、前記被処理
物が、ＰＣＢを含有したトランスまたはコンデンサを構
成する部材であることを特徴とする。The cleaning apparatus according to the tenth invention is characterized in that, in any one of the sixth to eighth inventions, the object to be processed is a member containing a transformer or a capacitor containing PCB. To do.
【００２３】[0023]
【発明の実施の形態】本発明による洗浄液の再利用方法
及びこれを使用する洗浄装置の実施の形態を図面を用い
て説明するが、本発明は以下の実施の形態に限定される
ものではない。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a method for reusing a cleaning liquid and a cleaning apparatus using the same according to the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments. .
【００２４】［第一番目の実施の形態］本発明による洗
浄液の再利用方法及びこれを使用する洗浄装置を、ＰＣ
Ｂで汚染されたトランスやコンデンサの容器等の部材を
洗浄する際に適用する場合の第一番目の実施の形態を図
１を用いて説明する。図１は、洗浄装置の概略構成図で
ある。[First Embodiment] A method of reusing a cleaning liquid according to the present invention and a cleaning device using the same are
A first embodiment in the case of applying when cleaning a member such as a transformer or a container of a capacitor contaminated with B will be described with reference to FIG. FIG. 1 is a schematic configuration diagram of a cleaning device.
【００２５】図１に示すように、第一の本洗浄槽１１、
第二の本洗浄槽１２、仕上洗浄槽１３内には、有機溶剤
からなる洗浄液１００が貯溜すると共に、図示しない超
音波発振器が設けられている。仕上洗浄槽１３には、当
該仕上洗浄槽１３内に新規の洗浄液１００を供給する洗
浄液供給源１４が連結されている。As shown in FIG. 1, the first main cleaning tank 11,
In the second main cleaning tank 12 and the finish cleaning tank 13, a cleaning liquid 100 made of an organic solvent is stored and an ultrasonic oscillator (not shown) is provided. A cleaning liquid supply source 14 for supplying a new cleaning liquid 100 into the finish cleaning tank 13 is connected to the finish cleaning tank 13.
【００２６】仕上洗浄槽１３の下部は、送給ポンプ１５
の受入口に連結している。送給ポンプ１５の送出口は、
仕上洗浄用蒸留器２３の受入口に連絡している。仕上洗
浄用蒸留器２３の蒸気送出口は、冷却器２４の受入口に
連結している。冷却器２４の送出口は、送給ポンプ１９
の受入口に連結している。送給ポンプ１９の送出口は、
仕上洗浄槽１３内に連結している。The lower part of the finish cleaning tank 13 has a feed pump 15
Is connected to the entrance. The delivery port of the delivery pump 15 is
It communicates with the inlet of the finish cleaning distiller 23. The vapor outlet of the finish cleaning distiller 23 is connected to the inlet of the cooler 24. The outlet of the cooler 24 is the delivery pump 19
Is connected to the entrance. The delivery port of the delivery pump 19 is
It is connected to the finish cleaning tank 13.
【００２７】第二の本洗浄槽１２の下部は、送給ポンプ
１６の受入口に連結している。送給ポンプ１６の送出口
は、第一の本洗浄槽１１内に連結している。第一の本洗
浄槽１１の下部は、送給ポンプ１７の受入口に連結して
いる。送給ポンプ１７の送出口は、本洗浄用蒸留器２１
の受入口に連結している。本洗浄用蒸留器２１の蒸気送
出口は、冷却器２２の受入口に連結している。冷却器２
２の送出口は、送給ポンプ１８の受入口に連結してい
る。送給ポンプ１８の送出口は、第二の本洗浄槽１２内
に連結している。The lower part of the second main cleaning tank 12 is connected to the inlet of the feed pump 16. The outlet of the feed pump 16 is connected to the inside of the first main cleaning tank 11. The lower part of the first main cleaning tank 11 is connected to the inlet of the feed pump 17. The outlet of the feed pump 17 is a main cleaning distiller 21.
Is connected to the entrance. The steam outlet of the main cleaning distiller 21 is connected to the inlet of the cooler 22. Cooler 2
The outlet 2 is connected to the inlet of the feed pump 18. The outlet of the feed pump 18 is connected to the inside of the second main cleaning tank 12.
【００２８】また、前記仕上洗浄用蒸留器２３の残留分
送出口は、送給ポンプ２０の受入口に連結している。送
給ポンプ２０の送出口は、上記本洗浄用蒸留器２１の受
入口に連結している。本洗浄用蒸留器２１の残留分送出
口は、回収タンク２５に連結している。The residual delivery port of the finish cleaning distiller 23 is connected to the receiving port of the delivery pump 20. The outlet of the feed pump 20 is connected to the inlet of the main cleaning distiller 21. The residual delivery port of the main cleaning distiller 21 is connected to the recovery tank 25.
【００２９】このような本実施の形態においては、第一
の本洗浄槽１１、第二の本洗浄槽１２、送給ポンプ１６
等により本洗浄槽を構成し、送給ポンプ１７、本洗浄用
蒸留器２１、冷却器２２等により本洗浄用蒸留精製手段
を構成し、送給ポンプ１５、仕上洗浄用蒸留器２３、冷
却器２４等により仕上洗浄用蒸留精製手段を構成し、送
給ポンプ１８等により本洗浄用洗浄液送給手段を構成
し、送給ポンプ１９等により仕上洗浄用洗浄液送給手段
を構成し、送給ポンプ２０等により本洗浄用洗浄液補充
手段を構成し、洗浄液供給源１４等により仕上洗浄用洗
浄液補充手段を構成している。In this embodiment as described above, the first main cleaning tank 11, the second main cleaning tank 12, and the feed pump 16 are provided.
And the like constitute a main cleaning tank, and a feed pump 17, a main cleaning distiller 21, a cooler 22 and the like constitute a main cleaning distillation purification means, and a feed pump 15, a finish cleaning distiller 23, a cooler. 24 and the like constitute the finishing cleaning distillation and purification means, the feed pump 18 and the like constitute the main washing cleaning liquid feeding means, the feeding pump 19 and the like constitute the finishing washing cleaning liquid feeding means, and the feeding pump The cleaning liquid replenishing means for main cleaning is composed of 20 and the like, and the cleaning liquid replenishing means for finish cleaning is composed of the cleaning liquid supply source 14 and the like.
【００３０】このようにして構成された洗浄装置１０を
使用して、ＰＣＢの付着したトランスやコンデンサの容
器等の部材の被処理物１を洗浄処理する場合には、被処
理物１を第一の本洗浄槽１１内に入れて洗浄液１００中
に浸漬すると共に前記超音波発振器を作動させ、当該被
処理物１に付着しているＰＣＢを洗浄液１００中に溶解
して被処理物１から除去する。所定時間経過後、被処理
物１を第二の本洗浄槽１２内に移し入れて洗浄液１００
中に浸漬すると共に前記超音波発振器を作動させ、当該
被処理物１に残留しているＰＣＢを洗浄液１００中に溶
解して被処理物１から除去する（以上、本洗浄工程）。When the object to be treated 1 of a member such as a transformer or a capacitor container to which a PCB is adhered is cleaned by using the cleaning apparatus 10 thus constructed, the object 1 to be treated is first treated. The main body is placed in the main cleaning tank 11 and immersed in the cleaning liquid 100, and the ultrasonic oscillator is operated to dissolve the PCB adhering to the object to be processed 1 into the cleaning liquid 100 and remove it from the object to be processed 1. . After a lapse of a predetermined time, the object to be treated 1 is transferred into the second main cleaning tank 12 and the cleaning liquid 100 is added.
The PCB remaining in the object to be processed 1 is dissolved in the cleaning liquid 100 and removed from the object to be processed 1 by immersing the substrate in the ultrasonic wave oscillator and operating the ultrasonic oscillator (above, the main cleaning step).
【００３１】所定時間経過後、被処理物１を仕上洗浄槽
１３内に移し入れて洗浄液１００中に浸漬すると共に前
記超音波発振器を作動させて仕上洗浄を行う（以上、仕
上洗浄工程）。After the lapse of a predetermined time, the object to be treated 1 is transferred into the finish cleaning tank 13 and immersed in the cleaning liquid 100, and the ultrasonic oscillator is operated to perform the final cleaning (the above is the final cleaning step).
【００３２】所定時間経過後、被処理物１を仕上洗浄槽
１３内から取り出して乾燥させた後、ＰＣＢ付着残留評
価試験を行い、基準値をクリアした場合には、後工程へ
送り出され、基準値をクリアできなかった場合には、再
び洗浄処理される。After a lapse of a predetermined time, the object to be treated 1 is taken out from the finish cleaning tank 13 and dried, and then a PCB adhesion residual evaluation test is conducted. If the value cannot be cleared, the cleaning process is performed again.
【００３３】このようにして被処理物１を次々に洗浄し
ていき、仕上洗浄槽１３内の洗浄液１００中のＰＣＢ濃
度が基準値（０．５ｐｐｍ）に近くなったら（例えば
０．４ｐｐｍ）、前記送給ポンプ１５を作動して当該仕
上洗浄装置１３内の洗浄液１００を仕上洗浄用蒸留器２
３内に送給して蒸留すると共に、前記送給ポンプ１７を
作動して前記第一の本洗浄装置１１内の洗浄液１００を
本洗浄用蒸留器２１内に送給して蒸留する一方、前記送
給ポンプ１６を作動して第二の本洗浄槽１２内の洗浄液
１００を第一の本洗浄槽１１内に移し入れる。In this way, the objects to be treated 1 are cleaned one after another, and when the PCB concentration in the cleaning liquid 100 in the finish cleaning tank 13 becomes close to the reference value (0.5 ppm) (for example, 0.4 ppm), The feed pump 15 is operated to move the cleaning liquid 100 in the finish cleaning device 13 to the finish cleaning distiller 2
3 for feeding and distilling, and at the same time for operating the feed pump 17 to feed the cleaning liquid 100 in the first main cleaning apparatus 11 into the main cleaning distiller 21 for distillation, The feed pump 16 is operated to transfer the cleaning liquid 100 in the second main cleaning tank 12 into the first main cleaning tank 11.
【００３４】前記仕上洗浄用蒸留器２３で生成した蒸気
は、冷却器２４で液化されて、ＰＣＢをほとんど除去さ
れた（例えば０．０５ｐｐｍ以下）洗浄液１００として
送給ポンプ１９により仕上洗浄槽１３内に再び供給され
る。このとき、仕上洗浄槽１３内の洗浄液１００の不足
分は、前記洗浄液供給源１４から供給される新たな洗浄
液１００により補充される。The steam generated in the finish cleaning distiller 23 is liquefied in the cooler 24 to remove most of the PCB (for example, 0.05 ppm or less) as the cleaning liquid 100 in the finish cleaning tank 13 by the feed pump 19. Will be supplied again. At this time, the shortage of the cleaning liquid 100 in the finish cleaning tank 13 is replenished with the new cleaning liquid 100 supplied from the cleaning liquid supply source 14.
【００３５】また、前記本洗浄用蒸留器２１で生成した
蒸気は、冷却器２２で液化されて、ＰＣＢを大幅に低減
された（例えば１００ｐｐｍ以下）洗浄液１００として
送給ポンプ１８により第二の本洗浄槽１２内に送給され
る。Further, the vapor generated in the main cleaning distiller 21 is liquefied in the cooler 22 and PCB is greatly reduced (for example, 100 ppm or less) as the cleaning liquid 100, and the second pump is used by the feed pump 18. It is fed into the cleaning tank 12.
【００３６】一方、仕上洗浄用蒸留器２３内に残留した
洗浄液１００（ＰＣＢ濃度１００ｐｐｍ程度）は、前記
送給ポンプ２０により本洗浄用蒸留器２１内に送給さ
れ、前記第一の本洗浄槽１１からの前記洗浄液１００と
共に蒸留精製されて第二の本洗浄槽１２内に送給され
る。これにより、第二の本洗浄槽１２内の洗浄液１００
の不足分が補充される。On the other hand, the cleaning liquid 100 (PCB concentration of about 100 ppm) remaining in the finish cleaning distiller 23 is fed into the main cleaning distiller 21 by the feed pump 20, and the first main washing tank is supplied. It is distilled and purified together with the cleaning liquid 100 from 11 and fed into the second main cleaning tank 12. As a result, the cleaning liquid 100 in the second main cleaning tank 12
Will be replenished.
【００３７】また、本洗浄用蒸留器２１内に残留した洗
浄液１００（高濃度ＰＣＢ含有洗浄液）は、回収タンク
２５に回収され、後工程で無害化処理される。The cleaning liquid 100 (high-concentration PCB-containing cleaning liquid) remaining in the main cleaning distiller 21 is recovered in the recovery tank 25, and is detoxified in a subsequent step.
【００３８】つまり、従来は、本洗浄工程で使用した洗
浄液１００を仕上洗浄工程で再利用できるように蒸留精
製していたが、本実施の形態では、本洗浄工程で使用し
た洗浄液１００と仕上洗浄工程で使用した洗浄液１００
とをそれぞれ別個に蒸留精製し、本洗浄工程で使用され
て蒸留精製された洗浄液１００を当該本洗浄工程で再利
用する一方、仕上洗浄工程で使用されて蒸留精製された
洗浄液１００を当該仕上洗浄工程で再利用するようにし
たのである。That is, conventionally, the cleaning liquid 100 used in the main cleaning process was distilled and purified so that it can be reused in the finishing cleaning process. However, in the present embodiment, the cleaning liquid 100 used in the main cleaning process and the final cleaning process are used. Cleaning solution 100 used in the process
Are separately purified by distillation, and the cleaning liquid 100 used in the main cleaning step and purified by distillation is reused in the main cleaning step, while the cleaning liquid 100 used in the final cleaning step and purified by distillation is subjected to the final cleaning. It was reused in the process.
【００３９】このため、従来は、段数の多い複雑な構造
の蒸留器１２１を使用して洗浄液１００を再生処理する
必要があったものの、本実施の形態では、段数の少ない
簡単な構造の蒸留器２１，２３だけで洗浄液１００の再
生処理を行うことができる。この理由を以下に説明す
る。For this reason, conventionally, it was necessary to regenerate the cleaning liquid 100 by using the distiller 121 having a large number of stages and a complicated structure, but in the present embodiment, the distiller having a simple structure with a small number of stages is used. The cleaning liquid 100 can be regenerated with only 21 and 23. The reason for this will be described below.
【００４０】蒸留器は、溶媒中に溶解する溶質の濃度に
関係なく、蒸留前後の溶媒中の溶質の濃度の変化率が一
定になる特性を有している。例えば、１０％の割合で溶
質が溶解している溶媒を蒸留して、溶媒中の溶質の割合
を１００ｐｐｍ（１／１００まで低減）とする場合と、
１％の割合で溶質が溶解している溶媒を蒸留して、溶媒
中の溶質の割合を１０ｐｐｍ（１／１００まで低減）と
する場合とは、段数の比較的少ない簡単な構造の蒸留器
で実施することができる。これに対し、例えば、１０％
の割合で溶質が溶解している溶媒を蒸留して、溶媒中の
溶質の割合を１０ｐｐｍ（１／１０００まで低減）とし
ようとすると、段数の多い複雑な構造の蒸留器を使用し
なければならず、設備コストが著しく上昇してしまう。The distiller has a characteristic that the rate of change in the concentration of the solute in the solvent before and after the distillation becomes constant regardless of the concentration of the solute dissolved in the solvent. For example, when the solvent in which the solute is dissolved at a ratio of 10% is distilled to make the ratio of the solute in the solvent 100 ppm (reduced to 1/100),
Distilling a solvent in which a solute is dissolved at a ratio of 1% to reduce the solute ratio in the solvent to 10 ppm (reduced to 1/100) is performed with a distiller having a simple structure with relatively few stages. It can be carried out. On the other hand, for example, 10%
In order to distill the solvent in which the solute is dissolved at a ratio of 10 to reduce the ratio of the solute in the solvent to 10 ppm (reduced to 1/1000), a distiller having a complicated structure with many stages must be used. Therefore, the equipment cost will increase significantly.
【００４１】そこで、本発明では、溶質の濃度が高い溶
媒と、溶質の濃度が低い溶媒とをそれぞれ別個に蒸留精
製すると共にそれぞれ別個に再利用する、すなわち、本
洗浄で使用する洗浄液１００と、仕上洗浄で使用する洗
浄液１００とをそれぞれ別個に蒸留してそれぞれ別個に
再利用することにより、すべての洗浄液１００の再利用
を図りながらも、ＰＣＢがほとんど除去された（例えば
０．０５ｐｐｍ以下）洗浄液１００を容易に得ることが
できるようにしたのである。Therefore, in the present invention, the solvent having a high solute concentration and the solvent having a low solute concentration are separately purified by distillation and reused separately, that is, the cleaning liquid 100 used in the main cleaning, By distilling the cleaning liquid 100 used in the finish cleaning separately and reusing them separately, PCBs are almost removed (for example, 0.05 ppm or less) while reusing all the cleaning liquids 100. The 100 can be easily obtained.
【００４２】これにより、従来のような段数の多い複雑
な構造の蒸留器１２１を使用する必要がなくなり、段数
の比較的少ない簡単な構造の蒸留器２１，２３だけで洗
浄液１００の再生処理を済ますことができる。As a result, there is no need to use a conventional distiller 121 having a complicated structure with a large number of stages, and the cleaning liquid 100 can be regenerated only by the distillers 21 and 23 having a relatively small number of stages and a simple structure. be able to.
【００４３】したがって、本実施の形態によれば、洗浄
液１００の再利用にかかるコストを大幅に削減すること
ができる。Therefore, according to the present embodiment, the cost for reusing the cleaning liquid 100 can be significantly reduced.
【００４４】なお、前記洗浄液１００としては、例え
ば、ベンゼン、トルエン、キシレン、ヘキサン、オクタ
ン、灯油、Ｃ2 〜Ｃ4 程度のアルコールや有機塩素化合
物、代替フロン等の各種有機溶剤が挙げられる。Examples of the cleaning liquid 100 include benzene, toluene, xylene, hexane, octane, kerosene, C 2 to C 4 alcohols, organic chlorine compounds, and various organic solvents such as CFC substitutes.
【００４５】＜有害物質処理システム＞このようにして
ＰＣＢの付着したトランスやコンデンサの容器等の部材
の被処理物１の洗浄処理を行う上記洗浄装置１０は、以
下のような有害物質処理システムに組み込まれることに
より、より効果的に利用することができる。<Toxic Substance Processing System> The above-described cleaning device 10 for cleaning the object 1 to be processed of the member such as the transformer and the capacitor container to which the PCB is adhered in this way has the following harmful substance processing system. When incorporated, it can be used more effectively.
【００４６】有害物質処理システムは、図２に示すよう
に、有害物質が付着又は含有又は保存されている被処理
物を無害化する有害物質処理システムであって、被処理
物（例えばトランス、コンデンサ等）1001である有害物
質( 例えばＰＣＢ等)1002 を保存する容器1003から当該
有害物質1002を分離する第１の分離手段1004と、被処理
物1001を構成する構成材1001ａ，ｂ，…を解体する解体
手段1005とのいずれか一方又は両方を有する前処理手段
1006と、前処理手段1006において処理された被処理物を
構成する構成材（コア、コンデンサ素子部等）1001ａ，
ｂ，…から紙・木・樹脂等の有機物1007と金属等の無機
物1008とに分離する第２の分離手段1009と、上記前処理
手段1006で分離された金属製の容器1003又は上記分離手
段1009で分離した金属等の無機物1008を洗浄液1010で洗
浄する洗浄手段1011と、洗浄後の洗浄廃液1012及び前処
理手段で分離した有害物質1001のいずれか一方又は両方
を分解処理する有害物質分解処理手段1013とを、具備し
てなるものである。As shown in FIG. 2, the harmful substance processing system is a harmful substance processing system for detoxifying an object to be processed to which harmful materials are attached, contained or stored, and the object to be processed (for example, a transformer or a capacitor). Etc.) 1001 is a first separating means 1004 for separating the harmful substance 1002 from a container 1003 for storing the harmful substance (eg PCB) 1002 and the constituent materials 1001a, b, ... Pretreatment means having one or both of the disassembling means 1005
1006 and constituent materials (core, capacitor element portion, etc.) 1001a constituting the object processed by the pretreatment means 1006,
Second separation means 1009 for separating organic matter 1007 such as paper, wood, resin and the like and inorganic matter 1008 such as metal from b, ..., Metal container 1003 separated by the pretreatment means 1006 or the separation means 1009 The cleaning means 1011 for cleaning the inorganic substance 1008 such as the metal separated by the cleaning solution 1010, the cleaning waste liquid 1012 after cleaning, and the harmful substance 1001 separated by the pretreatment means. 1013 and are provided.
【００４７】このような有害物質処理システムにおいて
は、前記洗浄装置１０は上記洗浄手段1011として使用さ
れる。In such a harmful substance treatment system, the cleaning device 10 is used as the cleaning means 1011.
【００４８】このような有害物質処理システムによれ
ば、被処理物１に付着するＰＣＢ濃度を、現在のＰＣＢ
の排出基準値（３ｐｐｂ）以下の0.５ｐｐｂ以下にまで
低減することができ、ＰＣＢを含むトランスやコンデン
サ等を安全かつ確実に処理することができる。したがっ
て、ＰＣＢ含有物品の完全処理が可能となり、ＰＣＢの
完全消滅が可能となる。According to such a harmful substance treatment system, the concentration of PCB adhering to the object to be treated 1 can be calculated by using the current PCB concentration.
The emission standard value (3 ppb) or less can be reduced to 0.5 ppb or less, and the transformer and the capacitor including the PCB can be safely and reliably treated. Therefore, the PCB-containing article can be completely processed, and the PCB can be completely extinguished.
【００４９】また、ＰＣＢ以外の有機化合物も分解する
ことができるので、ＰＣＢ中に含まれるダイオキシン
類、ＰＣＢに汚染された紙、木、布などの有機物、およ
びケースの洗浄に使用する洗浄剤も同様に分解処理する
ことができる。Since organic compounds other than PCB can also be decomposed, dioxins contained in PCB, organic substances such as paper, wood, cloth, etc. contaminated by PCB, and a cleaning agent used for cleaning the case are also used. It can be decomposed similarly.
【００５０】なお、上記水熱分解方法は本願出願人によ
り既に開示されており、詳しくは特開平１１−６３９号
公報、特開平１１−２５３７９５号公報等を参照された
い。The above hydrothermal decomposition method has already been disclosed by the applicant of the present application, and for details, refer to JP-A Nos. 11-639 and 11-253795.
【００５１】［他の実施の形態］
＜仕上洗浄用蒸留器の残留分＞前述した第一番目の実施
の形態では、仕上洗浄用蒸留器２３内に残留した洗浄液
１００を送給ポンプ２０により本洗浄用蒸留器２１内に
送給し、第一の本洗浄槽１１からの前記洗浄液１００と
共に蒸留精製してから第二の本洗浄槽１２内に送給する
ようにしたが、他の実施の形態として、例えば、仕上洗
浄用蒸留器２３内に残留した洗浄液１００を送給ポンプ
２０により第一の本洗浄槽１１や第二の本洗浄槽１２内
に直接送給したり、本洗浄用蒸留器２１と本洗浄槽１
１，１２との両者に分配して送給したりすることも可能
である。[Other Embodiments] <Residual Content of Finish Cleaning Distiller> In the above-described first embodiment, the cleaning liquid 100 remaining in the finish cleaning distiller 23 is supplied by the feed pump 20. The cleaning distiller 21 is fed to the cleaning distiller 21 and is distilled and purified together with the cleaning liquid 100 from the first main cleaning tank 11 before being fed to the second main cleaning tank 12. As a form, for example, the cleaning liquid 100 remaining in the finish cleaning distiller 23 is directly fed into the first main cleaning tank 11 or the second main cleaning tank 12 by the feed pump 20, or the main cleaning distillation is performed. Vessel 21 and main cleaning tank 1
It is also possible to distribute and send to both 1 and 12.
【００５２】具体的には、例えば、仕上洗浄用蒸留器２
３内に残留した洗浄液１００中のＰＣＢ濃度が、第二の
本洗浄槽１２内の洗浄液１００中のＰＣＢ濃度の上限値
（例えば１００ｐｐｍ）よりも小さい場合には、仕上洗
浄用蒸留器２３内に残留した洗浄液１００を第二の本洗
浄槽１２内に戻し、第二の本洗浄槽１２内の洗浄液１０
０中のＰＣＢ濃度の上限値（例えば１００ｐｐｍ）より
も大きく、第一の本洗浄槽１１内の洗浄液１００中のＰ
ＣＢ濃度の上限値（例えば１０００ｐｐｍ）よりも小さ
い場合には、第一の本洗浄槽１１内に戻し、第一の本洗
浄槽１１内の洗浄液１００中のＰＣＢ濃度の上限値（例
えば１０００ｐｐｍ）よりも大きい場合には、本洗浄用
蒸留器２１内に送給するとよい。Specifically, for example, the distiller 2 for finish cleaning is used.
In the case where the PCB concentration in the cleaning liquid 100 remaining in 3 is smaller than the upper limit value (for example, 100 ppm) of the PCB concentration in the cleaning liquid 100 in the second main cleaning tank 12, it is stored in the finish cleaning distiller 23. The remaining cleaning liquid 100 is returned into the second main cleaning tank 12 to wash the cleaning liquid 10 in the second main cleaning tank 12.
P concentration in the cleaning liquid 100 in the first main cleaning tank 11 is larger than the upper limit value of the PCB concentration in 0 (for example, 100 ppm).
If the CB concentration is lower than the upper limit value (for example, 1000 ppm), the CB concentration is returned to the inside of the first main cleaning tank 11, and the PCB concentration in the cleaning liquid 100 in the first main cleaning tank 11 is determined from the upper limit value (for example, 1000 ppm). If it is too large, it may be fed into the main cleaning distiller 21.
【００５３】しかしながら、前述した第一番目の実施の
形態のように、仕上洗浄用蒸留器２３内に残留した洗浄
液１００を本洗浄用蒸留器２１内に送給するようにする
と、洗浄液１００等に要するランニングコストや蒸留器
２１，２３の特性等に要するイニシャルコストのバラン
スが最も好ましくなる。However, when the cleaning liquid 100 remaining in the finish cleaning distiller 23 is fed into the main cleaning distiller 21 as in the first embodiment described above, the cleaning liquid 100 and the like are obtained. The balance between the running cost required and the initial cost required for the characteristics of the stills 21, 23 is most preferable.
【００５４】＜本洗浄槽＞前述した第一番目の実施の形
態では、二つの本洗浄槽１１，１２を送給ポンプ１６で
連結して本洗浄を行うようにしたが、本発明は、これに
限らず、他の実施の形態として、単一の本洗浄槽だけと
したり、三つ以上の本洗浄槽の間を送給ポンプでそれぞ
れ連結して各本洗浄槽で本洗浄をそれぞれ行うようにす
ることも可能である。しかしながら、前述した第一番目
の実施の形態のように、二つの本洗浄槽１１，１２を送
給ポンプ１６で連結して本洗浄を行うようにすれば、コ
スト的に最も効率よく本洗浄を行うことができるので好
ましい。<Main Cleaning Tank> In the above-described first embodiment, the two main cleaning tanks 11 and 12 are connected by the feed pump 16 to perform the main cleaning. Not limited to this, as another embodiment, a single main cleaning tank may be used, or three or more main cleaning tanks may be connected by a feed pump to perform main cleaning in each main cleaning tank. It is also possible to However, if the two main cleaning tanks 11 and 12 are connected by the feed pump 16 to perform the main cleaning as in the first embodiment described above, the main cleaning can be performed most efficiently in terms of cost. This is preferable because it can be performed.
【００５５】＜仕上洗浄槽＞前述した第一番目の実施の
形態では、一つの仕上洗浄槽１３で仕上洗浄を行うよう
にしたが、本発明は、これに限らず、他の実施の形態と
して、二つ以上の仕上洗浄槽の間を送給ポンプで連結し
て各仕上洗浄槽で仕上洗浄をそれぞれ行うようにするこ
とも可能である。しかしながら、前述した第一番目の実
施の形態のように、一つの仕上洗浄槽１３で仕上洗浄を
行うようにすれば、コスト的に最も効率よく仕上洗浄を
行うことができるので好ましい。<Finishing Cleaning Tank> In the above-described first embodiment, one finishing cleaning tank 13 is used for finishing cleaning. However, the present invention is not limited to this, and other embodiments are possible. It is also possible to connect two or more finish cleaning tanks with a feed pump so that the finish cleaning tanks respectively carry out the finish cleaning. However, it is preferable to perform the finish cleaning in one finish cleaning tank 13 as in the above-described first embodiment because the finish cleaning can be most efficiently performed in terms of cost.
【００５６】＜有害物質分解手段＞前述した第一番目の
実施の形態では、有害物質処理システムにおいて、水熱
分解手段によりＰＣＢ等の有害物質を分解処理したが、
他の実施の形態としては、例えば、高圧ポンプにより臨
界圧力以上に水を加圧し、この中にＰＣＢを含む有機物
や洗浄廃液を投入し、酸化剤によってＰＣＢ等の有害物
質を酸化分解する超臨界水酸化手段を使用することが可
能である。このような超臨界水酸化手段においては、極
めて短時間で高い反応効率が得られると共に、水熱分解
法と同様に、ダイオキシン類等の有害物質を発生させな
いという利点がある。<Hazardous Substance Decomposing Means> In the first embodiment described above, in the harmful substance treating system, the hydrothermal decomposing means decomposes harmful substances such as PCB.
In another embodiment, for example, water is pressurized to a pressure higher than the critical pressure by a high-pressure pump, an organic substance containing PCB or a cleaning waste liquid is charged therein, and a supercritical substance that oxidizes and decomposes harmful substances such as PCB by an oxidizing agent is used. It is possible to use hydroxylation means. Such a supercritical water oxidation means has an advantage that a high reaction efficiency can be obtained in an extremely short time and, like the hydrothermal decomposition method, no harmful substances such as dioxins are generated.
【００５７】＜被処理物＞前述した第一番目の実施の形
態では、ＰＣＢの付着したトランスやコンデンサの容器
等の無機物の部材の被処理物１を洗浄処理する場合につ
いて説明したが、他の実施の形態として、例えば、有害
物質である廃棄塗料や廃棄燃料や有害薬品等を保存して
いる保存容器、火薬・爆薬類が充填された爆弾等が挙げ
られる。しかしながら、本発明は、これらに限定される
ことはなく、各種の有害物質のような汚染物が付着して
いる被処理物であれば、前述した第一番目の実施の形態
の場合と同様にして洗浄することができる。<Subject to be Treated> In the above-described first embodiment, the case where the subject 1 to be treated, which is an inorganic member such as a transformer or capacitor container to which a PCB is adhered, has been described. Examples of the embodiment include a storage container for storing waste paint, waste fuel, harmful chemicals, and the like, which are harmful substances, and a bomb filled with explosives and explosives. However, the present invention is not limited to these, as long as it is an object to be treated to which contaminants such as various harmful substances are attached, the same as in the case of the first embodiment described above. Can be washed.
【００５８】＜汚染物＞また、本発明で処理可能な汚染
物としては、上記ＰＣＢ以外に、例えば、廃棄塗料、廃
棄燃料、有害薬品、未処理爆薬類等のような有害物質が
挙げられる。しかしながら、本発明は、これらに限定さ
れることはなく、環境汚染に起因する環境ホルモン等の
有害物質のような汚染物であれば、前述した第一番目の
実施の形態の場合と同様にして処理することができる。<Pollutants> In addition to the above-mentioned PCBs, examples of pollutants that can be treated in the present invention include harmful substances such as waste paint, waste fuel, harmful chemicals, and untreated explosives. However, the present invention is not limited to these, and if it is a pollutant such as a harmful substance such as an endocrine disrupter caused by environmental pollution, in the same manner as in the case of the first embodiment described above. Can be processed.
【００５９】[0059]
【発明の効果】第一番目の発明による洗浄液の再利用方
法は、汚染物の付着した被処理物を本洗浄する本洗浄工
程で使用した洗浄液と、前記本洗浄工程で洗浄された前
記被処理物を仕上洗浄する仕上洗浄工程で使用した洗浄
液とを蒸留精製して再利用する洗浄液の再利用方法であ
って、前記本洗浄工程で使用した前記洗浄液と前記仕上
洗浄工程で使用した前記洗浄液とをそれぞれ別個に蒸留
精製し、上記本洗浄工程で使用されて蒸留精製された上
記洗浄液を当該本洗浄工程で再利用する一方、上記仕上
洗浄工程で使用されて蒸留精製された上記洗浄液を当該
仕上洗浄工程で再利用するようにしたことから、すべて
の洗浄液の再利用を図りながらも、汚染物がほとんど除
去された洗浄液を容易に得ることができるので、段数の
比較的少ない簡単な構造の蒸留設備で洗浄液の再生処理
を済ますことができ、洗浄液の再利用にかかるコストを
大幅に削減することができる。According to the first aspect of the present invention, there is provided a method for reusing a cleaning liquid, including a cleaning liquid used in a main cleaning step for main cleaning an object to be treated having contaminants, and the above-mentioned target cleaning object cleaned in the main cleaning step. A method for reusing a cleaning liquid by distilling and refining a cleaning liquid used in a final cleaning process for finish cleaning an object, the cleaning liquid used in the main cleaning process and the cleaning liquid used in the final cleaning process, Are purified separately by distillation, and the cleaning solution used in the main cleaning step and purified by distillation is reused in the main cleaning step, while the cleaning solution used in the finish cleaning step and purified by distillation is used in the final cleaning step. Since the cleaning solution is reused in the cleaning process, it is possible to easily reuse the cleaning solution from which most of the contaminants have been removed, while still trying to reuse all the cleaning solution. Can be dispensed regeneration process of the cleaning liquid in distillation equipment structure, it is possible to greatly reduce the cost of recycling of the cleaning liquid.
【００６０】第二番目の発明による洗浄液の再利用方法
は、第一番目の発明において、前記本洗浄工程の前記洗
浄液の不足分を、前記仕上洗浄工程で使用されて蒸留精
製した前記洗浄液の残留分で補うようにしたので、洗浄
液をさらに有効に再利用することができる。The method of reusing the cleaning liquid according to the second aspect of the present invention is the method of reusing the cleaning liquid according to the first aspect, wherein the insufficient amount of the cleaning liquid in the main cleaning step is used in the finish cleaning step and remains after the distillation purification. Since it is made up for by the minute, the cleaning liquid can be reused more effectively.
【００６１】第三番目の発明による洗浄液の再利用方法
は、第一番目または第二番目の発明において、前記仕上
洗浄工程の前記洗浄液の不足分を、新規の洗浄液で補う
ようにしたので、新規の洗浄液を最も効率よく利用する
ことができる。The method of reusing the cleaning solution according to the third aspect of the invention is the method of reusing the cleaning solution according to the first or second aspect of the invention, in which the shortage of the cleaning solution in the finish cleaning step is supplemented with a new cleaning solution. The cleaning liquid can be used most efficiently.
【００６２】第四番目の発明による洗浄液の再利用方法
は、第一番目から第三番目の発明のいずれかにおいて、
前記汚染物が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品
のうちの少なくとも一種であるので、上述した効果が最
も有効に発現するようになる。A method of reusing a cleaning liquid according to a fourth aspect of the invention is the method according to any one of the first to third aspects of the invention.
Since the contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals, the above-mentioned effects are most effectively exhibited.
【００６３】第五番目の発明による洗浄液の再利用方法
は、第一番目から第三番目の発明のいずれかにおいて、
前記被処理物が、ＰＣＢを含有したトランスまたはコン
デンサを構成する部材であるので、上述した効果が最も
有効に発現するようになる。A method of reusing a cleaning liquid according to a fifth aspect of the invention is the method according to any one of the first to third aspects of the invention.
Since the object to be processed is a member that constitutes a transformer or a capacitor containing PCB, the above-mentioned effects are most effectively exhibited.
【００６４】第六番目の発明による洗浄装置は、内部に
洗浄液を貯溜し、汚染物の付着した被処理物を本洗浄す
る本洗浄槽と、内部に洗浄液を貯溜し、前記本洗浄槽で
本洗浄された前記被処理物を仕上洗浄する仕上洗浄槽
と、前記本洗浄槽で使用された前記洗浄液を蒸留精製す
る本洗浄用蒸留精製手段と、前記仕上洗浄槽で使用され
た前記洗浄液を蒸留精製する仕上洗浄用蒸留精製手段
と、前記本洗浄用蒸留精製手段で蒸留精製された前記洗
浄液を前記本洗浄槽に戻す本洗浄用洗浄液送給手段と、
前記仕上洗浄用蒸留精製手段で蒸留精製された前記洗浄
液を前記仕上洗浄槽に戻す仕上洗浄用洗浄液送給手段と
を備えたことから、すべての洗浄液の再利用を図りなが
らも、汚染物がほとんど除去された洗浄液を容易に得る
ことができるので、段数の比較的少ない簡単な構造の蒸
留設備で洗浄液の再生処理を済ますことができ、洗浄液
の再利用にかかるコストを大幅に削減することができ
る。The cleaning apparatus according to the sixth aspect of the invention comprises a main cleaning tank for storing the cleaning liquid therein, and a main cleaning tank for carrying out a main cleaning of an object to be treated with contaminants, and a cleaning liquid for storing the cleaning liquid inside the main cleaning tank. A finish cleaning tank for finishing cleaning the washed object, a distillation purification means for main cleaning for distilling and refining the cleaning liquid used in the main cleaning tank, and a distillation for the cleaning liquid used in the finish cleaning tank. A final cleaning distilling and refining means for purifying, and a main cleaning cleaning liquid feeding means for returning the cleaning liquid distilled and purified by the main cleaning distilling and refining means to the main cleaning tank,
Since the cleaning liquid for finishing cleaning, which returns the cleaning liquid distilled and purified by the distillation / purification device for finishing cleaning to the finishing cleaning tank, is provided, almost all the cleaning liquid is reused, but most of the contaminants are not polluted. Since the removed cleaning liquid can be easily obtained, the cleaning liquid can be regenerated by a distillation facility with a simple structure having a relatively small number of stages, and the cost for reusing the cleaning liquid can be significantly reduced. .
【００６５】第七番目の発明による洗浄装置は、第六番
目の発明において、前記仕上洗浄用蒸留精製手段で生成
した前記洗浄液の残留分を前記本洗浄用蒸留手段および
前記本洗浄槽の少なくとも一方に送給する本洗浄用洗浄
液補充手段を備えたことから、洗浄液をさらに有効に再
利用することができる。A cleaning apparatus according to a seventh aspect of the invention is the cleaning apparatus according to the sixth aspect, wherein the residual amount of the cleaning liquid produced by the distillation / purification means for finish cleaning is at least one of the distillation means for main cleaning and the main cleaning tank. Since the cleaning liquid replenishing means for the main cleaning that is supplied to the main cleaning device is provided, the cleaning liquid can be reused more effectively.
【００６６】第八番目の発明による洗浄装置は、第六番
目または第七番目の発明において、前記仕上洗浄槽内に
新規の洗浄液を補充する仕上洗浄用洗浄液補充手段を備
えたことから、新規の洗浄液を最も効率よく利用するこ
とができる。The eighth aspect of the cleaning apparatus according to the sixth or seventh aspect of the invention is that it is provided with a cleaning liquid replenishing means for finishing cleaning which replenishes a new cleaning liquid in the finishing cleaning tank. The cleaning liquid can be used most efficiently.
【００６７】第九番目の発明による洗浄装置は、第六番
目から第八番目の発明のいずれかにおいて、前記汚染物
が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品のうちの少
なくとも一種であるので、上述した効果が最も有効に発
現するようになる。The cleaning apparatus according to the ninth invention is the cleaning apparatus according to any one of the sixth to eighth inventions, in which the contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals. The above-mentioned effects are most effectively exhibited.
【００６８】第十番目の発明による洗浄装置は、第六番
目から第八番目の発明のいずれかにおいて、前記被処理
物が、ＰＣＢを含有したトランスまたはコンデンサを構
成する部材であるので、上述した効果が最も有効に発現
するようになる。The cleaning apparatus according to the tenth aspect of the present invention is the cleaning apparatus according to any one of the sixth to eighth aspects, wherein the object to be treated is a member that constitutes a transformer or capacitor containing PCB. The effects are most effectively expressed.
【図１】本発明による洗浄装置の第一番目の実施の形態
の概略構成図である。FIG. 1 is a schematic configuration diagram of a first embodiment of a cleaning device according to the present invention.
【図２】本発明による洗浄装置を利用した有害物質処理
システムの第一番目の実施の形態の全体構成図である。FIG. 2 is an overall configuration diagram of a first embodiment of a harmful substance treatment system using a cleaning device according to the present invention.
【図３】従来の洗浄装置の一例の概略構成図である。FIG. 3 is a schematic configuration diagram of an example of a conventional cleaning device.
１ 被処理物 １０ 洗浄装置 １１ 第一の本洗浄槽 １２ 第二の本洗浄槽 １３ 仕上洗浄槽 １４ 洗浄液供給源 １５〜２０ 供給ポンプ ２１ 本洗浄用蒸留器 ２２ 冷却器 ２３ 仕上洗浄用蒸留器 ２４ 冷却器 ２５ 回収タンク １００ 洗浄液 1001 被処理物 1002 有害物質（例えばＰＣＢ) 1003 容器 1004 分離手段 1005 解体手段 1006 前処理手段 1007 有機物 1008 無機物 1009 分離手段 1010 洗浄液 1011 洗浄手段 1012 洗浄廃液 1013 有害物質分解処理手段 1014 スラリー 1015 スラリー化手段 1 Object to be processed 10 Cleaning device 11 First main cleaning tank 12 Second main cleaning tank 13 Finishing cleaning tank 14 Cleaning liquid supply source 15-20 supply pump 21 Distiller for main cleaning 22 Cooler 23 Distiller for finish cleaning 24 Cooler 25 recovery tank 100 cleaning solution 1001 object 1002 Hazardous substances (eg PCB) 1003 containers 1004 Separation means 1005 Dismantling method 1006 Pretreatment means 1007 organic matter 1008 inorganic 1009 Separation means 1010 cleaning solution 1011 Cleaning means 1012 Wash waste liquid 1013 Hazardous substance decomposition processing means 1014 slurry 1015 Slurrying means
───────────────────────────────────────────────────── フロントページの続き (72)発明者 開 昭夫 長崎県長崎市深堀町５丁目717番１号 三 菱重工業株式会社長崎研究所内 Ｆターム(参考） 3B201 AA46 AB01 BB02 BB92 CB11 CD22 4D004 AA21 AB05 AB06 CA40 CA50 CC04 4D076 AA12 AA13 AA22 BB03 CB06 FA02 FA11 HA05 JA01 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Akio Kai 3-51-1717 Fukahori-cho, Nagasaki-shi, Nagasaki Hishi Heavy Industries Ltd. Nagasaki Research Center F term (reference) 3B201 AA46 AB01 BB02 BB92 CB11 CD22 4D004 AA21 AB05 AB06 CA40 CA50 CC04 4D076 AA12 AA13 AA22 BB03 CB06 FA02 FA11 HA05 JA01
Claims (10)
本洗浄工程で使用した洗浄液と、前記本洗浄工程で洗浄
された前記被処理物を仕上洗浄する仕上洗浄工程で使用
した洗浄液とを蒸留精製して再利用する洗浄液の再利用
方法であって、 前記本洗浄工程で使用した前記洗浄液と前記仕上洗浄工
程で使用した前記洗浄液とをそれぞれ別個に蒸留精製
し、上記本洗浄工程で使用されて蒸留精製された上記洗
浄液を当該本洗浄工程で再利用する一方、上記仕上洗浄
工程で使用されて蒸留精製された上記洗浄液を当該仕上
洗浄工程で再利用するようにしたことを特徴とする洗浄
液の再利用方法。1. A cleaning liquid used in a main cleaning step for main cleaning of an object to be treated with contaminants attached thereto, and a cleaning solution used in a final cleaning step for final cleaning of the object to be treated cleaned in the main cleaning step. A method of reusing a cleaning liquid by distilling and purifying the same, wherein the cleaning liquid used in the main cleaning step and the cleaning liquid used in the finish cleaning step are separately purified by distillation, and in the main cleaning step, The cleaning liquid used by distillation purification is reused in the main cleaning step, while the cleaning liquid used in the finish cleaning step and purified by distillation is reused in the finishing cleaning step. How to reuse the cleaning solution.
工程で使用されて蒸留精製した前記洗浄液の残留分で補
うようにしたことを特徴とする洗浄液の再利用方法。2. The cleaning liquid according to claim 1, wherein a shortage of the cleaning liquid in the main cleaning process is supplemented with a residual amount of the cleaning liquid used in the finishing cleaning process and purified by distillation. How to reuse.
液で補うようにしたことを特徴とする洗浄液の再利用方
法。3. The method for reusing a cleaning liquid according to claim 1, wherein a shortage of the cleaning liquid in the finish cleaning step is supplemented with a new cleaning liquid.
て、 前記汚染物が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品
のうちの少なくとも一種であることを特徴とする洗浄液
の再利用方法。4. The method for reusing a cleaning liquid according to claim 1, wherein the contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals.
て、 前記被処理物が、ＰＣＢを含有したトランスまたはコン
デンサを構成する部材であることを特徴とする洗浄液の
再利用方法。5. The method of reusing a cleaning liquid according to claim 1, wherein the object to be processed is a member that constitutes a transformer or a capacitor containing PCB.
た被処理物を本洗浄する本洗浄槽と、 内部に洗浄液を貯溜し、前記本洗浄槽で本洗浄された前
記被処理物を仕上洗浄する仕上洗浄槽と、 前記本洗浄槽で使用された前記洗浄液を蒸留精製する本
洗浄用蒸留精製手段と、 前記仕上洗浄槽で使用された前記洗浄液を蒸留精製する
仕上洗浄用蒸留精製手段と、 前記本洗浄用蒸留精製手段で蒸留精製された前記洗浄液
を前記本洗浄槽に戻す本洗浄用洗浄液送給手段と、 前記仕上洗浄用蒸留精製手段で蒸留精製された前記洗浄
液を前記仕上洗浄槽に戻す仕上洗浄用洗浄液送給手段と
を備えたことを特徴とする洗浄装置。6. A main cleaning tank in which a cleaning liquid is stored and main cleaning is performed on an object to be processed with contaminants, and a cleaning liquid is stored inside the main cleaning tank to perform main cleaning in the main cleaning tank. A finish cleaning tank for finish cleaning, a distillation / purification means for main cleaning for distilling and purifying the cleaning liquid used in the main cleaning tank, and a distillation / purification means for finishing cleaning for distilling and purifying the cleaning liquid used in the finish cleaning tank. And a cleaning liquid feed means for main cleaning for returning the cleaning liquid distilled and purified by the main cleaning distillation purification means to the main cleaning tank, and the cleaning liquid distilled and purified by the final cleaning distillation purification means for the final cleaning. A cleaning device comprising: a cleaning liquid feeding means for finishing cleaning, which is returned to the tank.
留分を前記本洗浄用蒸留手段および前記本洗浄槽の少な
くとも一方に送給する本洗浄用洗浄液補充手段を備えた
ことを特徴とする洗浄装置。7. The cleaning solution replenishing means for main cleaning according to claim 6, wherein the residual content of the cleaning solution generated by the distillation / purifying means for finish cleaning is sent to at least one of the distillation means for main cleaning and the main cleaning tank. A cleaning device comprising:
洗浄液補充手段を備えたことを特徴とする洗浄装置。8. The cleaning apparatus according to claim 6, further comprising a cleaning liquid replenishing means for finishing cleaning, which replenishes a new cleaning liquid in the finishing cleaning tank.
て、 前記汚染物が、ＰＣＢ、廃棄塗料、廃棄燃料、有害薬品
のうちの少なくとも一種であることを特徴とする洗浄装
置。9. The cleaning device according to claim 6, wherein the contaminant is at least one of PCB, waste paint, waste fuel, and harmful chemicals.
いて、 前記被処理物が、ＰＣＢを含有したトランスまたはコン
デンサを構成する部材であることを特徴とする洗浄装
置。10. The cleaning apparatus according to claim 6, wherein the object to be processed is a member that constitutes a transformer or a capacitor containing PCB.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001198561A JP2003010798A (en) | 2001-06-29 | 2001-06-29 | Method for reusing cleaning liquid and cleaning apparatus using the method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001198561A JP2003010798A (en) | 2001-06-29 | 2001-06-29 | Method for reusing cleaning liquid and cleaning apparatus using the method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003010798A true JP2003010798A (en) | 2003-01-14 |
Family
ID=19035991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001198561A Pending JP2003010798A (en) | 2001-06-29 | 2001-06-29 | Method for reusing cleaning liquid and cleaning apparatus using the method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003010798A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012187441A (en) * | 2011-03-08 | 2012-10-04 | Kobelco Eco-Solutions Co Ltd | Method for rendering distillation column harmless |
| JP2012187442A (en) * | 2011-03-08 | 2012-10-04 | Kobelco Eco-Solutions Co Ltd | Method for demolishing facility for rendering pcb-contaminated equipment harmless |
| JP7197761B2 (en) | 2018-05-16 | 2022-12-28 | キヤノンマーケティングジャパン株式会社 | CLEANING APPARATUS AND CONTROL METHOD THEREOF AND CLEANING SYSTEM AND CONTROL METHOD THEREOF |
-
2001
- 2001-06-29 JP JP2001198561A patent/JP2003010798A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012187441A (en) * | 2011-03-08 | 2012-10-04 | Kobelco Eco-Solutions Co Ltd | Method for rendering distillation column harmless |
| JP2012187442A (en) * | 2011-03-08 | 2012-10-04 | Kobelco Eco-Solutions Co Ltd | Method for demolishing facility for rendering pcb-contaminated equipment harmless |
| JP7197761B2 (en) | 2018-05-16 | 2022-12-28 | キヤノンマーケティングジャパン株式会社 | CLEANING APPARATUS AND CONTROL METHOD THEREOF AND CLEANING SYSTEM AND CONTROL METHOD THEREOF |
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