JP2003080264A - Liquid treatment method and equipment for the same - Google Patents

Liquid treatment method and equipment for the same

Info

Publication number
JP2003080264A
JP2003080264A JP2001272202A JP2001272202A JP2003080264A JP 2003080264 A JP2003080264 A JP 2003080264A JP 2001272202 A JP2001272202 A JP 2001272202A JP 2001272202 A JP2001272202 A JP 2001272202A JP 2003080264 A JP2003080264 A JP 2003080264A
Authority
JP
Japan
Prior art keywords
liquid
electrodes
gas
treated
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001272202A
Other languages
Japanese (ja)
Inventor
Shigeto Adachi
成人 足立
Junji Haga
潤二 芳賀
Masahiko Miura
雅彦 三浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP2001272202A priority Critical patent/JP2003080264A/en
Publication of JP2003080264A publication Critical patent/JP2003080264A/en
Withdrawn legal-status Critical Current

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  • Water Treatment By Electricity Or Magnetism (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Physical Water Treatments (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a liquid treatment method capable of obtaining a stable electric discharge state over the entire part between electrodes in improving the quality of a liquid existing between the electrodes by supplying impulsive electric power to the electrode pair and equipment capable of realizing this method. SOLUTION: In the liquid treatment method for improving the quality of the liquid successively supplied between the electrodes by disposing at least one set of the electrode pair and forming the electric discharge state between the electrodes by applying the high-voltage pulses to the electrode pair, gas and/or solid from the liquid on the upstream side of an electric discharge state forming region are removed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、(1)下水処理場
や屎尿処理場における下水処理過程、或は食品工場や化
学工場の排水処理過程等から排出される有機性廃液の生
物学的な好気性処理または嫌気性処理、(2)前記各工
場の廃液(ただし有機性以外をも含む)、清浄な純水を
製造する過程における被処理水、上下水道水、食品、飲
料水等の滅菌・殺菌処理、脱色処理、脱臭処理、或は
(3)前記の各種液体の滅菌・殺菌処理、脱色処理、脱
臭処理の際やゴミ焼却炉の浸出水の浸出の際等に現出さ
れるダイオキシン、環境ホルモン、PCB等の難分解性物
質の分解処理等に適用される液体の処理方法、およびこ
の様な処理方法を実施する為に用いられる装置に関する
ものである。
TECHNICAL FIELD The present invention relates to (1) biological treatment of organic waste liquid discharged from a sewage treatment process in a sewage treatment plant or a human waste treatment plant, or a wastewater treatment process of a food factory or a chemical factory. Aerobic treatment or anaerobic treatment, (2) sterilization of treated water in the process of producing waste water (including organic substances other than the above) of each plant, clean pure water, tap water, food, drinking water, etc.・ Sterilization treatment, decolorization treatment, deodorization treatment, or (3) Dioxins that appear during sterilization / sterilization treatment, decolorization treatment, deodorization treatment of the above-mentioned various liquids, or when leaching water from leach incinerator. The present invention relates to a method for treating a liquid which is applied to a decomposition treatment of a hardly decomposable substance such as an endocrine disrupter or PCB, and an apparatus used for carrying out such a treatment method.

【0002】[0002]

【従来の技術】上記(1)〜(3)に示した各種用途にお
いて、水の再利用や微量汚染物質の除去等の方法として
は、従来から活性炭処理、オゾン処理、膜処理等による
各種方法が知られており、実用化が進められている。し
かしながら、活性炭処理では、有機系汚濁物質の吸着除
去は可能であるが、殺菌効果がなく、また活性炭を頻繁
に交換する必要がある。また、オゾン処理では、脱色、
脱臭、殺菌効果の面で優れてはいるが、オゾンの残留に
よる二次処理の問題がある。更に、膜処理では、汚染物
質等の除去という観点からは水処理には優れているもの
の維持管理が煩雑でコストも高く、しかも廃棄物が発生
するという問題がある。
2. Description of the Related Art In the various uses shown in (1) to (3) above, various methods such as activated carbon treatment, ozone treatment, and membrane treatment have hitherto been used as methods for reusing water and removing trace contaminants. Is known and is being put to practical use. However, the activated carbon treatment can adsorb and remove organic pollutants, but has no bactericidal effect and requires frequent replacement of the activated carbon. In ozone treatment, decolorization,
Although it is excellent in deodorizing and sterilizing effects, it has a problem of secondary treatment due to residual ozone. Further, in the membrane treatment, although water treatment is excellent from the viewpoint of removing contaminants and the like, there are problems that maintenance is complicated and the cost is high, and waste is generated.

【0003】本発明者らは上記の様な水処理技術の改良
についてかねてより研究を進めており、その一環として
特開平11−253999号のような技術を提案している。この
技術は、例えば液体中に含有される有害な細菌類を死滅
させて該液体を清浄化する方法として、或は液体(被処
理液)中に含有される細菌やその死骸等からなる汚損成
分を減容化する為にその汚損成分を好気的微生物が生化
学的に処理しやすい状態に改質する方法として、前記液
体に高電圧パルス放電処理および/または電界パルス印
加を行って液体を処理するものである。これを図面を用
いて説明する。
The present inventors have been researching the improvement of the above-mentioned water treatment technology for some time, and have proposed a technology such as JP-A No. 11-253999 as part of the research. This technique is, for example, as a method of killing harmful bacteria contained in a liquid to purify the liquid, or a fouling component composed of bacteria contained in the liquid (processing liquid) or dead bodies thereof. As a method of modifying the fouling component into a state in which aerobic microorganisms can be easily biochemically treated to reduce the volume of the liquid, the liquid is subjected to high-voltage pulse discharge treatment and / or electric field pulse application to remove the liquid. It is something to process. This will be described with reference to the drawings.

【0004】図1は、前記液体に高電圧パルス放電およ
び/または電界パルス印加を施す改質装置18を示してお
り、改質槽3と電源4を備えている(図中の矢印A,Bは
汚損物質の流れを示している)。該電源4に接続された
棒状電極(+極)5と平板電極(−極)6が、改質槽3内
の汚損物質(汚泥)に浸漬する様にして平行に配設され
ている。改質槽3内の汚泥は、電気的にはある所定の誘
電率を示す誘電体とみなすことができ、上記電極5,6間
に誘電体が満たされた状態で電圧を加えて電極5,6に夫
々正負の電荷を搬送すると、上記誘電体(汚泥)には電
界が形成され、この電界の強さがある程度以上となった
ときに絶縁破壊を生じ、電極5,6間に放電が発生する。
この様な構成を採用することによって、汚泥を可溶化,
低分子化(改質)することが可能になった。
FIG. 1 shows a reforming device 18 for applying high-voltage pulse discharge and / or electric field pulse to the liquid, which comprises a reforming tank 3 and a power source 4 (arrows A and B in the figure). Indicates the flow of pollutants). A rod-shaped electrode (+ electrode) 5 and a flat plate electrode (-electrode) 6 connected to the power source 4 are arranged in parallel so as to be immersed in the fouling substance (sludge) in the reforming tank 3. The sludge in the reforming tank 3 can be electrically regarded as a dielectric having a certain dielectric constant, and a voltage is applied to the electrodes 5, 6 while the dielectric is filled between the electrodes 5, 6. When positive and negative charges are respectively transferred to 6, an electric field is formed in the dielectric (sludge), and when the strength of this electric field exceeds a certain level, dielectric breakdown occurs and discharge occurs between electrodes 5 and 6. To do.
By adopting such a configuration, sludge can be solubilized,
It has become possible to lower the molecular weight (modify).

【0005】[0005]

【発明が解決しようとする課題】また、本発明者らは、
各種液体に放電を施し改質する液体処理装置についても
開発しており、その技術的意義が認められたので先に出
願している(特願2000-186493号)。これを図面を用い
て説明する。
The present inventors have also found that
We have also developed a liquid treatment device that discharges and modifies various liquids, and since its technical significance was recognized, we have filed a patent application (Japanese Patent Application No. 2000-186493). This will be described with reference to the drawings.

【0006】図2は、上述した改質槽3における電極の配
置状態および放電状態の一例を示す概略説明図であり、
図中3は改質槽、25は棒状電極、26はリング状電極、27
は高電圧パルス電源、23は被処理液、24は放電を夫々示
す。図2に示した構成では、棒状電極25とリング状電極2
6を同芯上に配置し、棒状電極25とリング状電極26の間
に急峻な立ち上がりのパルス電圧を高電圧パルス電源27
から印加しているので、棒状電極25の先端部からリング
状電極26に向けて全方向的な放電が発生する。よって、
この放電24は面状の立体的な放電となるので、被処理液
23に対して広範囲に放電24を作用させることができる様
になった。
FIG. 2 is a schematic explanatory view showing an example of an arrangement state of electrodes and a discharge state in the reforming tank 3 described above,
In the figure, 3 is a reforming tank, 25 is a rod-shaped electrode, 26 is a ring-shaped electrode, 27
Is a high voltage pulse power supply, 23 is a liquid to be treated, and 24 is a discharge. In the configuration shown in FIG. 2, the rod-shaped electrode 25 and the ring-shaped electrode 2
6 are arranged concentrically, and a pulse voltage with a steep rising is applied between the rod-shaped electrode 25 and the ring-shaped electrode 26 by the high-voltage pulse power supply 27.
Since the voltage is applied from above, an omnidirectional discharge is generated from the tip of the rod-shaped electrode 25 toward the ring-shaped electrode 26. Therefore,
Since this discharge 24 becomes a planar three-dimensional discharge, the liquid to be treated is
It has become possible to apply the discharge 24 to 23 over a wide range.

【0007】しかしながら、上記の様な構成によっても
若干の解決すべき問題があった。すなわち、上記構成で
は電極間における放電状態が不均一になる場合があり、
電極間でも放電が発生している部分と放電が発生してい
ない部分が生じていた。そして、これに伴って汚損成分
の処理効率が低下する場合があった。
However, even with the above-mentioned structure, there are some problems to be solved. That is, in the above configuration, the discharge state between the electrodes may be non-uniform,
Even between the electrodes, there were portions where discharge was generated and portions where discharge was not generated. Then, along with this, there are cases in which the processing efficiency of the stain component decreases.

【0008】本発明は、この様な状況に鑑みてなされた
ものであって、その目的は、電極対にパルス状の電力を
供給して電極間に存在する液体を改質するに際し、安定
した放電状態を電極間全体に渡って得ることができる液
体処理方法およびこの方法を実現できる装置を提供する
ことにある。
The present invention has been made in view of such a situation, and an object thereof is to stabilize when a pulsed electric power is supplied to an electrode pair to reform a liquid existing between the electrodes. It is an object of the present invention to provide a liquid treatment method capable of obtaining a discharge state across electrodes and an apparatus capable of realizing this method.

【0009】[0009]

【課題を解決するための手段】上記課題を解決すること
のできた本発明に係る液体処方法とは、少なくとも一組
の電極対を設けると共に、該電極対に高電圧パルスを印
加して電極間に放電状態を形成させることによって、電
極間に順次供給される液体を改質する液体処理方法にお
いて、放電状態形成領域の上流側で液体から気体および
/または固体を取り除く点に要旨を有する。
The liquid treatment method according to the present invention, which has been able to solve the above-mentioned problems, is to provide at least one pair of electrodes and apply a high voltage pulse to the pair of electrodes to apply a high voltage pulse between the electrodes. In the liquid treatment method for reforming the liquid sequentially supplied between the electrodes by forming the discharge state in the electrode, the point is to remove gas and / or solid from the liquid on the upstream side of the discharge state forming region.

【0010】また、上記課題を解決することのできた本
発明に係る液体処理装置とは、少なくとも一組の電極対
を備えると共に、該電極対に高電圧パルスを印加して電
極間に放電状態を形成させることによって、電極間に順
次供給される液体を改質する様に構成した液体処理装置
において、放電状態形成領域の上流側に液体から気体お
よび/または固体を取り除く手段を備える点に要旨を有
する。この場合、前記気体および/または固体を取り除
く手段から気体および/または固体を抜き出す手段を備
えることが好ましい。
Further, the liquid processing apparatus according to the present invention which has been able to solve the above-mentioned problems is provided with at least one pair of electrodes, and a high voltage pulse is applied to the pair of electrodes to establish a discharge state between the electrodes. In the liquid processing device configured to reform the liquid sequentially supplied between the electrodes by forming the liquid, a means for removing gas and / or solid from the liquid is provided on the upstream side of the discharge state forming region. Have. In this case, it is preferable to provide means for extracting gas and / or solid from the means for removing gas and / or solid.

【0011】[0011]

【発明の実施の形態および実施例】本発明者らは、上記
課題を解決すべく、様々な角度から検討してきた。その
結果、放電状態が不安定になる原因は、放電が発生して
いる領域に粗大な気泡や固体が混入するからであること
を突き止めた。
BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have studied from various angles in order to solve the above problems. As a result, it was found that the reason why the discharge state becomes unstable is that coarse bubbles and solids are mixed in the region where the discharge is occurring.

【0012】すなわち、液体(被処理液)に気体(気
泡)が混在していると、該気泡が放電領域に入り、気泡
が存在している部分の電界強度が上がることになる。こ
れによって、図3(a)に示す様に放電が局所的に集中し
た状態が発生する。こうした状態が発生すると、被処理
液が電極間を通過したとしても、放電が実際に起こって
いない領域を被処理液が通る機会が増加してしまい、改
質されないまま系外へ排出される被処理液が増えること
になる。その結果、被処理液全体の処理効率が低下する
のである。また、被処理液内に混在している気体の大き
さは、一般に不均一であるので、これも電界強度を変動
させる要因の一つである。さらに、被処理液に混在して
いる気泡は、被処理液の流れに伴って互いに凝集して粗
大化する。この様に粗大化した気体が放電領域に入って
も、安定した放電を維持できないのである。
That is, when gas (bubbles) is mixed in the liquid (liquid to be treated), the bubbles enter the discharge region, and the electric field strength at the portion where the bubbles are present increases. As a result, a state in which the discharge is locally concentrated occurs as shown in FIG. When such a condition occurs, even if the liquid to be treated passes between the electrodes, the chances of the liquid to be treated passing through a region where no discharge actually occurs increases and the substance to be discharged outside the system without being reformed. The processing liquid will increase. As a result, the treatment efficiency of the entire liquid to be treated is lowered. In addition, the size of the gas mixed in the liquid to be treated is generally non-uniform, which is also one of the factors that change the electric field strength. Furthermore, the air bubbles mixed in the liquid to be treated are aggregated and coarsen with the flow of the liquid to be treated. Even if the gas thus coarsened enters the discharge region, stable discharge cannot be maintained.

【0013】一方、被処理液に固体が混在している場合
も同様であり、通常固体は水よりも比誘電率が低いの
で、この様な固体が放電発生領域に入ると、電界強度が
局所的に上昇し、該上昇した箇所で放電が集中して発生
する。これによって、放電領域における放電状態が不均
一となり、被処理液の処理効率が低下するのである。
On the other hand, the same is true when solids are mixed in the liquid to be treated, and since solids usually have a lower relative dielectric constant than water, when such solids enter the discharge generation region, the electric field strength is locally increased. As a result, the discharge is concentrated and is generated at the raised portion. As a result, the discharge state in the discharge region becomes non-uniform, and the treatment efficiency of the liquid to be treated decreases.

【0014】そこで、本発明に係る液体処理方法では、
高電圧パルスを適用して液体を改質するに際し、放電状
態形成領域の上流側で液体から気体および/または固体
を取り除く様に操業すれば、例えば図3(b)に示す様な
安定した放電を得ることができることを見出し本発明を
完成した。
Therefore, in the liquid processing method according to the present invention,
When reforming a liquid by applying a high voltage pulse, if operation is performed to remove gas and / or solids from the liquid on the upstream side of the discharge state forming region, stable discharge as shown in Fig. 3 (b) can be achieved. The present invention has been completed by finding that the above can be obtained.

【0015】以下、図面を用いて本発明の作用効果につ
いて説明するが、本発明はこれら図示例に限定される性
質のものではなく、前・後記の趣旨に徴して設計変更す
ることはいずれも本発明の技術的範囲に含まれるもので
ある。また、各図において共通する構成部分について
は、同一の符号を付すことによって重複説明を避ける。
Hereinafter, the operation and effect of the present invention will be described with reference to the drawings. However, the present invention is not limited to these illustrated examples, and any design changes can be made with the gist of the preceding and the following description. It is included in the technical scope of the present invention. In addition, the same reference numerals are given to the common components in the respective drawings to avoid redundant description.

【0016】図4は本発明に係る液体処理装置の一例を
示す概略説明図であり、この構成では前記図2に示した
改質槽3において、被処理液23の流れ方向(矢印方向)
の上流側に、被処理液(液体)から気体および固体を取
り除く手段1を備えたものである。つまり、図4では改質
槽3に接続した管路10を鉛直方向に対して横向きのS字
となる様に配置されている。従って、管路10内を被処理
液23が流れると、管路10の凸部(前記S字で鉛直上向き
に凸状になっている部分)で被処理液23に混在している
気体を回収でき、管路10の凹部(前記S字で鉛直下向き
に凸状になっている部分)で被処理液23からの固体を回
収することができる。これによって、前記管路10を通過
した被処理液23には、気体や固体が殆ど混在していない
ので、該被処理液が放電領域に入ったとしても、被処理
液に混在する気体や固体によって放電状態が阻害される
ことがない。よって、本発明では安定した放電状態を維
持することができるので、被処理液の処理効率を低下さ
せることはない。
FIG. 4 is a schematic explanatory view showing an example of the liquid processing apparatus according to the present invention. In this configuration, in the reforming tank 3 shown in FIG. 2, the flow direction of the liquid 23 to be processed (arrow direction).
A means (1) for removing gas and solids from the liquid to be treated (liquid) is provided on the upstream side of. That is, in FIG. 4, the pipe line 10 connected to the reforming tank 3 is arranged so as to have an S-shape that is lateral to the vertical direction. Therefore, when the liquid 23 to be treated flows in the pipe 10, the gas mixed in the liquid 23 to be treated is recovered at the convex portion of the pipe 10 (the portion of the S-shape that is vertically upwardly convex). Therefore, the solid from the liquid 23 to be treated can be collected in the concave portion of the conduit 10 (the portion of the S-shape that is convex vertically downward). As a result, the liquid to be treated 23 that has passed through the pipe line 10 contains almost no gas or solid, so that even if the liquid to be treated enters the discharge region, the gas or solids to be mixed in the liquid to be treated are mixed. Does not hinder the discharge state. Therefore, in the present invention, a stable discharge state can be maintained, so that the treatment efficiency of the liquid to be treated is not reduced.

【0017】また、本発明では、上記の様に被処理液か
ら回収された気体や固体を順次系外へ排出することが好
ましい。つまり、前記図4において管路10の凸部に気体
が多く溜まると、被処理液23の流れが悪くなったり、ト
ラップした気体が被処理液23の流れに沿って放電領域に
混入する場合がある。また、管路10の凹部に固体が多く
沈降すると、被処理液23の流れが悪くなったり、固体が
過剰に堆積すると固体の回収効率が低下する場合があ
る。そこで、本発明に係る液体処理装置では、被処理液
から気体や固体を取り除く手段から、該気体や固体を系
外へ排出するための抜き出し手段を備えることが推奨さ
れる。こうした構成を図面を用いて説明する。
Further, in the present invention, it is preferable that the gas or solid recovered from the liquid to be treated as described above is sequentially discharged out of the system. That is, when a large amount of gas is accumulated in the convex portion of the conduit 10 in FIG. 4, the flow of the liquid to be treated 23 may be deteriorated, or the trapped gas may be mixed in the discharge region along the flow of the liquid to be treated 23. is there. Further, if a large amount of solids settles in the recesses of the pipeline 10, the flow of the liquid to be treated 23 may become poor, or if solids are excessively deposited, the solid recovery efficiency may decrease. Therefore, in the liquid processing apparatus according to the present invention, it is recommended that the device for removing the gas or solid from the liquid to be processed be provided with the extracting device for discharging the gas or solid out of the system. Such a configuration will be described with reference to the drawings.

【0018】図5は本発明に係る液体処理装置の他の構
成例を示す概略説明図であり、この例では上記図4の構
成に加えて気体または固体の抜き出し手段を備えたもの
である。つまり、上記図4に示した管路10の凸部と凹部
の夫々端部に空間11および12を夫々設けている。そし
て、該空間の上部と下部に夫々スリットを設けて、複数
の板を介在させることによって前記空間を区切ってい
る。
FIG. 5 is a schematic explanatory view showing another structural example of the liquid processing apparatus according to the present invention. In this example, a gas or solid extracting means is provided in addition to the structure shown in FIG. That is, the spaces 11 and 12 are provided at the ends of the convex portion and the concave portion of the conduit 10 shown in FIG. 4, respectively. Then, slits are provided in the upper part and the lower part of the space, and the space is divided by interposing a plurality of plates.

【0019】この様に、管路10の凸部と凹部の端部に夫
々空間を設けることによって、被処理液から回収するこ
とのできる気体や固体の量を多くすることができる。そ
して、該空間を板で区切っているので、空間の上部と下
部の板を交互に動作させることによって、過剰な被処理
液を系外へ放出することなく空間内に溜まった気体や固
体を効率よく排出することができる。
By thus providing the spaces at the ends of the convex portion and the concave portion of the conduit 10, respectively, the amount of gas or solid that can be recovered from the liquid to be treated can be increased. Since the space is divided by plates, the upper and lower plates of the space are alternately operated to efficiently remove gas and solids accumulated in the space without releasing excess liquid to be treated from the system. Can be discharged well.

【0020】尚、ここではスリットと板を設けることに
よって、気体や固体を系外へ抜き出す構成を示したけれ
ども、これ以外の方法も勿論採用することができる。例
えば、スリットと板の代わりに回転式の三方弁などを設
けても良い。
Although a structure in which a gas and a solid are taken out of the system by providing a slit and a plate is shown here, other methods can of course be adopted. For example, a rotary three-way valve or the like may be provided instead of the slit and the plate.

【0021】また、図4や図5では管路10をS字に配置す
ることによって、被処理液23に混在する気体および固体
の両方を除去できる様にした構成例を示したけれども、
必要に応じて被処理液から気体または固体を選択的に除
去できるように構成することもできる。すなわち、固体
や気体のどちらか一方が予め除去されていたり、どちら
か一方が全く混在していない場合は、被処理液から除去
されていないものだけを回収すれば良いのである。こう
した構成を図面を用いて説明する。
Although FIG. 4 and FIG. 5 show the constitutional example in which both the gas and the solid mixed in the liquid 23 to be treated can be removed by arranging the pipe 10 in the S shape.
A gas or solid can be selectively removed from the liquid to be treated, if necessary. That is, when either one of the solid and the gas has been removed in advance, or when either one of them does not exist at all, it is sufficient to recover only the one that has not been removed from the liquid to be treated. Such a configuration will be described with reference to the drawings.

【0022】図6は被処理液から気体のみを取り除く様
に構成した本発明に係る液体処理装置の一構成例を示す
概略説明図であり、前記図2に示した改質槽3に接続され
た管路8の形状を、上方に向かって凸状となる様に(U
字状に)を配置している。これによって、被処理液23か
ら気体だけを効率良く除去することができる。
FIG. 6 is a schematic explanatory view showing one structural example of the liquid processing apparatus according to the present invention configured to remove only gas from the liquid to be processed, which is connected to the reforming tank 3 shown in FIG. The shape of the pipe line 8 that has become convex (U
Are arranged in a letter shape. As a result, only the gas can be efficiently removed from the liquid to be treated 23.

【0023】一方、被処理液23に混在している固体のみ
を集中的に除去するには、図7に示す様に、改質槽3に接
続されている管路9の形状を、下方に向かって凸状とな
る様に(U字となる様に)配置すれば良い。
On the other hand, in order to intensively remove only the solids mixed in the liquid to be treated 23, as shown in FIG. 7, the shape of the pipe 9 connected to the reforming tank 3 is changed downward. It may be arranged so as to form a convex shape (a U shape).

【0024】図8は本発明に係る液体処理装置の他の構
成例を示す概略説明図であり、図8では改質槽3に接続さ
れている管路13の形状は直線状(水平方向に延びた管
路)であり、該管路13に気体または固体をトラップする
ための空間11と12が夫々設けられている。この様に、管
路に気体または固体をトラップするための空間を設ける
ことによっても、本発明の効果を充分に得ることができ
る。
FIG. 8 is a schematic explanatory view showing another constitutional example of the liquid treatment apparatus according to the present invention. In FIG. 8, the pipe line 13 connected to the reforming tank 3 has a linear shape (horizontal direction). The pipe line 13 is provided with spaces 11 and 12 for trapping a gas or a solid, respectively. As described above, the effect of the present invention can be sufficiently obtained also by providing the space for trapping the gas or the solid in the pipeline.

【0025】尚、この場合でも、上述した様な空間にト
ラップされた気体や固体を系外へ排出する手段を設ける
ことが好ましい。また、図8では空間12の真上に空間11
を設けた例を示したけれども、空間11と12の位置はこれ
に限定されず、管路上同一場所になくともよい。すなわ
ち、空間12を設ける位置を空間11を設ける位置よりも相
対的に上流側に備える構成や、その逆の構成も本発明の
範囲である。
Even in this case, it is preferable to provide means for discharging the gas or solid trapped in the space as described above to the outside of the system. Further, in FIG. 8, the space 11 is directly above the space 12.
Although the example in which the space is provided is shown, the positions of the spaces 11 and 12 are not limited to this, and they do not have to be at the same place on the pipeline. That is, a configuration in which the position where the space 12 is provided is provided on the upstream side relative to the position where the space 11 is provided, and the reverse configuration are also within the scope of the present invention.

【0026】図9は本発明に係る液体処理装置の他の構
成例を示す概略説明図である。図9に示された構成で
は、水平に配置された管路13の天井部から潜り堰が、底
部から堰が夫々交互に二つずつ設けられている。これに
よって、被処理液が堰と潜り堰の間をくぐりながら流れ
るに連れて、被処理液から気体や固体が除去されるので
ある。
FIG. 9 is a schematic explanatory view showing another structural example of the liquid processing apparatus according to the present invention. In the configuration shown in FIG. 9, two submerged weirs are provided alternately from the ceiling portion of the horizontally arranged conduit 13 and two weirs are provided from the bottom portion. As a result, gas and solids are removed from the liquid to be treated as the liquid to be treated flows while passing between the weir and the submerged weir.

【0027】上記構成例では、被処理液23の流れ方向を
改質槽3の上方から下方となる場合を示したけれども、
これは本発明において被処理液23の流れ方向を限定する
性質のものではなく、改質槽の下方から上方へ被処理液
23を流す様に構成しても良い。
In the above configuration example, the case where the flow direction of the liquid to be treated 23 is from the upper side to the lower side of the reforming tank 3 is shown.
This does not limit the flow direction of the liquid to be treated 23 in the present invention.
It may be configured to flow 23.

【0028】また本発明は、改質処理する前の被処理液
(液体)から気体や固体を除去する点に特徴があり、改
質槽における電極対の電極形状は特に限定されず、例え
ば、平板電極やリング状電極、筒状電極、テープ状電
極、棒状電極、線状電極などどのような形状でも構わな
い。また、電極の断面形状も特に限定されず、円形のも
のであっても良いし、矩形であってもよい。
Further, the present invention is characterized in that gas or solid is removed from the liquid to be treated (liquid) before the reforming treatment, and the electrode shape of the electrode pair in the reforming tank is not particularly limited. Any shape such as a flat plate electrode, a ring-shaped electrode, a cylindrical electrode, a tape-shaped electrode, a rod-shaped electrode, or a linear electrode may be used. Moreover, the cross-sectional shape of the electrode is not particularly limited, and may be circular or rectangular.

【0029】本発明において、上記高電圧電源から供給
されるパルス状の電力とは、方形波に限らず、長方形
波、サイン波、三角波等を施しても良い。
In the present invention, the pulsed electric power supplied from the high-voltage power supply is not limited to a square wave, but may be a rectangular wave, a sine wave, a triangular wave, or the like.

【0030】[0030]

【発明の効果】上記のような構成を採用すると、放電領
域に気体や固体が混入することがないので、電極対にパ
ルス状の電力を供給して電極間に存在する液体を改質す
るに際し、安定した放電状態を電極間全体に渡って供給
することのできる液体処理方法およびこの方法を実現で
きる装置を提供することができた。
When the above-mentioned structure is adopted, gas or solid is not mixed in the discharge region, and therefore when pulsed power is supplied to the electrode pair to reform the liquid existing between the electrodes. Thus, it has been possible to provide a liquid treatment method capable of supplying a stable discharge state across the entire electrodes and an apparatus capable of realizing this method.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明者らが先に提案した液体改質装置の一
構成例を示す概略説明図である。
FIG. 1 is a schematic explanatory view showing a configuration example of a liquid reforming apparatus previously proposed by the present inventors.

【図2】 本発明者らが先に提案した液体改質装置の他
の構成例を示す概略説明図である。
FIG. 2 is a schematic explanatory view showing another configuration example of the liquid reforming apparatus previously proposed by the present inventors.

【図3】 電極間における放電の発生例を示す概略説明
図である。
FIG. 3 is a schematic explanatory diagram showing an example of occurrence of discharge between electrodes.

【図4】 本発明に係る液体処理装置の他の構成例を示
す概略説明図である。
FIG. 4 is a schematic explanatory diagram showing another configuration example of the liquid processing apparatus according to the present invention.

【図5】 本発明に係る液体処理装置の更に他の構成例
を示す概略説明図である。
FIG. 5 is a schematic explanatory diagram showing still another configuration example of the liquid processing apparatus according to the present invention.

【図6】 本発明に係る液体処理装置の他の構成例を示
す概略説明図である。
FIG. 6 is a schematic explanatory diagram showing another configuration example of the liquid processing apparatus according to the present invention.

【図7】 本発明に係る液体処理装置の他の構成例を示
す概略説明図である。
FIG. 7 is a schematic explanatory diagram showing another configuration example of the liquid processing apparatus according to the present invention.

【図8】 本発明に係る液体処理装置の他の構成例を示
す概略説明図である。
FIG. 8 is a schematic explanatory diagram showing another configuration example of the liquid processing apparatus according to the present invention.

【図9】 本発明に係る液体処理装置の他の構成例を示
す概略説明図である。
FIG. 9 is a schematic explanatory diagram showing another configuration example of the liquid processing apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

1 被処理液から気体および固体を取り除く手段 3 改質槽 4 電源 5 棒状電極 6 平板電極 8 管路(U字管) 9 管路(U字管) 11 空間 12 空間 13 管路 18 改質装置 23 被処理液 24 放電 25 棒状電極 26 リング状電極 27 高電圧パルス電源 1 Means for removing gas and solids from the liquid to be treated 3 reforming tank 4 power supply 5 Rod electrodes 6 Flat plate electrode 8 pipes (U-shaped pipe) 9 pipes (U-shaped pipe) 11 space 12 spaces 13 pipelines 18 reformer 23 Liquid to be treated 24 discharge 25 Rod electrode 26 ring electrode 27 High voltage pulse power supply

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C02F 1/20 C02F 1/20 A (72)発明者 三浦 雅彦 神戸市西区高塚台1丁目5番5号 株式会 社神戸製鋼所神戸総合技術研究所内 Fターム(参考) 4D011 AA05 AB07 AC05 AD03 4D037 AA02 AA11 AA13 AA15 AB18 BA23 CA04 CA06 4D061 DA08 DB19 DC09 EA15 EB01 EB07 EB19 EB20 EB33 EB39 FA03 FA20 GC14 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C02F 1/20 C02F 1/20 A (72) Inventor Masahiko Miura 1-5-5 Takatsukadai, Nishi-ku, Kobe City F-Term in Kobe Research Institute of Kobe Steel, Ltd. (reference) 4D011 AA05 AB07 AC05 AD03 4D037 AA02 AA11 AA13 AA15 AB18 BA23 CA04 CA06 4D061 DA08 DB19 DC09 EA15 EB01 EB07 EB19 EB20 EB33 EB39 FA03 FA20 GC14

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 少なくとも一組の電極対を設けると共
に、該電極対に高電圧パルスを印加して電極間に放電状
態を形成させることによって、電極間に順次供給される
液体を改質する液体処理方法において、 放電状態形成領域の上流側で液体から気体および/また
は固体を取り除くことを特徴とする液体処理方法。
1. A liquid for reforming a liquid sequentially supplied between electrodes by providing at least one pair of electrodes and applying a high voltage pulse to the electrode pairs to form a discharge state between the electrodes. In the treatment method, a gas and / or solid is removed from the liquid upstream of the discharge state forming region.
【請求項2】 少なくとも一組の電極対を備えると共
に、該電極対に高電圧パルスを印加して電極間に放電状
態を形成させることによって、電極間に順次供給される
液体を改質する様に構成した液体処理装置において、 放電状態形成領域の上流側に液体から気体および/また
は固体を取り除く手段を備えることを特徴とする液体処
理装置。
2. At least one pair of electrodes is provided, and a high voltage pulse is applied to the pair of electrodes to form a discharge state between the electrodes, thereby reforming the liquid sequentially supplied between the electrodes. The liquid processing apparatus configured as described above, further comprising a means for removing gas and / or solid from the liquid upstream of the discharge state forming region.
【請求項3】 前記気体および/または固体を取り除く
手段から気体および/または固体を抜き出す手段を備え
る請求項2に記載の液体処理装置。
3. The liquid processing apparatus according to claim 2, further comprising means for extracting gas and / or solid from the means for removing gas and / or solid.
JP2001272202A 2001-09-07 2001-09-07 Liquid treatment method and equipment for the same Withdrawn JP2003080264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001272202A JP2003080264A (en) 2001-09-07 2001-09-07 Liquid treatment method and equipment for the same

Publications (1)

Publication Number Publication Date
JP2003080264A true JP2003080264A (en) 2003-03-18

Family

ID=19097607

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008072096A (en) * 2006-08-15 2008-03-27 Tokyo Electron Ltd Buffer tank, intermediate accumulation apparatus, liquid treatment apparatus, and supplying method of treating liquid
JP2009255027A (en) * 2007-12-20 2009-11-05 Mitsubishi Electric Corp Sterilization method, sterilizer and air conditioner, hand drier and humidifier using the sterilizer
JP2010054164A (en) * 2008-08-29 2010-03-11 Mitsubishi Electric Corp Air conditioner and operation method of the air conditioner
JP2010058036A (en) * 2008-09-03 2010-03-18 Mitsubishi Electric Corp Water sterilizing device, and air conditioner, hand dryer, and humidifier using this water sterilizing device
CN101843991A (en) * 2010-06-01 2010-09-29 陈谟凑 Water treatment deposition filter

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008072096A (en) * 2006-08-15 2008-03-27 Tokyo Electron Ltd Buffer tank, intermediate accumulation apparatus, liquid treatment apparatus, and supplying method of treating liquid
JP2009255027A (en) * 2007-12-20 2009-11-05 Mitsubishi Electric Corp Sterilization method, sterilizer and air conditioner, hand drier and humidifier using the sterilizer
JP2010054164A (en) * 2008-08-29 2010-03-11 Mitsubishi Electric Corp Air conditioner and operation method of the air conditioner
JP2010058036A (en) * 2008-09-03 2010-03-18 Mitsubishi Electric Corp Water sterilizing device, and air conditioner, hand dryer, and humidifier using this water sterilizing device
CN101843991A (en) * 2010-06-01 2010-09-29 陈谟凑 Water treatment deposition filter

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