JP2003020379A - Insulation resin composition for electronic part, and adhesive sheet - Google Patents

Insulation resin composition for electronic part, and adhesive sheet

Info

Publication number
JP2003020379A
JP2003020379A JP2001210262A JP2001210262A JP2003020379A JP 2003020379 A JP2003020379 A JP 2003020379A JP 2001210262 A JP2001210262 A JP 2001210262A JP 2001210262 A JP2001210262 A JP 2001210262A JP 2003020379 A JP2003020379 A JP 2003020379A
Authority
JP
Japan
Prior art keywords
resin composition
core
electronic parts
insulating resin
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001210262A
Other languages
Japanese (ja)
Other versions
JP4771445B2 (en
Inventor
Toyofumi Asano
豊文 浅野
Naomi Mori
直美 森
Masahiro Imaizumi
雅裕 今泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP2001210262A priority Critical patent/JP4771445B2/en
Publication of JP2003020379A publication Critical patent/JP2003020379A/en
Application granted granted Critical
Publication of JP4771445B2 publication Critical patent/JP4771445B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a material which is excellent in adherence to a constituent base material for electronic parts, causes little deformation of an adhesive layer in thermal adhesion, is flexible before and after curing, and is excellent in handleability during processing. SOLUTION: This insulating resin composition for electronic parts is characterized in that it contains an epoxy resin (a), a curing agent (b) and a core-shell crosslinked rubber (c) having a mean particle diameter of 1 μm or smaller, wherein the content of the core-shell crosslinked rubber (c) is 60-95 wt.% based on the total resin content.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品の組み立
てに用いられる絶縁樹脂組成物に関する。
TECHNICAL FIELD The present invention relates to an insulating resin composition used for assembling electronic parts.

【0002】[0002]

【従来の技術】電子部品用絶縁樹脂組成物には、従来エ
ポキシ樹脂、硬化剤からなるエポキシ樹脂組成物が用い
られている。
2. Description of the Related Art As an insulating resin composition for electronic parts, an epoxy resin composition comprising an epoxy resin and a curing agent has been conventionally used.

【0003】[0003]

【発明が解決しようとする課題】近年チップ抵抗器、チ
ップコンデンサ、チップインダクタなどの電子部品の小
型化、軽量化に伴い、電子部品を構成する基材との接着
性に優れ、熱接着時に接着層の形状変形が小さく、なお
且つ硬化前後においてフレキシブル性があり、工程中取
り扱いに優れる材料が求められている。
With the recent miniaturization and weight reduction of electronic parts such as chip resistors, chip capacitors, and chip inductors, they have excellent adhesiveness to the base material that constitutes the electronic parts, and they adhere at the time of heat bonding. There is a demand for a material that is small in shape deformation of the layer, has flexibility before and after curing, and is excellent in handling during the process.

【0004】[0004]

【課題を解決するための手段】本発明者らは前記した課
題を解決すべく鋭意研究を重ねた結果、上記性能を同時
に満足させる電子部品用絶縁樹脂組成物が得られること
を見出し本発明を完成した。即ち、本発明は、(1)エ
ポキシ樹脂(a)、硬化剤(b)、並びに平均粒子径が
1μm以下のコアシェル構造架橋ゴム(c)を含有し、
コアシェル構造架橋ゴム(c)の含有量が樹脂分総量に
対して60重量%以上95重量%以下であることを特徴
とする電子部品用絶縁樹脂組成物、(2)コアシェル構
造架橋ゴム(c)のコア層が架橋ポリブタジエンであ
り、シェル層がアクリル酸アルキル−メタクリル酸アル
キル共重合物である(1)に記載の電子部品用絶縁樹脂
組成物、(3)コアシェル構造架橋ゴム(c)のコア層
が架橋ポリブタジエンであり、シェル層がメタクリル酸
アルキル−スチレン共重合物である(1)に記載の電子
部品用絶縁樹脂組成物、(4)コアシェル構造架橋ゴム
(c)のコア層が架橋アクリル酸アルキル共重合物であ
り、シェル層がアクリル酸アルキル共重合物である請求
項(1)に記載の電子部品用絶縁樹脂組成物、(5)
(1)乃至(4)の何れか1項に記載の電子部品用絶縁
樹脂組成物のシート、(6)シートの厚みが5μm以上
50μm以下で、なお且つ150℃、1MPaで加熱、
加圧したときの辺部の樹脂変形量が100μm以下であ
る(5)に記載の電子部品用絶縁樹脂組成物のシート、
(7)(1)乃至(6)の何れか一項に記載の電子部品
用絶縁樹脂組成物又はシートの硬化物に関する。
Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that an insulating resin composition for electronic parts which simultaneously satisfies the above-mentioned properties can be obtained, and the present invention completed. That is, the present invention contains (1) an epoxy resin (a), a curing agent (b), and a core-shell structure crosslinked rubber (c) having an average particle size of 1 μm or less,
The content of the core-shell structure crosslinked rubber (c) is 60% by weight or more and 95% by weight or less based on the total amount of the resin, and the insulating resin composition for electronic parts, (2) the core-shell structure crosslinked rubber (c) The core layer is a crosslinked polybutadiene, and the shell layer is an alkyl acrylate-alkyl methacrylate copolymer (1), the insulating resin composition for electronic parts, (3) the core of the core-shell structure crosslinked rubber (c) The layer is crosslinked polybutadiene and the shell layer is an alkyl methacrylate-styrene copolymer. (1) Insulating resin composition for electronic parts, (4) Core shell structure Crosslinked rubber (c) Core layer is crosslinked acrylic The insulating resin composition for electronic parts according to claim 1, wherein the insulating layer is an acid alkyl copolymer and the shell layer is an alkyl acrylate copolymer.
A sheet of the insulating resin composition for electronic parts according to any one of (1) to (4), (6) the sheet has a thickness of 5 μm or more and 50 μm or less, and is heated at 150 ° C. and 1 MPa,
A sheet of the insulating resin composition for electronic parts according to (5), wherein the amount of resin deformation of the side portion when pressed is 100 μm or less.
(7) A cured product of the insulating resin composition for electronic parts or the sheet according to any one of (1) to (6).

【0005】[0005]

【発明の実施の形態】本発明の電子部品用絶縁樹脂組成
物はエポキシ樹脂(a)、硬化剤(b)、並びに平均粒
子径が1μm以下のコアシェル構造架橋ゴム(c)を含
有する。
BEST MODE FOR CARRYING OUT THE INVENTION The insulating resin composition for electronic parts of the present invention contains an epoxy resin (a), a curing agent (b), and a core-shell structured crosslinked rubber (c) having an average particle diameter of 1 μm or less.

【0006】本発明で用いられるエポキシ樹脂(a)
は、分子内に2個以上のエポキシ基を持つ化合物であれ
ばどのようなものでも良く、例えばビスフェノールA型
エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビス
フェノールS型エポキシ樹脂、脂環式エポキシ樹脂、フ
ェノールノボラック型エポキシ樹脂、クレゾールノボラ
ック型エポキシ樹脂、グリシジルエステル系エポキシ樹
脂、グリシジルアミン系エポキシ樹脂、ハロゲン化フェ
ノール類をグリシジル化したエポキシ樹脂、エポキシ化
ポリブタジエン等があげられるが、特にビスフェノール
A型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、
フェノールノボラック型エポキシ樹脂、クレゾールノボ
ラック型エポキシ樹脂が好ましく、これらを2種類以上
併用することも出来る。
Epoxy resin (a) used in the present invention
May be any compound as long as it has two or more epoxy groups in the molecule, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic epoxy resin, phenol. Examples include novolac type epoxy resin, cresol novolac type epoxy resin, glycidyl ester type epoxy resin, glycidyl amine type epoxy resin, epoxy resin obtained by glycidylating halogenated phenols, epoxidized polybutadiene, and particularly bisphenol A type epoxy resin, Bisphenol F type epoxy resin,
Phenol novolac type epoxy resin and cresol novolac type epoxy resin are preferable, and two or more of them can be used in combination.

【0007】本発明で用いられる硬化剤(b)として
は、例えばフタル酸無水物、トリメリット酸無水物、ピ
ロメリット酸無水物、ベンゾフェノンテトラカルボン酸
無水物、エチレングリコール無水トリメリット酸無水
物、ビフェニルテトラカルボン酸無水物等の芳香族カル
ボン酸無水物、アゼライン酸、セバシン酸、ドデカン二
酸等の脂肪族カルボン酸の無水物、テトラヒドロフタル
酸無水物、ヘキサヒドロフタル酸無水物、ナジック酸無
水物、ヘット酸無水物、ハイミック酸無水物等の脂環式
カルボン酸無水物、ジアミノジフェニルメタン、ジアミ
ノジフェニルスルフォン、ジアミノジフェニルエーテ
ル、p−フェニレンジアミン、m−フェニレンジアミ
ン、o−フェニレンジアミン、1,5−ジアミノナフタ
レン、m−キシリレンジアミン等の芳香族アミン、エチ
レンジアミン、ジエチレンジアミン、イソフォロンジア
ミン、ビス(4−アミノ−3−メチルジシクロヘキシ
ル)メタン、ポリエーテルジアミン等の脂肪族アミン、
ジシアンジアミド、1−(o−トリル)ビグアニド等の
グアニジン類、エポキシ樹脂のアミンアダクト、ビスフ
ェノールA、ビスフェノールF、ビスフェノールS、
4,4’−ビフェニルフェノール、テトラメチルビスフ
ェノールA、ジメチルビスフェノールA、テトラメチル
ビスフェノールF、ジメチルビスフェノールF、テトラ
メチルビスフェノールS、ジメチルビスフェノールS、
テトラメチル−4,4’−ビフェノール、ジメチル−
4,4’−ビフェニルフェノール、1−(4−ヒドロキ
シフェニル)−2−[4−(1,1−ビス−(4−ヒド
ロキシフェニル)エチル)フェニル]プロパン、2,
2’−メチレン−ビス(4−メチル−6−tert−ブ
チルフェノール)、4,4’−ブチリデン−ビス(3−
メチル−6−tert−ブチルフェノール)、トリスヒ
ドロキシフェニルメタン、レゾルシノール、ハイドロキ
ノン、ピロガロール、ジイソプロピリデン骨格を有する
フェノール類、1,1−ジ−4−ヒドロキシフェニルフ
ルオレン等のフルオレン骨格を有するフェノール類、フ
ェノール化ポリブタジエン、フェノール、クレゾール
類、エチルフェノール類、ブチルフェノール類、オクチ
ルフェノール類、ビスフェノールA、ビスフェノール
F、ビスフェノールS、ナフトール類等の各種フェノー
ルを原料とするノボラック樹脂、キシリレン骨格含有フ
ェノールノボラック樹脂、ジシクロペンタジエン骨格含
有フェノールノボラ・メチルイミダゾールイソシアヌル
酸の2:3付加物、2−フェニルイミダゾールイソシア
ヌル酸付加物、2−フェニル−3,5−ジヒドロキシメ
チルイミダゾール、2−フェニル−4−ヒドロキシメチ
ル−5−メチルイミダゾール、1−シアノエチル−2−
フェニル−3,5−ジシアノエトキシメチルイミダゾー
ルの各種イミダゾール類、及び、それらイミダゾール類
とフタル酸、イソフタル酸、テレフタル酸、トリメリッ
ト酸、ピロメリット酸、ナフタレンジカルボン酸、マレ
イン酸、蓚酸等の多価カルボン酸との塩類、ジヒドラジ
ド類、ルイス酸、ブレンステッド酸塩類、ポリメルカプ
トン類、イソシアネート類、ブロックイソシアネート類
等が挙げられる。
Examples of the curing agent (b) used in the present invention include phthalic acid anhydride, trimellitic acid anhydride, pyromellitic acid anhydride, benzophenonetetracarboxylic acid anhydride, ethylene glycol trimellitic acid anhydride, Aromatic carboxylic acid anhydrides such as biphenyl tetracarboxylic acid anhydrides, Aliphatic carboxylic acid anhydrides such as azelaic acid, sebacic acid, dodecanedioic acid, tetrahydrophthalic acid anhydride, hexahydrophthalic acid anhydride, nadic acid anhydride Compounds, alicyclic carboxylic acid anhydrides such as het acid anhydride, hymic acid anhydride, diaminodiphenylmethane, diaminodiphenylsulfone, diaminodiphenyl ether, p-phenylenediamine, m-phenylenediamine, o-phenylenediamine, 1,5- Diaminonaphthalene, m-xylylene diene Aromatic amines such as down, ethylenediamine, diethylenediamine, isophoronediamine, bis (4-amino-3-methyl dicyclohexyl) methane, aliphatic amines such as polyether diamines,
Dicyandiamide, guanidines such as 1- (o-tolyl) biguanide, amine adduct of epoxy resin, bisphenol A, bisphenol F, bisphenol S,
4,4'-biphenylphenol, tetramethylbisphenol A, dimethylbisphenol A, tetramethylbisphenol F, dimethylbisphenol F, tetramethylbisphenol S, dimethylbisphenol S,
Tetramethyl-4,4'-biphenol, dimethyl-
4,4′-biphenylphenol, 1- (4-hydroxyphenyl) -2- [4- (1,1-bis- (4-hydroxyphenyl) ethyl) phenyl] propane, 2,
2'-methylene-bis (4-methyl-6-tert-butylphenol), 4,4'-butylidene-bis (3-
Methyl-6-tert-butylphenol), trishydroxyphenylmethane, resorcinol, hydroquinone, pyrogallol, phenols having a diisopropylidene skeleton, phenols having a fluorene skeleton such as 1,1-di-4-hydroxyphenylfluorene, phenol Novolak resins made from various phenols such as modified polybutadiene, phenol, cresols, ethylphenols, butylphenols, octylphenols, bisphenol A, bisphenol F, bisphenol S, and naphthols, xylylene skeleton-containing phenol novolac resins, dicyclopentadiene Skeleton-containing phenol novola / methylimidazole isocyanuric acid 2: 3 adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl Sulfonyl-3,5-dihydroxy methyl imidazole, 2-phenyl-4-hydroxymethyl-5-methylimidazole, 1-cyanoethyl-2
Various imidazoles such as phenyl-3,5-dicyanoethoxymethylimidazole, and imidazoles and polyhydric acids such as phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, pyromellitic acid, naphthalenedicarboxylic acid, maleic acid and oxalic acid. Examples thereof include salts with carboxylic acids, dihydrazides, Lewis acids, Bronsted acid salts, polymercaptons, isocyanates and blocked isocyanates.

【0008】これら硬化剤のうち、どの硬化剤を用いる
かは接着剤に要求される特性によって適宜選択される
が、好ましくはエポキシ樹脂のアミンアダクト、ジヒド
ラジド類である。
[0008] Among these curing agents, which curing agent is used is appropriately selected depending on the properties required for the adhesive, but is preferably amine adduct of epoxy resin or dihydrazide.

【0009】これら硬化剤(b)の使用量はエポキシ樹
脂(a)のエポキシ基に対する硬化剤の当量比において
通常0.3〜2.0、好ましくは0.4〜1.6、更に
好ましくは0.5〜1.3の範囲で用いられる。上記硬
化剤は2種以上を混合して用いることもできる。また、
必要に応じて硬化促進剤を配合しても良い。硬化促進剤
としてはエポキシ樹脂の硬化を促進するものであればど
のようなものでも良く、例えばイミダゾール類、有機リ
ン化合物、第三級アミン、第四級アンモニウム塩などが
ある。
The amount of these curing agents (b) used is usually 0.3 to 2.0, preferably 0.4 to 1.6, more preferably the equivalent ratio of the curing agent to the epoxy groups of the epoxy resin (a). It is used in the range of 0.5 to 1.3. Two or more kinds of the above curing agents can be mixed and used. Also,
You may mix | blend a hardening accelerator as needed. Any curing accelerator may be used as long as it accelerates the curing of the epoxy resin, and examples thereof include imidazoles, organic phosphorus compounds, tertiary amines and quaternary ammonium salts.

【0010】本発明で使用するコアシェル構造架橋ゴム
(c)は、2層又は3層構造であり、コア層がゴム弾性
を示す架橋ゴムであり、コア層をゴム弾性を示さない架
橋ポリマーで被覆した構造であればどのようなものでも
良い。コア層としては架橋ポリブタジエン、架橋アクリ
ル酸アルキル共重合物、架橋ポリイソプレンなどが挙げ
られ、シェル層としてはアクリル酸アルキル−メタクリ
ル酸アルキル共重合物、メタクリル酸アルキル−スチレ
ン共重合物、アクリル酸アルキル共重合物などが挙げら
れる。これらのうちコア層とシェル層の好ましい組み合
わせとしては、コア層が架橋ポリブタジエンであり、シ
ェル層がアクリル酸アルキル−メタクリル酸アルキル共
重合物又はメタクリル酸アルキル−スチレン共重合物で
ある組み合わせ、コア層が架橋アクリル酸アルキル共重
合物であり、シェル層がアクリル酸アルキル共重合物で
ある組み合わせが挙げられる。コアシェル構造架橋ゴム
の平均粒子径は、1μm以下が好ましい。平均粒子径が
1μmより大きいと熱接着時に接着層の形状変形が大き
くなる傾向がある。また、粒子径が小さすぎると凝集し
やすくなるため、平均粒子径は0.1μm以上が好まし
い。
The crosslinked rubber (c) having a core-shell structure used in the present invention has a two-layer or three-layer structure, the core layer is a crosslinked rubber having rubber elasticity, and the core layer is coated with a crosslinked polymer having no rubber elasticity. Any structure may be used as long as it has the above structure. Examples of the core layer include cross-linked polybutadiene, cross-linked alkyl acrylate copolymer, cross-linked polyisoprene, and the like, and the shell layer includes alkyl acrylate-alkyl methacrylate copolymer, alkyl methacrylate-styrene copolymer, alkyl acrylate. Examples thereof include copolymers. Among these, a preferred combination of the core layer and the shell layer is a combination in which the core layer is a crosslinked polybutadiene and the shell layer is an alkyl acrylate-alkyl methacrylate copolymer or an alkyl methacrylate-styrene copolymer, the core layer Is a crosslinked alkyl acrylate copolymer and the shell layer is an alkyl acrylate copolymer. The average particle diameter of the core-shell structure crosslinked rubber is preferably 1 μm or less. If the average particle size is larger than 1 μm, the shape deformation of the adhesive layer tends to increase during heat bonding. Further, if the particle size is too small, the particles are likely to aggregate, so that the average particle size is preferably 0.1 μm or more.

【0011】本発明の電子部品用絶縁樹脂組成物中のコ
アシェル構造架橋ゴムの添加量は絶縁樹脂組成物中、樹
脂分総量に対して60重量%以上95重量%以下であ
り、好ましくは80重量%以上90重量%以下である。
60重量%より少ない場合、熱接着時に接着層の形状変
化が生じ、95重量%より多い場合、接着信頼性が低下
する。
The addition amount of the core-shell structured crosslinked rubber in the insulating resin composition for electronic parts of the present invention is 60% by weight or more and 95% by weight or less, preferably 80% by weight, based on the total amount of the resin content in the insulating resin composition. % To 90% by weight.
When the amount is less than 60% by weight, the shape of the adhesive layer is changed during heat bonding, and when the amount is more than 95% by weight, the adhesion reliability is deteriorated.

【0012】本発明の電子部品用絶縁樹脂組成物には、
必要に応じて、他の添加物を加えることができる。例え
ば天然ワックス類、合成ワックス類および長鎖脂肪族酸
の金属塩類等の可塑剤、酸アミド類、エステル類、パラ
フィン類などの離型剤、ニトリルゴム、ブタジエンゴム
等の応力緩和剤、三酸化アンチモン、五酸化アンチモ
ン、酸化錫、水酸化錫、酸化モリブデン、硼酸亜鉛、メ
タ硼酸バリウム、赤燐、水酸化アルミニウム、水酸化マ
グネシウム、アルミン酸カルシウム等の無機難燃剤、テ
トラブロモビスフェノールA、テトラブロモ無水フタル
酸、ヘキサブロモベンゼン、ブロム化フェノールノボラ
ック等の臭素系難燃剤、シラン系カップリング剤、チタ
ネート系カップリング剤、アルミニウム系カップリング
剤等のカップリング剤、溶融シリカ、結晶性シリカ、低
α線シリカ、ガラスフレーク、ガラスビーズ、ガラスバ
ルーン、タルク、アルミナ、ケイ酸カルシウム、水酸化
アルミニウム、炭酸カルシウム、硫酸バリウム、マグネ
シア、窒化ケイ素、窒化ホウ素、フェライト、希土コバ
ルト、金、銀、ニッケル、銅、鉛、鉄粉、酸化鉄、砂鉄
等の金属粉、黒鉛、カーボン、弁柄、黄鉛等の無機質充
填剤または導電性粒子等、染料や顔料等の着色剤、炭素
繊維、ガラス繊維、ボロン繊維、シリコンカーバイト繊
維、アルミナ繊維、シリカアルミナ繊維などの無機系繊
維、アラミド繊維、ポリエステル繊維、セルロース繊
維、炭素繊維などの有機系繊維、酸化安定剤、光安定
剤、耐湿性向上剤、チキソトロピー付与剤、希釈剤、消
泡剤、他の各種の樹脂、粘着付与剤、帯電防止剤、滑
剤、紫外線吸収剤等を配合することもできる。
The insulating resin composition for electronic parts of the present invention comprises:
Other additives can be added as needed. For example, plasticizers such as natural waxes, synthetic waxes and metal salts of long chain aliphatic acids, release agents such as acid amides, esters and paraffins, stress relaxation agents such as nitrile rubber and butadiene rubber, trioxide. Inorganic flame retardants such as antimony, antimony pentoxide, tin oxide, tin hydroxide, molybdenum oxide, zinc borate, barium metaborate, red phosphorus, aluminum hydroxide, magnesium hydroxide, calcium aluminate, tetrabromobisphenol A, tetrabromoanhydrous Brominated flame retardants such as phthalic acid, hexabromobenzene, brominated phenol novolac, silane coupling agents, titanate coupling agents, aluminum coupling agents, and other coupling agents, fused silica, crystalline silica, low α Wire silica, glass flakes, glass beads, glass balloons, talc Alumina, calcium silicate, aluminum hydroxide, calcium carbonate, barium sulfate, magnesia, silicon nitride, boron nitride, ferrite, rare earth cobalt, gold, silver, nickel, copper, lead, iron powder, iron oxide, iron sand, etc. Inorganic fillers such as powder, graphite, carbon, rouge, yellow lead or conductive particles, colorants such as dyes and pigments, carbon fibers, glass fibers, boron fibers, silicon carbide fibers, alumina fibers, silica-alumina fibers Inorganic fibers such as, aramid fibers, polyester fibers, cellulose fibers, organic fibers such as carbon fibers, oxidation stabilizers, light stabilizers, moisture resistance improvers, thixotropic agents, diluents, defoamers, and various other types. The resin, tackifier, antistatic agent, lubricant, ultraviolet absorber and the like can also be added.

【0013】本発明の電子部品用絶縁樹脂組成物は各成
分を均一に混合するため、溶剤を加えワニスとすること
が好ましい。溶剤はエポキシ樹脂を溶解するものであれ
ばどのようなものでも良いが、特にメチルエチルケト
ン、トルエン、キシレン、酢酸エチル、N,N−ジメチ
ルホルムアミド、N,N−ジメチルアセトアミド、シク
ロヘキサノン、プロピレングリコールジアセテート、エ
チレングリコールモノメチルエーテル等がエポキシ樹脂
の溶解性に優れるため好ましい。これらの溶剤の配合量
は樹脂が溶解し、コアシェル構造架橋ゴムを混合できる
量であれば特に制限はないが、エポキシ樹脂、硬化剤及
びコアシェル構造架橋ゴムの総量100重量部に対し
て、30〜200重量部が好ましい。尚、コアシェル構
造架橋ゴムを均一に分散する為、らいかい機、ホモジナ
イザー、三本ロール等を用いることが有効である。
Since the insulating resin composition for electronic parts of the present invention uniformly mixes each component, it is preferable to use a varnish by adding a solvent. Any solvent may be used as long as it dissolves the epoxy resin, but in particular, methyl ethyl ketone, toluene, xylene, ethyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, cyclohexanone, propylene glycol diacetate, Ethylene glycol monomethyl ether and the like are preferable because they have excellent solubility in the epoxy resin. The blending amount of these solvents is not particularly limited as long as the resin dissolves and the core-shell structured crosslinked rubber can be mixed, but is 30 to 30 parts by weight based on 100 parts by weight of the total amount of the epoxy resin, the curing agent and the core-shell structured crosslinked rubber. 200 parts by weight is preferred. In order to uniformly disperse the crosslinked rubber having a core-shell structure, it is effective to use a ladle machine, a homogenizer, a triple roll, or the like.

【0014】本発明の電子部品用絶縁樹脂組成物のシー
トは、シートの厚みが5μm以上100μm以下で、な
お且つ150℃、1MPaで加熱、加圧したときの辺部
の樹脂変形量が100μm以下であるものが好ましい。
この場合の樹脂の変形量とはシートを直径5mmの円形
に打ち抜いたものを2枚のガラス板の間にはさみ、15
0℃1MPaで1時間加熱、加圧して硬化させたときの
直径の変形量である。本発明のシートは、支持体となる
フィルム上に形成される。形成方法としては、前記電子
部品用絶縁樹脂組成物のワニスをフィルム上に塗布、溶
剤を乾燥するのが良いが、これに限定されるものではな
い。乾燥後のシート厚みは、用途にもよるが、実用上5
μm以上100μm以下がよい。支持体となるフィルム
としては、乾燥工程に耐える耐熱性を有したものである
ことが必要である。これを満足しコスト的にも安価なも
のとしてはポリエチレンテレフタレート(PET)フィ
ルム等が挙げられる。接着シートの剥離性を良くする
為、支持体フィルムの表面には離型処理を施してあるこ
とが好ましい。
The sheet of the insulating resin composition for electronic parts according to the present invention has a sheet thickness of 5 μm or more and 100 μm or less, and a side resin deformation amount of 100 μm or less when heated and pressed at 150 ° C. and 1 MPa. Are preferred.
The amount of resin deformation in this case means that a sheet punched into a circle with a diameter of 5 mm is sandwiched between two glass plates,
It is the amount of deformation of the diameter when heated and pressed at 0 ° C. and 1 MPa for 1 hour to cure. The sheet of the present invention is formed on a film serving as a support. As a forming method, it is preferable to apply a varnish of the insulating resin composition for electronic parts onto a film and dry the solvent, but it is not limited to this. The sheet thickness after drying depends on the application, but is practically 5
It is preferable that the thickness is 100 μm or more. The film serving as a support needs to have heat resistance to withstand the drying process. Polyethylene terephthalate (PET) film and the like can be mentioned as a material which satisfies this requirement and is inexpensive. In order to improve the releasability of the adhesive sheet, the surface of the support film is preferably subjected to a release treatment.

【0015】本発明の電子部品用絶縁樹脂組成物の硬化
条件については、どのような条件でも構わないが、その
温度は120〜250℃が好ましい。120℃より低い
温度では樹脂の硬化が不十分になり、250℃より高い
温度では樹脂の熱分解が起きる為好ましくない。
The insulating resin composition for electronic parts of the present invention may be cured under any conditions, but the temperature is preferably 120 to 250 ° C. If the temperature is lower than 120 ° C, curing of the resin will be insufficient, and if the temperature is higher than 250 ° C, the resin will be thermally decomposed, which is not preferable.

【0016】[0016]

【実施例】以下、更に実施例を以て本発明をより具体的
に説明するが、本発明はこれらに限定されるものではな
い。なお、実施例および比較例中、%および部は、特記
しない限り重量基準である。 実施例1 RE−310S(液状ビスフェノールAエポキシ樹脂、
日本化薬株式会社製、エポキシ当量182g/eq)5
0部、YD−012(固形ビスフェノールAエポキシ樹
脂、東都化成株式会社製、エポキシ当量670g/e
q)50部、アミキュアMY−H(エポキシ樹脂のアミ
ンアダクト、味の素株式会社製)20部、パラロイドE
XL−2602(コアシェル構造架橋ゴム、呉羽化学工
業株式会社製、コア層:架橋ポリブタジエン、シェル
層:アクリル酸アルキル−メタクリル酸アルキル共重合
物、平均粒子径200nm)600部、プロピレングリ
コールジアセテート800部を秤量し、プラネタリーミ
キサーで予備混合後、更に3本ロールにて混練してワニ
スを得た。このワニスをPETフィルム#3811(リ
ンテック株式会社製、離型処理品)に乾燥後の厚みが2
5μmになるように塗布し、140℃で3分間乾燥して
電子部品用絶縁樹脂組成物のシートを得た。得られたシ
ートは硬化前後においてフレキシブル性を有していた。
得られたシートを直径5mmの円形に打ち抜いたものを
2枚のガラス板にはさみ、150℃、1MPaで1時間
加熱、加圧して硬化させたときの直径の変形量は50μ
mであった。また、接着したガラスの垂直方向の引き剥
がし強度は5MPaと良好であった。
The present invention will be described in more detail below with reference to examples, but the present invention is not limited thereto. In Examples and Comparative Examples,% and parts are by weight unless otherwise specified. Example 1 RE-310S (liquid bisphenol A epoxy resin,
Nippon Kayaku Co., Ltd., epoxy equivalent 182g / eq) 5
0 parts, YD-012 (solid bisphenol A epoxy resin, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent 670 g / e
q) 50 parts, Amicure MY-H (epoxy resin amine adduct, manufactured by Ajinomoto Co., Inc.) 20 parts, Paraloid E
XL-2602 (core shell structure crosslinked rubber, manufactured by Kureha Chemical Industry Co., Ltd., core layer: crosslinked polybutadiene, shell layer: alkyl acrylate-alkyl methacrylate copolymer, average particle diameter 200 nm) 600 parts, propylene glycol diacetate 800 parts Was weighed, pre-mixed with a planetary mixer, and then kneaded with three rolls to obtain a varnish. This varnish was applied to PET film # 3811 (manufactured by Lintec Co., Ltd., release treated product) and the thickness after drying was 2
It was applied so as to have a thickness of 5 μm and dried at 140 ° C. for 3 minutes to obtain a sheet of an insulating resin composition for electronic parts. The obtained sheet had flexibility before and after curing.
The obtained sheet was punched into a circular shape with a diameter of 5 mm, sandwiched between two glass plates, heated at 150 ° C. and 1 MPa for 1 hour, and pressed to cure, so that the deformation amount of the diameter was 50 μm.
It was m. Further, the peeling strength of the adhered glass in the vertical direction was as good as 5 MPa.

【0017】実施例2 RE−310S(液状ビスフェノールAエポキシ樹脂、
日本化薬株式会社製、エポキシ当量182g/eq)5
0部、YD−012(固形ビスフェノールAエポキシ樹
脂、東都化成株式会社製、エポキシ当量670g/e
q)50部、アミキュアMY−H(エポキシ樹脂のアミ
ンアダクト、味の素株式会社製)20部、パラロイドE
XL−2655(コアシェル構造架橋ゴム、呉羽化学工
業株式会社製、コア層:架橋ポリブタジエン、シェル
層:メタクリル酸アルキル−スチレン共重合物、平均粒
子径200nm)600部、プロピレングリコールジア
セテート800部を秤量し、プラネタリーミキサーで予
備混合後、更に3本ロールにて混練してワニスを得た。
このワニスをPETフィルム#3811(リンテック株
式会社製、離型処理品)に乾燥後の厚みが25μmにな
るように塗布し、140℃で3分間乾燥して電子部品用
絶縁樹脂組成物のシートを得た。得られたシートは硬化
前後においてフレキシブル性を有していた。得られたシ
ートを直径5mmの円形に打ち抜いたものを2枚のガラ
ス板にはさみ、150℃、1MPaで1時間加熱、加圧
して硬化させたときの直径の変形量は50μmであっ
た。また、接着したガラスの垂直方向の引き剥がし強度
は5MPaと良好であった。
Example 2 RE-310S (liquid bisphenol A epoxy resin,
Nippon Kayaku Co., Ltd., epoxy equivalent 182g / eq) 5
0 parts, YD-012 (solid bisphenol A epoxy resin, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent 670 g / e
q) 50 parts, Amicure MY-H (epoxy resin amine adduct, manufactured by Ajinomoto Co., Inc.) 20 parts, Paraloid E
XL-2655 (core shell structure crosslinked rubber, manufactured by Kureha Chemical Industry Co., Ltd., core layer: crosslinked polybutadiene, shell layer: alkyl methacrylate-styrene copolymer, average particle diameter 200 nm) 600 parts, propylene glycol diacetate 800 parts are weighed. Then, after premixing with a planetary mixer, it was further kneaded with a three-roll mill to obtain a varnish.
This varnish was applied to PET film # 3811 (manufactured by Lintec Co., Ltd., release treated product) so that the thickness after drying was 25 μm, and dried at 140 ° C. for 3 minutes to obtain a sheet of an insulating resin composition for electronic parts. Obtained. The obtained sheet had flexibility before and after curing. The obtained sheet was punched into a circle having a diameter of 5 mm, sandwiched between two glass plates, and heated at 150 ° C. and 1 MPa for 1 hour to be pressed and cured, and the amount of deformation of the diameter was 50 μm. Further, the peeling strength of the adhered glass in the vertical direction was as good as 5 MPa.

【0018】実施例3 RE−310S(液状ビスフェノールAエポキシ樹脂、
日本化薬株式会社製、エポキシ当量182g/eq)5
0部、YD−012(固形ビスフェノールAエポキシ樹
脂、東都化成株式会社製、エポキシ当量670g/e
q)50部、アミキュアVDH(1,3−ビス(ヒドラ
ジノカルボエチル)−5−イソプロピルヒダントイン、
味の素株式会社製)20部、ゼオンF351(コアシェ
ル構造架橋ゴム、日本ゼオン株式会社製、コア層:架橋
アクリル酸アルキル共重合、シェル層:アクリル酸アル
キル共重合物、平均粒子径300nm)600部、プロ
ピレングリコールジアセテート800部を秤量し、プラ
ネタリーミキサーで予備混合後、更に3本ロールにて混
練してワニスを得た。このワニスをPETフィルム#3
811(リンテック株式会社製、離型処理品)に乾燥後
の厚みが25μmになるように塗布し、140℃で3分
間乾燥して電子部品用絶縁樹脂組成物のシートを得た。
得られたシートは硬化前後においてフレキシブル性を有
していた。得られたシートを直径5mmの円形に打ち抜
いたものを2枚のガラス板にはさみ、150℃、1MP
aで1時間加熱、加圧して硬化させたときの直径の変形
量は70μmであった。また、接着したガラスの垂直方
向の引き剥がし強度は4MPaと良好であった。
Example 3 RE-310S (Liquid bisphenol A epoxy resin,
Nippon Kayaku Co., Ltd., epoxy equivalent 182g / eq) 5
0 parts, YD-012 (solid bisphenol A epoxy resin, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent 670 g / e
q) 50 parts, Amicure VDH (1,3-bis (hydrazinocarboethyl) -5-isopropylhydantoin,
Ajinomoto Co., Ltd.) 20 parts, Zeon F351 (core-shell structure crosslinked rubber, manufactured by Nippon Zeon Co., Ltd., core layer: crosslinked alkyl acrylate copolymer, shell layer: alkyl acrylate copolymer, average particle diameter 300 nm) 600 parts, 800 parts of propylene glycol diacetate was weighed, premixed with a planetary mixer, and then kneaded with three rolls to obtain a varnish. Use this varnish with PET film # 3
811 (manufactured by Lintec Co., Ltd., release treated product) was applied so that the thickness after drying would be 25 μm, and dried at 140 ° C. for 3 minutes to obtain a sheet of an insulating resin composition for electronic parts.
The obtained sheet had flexibility before and after curing. The obtained sheet was punched into a circle with a diameter of 5 mm and sandwiched between two glass plates at 150 ° C and 1MP.
The amount of deformation of the diameter when it was heated and pressurized at a for 1 hour to cure was 70 μm. Further, the peeling strength of the adhered glass in the vertical direction was as good as 4 MPa.

【0019】実施例4 RE−310S(液状ビスフェノールAエポキシ樹脂、
日本化薬株式会社製、エポキシ当量182g/eq)5
0部、YD−012(固形ビスフェノールAエポキシ樹
脂、東都化成株式会社製、エポキシ当量670g/e
q)50部、アミキュアMY−H(エポキシ樹脂のアミ
ンアダクト、味の素株式会社製)20部、SG−200
0(タルク微粉末、日本タルク株式会社製)200部、
パラロイドEXL−2655(コアシェル構造架橋ゴ
ム、呉羽化学工業株式会社製、コア層:架橋ポリブタジ
エン、シェル層:メタクリル酸アルキル−スチレン共重
合物、平均粒子径200nm)600部、プロピレング
リコールジアセテート800部を秤量し、プラネタリー
ミキサーで予備混合後、更に3本ロールにて混練してワ
ニスを得た。このワニスをPETフィルム#3811
(リンテック株式会社製、離型処理品)に乾燥後の厚み
が25μmになるように塗布し、140℃で3分間乾燥
して電子部品用絶縁樹脂組成物のシートを得た。得られ
たシートは硬化前後においてフレキシブル性を有してい
た。得られたシートを直径5mmの円形に打ち抜いたも
のを2枚のガラス板にはさみ、150℃、1MPaで1
時間加熱、加圧して硬化させたときの直径の変形量は3
0μmであった。また、接着したガラスの垂直方向の引
き剥がし強度は5MPaと良好であった。
Example 4 RE-310S (liquid bisphenol A epoxy resin,
Nippon Kayaku Co., Ltd., epoxy equivalent 182g / eq) 5
0 parts, YD-012 (solid bisphenol A epoxy resin, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent 670 g / e
q) 50 parts, Amicure MY-H (epoxy resin amine adduct, manufactured by Ajinomoto Co., Inc.) 20 parts, SG-200
0 (fine powder of talc, manufactured by Nippon Talc Co., Ltd.) 200 parts,
Paraloid EXL-2655 (core shell structure crosslinked rubber, manufactured by Kureha Chemical Industry Co., Ltd., core layer: crosslinked polybutadiene, shell layer: alkyl methacrylate-styrene copolymer, average particle size 200 nm) 600 parts, propylene glycol diacetate 800 parts After weighing and premixing with a planetary mixer, the mixture was further kneaded with three rolls to obtain a varnish. Use this varnish with PET film # 3811
(Rintec Co., Ltd., release treated product) was applied so that the thickness after drying would be 25 μm, and dried at 140 ° C. for 3 minutes to obtain a sheet of an insulating resin composition for electronic parts. The obtained sheet had flexibility before and after curing. The obtained sheet was punched into a circular shape with a diameter of 5 mm, and sandwiched between two glass plates.
The amount of diameter deformation when heated and pressed for 3 hours to cure is 3
It was 0 μm. Further, the peeling strength of the adhered glass in the vertical direction was as good as 5 MPa.

【0020】[0020]

【発明の効果】本発明の電子部品用絶縁樹脂組成物は、
電子部品を構成する基材との接着性に優れ、熱接着時に
接着層の形状変形が小さく、なお且つ硬化前後において
フレキシブル性があるため工程中の取り扱いに優れる。
従って、本発明のシートは、電子部品の絶縁用シートと
して極めて有用である。
The insulating resin composition for electronic parts of the present invention comprises:
It has excellent adhesiveness to the base material that constitutes the electronic component, the shape deformation of the adhesive layer is small at the time of heat bonding, and it has flexibility before and after curing, which makes it excellent in handling during the process.
Therefore, the sheet of the present invention is extremely useful as an insulating sheet for electronic parts.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) (C08L 51/04 C08L 63:00 A 63:00) Fターム(参考) 4F071 AA12 AA12X AA13 AA13X AA33 AA41 AA42 AA77 AC09 AC11 AC12 AC13 AC19 AD02 AE02 AF39 AH12 BB02 BC01 4J002 BN121 BN141 CC033 CC043 CC053 CC063 CC273 CD022 CD051 CD062 CD102 CD112 CD122 CD132 CD182 CD203 CE003 EJ016 EJ036 EJ046 EL136 EN036 EN076 EN126 EQ026 ER006 ER026 ET006 EU116 EU196 EV076 EV216 FA040 FD010 FD020 FD090 FD110 FD130 FD140 FD143 FD146 FD160 GQ01 4J040 DL141 EB052 EC062 EC072 EC092 EC122 EC152 EC172 EC262 EF152 HB35 HB47 HC01 HC16 HC24 HD16 JA03 JA09 KA16 LA06 LA09 NA19 5G305 AA07 AB34 AB36 BA09 BA18 CA15 CA47 ─────────────────────────────────────────────────── ─── Continued Front Page (51) Int.Cl. 7 Identification Code FI Theme Coat (Reference) (C08L 51/04 C08L 63:00 A 63:00) F Term (Reference) 4F071 AA12 AA12X AA13 AA13X AA33 AA41 AA42 AA77 AC09 AC11 AC12 AC13 AC19 AD02 AE02 AF39 AH12 BB02 BC01 4J002 BN121 BN141 CC033 CC043 CC053 CC063 CC273 CD022 CD051 CD062 CD102 CD112 CD122 CD132 CD182 CD203 CE003 EJ016 FE160 FD 176 016 010 176 010 216 176 010 010 216 010 006 006 010 010 006 006 010 006 006 FE 610 006 006 FE 610 FE 006 FE 006 FE 006 FE 006 FE 006 FE 006 FE 006 006 FD130 FD140 FD143 FD146 FD160 GQ01 4J040 DL141 EB052 EC062 EC072 EC092 EC122 EC152 EC172 EC262 EF152 HB35 HB47 HC01 HC16 HC24 HD16 JA03 JA09 KA16 LA06 LA09 NA19 5G305 AA07 AB34 AB36 BA09 BA18 CA15 CA47

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】エポキシ樹脂(a)、硬化剤(b)、並び
に平均粒子径が1μm以下のコアシェル構造架橋ゴム
(c)を含有し、コアシェル構造架橋ゴム(c)の含有
量が樹脂分総量に対して60重量%以上95重量%以下
であることを特徴とする電子部品用絶縁樹脂組成物。
1. An epoxy resin (a), a curing agent (b), and a core-shell structure cross-linked rubber (c) having an average particle size of 1 μm or less, wherein the content of the core-shell structure cross-linked rubber (c) is the total resin content. To 60% by weight or more and 95% by weight or less of the insulating resin composition for electronic parts.
【請求項2】コアシェル構造架橋ゴム(c)のコア層が
架橋ポリブタジエンであり、シェル層がアクリル酸アル
キル−メタクリル酸アルキル共重合物である請求項1に
記載の電子部品用絶縁樹脂組成物。
2. The insulating resin composition for electronic parts according to claim 1, wherein the core layer of the crosslinked rubber (c) having a core-shell structure is a crosslinked polybutadiene, and the shell layer is an alkyl acrylate-alkyl methacrylate copolymer.
【請求項3】コアシェル構造架橋ゴム(c)のコア層が
架橋ポリブタジエンであり、シェル層がメタクリル酸ア
ルキル−スチレン共重合物である請求項1に記載の電子
部品用絶縁樹脂組成物。
3. The insulating resin composition for electronic parts according to claim 1, wherein the core layer of the crosslinked rubber (c) having a core-shell structure is a crosslinked polybutadiene, and the shell layer is an alkyl methacrylate-styrene copolymer.
【請求項4】コアシェル構造架橋ゴム(c)のコア層が
架橋アクリル酸アルキル共重合物であり、シェル層がア
クリル酸アルキル共重合物である請求項1に記載の電子
部品用絶縁樹脂組成物。
4. The insulating resin composition for electronic parts according to claim 1, wherein the core layer of the crosslinked rubber (c) having a core-shell structure is a crosslinked alkyl acrylate copolymer and the shell layer is an alkyl acrylate copolymer. .
【請求項5】請求項1乃至4の何れか一項に記載の電子
部品用絶縁樹脂組成物のシート。
5. A sheet of the insulating resin composition for electronic parts according to claim 1.
【請求項6】シートの厚みが5μm以上100μm以下
で、なお且つ150℃、1MPaで加熱、加圧したとき
の辺部の樹脂変形量が100μm以下である請求項5に
記載の電子部品用絶縁樹脂組成物のシート。
6. The insulation for electronic parts according to claim 5, wherein the thickness of the sheet is 5 μm or more and 100 μm or less, and the amount of resin deformation of the side portion when heated and pressed at 150 ° C. and 1 MPa is 100 μm or less. A sheet of resin composition.
【請求項7】請求項1乃至6の何れか一項に記載の電子
部品用絶縁樹脂組成物又はシートの硬化物。
7. A cured product of the insulating resin composition for electronic parts or a sheet according to claim 1.
JP2001210262A 2001-07-11 2001-07-11 Insulating resin composition for electronic parts and adhesive sheet Expired - Fee Related JP4771445B2 (en)

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JP2008038070A (en) * 2006-08-09 2008-02-21 Toshiba Corp Epoxy adhesive, cast-molded product using the same, and method for producing the cast-molded product using the same
JP2009506169A (en) * 2005-08-24 2009-02-12 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Epoxy composition having improved impact resistance
US8545667B2 (en) 2006-10-06 2013-10-01 Henkel Ag & Co. Kgaa Pumpable epoxy paste adhesives resistant to wash-off
US8673108B2 (en) 2006-07-31 2014-03-18 Henkel Ag & Co. Kgaa Curable epoxy resin-based adhesive compositions
JP2014185296A (en) * 2013-03-25 2014-10-02 Asahi Kasei E-Materials Corp Liquid resin composition and processed product
US9133375B2 (en) 2007-10-30 2015-09-15 Henkel Ag & Co. Kgaa Epoxy-paste adhesives resistant to wash-off

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* Cited by examiner, † Cited by third party
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JP2009506169A (en) * 2005-08-24 2009-02-12 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Epoxy composition having improved impact resistance
US8673108B2 (en) 2006-07-31 2014-03-18 Henkel Ag & Co. Kgaa Curable epoxy resin-based adhesive compositions
JP2008038070A (en) * 2006-08-09 2008-02-21 Toshiba Corp Epoxy adhesive, cast-molded product using the same, and method for producing the cast-molded product using the same
US8545667B2 (en) 2006-10-06 2013-10-01 Henkel Ag & Co. Kgaa Pumpable epoxy paste adhesives resistant to wash-off
US9133375B2 (en) 2007-10-30 2015-09-15 Henkel Ag & Co. Kgaa Epoxy-paste adhesives resistant to wash-off
JP2014185296A (en) * 2013-03-25 2014-10-02 Asahi Kasei E-Materials Corp Liquid resin composition and processed product

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