JP2003019874A - Screen fabric for printing - Google Patents
Screen fabric for printingInfo
- Publication number
- JP2003019874A JP2003019874A JP2001208781A JP2001208781A JP2003019874A JP 2003019874 A JP2003019874 A JP 2003019874A JP 2001208781 A JP2001208781 A JP 2001208781A JP 2001208781 A JP2001208781 A JP 2001208781A JP 2003019874 A JP2003019874 A JP 2003019874A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- screen
- gauze
- antireflection film
- stainless steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、写真製版用に好適な
印刷用スクリーン紗に関し、特にプリント配線等の精密
印刷を可能にするものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printing screen mesh suitable for photoengraving, and in particular, enables precise printing of printed wiring and the like.
【０００２】[0002]
【従来の技術】印刷用スクリーン紗として、ステンレス
鋼からなる直径１０〜５０μｍの細い線材を経糸および
緯糸に用いて１００〜８００メッシュの紗状織物を製織
し、その表裏両面にステンレス鋼をスパッタ蒸着して上
記の経糸および緯糸をステンレス鋼からなるアモルファ
ス構造の厚み１０〜１０００ｎｍの蒸着膜で被覆したも
のが知られている（特開平８−１１８８３５号公報参
照）。この印刷用スクリーン紗は、上記の蒸着膜を有し
ないものに比べ、印刷インキやトナー、捺染糊に対する
濡れ性が優れるため、精密印刷が可能である。2. Description of the Related Art As a printing screen gauze, a 100-800 mesh gauze-like fabric is woven by using fine wire rods made of stainless steel and having a diameter of 10-50 μm for warp and weft, and stainless steel is sputter-deposited on both sides It is known that the above warp and weft are coated with a vapor deposition film of stainless steel having an amorphous structure and a thickness of 10 to 1000 nm (see Japanese Patent Laid-Open No. 8-118835). This printing screen gauze has better wettability with printing inks, toners, and printing paste than those without the above-mentioned vapor deposition film, and thus allows precise printing.
【０００３】しかしながら、上記の印刷用スクリーン紗
は、経糸および緯糸の表面がステンレス鋼で形成されて
いて光反射性を有するため、写真製版に際し、紫外線硬
化性樹脂からなる水溶性乳剤を塗布、乾燥して感光層を
形成し、得られたスクリーンの片面に原板マスクを介し
て紫外線を照射し露光したとき、感光層に入った紫外線
の一部が経糸または緯糸の表面で反射し、この反射光が
本来露光の不要な部分の感光層を感光させて硬化し、そ
のため硬化部分の面積が設計よりも広くなり、印刷イン
キ等の通過する孔が狭くなるという問題があった。However, since the warp and weft surfaces of the above-mentioned printing screen gauze are made of stainless steel and have light reflectivity, a water-soluble emulsion composed of an ultraviolet curable resin is applied and dried at the time of photolithography. Then, a photosensitive layer is formed, and when one side of the resulting screen is exposed to ultraviolet light through a mask for the original plate, part of the ultraviolet light that has entered the photosensitive layer is reflected on the surface of the warp or weft, and this reflected light However, there is a problem that the area of the cured portion becomes larger than designed and the holes through which printing ink and the like pass become narrower because the photosensitive layer of the portion which originally does not need to be exposed is exposed and cured.
【０００４】図１は、従来のスクリーン紗１０に感光層
１１を形成した状態の断面図を示し、スクリーン紗１０
は、ステンレス鋼製の経糸１０ａと緯糸（図示されてい
ない）とで製織され、ステンレス鋼の蒸着膜（図示され
ていない）を有しており、感光層１１は前記の紫外線硬
化性樹脂で形成されている。１２は原板マスクであり、
透明部１２ａとシャドー部１２ｂとからなり、この原板
マスク１２を感光層１１の表面に重ね、紫外線Ｌを照射
すると、その一部はシャドー部１２ｂによって感光層１
１への入射を遮られるが、残りは透明部１２ａを経て感
光層１１へ入射し、感光、硬化させる。そして、感光層
１１に入射した紫外線Ｌは、更に経糸１０ａまたは緯糸
に当たって反射するものと、当たらずに感光層１１を貫
通するものとに分かれ、当たって反射したものの一部Ｌ
ａは、シャドー部１２ｂの下の感光層１１に入射し、こ
の部分を感光、硬化させる。FIG. 1 is a sectional view showing a state in which a photosensitive layer 11 is formed on a conventional screen gauze 10.
Is woven with a stainless steel warp 10a and a weft (not shown), has a stainless steel vapor deposition film (not shown), and the photosensitive layer 11 is formed of the ultraviolet curable resin described above. Has been done. 12 is an original mask,
A transparent portion 12a and a shadow portion 12b are formed. When the original mask 12 is overlapped on the surface of the photosensitive layer 11 and ultraviolet rays L are irradiated, a part of the mask 12 is exposed by the shadow portion 12b.
1 is blocked, but the rest is incident on the photosensitive layer 11 through the transparent portion 12a to be exposed and cured. The ultraviolet rays L that have entered the photosensitive layer 11 are further divided into those which are reflected by hitting the warp threads 10a or wefts and those which penetrate the photosensitive layer 11 without hitting them, and a part L of the rays that are hit and reflected.
The light a enters the photosensitive layer 11 below the shadow portion 12b, and this portion is exposed and cured.
【０００５】上記の露光が終わると、原板マスク１２を
外したスクリーン紗１０が感光層１１と共に現像に付さ
れ、この処理で感光層１１の感光部分を残して非感光部
分が除去され、印刷インキや塗料の通過可能な孔が形成
され、印刷版（スクリーン型）１３（図２参照）が得ら
れる。したがって、上記シャドー部１２ｂの下方部分に
入射する紫外線Ｌａが存在しない場合は、図２（ａ）に
示すように、印刷版１３には、シャドー部１２ｂと等し
い形の孔１３ａが形成されるが、実際には上記シャドー
部１２ｂの下方に入射する紫外線Ｌａが存在するため、
図２（ｂ）に示すように、印刷版１３に形成される孔１
３ａは、上部がシャドー部１２ｂとほぼ等しく、下部が
狭い台形断面となる。After the above exposure, the screen cloth 10 from which the original mask 12 has been removed is developed together with the photosensitive layer 11, and in this process, the non-exposed portion of the photosensitive layer 11 is removed, leaving the non-exposed portion. A hole through which a paint or paint can pass is formed, and a printing plate (screen type) 13 (see FIG. 2) is obtained. Therefore, when there is no ultraviolet ray La incident on the lower portion of the shadow portion 12b, a hole 13a having the same shape as the shadow portion 12b is formed in the printing plate 13 as shown in FIG. 2 (a). Actually, since the ultraviolet ray La which is incident below the shadow portion 12b exists,
As shown in FIG. 2B, the holes 1 formed in the printing plate 13
3a has a trapezoidal cross section in which the upper portion is substantially equal to the shadow portion 12b and the lower portion is narrow.
【０００６】[0006]
【発明が解決しようとする課題】この発明は、ステンレ
ス鋼線を経糸、緯糸とするスクリーン紗を改良すること
により、写真製版の際にシャドー部下方の感光層に紫外
線が入射するのを防いで感光層に原板マスクと等しい形
の孔を形成し、もって印刷インキ、トナー、捺染糊およ
びペースト等の透過性を向上し、プリント回路等で要求
される精密印刷を可能にするものである。SUMMARY OF THE INVENTION The present invention improves a screen gauze using a stainless steel wire as a warp and a weft to prevent ultraviolet rays from entering a photosensitive layer below a shadow portion during photolithography. By forming holes in the photosensitive layer in the same shape as the original plate mask, the permeability of printing ink, toner, printing paste, paste and the like is improved, thereby enabling precision printing required in a printed circuit or the like.
【０００７】[0007]
【課題を解決するための手段】この発明に係る印刷用ス
クリーン紗は、ステンレス鋼の細い線材を経糸および緯
糸に用いて製織された紗状織物の少なくとも片面が金属
の酸化物、窒化物もしくは炭化物又はフッ化マグネシウ
ムからなる紫外線用の反射防止膜で被覆されていること
を特徴とする。A screen mesh for printing according to the present invention is a gauze-like fabric woven using a thin wire of stainless steel for a warp and a weft, and at least one surface of which is a metal oxide, nitride or carbide. Alternatively, it is characterized by being coated with an antireflection film for ultraviolet rays made of magnesium fluoride.
【０００８】この発明に係るスクリーン紗は、写真製版
の際、常法にしたがって紫外線硬化性樹脂からなる感光
層と一体化し、得られたスクリーンの表面、すなわち経
糸および緯糸が反射防止膜で被覆されている側に原板マ
スクを重ねて紫外線を照射し、次いで現像、水洗により
非露光部分を洗い流して印刷版（スクリーン型）とされ
るが、経糸および緯糸を構成するステンレス鋼の細い線
材の少なくとも片面が紫外線用の反射防止膜で被覆され
ているので、紫外線照射の際、反射防止膜からの反射光
が大幅に減少する。The screen gauze according to the present invention is integrated with a photosensitive layer made of an ultraviolet curable resin according to a conventional method at the time of photolithography, and the surface of the obtained screen, that is, the warp and the weft is covered with an antireflection film. The original plate mask is laid on the side where it is exposed to ultraviolet rays, and then the unexposed area is washed away by development and washing to form a printing plate (screen type). At least one side of the thin wire made of stainless steel that constitutes the warp and weft. Is coated with an anti-reflection film for ultraviolet rays, so that the amount of light reflected from the anti-reflection film is greatly reduced during ultraviolet irradiation.
【０００９】そして、反射防止膜で被覆されない部分が
あっても、その部分は原板マスクの反対側に位置するの
で、露光用の紫外線が当たることはない。したがって、
原板マスクのシャドー部下方の感光剤に紫外線が入射し
て該部が硬化することはなく、そのため現像、水洗によ
ってシャドー部と同一形状の孔が形成され、原板マスク
と等しい型模様の印刷版（スクリーン型）が得られる。Even if there is a portion which is not covered with the antireflection film, since that portion is located on the opposite side of the original mask, it is not exposed to the ultraviolet rays for exposure. Therefore,
Ultraviolet rays do not enter the photosensitizer below the shadow portion of the original mask and the area is not cured. Therefore, a hole having the same shape as the shadow portion is formed by development and washing, and a printing plate with the same pattern as the original mask ( Screen type) is obtained.
【００１０】上記の反射防止膜は、チタン、亜鉛、ニッ
ケル、クロームおよびケイ素等の金属の酸化物、窒化物
もしくは炭化物又はフッ化マグネシウムで形成される。
この反射防止膜は、特に物理蒸着膜が好ましい。これら
の物理蒸着膜は、経糸および緯糸を構成するステンレス
鋼と共に導電性を有しているので、静電気の帯電による
障害も防ぐことができる。そして、物理蒸着膜であるた
め、耐剥離性に優れる。また、物理蒸着を紗状織物の表
面に向けて施すことにより、蒸着膜が経糸および緯糸の
表面側半周を裏面側へ越えて広く形成される。The above antireflection film is formed of oxides, nitrides or carbides of metals such as titanium, zinc, nickel, chrome and silicon, or magnesium fluoride.
The antireflection film is preferably a physical vapor deposition film. Since these physical vapor deposition films have electrical conductivity together with the stainless steel forming the warp and the weft, it is possible to prevent troubles due to electrostatic charging. Since it is a physical vapor deposition film, it has excellent peeling resistance. Further, by performing physical vapor deposition toward the surface of the gauze-like woven fabric, the vapor deposition film is formed widely across the front side half circumference of the warp and the weft to the back side.
【００１１】図３は、この発明に係るスクリーン紗１５
の断面を示し、ステンレス鋼線からなる経糸１６および
緯糸１７の表面側にそれぞれ反射防止膜１６ａおよび１
７ａが形成されている。スクリーン紗１５の片側（図３
の上方）から物理蒸着法によって前記金属酸化物等の蒸
気を下向きに飛ばした場合は、蒸気が主として経糸１６
および緯糸１７の上面に付着して上記の金属酸化物等と
ほぼ同じ組成の金属酸化物からなる蒸着膜が形成され、
その厚みを適当に設定することにより反射防止膜１６
ａ、１７ａを構成するが、金属酸化物が蒸気の形で飛ば
されるため、一部が経糸１６、緯糸１７の下面側にも回
って付着し、反射防止膜１６ａ、１７ａが経糸１６、緯
糸１７の片側半分よりも広い範囲にわたって形成され
る。FIG. 3 shows a screen gauze 15 according to the present invention.
Of the anti-reflection coatings 16a and 1 on the surface side of the warp 16 and the weft 17 made of stainless steel wire, respectively.
7a is formed. One side of screen gauze 15 (Fig. 3
When the vapor of the metal oxide or the like is blown downward by a physical vapor deposition method from above (from above), the vapor mainly
And adheres to the upper surface of the weft yarn 17 to form a vapor deposition film made of a metal oxide having substantially the same composition as the above metal oxide,
By setting the thickness appropriately, the antireflection film 16
a and 17a, the metal oxides are blown in the form of steam, so that part of the metal oxide also rotates around and adheres to the lower surfaces of the warp yarn 16 and the weft yarn 17, and the antireflection films 16a and 17a form the warp yarn 16 and the weft yarn 17. Is formed over a wider area than one half of the.
【００１２】上記反射防止膜を備えた印刷用スクリーン
紗の反射率は、特に波長２５０〜４５０ｎｍの紫外線に
対して１５％以下であることが好ましく、１５％を超え
た場合は、設計通りの製版が困難になる。上記の反射率
を得るためには、前記の物理蒸着を行う際の蒸着時間等
を制御することにより、上記反射防止膜の厚みを３〜２
５０ｎｍに設定することが好ましい。また、透過率は、
上記の紫外線に対して４５％以上が好ましい。そして、
紫外線として上記波長のものを選択することにより、上
記範囲の紫外線に感光性の紫外線硬化樹脂を使用するこ
とが可能になり、取扱が容易になる。また、上記の反射
防止膜は、単層でもよいが、屈折率を異にする２種以上
の反射防止膜からなる多層構造として反射率を一層小さ
くすることもできる。また、上記の反射防止膜を表裏両
面に形成した場合は、印刷インキ、トナー、捺染糊およ
びペースト等の透過性が一層向上する。The reflectance of the printing screen gauze provided with the antireflection film is preferably 15% or less for ultraviolet rays having a wavelength of 250 to 450 nm, and when it exceeds 15%, the plate-making according to the design is performed. Becomes difficult. In order to obtain the above reflectance, the thickness of the antireflection film is adjusted to 3 to 2 by controlling the vapor deposition time when performing the physical vapor deposition.
It is preferably set to 50 nm. Also, the transmittance is
It is preferably 45% or more with respect to the above ultraviolet rays. And
By selecting the ultraviolet light having the above wavelength, it becomes possible to use the ultraviolet curable resin which is sensitive to the ultraviolet light in the above range, and the handling becomes easy. The above antireflection film may be a single layer, but it is also possible to further reduce the reflectance as a multilayer structure composed of two or more antireflection films having different refractive indexes. Further, when the above antireflection film is formed on both front and back surfaces, the permeability of printing ink, toner, printing paste, paste and the like is further improved.
【００１３】この発明において、上記の経糸および緯糸
を構成するステンレス鋼は、マルテンサイト系、フェラ
イト系、オーステナイト系等のステンレス鋼であり、特
にオーステナイト系ステンレス鋼の中でモリブデンを添
加したもの（例えば、ＳＵＳ３１６）は、耐食性、耐塩
素性および耐酸性等に優れる点で特に好ましい。この発
明では、上記のステンレス鋼からなる細い線材が織物の
経糸および緯糸として使用されるが、その太さは、１０
〜５０μｍ、特に１５〜３０μｍが好ましく、１０μｍ
未満では、細過ぎて切断し易く、反対に５０μｍを超す
と細い線の印刷が著しく困難になる。In the present invention, the stainless steel constituting the above warp and weft is a martensitic, ferritic, austenitic stainless steel or the like, and in particular, austenitic stainless steel to which molybdenum is added (for example, , SUS316) are particularly preferable because they are excellent in corrosion resistance, chlorine resistance, acid resistance and the like. In the present invention, the thin wire made of the above stainless steel is used as the warp and the weft of the woven fabric, and the thickness thereof is 10
˜50 μm, especially 15-30 μm is preferred, 10 μm
If it is less than 50 μm, it is too thin to be easily cut. On the other hand, if it exceeds 50 μm, printing of fine lines becomes extremely difficult.
【００１４】上記スクリーン紗の密度は、１００〜８０
０メッシュ、特に２５０〜７００メッシュが好ましい。
この密度が１００メッシュ未満では細い線からなる精密
な図柄の印刷、捺染が不可能になり、反対に８００メッ
シュを超した場合は、製造が困難になる。なお、上記ス
クリーン紗の織り組織は、平組織等の目ずれの生じ難
い、縦横均一な開口面を有する組織が好ましい。The density of the screen mesh is 100-80.
0 mesh, particularly 250 to 700 mesh is preferable.
If the density is less than 100 mesh, it is impossible to print and print a precise pattern composed of fine lines, and if the density exceeds 800 mesh, manufacturing becomes difficult. The screen gauze preferably has a woven structure, such as a flat structure, in which misalignment is unlikely to occur and which has uniform longitudinal and lateral opening surfaces.
【００１５】[0015]
【発明の実施の形態】実施形態１
線径１５〜３０μｍのステンレス鋼線を経糸および緯糸
に用いて２５０〜７００メッシュの平織物を製織し、こ
れを紗状織物（スクリーン紗原反）とし、その表面側に
酸化チタン等の金属酸化物をスパッタ蒸着して経糸およ
び緯糸に厚み３〜２５０ｎｍの反射防止膜を形成する。
得られたスクリーン紗に紫外線硬化性樹脂からなる水溶
性乳剤を塗布、乾燥して感光層を形成し、その表面（経
糸・緯糸の反射防止膜側）に原板マスクを重ねて紫外線
を照射し、次いで現像、水洗すると、原板マスクと同じ
型模様を備えた印刷版（スクリーン型）が得られる。そ
して、この印刷版は、濡れ性および導電性を兼備してい
るため、印刷時の裏回りも良好で、かつ静電気の帯電に
よる障害もなく、極めて精密な印刷が可能である。BEST MODE FOR CARRYING OUT THE INVENTION Embodiment 1 A plain weave of 250 to 700 mesh is woven using a stainless steel wire having a wire diameter of 15 to 30 μm for warp and weft, and this is used as a woven fabric (screen fabric). A metal oxide such as titanium oxide is sputter-deposited on the surface side to form an antireflection film having a thickness of 3 to 250 nm on the warp and the weft.
The resulting screen gauze is coated with a water-soluble emulsion made of an ultraviolet curable resin and dried to form a photosensitive layer, and the surface (the anti-reflective film side of the warp and weft) is covered with a master mask and irradiated with ultraviolet rays, Next, by developing and washing with water, a printing plate (screen type) having the same pattern as the original mask is obtained. Further, since this printing plate has both wettability and conductivity, the backing during printing is good, and there is no obstacle due to electrostatic charging, and extremely precise printing is possible.
【００１６】図４は、スパッタリング装置の一例を示
し、密閉可能なチャンバ２０の下部にチタンからなる平
板状のターゲット２１が表面を上にして中空のターゲッ
トソース２２上に固定され、このターゲットソース２２
に通される冷水で上記ターゲット２１が下面から冷却さ
れる。このターゲット２１の上方左右にアノード２３が
水平に設置され、このアノード２３およびターゲット２
１間に直流電源Ｅによって５００〜１０００Ｖの直流電
圧が印加される。FIG. 4 shows an example of a sputtering apparatus, in which a flat plate-like target 21 made of titanium is fixed to a hollow target source 22 with its surface facing upward under a chamber 20 which can be closed.
The target 21 is cooled from the lower surface by cold water passed through. Anodes 23 are horizontally installed above and to the left and right of the target 21, respectively.
A DC voltage of 500 to 1000 V is applied by the DC power supply E during the period 1.
【００１７】上記アノード２３の上方に水冷シリンダ２
４が水平に、かつ回転自在に設置され、その左上方に前
記のステンレス鋼線からなる紗状織物Ｆの送出し軸２５
が、また右上方にスクリーン紗Ｆａの巻取り軸２６がそ
れぞれ水平に、かつ回転自在に設置される。そして、送
出し軸２５に巻かれた紗状織物Ｆが引出され、左上部の
ガイドローラ２７ａを経て上記水冷シリンダ２４に巻回
され、右上部のガイドローラ２７ｂを経て巻取り軸２６
に巻き取られる。また、チャンバ２０に真空ポンプ２
８、アルゴンガス供給用ガスボンベ２９ａおよび酸素ガ
ス供給用ガスボンベ２９ｂがそれぞれ接続される。A water-cooled cylinder 2 is provided above the anode 23.
4 is horizontally and rotatably installed, and the feeding shaft 25 of the gauze-like fabric F made of the stainless steel wire is provided on the upper left side thereof.
On the upper right side, the winding shafts 26 of the screen mesh Fa are horizontally and rotatably installed. Then, the gauze-like fabric F wound around the delivery shaft 25 is drawn out, wound around the water cooling cylinder 24 through the upper left guide roller 27a, and wound through the upper right guide roller 27b.
To be wound up. In addition, the vacuum pump 2 is installed in the chamber 20.
8. An argon gas supply gas cylinder 29a and an oxygen gas supply gas cylinder 29b are connected to each other.
【００１８】上記の装置において、送出し軸２５、巻取
り軸２６および水冷シリンダ２４を回転し、紗状織物Ｆ
を反時計方向に所定の速度で送りながら水冷シリンダ２
４を冷却し、上記紗状織物Ｆの表面温度を６０℃以下に
維持する。一方、真空ポンプ２８を駆動してチャンバ２
０内圧力を１．３×１０-3Pa程度に減圧し、次いでアル
ゴンガス供給用ガスボンベ２９ａからアルゴンガスを導
入してチャンバ２０内圧力を６．６×１０-2Pa程度に調
整し、続いて酸素ガス供給用ガスボンベ２９ｂから酸素
ガスを導入してチャンバ２０内圧力を１．３×１０-1Pa
程度に調整し、しかるのち上記のアノード２３およびタ
ーゲット２１間に５００〜１０００Ｖの直流電圧を印加
してターゲット２１からチタンを飛び出させ、このチタ
ンを酸素ガスと反応させて酸化チタンとし、この酸化チ
タンを上記紗状織物Ｆの経糸および緯糸上に付着させ、
経糸および緯糸の半周以上を酸化チタンの蒸着膜で被覆
する。このとき、紗状織物Ｆの送り速度を調整して蒸着
膜の厚さを３〜２５０ｎｍに制御して反射防止膜とし、
スクリーン紗Ｆａを得る。In the above apparatus, the delivery shaft 25, the winding shaft 26 and the water cooling cylinder 24 are rotated to form a gauze fabric F.
Water-cooling cylinder 2 while feeding counterclockwise at a predetermined speed
4 is cooled and the surface temperature of the gauze-like fabric F is maintained at 60 ° C. or lower. Meanwhile, the vacuum pump 28 is driven to drive the chamber 2
0 internal pressure is reduced to about 1.3 × 10 −3 Pa, and then argon gas is introduced from the argon gas supply gas cylinder 29a to adjust the internal pressure of the chamber 20 to about 6.6 × 10 −2 Pa. Oxygen gas is introduced from the oxygen gas supply gas cylinder 29b to adjust the internal pressure of the chamber 20 to 1.3 × 10 -1 Pa.
After adjusting to a certain degree, a DC voltage of 500 to 1000 V is applied between the anode 23 and the target 21 to eject titanium from the target 21, and the titanium is reacted with oxygen gas to form titanium oxide. To the warp and weft of the above-mentioned gauze fabric F,
Half or more of the warp and weft are covered with a titanium oxide vapor deposition film. At this time, the feeding speed of the gauze-like fabric F is adjusted to control the thickness of the vapor deposition film to 3 to 250 nm to form an antireflection film,
Obtain the screen cloth Fa.
【００１９】なお、ターゲット２１のチタンに代えて亜
鉛、ニッケル、クローム、ケイ素等を使用した場合は、
亜鉛やニッケル、クローム、ケイ素の酸化物からなる反
射防止膜が得られる。When zinc, nickel, chrome, silicon or the like is used instead of titanium for the target 21,
An antireflection film made of an oxide of zinc, nickel, chrome or silicon can be obtained.
【００２０】実施形態２
上記の実施形態１において、酸素ガスに代えて窒素ガス
を用い、その他は実施形態１と同様にしてチタン、亜
鉛、ニッケル、クローム、ケイ素等の金属を窒素ガスと
反応させ、これによって窒化物からなる反射防止膜を形
成する。Embodiment 2 In the above-described Embodiment 1, nitrogen gas is used instead of oxygen gas, and the same as in Embodiment 1 except that titanium, zinc, nickel, chrome, silicon or another metal is reacted with nitrogen gas. Thus, an antireflection film made of nitride is formed.
【００２１】実施形態３
上記の実施形態１において、酸素ガスに代えてメタンガ
スを用い、その他は実施形態１と同様にしてチタン、亜
鉛、ニッケル、クローム、ケイ素等の金属を、メタンガ
スから分離した炭素ガスと反応させ、これによって炭化
物からなる反射防止膜を形成する。Embodiment 3 In the above-mentioned Embodiment 1, methane gas is used instead of oxygen gas, and the same as in Embodiment 1 except that titanium, zinc, nickel, chrome, silicon and other metals are separated from methane gas. It reacts with gas, thereby forming an antireflection film made of carbide.
【００２２】実施形態４
上記の実施形態１において、ターゲット２１のチタンに
代えてフッ化マグネシウムを使用し、かつ酸素ガス供給
用ガスボンベ２９ｂの使用を止め、アルゴンガスの雰囲
気下でスパッタリングを行うことにより、フッ化マグネ
シウムからなる反射防止膜を形成する。Embodiment 4 In Embodiment 1 described above, magnesium fluoride is used in place of titanium of the target 21, the use of the oxygen gas supply gas cylinder 29b is stopped, and sputtering is performed in an argon gas atmosphere. An antireflection film made of magnesium fluoride is formed.
【００２３】実施形態５
上記の実施形態１〜４において、スクリーン紗原反Ｆに
対する片側からのスパッタリングが終わった後、この原
反Ｆを裏返しに取付けて２度目のスパッタリングを裏側
から行うことにより、経糸および緯糸の全面に反射防止
膜を形成することができ、この場合は濡れ性が一層向上
する。そして、図５に示すように、チャンバ内に２組の
スパッタリング装置を設置すると、表裏のスパッタリン
グを連続して行うことができる。Embodiment 5 In Embodiments 1 to 4 described above, after the screen cloth raw fabric F has been sputtered from one side, the raw fabric F is attached to the inside out and a second sputtering is performed from the back side. An antireflection film can be formed on the entire surface of the warp and the weft, and in this case, the wettability is further improved. Then, as shown in FIG. 5, when two sets of sputtering devices are installed in the chamber, front and back sputtering can be continuously performed.
【００２４】図５において、３０は密閉チャンバであ
り、その中央部左右に第１水冷シリンダー３１および第
２水冷シリンダー３２が並設され、左側の第１水冷シリ
ンダー３１が反時計方向に、また右側の第２水冷シリン
ダー３２が時計方向にそれぞれ駆動により回転する。In FIG. 5, reference numeral 30 denotes a closed chamber, a first water-cooling cylinder 31 and a second water-cooling cylinder 32 are juxtaposed on the left and right of the central portion thereof, and the first water-cooling cylinder 31 on the left side is counterclockwise and the right side is on the right side. The second water-cooled cylinders 32 are driven to rotate in the clockwise direction.
【００２５】上記第１水冷シリンダー３１の上方に紗状
織物Ｆの送出し軸３３が、また上記第２水冷シリンダー
３２の上方にスクリーン紗Ｆの巻取り軸３４がそれぞれ
回転自在に設置される。そして、送出し軸３３から引出
された紗状織物Ｆは、第１ガイドローラ３５ａを経て第
１水冷シリンダー３１に裏面が接するように巻回され、
この第１水冷シリンダー３１から第２ガイドローラ３５
ｂを経て離脱し、上方の第３ガイドローラ３５ｃ、第４
ガイドローラ３５ｄに導かれて上記巻取り軸３４の上を
通り、下方の第５ガイドローラ３５ｅを経て第２水冷シ
リンダー３２に表面が接するように巻回され、この第２
水冷シリンダー３２から第６ガイドローラ３５ｆを経て
離脱し、スクリーン紗Ｆａとして巻取り軸３４に引取ら
れる。Above the first water-cooling cylinder 31, a delivery shaft 33 of the gauze fabric F is rotatably installed, and above the second water-cooling cylinder 32, a winding shaft 34 of the screen gauze F is rotatably installed. Then, the gauze-like fabric F drawn from the delivery shaft 33 is wound so that the back surface is in contact with the first water-cooled cylinder 31 via the first guide roller 35a,
From the first water cooling cylinder 31 to the second guide roller 35.
The second guide roller 35c, the fourth guide roller 35c
It is guided by a guide roller 35d, passes over the winding shaft 34, passes through a fifth guide roller 35e below, and is wound so that its surface is in contact with the second water-cooled cylinder 32.
The water-cooled cylinder 32 is separated from the water-cooled cylinder 32 through the sixth guide roller 35f and is taken up by the take-up shaft 34 as a screen mesh Fa.
【００２６】上記の第１水冷シリンダー３１および第２
水冷シリンダー３２の下方には、それぞれ左右一対の第
１アノード３７および第２アノード３８が設置される。
そして、第１アノード３７および第２アノード３８の下
方にそれぞれ水冷式の第１ターゲットソース３９および
第２ターゲットソース４０が設置され、これら第１ター
ゲットソース３９および第２ターゲットソース４０の上
にそれぞれチタンからなる平板状ターゲット３１がそれ
ぞれ固定され、第１アノード３７と第１ターゲットソー
ス３９の間および第２アノード３８と第２ターゲットソ
ース４０の間にそれぞれ電圧５００〜１０００Ｖの直流
電源Ｅが介設される。The above-mentioned first water-cooled cylinder 31 and second
Below the water cooling cylinder 32, a pair of left and right first anodes 37 and second anodes 38 are installed.
Then, a water-cooled first target source 39 and a second target source 40 are installed below the first anode 37 and the second anode 38, respectively, and titanium is placed on the first target source 39 and the second target source 40, respectively. The flat plate-shaped targets 31 each made up of are fixed, and a DC power source E having a voltage of 500 to 1000 V is provided between the first anode 37 and the first target source 39 and between the second anode 38 and the second target source 40, respectively. It
【００２７】上記の構造において、送出し軸３３、巻取
り軸３４および水冷シリンダー３１、３２を回転し、送
出し軸３３から紗状織物Ｆを所定の速度で送出し、第１
水冷シリンダー３１および第２水冷シリンダー３２に順
に接触させて巻取り軸３４で引取りながら、第１水冷シ
リンダー３１では上記の紗状織物Ｆを裏側から冷却し、
また第２水冷シリンダー３２では表側から冷却する。一
方、密閉チャンバ３０に接続されている真空ポンプ（図
示されていない）を駆動して密閉チャンバ３０の内部圧
力を１．３×１０-3Pa程度に減圧し、次いでアルゴンガ
ス供給用ガスボンベ（図示されていない）からアルゴン
ガスを導入して上記密閉チャンバ３０の内部圧力を６．
６×１０-2Pa程度に調整し、更に酸素ガス供給用ガスボ
ンベ（図示されていない）から酸素ガスを導入してチャ
ンバ３０内圧力を１．３×１０-1Pa程度に調整する。In the above structure, the delivery shaft 33, the winding shaft 34 and the water-cooled cylinders 31, 32 are rotated to deliver the gauze-like fabric F from the delivery shaft 33 at a predetermined speed.
While being brought into contact with the water-cooled cylinder 31 and the second water-cooled cylinder 32 in order and taken up by the take-up shaft 34, the first water-cooled cylinder 31 cools the above-mentioned woven cloth F from the back side,
Further, the second water cooling cylinder 32 is cooled from the front side. Meanwhile, a vacuum pump (not shown) connected to the closed chamber 30 is driven to reduce the internal pressure of the closed chamber 30 to about 1.3 × 10 −3 Pa, and then a gas cylinder for supplying an argon gas (shown in the drawing). Argon gas is introduced into the closed chamber 30 to adjust the internal pressure to 6.
The pressure in the chamber 30 is adjusted to about 6 × 10 -2 Pa, and oxygen gas is introduced from a gas cylinder (not shown) for supplying oxygen gas to adjust the internal pressure of the chamber 30 to about 1.3 × 10 -1 Pa.
【００２８】しかるのち上記の第１アノード３７・第１
ターゲットソース３９間および第２アノード３８・第２
ターゲットソース４０間にそれぞれ直流電圧を印加して
平板状ターゲット４１からチタンを飛び出させ、酸素と
反応させて酸化チタンとし、これを第１水冷シリンダー
３１上の紗状織物Ｆの表面および第２水冷シリンダー３
２上の紗状織物Ｆの裏面にそれぞれ付着させ、急冷して
アモルファス構造の厚み３〜２５０ｎｍの反射防止膜を
形成してスクリーン紗Ｆａを得る。Thereafter, the above-mentioned first anode 37 and first
Between target source 39 and second anode 38 / second
A direct current voltage is applied between the target sources 40 to cause titanium to fly out from the flat target 41 and react with oxygen to form titanium oxide, which is used as the surface of the woven cloth F on the first water-cooling cylinder 31 and the second water-cooling. Cylinder 3
2 is attached to the back surface of the gauze-like fabric F on 2 respectively, and is rapidly cooled to form an antireflection film having a thickness of 3 to 250 nm and having an amorphous structure, to obtain a screen gauze Fa.
【００２９】なお、左右のターゲット４１のチタンに代
えて亜鉛、ニッケル、クローム、ケイ素等を使用した場
合は、その酸化物からなる反射防止膜が得られる。ま
た、酸素ガスに代えて窒素ガスを用いた場合は、窒化物
からなる反射防止膜が得られる。また、酸素ガスに代え
てメタンガスを用いた場合は、炭化物からなる反射防止
膜が得られる。また、ターゲット４１のチタンに代えて
フッ化マグネシウム使用し、かつ酸素ガスの使用を止
め、アルゴンガスの雰囲気下でスパッタリングを行った
場合は、フッ化マグネシウムからなる反射防止膜が得ら
れる。When zinc, nickel, chrome, silicon or the like is used instead of titanium of the left and right targets 41, an antireflection film made of the oxide is obtained. When nitrogen gas is used instead of oxygen gas, an antireflection film made of nitride is obtained. When methane gas is used instead of oxygen gas, an antireflection film made of carbide is obtained. Further, when magnesium fluoride is used instead of titanium of the target 41, the use of oxygen gas is stopped, and sputtering is performed in an atmosphere of argon gas, an antireflection film made of magnesium fluoride is obtained.
【００３０】[0030]
【実施例】オーステナイト系ステンレス鋼（ＳＵＳ３１
６）からなる線径１８μｍの線材を経糸および緯糸とす
る５００メッシュの平織物を使用し、前記実施形態５の
方法で表裏両面にスパッタリングを行い、実施例１、２
の印刷用スクリーン紗を製造した。また、実施形態５に
おいて、ターゲットにステンレス鋼製を用い、雰囲気ガ
スにアルゴンガスを用いる以外は実施形態５と同様にし
て比較例１のスクリーン紗を製造した。また、上記の線
材からなる平織物をそのまま用いて比較例２のスクリー
ン紗とした。これらのスクリーン紗の特性を下記の表１
に示す。[Example] Austenitic stainless steel (SUS31
Using a 500-mesh plain weave having a wire material of 6) having a wire diameter of 18 μm as warps and wefts, sputtering was performed on both the front and back sides by the method of the fifth embodiment, and the first and second embodiments were performed.
The screen gauze for printing of was manufactured. Further, in Example 5, a screen gauze of Comparative Example 1 was manufactured in the same manner as in Example 5 except that stainless steel was used as the target and argon gas was used as the atmosphere gas. Further, the plain weave made of the above wire was used as it was to prepare a screen gauze of Comparative Example 2. The characteristics of these screen gauze are shown in Table 1 below.
Shown in.
【００３１】[0031]
【表１】 [Table 1]
【００３２】上記の実施例１、２および比較例１、２の
スクリーン紗をそれぞれスクリーン枠（サイズ３２０×
３２０mm）に張り、感光乳剤を塗布し、その中央部（サ
イズ１００×１００mm）に原板マスクを密着した。次い
で、波長２００〜４５０ｎｍの紫外線を照射し、現像し
て製版し、ＵＶペースト（ソマール社製「ＥＲ−７０
Ｂ」）、ガラスペースト（奥野製薬社製「ＥＬＤ−５２
０」）および銀ペースト（アサヒ化学社製「ＬＳ−５０
４ＨＣ」）を用いて印刷テストを行い、印刷前と印刷後
の被印刷物（コート紙）の重量を測定し、その差からペ
ーストの塗布量を算出し、この塗布量で印刷性能を比較
した。The screen gauze of each of Examples 1 and 2 and Comparative Examples 1 and 2 described above was screen frame (size 320 ×).
320 mm), a photosensitive emulsion was applied, and a master mask was adhered to the central portion (size 100 × 100 mm). Then, it is irradiated with ultraviolet rays having a wavelength of 200 to 450 nm, developed and made into a plate, and then UV paste (manufactured by Somar "ER-70" is used.
B)), glass paste ("ELD-52" manufactured by Okuno Pharmaceutical Co., Ltd.)
0 ”) and silver paste (“ LS-50 ”manufactured by Asahi Chemical Co., Ltd.)
4HC ") was used to perform a printing test, the weight of the material to be printed (coated paper) before and after printing was measured, and the coating amount of the paste was calculated from the difference, and the printing performance was compared with this coating amount.
【００３３】印刷機には小型印刷機（ニューロング精密
工業株式会社製、商品名「ＬＳ１５ＧＸ」）を使用し、
スキージ圧力を３．５kg／cm2 に、押込み量（被印刷物
にスキージゴムの先端を接触させ、この位置を基準にし
て印圧を加えた際のスキージヘッドの下降距離）を０．
３ mm に、オフコンタクト（刷版の印刷面と被印刷物間
のギャップ）を１．０mmに、スキージ硬度を７０度に、
スキージ角度を７５度に、印刷速度を１００mm／秒 に
それぞれ設定した。ただし、試料番号１〜３のそれぞれ
で１０回ずつペースト塗布量を試験し、その算術平均を
算出した。その結果を下記の表２に示す。A small printing machine (trade name "LS15GX" manufactured by New Long Precision Co., Ltd.) is used as the printing machine.
The squeegee pressure is 3.5 kg / cm 2 , and the pushing amount (the squeegee head descending distance when the tip of the squeegee rubber is brought into contact with the printing object and printing pressure is applied with this position as a reference) is set to 0.
3 mm, off-contact (gap between printing surface of printing plate and substrate) 1.0 mm, squeegee hardness 70 degrees,
The squeegee angle was set to 75 degrees and the printing speed was set to 100 mm / sec. However, the paste application amount was tested 10 times for each of the sample numbers 1 to 3, and the arithmetic average thereof was calculated. The results are shown in Table 2 below.
【００３４】[0034]
【表２】 [Table 2]
【００３５】上記の表１、２に示すとおり、実施例１、
２は、特に可視光領域に近い波長３６０ｎｍの紫外線に
対する反射率が小さいため、平均塗布量が大きくなり、
小さい孔や幅の狭いスリットの形成が可能になり、精密
印刷が可能であった。一方、比較例１、２は、反射率が
大きいため、平均塗布量が少なくなり、実施例に比べて
印刷性が劣っていた。As shown in Tables 1 and 2 above, Example 1,
No. 2 has a low reflectance for ultraviolet rays having a wavelength of 360 nm, which is particularly close to the visible light region, so the average coating amount becomes large
It became possible to form small holes and narrow slits, enabling precision printing. On the other hand, in Comparative Examples 1 and 2, the reflectance was high, the average coating amount was small, and the printability was inferior to that of the Examples.
【００３６】[0036]
【発明の効果】上記のとおり、この発明に係る印刷用ス
クリーン紗は、写真製版に際し、反射防止膜を有しない
もに比べて再現性に優れ、原板マスクと等しい型模様の
印刷版（スクリーン型）が得られ、かつ濡れ性も良好で
あるため、印刷インキ等の透過性が向上し、精密印刷や
精密捺染が可能になる。特に請求項２に係る発明は、反
射防止膜の耐剥離性に優れている。また、請求項３に係
る発明は、反射防止膜の反射率を限定するものであるか
ら、設計通りの製版が一層容易になる。INDUSTRIAL APPLICABILITY As described above, the printing screen gauze according to the present invention is excellent in reproducibility in photolithography as compared with the case where it does not have an antireflection film, and has a pattern similar to that of the original mask (screen type). ) Is obtained and the wettability is good, the permeability of printing ink and the like is improved, and precision printing and precision printing become possible. Particularly, the invention according to claim 2 is excellent in peeling resistance of the antireflection film. Further, in the invention according to claim 3, since the reflectance of the antireflection film is limited, plate making as designed becomes easier.
【図１】印刷用スクリーンの露光時における断面図であ
る。FIG. 1 is a cross-sectional view of a printing screen during exposure.
【図２】原板マスクと印刷版の関係を示す断面図であ
る。FIG. 2 is a cross-sectional view showing a relationship between an original mask and a printing plate.
【図３】実施形態のスクリーン紗の断面図である。FIG. 3 is a cross-sectional view of the screen mesh of the embodiment.
【図４】スパッタリング装置の一例を示す断面図であ
る。FIG. 4 is a cross-sectional view showing an example of a sputtering apparatus.
【図５】スパッタリング装置の他の例を示す断面図であ
る。FIG. 5 is a cross-sectional view showing another example of the sputtering apparatus.
Ｌ、Ｌａ：紫外線
１０：スクリーン紗、１０ａ：経糸
１１：感光層
１２：原板マスク、１２ａ：透明部、１２ｂ：シャドー
部
１３：印刷版（スクリーン型）、１３ａ：孔
１５：実施形態のスクリーン紗
１６：経糸
１７：緯糸
１６ａ、１７ａ：反射防止膜
Ｆ：スクリーン紗原反（紗状織物）
Ｆａ：スクリーン紗
２０、３０：チャンバ
２１、４１：ターゲット
２２、３９、４０：ターゲットソース
２３、３７、３８：アノード
２４、３１、３２：水冷シリンダ
２５、３３：送出し軸
２６、３４：巻取り軸
２７ａ、２７ｂ、３５ａ〜３５ｆ：ガイドローラ
２８：真空ポンプ
２９ａ、２９ｂ：ガスボンベ
Ｅ：直流電源L, La: ultraviolet rays 10: screen gauze, 10a: warp 11: photosensitive layer 12: original plate mask, 12a: transparent part, 12b: shadow part 13: printing plate (screen type), 13a: hole 15: screen gauze of embodiment 16: Warp 17: Wefts 16a, 17a: Antireflection film F: Screen cloth raw cloth (sachet cloth) Fa: Screen cloth 20, 30: Chamber 21, 41: Target 22, 39, 40: Target source 23, 37, 38: Anode 24, 31, 32: Water cooling cylinder 25, 33: Delivery shaft 26, 34: Winding shaft 27a, 27b, 35a to 35f: Guide roller 28: Vacuum pump 29a, 29b: Gas cylinder E: DC power supply
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中嶋 英吾 愛知県蒲郡市浜町36番地 株式会社鈴寅内 (72)発明者 鈴木 敏和 愛知県蒲郡市浜町36番地 株式会社鈴寅内 (72)発明者 鈴木 隆啓 愛知県蒲郡市浜町36番地 株式会社鈴寅内 (72)発明者 横溝 徹 東京都日野市豊田２丁目50番地の３ エ ヌ・ビー・シー工業株式会社内 (72)発明者 大高 浩 東京都日野市豊田２丁目50番地の３ エ ヌ・ビー・シー工業株式会社内 Ｆターム(参考） 2H096 AA00 AA19 2H114 AB05 BA02 DA04 DA05 DA06 EA01 EA04 GA33 5E343 DD03 FF02 FF14 GG08 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Eigo Nakajima 36 Hama-cho, Gamagori-shi, Aichi Prefecture (72) Inventor Toshikazu Suzuki 36 Hama-cho, Gamagori-shi, Aichi Prefecture (72) Inventor Takahiro Suzuki 36 Hama-cho, Gamagori-shi, Aichi Prefecture (72) Inventor Toru Yokomizo 3 D, 2-50, Toyota, Hino City, Tokyo NBC Industry Co., Ltd. (72) Inventor Hiroshi Otaka 3 D, 2-50, Toyota, Hino City, Tokyo NBC Industry Co., Ltd. F term (reference) 2H096 AA00 AA19 2H114 AB05 BA02 DA04 DA05 DA06 EA01 EA04 GA33 5E343 DD03 FF02 FF14 GG08
Claims (3)
糸に用いて製織された紗状織物の少なくとも片面が金属
の酸化物、窒化物もしくは炭化物又はフッ化マグネシウ
ムからなる紫外線の反射防止膜で被覆されていることを
特徴とする印刷用スクリーン紗。1. A gauze-like fabric woven using a thin wire of stainless steel for warp and weft, at least one side of which is coated with an ultraviolet ray antireflection film made of metal oxide, nitride or carbide, or magnesium fluoride. A screen gauze for printing characterized in that
に記載の印刷用スクリーン紗。2. The antireflection film is a physical vapor deposition film.
Printing screen gauze described in.
ｍの波長域において１５％以下である請求項１または２
に記載の印刷用スクリーン紗。3. The reflectance of the antireflection film is 250 to 450 n.
3. The ratio is 15% or less in the wavelength range of m.
Printing screen gauze described in.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001208781A JP3492652B2 (en) | 2001-07-10 | 2001-07-10 | Printing screen 紗 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001208781A JP3492652B2 (en) | 2001-07-10 | 2001-07-10 | Printing screen 紗 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003019874A true JP2003019874A (en) | 2003-01-21 |
| JP3492652B2 JP3492652B2 (en) | 2004-02-03 |
Family
ID=19044537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001208781A Expired - Lifetime JP3492652B2 (en) | 2001-07-10 | 2001-07-10 | Printing screen 紗 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3492652B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007324349A (en) * | 2006-05-31 | 2007-12-13 | Ngk Spark Plug Co Ltd | Dividing device and ceramic wiring board manufacturing method |
| JP2009008526A (en) * | 2007-06-28 | 2009-01-15 | Nippon Instrument Kk | Mercury atomic fluorescence spectrometer |
| JP2011011480A (en) * | 2009-07-03 | 2011-01-20 | Air Water Inc | Metal mesh fabric for screen printing, method for manufacturing the same, and screen plate |
| WO2013022097A1 (en) * | 2011-08-10 | 2013-02-14 | 太陽化学工業株式会社 | Structure including thin primer film, and process for producing said structure |
| JP2016013639A (en) * | 2014-07-01 | 2016-01-28 | 株式会社Ｎｂｃメッシュテック | Metal mesh fabric for screen printing and screen plate for screen printing |
-
2001
- 2001-07-10 JP JP2001208781A patent/JP3492652B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007324349A (en) * | 2006-05-31 | 2007-12-13 | Ngk Spark Plug Co Ltd | Dividing device and ceramic wiring board manufacturing method |
| JP2009008526A (en) * | 2007-06-28 | 2009-01-15 | Nippon Instrument Kk | Mercury atomic fluorescence spectrometer |
| JP2011011480A (en) * | 2009-07-03 | 2011-01-20 | Air Water Inc | Metal mesh fabric for screen printing, method for manufacturing the same, and screen plate |
| WO2013022097A1 (en) * | 2011-08-10 | 2013-02-14 | 太陽化学工業株式会社 | Structure including thin primer film, and process for producing said structure |
| JPWO2013022097A1 (en) * | 2011-08-10 | 2015-03-05 | 太陽化学工業株式会社 | Structure including primer thin film and method of manufacturing the structure |
| US9469097B2 (en) | 2011-08-10 | 2016-10-18 | Taiyo Yuden Chemical Technology Co., Ltd. | Structure including thin primer film and method of producing said structure |
| JP2016013639A (en) * | 2014-07-01 | 2016-01-28 | 株式会社Ｎｂｃメッシュテック | Metal mesh fabric for screen printing and screen plate for screen printing |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3492652B2 (en) | 2004-02-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4869778A (en) | Method of forming a patterned aluminum layer and article | |
| US5043201A (en) | Method of forming a patterned aluminum layer and article | |
| JP2886254B2 (en) | Method for producing photosensitive resin plate and plate making apparatus used therefor | |
| TWI520857B (en) | Cliche and method for preparing the same | |
| JP2003019874A (en) | Screen fabric for printing | |
| KR100329022B1 (en) | Manufacturing Method of Glass Substrate Covered with Fine Pattern Nesa Glass Film | |
| JP3483868B2 (en) | Screen gauze for printing | |
| SU948301A3 (en) | Light-sensitive material for obtaining images | |
| JPH06143855A (en) | Screen printing plate and production thereof | |
| JP2007334058A (en) | Screen printing plate and method for manufacturing the same | |
| JP2009071024A (en) | Optical filter for display, and manufacturing method for optical filter for display | |
| CN1033903A (en) | Make the method for shadow mask | |
| JP2000258921A (en) | Pattern forming method and its formed pattern | |
| JP2000174486A (en) | Light-transmission electromagnetic wave shield film and manufacturing method of light-transmission electromagnetic shield panel | |
| JP4884948B2 (en) | Electromagnetic wave shielding material roll body and manufacturing method thereof, electromagnetic wave shielding film for display | |
| JP2022107073A (en) | Screen printing plate and method for manufacturing the same | |
| JPH04240852A (en) | Manufacture of mask | |
| JP2004243774A (en) | Mask preparation for manufacturing print plate | |
| JPH09244212A (en) | Halftone phase shift photomask and blank for halftone phase shift photomask | |
| KR900001704B1 (en) | Product method of slot-type shadow mask | |
| JPH11288080A (en) | Mask for printing photoresist, printing device, printing method, production of electrode foil and roll for printing | |
| JPH05270161A (en) | Screen printing plate | |
| KR100756395B1 (en) | Method for manufacturing electromagnetics shielding layer, method for manufacturing mold substrate for the same, and mold substrate for the same | |
| KR20070041041A (en) | Structure of intaglio blanket using offset printing | |
| JP2683876B2 (en) | Printing screen and its manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TRDD | Decision of grant or rejection written | ||
| R150 | Certificate of patent or registration of utility model |
Ref document number: 3492652 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091114 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101114 Year of fee payment: 7 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101114 Year of fee payment: 7 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101114 Year of fee payment: 7 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111114 Year of fee payment: 8 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111114 Year of fee payment: 8 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121114 Year of fee payment: 9 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131114 Year of fee payment: 10 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |