JP2002525800A5 - - Google Patents
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- Publication number
- JP2002525800A5 JP2002525800A5 JP2000570812A JP2000570812A JP2002525800A5 JP 2002525800 A5 JP2002525800 A5 JP 2002525800A5 JP 2000570812 A JP2000570812 A JP 2000570812A JP 2000570812 A JP2000570812 A JP 2000570812A JP 2002525800 A5 JP2002525800 A5 JP 2002525800A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9820205A GB2341720A (en) | 1998-09-16 | 1998-09-16 | Electron beam aperture element with beam sheilding |
| GB9820205.4 | 1998-09-16 | ||
| PCT/EP1999/006770 WO2000016370A1 (en) | 1998-09-16 | 1999-09-13 | Electron beam aperture element with beam shielding |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002525800A JP2002525800A (ja) | 2002-08-13 |
| JP2002525800A5 true JP2002525800A5 (ja) | 2010-04-02 |
| JP4568431B2 JP4568431B2 (ja) | 2010-10-27 |
Family
ID=10838977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000570812A Expired - Fee Related JP4568431B2 (ja) | 1998-09-16 | 1999-09-13 | ビームシールドを備えた電子ビーム開口要素 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1121704B1 (ja) |
| JP (1) | JP4568431B2 (ja) |
| DE (1) | DE69932067T2 (ja) |
| GB (1) | GB2341720A (ja) |
| WO (1) | WO2000016370A1 (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110536535B (zh) * | 2019-07-12 | 2020-06-19 | 西安交通大学 | 一种用于高能粒子加速器的束屏 |
| EP3879557A1 (en) * | 2020-03-09 | 2021-09-15 | ASML Netherlands B.V. | Aperture body, flood column and charged particle tool |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE903017C (de) * | 1951-01-31 | 1954-02-01 | Sueddeutsche Lab G M B H | Herstellung kleiner Kugeln aus hochschmelzbaren Materialien |
| JPS5935501B2 (ja) * | 1979-07-25 | 1984-08-29 | 株式会社日立製作所 | 電子線装置 |
| JPS59203353A (ja) * | 1983-05-06 | 1984-11-17 | Sony Corp | 電子ビ−ム発生装置 |
| DE3407050A1 (de) * | 1984-02-27 | 1985-09-05 | Siemens AG, 1000 Berlin und 8000 München | Korpuskelbeschleunigende elektrode |
| EP0197579B1 (en) * | 1985-03-28 | 1989-11-08 | Koninklijke Philips Electronics N.V. | Electron beam apparatus comprising an integrated anode/beam blanking unit |
| EP0308560A1 (fr) * | 1987-09-22 | 1989-03-29 | Universite De Reims Champagne Ardenne | Canon à particules électriques permettant l'émission pulsée de particules d'énergie déterminée |
| ATE171812T1 (de) * | 1988-06-01 | 1998-10-15 | Ims Ionen Mikrofab Syst | Ionenstrahllithographie |
| WO1991006393A1 (en) * | 1989-11-01 | 1991-05-16 | Vladimir Omarovich Tokarev | Device for protection against deposition on cathode of electron beam welding gun and on walls of vacuum chamber |
| US5493116A (en) * | 1993-10-26 | 1996-02-20 | Metrologix, Inc. | Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices |
| US5838006A (en) * | 1996-10-17 | 1998-11-17 | Etec Systems, Inc. | Conical baffle for reducing charging drift in a particle beam system |
-
1998
- 1998-09-16 GB GB9820205A patent/GB2341720A/en not_active Withdrawn
-
1999
- 1999-09-13 WO PCT/EP1999/006770 patent/WO2000016370A1/en active IP Right Grant
- 1999-09-13 JP JP2000570812A patent/JP4568431B2/ja not_active Expired - Fee Related
- 1999-09-13 EP EP99969178A patent/EP1121704B1/en not_active Expired - Lifetime
- 1999-09-13 DE DE69932067T patent/DE69932067T2/de not_active Expired - Lifetime