JP2002358898A - Plasma display panel and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma display panel without any degradation of brightness with time, and of high stability and long life. SOLUTION: It is so structured that a conductive electrode and a dielectric and a protection layers covering it are successively laminated on at least one of a pair of substrates which oppose with a discharge space in between, and impurity atoms exist distributed in the layer thickness direction in the dielectric layer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel, and more particularly to an opposed three-electrode surface discharge type AC plasma display panel and a method of manufacturing the same. And a protective layer.

[0002]

2. Description of the Related Art A plasma display panel is a display that excites and emits a phosphor by ultraviolet rays generated by gas discharge to display an image. The discharge can be classified into an alternating current (AC) type and a direct current (DC) type based on the method of forming the discharge. The AC type is characterized by being superior to the DC type in luminance, luminous efficiency, and life. Furthermore, among the AC types, the reflection type surface discharge type is the most common because it is particularly outstanding in terms of luminance and luminous efficiency.

FIG. 4 is a cross-sectional view of a part of a pixel of a reflective AC surface discharge plasma display panel as an example of the related art. The structure and operation will be described below. Transparent insulating substrate (most commonly a glass plate is used)
Transparent electrode (ITO or SnO2 is used) on 401
A plurality 402 are formed. However, since the transparent electrode 402 has a high sheet resistance and cannot supply sufficient power to all pixels in a large panel, a thick silver film, an aluminum thin film,
The bus electrode 403 is formed of a laminated thin film of copper / chromium (Cr / Cu / Cr). The apparent bus resistance of the transparent electrode 402 is reduced by the bus electrode 403.
A transparent dielectric layer (low melting glass is used) 404 and a protective layer 405 made of magnesium oxide (MgO) are formed on these electrodes. Dielectric layer 404
Have a current limiting function peculiar to the AC type plasma display, which is a factor that can make the life longer than that of the DC type.

[0004] On the front side substrate 401, a data electrode 407 for writing image data, a base dielectric layer 408, a partition 409, and a phosphor layer 410 are formed on a transparent insulating substrate 406 on the other rear side. Have been. Here, the data electrode 407 and the partition wall 409 are connected to the transparent electrode 4.
02, and the discharge cells 411 are formed in a space surrounded by two partition walls 409. In the discharge cells 411, neon (Ne) and xenon (Xe) are used as discharge gases. ) Is about 6
It is filled at a pressure of 6.7 kPa (500 Torr). Further, the partition 409 serves to partition adjacent discharge cells and prevent erroneous discharge and optical crosstalk.

An AC voltage of several tens of kHz to several hundreds of kHz is applied between the transparent electrodes 402 to generate a discharge in the discharge cell 411, and the phosphor layer 410 is excited by ultraviolet rays from the excited Xe atoms. The display operation is performed by generating visible light.

As such a plasma display panel, there has been proposed a plasma display panel in which Ar is added to a discharge gas consisting of Xe and Ne to improve the luminous efficiency (Japanese Patent Laid-Open No. 20-204).
00-156164).

[0007]

[0005] One of the problems of the plasma display panel is the luminance degradation with time. This is due to deterioration of the phosphor due to plasma damage, reduction of the secondary electron emission coefficient due to sputtering of the MgO protective layer, and contamination of the protective layer and the phosphor surface by the impurity gas mixed into the discharge gas.

In the above-mentioned conventional example, by adding Ar to the discharge gas, the discharge starting voltage can be reduced by the Penning effect, or higher brightness can be obtained at the same discharge voltage. However, in the conventional example, although the luminance at the initial stage of the operation can be increased, it is not possible to prevent the luminance from decreasing with time due to the above-described causes.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and its object is to (1) supply a gas having a penning effect gradually to a discharge space so as to reduce luminance deterioration with time. Providing no plasma display,
(2) To provide a plasma display that does not deteriorate with time by inactivating impurity gas mixed into a discharge space, and (3) To provide a manufacturing method for manufacturing the above plasma display.

[0010]

In order to achieve the above object,
The plasma display panel according to the first aspect of the present invention has a structure in which a conductive electrode, a dielectric layer covering the conductive electrode, and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space. However, impurity atoms are distributed and present in the thickness direction in the dielectric layer,
Since the impurity atoms having the penning effect are gradually supplied into the discharge space with time, a plasma display panel without luminance degradation can be provided.

The plasma display panel according to the second aspect of the present invention is characterized in that a region having a high impurity atom density exists on the protective layer side of the dielectric layer.

A third aspect of the present invention is characterized in that the dielectric layer is made of glass containing lead oxide, bismuth oxide or phosphorus oxide.

The plasma display panel according to a fourth aspect of the present invention is characterized in that the impurity atoms are at least rare gas atoms.

In the plasma display panel according to the present invention, the maximum value of the impurity atom density is 1 × 10 18 / c.
m3 or more and 2 * 1021 pieces / cm3 or less.

According to a sixth aspect of the present invention, a conductive electrode, a dielectric layer covering the conductive electrode, and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space. Having a structure, wherein impurity atoms are distributed and present in the layer thickness direction in the protective layer, and impurity atoms having a penning effect are gradually supplied to the discharge space with time. A plasma display panel without luminance degradation can be provided.

According to a seventh aspect of the present invention, in the plasma display panel, the protective film is made of at least a metal oxide, a metal nitride, or a metal halide.

The plasma display panel according to the invention of claim 8 is characterized in that a region having a high impurity atom density exists on the discharge space side of the protective layer.

A ninth aspect of the present invention is characterized in that the impurity atoms are at least rare gas atoms.

In the plasma display panel according to the tenth aspect, the maximum value of the impurity atom density is 1 × 1018 / atom.
cm3 or more and 2 * 1021 pieces / cm3 or less.

[0020] The plasma display panel according to the eleventh aspect of the present invention includes a pair of substrates facing each other via a discharge space,
It has a structure in which a conductive electrode, a dielectric layer and a protective layer covering the conductive electrode are sequentially laminated on at least one substrate, and a base conductive electrode and a partition are formed on the other substrate, and impurities are contained in the partition. The plasma display panel is characterized in that atoms are distributed and exist in the layer thickness direction, and impurity atoms having a penning effect are gradually supplied to a discharge space with time, so that a plasma display panel without luminance degradation can be provided.

According to a twelfth aspect of the present invention, there is provided a plasma display panel comprising: a pair of substrates opposed to each other via a discharge space;
It has a structure in which a conductive electrode and a dielectric layer and a protective layer covering the conductive electrode are sequentially laminated on at least one substrate, and a base conductive electrode, a base dielectric layer, and a partition are formed on the other substrate. It is characterized in that impurity atoms are distributed and present in the thickness direction of the underlying dielectric layer. Impurity atoms having a penning effect are gradually supplied into the discharge space with time, so that the deterioration of luminance is reduced. It is possible to provide a plasma display panel without any.

A plasma display panel according to a thirteenth aspect of the present invention is characterized in that a region having a high impurity atom density exists on the discharge space side of the partition wall or the underlying dielectric layer.

A plasma display panel according to a fourteenth aspect of the present invention is characterized in that the impurity atoms are at least rare gas atoms.

According to a fifteenth aspect of the present invention, the maximum value of the impurity atom density is 1 × 1018 / atom.
cm3 or more and 2 * 1021 pieces / cm3 or less.

A plasma display panel according to a sixteenth aspect of the present invention is characterized in that molecules containing at least silicon atoms or germanium atoms are present in the discharge space, and by inactivating impurity gas mixed in the discharge space. It is possible to provide a plasma display panel that does not deteriorate in luminance over time.

According to a seventeenth aspect of the present invention, in the method of manufacturing a plasma display panel, a conductive electrode and a dielectric layer covering the conductive electrode are formed on a substrate, and then the protective layer is formed after irradiating the dielectric layer with impurity atoms. It is characterized by doing.

The method of manufacturing a plasma display panel according to claim 18 is characterized in that after forming a conductive electrode, a dielectric layer and a protective layer covering the conductive electrode on a substrate, the protective layer is irradiated with impurity atoms. I do.

A method of manufacturing a plasma display panel according to a nineteenth aspect of the present invention is characterized in that after forming a base conductive electrode and a partition on a substrate, the partition is irradiated with impurity atoms.

According to a twentieth aspect of the present invention, in the method of manufacturing a plasma display panel, a base conductive electrode and a base dielectric layer are formed on a substrate, and furthermore, a barrier is formed after irradiating the base dielectric layer with impurity atoms. It is characterized by the following.

[0030]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Some embodiments of the present invention will be described below with reference to the accompanying drawings.

(Embodiment 1) FIG. 1 is a sectional perspective view of a plasma display panel 100 according to a first embodiment of the present invention. This plasma display panel 1
Reference numeral 00 denotes a display electrode 102 made of a transparent conductive material such as ITO or tin oxide (SnO 2) and a silver (Ag) thick film (thickness: 2 μm to 10 μm) on the display surface side glass substrate 101.
m), aluminum (Al) thin film (thickness: 0.1 μm or more)
1 μm) or a Cr / Cu / Cr laminated thin film (thickness: 0.1 μm).
(1 μm to 1 μm) are sequentially stacked, and furthermore, lead oxide (PbO) or bismuth oxide (Bi)
Dielectric layer 1 made of low melting point glass (thickness: 20 μm to 50 μm) mainly containing 2O3) or phosphorus oxide (PO4)
04 is formed by screen printing. Subsequently, the glass substrate 101 is placed in a commercially available ion implantation apparatus. Argon (Ar) ion dose and acceleration voltage-
The operation is performed simultaneously in the range of 0.1 kV to -400 kV to implant the dielectric layer 104. Ar ions are in the dielectric layer 10
4 is implanted in the vicinity of the surface, and the range of the implanted depth is 1n.
m to 2000 nm (nanometers). here,
Dielectric layer 10 by secondary ion mass spectrometry (SIMS)
When the amount of Ar implanted into Sample No. 4 was quantified, it was found that the distribution of Ar atoms in the depth direction from the dielectric surface was as shown in FIG. The maximum value of the Ar atom density is 2 × 10 20 atoms / cm 3 or more and 2 × 10 2
The range was 1 / cm3 or less. Next, the dielectric layer 10
A protective layer 105 (thickness: 100 nm to 1000 nm) made of MgO that protects No. 4 from damage by plasma is formed by an electron beam evaporation method. The substrate on the display surface side was configured as described above.

On the other hand, a silver (Ag) thick film (thickness: 2 μm to 10 μm), an aluminum (Al) thin film (thickness: 0.1 μm to 1 μm) or C
r / Cu / Cr laminated thin film (thickness: 0.1 μm to 1 μm)
Electrodes 107, partition walls 108, and phosphor layers 1 of three colors (red: R, green: G, blue: B) for color display
09R, 109G, and 109B are sequentially laminated. The partition 108 separates the discharge space 110 into sub-pixels SU in the line direction.
Has a predetermined constant value. Here, one pixel (pixel) is composed of three sub-pixels SU that emit light of each color of R, G, B in the line direction. Further, as shown in FIG. 3, lead oxide (PbO) or bismuth oxide (B
The base dielectric layer 301 made of low melting point glass (thickness: 5 μm to 20 μm) containing i2O3) or phosphorus oxide (PO4) as a main component may be formed. The base dielectric layer 301 improves the adhesion between the phosphor layers 109R, G, and B, and does not mean that the plasma display panel does not operate without it.

The display side glass substrate 101 and the rear side glass substrate 106 obtained as described above are
2 and the address electrode 107 are opposed to each other via a partition wall 108 so as to be orthogonal to each other, hermetically sealed around, and a discharge gas composed of a mixed gas of Ne and Xe is supplied into the discharge space 110 at a predetermined pressure and a predetermined mixing ratio. This was filled to produce a plasma display panel (1) 100.

For comparison, in the above-described plasma display panel (1) 100, Ar ions were not implanted into the dielectric layer 100, and the other components were exactly the same as the panel (1) 100. (A) was produced.

The panels (1) and (A) were operated continuously, and the change with time in the emission luminance was examined. As a result, 5
After the elapse of 000 hours, the luminance of the panel (1) was reduced to 90% as compared with the initial value of the operation, whereas the luminance of the panel (A) was reduced to 60%.

In FIG. 2A, the doping amount is controlled at the time of plasma doping, and the maximum value of the Ar atom density is set to 1 × 10 18 atoms / cm 3 or more and 8 × 102 1 atoms / cm 3
Plasma display panel 1 changed in the following range
00 was produced, but the same effect as above was obtained. If the maximum value of the Ar atom density is smaller than 1 × 10 18 atoms / cm 3, the luminance after 5000 hours has passed is 70% of the initial value.
It fell below. The maximum value of the Ar atom density is 1
In the range of × 1018 / cm3 or more and 2 × 1020 / cm3 or less, the luminance reduction rate decreases as the Ar atom density increases, but when the density is 2 × 1021 / cm3 or more, the dielectric layer into which Ar ions are implanted. A cavity such as a bubble was generated in the region 104, and the luminance after lapse of 5000 hours was conversely reduced to 70% or less of the initial value.

The plasma display panel 100 having the Ar atom density distribution as shown in FIGS. 2B to 2F was manufactured by controlling the dose amount and the acceleration voltage at the time of the ion implantation. Similar results were obtained. At this time, the peak value of the Ar atom density distribution is 1 × 10 18 / c
The range was m3 or more and 2 × 1021 pieces / cm3 or less.

As described above, the reason why the time-dependent decrease in luminance of the plasma display panel 100 is reduced by implanting the above-described impurity ions, for example, Ar ions into the dielectric layer 104 is as follows. thinking. Ar atoms implanted in the dielectric layer 104 are gradually released into the discharge space 110 by diffusion. Therefore,
By mixing Ar into the discharge gas composed of the Ne—Xe mixed gas, the discharge starting voltage is reduced by the Penning effect, that is, the efficiency is increased. That is, as the mixing of Ar increases with time, the phosphor layer 109 and the protective layer 10
It is considered that the decrease in efficiency due to the deterioration of 5 was compensated for, and as a result, the decrease in luminance, which was a major problem of the plasma display panel, was suppressed.

The impurity atoms to be implanted into the dielectric layer 104 may be those which give a penning effect to the discharge gas. In the case where a mixed gas of Ne--Xe is used as the discharge gas, in addition to Ar, He may be used, or Ar and He may be implanted simultaneously. When He-Xe is used as the discharge gas, Ne is preferably used as the impurity atom implanted into the dielectric layer 104.

For the implantation of impurity atoms into the dielectric layer 104, a commercially available ion shower doping apparatus may be used in addition to the ion implanter.

(Embodiment 2) In a second embodiment of the present invention, in the plasma display panel 100 manufactured in the first embodiment, after forming the dielectric layer 104, ion implantation is not performed, and the protection layer (MgO) 105 After the formation of A, A is added to the protective layer 105 as an impurity atom in the same manner as in the first embodiment.
A plasma display panel (2) into which r ions were ion-implanted was formed. In addition, when the Ar atom density in the thickness direction in the MgO layer 105 was evaluated by SIMS, FIG.
(A) had the distribution shape. However, the depth at the peak value of the Ag atom density is approximately 1 nm to 200 nm, and the peak value is 2 × 1020 / cm3 to 2 × 1021 / cm.
It was 3. Other components are the same as those described in the first embodiment, and a description thereof will be omitted.

When this panel (2) was examined for changes with time in light emission luminance in the same manner as in Embodiment 1, after 5000 hours, the luminance was reduced to 80% of the initial value. Compared with the comparative panel (A) manufactured in the first embodiment, the rate of decrease in luminance was small, and it was confirmed that the change with time was small.

Further, plasma display panels were manufactured in which the peak value was varied in various ways by controlling the dose during the implantation of Ar ions, and the change with time was similarly examined. The peak value was found to be 1 × 10 18 / cm 3 or less. It was found that the luminance after lapse of 5000 hours was reduced to 62% of the initial value. However, when the peak value exceeds 1 × 10 18 / cm 3, the luminance after lapse of 5000 hours starts to increase and 2 × 1
In the range of 020 / cm3 to 2 × 1021 / cm3, the luminance was almost maximum. The peak value is 2 × 1020 /
If it exceeds cm3, then the brightness will suddenly decrease to 5000
It was found that the luminance after a lapse of time was 70% or less of the initial value. At this time, the panel was disassembled and the surface of the MgO film 105 was observed by SEM. As a result, it was confirmed that the MgO film 105 was deeply shaved. That is, the Ar atoms are converted to the MgO film 10.
5, Ar is released into the discharge space 110 with the passage of time, and the decrease in luminance over time due to the Penning effect is reduced. However, if too much is implanted, the structure of the MgO film 105 is broken and made brittle. By operating the panel, the MgO film 105 is sputtered away and the secondary electron emission coefficient of the MgO film 105 is reduced, and the brightness is reduced. Seems to have become remarkable.

From the above results, the peak density of impurity atoms contained in the protective layer 105 is preferably 1 × 10 18
Larger than 2 pieces / cm3 and 2 × 1021 pieces / cm3 or less,
More preferably 2 × 1020 / cm3 or more and 2 × 102
1 / cm3 or less.

The impurity atoms implanted into the protective layer 105 are:
Any material that gives a penning effect to the discharge gas may be used. When a mixed gas of Ne—Xe is used as the discharge gas, He may be used in addition to Ar, and Ar and He may be used.
May be simultaneously injected. When He-Xe is used as the discharge gas, Ne is preferably used as the impurity atom implanted into the protective layer 105.

(Third Embodiment) In the plasma display panel 100 manufactured in the first embodiment, Ar ions are implanted into the dielectric layer 104 under the same conditions as in the first embodiment, and then the MgO protective layer 105 (film thickness) is formed. : 0.5 μm), and the MgO protective layer 10 was formed under the same conditions as in the second embodiment.
5 (film thickness: 0.5 μm) was prepared by implanting Ar ions into a plasma display panel (3). Other components are the same as those described in the first embodiment,
The description thereof is omitted here.

The panel (3) was examined for changes with time in light emission luminance in the same manner as in the first embodiment. The luminance after 5000 hours was 93% of the initial value. It was better than that. This is presumably because the number of Ar atoms released into the discharge space 110 with the passage of time was larger than in the panels (1) and (2).

(Embodiment 4) In the plasma display panel 100 manufactured in Embodiment 1, a substrate on the display surface side is formed without implanting Ar ions into the dielectric layer 104, and as shown in FIG. After forming the address electrode 107 and the underlying dielectric layer 301 on the glass substrate 106 on the side, a plasma display panel (4) in which Ar ions are implanted into the underlying dielectric layer 301 in the same manner as in the first embodiment is manufactured. did. In addition, when the Ar atom density in the film thickness direction in the base dielectric layer 301 was evaluated by SIMS,
The distribution shape was as shown in FIG. However, the depth at the peak value of the Ag atom density is approximately 1 nm to 2000 nm.
And the peak value is 2 × 1020 / cm3 or more and 2 × 102
The range was 1 / cm3 or less. Other components are the same as those described in the first embodiment, and a description thereof will be omitted.

This panel (4) was examined for changes with time in light emission luminance in the same manner as in Embodiment 1. The luminance after 5000 hours was 85% of the initial value. It turned out to be superior to A).

Further, a plasma display panel is constructed using the back substrate at this time and the display surface substrate in which Ar is injected into the dielectric layer 104 manufactured in the first embodiment, and the change in emission luminance with time is examined. As a result, the luminance after 5000 hours was 93% of the initial value.

Further, a plasma display panel was constructed using the back side substrate and the display surface side substrate in which Ar was injected into the protective layer 105 manufactured in the second embodiment, and the change in emission luminance with time was examined. However, the luminance after 5000 hours was 88% of the initial value.

Further, a plasma display panel was constructed using the rear substrate at this time and the display surface substrate in which Ar was injected into the protective layer 105 manufactured in the third embodiment, and changes over time in light emission luminance were examined. However, the luminance after 5000 hours was 95% of the initial value.

The impurity atoms to be implanted into the underlying dielectric layer 301 may be those which give a Penning effect to the discharge gas. In the case where a mixed gas of Ne--Xe is used as the discharge gas, other than Ar, He may be used for Ar
And He may be implanted simultaneously. He-Xe for discharge gas
Is used, Ne is preferable as an impurity atom to be implanted into the base dielectric layer 301.

(Fifth Embodiment) In the plasma display panel 100 manufactured in the first embodiment, a substrate on the display surface side is formed without implanting Ar ions into the dielectric layer 104, and as shown in FIG. After the partition walls 108 were formed on the glass substrate 106 on the side, a plasma display panel (5) was prepared in which Ar ions were implanted into the partition walls 108 in the same manner as in the first embodiment. In addition, when the Ar atom density in the film thickness direction in the partition wall 108 was evaluated by SIMS, the distribution shape was as shown in FIG. However, the depth at the peak value of the Ag atom density is approximately 1 nm to 2000 n.
m, the peak value is 2 × 1020 / cm3 or more and 2 × 10
The range was 21 / cm3 or less. Other components are the same as those described in the first embodiment, and a description thereof will be omitted.

This panel (5) was examined for changes with time in light emission luminance in the same manner as in the first embodiment. The luminance after 5000 hours was 90% of the initial value. It turned out to be superior to A).

Further, a plasma display panel was constructed using the rear substrate at this time and the display surface substrate in which Ar was injected into the dielectric layer 104 manufactured in the first embodiment, and changes over time in light emission luminance were examined. However, the luminance after 5000 hours was 95% of the initial value.

Further, a plasma display panel was constructed using the back side substrate and the display surface side substrate in which Ar was injected into the protective layer 105 manufactured in the second embodiment, and changes over time in light emission luminance were examined. However, the luminance after 5000 hours was 92% of the initial value.

Also, a plasma display panel was constructed using the back side substrate at this time and the display surface side substrate in which Ar was injected into the protective layer 105 manufactured in the third embodiment, and the change over time in the emission luminance was examined. However, the luminance after 5000 hours was 97% of the initial value.

The impurity atoms to be injected into the barrier ribs 108 may be those which give a Penning effect to the discharge gas. When a mixed gas of Ne and Xe is used as the discharge gas, He is used instead of Ar. Ar and He may be used
May be simultaneously injected. When He-Xe is used for the discharge gas, Ne is preferably used as the impurity atom implanted into the partition wall 108.

(Embodiment 6) In the plasma display panel 100 manufactured in Embodiment 1, a substrate on the display surface side is formed without implanting Ar ions into the dielectric layer 104, and as shown in the drawing, A plasma display panel (6) in which Ar ions were implanted into the base dielectric layer 111 and the barrier ribs 108 on the glass substrate 106 in the same manner as in the first embodiment was manufactured. Other components are the same as those described in the first embodiment, and a description thereof will be omitted.

The panel (6) was examined for changes with time in light emission luminance in the same manner as in the first embodiment. The luminance after 5000 hours was 93% of the initial value. It turned out to be superior. This is due to the Ar released into the discharge space 110 over time.
This is probably because the number of atoms was larger than those in panels (4) and (5).

Further, a plasma display panel was constructed using the back side substrate and the display surface side substrate in which Ar was injected into the dielectric layer 104 manufactured in the first embodiment, and the change with time of the emission luminance was examined. However, the luminance after 5000 hours was 97% of the initial value.

Further, a plasma display panel was constructed using the back side substrate at this time and the display surface side substrate in which Ar was injected into the protective layer 105 manufactured in the second embodiment, and the change with time of the emission luminance was examined. However, the luminance after 5000 hours was 95% of the initial value.

Further, a plasma display panel was constructed using the back side substrate at this time and the display surface side substrate in which Ar was injected into the protective layer 105 manufactured in the third embodiment, and changes over time in the emission luminance were examined. However, the luminance after 5000 hours was 98 to 99% of the initial value.

(Embodiment 7) A panel (7) was prepared by mixing the filled discharge gas with SiH4 at a volume ratio of 10 ppm to 1% in the plasma display panel 100 manufactured in Embodiment 1. Other components are the same as those described in the first embodiment, and a description thereof will be omitted.

This panel (7) was examined for changes with time in light emission luminance in the same manner as in the first embodiment.
The luminance after 0 hour was 95% of the initial value, which proved to be superior to the panel (1) in which SiH4 was not mixed. The cause is considered as follows.

As time passes, H2O and CO2 adsorbed on the surfaces of the protective layer 105 and the phosphor layers 109R, G, and B,
The hydrocarbon gas contained in the dielectric layer 104, the base dielectric layer 301, and the barrier ribs 108 is gradually released into the discharge space 110, and the impurity gas is mixed into the discharge gas, thereby deteriorating the brightness of the panel. However, by mixing a gas that reacts with these gases in the plasma of the discharge space 110 and has a function of changing into a solid substance that does not gasify with a higher binding energy, the impurity gas molecules may float in the discharge space 110. And the luminance of the panel can be prevented from deteriorating. The atoms that bond with the atoms (oxygen atoms, carbon atoms) constituting impurity gases such as H2O, CO2 and hydrocarbons with strong binding energy are Si and Ge (S
i-C bond, Si-O bond, Ge-C bond, and Ge-O bond are formed). Therefore, the reason why the panel (7) in which SiH4 is mixed has less luminance deterioration than the panel (1) in which SiH4 is not mixed is that the SiH4 and the impurity gas molecules are dissociated in the discharge space 110, and the Si-O bond and the Si- This is presumably because C bonds were formed and fixed to the phosphor layers 109R, G, B and the surface of the protective layer 105.

The gas to be mixed with the discharge gas is Si
In addition to H4, Si2H6, Si3H8, SiF4, Si
H2F2, SiH3F, SiHF3, SiCl4, Si
HCl3, SiH2Cl2, SiH3Cl, GeH4,
Ge2H6, GeF4, Ge2F6, GeH3F, Ge
H2F2, GeHF3 or the like may be used.

In the first to seventh embodiments, not only one kind of Ar but also different kinds of impurity atoms may be mixed into each part. In addition, the types of impurity atoms contained in each of the dielectric layer 104, the protective layer 105, the base dielectric layer 301, and the partition 108 may be different, or different types of atoms may be contained by changing the mixing ratio. .

As can be seen from the above description, the plasma display panel of the present invention does not change with time in luminance, and operates with high stability.

[0071]

According to the present invention, it is possible to provide a plasma display panel which is stable and has a long life without luminance change with time.

[Brief description of the drawings]

FIG. 1 is a cross-sectional perspective view schematically illustrating a configuration of a plasma display panel according to an embodiment of the present invention.

FIG. 2 is a diagram showing the distribution of impurity atom densities in a dielectric layer, a protective layer, a base dielectric layer, or a partition used in an embodiment of the present invention.

FIG. 3 is a cross-sectional perspective view schematically illustrating a configuration of a plasma display panel according to another embodiment of the present invention.

FIG. 4 is a cross-sectional view schematically showing a configuration of a conventional plasma display panel.

[Explanation of symbols]

 REFERENCE SIGNS LIST 100 plasma display panel 101 display surface side glass substrate 102 display electrode 103 bus electrode 104 dielectric layer 105 protective layer 106 back side glass substrate 107 address electrode 108 partition 109R phosphor layer (red) 109G phosphor layer (green) 109B phosphor Layer (blue) 110 Discharge space 301 Base dielectric layer

Claims (20)

[Claims] 1. A dielectric layer having a structure in which a conductive electrode, a dielectric layer covering the conductive electrode and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space. A plasma display panel, wherein impurity atoms are distributed and present in a layer thickness direction. 2. The plasma display panel according to claim 1, wherein a region having a high impurity atom density exists on the protective layer side of the dielectric layer. 3. The plasma display panel according to claim 1, wherein the dielectric layer is made of glass containing lead oxide, bismuth oxide, or phosphorus oxide. 4. The plasma display panel according to claim 1, wherein the impurity atoms are at least rare gas atoms. 5. The maximum value of the impurity atom density is 1 × 1018.
2. The plasma display panel according to claim 1, wherein the number is not less than 2 × 10 21 pieces / cm 3. 6. A structure in which a conductive electrode, a dielectric layer covering the conductive electrode, and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space, A plasma display panel characterized in that impurity atoms are distributed and present in the layer thickness direction. 7. The plasma display panel according to claim 6, wherein the protective film is made of at least a metal oxide, a metal nitride, or a metal halide. 8. The plasma display panel according to claim 6, wherein a region having a high impurity atom density exists on the discharge space side of the protective layer. 9. The plasma display panel according to claim 6, wherein the impurity atoms are at least rare gas atoms. 10. The maximum value of the impurity atom density is 1 × 101.
The plasma display panel according to claim 6, wherein the number is not less than 8 / cm3 and not more than 2 x 1021 / cm3. 11. A structure in which a conductive electrode, a dielectric layer covering the conductive electrode and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space, and the other substrate is provided. A plasma display panel, on which a base conductive electrode and a partition are formed, and impurity atoms are distributed and present in the partition in a layer thickness direction. 12. A substrate having a structure in which a conductive electrode, a dielectric layer covering the conductive electrode and a protective layer are sequentially laminated on at least one of a pair of substrates facing each other via a discharge space, and the other substrate is provided. A plasma display panel on which a base conductive electrode, a base dielectric layer, and a partition are formed, and wherein impurity atoms are distributed in the base dielectric layer in a layer thickness direction. 13. The plasma display panel according to claim 12, wherein a region having a high impurity atom density exists on a discharge space side of the base dielectric layer or the partition wall. 14. The plasma display panel according to claim 11, wherein the impurity atoms are at least rare gas atoms. 15. The maximum value of the impurity atom density is 1 × 101.
The plasma display panel according to claim 13, wherein the number is not less than 8 / cm3 and not more than 2 * 1021 / cm3. 16. The plasma display panel according to claim 1, wherein a molecule containing at least a silicon atom or a germanium atom exists in the discharge space. 17. The method of manufacturing a plasma display panel according to claim 1, wherein a conductive electrode and a dielectric layer covering the conductive electrode are formed on a substrate, and furthermore, protection is performed after irradiating the dielectric layer with impurity atoms. A method for manufacturing a plasma display panel, comprising forming a layer. 18. The method of manufacturing a plasma display panel according to claim 6, wherein after forming a conductive electrode and a dielectric layer and a protective layer covering the conductive electrode on a substrate, irradiating the protective layer with impurity atoms. A method for manufacturing a plasma display panel, comprising: 19. The method of manufacturing a plasma display panel according to claim 11, wherein after forming a base conductive electrode and a partition on the substrate, the partition is irradiated with impurity atoms. Production method. 20. The method of manufacturing a plasma display panel according to claim 12, wherein a base conductive electrode and a base dielectric layer are formed on a substrate, and the base dielectric layer is irradiated with impurity atoms. Forming a plasma display panel.