JP2002350660A - Laminated structure type photobleaching waveguide and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a laminated structure type photobleaching waveguide, with which a high-precision waveguide can be easily obtained at a low cost and its manufacturing method. SOLUTION: Core layers 3a-1 to 3a-6, and 3b-1 to 3b-6 and respective flank clad layers 4a and 4b are made of polymer materials for photobleaching, so all the core layers 3a-1 to 3a-6 and 3b-1 to 3b-6, and all the flank clad layers 4a and 4b can be formed together only by performing exposure by ultraviolet- ray irradiation through a photomask once. Consequently, the waveguide can easily be formed at a low cost. Further, those core layers 3a-1 to 3a-6, and 3b-1 to 3b-6, and flank clad layers 4a and 4b can be formed through single-time batch exposure, so those core layers 3a-1 to 3a-6 and 3b-1 to 3b-6, and flank clad layers 4a and 4b can be formed while their position precision and size precision are maintained with high precision.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a laminated structure type photobleaching waveguide and a method of manufacturing the same.

[0002]

2. Description of the Related Art With the development of optical interconnection technology, a system for transmitting optical signals between devices in parallel using an optical fiber has entered a practical stage. The next generation method is on-board or LS
A method of transmitting signals in parallel between I chips using optical signals has been studied in earnest. To realize this method, a waveguide is used instead of an optical fiber as a transmission line. This waveguide is required to have a laminated structure capable of transmitting on a matrix. As this laminated structure, a glass waveguide or a polymer waveguide has been studied, but no practical waveguide has been reported yet.

[0003]

However, the above-mentioned prior art has the following problems.

[0004] (1) It is very difficult to manufacture, and the manufacturing method is complicated, so that it is difficult to make the interval between the respective core layers a desired size. In addition, the dimensional deviation of each core layer causes variations in the coupling characteristics of the semiconductor optical device.

(2) Since each layer is made of materials having different coefficients of thermal expansion, the waveguide may be warped or the optical characteristics may change due to a temperature change.

(3) Interface non-uniformity of each layer is likely to occur,
It is difficult to reduce value.

It is an object of the present invention to solve the above-mentioned problems and to provide a laminated structure type photobleaching waveguide capable of obtaining a high-precision waveguide simply and at low cost, and a method of manufacturing the same.

[0008]

In order to achieve the above object, a laminated structure photobleaching waveguide according to the present invention comprises a lower clad layer having a core layer having a higher refractive index than the lower clad layer. Side cladding layers having a lower refractive index than the core layer are formed on both sides of the core layer on the layer, and the waveguide body in which an upper cladding layer having a lower refractive index than the core layer is formed on the core layer and the side cladding layers is transparent. The core layer is laminated on either one side or both sides of the substrate so that the position of the core layer vertically overlaps, and the lower cladding layer, the core layer, the side cladding layer, and the upper cladding layer are made of a photobleaching material. is there.

In addition to the above configuration, a plurality of core layers of the laminated photobleaching waveguide of the present invention may be formed at desired intervals between the lower clad layer and the upper clad layer.

In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention preferably uses glass, plastic, sapphire, or a flexible plastic film as a substrate material.

[0011] In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention comprises a lower clad layer, the core layer,
It is preferable that the side cladding layer and the upper cladding layer are made of a polymer material.

In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention may have a waveguide main body formed on both sides of a substrate having a thickness of 0.3 mm or less.

In addition to the above-described structure, the laminated structure type photobleaching waveguide of the present invention is composed of a semiconductor such as Si, GaAs, or the like.
The waveguide main body may be formed on either the upper surface or the lower surface of an opaque substrate such as a ferroelectric substance such as iNbO ₃ or a ceramic.

In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention preferably has a light reflecting surface of approximately 45 degrees formed at the light input end and light output end of the waveguide main body and the substrate.

In addition to the above-described structure, the laminated structure type photobleaching waveguide of the present invention is formed such that the light reflecting surface at the light input end and the light reflecting surface at the light output end are substantially parallel or substantially orthogonal. Is preferred.

In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention may be such that the waveguide main body and the substrate are adhered on another substrate.

In addition to the above structure, the laminated structure type photobleaching waveguide of the present invention may have a semiconductor optical element, an optical component, or an electronic component mounted on one or both surfaces of the waveguide body. .

In the method of manufacturing a laminated structure type photobleaching waveguide according to the present invention, after forming a lower cladding layer on one or both surfaces of a transparent substrate, the lower cladding layer is formed on the lower cladding layer. A step of forming a polymer layer for photobleaching having a high refractive index and a step of forming an upper clad layer having a lower refractive index than the polymer layer for photobleaching on the polymer layer for photobleaching were performed at least once. After that, a photomask having a core pattern drawn thereon is arranged on the upper cladding layer, and the polymer layer for photobleaching is irradiated with ultraviolet light from above the photomask to form a core layer having a substantially rectangular cross-sectional shape having a high refractive index. And a low refractive index side cladding layer located on both sides of the core layer to form a laminated waveguide.

In addition to the above-described structure, the method of manufacturing a laminated structure type photobleaching waveguide of the present invention is characterized in that the waveguide main body and the substrate are inclined obliquely so as to have a light reflecting surface of approximately 45 degrees on the light input end and light output end side. The waveguide may be cut, or a part of the core layer may be changed to a low-refractive-index 45-degree light reflecting surface by irradiating a linear ultraviolet ray to the waveguide from a direction of approximately 45 degrees.

In addition to the above structure, in the method of manufacturing a laminated structure type photobleaching waveguide of the present invention, the waveguide main body may be attached to another substrate using an ultraviolet curing adhesive.

In addition to the above structure, the method of manufacturing a laminated structure type photobleaching waveguide according to the present invention comprises the steps of:
Semiconductor optical elements, optical components, electronic components, and the like may be mounted on the lower surface or on both surfaces.

According to the present invention, since each core layer and each side cladding layer are made of a photobleaching polymer material, all of the cores can be exposed only once by ultraviolet irradiation through a photomask. The layer and all side cladding layers can be formed at once. Due to such features, the formation of the waveguide can be easily realized at low cost. Further, since each core layer and each side cladding layer can be formed by one batch exposure, it is possible to form each core layer and each side cladding layer while maintaining high positional accuracy and dimensional accuracy. This enables high-efficiency coupling with matrix-like semiconductor elements (semiconductor lasers, light-receiving elements, etc.) when transmitting optical signals in a multi-parallel manner in a matrix. That is, the size and the element interval of the matrix-shaped semiconductor optical element are manufactured at the mask dimension level. In addition, since the lower cladding layer, the core layer, the side cladding layer, and the upper cladding layer can all be made of a polymer material, the interface of each layer can be kept uniform, and low scattering loss characteristics can be realized. . In addition, if the photobleaching polymer material is used, all the layers can be made of the same photobleaching polymer material, and each layer can be set only by adjusting the irradiation amount of ultraviolet rays. For this reason, problems such as generation of microcracks and residual distortion due to mismatching of the thermal expansion coefficient hardly occur.

Another feature of the present invention is that, unlike the conventional method in which the core layer is formed by dry etching in a vacuum, the core layer having a substantially rectangular cross-sectional shape is formed by irradiation with ultraviolet rays. Since the side cladding layers having a low refractive index can be formed on both sides of the core layer,
The surface of each layer becomes flat. As a result, the uniformity of the interface of each layer is improved, and the optical element, optical component, or electronic component is easily mounted on the surface of each layer. Furthermore, it is necessary to use a transparent substrate to realize batch exposure. Further, when each layer is formed on both surfaces of the substrate, it is preferable that the thickness of the substrate be 0.3 mm or less in performing batch exposure using parallel light. Approximately 45 on the optical input / output end side of the waveguide
By forming an optical reflecting surface, an optical element or an optical component is provided on the upper surface or lower surface of the waveguide, and each optical signal is coupled into each core layer. Can be combined. In addition, since a polymer material for photobleaching is used, the light reflecting surface of approximately 45 degrees is irradiated with a linear beam of ultraviolet rays from the direction of approximately 45 degrees to the core layer, so that the non-contact and non-cutting methods are used. Can be easily and collectively formed on the core layer of the waveguide. According to this ultraviolet irradiation method, since a plurality of core layers are simultaneously irradiated at the same time, the angles of the light reflecting surfaces can be formed at the same angle. Since the laminated structure type photobleaching waveguide has flat upper and lower surfaces, it can be easily attached to another substrate, for example, a printed substrate or a ceramic substrate, using an ultraviolet-curing adhesive. It can also be used for composite mounting of electricity.

According to the method of manufacturing a laminated structure photobleaching waveguide of the present invention, by using a polymer material for each layer, each layer can be formed through a coating and heating process using a polymer solution in the air. In addition, each core layer and each side clad layer can be formed by one exposure. That is, it can be formed by an extremely simple process without using an expensive device, and cost reduction can be achieved.

[0025]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.

FIG. 1 is an external perspective view showing one embodiment of a laminated structure type photobleaching waveguide to which the manufacturing method of the present invention is applied.

The waveguide shown in the figure, are lower cladding layer 2a having a low refractive index n _b is formed on the transparent upper surface of the substrate 1, the high refractive index n _w (n _w> n over the lower cladding layer 2a _b ) Side surfaces of a plurality of (but not limited to six in the figure) core layers 3a-1, 3a-2,..., 3a-6 having a substantially rectangular cross-sectional shape and a low refractive index n _s (≒ n _b ). A clad layer 4a is formed, and an upper clad layer 5a having a low refractive index n _u (≒ n _b ) is formed on the core layers 3a-1, 3a-2,..., 3a-6 and the side clad layers 4a. One waveguide main body 7a,
Is a low refractive index n _b of the lower cladding layer 2b on top of the waveguide main body 7a is formed in the plurality (FIG substantially rectangular cross-sectional shape of the high refractive index n _w over the lower cladding layer 2b is a 6 3b-1, 3b-2,..., 3b
-6 and a low-refractive-index n _s side cladding layer 4b are formed, and a low-refractive-index n _u upper cladding layer 5 is provided on the core layers 3b-1, 3b-2,..., 3b-6 and the side cladding layer 4b.
and a second waveguide main body 7b on which b is formed.

That is, this waveguide is formed by laminating two stages of waveguide bodies 7a and 7b on the upper surface of the transparent substrate 1.

The core layers 3a-1, 3a-2,..., 3a-6, 3b-1, 3b of the waveguide main body 7a and the waveguide main body 7b.
,..., 3b-6 are on a vertical axis A perpendicular to the substrate 1
On ₁ -A _1, on A ₂ -A _2, ..., it is formed on an axis which coincides to overlap on A ₆ -A _6. This means that one photomask is formed on the upper surface of the upper cladding layer 5b as described later,
Alternatively, the core layers 3a-1 to 3a-3 may be disposed at a time by irradiating ultraviolet rays from above the photomask disposed on the lower surface of the transparent substrate 1.
a-6, 3b-1 to 3b-6 and the side cladding layer 4a,
4b. Such a structure in which the positions of the upper and lower core layers 3a-1 to 3a-6 and 3b-1 to 3b-6 and the intervals between the core layers 3a-1 to 3a-6 and 3b-1 to 3b-6 are constant. Since the waveguide has the same structure as the matrix structure of the light emitting element and the light receiving element, the coupling efficiency between the light emitting element (light receiving element) and the waveguide can be increased.

Here, the plane direction of the substrate 1 (the horizontal direction in the figure)
The intervals between the core layers 3a-1 to 3a-6 and 3b-1 to 3b-6 can be freely changed by the core pattern of the photomask. The upper and lower core layers 3a-1 to 3a-6, 3b
The interval between -1 to 3b-6 can be set by adjusting the thicknesses of the upper clad layer 5a and the lower clad layer 2b.

Further, as described later, each core layer 3a-1 to 3a-6, 3b-1 to 3b-1 of each of the two waveguides is exposed by one exposure.
In order to pattern 3b-6, a mechanism for converting light from an ultraviolet light source into parallel light may be provided and irradiated onto a photomask. However, in general, the parallel light beam does not spread greatly up to about 1 mm in the depth direction (thickness direction), and can emit substantially parallel light, so that the waveguide main bodies 7a and 7b and the transparent glass can be irradiated. The total thickness of the substrate 1 is 1
mm or less is preferable.

In the case of a single mode waveguide, the lower clad layers 2a and 2b, the upper clad layers 5a and 5b, and the core layers 3a-1 to 3a-6 and 3b-1 to 3b-6 each have a thickness of 30 μm. In the case of a multimode waveguide, each layer 2a, 2b, 3a-1 to 3a-6, 3b-1 to
Since the thicknesses of 3b-6, 5a, and 5b are 100 μm or less, if the thickness of the substrate 1 is 0.3 mm or less, the total thickness can be 1 mm or less, and each core layer 3a-1 ~
It is possible to pattern-expose the shapes of 3a-6 and 3b-1 to 3b-6 in substantially the same shape.

Here, the upper cladding layer 5 shown in FIG.
a, 5b and the lower cladding layers 2a, 2b may be formed of layers made of the same type of material.

FIG. 2 is an external perspective view showing another embodiment of the laminated photobleaching waveguide according to the present invention.
Hereinafter, the same members as those of the embodiment shown in FIG.

The difference from the embodiment shown in FIG. 1 is that waveguides are stacked one by one on both surfaces of a transparent substrate.

Also in this waveguide, similarly to the waveguide shown in FIG. 1, each core layer 3a-1 of the upper waveguide body 7a.
3a-6, and each core layer 3c- of the lower waveguide body 7c.
1-3c-6 are vertical axes B ₁ -B ₁ , B
_2- B ₂ ,..., B ₆ -B ₆ . Since the substrate 1 and the waveguide bodies 7a and 7c are all made of a transparent material, the core layers 3a-1 to 3a-
6, 3c-1 to 3c-6 can be patterned by disposing a photomask on the upper surface of either the upper cladding layer 5a or the upper cladding layer 5c, and irradiating the photomask with parallel ultraviolet light. This can be realized by exposing and patterning the photobleaching polymer layers on the waveguide main body 7a side and the waveguide main body 7c side.

FIGS. 3 and 4 are side views showing modified examples of the laminated structure type photobleaching waveguide of the present invention.

That is, the light input terminals 8-1, 8-
It is formed so as to have a light reflecting surface at angles θ ₁ to θ ₄ (approximately 45 degrees) on the third side and the light output ends 8-2 and 8-4. The waveguide shown in FIG. 3 shows a case where the light reflection surface of the light input end 8-1 and the light reflection surface of the light output end 8-2 are substantially parallel,
The waveguide shown in FIG. 4 shows a case where the light reflection surface of the light input end 8-3 and the light reflection surface of the light output end 8-4 are substantially orthogonal.

In each of the waveguides shown in FIGS. 3 and 4, signal light enters from outside the waveguide or is guided by using the light reflecting surfaces of the light input ends 8-1 and 8-3. The signal light propagating in the wave path can be emitted to the outside using the light reflecting surfaces of the light output ends 8-2 and 8-4.

FIGS. 5A to 5C are process diagrams showing one embodiment of a method for manufacturing a laminated structure type photobleaching waveguide according to the present invention.

As shown in FIG. 5A, a lower clad layer 2a, a polymer layer for photobleaching 3a, an upper clad layer 5a, and a lower clad layer 2 are formed on the surface of a transparent substrate 1.
b, a photobleaching polymer layer 3b and an upper cladding layer 5b are sequentially laminated.

Here, each of the layers 2a, 2b, 3a, 3b, 5
When a polymer material is used for a and 5b, a polymer solution dissolved in an organic solvent is applied by a method such as a spin coating method or an extrusion coating method, as described later, and then subjected to pre-baking and post-baking. Obtain a cured polymer layer. Materials other than the polymer material, such as a sol-gel film and C, are added to the layers other than the photobleaching polymer layer.
A VD film, a spin-on-glass film, a water glass film, or the like may be used.

Next, as shown in FIG. 5B, a photomask 10 on which a desired core pattern (light blocking property, hatched portion) is drawn is placed on the upper cladding layer 5b. UV light 9 is irradiated from above. This UV 9
Uses a parallel light source having sufficient parallelism up to the lower surface of the substrate 1. By performing an exposure step by ultraviolet irradiation, a laminated structure type photobleaching waveguide as shown in FIG. 5C can be realized.

FIG. 6 is an explanatory view showing another embodiment of the method of manufacturing the laminated structure type photobleaching waveguide of the present invention.

The difference from the embodiment shown in FIGS. 5A to 5C is that an ultraviolet laser beam is provided on the light input side and the light output side of the laminated structure type photobleaching waveguide shown in FIG. Is applied to form a light reflecting surface.

As shown in FIG. 6, an ultraviolet linear laser beam is directed in the directions of arrows 11-1 and 11-2 at angles θ ₅ and θ ₆ (both 45 degrees) from the upper surface of the upper cladding layer 5c. And irradiate. As a result, the core layers 3a, 3b, and 3c have not been irradiated with ultraviolet rays or have been irradiated with a sufficiently small amount of ultraviolet rays.
Are light-reflecting surfaces 12-1, 12-2, 12-3, 12-4, and 1, which are exposed by the linear laser beam light and have a low refractive index.
2-5 and 12-6 are formed. This light reflecting surface 12-1
~ 12-6 is the irradiation energy of the ultraviolet laser beam,
In other words, by changing the irradiation time and irradiation power,
The amount of decrease in the refractive index can be controlled. Since the relative refractive index difference before and after the irradiation of the ultraviolet rays can be obtained up to about 6%, it can function as a 45-degree light reflecting surface. Further, the width of the light reflecting surface can be increased by moving the ultraviolet laser beam in the directions of arrows 17-1 and 17-2.

Incidentally, 5a + 2b in the figure is obtained by applying a silicone solution dissolved in toluene by a spin coating method,
Pre-baking at about 120 ° C. and post-baking at about 200 ° C. are performed for 20 minutes each to show a cured silicone polymer layer (upper clad layer 5a and lower clad layer 2b) having a thickness of about 20 μm. The polymer layers (upper cladding layer 5b, lower cladding layer 2c) are shown.

FIG. 7A is a plan view showing a case where an optical element or an electronic component is mounted on the laminated structure photobleaching waveguide of the present invention, and FIG. 7B is a side sectional view of FIG. FIG.

The light-emitting elements are arranged in a matrix of 5 rows and 2 columns, that is, 10 light-emitting elements are arranged in a matrix (5 light-emitting elements 13a and 5 light-emitting elements 13c). Two rows, that is, ten elements are arranged in a matrix (five core layers 3a and five core layers 3c), and five light receiving elements for receiving an optical signal propagating in the core layer are also provided.
Two rows, that is, ten rows are arranged in a matrix (5 light receiving elements 14a and 5 light receiving elements 14c).
Also, an LSI for driving the light emitting elements 13a and 13c
Is placed on each of the light emitting elements 13a and 13c (the LSI 15a is
And five LSIs 15c). L for amplifying and reproducing the signal converted into the electric signal by the light receiving element.
SI is also stacked on each light receiving element (LS
Five I16a and five LSI16c).

The light signals from the light emitting elements 13a (13c) are indicated by arrows 18-1 (19-1) and 18-2 (19-
2), propagate as 18-3 (19-3) and 18-4 (19-4), and are received by the light receiving element 14a (14c).

Next, specific numerical values will be described, but the present invention is not limited to these numerical values.

[0052]

EXAMPLE 1 In FIG. 1, a quartz glass substrate having a thickness of 0.2 mm was used as a transparent substrate 1 and a silicone solution (phenylmethylmethoxysilicone resin) dissolved in toluene was placed on the quartz substrate. Is applied by spin coating, and pre-baking at about 120 ° C. and post-baking at about 200 ° C. are performed for 20 minutes each, and a cured silicone polymer layer (refraction index: about 20 μm thick) is formed. 632.8 nm wavelength
1.478) to form a lower cladding layer 2a.

On the lower cladding layer 2a, a polymer solution obtained by mixing a polysilane dissolved in toluene and a silicone compound (a polymer solution obtained by adding 50% of a silicone compound to a branched polymethylphenylsilane compound having a branching degree of 20%) was used. Apply by spin coating method, about 150 ° C
Was prebaked and postbaked at about 250 ° C. for 20 minutes each to form a cured photobleaching polymer layer (having a refractive index of 1.64 at a wavelength of 632.8 nm) 3a having a thickness of about 15 μm.

Next, a silicone solution dissolved in toluene was applied on the photobleaching polymer layer 3a by spin coating, and prebaked at about 120 ° C. and post-baked at about 200 ° C. for 20 minutes, respectively. A cured silicone polymer layer 5a, 2 having a thickness of about 20 μm;
b, and the silicone polymer layers 5a and 2b are
As the upper clad layer 5a and the lower clad layer 2b.

Next, on the silicone polymer layer (upper cladding layer 5a, lower cladding layer 2b), a polymer solution obtained by mixing a polysilane dissolved in toluene and a silicone compound is applied by a spin coating method. Pre-baking and post-baking at about 250 ° C. were performed for 20 minutes each to form a photobleaching polymer layer 3b cured to a thickness of about 15 μm.

Next, a silicone polymer layer was formed on the photobleaching polymer layer 3b by the above-described method to form an upper clad layer 5b.

Thereafter, as shown in FIG. 5B, the photomask 10 is disposed on the upper
Irradiation with ultraviolet light having an energy of 000 mJ was performed. As a result, the photobleaching polymer layers 3a and 3b are both high refractive index core layers 3a-1 to 3a-6 and 3b-1 to 3b-.
6 and the low refractive index side cladding layers 4a and 4b, and a laminated structure type photobleaching waveguide as shown in FIGS. 1 and 5 (c) was obtained.

(Example 2) A waveguide similar to that of Example 1 (see FIG. 1) was used as the substrate 1 by using a PET (polyethylene phthalate) film having a thickness of 0.2 mm instead of the quartz glass substrate. I got it.

Example 3 As the substrate 1, the waveguide shown in FIG. 1 was manufactured using a Si substrate (0.1 mm thick).

In Examples 1 to 3, the core layers 3a-1 to 3a-3 were used.
a-6, 3b-1 to 3b-6, width and thickness of 15
A pattern of μm was prepared, and in each case, the core layer 3a-1 was used.
3a-6, 3b-1 to 3b-6 have a width and thickness of 15 μm.
m ± 2 μm. Also, the vertical axis A ₁ -A ₁ .
The axial misalignment of the core layers 3a and 3b from above A ₆ -A ₆ was evaluated, and any of the core layers 3a-1 to 3a-6 and 3b-1 to 3 was evaluated.
b-6 was also within the range of ± 2 μm. That is, it was confirmed that a photomask was arranged on the upper cladding layer 5b and that exposure with high dimensional accuracy could be performed by batch exposure.

Example 4 Next, referring to FIG. 1 (or FIG. 2), the lower cladding layers 2a and 2b and the core layers 3a-1 to 3a-1
3a-6, 3b-1 to 3b-6, side cladding layer 4a,
A case where a polymer layer for photobleaching is used for 4b and the upper cladding layers 5a and 5b will be described.

The lower cladding layers 2a and 2b shown in FIG.
As the upper cladding layers 5a and 5b, a polymer solution previously irradiated with ultraviolet light having an energy of 40,000 mJ was applied to a polymer solution obtained by mixing the above-mentioned polysilane dissolved in toluene and a silicone compound by spin coating. A pre-bake at 150 ° C. and a post-bake at about 250 ° C. were performed for 20 minutes each to use a cured polymer layer having a thickness of about 20 μm (refractive index is about 1.57 at a wavelength of 632.8 nm). That is, as described above, the ultraviolet ray is irradiated in the state of the polymer solution, the polymer solution is applied, and the heat-cured polymer layer has a refractive index of:
It has been found that it can be adjusted by the irradiation amount of ultraviolet rays.

Therefore, the lower cladding layers 2a and 2b and the upper cladding layers 5a and 5b are sufficiently irradiated with ultraviolet rays to apply a polymer solution having a value at which the decrease in the refractive index is saturated. And a polymer layer obtained by curing. As a matter of course, polymer layers were formed on the core layers 3a and 3b using a polymer solution obtained by mixing the above-mentioned polysilane dissolved in toluene and a silicone compound.
The core layers 3a and 3b may be coated with a polymer solution which has been irradiated with a desired amount of ultraviolet light in advance, and then heated and cured to obtain a polymer layer.

(Example 5) Next, the waveguide formed on the PET film described above was adhered to a multilayer polyimide substrate on which electric wiring was mounted with an ultraviolet curing adhesive, and the light propagation loss of the waveguide was evaluated. However, compared to the light propagation loss evaluated before the attachment, the increase in the light propagation loss can be suppressed to only about 10%, and it was confirmed that the device can be practically attached and used.

(1) Since the core layer and the side cladding layer of each waveguide are composed of a polymer material for photobleaching,
The core layer and the side cladding layers of all the waveguides can be collectively formed by performing only one exposure by ultraviolet irradiation through a photomask.

(2) It is possible to easily form a waveguide at low cost.

(3) The positional accuracy and dimensional accuracy of each core layer and side cladding layers can be maintained with high accuracy.

(4) Since a matrix waveguide can be realized with high dimensional accuracy, it can be efficiently coupled to a semiconductor device (semiconductor laser or light receiving device) configured in a matrix.

(5) Since the lower clad layer, the core layer, the side clad layer, and the upper clad layer of each waveguide can all be made of a polymer material, the interface of each layer can be kept uniform and low scattering loss can be achieved. Characteristics can be realized. In addition, since each layer can be made of the same polymer material for photobleaching, problems such as generation of microcracks and residual distortion due to mismatching in the coefficient of thermal expansion hardly occur.

(6) Since the layer surface of each waveguide is flat, an optical element, an optical component or an electronic component can be easily mounted on the surface with high dimensional accuracy.

(7) A light reflecting surface can be formed collectively only by irradiating the light input / output end side of each waveguide with an ultraviolet laser beam. In addition, since both can be formed at the same angle of the oblique reflection surface, the optical signal can be emitted or incident in the same angle direction.

[0072]

In summary, according to the present invention, the following excellent effects are exhibited.

It is possible to provide a laminated structure type photobleaching waveguide capable of obtaining a high-accuracy waveguide simply and at low cost, and a method of manufacturing the same.

[Brief description of the drawings]

FIG. 1 is an external perspective view showing an embodiment of a laminated photobleaching waveguide to which a manufacturing method of the present invention is applied.

FIG. 2 is an external perspective view showing another embodiment of the laminated structure type photobleaching waveguide of the present invention.

FIG. 3 is a side view showing a modified example of the laminated structure type photobleaching waveguide of the present invention.

FIG. 4 is a side view showing another modified example of the laminated structure type photobleaching waveguide of the present invention.

5 (a) to 5 (c) are process diagrams showing one embodiment of a method for manufacturing a laminated structure type photobleaching waveguide according to the present invention.

FIG. 6 is an explanatory view showing another embodiment of the method for manufacturing a laminated structure type photobleaching waveguide of the present invention.

FIG. 7A is a plan view when an optical element or an electronic component is mounted on the laminated structure photobleaching waveguide of the present invention, and FIG. 7B is a side sectional view of FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 2a, 2b Lower cladding layer 3a-1-3a-6, 3b-1-3b-6 Core layer 4a, 4b Side cladding layer 5a, 5b Upper cladding layer 7a, 7b Waveguide main body

Claims (14)

[Claims] A core layer having a higher refractive index than the lower cladding layer is formed on the lower cladding layer, and side cladding layers having a lower refractive index than the core layer are formed on both sides of the core layer on the lower cladding layer. The waveguide body in which an upper cladding layer having a lower refractive index than the core layer is formed on the core layer and the side cladding layer has a position of the core layer on any one surface of the transparent substrate, or both surfaces. A laminated structure photobleaching waveguide, wherein the lower cladding layer, the core layer, the side cladding layer, and the upper cladding layer are formed of a photobleaching material. 2. The multilayer structure photobleaching waveguide according to claim 1, wherein a plurality of said core layers are formed at a desired interval between said lower cladding layer and said upper cladding layer. 3. The laminated photobleaching waveguide according to claim 1, wherein glass, plastic, sapphire, or flexible plastic film is used as a material of the substrate. 4. The laminated structure photobleaching waveguide according to claim 1, wherein said lower cladding layer, said core layer, said side cladding layer, and said upper cladding layer are made of a polymer material. . 5. The laminated structure photobleaching waveguide according to claim 1, wherein a waveguide main body is formed on both surfaces of a substrate having a thickness of 0.3 mm or less. 6. A semiconductor such as Si or GaAs, LiNbO.
Ferroelectric such as _3, laminate structure-type photobleaching waveguide according to any one of the upper surface or lower surface of an opaque substrate of claims 1, waveguide body is formed in one of four such as ceramics. 7. A multilayer structure type photobleaching device according to claim 1, wherein a light reflecting surface of approximately 45 degrees is formed at a light input end and a light output end of the waveguide main body and the substrate. Waveguide. 8. The photobleaching device according to claim 6, wherein the light reflecting surface at the light input end and the light reflecting surface at the light output end are formed so as to be substantially parallel or substantially orthogonal. Waveguide. 9. The laminated structure photobleaching waveguide according to claim 1, wherein said waveguide main body and said substrate are pasted on another substrate. 10. The waveguide body according to claim 1, wherein:
10. The laminated photobleaching waveguide according to claim 1, wherein a semiconductor optical device, an optical component, or an electronic component is mounted on both surfaces. 11. A photo-bleaching polymer layer having a higher refractive index than the lower cladding layer is formed on the lower cladding layer after forming a lower cladding layer on one or both surfaces of a transparent substrate. And forming an upper cladding layer having a lower refractive index than the photobleaching polymer layer on the photobleaching polymer layer at least once, and then forming a core pattern on the upper cladding layer. Is arranged, and by irradiating ultraviolet rays from above the photomask, the photobleaching polymer layer is positioned on both sides of the core layer having a high refractive index substantially rectangular cross section and the core layer. A method of manufacturing a laminated structure type photobleaching waveguide in which a waveguide having a laminated structure is formed by changing to a side cladding layer having a low refractive index. 12. The waveguide body and the substrate are obliquely cut so as to have a light reflecting surface of approximately 45 degrees on the light input end and light output end side, or linear ultraviolet light is applied to the waveguide. 12. A part of the core layer is changed to a low-refractive-index 45-degree light reflecting surface by irradiating from a direction of approximately 45 degrees.
5. The method for producing a laminated structure type photobleaching waveguide according to item 4. 13. The method of manufacturing a laminated structure photobleaching waveguide according to claim 11, wherein the waveguide main body is attached to another substrate using an ultraviolet curing adhesive. 14. The multilayer structure photobleaching waveguide according to claim 11, wherein a semiconductor optical device, an optical component, an electronic component, and the like are mounted on an upper surface, a lower surface, or both surfaces of the waveguide main body. Manufacturing method.