JP2002346312A - Filter medium treatment method in liquid feed flow channel - Google Patents
Filter medium treatment method in liquid feed flow channelInfo
- Publication number
- JP2002346312A JP2002346312A JP2001153408A JP2001153408A JP2002346312A JP 2002346312 A JP2002346312 A JP 2002346312A JP 2001153408 A JP2001153408 A JP 2001153408A JP 2001153408 A JP2001153408 A JP 2001153408A JP 2002346312 A JP2002346312 A JP 2002346312A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- filter medium
- housing
- liquid feed
- flow path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Filtration Of Liquid (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、塗布装置等に用い
られる送液流路において、送液液体に気泡が混入しない
ようにした送液流路における濾材処理方法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a filter medium in a liquid sending flow path used in a coating apparatus or the like so that bubbles are not mixed into the liquid sending liquid.
【0002】[0002]
【従来の技術】一般に、送液流路を用いて次工程、例え
ば、塗布装置に塗布液を供給する送液方法においては、
不純物等を除去するために、送液流路内に濾材を設けて
いる。しかし、このような濾材を通して塗布液を送る
と、濾材の空孔内に残存する空気が気泡として塗布液内
に混入し、気泡が混入した塗布液が基体上に塗布される
と欠陥となるものであった。2. Description of the Related Art Generally, in the next step, for example, a liquid feeding method for supplying a coating liquid to a coating apparatus using a liquid feeding flow path,
In order to remove impurities and the like, a filter medium is provided in the liquid sending flow path. However, when the coating liquid is sent through such a filter medium, air remaining in the pores of the filter medium is mixed into the coating liquid as air bubbles, and when the coating liquid containing air bubbles is applied to the substrate, it becomes a defect. Met.
【0003】したがって、従来、塗布液等の送液液体に
気泡が混入しないような技術が各種提案されている。例
えば、特公昭58−48891号公報では、減圧状態に
した流路内に、前記減圧よりは高いが大気圧よりは低い
圧力下で生成された飽和蒸気を導き、その後この蒸気の
排除のために脱気された液体を流路に導く方法が提案さ
れている。特公昭62−43722号公報および特公平
2−49149号公報では、脱気された温水を流路に通
じ、流路内に存在する空気を押し出した後、使用に供さ
れる液体を供給する方法が提案されている。特公平1−
17729号公報では、連続的な濾過、送液を行うため
濾材の閉塞時に切替を行えるように並列配置としたキャ
ンドルフィルターの片側の空気を排除するため、該液体
を分割送液し、噴出口からの空気を伴った液体を循環
し、製造へと戻す方法が提案されている。特開昭62−
274257号公報では、超音波検査時の気泡の存在に
よる超音波信号の拡散や減衰を防ぐために、密閉した検
査対象に減圧した状態で液体を流入させ、その液体を脱
気する装置が提案されている。特開平3−207439
号公報では、脱気温水と低表面張力液を組み合わせて用
いることで、塗布液送液前に流路内の気体を排除する方
法が提案されている。特公平2−37228号公報で
は、被含浸物に合成樹脂を注入・含浸するにあたり、減
圧もしくは常圧下で樹脂を注入、さらに減圧→常圧、常
圧→加圧の圧力変化を繰り返すことによって、ボイドの
発生を抑制する方法が提案されている。Therefore, various techniques have been proposed to prevent bubbles from being mixed into a liquid to be fed such as a coating liquid. For example, in Japanese Patent Publication No. 58-48891, saturated steam generated under a pressure higher than the reduced pressure but lower than the atmospheric pressure is guided into a flow path in a reduced pressure state. A method has been proposed in which degassed liquid is guided to a flow path. JP-B-62-43722 and JP-B-2-49149 disclose a method in which degassed hot water is passed through a flow path, air present in the flow path is extruded, and a liquid to be used is supplied. Has been proposed. Tokuhei 1-
In Japanese Patent No. 17729, in order to eliminate air on one side of a candle filter arranged in parallel so that switching can be performed when a filter medium is closed in order to perform continuous filtration and liquid supply, the liquid is divided and supplied, and the liquid is supplied from a jet port. A method has been proposed in which a liquid with air is circulated and returned to production. JP-A-62-2
Japanese Patent Application Publication No. 274257 proposes a device for introducing a liquid under reduced pressure into a sealed test object and degassing the liquid in order to prevent the diffusion and attenuation of the ultrasonic signal due to the presence of bubbles during the ultrasonic test. I have. JP-A-3-207439
In Japanese Patent Application Laid-Open Publication No. H11-264, a method is proposed in which gas in a flow path is eliminated before sending a coating liquid by using de-aired water and a low surface tension liquid in combination. In Japanese Patent Publication No. 2-37228, upon injecting and impregnating a synthetic resin into an impregnated material, the resin is injected under reduced pressure or normal pressure, and further, pressure change of reduced pressure → normal pressure, normal pressure → pressurized is repeated. Methods for suppressing the generation of voids have been proposed.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上述し
た従来の各種方法にはそれぞれ問題があった。すなわ
ち、前記特公昭58−48891号公報で提案された方
法は、減圧下での飽和蒸気を生成するための付帯設備が
必要であり、また、この飽和蒸気の温度は、好ましい具
体例によれば、送液されるべき液体よりも10から20
℃高い温度であるため、送液流路内に設けられる各種計
器類に好ましからざる影響をもたらすばかりか、感光材
料用塗布液の如く、流路の温調が必要な場合に温調制御
系への外乱をもたらすものであった。However, each of the above-mentioned conventional methods has its own problems. That is, the method proposed in Japanese Patent Publication No. 58-48891 requires an additional facility for generating saturated steam under reduced pressure, and the temperature of the saturated steam is determined according to a preferred embodiment. , 10 to 20 more than the liquid to be pumped
Because of the high temperature, it not only has an unfavorable effect on the various instruments installed in the liquid feed channel, but also provides a temperature control system when the temperature of the flow channel needs to be controlled, such as a coating solution for photosensitive materials. Was to cause disturbance.
【0005】特公昭62−43722号公報および特公
平2−49149号公報で提案された方法は、空気除去
に用いられるのは温水のみであり、また、特開平3−2
07439号公報で提案された方法では低表面張力液を
併用しているが、これらの場合は温水や低表面張力液が
除去しきれる空気、ことに濾材空孔内の残存空気に限度
があり、該流路を用いて送液される液体が高粘度、低表
面張力、しかも高流量な場合、温水や低表面張力液で排
除し切れなかった有意に大量の気泡が該液体に混入する
ものであった。特に、プリーツ構造を持つ濾材を用いた
場合は、プリーツの折込部分の残存空気が大きいので、
気泡の混入量が極めて多いものとなっていた。The methods proposed in Japanese Patent Publication Nos. 62-43722 and 2-49149 use only hot water for air removal.
In the method proposed in Japanese Patent No. 07439, a low surface tension liquid is used in combination, but in these cases, there is a limit to the air from which the warm water and the low surface tension liquid can be completely removed, especially to the residual air in the filter medium pores. If the liquid sent using the flow path has a high viscosity, a low surface tension, and a high flow rate, a significantly large amount of air bubbles that cannot be eliminated by hot water or a low surface tension liquid are mixed into the liquid. there were. In particular, when a filter medium with a pleated structure is used, the residual air in the folded part of the pleat is large,
The amount of air bubbles was extremely large.
【0006】前記特公平1−17729号公報で提案さ
れた方法は、高価な液体のロスを防ぐためには空気除去
に用いられた液体を供給元に戻すための循環系が必要と
なり、また、該液体に混入した気泡を分離・除去する方
法、装置が別途必要となるので送液流路全体が複雑とな
るものであった。The method proposed in Japanese Patent Publication No. 1-172929 requires a circulation system for returning the liquid used for air removal to the supply source in order to prevent loss of expensive liquid. A separate method and apparatus for separating and removing air bubbles mixed into the liquid are required, which complicates the entire liquid supply flow path.
【0007】特開昭62−274257号公報で提案さ
れた方法は、超音波検査される穴に気泡混入無しに、脱
気された液体を注入するのであるが、これは検査対象そ
のものを減圧により液体を脱気するための部屋とし、ま
た液体を注入した後、常圧に戻す操作を繰り返すこと
で、穴を完全に液体で充満させることを狙いとしてい
る。注入後減圧・常圧の圧力変化を繰り返すのみでは、
気泡は減圧によって脱気された注入液体に対して徐々に
溶解されるのみの効果であり、送液流路の濾材では多大
な時間を必要とするものであった。In the method proposed in Japanese Patent Application Laid-Open No. 62-274257, a degassed liquid is injected into a hole to be subjected to ultrasonic inspection without introducing air bubbles. The room aims to completely fill the hole with liquid by decanting the liquid and repeating the operation of returning to normal pressure after injecting the liquid. Just repeating pressure change of normal pressure and reduced pressure after injection,
Bubbles have the effect of only being gradually dissolved in the injection liquid degassed by depressurization, and the filter medium in the liquid sending flow path requires a great deal of time.
【0008】特公平2−37228号公報で提案された
方法は、圧力容器内に収められた収納容器内において、
常圧下で被含浸物に合成樹脂を注入した後、加圧し、さ
らに常圧に戻した後、再び加圧する操作を一回以上繰り
返す、あるいは減圧下で注入を行い、常圧に戻し、さら
に減圧した後、常圧に戻す操作を一回以上繰り返す方法
である。これは特開昭62−274257号公報と同
様、単にボイドの要因となる被含浸物に残存する気泡に
圧力変化を加えることで気泡を樹脂へ溶解せしめる、あ
るいは拡散せしめる効果を狙ったものであり、送液流路
において流動状態を保たねば凝固するような対象液体で
は、静置状態で圧力変化を行うことは困難であるし、流
動状態で圧力変化を与えることは多大な液ロスをうむこ
とになる。凝固しない液体であっても流路全体を加圧す
る装置は過大なものとなるし、一般的なガス体による加
圧を行えば、このガス自身が液体へ溶解し、過飽和状態
をもたらし、塗布部における気泡の再析出を引き起こす
ことになる。減圧する場合は液体自身からの発泡が問題
となる。[0008] The method proposed in Japanese Patent Publication No. 2-37228 discloses a method in which a storage container housed in a pressure vessel is used.
After injecting the synthetic resin into the material to be impregnated under normal pressure, pressurizing, returning to normal pressure, and then repeating the operation of applying pressure once or more, or performing injection under reduced pressure, returning to normal pressure, and further reducing pressure Then, the operation of returning to normal pressure is repeated once or more. This aims at dissolving or diffusing the bubbles in the resin by simply applying a pressure change to the bubbles remaining in the impregnated material which causes voids, similarly to JP-A-62-274257. However, it is difficult to change the pressure in a stationary state with a target liquid that solidifies if the liquid is kept in a flowing state in the liquid flow path, and applying a pressure change in a flowing state causes a large liquid loss. Will be. Even if it is a liquid that does not solidify, the device that pressurizes the entire flow channel becomes excessively large, and if pressurized with a general gas, this gas itself dissolves in the liquid, causing a supersaturated state, and the coating section Will cause re-precipitation of bubbles. When the pressure is reduced, foaming from the liquid itself becomes a problem.
【0009】本発明は、以上の問題点を解決し、簡単な
装置を用い短時間の処理作業で気泡の混入を確実に防止
することができる送液流路における濾材処理方法を提供
することを目的とする。The present invention has been made to solve the above problems and to provide a method for treating a filter medium in a liquid feed passage which can reliably prevent air bubbles from being mixed in a short processing operation using a simple apparatus. Aim.
【0010】[0010]
【課題を解決するための手段】すなわち、本発明による
送液流路における濾材処理方法は、送液流路そのものを
減圧し、かつ濾材処理液を送液流路に充填し、さらにこ
の濾材処理液を排出する操作を1回以上繰り返すこと
で、又はこのような操作を送液流路とは別途設けたハウ
ジングにおいて行うことで、濾材を含む送液流路、又は
流路にセットされる濾材を、予め残存気泡の無い状態に
し、その後、送液されるべき対象液体を直ちに通液する
ものである。That is, in the method for treating a filter medium in a liquid feed channel according to the present invention, the pressure of the liquid feed channel itself is reduced, the filter medium processing liquid is filled in the liquid feed channel, and the filter material treatment is further performed. By repeating the operation of discharging the liquid one or more times, or by performing such an operation in a housing provided separately from the liquid sending flow path, the liquid sending flow path including the filter medium, or the filter medium set in the flow path Is made to have no residual air bubbles in advance, and thereafter the target liquid to be fed is immediately passed.
【0011】本発明による第1の送液流路における濾材
処理方法は、濾材の装着された送液流路において、該送
液流路を減圧する減圧工程と、該減圧工程で減圧された
送液流路内に濾材処理液を充填する液体充填工程と、該
液体充填工程で充填された濾材処理液を送液流路外へ排
出する液体排出工程とを有することを特徴として構成さ
れている。[0011] In the first method for treating a filter medium in a liquid feed channel according to the present invention, a pressure reducing step of reducing the pressure in the liquid feed channel in the liquid feed channel provided with the filter medium, It is characterized by having a liquid filling step of filling the filter medium treatment liquid into the liquid flow path, and a liquid discharging step of discharging the filter medium treatment liquid filled in the liquid filling step to the outside of the liquid supply flow path. .
【0012】本発明による第1の送液流路における濾材
処理方法においては、減圧下の送液流路に濾材処理液を
充填すると、濾材処理液が濾材の内部にまで侵入してい
くが、濾材の空孔内に排除しきれない空気が残る。次
に、充填した濾材処理液を排出すると、濾材処理液の一
部が空孔近傍、空孔内部に残留し、空孔の一部が濡れた
状態となる。この状態で濾材処理液体が再度充填される
と、空孔の一部は既に濡れた状態にあるので、濡れ易
く、また、減圧により一度排出された空気は濡れて閉じ
られた間隙には再流入しづらいものであるので、空孔に
濾材処理液が充填されていく。この操作を繰り返すと、
短時間で濾材処理液を全ての空孔に充填することができ
る。したがって、濾材処理液の充填後に通液される送液
液体に気泡が混入することがない。In the first method for treating a filter medium in the liquid-feeding channel according to the present invention, when the filter-material processing solution is filled in the liquid-feeding channel under reduced pressure, the filter material-treating liquid enters the inside of the filter material. Unremovable air remains in the pores of the filter medium. Next, when the filled filter medium treatment liquid is discharged, a part of the filter medium treatment liquid remains near the pores and inside the pores, and a part of the pores becomes wet. When the filter medium treatment liquid is refilled in this state, some of the pores are already wet, so it is easy to get wet, and the air once exhausted by the reduced pressure re-enters the closed gap that is wet. Since the pores are difficult to fill, the pores are filled with the filter medium treatment liquid. By repeating this operation,
All pores can be filled with the filter medium treatment liquid in a short time. Therefore, no bubbles are mixed into the liquid to be sent after the filling of the filter medium processing liquid.
【0013】本発明による第2の送液流路における濾材
処理方法は、濾材を着脱自在に取り付けられるハウジン
グを用意し、ハウジングに濾材を取り付ける濾材取付工
程と、ハウジング内を減圧する減圧工程と、該減圧工程
で減圧されたハウジング内に濾材処理液を充填する液体
充填工程と、該液体充填工程で充填された濾材処理液を
ハウジング外へ排出する液体排出工程と、ハウジングよ
り濾材を取り出す濾材取出し工程と、濾材取出し工程で
取出した濾材を送液流路に取り付ける濾材取付工程とを
有することを特徴として構成されている。According to the second method for treating a filter medium in the liquid feed channel according to the present invention, there is provided a housing in which a filter medium is detachably mounted, a filter medium mounting step of mounting the filter medium in the housing, a depressurizing step of depressurizing the inside of the housing, A liquid filling step of filling the filter medium processing liquid into the housing decompressed in the pressure reducing step, a liquid discharging step of discharging the filter medium processing liquid filled in the liquid filling step to the outside of the housing, and removing the filter medium from the housing And a filter medium attaching step of attaching the filter medium taken out in the filter medium taking-out step to the liquid sending flow path.
【0014】本発明による第2の送液流路における濾材
処理方法においては、減圧下のハウジングに濾材処理液
を充填すると、濾材処理液が濾材の内部にまで侵入して
いくが、濾材の空孔内に排除しきれない空気が残る。次
に、充填した濾材処理液を排出すると、濾材処理液の一
部が空孔近傍、空孔内部に残留し、空孔の一部が濡れた
状態となる。この状態で濾材処理液体が再度充填される
と、空孔の一部は既に濡れた状態にあるので、濡れ易
く、また、減圧により排出された空気は濡れて閉じられ
た間隙には再流入しづらいものであるので、空孔に濾材
処理液が充填されていく。この状態の濾材を送液流路に
取り付けると、送液液体を通液させても、送液液体に気
泡が混入することがない。In the filter material processing method in the second liquid feed passage according to the present invention, when the housing under reduced pressure is filled with the filter medium processing liquid, the filter medium processing liquid enters the inside of the filter medium, but the filter medium becomes empty. Unremovable air remains in the holes. Next, when the filled filter medium treatment liquid is discharged, a part of the filter medium treatment liquid remains near the pores and inside the pores, and a part of the pores becomes wet. When the filter medium treatment liquid is refilled in this state, some of the holes are already wet, so it is easy to get wet, and the air exhausted by the reduced pressure flows back into the wet and closed gap. Since it is difficult, the pores are filled with the filter medium treatment liquid. When the filter medium in this state is attached to the liquid sending flow path, bubbles are not mixed into the liquid sending liquid even when the liquid sending liquid is passed.
【0015】[0015]
【発明の実施の形態】まず、第1の送液流路における濾
材処理方法について説明する。減圧工程は送液流路内を
減圧するもので、減圧度は、高真空を達成するまで減圧
する必要はないが、200Torr以下にすることが好
ましく、50Torr以下にすることがより好ましい。
減圧する装置としては、特に限定されるものでなく、従
来公知の減圧ポンプを用いることができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, a method for treating a filter medium in a first liquid feed channel will be described. The depressurizing step is a step of depressurizing the inside of the liquid sending flow path. The degree of depressurization does not need to be reduced until a high vacuum is achieved, but is preferably 200 Torr or less, more preferably 50 Torr or less.
The pressure reducing device is not particularly limited, and a conventionally known pressure reducing pump can be used.
【0016】液体充填工程は送液流路内に濾材処理液を
充填するもので、濾材処理液は、水又は温水、低表面張
力液、例えば、界面活性剤の水溶液、有機溶媒(アルコ
ール等)及びその水溶液を用いることができ、また、送
液流路で送液しようとする液体それ自身であってもよ
い。また、濾材処理液は、予め脱気されていることが好
ましい。In the liquid filling step, a filter medium treatment liquid is filled in the liquid sending flow path, and the filter medium treatment liquid is water or warm water, a low surface tension liquid, for example, an aqueous solution of a surfactant, an organic solvent (such as alcohol) or the like. And an aqueous solution thereof, or the liquid itself to be sent in the liquid sending channel. Further, the filter medium treatment liquid is preferably degassed in advance.
【0017】液体排出工程は送液流路内から濾材処理液
を排出するもので、濾材処理液を送液流路から外部へ廃
棄しても、送液流路を逆送させて濾材処理液の供給源へ
戻してもよく、いずれにしても送液流路内を空の状態に
できればよいものである。In the liquid discharging step, the filter medium processing liquid is discharged from the inside of the liquid sending flow path. Even if the filter medium processing liquid is discarded from the liquid sending flow path to the outside, the liquid sending flow path is reversely fed to the filter medium processing liquid. May be returned to the supply source, and in any case, it is sufficient that the inside of the liquid sending flow path can be emptied.
【0018】以上のような減圧工程、液体充填工程及び
液体排出工程を少なくとも1回行うのであるが、3回〜
10回連続して行うことが好ましく、空孔のサイズによ
っては20回行っても良い。このような工程を経た後、
最終の液体充填工程を行った状態で操作を停止するが、
これは濾材処理液を送液流路内に充填するもので、用い
る濾材処理液体は、初期の液体充填工程の場合と同様、
もしくは初期の濾材処理液体が本来の送液液体との親和
性の低いものであれば、親和性の高いものを最終充填用
の濾材処理液体としてもよい。最終液体充填工程におけ
る濾材処理液の充填後、本来の搬送する目的である送液
液体の通液を開始する。The above-described pressure reduction step, liquid filling step and liquid discharging step are performed at least once.
It is preferably performed 10 times continuously, and may be performed 20 times depending on the size of the pores. After going through such a process,
The operation stops after the final liquid filling step has been performed,
This is to fill the filter medium processing liquid into the liquid sending flow path, and the filter medium processing liquid to be used is the same as in the initial liquid filling step.
Alternatively, if the initial filter medium processing liquid has a low affinity with the original liquid sending liquid, a liquid with a high affinity may be used as the filter medium processing liquid for final filling. After the filling of the filter medium treatment liquid in the final liquid filling step, the flow of the liquid-feed liquid, which is originally intended for conveyance, is started.
【0019】本発明の送液流路における濾材処理方法に
用いる濾材は、特に限定されず、従来公知のものを用い
ることができる。プリーツ構造を持つカートリッジ型の
濾材の場合は、濾材自信に変形を与えて空孔部を拡張さ
せ、空孔部への濾材処理液の浸入を容易にするので、濾
材の外部を減圧することが好ましい。プリーツ構造を持
たない濾材の場合は、減圧の方向を特に定める必要はな
い。The filter medium used in the method for treating a filter medium in the liquid feed channel of the present invention is not particularly limited, and a conventionally known filter medium can be used. In the case of a cartridge-type filter medium with a pleated structure, the filter medium itself is deformed to expand the pores and facilitate the penetration of the filter medium treatment liquid into the pores. preferable. In the case of a filter medium having no pleated structure, there is no need to particularly determine the direction of pressure reduction.
【0020】次に、第2の送液流路における濾材処理方
法について説明する。第2の送液流路における濾材処理
方法は、濾材をオフラインで処理するもので、濾材を処
理するためのハウジングを用意し、このハウジングにお
いて濾材の空孔に濾材処理液を充填し、その後、濾材処
理液を充填した濾材を送液流路に取り付けるものであ
る。Next, a method of treating the filter medium in the second liquid feed channel will be described. The filter medium processing method in the second liquid supply flow path is to process the filter medium offline, prepare a housing for processing the filter medium, fill the pores of the filter medium with the filter medium processing liquid in this housing, A filter medium filled with a filter medium treatment liquid is attached to a liquid sending flow path.
【0021】ハウジングにおける濾材の処理は、第1の
送液流路における濾材処理方法と同様であり、この処理
した濾材を送液流路に取り付けた後、送液液体を通液す
ることで、濾材を原因とする気泡の混入を防止すること
ができる。また、処理した濾材を送液流路に取り付ける
際、送液流路に予め濾材処理液を充填しておくことが好
ましい。The processing of the filter medium in the housing is the same as the method of processing the filter medium in the first liquid-feeding channel. After attaching this processed filter medium to the liquid-feeding channel, the liquid-feeding liquid is passed. It is possible to prevent air bubbles from entering due to the filter medium. In addition, when the treated filter medium is attached to the liquid sending flow path, it is preferable that the liquid sending flow path is previously filled with the filter medium treatment liquid.
【0022】なお、第1の送液流路の濾材処理方法は、
濾材のみならず送液流路内の他の要因による間隙部(ス
クラッチ等)に残存する空気も除去することができる。
この点において、第1の送液流路の処理方法は、第2の
送液流路の濾材処理方法より好ましい。[0022] The first method for treating the filter medium in the liquid feed channel is as follows.
It is possible to remove not only the filter medium but also the air remaining in the gap (scratch etc.) due to other factors in the liquid sending flow path.
In this regard, the processing method of the first liquid flow path is more preferable than the filter material processing method of the second liquid flow path.
【0023】本発明による送液流路の濾材処理方法は、
送液液体に気泡が混入しないことが好ましい各種製造に
用いることができ、例えば、感光材料の製造における乳
剤の塗布工程、光記録材料等のフォトレジスト塗布工程
など塗布方式そのものによらず利用可能なものである。[0023] The method for treating a filter medium in a liquid sending channel according to the present invention comprises:
It can be used in various productions in which bubbles are preferably not mixed in the liquid to be sent. For example, it can be used irrespective of the coating method itself, such as an emulsion coating process in the production of photosensitive materials, a photoresist coating process for optical recording materials, etc. Things.
【0024】また、本発明の送液流路における濾材処理
方法は、半導体製造工程においても利用することができ
る。すなわち、半導体製造工程においては、純水の品質
管理のために純水中の粒子計測を行っている。そして、
この流路には、通常、異物や菌を除去する必要があるの
で、精密濾過を行うための濾材が装着されている。しか
し、この濾材から気泡が流出すると、粒子計測上の誤差
になるので気泡の混入を防止しなければならない。した
がって、本発明による送液流路における濾材処理方法を
用いることにより、気泡による計数誤差を防止すること
ができる。Further, the method for treating a filter medium in a liquid sending channel according to the present invention can be used also in a semiconductor manufacturing process. That is, in the semiconductor manufacturing process, particles in pure water are measured for quality control of the pure water. And
Usually, it is necessary to remove foreign substances and bacteria in this flow path, so a filter medium for performing fine filtration is mounted. However, if air bubbles flow out of the filter medium, it will cause an error in particle measurement, so that it is necessary to prevent air bubbles from being mixed. Therefore, by using the method for treating a filter medium in the liquid-feeding channel according to the present invention, counting errors due to bubbles can be prevented.
【0025】[0025]
【実施例】本発明による送液流路における濾材処理方法
について図面を参照して説明する。図1は第1の送液流
路における濾材処理方法を実施する塗布装置の概略図、
図2は濾材処理方法に用いる濾材の斜断面模式図、図3
は濾材の大気圧時の形態を示す断面模式図、図4は濾材
の外部を減圧した状態の形態を示す断面模式図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for treating a filter medium in a liquid feed channel according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram of a coating apparatus that performs a filter material processing method in a first liquid sending flow path,
FIG. 2 is a schematic cross-sectional view of a filter medium used in the filter medium processing method, and FIG.
FIG. 4 is a schematic cross-sectional view illustrating a form of the filter medium at atmospheric pressure, and FIG. 4 is a schematic cross-sectional view illustrating a form in which the outside of the filter medium is depressurized.
【0026】図1において、1は液体貯溜槽で送液液体
としての塗布液が貯溜されており、この液体貯溜槽1
は、送液ポンプ2を介して濾材ハウジング3に連結さ
れ、濾材ハウジング3内には濾材4が装着されている。
液体貯溜槽1と送液ポンプ2との間には、三方弁5が設
けられ、この三方弁5には濾材処理液としての温水を貯
溜している濾材処理液槽6が弁13を介して連結される
とともに、弁6を介して排水管7が連結されている。ま
た、濾材ハウジング3には、脱泡部8、弁9及び塗布部
10が連結されており、脱泡部8と弁9との間には弁1
1を介して真空ポンプ12が連結されている。In FIG. 1, reference numeral 1 denotes a liquid storage tank in which a coating liquid as a liquid to be sent is stored.
Is connected to a filter medium housing 3 via a liquid feed pump 2, and a filter medium 4 is mounted in the filter medium housing 3.
A three-way valve 5 is provided between the liquid storage tank 1 and the liquid sending pump 2. The three-way valve 5 is provided with a filter medium treatment liquid tank 6 storing hot water as a filter medium treatment liquid via a valve 13. The drainage pipe 7 is connected via the valve 6 while being connected. A defoaming section 8, a valve 9 and a coating section 10 are connected to the filter medium housing 3, and a valve 1 is provided between the defoaming section 8 and the valve 9.
The vacuum pump 12 is connected via 1.
【0027】前記濾材4は、図2に示すように、芯部材
41と、その外周面に設けられたプリーツ部42とから
なっており、このプリーツ部42は、プリーツの開閉が
自在となっている。As shown in FIG. 2, the filter medium 4 comprises a core member 41 and a pleated portion 42 provided on an outer peripheral surface of the core member 41. The pleated portion 42 can be freely opened and closed. I have.
【0028】以上のような塗布装置において、本発明に
よる送液流路の濾材処理方法を実施するには、まず、真
空ポンプ11により送液管、濾材ハウジング3及び脱泡
部8を減圧する(減圧工程)。この時、濾材4は、減圧
前の大気圧の環境においては、図3に示すように、プリ
ーツ部42は閉じた状態となっているが、濾材が濡れて
いて、かつ減圧の環境においては、図4に示すように、
プリーツ部42は外側へ開いた状態となっている。この
状態で弁13を開き送液ポンプ2を介して濾材処理液槽
6に貯溜してある温水を送液管及び濾材ハウジング3に
充填する(液体充填工程)。すると、濾材4のプリーツ
部42が開いているので、温水が内部まで入って気孔に
入り込み又は周辺を濡らした状態になるとともに、送液
管のスクラッチ等にも温水が入り込み又は周辺を濡らし
た状態となる。In the above-described coating apparatus, in order to carry out the method for treating a filter medium in a liquid feed channel according to the present invention, first, the liquid feed pipe, the filter medium housing 3 and the defoaming section 8 are depressurized by a vacuum pump 11 ( Decompression step). At this time, in the environment of the atmospheric pressure before the pressure reduction, the pleated portion 42 is in the closed state as shown in FIG. 3, but in the environment where the filter medium is wet and the pressure is reduced, As shown in FIG.
The pleated portion 42 is open outward. In this state, the valve 13 is opened, and the hot water stored in the filter medium treatment liquid tank 6 is filled into the liquid sending pipe and the filter medium housing 3 via the liquid sending pump 2 (liquid filling step). Then, since the pleated portion 42 of the filter medium 4 is open, warm water enters the inside and enters the pores or wets the surroundings, and warm water enters the scratches of the liquid supply pipe or wets the surroundings. Becomes
【0029】次に、充填した温水を排水管7より排出し
(処理液排出工程)、その後、再び減圧の後、温水を送
液管及びハウジング3に充填する(最終の液体充填工
程)。すると、濾材4の気孔、送液管のスクラッチ等は
既に濡れた状態となっているので、温水が容易に入り込
み、濾材の空孔、送液管のスクラッチ等は温水で満たさ
れることになる。Next, the filled hot water is discharged from the drain pipe 7 (treatment liquid discharging step), and then, after the pressure is reduced again, the hot water is filled into the liquid sending pipe and the housing 3 (final liquid filling step). Then, since the pores of the filter medium 4 and the scratches of the liquid feed pipe are already in a wet state, warm water easily enters, and the pores of the filter medium, the scratches of the liquid feed pipe and the like are filled with hot water.
【0030】この状態で液体貯溜槽1にある塗布液の通
液を開始すると、塗布液に気泡が混入することが無く送
られ、脱泡部8で他の原因によって混入した気泡が除去
された後、塗布部10へ送られる。したがって、塗布部
10において、気泡による欠陥が生じることなく良好な
製品を得ることができる。In this state, when the flow of the coating liquid in the liquid storage tank 1 is started, the coating liquid is sent without being mixed with air bubbles, and the air bubbles mixed by other causes are removed in the defoaming section 8. Then, it is sent to the coating unit 10. Therefore, a good product can be obtained without causing defects due to bubbles in the application section 10.
【0031】図5は第2の送液流路における濾材処理方
法を実施する装置の概略図である。この図において、5
1は濾材処理液槽で濾材処理液としての温水が貯溜され
ており、この濾材処理液槽51は三方弁52及び送液ポ
ンプ53を介して濾材ハウジング54に連結されてい
る。濾材ハウジング54は濾材55が着脱自在に装着で
きるようになっている。また、濾材ハウジング54に
は、弁56を介して真空ポンプ57が連結されており、
前記三方弁52の一方には排水管58、弁59が連結さ
れている。FIG. 5 is a schematic diagram of an apparatus for performing the method for treating a filter medium in the second liquid-feeding channel. In this figure, 5
Reference numeral 1 denotes a filter medium processing liquid tank in which warm water as a filter medium processing liquid is stored. The filter medium processing liquid tank 51 is connected to a filter medium housing 54 via a three-way valve 52 and a liquid feed pump 53. The filter medium housing 54 is configured such that the filter medium 55 can be detachably mounted. A vacuum pump 57 is connected to the filter medium housing 54 via a valve 56.
A drain pipe 58 and a valve 59 are connected to one of the three-way valves 52.
【0032】以上のような装置において、本発明による
送液流路における濾材処理方法を実施するには、まず、
濾材ハウジング54に濾材55を装着し(濾材取付工
程)、真空ポンプ57により濾材ハウジング54内を減
圧する(減圧工程)。次に、濾材処理液槽51の温水を
濾材ハウジング54内に充填し(液体充填工程)、濾材
55の気孔を温水で満たした後、温水を排水管58、弁
59より排出し(液体排出工程)、さらに減圧の後温水
を再度濾材ハウジング54に充填する(最終の液体充填
工程)。In the apparatus as described above, in order to carry out the method for treating a filter medium in the liquid feed channel according to the present invention, first,
The filter medium 55 is mounted on the filter medium housing 54 (filter medium mounting step), and the inside of the filter medium housing 54 is depressurized by the vacuum pump 57 (decompression step). Next, hot water in the filter medium processing liquid tank 51 is filled in the filter medium housing 54 (liquid filling step), and pores of the filter medium 55 are filled with hot water, and then the hot water is discharged from the drain pipe 58 and the valve 59 (liquid discharging step). ) Then, after the pressure is reduced, the warm water is filled again into the filter medium housing 54 (final liquid filling step).
【0033】そして、この濾材55を濾材ハウジング5
4より取出し(濾材取出し工程)、所定の送液流路の濾
材ハウジングに装着する(濾材取付工程)。この後、従
来と同様に、送液液体を通液し、例えば塗布処理等を行
う。Then, the filter medium 55 is connected to the filter medium housing 5.
4 (filter material removal step), and the filter medium is mounted on a filter medium housing in a predetermined liquid supply flow path (filter material mounting step). Thereafter, as in the conventional case, the liquid to be fed is passed, and for example, a coating process is performed.
【0034】[0034]
【発明の効果】本発明は以上のように構成したので、以
下に示すような効果を有する。 (1) 簡単な構造及び作業で、送液液体中に気泡が混入
することを防止できる。すなわち、特別な低表面張力液
や、その調製のための付帯設備が不要で、簡便な減圧装
置を送液流路に付加するだけでよく、また、すすぎ作業
も必要がなくなった。 (2) 濾材交換のための切替時間が従来の1/10から
1/20に短縮されるので、生産効率を向上させること
ができる。 (3) 濾材使用の初期段階であっても、送液液体に混入
する気泡を皆無とすることができ、また、液ロスを減少
させることができる。 (4) 濾材から持ち込まれる残存気泡の処理のために、
比較的大型な脱泡装置を必要としていたが、この混入気
泡がなくなることで、脱泡装置の小型化を図ることがで
きる。Since the present invention has the above-described structure, it has the following effects. (1) With a simple structure and operation, it is possible to prevent bubbles from being mixed in the liquid to be sent. In other words, no special low surface tension liquid or ancillary equipment for its preparation is required, and a simple decompression device needs only to be added to the liquid sending flow path, and a rinsing operation is not required. (2) Since the switching time for replacing the filter medium is reduced from 1/10 to 1/20 of the conventional one, the production efficiency can be improved. (3) Even in the initial stage of the use of the filter medium, it is possible to eliminate any bubbles mixed into the liquid to be sent and to reduce liquid loss. (4) For the treatment of residual air bubbles brought in from the filter media,
Although a relatively large defoaming device has been required, the defoaming device can be reduced in size by eliminating this mixed air bubble.
【図1】 本発明による第1の送液流路の濾材処理方法
を実施する塗布装置の概略図。FIG. 1 is a schematic view of a coating apparatus for performing a first method for treating a filter medium in a liquid-feeding channel according to the present invention.
【図2】 同上濾材処理方法に用いる濾材の斜断面模式
図。FIG. 2 is a schematic cross-sectional view of a filter medium used in the same method for treating a filter medium.
【図3】 同上濾材処理方法に用いる濾材の大気圧時の
形態を示す断面模式図。FIG. 3 is a schematic cross-sectional view showing a form at atmospheric pressure of a filter medium used in the filter medium treatment method.
【図4】 同上濾材処理方法に用いる濾材の外部が減圧
時の形態を示す断面模式図。FIG. 4 is a schematic cross-sectional view showing a state where the outside of the filter medium used in the method for treating a filter medium is depressurized.
【図5】 本発明による第2の送液流路の濾材処理方法
を実施する装置の概略図。FIG. 5 is a schematic view of an apparatus for carrying out a second method for treating a filter medium in a liquid sending channel according to the present invention.
1…液体貯溜槽 2…送液ポンプ 3…濾材ハウジング 4…濾材 42…プリーツ部 6…濾材処理液槽 7…排水管 8…脱泡部 10…塗布部 12…真空ポンプ 51…濾材処理液槽 53…送液ポンプ 54…濾材ハウジング 55…濾材 57…真空ポンプ DESCRIPTION OF SYMBOLS 1 ... Liquid storage tank 2 ... Liquid feed pump 3 ... Filter medium housing 4 ... Filter medium 42 ... Pleated part 6 ... Filter medium processing liquid tank 7 ... Drainage pipe 8 ... Defoaming part 10 ... Application part 12 ... Vacuum pump 51 ... Filter medium processing liquid tank 53: liquid feed pump 54: filter medium housing 55: filter medium 57: vacuum pump
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) B05D 3/00 B01D 29/06 510A 510C 29/42 510 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (Reference) B05D 3/00 B01D 29/06 510A 510C 29/42 510
Claims (3)
送液流路を減圧する減圧工程と、該減圧工程で減圧され
た送液流路内に濾材処理液を充填する液体充填工程と、
該液体充填工程で充填された濾材処理液を送液流路外へ
排出する液体排出工程とを有することを特徴とする送液
流路における濾材処理方法。1. A depressurizing step of depressurizing a liquid-feeding channel in a liquid-feeding channel provided with a filter medium, and a liquid filling step of filling a filter-media treatment liquid into the liquid-feeding channel depressurized in the depressurizing step. When,
A liquid discharging step of discharging the filter medium processing liquid filled in the liquid filling step to the outside of the liquid sending flow path.
ングを用意し、ハウジングに濾材を取り付ける濾材取付
工程と、ハウジング内を減圧する減圧工程と、該減圧工
程で減圧されたハウジング内に濾材処理液を充填する液
体充填工程と、該液体充填工程で充填された濾材処理液
をハウジング外へ排出する液体排出工程と、ハウジング
より濾材を取り出す濾材取出し工程と、濾材取出し工程
で取出した濾材を送液流路に取り付ける濾材取付工程と
を有することを特徴とする送液流路における濾材処理方
法。2. A housing in which a filter medium is removably mounted, a filter medium mounting step of mounting the filter medium on the housing, a depressurizing step of depressurizing the inside of the housing, and a filtering medium treatment liquid in the housing depressurized in the depressurizing step. A liquid filling step of filling, a liquid discharging step of discharging the filter medium treatment liquid filled in the liquid filling step to the outside of the housing, a filter medium removing step of removing the filter medium from the housing, and a flow of the filter medium removed in the filter medium removing step. And a method of attaching a filter medium to a channel.
り、減圧工程において濾材の外部を減圧する請求項1又
は2記載の送液流路における濾材処理方法。3. The method according to claim 1, wherein the filter medium is a filter medium having a pleated structure, and the pressure inside the filter medium is reduced in the pressure reducing step.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001153408A JP4205318B2 (en) | 2001-05-23 | 2001-05-23 | Filter medium processing method in liquid flow path |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001153408A JP4205318B2 (en) | 2001-05-23 | 2001-05-23 | Filter medium processing method in liquid flow path |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002346312A true JP2002346312A (en) | 2002-12-03 |
JP2002346312A5 JP2002346312A5 (en) | 2006-02-16 |
JP4205318B2 JP4205318B2 (en) | 2009-01-07 |
Family
ID=18997929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001153408A Expired - Fee Related JP4205318B2 (en) | 2001-05-23 | 2001-05-23 | Filter medium processing method in liquid flow path |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4205318B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011108419A1 (en) * | 2010-03-01 | 2011-09-09 | 株式会社 フジミインコーポレーテッド | Liquid filtration method |
WO2011108418A1 (en) * | 2010-03-01 | 2011-09-09 | 株式会社 フジミインコーポレーテッド | Filtration method for non-deaired liquid |
JP2014033111A (en) * | 2012-08-03 | 2014-02-20 | Tokyo Electron Ltd | Method for operating treatment liquid supply device and treatment liquid supply device and storage medium |
CN104280809A (en) * | 2013-07-04 | 2015-01-14 | 日东电工株式会社 | Method of producing laminate |
JP2015144318A (en) * | 2015-04-21 | 2015-08-06 | 東京エレクトロン株式会社 | Filter wetting method, filter wetting device, and storage medium |
JP2018008262A (en) * | 2016-07-05 | 2018-01-18 | 株式会社エフテック | Decompressed capsule filter for liquid filtration |
CN111687008A (en) * | 2020-06-20 | 2020-09-22 | 杭州伟业纺织有限公司 | Coating machine and environment-friendly coating process thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1099661A (en) * | 1996-09-30 | 1998-04-21 | Fuji Photo Film Co Ltd | Micro filtration membrane cartridge filter |
JP2000262956A (en) * | 1999-03-17 | 2000-09-26 | Fuji Photo Film Co Ltd | Starting method of feeding liquid to coating head and device therefor |
-
2001
- 2001-05-23 JP JP2001153408A patent/JP4205318B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1099661A (en) * | 1996-09-30 | 1998-04-21 | Fuji Photo Film Co Ltd | Micro filtration membrane cartridge filter |
JP2000262956A (en) * | 1999-03-17 | 2000-09-26 | Fuji Photo Film Co Ltd | Starting method of feeding liquid to coating head and device therefor |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5730851B2 (en) * | 2010-03-01 | 2015-06-10 | 株式会社フジミインコーポレーテッド | Filtration of undegassed liquid |
WO2011108419A1 (en) * | 2010-03-01 | 2011-09-09 | 株式会社 フジミインコーポレーテッド | Liquid filtration method |
CN102834156A (en) * | 2010-03-01 | 2012-12-19 | 福吉米株式会社 | Liquid filtration method |
CN102834157A (en) * | 2010-03-01 | 2012-12-19 | 福吉米株式会社 | Liquid filtration method |
JPWO2011108418A1 (en) * | 2010-03-01 | 2013-06-27 | 株式会社フジミインコーポレーテッド | Filtration of undegassed liquid |
JPWO2011108419A1 (en) * | 2010-03-01 | 2013-06-27 | 株式会社フジミインコーポレーテッド | Liquid filtration method |
WO2011108418A1 (en) * | 2010-03-01 | 2011-09-09 | 株式会社 フジミインコーポレーテッド | Filtration method for non-deaired liquid |
JP2014033111A (en) * | 2012-08-03 | 2014-02-20 | Tokyo Electron Ltd | Method for operating treatment liquid supply device and treatment liquid supply device and storage medium |
CN104280809A (en) * | 2013-07-04 | 2015-01-14 | 日东电工株式会社 | Method of producing laminate |
JP2015013242A (en) * | 2013-07-04 | 2015-01-22 | 日東電工株式会社 | Manufacturing method of laminate |
US9650482B2 (en) | 2013-07-04 | 2017-05-16 | Nitto Denko Corporation | Method of producing laminate |
JP2015144318A (en) * | 2015-04-21 | 2015-08-06 | 東京エレクトロン株式会社 | Filter wetting method, filter wetting device, and storage medium |
JP2018008262A (en) * | 2016-07-05 | 2018-01-18 | 株式会社エフテック | Decompressed capsule filter for liquid filtration |
CN111687008A (en) * | 2020-06-20 | 2020-09-22 | 杭州伟业纺织有限公司 | Coating machine and environment-friendly coating process thereof |
Also Published As
Publication number | Publication date |
---|---|
JP4205318B2 (en) | 2009-01-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4975950B2 (en) | Membrane module cleaning method | |
TW535216B (en) | Photoresist processing method and photoresist processing system | |
TWI544971B (en) | Method of operating process liquid supply device,process liquid supply device,and storage medium | |
KR101262410B1 (en) | Method and apparatus for treating fluids to reduce microbubbles | |
JP2008539054A (en) | Chemical cleaning for membrane filters | |
TWI579945B (en) | Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording medium | |
JPH10504996A (en) | Cleaning of hollow fiber membrane | |
KR102477917B1 (en) | Process liquid filtration apparatus, chemical supply apparatus and process liquid filtration method and storage medium | |
JP2011238820A (en) | Coating apparatus | |
JP2002346312A (en) | Filter medium treatment method in liquid feed flow channel | |
JP4353991B2 (en) | Method and apparatus for regenerating slurry waste liquid | |
JP2006255567A (en) | Immersion type membrane separation device and its chemical washing method | |
JP2008140964A (en) | Chemical supply apparatus, and method for manufacturing semiconductor device | |
JPH0217924A (en) | Method for backwashing hollow yarn membrane filter apparatus | |
JPS6243722B2 (en) | ||
JP2007245060A (en) | Method for detecting and testing membrane damage of filtration membrane | |
JPH01199607A (en) | Treatment of photosensitive coating solution | |
JPH06181B2 (en) | ▲ Ro ▼ Backwash method of excess equipment | |
JP2669054B2 (en) | Developing device | |
JP3290385B2 (en) | Resist processing method and resist processing apparatus | |
TW201206543A (en) | Liquid filtration method | |
JP2001009401A (en) | Cleaning method of liquid contact member | |
JPS63302910A (en) | Method for washing porous filter | |
JPH1092719A (en) | Resist processing equipment | |
JPS63178807A (en) | Treatment of photosensitive coating liquid |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051222 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051222 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20061208 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20071126 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071129 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080124 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080922 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20081016 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111024 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121024 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121024 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131024 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |