JP2002343281A - Flat panel display - Google Patents
Flat panel displayInfo
- Publication number
- JP2002343281A JP2002343281A JP2001146050A JP2001146050A JP2002343281A JP 2002343281 A JP2002343281 A JP 2002343281A JP 2001146050 A JP2001146050 A JP 2001146050A JP 2001146050 A JP2001146050 A JP 2001146050A JP 2002343281 A JP2002343281 A JP 2002343281A
- Authority
- JP
- Japan
- Prior art keywords
- electron emission
- emission source
- film
- electron
- phosphor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、電子放出源から
放出された電子を蛍光体に衝突させて発光させる平面デ
ィスプレイに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display which emits light by colliding electrons emitted from an electron emission source with a phosphor.
【０００２】[0002]
【従来の技術】近年、ＦＥＤ（Field Emission Displa
y）や平型蛍光表示管のような、電子放出源から放出さ
れた電子を対向電極に形成された蛍光体からなる発光部
に衝突させて発光させるフラットパネル（平面）ディス
プレイにおいて、電子放出源にカーボンナノチューブな
どのナノチューブ状繊維を用いたＦＥＤが提案され、注
目されている。図３は、ナノチューブ状繊維を電子放出
源に用いた従来の平面ディスプレイの画素構成を示す部
分分解斜視図である。2. Description of the Related Art In recent years, FED (Field Emission Displa)
In a flat panel (flat) display that emits light by colliding electrons emitted from an electron emission source with a light emitting portion formed of a phosphor formed on a counter electrode, such as a y) or a flat fluorescent display tube, An FED using a nanotube fiber such as a carbon nanotube has been proposed and attracted attention. FIG. 3 is a partially exploded perspective view showing a pixel configuration of a conventional flat panel display using nanotube fibers as an electron emission source.
【０００３】この平面ディスプレイは、図３に示すよう
に、ガラス基板３０１上に互いに平行に垂設された複数
の基板リブ３０２を備えており、基板リブ３０２で挟ま
れたガラス基板３０１上に帯状に形成された電子放出源
３１０が配置されている。また、ガラス基板３０１に対
向して透明なフロントガラス３０３が配置されており、
フロントガラス３０３のガラス基板３０１に対向する面
には基板リブ３０２と直交するように所定間隔で複数の
前面リブ３０４が垂設されて基板リブ３０２の頂部と接
触している。[0003] As shown in FIG. 3, this flat display includes a plurality of substrate ribs 302 suspended in parallel from each other on a glass substrate 301, and a strip-shaped glass substrate 301 sandwiched between the substrate ribs 302. Is formed. Further, a transparent windshield 303 is arranged facing the glass substrate 301,
A plurality of front ribs 304 are provided at predetermined intervals on the surface of the front glass 303 facing the glass substrate 301 so as to be orthogonal to the substrate ribs 302 and are in contact with the tops of the substrate ribs 302.
【０００４】フロントガラス３０３内面の前面リブ３０
４に挟まれた領域には蛍光体膜３０５が配置されてお
り、蛍光体膜３０５の表面には陽極となるメタルバック
膜３０６が形成されている。また、メタルバック膜３０
６に対向して基板リブ３０２で支持された電子引き出し
電極３２１が設けられている。ガラス基板３０１とフロ
ントガラス３０３は、枠状のスペーサガラス（図示せ
ず）を介して対向配置され、低融点のフリットガラスで
それぞれスペーサガラスに接着されて外囲器を構成して
おり、外囲器内は１０-5Ｐａ台の真空度に保持されてい
る。The front rib 30 on the inner surface of the windshield 303
The phosphor film 305 is arranged in a region sandwiched between the four, and a metal back film 306 serving as an anode is formed on the surface of the phosphor film 305. In addition, the metal back film 30
6, an electron extraction electrode 321 supported by the substrate rib 302 is provided. The glass substrate 301 and the front glass 303 are disposed to face each other via a frame-shaped spacer glass (not shown), and are adhered to the spacer glass with low-melting frit glass to form an envelope. The inside of the vessel is maintained at a degree of vacuum of the order of 10 -5 Pa.
【０００５】この平面ディスプレイは、電子引き出し電
極３２１と電子放出源３１０の間に、電子引き出し電極
３２１側が正の電位となるように所定の電位差を設ける
ことにより、電子引き出し電極３２１と電子放出源３１
０が交差した部分から電子が引き出され、電子引き出し
電極３２１の矩形状の電子通過孔３２２から放出され
る。このため、メタルバック膜３０６に正電圧（加速電
圧）が印加されていると、電子通過孔３２２から放出さ
れた電子がメタルバック膜３０６に向かって加速され、
さらにメタルバック膜３０６を透過して蛍光体膜３０５
に衝突して蛍光体膜３０５を発光させる。In this flat display, by providing a predetermined potential difference between the electron extraction electrode 321 and the electron emission source 310 such that the electron extraction electrode 321 side has a positive potential, the electron extraction electrode 321 and the electron emission source 31 are provided.
Electrons are extracted from the portion where 0 crosses, and emitted from the rectangular electron passage hole 322 of the electron extraction electrode 321. Therefore, when a positive voltage (acceleration voltage) is applied to the metal back film 306, the electrons emitted from the electron passage holes 322 are accelerated toward the metal back film 306,
Further, the phosphor film 305 is transmitted through the metal back film 306.
To cause the phosphor film 305 to emit light.
【０００６】よって、例えば、電子引き出し電極３２１
を行方向に所定数設け、電子放出源３１０を列方向に所
定数設けた構成とした場合において、メタルバック膜３
０６に正電圧（加速電圧）を印加した状態で、アクティ
ブ行の電子引き出し電極３２１に所定の正電圧を印加し
ておき、アクティブ行の発光させる画素に対応する列の
電子放出源３１０に対して所定の負電圧を印加するとい
う動作を１行目から所定行目の電子引き出し電極３２１
まで順次行うことにより、ドットマトリクス表示をさせ
ることができる。Therefore, for example, the electron extraction electrode 321
Is provided in the row direction and a predetermined number of electron emission sources 310 are provided in the column direction.
In the state where a positive voltage (acceleration voltage) is applied to 06, a predetermined positive voltage is applied to the electron extraction electrode 321 in the active row, and the electron emission source 310 in the column corresponding to the pixel to emit light in the active row is applied. The operation of applying a predetermined negative voltage is performed from the first row to the predetermined row of the electron extraction electrode 321.
The dot matrix display can be performed by sequentially performing the operations up to the above.
【０００７】[0007]
【発明が解決しようとする課題】しかしながら、前述し
た平面ディスプレイでは、電子引き出し電極３２１は、
厚さ５０μｍのステンレス又は４２−６合金などの金属
板で構成されており、エッチングにより矩形状の電子通
過孔３２２を有するはしご状構造を形成している。この
ため、表示画面を大型化しようとすると電子引き出し電
極３２１の長さが長くなり、膨張による寸法変化や振動
現象などが発生し、精細な表示を得ることが困難になる
という問題があった。本発明は、以上のような問題点を
解消するためになされたものであり、表示画面の大型化
と精細な表示とが可能な薄型の平面ディスプレイを提供
することを目的とする。However, in the flat panel display described above, the electron extraction electrode 321 is
It is made of a metal plate such as stainless steel or 42-6 alloy having a thickness of 50 μm, and has a ladder-like structure having a rectangular electron passage hole 322 by etching. For this reason, when trying to enlarge the display screen, the length of the electron extraction electrode 321 becomes longer, which causes a dimensional change or a vibration phenomenon due to expansion, which makes it difficult to obtain a fine display. SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and has as its object to provide a thin flat display capable of increasing the size of a display screen and displaying fine images.
【０００８】[0008]
【課題を解決するための手段】上述した課題を解決する
ために、本発明の平面ディスプレイは、少なくとも一部
が透光性を有するフロントガラスとこのフロントガラス
に対向配置された基板とを含みかつ内部が真空排気され
た外囲器と、この外囲器内のフロントガラス面に配置さ
れた蛍光体膜と、外囲器内の基板面に配置された電子放
出源と、蛍光体膜と対向した面に形成された所定電圧が
印加可能な導電膜と電子通過孔とを有し蛍光体膜と電子
放出源との間に配置された絶縁基板とを備えたことによ
って特徴づけられる。In order to solve the above-described problems, a flat display according to the present invention includes a windshield having at least a part of a light-transmitting property, and a substrate opposed to the windshield, and An envelope whose inside is evacuated, a phosphor film disposed on a front glass surface in the envelope, an electron emission source disposed on a substrate surface in the envelope, and an opposing phosphor film. And a conductive film formed on the surface having a predetermined voltage and capable of applying a predetermined voltage and an electron passage hole, and an insulating substrate disposed between the phosphor film and the electron emission source.
【０００９】この平面ディスプレイの一構成例は、蛍光
体膜が帯状で互いに平行に複数配置され、電子放出源が
帯状で蛍光体膜の配置方向と直交する方向に複数配置さ
れ、導電膜が帯状で蛍光体膜に対応して複数配置され、
電子通過孔が蛍光体膜と電子放出源とが交差する領域内
に配置されている。この場合、蛍光体膜間にはフロント
ガラス面から直方体状の絶縁体からなる前面リブが垂設
され、絶縁基板が前面リブと電子放出源に挟まれてい
る。また、蛍光体膜は表面に陽極となるメタルバック膜
を有する。In one configuration example of this flat display, a plurality of phosphor films are arranged in a strip shape in parallel with each other, a plurality of electron emission sources are arranged in a strip shape, and a plurality of electron emission sources are arranged in a direction orthogonal to the arrangement direction of the phosphor films. Are arranged corresponding to the phosphor film,
The electron passage hole is arranged in a region where the phosphor film and the electron emission source intersect. In this case, a front rib made of a rectangular parallelepiped insulator is vertically provided from the front glass surface between the phosphor films, and the insulating substrate is sandwiched between the front rib and the electron emission source. Further, the phosphor film has a metal back film serving as an anode on the surface.
【００１０】絶縁基板の一構成例は、ガラス基板で構成
されている。電子放出源の一構成例は、電界放出型電子
放出源から構成されている。この場合、電界放出型電子
放出源は、多数の電子放出源からなる面状電子放出源で
ある。面状電子放出源の一構成例は、多数の貫通孔を有
しナノチューブ状繊維の生成核となる板状金属部材と、
この金属部材の表面及び貫通孔壁に配置された多数のナ
ノチューブ状繊維からなる被膜とから構成されている。One configuration example of the insulating substrate is formed of a glass substrate. One configuration example of the electron emission source includes a field emission type electron emission source. In this case, the field emission type electron emission source is a planar electron emission source including many electron emission sources. One configuration example of the planar electron emission source is a plate-like metal member having a large number of through holes and serving as a production nucleus of a nanotube-like fiber,
And a coating made of a large number of nanotube-like fibers disposed on the surface of the metal member and the wall of the through hole.
【００１１】[0011]
【発明の実施の形態】以下に図を用いて本発明の実施の
形態を説明する。図１は本発明の実施の形態にかかる平
面ディスプレイの画素構成を示す部分分解斜視図であ
り、図２は１画素の構造を示す断面図である。なお、図
２は図１のＡ−Ａ線とＢ−Ｂ線を含む面を矢印Ｃの示す
方向から見た図である。これらの図において、ガラス基
板１０１の一方の面に複数の基板リブ１０２が互いに平
行に所定間隔で垂設されており、ガラス基板１０１上の
これらの基板リブ１０２に挟まれた領域に帯状の電子放
出源１１０が配置されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a partially exploded perspective view showing a pixel configuration of a flat display according to an embodiment of the present invention, and FIG. 2 is a sectional view showing a structure of one pixel. FIG. 2 is a view of a plane including the line AA and the line BB in FIG. In these figures, a plurality of substrate ribs 102 are suspended from one surface of a glass substrate 101 in parallel with each other at a predetermined interval, and a band-like electron is formed in a region between the glass substrate 101 and the substrate ribs 102. An emission source 110 is located.
【００１２】また、ガラス基板１０１に対向して透明な
フロントガラス１０３が配置されており、フロントガラ
ス１０３のガラス基板１０１に対向する面には基板リブ
１０２と直交する方向に所定間隔で複数の前面リブ１０
４が垂設されている。フロントガラス１０３の前面リブ
１０４に挟まれた領域には帯状の蛍光体膜１０５が配置
されており、各蛍光体膜１０５の表面には陽極となるメ
タルバック膜１０６が形成されている。ガラス基板１０
１とフロントガラス１０３は、枠状のスペーサガラス
（図示せず）を介して対向配置され、低融点のフリット
ガラスでそれぞれスペーサガラスに接着されて外囲器を
構成しており、外囲器内は１０-5Ｐａ台の真空度に保持
されている。A transparent windshield 103 is disposed opposite to the glass substrate 101. A plurality of front windshields 103 are provided on the surface of the windshield 103 facing the glass substrate 101 at predetermined intervals in a direction orthogonal to the substrate ribs 102. Rib 10
4 is erected. A band-shaped phosphor film 105 is arranged in a region between the front ribs 104 of the front glass 103, and a metal back film 106 serving as an anode is formed on the surface of each phosphor film 105. Glass substrate 10
1 and the windshield 103 are opposed to each other via a frame-shaped spacer glass (not shown), and are respectively adhered to the spacer glass with low melting point frit glass to form an envelope. Is maintained at a degree of vacuum of the order of 10 -5 Pa.
【００１３】また、ガラス基板１０１とフロントガラス
１０３の間には各蛍光体膜１０５と１対１に対応した帯
状の導電膜１２１と複数の電子通過孔１２２とが形成さ
れた１枚の絶縁基板１２０がこれらの導電膜１２１を各
蛍光体膜１０５と対向させて配置されている。ここで、
電子通過孔１２２は、絶縁基板１２０と導電膜１２１を
貫く円形の貫通孔であり、各蛍光体膜１０５と各電子放
出源１１０とが交差する領域内に設けられている。この
絶縁基板１２０は、導電膜１２１間の絶縁基板１２０表
面に接触している前面リブ１０４と、電子放出源１１０
とによって挟まれており、大気圧により押しつけられて
固定されている。電子放出源１１０、導電膜１２１及び
メタルバック膜１０６は、それぞれ外囲器を貫通するリ
ード（図示せず）に接続されており、所定電圧が印加可
能に構成されている。A single insulating substrate having a strip-shaped conductive film 121 and a plurality of electron passage holes 122 formed in a one-to-one correspondence with the phosphor films 105 between the glass substrate 101 and the windshield 103. Numeral 120 is arranged such that these conductive films 121 face each phosphor film 105. here,
The electron passage hole 122 is a circular through hole penetrating the insulating substrate 120 and the conductive film 121, and is provided in a region where each phosphor film 105 and each electron emission source 110 intersect. The insulating substrate 120 has a front rib 104 in contact with the surface of the insulating substrate 120 between the conductive films 121 and an electron emission source 110.
And is pressed and fixed by the atmospheric pressure. The electron emission source 110, the conductive film 121, and the metal back film 106 are respectively connected to leads (not shown) penetrating the envelope, and are configured to be able to apply a predetermined voltage.
【００１４】ここで、外囲器を構成するガラス基板１０
１、フロントガラス１０３及びスペーサガラスは、低ア
ルカリソーダガラスを用いており、ガラス基板１０１と
フロントガラス１０３は厚さ１〜２ｍｍの板ガラスを使
用している。基板リブ１０２は、低融点のフリットガラ
スを含む絶縁ペーストを所定の高さになるまでガラス基
板１０１上に繰り返しスクリーン印刷した後、焼成して
形成した直方体状の絶縁体で構成されている。基板リブ
１０２の高さは、電子放出源１１０と電子引き出し電極
となる導電膜１２１との間隔を絶縁基板１２０の厚さの
みで規定できるようにするため、電子放出源１１０と同
じか又は低くする。なお、基板リブ１０２の高さは、隣
接する電子放出源１１０間で放電が発生するのを防止す
るため、電子放出源１１０と同じか低くとも０．０５ｍ
ｍ低い程度とすることが望ましい。Here, the glass substrate 10 constituting the envelope is
1. A low alkali soda glass is used for the front glass 103 and the spacer glass, and the glass substrate 101 and the front glass 103 use a plate glass having a thickness of 1 to 2 mm. The substrate rib 102 is formed of a rectangular parallelepiped insulator formed by repeatedly screen-printing an insulating paste containing frit glass having a low melting point on the glass substrate 101 until the insulating paste reaches a predetermined height, followed by firing. The height of the substrate rib 102 is the same as or lower than the electron emission source 110 so that the distance between the electron emission source 110 and the conductive film 121 serving as an electron extraction electrode can be defined only by the thickness of the insulating substrate 120. . Note that the height of the substrate rib 102 is equal to or lower than the height of the electron emission source 110 by 0.05 m in order to prevent discharge from occurring between the adjacent electron emission sources 110.
It is desirable that the distance be about m lower.
【００１５】この場合、電子放出源１１０の高さを０．
１５ｍｍとし、基板リブ１０２の高さを０．１ｍｍとし
た。また、基板リブ１０２は、幅を５０μｍとし、電子
放出源１１０の幅が０．３ｍｍとなるようにリブ間隔が
設定されている。なお、基板リブ１０２は、これに限ら
れるものではなく、基板リブ１０２の幅は隣接する電子
放出源１１０間で絶縁破壊が起こらない程度であればよ
い。また、リブ間隔も必要に応じて変更してもよい。In this case, the height of the electron emission source 110 is set to 0.
The height was 15 mm, and the height of the substrate rib 102 was 0.1 mm. The width of the substrate ribs 102 is set to 50 μm, and the rib interval is set so that the width of the electron emission source 110 is 0.3 mm. Note that the substrate rib 102 is not limited to this, and the width of the substrate rib 102 may be such that the dielectric breakdown does not occur between the adjacent electron emission sources 110. Also, the rib spacing may be changed as needed.
【００１６】電子放出源１１０は、高電界により電子を
放出する電界放出型電子放出源であり、多数の貫通孔を
有しナノチューブ状繊維の生成核となる板状金属部材１
１１と、この板状金属部材１１１の表面及び貫通孔壁に
配置された多数のナノチューブ状繊維からなる被膜１１
２とから構成されている。ここで、板状金属部材１１１
は、鉄又は鉄を含む合金からなる金属板であり、四角形
の貫通孔が一定間隔で設けられて梯子状となっている。
なお、貫通孔の開口部の形状は、板状金属部材１１１上
で被膜１１２の分布が均一となるものであればどのよう
な形状でもよく、開口部の大きさが同一である必要もな
い。例えば、開口部の形状が三角形、四角形、六角形な
どの多角形やこれら多角形の角を丸めたもの、又は円形
やだ円形など何でもよい。The electron emission source 110 is a field emission type electron emission source that emits electrons by a high electric field, and has a large number of through holes and is a plate-like metal member 1 serving as a nucleus for forming nanotube fibers.
11 and a coating film 11 composed of a large number of nanotube-like fibers disposed on the surface of the plate-like metal member 111 and the wall of the through-hole.
And 2. Here, the plate-shaped metal member 111
Is a metal plate made of iron or an alloy containing iron, and has a ladder shape in which rectangular through holes are provided at regular intervals.
The shape of the opening of the through hole may be any shape as long as the distribution of the coating 112 on the plate-like metal member 111 is uniform, and the size of the opening does not need to be the same. For example, the opening may have any shape such as a polygon such as a triangle, a quadrangle, or a hexagon, a rounded corner of the polygon, or a circle or ellipse.
【００１７】被膜１１２を構成するナノチューブ状繊維
は、太さが０．５〜１００ｎｍ程度で、長さが１μｍ以
上１００μｍ未満程度の炭素で構成された物質であり、
グラファイトの単層が円筒状に閉じ、かつ円筒の先端部
に五員環が形成された単層構造のカーボンナノチューブ
や、複数のグラファイトの層が入れ子構造的に積層し、
それぞれのグラファイト層が円筒状に閉じた同軸多層構
造のカーボンナノチューブであってもよいし、構造が乱
れて欠陥をもつ中空のグラファイトチューブやチューブ
内に炭素が詰まったグラファイトチューブでもよい。ま
た、これらが混在したものであってもよい。これらのナ
ノチューブ状繊維は、一端が板状金属部材１１１の表面
や貫通孔壁に結合するとともに、カールしたり互いに絡
み合ったりして板状金属部材１１１を覆い、綿状の被膜
１１２を形成している。The nanotube fiber constituting the coating 112 is a substance composed of carbon having a thickness of about 0.5 to 100 nm and a length of about 1 μm to less than 100 μm.
A single layer of graphite is closed in a cylindrical shape, and a carbon nanotube with a single-layer structure in which a five-membered ring is formed at the tip of the cylinder, and a plurality of graphite layers are stacked in a nested structure,
Each of the graphite layers may be a carbon nanotube having a coaxial multilayer structure in which each graphite layer is closed in a cylindrical shape, a hollow graphite tube having a disordered structure and a defect, or a graphite tube in which carbon is filled in the tube. Further, these may be mixed. One end of these nanotube fibers is bonded to the surface of the plate-shaped metal member 111 or the wall of the through-hole, and at the same time, curls or entangles with each other to cover the plate-shaped metal member 111 to form a cotton-like coating 112. I have.
【００１８】この電子放出源１１０は、反応容器に多数
の貫通孔を有しナノチューブ状繊維の生成核となる板状
金属部材１１１を入れて真空に排気した後、メタンガス
と水素ガスあるいは一酸化炭素ガスと水素ガスを所定の
比率で導入して１気圧に保ち、赤外線ランプで板状金属
部材１１１を所定時間加熱して表面や貫通孔壁に炭素か
らなるナノチューブ状繊維の被膜１１２を成長させるこ
とによって形成する。なお、ここではガラス基板１０１
と接する面の被膜１１２を剥離している。この実施の形
態では、板状金属部材１１１に上述したＣＶＤ法で多数
のナノチューブ状繊維からなる被膜１１２を形成して面
状電子放出源としたが、面状電子放出源の形成方法はこ
れに限られるものではない。例えば、ガラス基板１０１
上に多数のナノチューブ状繊維を含むペーストを印刷し
て形成してもよいし、板状金属部材１１１に電気泳動法
を用いてナノチューブ状繊維を付着させて形成してもよ
い。また、スプレーコーティング法を用いてもよい。こ
れらの方法によっても電界放出型電子放出源となるナノ
チューブ状繊維が多数集まって構成された面状電子放出
源を形成することができる。In the electron emission source 110, after a plate-shaped metal member 111 having a large number of through-holes and serving as a nucleus for forming a nanotube-like fiber is put in a reaction vessel and evacuated to vacuum, methane gas and hydrogen gas or carbon monoxide are used. Introducing gas and hydrogen gas at a predetermined ratio and maintaining the pressure at 1 atm, and heating the plate-like metal member 111 with an infrared lamp for a predetermined time to grow a coating 112 of carbon nanotube-like fibers on the surface and the through-hole wall. Formed by Here, the glass substrate 101
The coating 112 on the surface in contact with is peeled off. In this embodiment, the coating 112 made of a large number of nanotube fibers is formed on the plate-shaped metal member 111 by the above-described CVD method to obtain a planar electron emission source. It is not limited. For example, the glass substrate 101
The paste may be formed by printing a paste containing a large number of nanotube-like fibers on the top, or may be formed by attaching nanotube-like fibers to the plate-like metal member 111 by using an electrophoresis method. Further, a spray coating method may be used. According to these methods as well, a planar electron emission source composed of a large number of nanotube-like fibers serving as field emission electron emission sources can be formed.
【００１９】前面リブ１０４は、低融点のフリットガラ
スを含む絶縁ペーストを所定の高さになるまでフロント
ガラス１０３内面の所定位置に繰り返しスクリーン印刷
した後、焼成して形成した直方体状の絶縁体で構成され
ている。この場合、前面リブ１０４は、５０μｍの幅
と、導電膜１２１とメタルバック膜１０６の間が２．０
〜４．０ｍｍとなる高さとを有するように形成され、前
面リブ１０４に挟まれた領域に配置される蛍光体膜１０
５の幅が０．３ｍｍとなるようにリブ間隔が設定されて
いる。なお、前面リブ１０４は、これに限られるもので
はなく、前面リブ１０４の幅は隣接するメタルバック膜
１０６間や導電膜１２１間で絶縁破壊が起こらず、かつ
大気圧を支えられる程度であればよく、高さはメタルバ
ック膜１０６に印加する電圧に合わせて変更してもよ
い。また、リブ間隔も必要に応じて変更してもよい。The front rib 104 is a rectangular parallelepiped insulator formed by repeatedly screen-printing an insulating paste containing frit glass having a low melting point on a predetermined position on the inner surface of the front glass 103 until a predetermined height is reached, followed by firing. It is configured. In this case, the front rib 104 has a width of 50 μm and a gap between the conductive film 121 and the metal back film 106 of 2.0 μm.
The phosphor film 10 is formed to have a height of about 4.0 mm and is disposed in a region sandwiched between the front ribs 104.
The rib interval is set so that the width of No. 5 is 0.3 mm. Note that the front ribs 104 are not limited to this, and the width of the front ribs 104 is such that the dielectric breakdown does not occur between the adjacent metal back films 106 and between the conductive films 121 and the atmospheric pressure can be supported. The height may be changed according to the voltage applied to the metal back film 106. Also, the rib spacing may be changed as needed.
【００２０】蛍光体膜１０５は、所定の発光色を有する
蛍光体で構成されており、フロントガラス１０３の内面
に各色の蛍光体ペーストをストライプ状にスクリーン印
刷した後、焼成して厚さ１０〜１００μｍ、幅０．１〜
１．０ｍｍの蛍光体膜に形成したものである。この場
合、蛍光体膜１０５には、赤（Ｒ）に用いる赤色発光蛍
光体を用いた赤色発光蛍光体膜１０５Ｒ、緑（Ｇ）に用
いる緑色発光蛍光体を用いた緑色発光蛍光体膜１０５Ｇ
及び青（Ｂ）に用いる青色発光蛍光体を用いた青色発光
蛍光体膜１０５Ｂがあり、これらの蛍光体膜は前面リブ
１０４に挟まれて、赤色発光蛍光体膜１０５Ｒ、緑色発
光蛍光体膜１０５Ｇ、青色発光蛍光体膜１０５Ｂの順番
で所定数が配置されている。The phosphor film 105 is made of a phosphor having a predetermined luminescent color. A phosphor paste of each color is screen-printed on the inner surface of the front glass 103 in a stripe shape, and then fired to have a thickness of 10 to 10 mm. 100 μm, width 0.1 ~
It was formed on a 1.0 mm phosphor film. In this case, the phosphor film 105 includes a red light-emitting phosphor film 105R using a red light-emitting phosphor used for red (R) and a green light-emitting phosphor film 105G using a green light-emitting phosphor used for green (G).
And a blue light-emitting phosphor film 105B using a blue light-emitting phosphor used for blue (B), and these phosphor films are sandwiched between front ribs 104, and a red light-emitting phosphor film 105R and a green light-emitting phosphor film 105G are provided. , A predetermined number are arranged in the order of the blue light emitting phosphor films 105B.
【００２１】赤（Ｒ）、緑（Ｇ）、青（Ｂ）に用いる各
蛍光体膜１０５Ｒ，１０５Ｇ，１０５Ｂにはブラウン管
等で一般的に使用されている、４〜１０ＫＶの高電圧で
加速した電子を衝突させることで発光する周知の酸化物
蛍光体や硫化物蛍光体を用いることができる。ここで
は、カラー表示用に赤（Ｒ）、緑（Ｇ）、青（Ｂ）の三
原色を発光するため３種類の蛍光体膜を用いたが、これ
に限られるものではなく、モノクロ表示用に１種類の蛍
光体膜を用いるようにしてもよい。メタルバック膜１０
６は、厚さ０．１μｍ程度のアルミニウム薄膜から構成
されており、周知の蒸着法を用いて蛍光体膜の表面に形
成されている。Each of the phosphor films 105R, 105G, and 105B used for red (R), green (G), and blue (B) is accelerated by a high voltage of 4 to 10 KV generally used for a cathode ray tube or the like. Well-known oxide phosphors and sulfide phosphors that emit light upon collision with electrons can be used. Here, three types of phosphor films are used to emit three primary colors of red (R), green (G), and blue (B) for color display. However, the present invention is not limited to this. One type of phosphor film may be used. Metal back film 10
Numeral 6 is made of an aluminum thin film having a thickness of about 0.1 μm, and is formed on the surface of the phosphor film by using a well-known vapor deposition method.
【００２２】電子引き出し電極となる導電膜１２１は、
１０μｍ程度の厚さとなるように銀あるいはカーボンを
導電材料として含んだ導電性ペーストを所定のパターン
で絶縁基板１２０にスクリーン印刷した後、焼成して形
成する。また、電子通過孔１２２は、導電膜１２１が形
成された絶縁基板１２０の所定位置に炭酸ガスレーザ、
エキシマレーザ又はサンドブラスト法などを用いて形成
する。ここでは、絶縁基板１２０として厚さ０．０５ｍ
ｍのガラス基板を用いた。なお、電子通過孔１２２は１
画素当たり１個に限られるものではなく、メッシュ構造
や口径２０〜１００μｍの多数の円形開口部を設けるな
ど他の形状であってもよい。The conductive film 121 serving as an electron extraction electrode is
A conductive paste containing silver or carbon as a conductive material is screen-printed in a predetermined pattern on the insulating substrate 120 so as to have a thickness of about 10 μm, and then fired. Further, the electron passage hole 122 is provided at a predetermined position of the insulating substrate 120 on which the conductive film 121 is formed, by using a carbon dioxide laser,
It is formed by using an excimer laser or a sandblast method. Here, the thickness of the insulating substrate 120 is 0.05 m.
m glass substrate was used. The electron passage hole 122 is 1
The shape is not limited to one per pixel, and may be other shapes such as a mesh structure or a plurality of circular openings having a diameter of 20 to 100 μm.
【００２３】次に、この平面ディスプレイの動作につい
て説明する。この平面ディスプレイは、電子引き出し電
極となる導電膜１２１と電子放出源１１０の間に、導電
膜１２１側が正の電位となるように電位差を設けること
により、導電膜１２１と電子放出源１１０が交差した部
分にある電子放出源１１０の被膜１１２を構成するナノ
チューブ状繊維に電界が均一に印加されて、ナノチュー
ブ状繊維から電子が引き出され、絶縁基板１２０の電子
通過孔１２２から放出される。このため、メタルバック
膜１０６に正電圧（加速電圧）が印加されていると、電
子通過孔１２２から放出された電子がメタルバック膜１
０６に向かって加速され、さらにメタルバック膜１０６
を透過して蛍光体膜１０５に衝突し発光させる。Next, the operation of the flat display will be described. In this flat display, the conductive film 121 and the electron emission source 110 intersect by providing a potential difference between the conductive film 121 serving as an electron extraction electrode and the electron emission source 110 so that the conductive film 121 side has a positive potential. An electric field is uniformly applied to the nanotube fibers constituting the coating 112 of the electron emission source 110 at the portion, electrons are extracted from the nanotube fibers, and emitted from the electron passage holes 122 of the insulating substrate 120. For this reason, when a positive voltage (acceleration voltage) is applied to the metal back film 106, the electrons emitted from the electron passage holes 122 cause the metal back film 1
06, and further accelerated toward the metal back film 106.
And collides with the phosphor film 105 to emit light.
【００２４】よって、例えば、電子引き出し電極となる
導電膜１２１を行方向に所定数設け、電子放出源１１０
を列方向に所定数設けた構成とした場合において、メタ
ルバック膜１０６に正電圧（加速電圧）を印加した状態
で、アクティブ行の導電膜１２１に所定の正電圧を印加
しておき、アクティブ行の発光させる画素に対応する列
の電子放出源１１０に対して所定の負電圧を印加すると
いう動作を１行目から所定行目の導電膜１２１まで順次
行うことにより、ドットマトリクス表示をさせることが
できる。なお、負電圧を印加しない電子放出源１１０と
アクティブ行以外の導電膜１２１は０Ｖにしておく。Therefore, for example, a predetermined number of conductive films 121 serving as electron extraction electrodes are provided in the row direction, and the electron emission source 110
Is provided in the column direction, a predetermined positive voltage is applied to the conductive film 121 in the active row while a positive voltage (acceleration voltage) is applied to the metal back film 106, The operation of applying a predetermined negative voltage to the electron emission source 110 in the column corresponding to the pixel to emit light is sequentially performed from the first row to the conductive film 121 in the predetermined row, thereby performing dot matrix display. it can. Note that the electron emission source 110 to which no negative voltage is applied and the conductive film 121 other than the active row are set to 0V.
【００２５】この実施の形態の平面ディスプレイによれ
ば、電子引き出し電極が１枚の絶縁基板１２０上に形成
された帯状の導電膜１２１で構成されており、この絶縁
基板１２０が前面リブ１０４と電子放出源１１０とによ
って挟まれて大気圧により押しつけられ固定されている
ため、電子引き出し電極となる導電膜１２１と電子放出
源１１０との間隔を一定にすることができるので、容易
に各画素の輝度を均一化することができる。また、画面
が大型化して電子引き出し電極が長くなっても膨張によ
る寸法変化や振動現象が発生しないので、精細な表示を
得ることができる。According to the flat panel display of this embodiment, the electron extraction electrode is constituted by the strip-shaped conductive film 121 formed on one insulating substrate 120, and the insulating substrate 120 is formed by the front rib 104 and the electron Since it is sandwiched between the emission sources 110 and pressed and fixed by the atmospheric pressure, the distance between the conductive film 121 serving as an electron extraction electrode and the electron emission source 110 can be made constant, so that the brightness of each pixel can be easily set. Can be made uniform. In addition, even if the screen is enlarged and the length of the electron extraction electrode is increased, a dimensional change or a vibration phenomenon due to expansion does not occur, so that a fine display can be obtained.
【００２６】また、電子引き出し電極が１枚の絶縁基板
１２０への厚膜印刷で形成できるので、従来の格子状金
属電極を用いた電子引き出し電極に比べて製造が容易で
あり、部材コストも低減できる。さらに、電子放出源１
１０上に電子引き出し電極が形成された絶縁基板１２０
を１枚配置するだけで電子引き出し電極の配置が完了す
るので、平面ディスプレイの組立が容易になる。また、
電子引き出し電極と電子放出源１１０との間隔が絶縁基
板１２０の厚さのみで決まるので、この間隔を所定の距
離に制御することが容易である。Further, since the electron extraction electrode can be formed by thick film printing on one insulating substrate 120, the production is easier and the member cost is reduced as compared with the conventional electron extraction electrode using the grid-like metal electrode. it can. Further, the electron emission source 1
Insulating substrate 120 on which electron extraction electrodes are formed on 10
Since the arrangement of the electron extraction electrodes is completed only by arranging one sheet, the assembly of the flat display becomes easy. Also,
Since the distance between the electron extraction electrode and the electron emission source 110 is determined only by the thickness of the insulating substrate 120, it is easy to control this distance to a predetermined distance.
【００２７】[0027]
【発明の効果】以上説明したように、本発明の平面ディ
スプレイは、導電膜と電子通過孔とを有する絶縁基板を
蛍光体膜と電子放出源との間に配置し、この導電膜を電
子引き出し電極としたので、表示画面を大型化して電子
引き出し電極が長くなっても従来の金属板を用いた電子
引き出し電極のような膨張による寸法変化や振動現象が
発生せず、精細な表示を得ることができる。また、蛍光
体膜、電子放出源及び導電膜を帯状とし、蛍光体膜を互
いに平行に複数配置し、電子放出源を蛍光体膜の配置方
向と直交する方向に複数配置し、導電膜を蛍光体膜に対
応して複数配置し、電子通過孔を蛍光体膜と電子放出源
とが交差する領域内に配置したので、精細なドットマト
リクス表示を得ることができる。As described above, in the flat panel display according to the present invention, the insulating substrate having the conductive film and the electron passing holes is disposed between the phosphor film and the electron emission source, and the conductive film is drawn out of the electron. Because the electrodes are used as electrodes, even if the display screen is enlarged and the electron extraction electrodes become longer, dimensional changes and vibration phenomena due to expansion do not occur as in the case of conventional electron extraction electrodes using metal plates, and a fine display can be obtained. Can be. Also, the phosphor film, the electron emission source and the conductive film are formed in a strip shape, a plurality of phosphor films are arranged in parallel with each other, a plurality of electron emission sources are arranged in a direction orthogonal to the arrangement direction of the phosphor film, Since a plurality of holes are arranged corresponding to the body film and the electron passage holes are arranged in a region where the phosphor film and the electron emission source intersect, a fine dot matrix display can be obtained.
【００２８】また、蛍光体膜間にはフロントガラス面か
ら直方体状の絶縁体からなる前面リブが垂設され、絶縁
基板は前面リブと電子放出源に挟まれているので、絶縁
基板の厚さにより電子引き出し電極となる導電膜と電子
放出源との間隔を一定にすることができ、容易に各画素
の輝度を均一化することができる。また、蛍光体膜は、
表面に陽極となるメタルバック膜を有するので、電子通
過孔から放出された電子が加速されて蛍光体膜を衝撃・
励起するため輝度がより向上する効果が得られる。Further, a front rib made of a rectangular parallelepiped insulator is vertically provided from the front glass surface between the phosphor films, and the insulating substrate is sandwiched between the front rib and the electron emission source. Accordingly, the distance between the conductive film serving as the electron extraction electrode and the electron emission source can be made constant, and the luminance of each pixel can be easily made uniform. Also, the phosphor film is
Since the surface has a metal back film that functions as an anode, the electrons emitted from the electron passage holes are accelerated and impact the phosphor film.
Because of the excitation, an effect of further improving the luminance can be obtained.
【００２９】また、絶縁基板をガラス基板としたので、
大型化や薄膜化が容易でかつ安価にできる効果が得られ
る。電子放出源を電界放出型電子放出源としたので、フ
ィラメントカソードを用いた電子放出源のように長さの
制約を受けないため、表示画面の大型化が容易である。
また、電界放出型電子放出源を多数の電子放出源からな
る面状電子放出源としたことにより、フィラメントカソ
ードを用いた電子放出源のような線状電子放出源に比べ
て放出される電子を多くできるので高輝度化が容易であ
る。面状電子放出源を板状金属部材の表面に配置された
多数のナノチューブ状繊維からなる被膜で構成したの
で、従来のカーボンナノチューブを用いた電子放出源の
ように一部の電子放出源に電界が集中して輝度が不均一
となることがない。Also, since the insulating substrate is a glass substrate,
The effect that the size can be easily increased and the film thickness can be reduced easily can be obtained. Since the electron emission source is a field emission type electron emission source, the length of the electron emission source is not limited as in the electron emission source using the filament cathode, so that the display screen can be easily enlarged.
In addition, since the field emission type electron emission source is a planar electron emission source composed of a large number of electron emission sources, electrons emitted from the field emission type electron emission source are compared with a linear electron emission source such as an electron emission source using a filament cathode. Since it can be increased, it is easy to increase the luminance. Since the planar electron emission source is composed of a coating composed of a large number of nanotube-like fibers arranged on the surface of a plate-like metal member, an electric field is applied to some electron emission sources like a conventional electron emission source using carbon nanotubes. Does not concentrate and the brightness does not become uneven.
【図１】 本発明の実施の形態にかかる平面ディスプレ
イの画素構成を示す部分分解斜視図である。１画素の構
造を示す断面図である。FIG. 1 is a partially exploded perspective view showing a pixel configuration of a flat display according to an embodiment of the present invention. FIG. 3 is a cross-sectional view illustrating a structure of one pixel.
【図２】 図１の１画素の構造を示す断面図である。FIG. 2 is a cross-sectional view illustrating a structure of one pixel of FIG.
【図３】 従来の平面ディスプレイの画素構成を示す部
分分解斜視図である。FIG. 3 is a partially exploded perspective view showing a pixel configuration of a conventional flat display.
１０１…ガラス基板、１０２…基板リブ、１０３…フロ
ントガラス、１０４…前面リブ、１０５…蛍光体膜、１
０５Ｂ…青色発光蛍光体膜、１０５Ｇ…緑色発光蛍光体
膜、１０５Ｒ…赤色発光蛍光体膜、１０６…メタルバッ
ク膜、１１０…電子放出源、１１１…板状金属部材、１
１２…被膜、１２０…絶縁基板、１２１…導電膜、１２
２…電子通過孔。101: glass substrate, 102: substrate rib, 103: front glass, 104: front rib, 105: phosphor film, 1
05B: blue light emitting phosphor film, 105G: green light emitting phosphor film, 105R: red light emitting phosphor film, 106: metal back film, 110: electron emission source, 111: plate-shaped metal member, 1
12: coating, 120: insulating substrate, 121: conductive film, 12
2. Electron passage hole.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 長廻 武志 三重県伊勢市上野町字和田700番地 伊勢 電子工業株式会社内 (72)発明者 倉知 宏行 三重県伊勢市上野町字和田700番地 伊勢 電子工業株式会社内 (72)発明者 山田 弘 三重県伊勢市上野町字和田700番地 伊勢 電子工業株式会社内 (72)発明者 江崎 智隆 三重県伊勢市上野町字和田700番地 伊勢 電子工業株式会社内 Ｆターム(参考） 5C031 DD17 5C032 CC10 5C036 CC07 CC13 EE03 EF01 EF06 EF09 EG02 EG12 EG17 EG36 EH04 EH06 EH08 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Takeshi Nagamado 700, Wada-cho, Ueno-cho, Ise, Mie Prefecture Inside Ise Electronics Industries Co., Ltd. (72) Inventor Hiroyuki Kurachi 700, Wada, Ueno-cho, Ise-shi, Mie Prefecture Co., Ltd. (72) Inventor Hiroshi Yamada 700, Uedacho, Ise-shi, Mie Prefecture, Ise Electronics Industry Co., Ltd. Terms (reference) 5C031 DD17 5C032 CC10 5C036 CC07 CC13 EE03 EF01 EF06 EF09 EG02 EG12 EG17 EG36 EH04 EH06 EH08
Claims (8)
トガラスとこのフロントガラスに対向配置された基板と
を含みかつ内部が真空排気された外囲器と、 この外囲器内の前記フロントガラス面に配置された蛍光
体膜と、 前記外囲器内の前記基板面に配置された電子放出源と、 前記蛍光体膜と対向した面に形成された所定電圧が印加
可能な導電膜と電子通過孔とを有し、前記蛍光体膜と前
記電子放出源との間に配置された絶縁基板とを備えた平
面ディスプレイ。An envelope including at least a part of a windshield having a light-transmitting property and a substrate opposed to the windshield and having an inside that is evacuated, and the windshield in the envelope A phosphor film disposed on a surface; an electron emission source disposed on the substrate surface in the envelope; a conductive film formed on a surface facing the phosphor film and capable of applying a predetermined voltage; A flat display, comprising: a through hole; and an insulating substrate disposed between the phosphor film and the electron emission source.
数配置され、 前記電子放出源は、帯状で前記蛍光体膜の配置方向と直
交する方向に複数配置され、 前記導電膜は、帯状で前記蛍光体膜に対応して複数配置
され、 前記電子通過孔は、前記蛍光体膜と前記電子放出源とが
交差する領域内に配置されていることを特徴とする請求
項１記載の平面ディスプレイ。2. A plurality of the phosphor films are arranged in a strip shape in parallel with each other; a plurality of the electron emission sources are arranged in a strip shape in a direction orthogonal to an arrangement direction of the phosphor films; The plane according to claim 1, wherein a plurality of the electron passing holes are arranged in a region where the phosphor film and the electron emission source intersect with each other. display.
ス面から直方体状の絶縁体からなる前面リブが垂設さ
れ、 前記絶縁基板は、前記前面リブと前記電子放出源に挟ま
れていることを特徴とする請求項２記載の平面ディスプ
レイ。3. A front rib made of a rectangular parallelepiped insulator is suspended from the front glass surface between the phosphor films, and the insulating substrate is sandwiched between the front rib and the electron emission source. 3. The flat display according to claim 2, wherein:
する請求項１から請求項３のいずれかに記載の平面ディ
スプレイ。4. The flat display according to claim 1, wherein the phosphor film has a metal back film serving as an anode on a surface thereof.
４のいずれかに記載の平面ディスプレイ。5. The flat display according to claim 1, wherein the insulating substrate is a glass substrate.
から請求項５のいずれかに記載の平面ディスプレイ。6. The electron emission source according to claim 1, wherein the electron emission source is a field emission type electron emission source.
A flat display according to any one of claims 1 to 5.
特徴とする請求項６記載の平面ディスプレイ。7. The flat display according to claim 6, wherein the field emission type electron emission source is a planar electron emission source including a plurality of electron emission sources.
板状金属部材と、この金属部材の表面及び貫通孔壁に配
置された多数のナノチューブ状繊維からなる被膜とから
構成されていることを特徴とする請求項７記載の平面デ
ィスプレイ。8. The planar electron emission source comprises: a plate-shaped metal member having a large number of through holes and serving as a nucleus for forming a nanotube fiber; and a large number of nanotubes arranged on the surface of the metal member and the wall of the through hole. 8. A flat display according to claim 7, wherein said flat display is constituted by a coating made of fiber-like fibers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001146050A JP4369075B2 (en) | 2001-05-16 | 2001-05-16 | Flat display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001146050A JP4369075B2 (en) | 2001-05-16 | 2001-05-16 | Flat display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002343281A true JP2002343281A (en) | 2002-11-29 |
| JP4369075B2 JP4369075B2 (en) | 2009-11-18 |
Family
ID=18991764
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001146050A Expired - Fee Related JP4369075B2 (en) | 2001-05-16 | 2001-05-16 | Flat display |
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| Country | Link |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1301532C (en) * | 2003-10-20 | 2007-02-21 | 诺利塔克股份有限公司 | Method of manufacturing flat display |
| US7245070B2 (en) | 2004-03-19 | 2007-07-17 | Noritake Co., Ltd. | Flat display |
| US7309954B2 (en) | 2002-12-24 | 2007-12-18 | Electronics And Telecommunications Research Institute | Field emission display having gate plate |
| US7564179B2 (en) | 2005-01-05 | 2009-07-21 | Noritake Co., Ltd. | Flat panel display, gate electrode structure, and gate electrode structure manufacturing method |
| US7629737B2 (en) | 2006-09-12 | 2009-12-08 | Noritake Co., Ltd. | Fluorescent display device |
| US7652417B2 (en) | 2005-05-19 | 2010-01-26 | Noritake Co., Ltd. | Flat panel display |
-
2001
- 2001-05-16 JP JP2001146050A patent/JP4369075B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7309954B2 (en) | 2002-12-24 | 2007-12-18 | Electronics And Telecommunications Research Institute | Field emission display having gate plate |
| CN1301532C (en) * | 2003-10-20 | 2007-02-21 | 诺利塔克股份有限公司 | Method of manufacturing flat display |
| US7245070B2 (en) | 2004-03-19 | 2007-07-17 | Noritake Co., Ltd. | Flat display |
| US7564179B2 (en) | 2005-01-05 | 2009-07-21 | Noritake Co., Ltd. | Flat panel display, gate electrode structure, and gate electrode structure manufacturing method |
| US7652417B2 (en) | 2005-05-19 | 2010-01-26 | Noritake Co., Ltd. | Flat panel display |
| US7629737B2 (en) | 2006-09-12 | 2009-12-08 | Noritake Co., Ltd. | Fluorescent display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4369075B2 (en) | 2009-11-18 |
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