JP2002334135A - Method and program for defining process control model, and process control method and its system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for defining a process control model and its program, etc., capable of constructing a process control system consistent with the existing system at an early stage by defining the process control model by correlating it with the respective parameters of constitutional components of a manufacturing shop and a system of the existing data base or the like. SOLUTION: An equipment operation sequence and the process control model are defined in consideration of structure of the manufacturing shop and structure of a data base in a manufacturing system. The respective parameters of the process control model are correlated with the respective parameters of the data base or recipe and the manufacturing shop is evaluated in advance based on the process control model. Furthermore, the recipe is decided based on the process control model and the process control system consistent with the existing system is formed by operating the respective pieces of manufacturing equipment.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to modeling of process control and recipe setting or recipe modification which define a processing method in a manufacturing facility formed in a manufacturing line or a manufacturing shop of a thin film product such as a semiconductor. This includes modeling process control for process flows that span not only a single manufacturing facility but also multiple manufacturing facilities.

[0002]

2. Description of the Related Art Conventionally, in order to determine the value of a recipe for operating a manufacturing facility, the process and operation of the manufacturing facility are examined on a desk, an experiment is performed based on the study, and a prospect of performing a stable processing. Was attached. Thereafter, construction is started by directly setting a recipe or the like on the terminal of the manufacturing facility or transmitting an instruction from the host system to the manufacturing facility online. Further, efforts are made to stabilize each manufacturing parameter of the process by QC activities and the like, and a method of observing and controlling the manufacturing parameters for stabilizing the quality is formulated. A process control system was developed for automation and installed, tested and put into production.

In order to complete this series of operations at an early stage and to stabilize the process as soon as possible, the contents of the process control from the process examination stage to the final process control method are managed consistently and unitarily. In addition, the same system must be used from the experimental stage to the final process execution to reduce the man-hours related to system development, such as installing recipe definition contents in the system and developing a process control system. In addition, it is necessary to evaluate the process in order to support the process leading to the determination of this series of process control methods.

Therefore, in a factory control apparatus and a control method described in Japanese Patent Application Laid-Open No. 7-191737 (prior art 1), a process model is selected, control parameters of a manufacturing apparatus are calculated, and a process is performed. A factory control method for adjusting the process based on the results is shown.

[0005] In the manufacturing system and the equipment operation parameter automatic determination device described in Japanese Patent Application Laid-Open No. 8-76812 (prior art 2), the past processing contents of the workpiece,
It shows how to perform real-time automatic setting of equipment operation parameters according to the internal state of the processing of the workpiece in the manufacturing equipment before the start of processing, the actual processing data obtained by partially processing the workpiece in the manufacturing equipment, or the inspection results. Have been.

[0006] In a recipe correction method for a semiconductor manufacturing apparatus described in Japanese Patent Application Laid-Open No. H11-186204 (prior art 3), parameters that change according to the state of the semiconductor manufacturing apparatus are monitored, and based on the monitored fluctuation parameters. A method of correcting recipe information to a semiconductor manufacturing apparatus is shown, and a specific recipe correction method for a chemical mechanical polishing process is also described.

[0007] In the semiconductor manufacturing process stabilization support system described in Japanese Patent Application Laid-Open No. 2000-252179 (prior art 4), a calculation means for obtaining a causal relationship between actual data of a manufacturing apparatus and an inspection result, Computing means for adjusting the manufacturing parameters with respect to the multi-variable manufacturing parameters and the inspection results thereof to identify the relationship, separation of the manufacturing parameters contributing to the variation and the manufacturing parameters that match the target value, A method of adjusting is shown.

[0008]

However, the factory control apparatus and control method described in the above-mentioned prior art 1 show a method of selecting and adjusting a process model and controlling a manufacturing facility and a process. There is no description of a method for determining a process and installing it as a system, and it is not possible to determine a sequence between manufacturing facilities and a content of a database in online processing, which are important in building a manufacturing line or a manufacturing shop.

Further, in the manufacturing system and the equipment operation parameter automatic determination device described in the above-mentioned prior art 2, the processing means capable of automatically determining the manufacturing parameters includes:
Although a method for automatically operating a manufacturing facility is described, a method for defining the processing content for automatic determination in consideration of the configuration of a manufacturing line or a manufacturing shop is not described. It relies on the technicians of the manufacturing line, manufacturing shop or process and cannot support the development of a consistent process control system.

Further, in the method of correcting a recipe of a semiconductor manufacturing apparatus described in the prior art 3, the process control method itself cannot be defined, and the process control system is designed in consideration of the configuration of the manufacturing line or the manufacturing shop. It cannot be realized.

In the semiconductor manufacturing process stabilization support system described in the prior art 4, a method for constructing a process model based on processing result data and inspection result data is described. It is not possible to control the process in consideration of the configuration of

[0012] An object of the present invention is to solve the above problems.
Process control model definition method and process that enables process control models to be constructed at an early stage by being able to define a process control model while considering the configuration of a manufacturing line or a manufacturing shop and the configuration of a database collected therefrom. It is to provide a control model definition program.

Another object of the present invention is to determine a process control method by defining a process control model in consideration of a configuration of a manufacturing line or a manufacturing shop and a configuration of a database collected therefrom. It is an object of the present invention to provide a process control method and a system thereof capable of providing a recipe to a facility group control system or a start instruction system based on the model, thereby enabling early construction of process control.

[0014]

In order to achieve the above-mentioned object, the present invention provides a process control model (including a process observation model) of a desired process control model (including a process observation model) according to the type of a workpiece. A first step of designating a process flow representing a processing procedure; and a production line (including an inspection facility) / equipment in a production line or a shop used in each process in the process flow designated in the first step. A second step of designating each control sequence consisting of a use sequence and a use time, and a process processing content provided to each production facility by the facility group control system or the start instruction system in the production line or the production shop. A method for defining a process control model characterized by defining a process control model to be represented A gram.

Further, according to the present invention, the second step in the process control model definition method and the program thereof may be performed by using, for each control sequence, each parameter of each control sequence by using an existing parameter collected from the manufacturing line or manufacturing shop. And is specified by associating with each parameter of the database.

Further, according to the present invention, there is provided a method for defining a process control model and a program therefor, comprising: a model / supply of a manufacturing facility in a manufacturing line or a manufacturing shop used in each process in a designated process flow; The method has a step of designating any one or more.

Further, according to the present invention, in the method for defining a process control model and its program, a parameter item in each designated control sequence is associated with each parameter of a recipe defining a process in each manufacturing facility. Assigning recipe parameters by
A step of associating a parameter item in each of the designated control sequences with a database item obtained based on a result of process processing in each manufacturing facility and performing database parameter assignment.

Further, according to the present invention, when a process control model is defined by the method for defining a process control model and its program, the process control model is defined based on information of the defined process control model and the results of process processing in each manufacturing facility. Evaluating a process control model using the obtained database.

Further, according to the present invention, when a process control model is defined by the process control model defining method and the program thereof, the process control model is defined based on information of the defined process control model and a result of process processing in each manufacturing facility. Evaluating a process control model by calculating a process capability index, a process processing time, an operation rate of a manufacturing facility, or a life of equipment of the manufacturing facility using the obtained database.

Further, according to the present invention, a simulation is performed on the process control model defined by the method for defining the process control model and the program by calculating desired parameters in the process control model. If not, the method has a step of modifying and redefining the process control model.

Further, according to the present invention, based on the process control model defined by the method for defining a process control model, each manufacturing facility is operated in accordance with a recipe set for the facility group control system or the start instruction system. A process control method characterized by the following.

Also, the present invention provides a performance data collection unit for collecting a database obtained based on the performance of process processing in each manufacturing facility in a manufacturing line or a manufacturing shop, a configuration of the manufacturing line or the manufacturing shop, and the performance A process control model definition unit that defines a process control model in consideration of a configuration of a database collected by a data collection unit, and evaluates the manufacturing line or the manufacturing shop based on the defined process control model; and A facility group control system unit or a start instruction system unit that determines a recipe based on the process control model defined and evaluated in the definition unit and operates each of the manufacturing facilities in the manufacturing line or the manufacturing shop. Process control system.

Each of the manufacturing facilities (including inspection facilities) in the manufacturing line or the manufacturing shop according to the present invention is connected to a facility group control system via a controller for directly controlling them. The operation content and timing are instructed to each manufacturing facility, and manufacturing (including inspection) is performed by the controller.

In the equipment group control system, when each manufacturing equipment (inspection equipment) is not connected, the operation instruction and timing are instructed to the worker by the start-of-work instruction system, and the worker can use each manufacturing equipment (inspection equipment). Driving). Further, when manufacturing is performed, there is provided means for accumulating the processing contents in a database as processing result data (including inspection result data) and as equipment management data such as the use time of equipment and equipment.

In the present invention, by providing means for defining a process control model representing the processing content of each manufacturing facility (including the inspection facility), the processing flow and processing content related to a plurality of manufacturing facilities are defined collectively. At this time, by specifying the type of process control model such as RunToRun, model base, statistics and diagnosis as the process control method, it is possible to perform the manufacturing and inspection in a manufacturing line or a manufacturing shop. It is possible to estimate a change in each parameter value of the apparatus, the workpiece, the fixture, and the processing method. Thereby, an appropriate process control model can be found.

The processing flow and the processing contents related to a plurality of manufacturing equipment and inspection equipment are defined as processing sequences (control sequences) that allow parallel processing of each apparatus and equipment. , Input parameter items, output parameter items, observation parameter items, and model parameter items (for example, model coefficient parameter items) are set in correspondence with each processing sequence (each control sequence). (E.g., a calculation formula including a gradual formula with each parameter item as a variable). This makes it possible to define a feedback structure and an adjustment structure of a process control model relating to a plurality of manufacturing facilities (including inspection facilities).

Further, according to the present invention, together with the definition of the process control model, each parameter item specified by the process control model is associated with an existing processing result data item, inspection result data item, and device management data item. In addition, it is possible to calculate process parameters or modify manufacturing conditions or recipes based on a process control model by associating the parameters with recipe parameter items required for the operation of each manufacturing facility or inspection apparatus, and to enable the existing manufacturing line or manufacturing It becomes possible to efficiently install the process control system of each manufacturing facility in the shop.

Further, according to the present invention, a process capability index Cp, Cpk is obtained based on the collected processing result data, inspection result data, and equipment management data for the defined process control model. Cycle time and tact are obtained based on the processing time specified at the time of model definition, and the operation rate of manufacturing equipment and the usage time of equipment used in manufacturing are collected, processing performance data, inspection result data, and equipment management. Evaluation based on the data enables evaluation of the process control model. As a result, it becomes possible to find quality improvement points of manufacturing equipment (including inspection equipment), find bottlenecks, examine the configuration of the manufacturing line or shop, and examine and instruct when to replace equipment.

Further, according to the present invention, each parameter item in the defined process control model is set, and each parameter value is repeatedly calculated according to the process control model for the number of times of processing of the specified wafer or lot, and the calculation result is represented by p. By displaying the data in the form of the control chart, the behavior of each parameter can be predicted. Simulation of the process control model is performed in this way, and according to the result,
By adjusting the value of the model coefficient parameter of the process control model, the process control model can be modified.

Further, manufacturing performance data associated with each parameter item in the defined process control model,
Import inspection result data and equipment management data,
Each parameter item is calculated based on the defined process control model, and the calculation result is displayed on the p control chart. At this time, in the process control model definition program, the definition of the calculation formula for calculating each parameter value is corrected, each parameter item is calculated, and the result is evaluated on the p control chart. It is possible to modify the process control model based on the results of the manufacturing equipment and the inspection equipment.

Further, according to the present invention, when a process control model is defined, an existing parameter item, a parameter, a process control model management, a process control model, a process flow, and a reference data are copied or newly generated. , A function to specify the name and configuration of storage means for storing processing result data or inspection result data or device management data and a data item, and a group control system or a start instruction system, and in the group control system or the start instruction system, With the ability to specify recipes or manufacturing parameters that define processing in a manufacturing or measurement facility, the process control model can be implemented for any manufacturing line or manufacturing shop or for one or more manufacturing facilities within a manufacturing shop. It is characterized by the definition and implementation of the process. That.

[0032]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of a method for defining a process control model, a process control model program, a process control method in a production line or a production shop, and a system therefor according to the present invention will be described with reference to the drawings.

FIG. 1 shows an embodiment of the configuration of the process control system according to the present invention.

Each facility (not shown) in the production line or shop has various controllers and is connected to the facility group control system 106 via the network 140. Various controllers include a stocker controller 131 that controls a stocker that stores and manages workpieces and equipment, a transport equipment controller 132 that controls a device that transports workpieces and equipment, and a manufacturing equipment that controls process processing of the workpiece. It comprises a controller 133 and an inspection equipment controller 134 for controlling the inspection equipment, and also comprises a processing unit controller 135 and an inspection unit controller 136 for controlling a partial processing device of each equipment. When each facility is not connected to the facility group control system 106 via the network 140, or when remote operation is not possible, the operator can directly operate the facility.

According to the recipe set in the equipment group control system 106, the equipment group control system 106 issues instructions to the various controllers 131 to 136, thereby automatically operating each equipment or setting the start instruction system 107. Recipe (for example, shown by a recipe name in FIG. 10)
, The operator operates each facility directly.

The group control system 106 and the start instruction system 107 are connected to the data totaling system 105 via the network 141, and store the processing contents of the manufacturing equipment and the inspection equipment in the databases 121 to 123. The stored data includes, as shown in FIG. 11, processing results data 121 representing lots and wafers processed in each manufacturing facility, information on wafers, manufacturing parameters or recipes in the process processing, and inspections performed in each inspection facility. From the inspection result data 122 representing the information about the lot, the wafer and its part and the inspection result and the operating parameter or recipe in the inspection processing, and the equipment management data 123 representing the use history of the equipment used in each manufacturing equipment and inspection equipment. Be composed.

The recipe or manufacturing parameter set in the equipment group control system 106 or the start instruction system 107 is determined by the recipe determination program 102 based on the process control model defined in the process control model definition program 101 of the computer 100. .

The recipe determination program 102 in the computer 100 converts the contents of a process defined as a process control model into a description of a set item or value of a recipe or a manufacturing parameter of each equipment or a procedure (protocol or message sequence). Via the network 141 to the facility group control system 106 or the start instruction system 107.

The content of the process control model defined in the process control model definition program 101 in the computer 100 according to the present invention includes information on each equipment used in the process, a sequence of use of each equipment and equipment attached to the equipment (operation procedure). ), Information (reference data) 116 on a process name representing the content of each step of the sequence, equipment to be used, kind of workpiece, equipment, and method of construction. This process control model is stored in the process control model database 114.

As described above, the process control model stored in the process control model database 114 is transmitted to the equipment group control system 106 or the start instruction system 107 by the recipe determination program 102 in the computer 100 to operate each equipment. However, information representing the relationship between the process control model and each facility and the workpiece to be manufactured is stored in the process control model management database 113.

As shown in FIG. 5, the process control model is
As shown in FIG. 7, the sequence of use of equipment which is defined in association with each process of the process flow representing the processing procedure of the workpiece and applied to each product type (process type) is specified. This process flow information is stored in the process flow database 115.

Processing time and input parameters (for example, reference polishing rate, previous film thickness, rear film thickness, etc.) and output parameters (for example, estimated polishing rate, estimated polishing time, etc.) associated with each equipment and each step of a sequence of equipment attached to equipment. The item names of the polishing time), the observation parameters (for example, the polishing time), and the model coefficient parameters (for example, the weighting coefficient w) used in the calculation formula for determining each parameter are stored in the parameter item database 111. The values of these parameters (processing time, input parameters, output parameters, observation parameters, model coefficient parameters, etc.) are stored in the parameter database 11 as reference values / standard values and calculation formulas using each parameter item as a variable.
2 is stored. The parameter items stored in the parameter item database 111 include the processing result data 12
1. Each item is associated with each item of the inspection result data 122 and the device management data 123, and is also associated with each parameter item or manufacturing parameter item of the recipe set in the equipment group control system 106 or the start instruction system 107.

In the computer 100, when the process control model is defined by the process control model definition program 101, the information 1 of the set process control model is set.
As shown in FIG. 12, the process control model evaluation program 103 utilizes the data 121 to 123 accumulated by the data aggregation system 105 and the process capability indexes Cp and Cpk, the process cycle time and tact, Operating rate of manufacturing equipment and inspection equipment,
Evaluate the life of equipment used in manufacturing.

Further, when the process control model is defined by the process control model definition program 101 in the computer 100, information 111-116 of the set process control model and data 121-123 accumulated by the data totaling system 105 are used. Using the process control simulator 104, as shown in FIG.
Simulate the value of each parameter in the model of the p control chart and modify the process control model.

As described above, the equipment group control system 106
Controls the manufacturing facilities and the inspection facilities 131 to 136 by using the process control model defined by the process control model definition program 101. FIG. 2 shows transmission and reception of data in the execution of the process control model.
As shown in FIG. 5, the process control model has a type (type).
(For example, RunToRun: iterative control, neural network control, feedback / feedforward control), and the process control model type 20
It is executed based on the operation 1 (processing procedure according to the processing type). An execution result of each of the manufacturing facilities and the inspection facilities 131 to 136 is set as an input 202, and an output 203 is output by the process control model type 201 to each of the manufacturing or inspection facilities 131 to 136
136 is calculated. In addition, the observation 204 is fed back in order to monitor the execution of the manufacturing equipment and the inspection apparatuses 131 to 136 and adjust the parameters of the process control model. Each manufacturing equipment or inspection equipment 131-1
A model that does not control 36 but performs only monitoring is called a process observation model.

The process control model is as shown in FIG.
Each manufacturing equipment and inspection equipment 131 to 136 are defined for each device and equipment, and are further defined for each manufacturing equipment and inspection equipment 131.
136 may be operated sequentially or in parallel, or they may be combined and defined as a process control model.

For example, in the CMP process in semiconductor manufacturing, the control of the CMP polishing apparatus alone is performed by inputting the film thickness before polishing 202, outputting the polishing time 203, and observing the film thickness after the previous polishing 204 to a RunToRun process control model type. Also, the control of the measuring device, the polishing device, and the measuring device in the CMP process in order can be defined as no input 202, the thickness after polishing as an observation 204, and a monitoring process observation model type 201. It can be defined.

Next, a method of defining a process control model in the computer 100 will be described. FIG. 3 shows an embodiment of a procedure for defining a process control model.

First, in the process control model type designation (S301), the type of the process control model or the process observation model is designated by using the computer 100. As a process control model type, for example, RunToR
Control methods such as un, model base, statistics, and optimization can be considered. By specifying this process control model type (for example, RunToRun as shown in FIG. 5), a framework is provided for setting a calculation formula for calculating each parameter (for example, a calculation formula for the estimated polishing rate shown in FIG. 9). It becomes possible.

Next, using the computer 100, the product name (for example, a DRAM (DR3058X) as shown in FIG.
HX3)) and specify the process flow (S303).
In FIG. 5, each process (as shown in FIG. 5, measurement (measurement of film thickness before), CMP (polishing), cleaning (washing), measurement (measurement of post-film thickness), etc.) and their processing order are set. Further, in the designation of the manufacturing equipment and the processing method (S304), the manufacturing equipment and the processing method (FIG.
As shown in the figure, the processing method (CMP) and the equipment / equipment name (NO1: CMP apparatus 553X, NO2: pad 1, N
O3: pad 2, NO4: head 1, NO5: head 2
)).

Process control model type designation (S301),
Computer (system) 1 for executing the process control model definition program 101 consisting of machining type designation (S302) and process flow designation (S303)
FIG. 5 shows an example screen 501 on a display device (not shown) connected to 00, and FIG. 6 shows an example screen 601 for specifying the manufacturing equipment and processing method 304 for each process. A process flow (for example, CMP process DRAM003) is set as a list (NO, process type, process name, equipment / equipment number, input parameter number, output parameter number, observation parameter number, etc.) 5011 in the lower part of the screen 501 in FIG. Then, a manufacturing equipment definition button 5012a is clicked to set a manufacturing equipment for each record. Then
A screen 601 in FIG. 6 is displayed, and equipment or equipment is set in the list 6011.

Process control model definition program 101
After defining the process control model type, the processing type, the process flow, the manufacturing equipment, and the processing method in the computer 100, the control sequence is specified (S305), as shown in FIG. Set the usage procedure (sequence).

For example, equipment or equipment used with the movement of the workpiece (wafer) attached to the heads 1 and 2 which oscillate in the radial direction while rotating with respect to the surface plate (on a revolving surface plate) The provided pads 1 and 2) change, and the time involved in the processing process of the workpiece differs for each facility and equipment.
Each facility (for example, pads 1 and 2) may be used in parallel. In order to display these, as shown in FIG. 7, a sequence diagram 7011 depicting a time axis sequence for each manufacturing facility and equipment is used.

FIG. 7 shows a screen example 701 in the process control model definition program 101 for the control sequence designation (S305). A sequence diagram 7011 includes manufacturing equipment (measuring device XXXX, CMP device 553X, etc.) and equipment (pad 1) used for each process (measurement, CMP, etc.) of the process flow and each process (measurement, CMP, etc.). , Pads 2, head 1, head 2 etc.) are arranged in the swim lanes and represent bars 7011a, 7011b,... According to the order of the process flow.
・ Is displayed. These bars 7011a, 7011b,
.. Is divided and the position and length are adjusted to determine the use order and time of each manufacturing facility and equipment.

Bar 7011a in measuring device XXXX
Is a pre-film thickness measurement, firstly setup and loading, followed by measurement and post-processing.

Bar 7011 in CMP apparatus 553X
In b, setup, loading, polishing, unloading, and unloading are performed.

The bars in the heads 1 and 2 are loaded, polished, and unloaded.

Of course, after this, cleaning and measurement (post-film thickness measurement)
Becomes By adjusting these divided positions and lengths, the use order and time of each manufacturing facility and equipment are determined.

Next, a loading rule of a workpiece (wafer) is defined for each processing step (for example, CMP). FIG. 8 shows an example screen 801 for specifying the input method obtained by clicking the input method 7012a. For each lot (for example, for every 25 wafers) or for each wafer (for each wafer)
Is specified, and in the case of each lot, the number of wafers per lot is specified.

Next, as shown in FIG. 9, for each processing step of the sequence in the control sequence specification (step S305), input parameter items (standard polishing rate, previous film thickness, rear film thickness, etc.) 9011 and output parameter items ( Estimated polishing rate (indicated by equation (1)), estimated polishing time (indicated by equation (2)) 9012, observation parameter item (polishing time, etc.) 9013, model coefficient parameter item (weighting coefficient w, etc.) ) Set 9014 and their values. The processing time is set by clicking the processing time setting 7012c.

FIG. 4 shows each parameter item (input parameter item, output parameter item, observation parameter item, model coefficient parameter item, etc.) for each sequence (measurement, CMP, etc.) and each processing step executed using the computer 100. ) And an example of a procedure for setting those values. Loop for each sequence (S401) and processing order setting for each sequence (S4
The process 11) is set in the screen example 701 of the control sequence designation (step S305) shown in FIG.

The processing in the loop (S412) for each processing step of each sequence is to set each parameter item and their value for each processing step. The process of setting the lot and the wafer input amount (S421) for each model and equipment of the manufacturing equipment can be set in the screen example 701 for specifying the control sequence (step S305) and the screen example 801 for specifying the input method. FIG. 9 shows a screen example 901 in the process control model definition program for the setting process of the process (S422) and the process (S433).

Step S422 is executed by the computer 100
, Input parameter items, output parameter items,
This is the setting of observation parameter items and model coefficient parameter items.

Step S423 is performed by the computer 100.
, Processing time (eg, polishing time), input parameter items, output parameter items, observation parameter items,
And setting of the reference value, management value, and calculation formula of the model coefficient parameter item.

The control sequence designation shown in FIG. 7 (step S3)
In the screen example 701 of FIG. 05), the processing step of the sequence (for example, the CMP apparatus 553X) is selected and designated, and this screen 901 is displayed by clicking the parameter setting button 7012b at the bottom of the screen. In this example, C
The film thickness after polishing is controlled by manipulating the polishing time, taking the MP processing step as an example. A recipe parameter item set in the manufacturing equipment is a polishing time as a processing time, and can be calculated as an estimated polishing time by the following equations (1) and (2).

Estimated polishing rate = reference polishing rate + w × ((pre-film thickness [−1] −post-film thickness [−1]) ÷ polishing time [−1]) (1) Estimated polishing time = (pre-film thickness) [0] −post-film thickness [reference]) ÷ Estimated polishing rate (2) Pre-film thickness [−1] is the film thickness before processing (before polishing) measured in the previous sequence.

The post-film thickness [-1] is the film thickness after processing (after polishing) measured in the previous sequence.

The polishing time [-1] is the polishing time observed in the previous sequence and required for polishing.

Therefore, ((pre-film thickness [-1] -post-film thickness [-1]) / polishing time [-1]) indicates the actual polishing rate in the previous sequence.

The estimated polishing rate is obtained by adding a value obtained by multiplying the actual polishing rate by a weighting coefficient to the reference polishing rate.

The estimated polishing time is obtained by subtracting the target film thickness after polishing (post-film thickness [reference]) from the measured film thickness before polishing (this time) (pre-film thickness [0]). It can be obtained by dividing the polished film thickness by the estimated polishing rate obtained by the equation (1).

The pre-film thickness, the post-film thickness, and the reference polishing rate are input parameters to the computer (system) 100. The reference polishing rate refers to the catalog value of the CMP apparatus 553X stored in the parameter 112 and is not an output of another processing step.
Since these are input to the computer (system) 100, they are input parameters. Since the polishing time is referred to repeatedly in a time series, it is used as an observation parameter for the computer 100. The calculated estimated polishing rate and estimated polishing time are calculated by the computer 1
This is an output parameter for 00. The weighting coefficient w is a model coefficient parameter item because it is a coefficient specific to the control model. Note that the brackets [] indicate 0 this time.
And the number of times performed so far is referred to by the relative position. References are negative values, for example [-1], 5
The previous time is [-5]. [Standard] means to refer to the standard value. FIG. 9 is a screen on which a calculation formula is set for the estimated polishing rate. If you want to determine the value of a parameter item as one, it is a reference value.
L (upper limit), LCL (lower limit)).

Next, the computer 100 associates each parameter of the recipe stored in the parameter item database 111 with each parameter of the process control model stored in the process control model database 114 (step S306). This specifies whether each parameter of the recipe is a reference source or a setting destination of each parameter of each processing step defined earlier. FIG. 10 shows a screen example 1001 in the process control model definition program for the setting process of the process (S306).
Shown in This screen 1001 is displayed by clicking a recipe parameter assignment button 5012b arranged at the bottom of the process model definition screen 501 in FIG. By selecting and specifying the recipe name 10011a and its location 10011b, each parameter of the recipe (for example, polishing time: polish time) is listed 1001.
2, each process (for example, a polishing step as a process name) and each parameter (for example, an estimated polishing time) of each sequence (for example, a CMP apparatus 553X as equipment / equipment) are designated for each list 10012. At this time, it is also instructed whether each parameter of the recipe (for example, the estimated polishing time) is to be a reference source or a setting destination. Although the recipe file has a different model in each manufacturing facility, the recipe file may be converted through a common intermediate file.

Then, the computer 100 associates the processing result data item, the inspection result data item, and the device management data item with each parameter of the process control model stored in the process control model database 114 via the network 141. (Step S30)
7). This is, for example, the data aggregation system 105 of FIG.
The processing result data 121, the inspection result data 122, and the device management data 123 accumulated by the above are associated with the parameters of each processing step defined above.
4 is used as a reference source of each parameter of each processing step when performing a process control model simulation using the step 4. FIG. 11 shows a screen example 1101 in the process control model definition program for the setting process of the process (S307). This screen 1101 is displayed by clicking a DB parameter assignment button 5012c arranged at the bottom of the process model definition screen 501 in FIG. Database name 11011a and its location 1101
1b, further, by selecting and specifying the table name 11011c, the processing result data item, the inspection result data item, and the device management data item are displayed in a list 11012, and each process (process name) and each sequence ( Each parameter of (equipment / equipment) is specified. At this time, the number of record references from the last record of the database table is also set. For example, if the number of record references is 100
Then, when executing the process control model simulation, the data is referred to from the record 100 records before the last record.

Finally, the computer 100 evaluates and simulates the process control model (step S30).
8) is performed. If the result of the evaluation / simulation is not desirable, each processing (S302 to S30)
Returning to 7), various setting contents are corrected, and the process control model evaluation / simulation (S308) is repeated.

The process of the process control model evaluation / simulation (S308) in the computer 100 is performed by the process capability index C of the defined process control model.
Processes for evaluating the process control model by calculating p, Cpk and processing time, and processes for repeatedly calculating each parameter from initial values based on the process control model and performing simulation to correct the process control model Can be

First, the process of evaluating the process control model based on the process control evaluation program 103 in the computer 100 (S308) will be described.
In the present embodiment, the evaluation targets the process capability index (control value width (variation) Cp, Cpk), the cycle time and tact of the process, the operation rate of the manufacturing apparatus and the inspection apparatus, and the life of the equipment used in the manufacturing.

Process capability index Cp = (UCL-LCL) / 6σ, Process capability index Cpk = | UCL or LCL-μ (average value)
| Min / 6σ If these Cp and Cpk are 1.0 or less, the result is NG.
1.3 is good and 1.3 or more is good.

FIG. 12 shows a process control model evaluation screen 1201. This screen 1201 is displayed by clicking an evaluation button 5012d arranged at the bottom of the process control model definition screen 501 in FIG. Description will be made in order from the top of the screen 1201.

In the computer 100, the cycle time (sum of the processing times of all processes from the input to the end (discharge)) and the tact (the longest processing time) are calculated for the entire process flow. Each process (e.g. measuring device XXXX as equipment / equipment,
For each CMP device 553X, pad 1, pad 2, ...)
The processing time is calculated as the difference between the first start time and the last end time of each sequence included in the process, and the largest one of them is tact (for example, 28 minutes), and all processes (measurement: previous film thickness) are performed. The total processing time (e.g., 204 minutes) of measurement, CMP: polishing, cleaning: cleaning, measurement: post-film thickness measurement, etc., is the cycle time. When the processing time of each sequence is defined as an equation, the processing time can be calculated by referring to the reference value of each parameter included in the equation.

In the computer 100, the life of the equipment used in the manufacturing is calculated by calculating the usage time of each equipment for each lot processing or wafer processing.
The equipment use time per process is obtained, and if the usable time of the equipment is given, the number of times of processing up to the service life can be known. By summing up the processing time of the sequence for each equipment / equipment, the equipment usage time per processing is totaled.

The total calculation of the process capability indices Cp and Cpk in the computer 100 is performed on the screen shown in FIG.
By designating a process name (for example, polishing) and equipment / equipment (for example, a CMP apparatus 553X), process capability indices Cp and Cpk are calculated for each parameter item set in the process and sequence. Period (for example, 2000
/ 08/01 to 2000/11/01), the processing result data 121 or the inspection result data 122 associated with each parameter of the process control model.
Alternatively, it is possible to search the device management data 123 and calculate the average μ and the standard deviation σ.

The use time, the number of use times, and the operation rate of the manufacturing device and the inspection device in the computer 100 are determined by the period (for example, 2000/08/01 to 2000/11/1/0).
By specifying 1), equipment / equipment (for example, measuring device XX)
XX, CMP apparatus 553X, pad 1, pad 2), processing result data 121, inspection result data 122, or device management data 1
It is calculated by retrieving and counting 23. Alternatively, it can be calculated by totaling the reference value of the processing time or the value calculated by the formula every time the processing is performed.

Next, a process in which the computer 100 simulates a process control model using the process control simulator 104 (S308) and corrects the process control model will be described. FIG. 13 shows a screen example 1301 of the process control model simulation. This screen 1301 is the sequence definition screen example 7 in FIG.
In step 01, a step (for example, polishing) of a sequence (for example, a CMP apparatus 553X for CMP) is selected and designated, and displayed by clicking a simulation button 7012d. By setting the parameter item name (for example, estimated polishing rate) and the number of trials (for example, 100) in the example of the process control model simulation screen, the parameter values (for example, the estimated polishing rate value) for the set number of trials of the set parameters are p-managed. It is displayed in the model of FIG.

To modify the setting contents of the parameter item name of the process control model, the user clicks a parameter reference source designation button 13012 arranged at the lower part of the process control model simulation screen example 1301 in FIG. FIG. 14 shows an example screen 1401 for specifying a parameter reference source.
Is shown. The contents of the parameter item names set on the simulation screen 1301 in FIG. 13 are the parameter item names (for example, the estimated polishing rate), the reference values (for example, 105), and the management value upper limit (UCL) (for example, 12) on the screen 1401 in FIG.
0), the lower limit (LCL) (for example, 97), and the calculation formula (for example, the above formula (1)). Further, various parameters used in the calculation formula are displayed in a list 14011. In this list 14011, the reference source of the values of the various parameters is set.

For example, if a simulation of the estimated polishing rate is performed, the parameters that are the variables of the calculation formula are the reference polishing rate, the model coefficient parameter w, the previous film thickness, the rear film thickness, and the polishing time. When the reference polishing rate and w refer to the reference value, and the previous film thickness, the rear film thickness, and the polishing time refer to the actual values from the database, the trend based on the actual data of the estimated polishing rate is observed. be able to. By comparing this with the actual polishing rate, the validity of the estimation by the formula for calculating the estimated polishing rate can be examined, and by changing the value of the model coefficient w, the value of the estimated polishing rate can be determined. It becomes possible to correct it.

[0087]

According to the present invention, a process control model is defined in consideration of the configuration of a manufacturing line or a shop and the configuration of a database in an online manufacturing system, and an equipment group control system or a facility group control system is defined based on the defined process control model. By providing the recipe to the start instruction system, there is an effect that a process control system in a production line or a shop can be quickly constructed.

Further, according to the present invention, the function of the process control model can be verified in advance by simulating the process control model based on the actual data when the process control model is defined.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing one embodiment of a process control system in a production line or a production shop according to the present invention.

FIG. 2 is a diagram showing a relationship between input and output of data with respect to a process control model according to the present invention.

FIG. 3 is a flowchart showing a processing flow for defining a process control model according to the present invention.

FIG. 4 shows each control sequence (observation sequence) shown in FIG.
6 is a flowchart showing a procedure for setting parameter items and values for each processing step in FIG.

FIG. 5 is a definition screen (designation screen) of a process control model type (machining type), a process type, and a process flow according to the present invention.
FIG.

FIG. 6 is a diagram showing a screen for designating each manufacturing facility and processing method according to the present invention.

FIG. 7 is a diagram showing a control sequence designation screen according to the present invention.

FIG. 8 is a diagram showing an example of a screen for designating a method of putting a product into a processing step in a control sequence according to the present invention.

FIG. 9 is a setting screen for setting each parameter item (for example, an input parameter item, an observation parameter item, and a model coefficient parameter item) for defining a parameter (calculating an output parameter item) in the control sequence according to the present invention; FIG.

FIG. 10 is a diagram showing a recipe parameter assignment screen (association setting screen for each parameter of a recipe and a process control model) according to the present invention.

FIG. 11 is a diagram showing a database parameter assignment screen (association setting screen for database data items and process control model parameters) according to the present invention.

FIG. 12 is a diagram showing a screen for evaluating a process control model according to the present invention.

FIG. 13 is a view showing a screen of a simulation of a process control model according to the present invention.

FIG. 14 is a diagram showing a parameter reference source setting screen at the time of simulation of the process control model according to the present invention.

[Explanation of symbols]

100: Computer, 101: Process control model definition program, 102: Recipe determination program, 103
... Process control model evaluation program, 104 ... Process control simulator, 105 ... Data totaling system, 1
06: Start instruction system, 107: Equipment group control system, 111: Parameter item database, 112: Parameter database, 113: Process control model management database, 114: Process control model database, 115: Process flow database, 116 ...
Reference database, 121 ... Processing result data, 122 ...
Inspection result data, 123: device management data, 131: stocker controller, 132: transport equipment controller,
133: production equipment controller, 134: inspection equipment controller, 135: processing unit controller, 136
Inspection unit controller 201 Process control model type or process observation model type 202 Input parameter 203 Output parameter 204 Observation parameter S301 Process control model (process observation model) type designation processing S302 Processing type Designation processing, S
303: process flow designating process, S304: manufacturing equipment and processing method designating process, S305: control sequence (observation sequence) designating process, S306: process of associating each parameter of the recipe with each parameter of the process control model, S307: process results Data item, inspection result data item, device management data item and process control model parameters are associated with each other, S308: process control model evaluation / simulation process, S401: loop for each sequence (repeated process), S411: each sequence Processing sequence setting (definition of each step of each sequence) processing, S412: loop (repetition processing) for each step of each sequence, S421: equipment of manufacturing equipment,
Lot and wafer input amount setting processing for each equipment, S422 ... Setting processing of input parameter items, output parameter items, observation parameter items, model coefficient parameter items, S42
3. Processing time, input parameter items, output parameter items, observation parameter items, reference values of model coefficient parameter items, management values, calculation formula setting processing, 501: process control model definition screen, 601: manufacturing equipment definition screen, 70
1 ... sequence definition screen, 801 ... input method designation screen,
901: Parameter definition screen, 1001: Recipe parameter allocation screen, 1101: Database parameter allocation screen, 1201: Process control model evaluation screen, 1301: Process control model simulation screen, 1401: Parameter reference source designation screen

 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Yoshio Iwata 5-2-1, Josuihonmachi, Kodaira-shi, Tokyo Within the Semiconductor Group, Hitachi, Ltd. (72) Inventor Rihiro Nakajima Gojokami-cho, Kodaira-shi, Tokyo No. 20-1 in Hitachi Semiconductor Group, Ltd. (72) Inventor Asuka Ogata 5-2-1, Kamimizuhonmachi, Kodaira-shi, Tokyo F-term in Hitachi Semiconductor Group, 3C100 AA05 AA43 BB12 BB13 BB14 CC02 EE06 5H004 GA30 GB01 GB10 GB20 HA06 KA80 KC28 KC32 KC39 LA16 LA18

Claims (18)

[Claims] 1. A first step for designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of designating each control sequence consisting of a use sequence and a use time of each production facility / equipment in a production line or a production shop used in each process in the flow; and a facility in the production line or the production shop. A method for defining a process control model, which comprises defining a process control model representing the content of process processing provided to each manufacturing facility by a group control system or a start instruction system. 2. A first step for designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. For each control sequence consisting of the use order and use time of each manufacturing facility / equipment in the manufacturing line or shop used in each process in the flow, each parameter of each control sequence was collected from the manufacturing line or shop. A second step of designating by associating with each parameter of an existing database, a process representing the content of a process provided to each manufacturing facility by the facility group control system or the start instruction system in the manufacturing line or the manufacturing shop. It is characterized by defining a control model How to define a process control model that. 3. A first step of designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of designating any one or more of a model / equipment of a manufacturing facility in a manufacturing line or a manufacturing shop used in each process in the flow, and a manufacturing method thereof, after being specified in the second step, A third step of designating each control sequence consisting of a use order and a use time of each of the manufacturing facilities / equipment used in each process in the process flow, and a facility group control system in the manufacturing line or the manufacturing shop or Process control model that represents the contents of process processing provided to each manufacturing facility by the start instruction system How to define a process control model, characterized by definition. 4. A first step of specifying a type of a process control model, a second step of specifying a type of a target workpiece, and a type of the process control model specified in the first step. A third step of designating a process flow representing each process and its processing procedure in accordance with the type of workpiece to be processed specified in the second step, and a process flow in the process flow designated in the third step. A fourth step of designating any one or more of a model / supply of a manufacturing facility in a manufacturing line or a manufacturing shop used in each process, and a method of manufacturing the same, after being specified in the first to fourth steps , Designating each control sequence including the use order and use time of each of the manufacturing facilities / equipment used in each process in the process flow. And a fifth step of defining a process control model representing a process performed by the equipment group control system or the start instruction system in the manufacturing line or the manufacturing shop to each manufacturing equipment. How to define the model. 5. A first step for designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of specifying each control sequence consisting of a use sequence and a use time of each manufacturing facility / equipment used in each process in the flow; and a parameter item in each control sequence specified in the second step; A third step of assigning recipe parameters by associating each parameter of a recipe that defines a process in each manufacturing facility; a parameter item in each control sequence specified in the second step; Database parameter assignment by associating with database items obtained based on the performance of process processing at the equipment And defining a process control model representing the content of process processing in each of the manufacturing facilities in a facility group control system or a start instruction system for a manufacturing line or a manufacturing shop. How to define the control model. 6. When a process control model is defined by the method for defining a process control model according to any one of claims 1 to 5, information on the defined process control model and process processing in each manufacturing facility. A step of evaluating a process control model using a database obtained based on the results of the process control model. 7. When a process control model is defined by the method for defining a process control model according to any one of claims 1 to 5, information on the defined process control model and process processing in each manufacturing facility. Process capability index, process time,
A method for defining a process control model, comprising evaluating a process control model by calculating an operation rate of a manufacturing facility or a life of equipment of the manufacturing facility. 8. A simulation is performed on a process control model defined by the method for defining a process control model according to claim 1 by calculating desired parameters in the process control model. A method for defining a process control model, comprising the step of modifying and redefining the process control model if the simulation result is not desirable. 9. A facility control system or a construction start instruction system set on the basis of a process control model defined by the process control model defining method according to claim 1. A process control method comprising operating each manufacturing facility according to a recipe. 10. A first step of designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of designating each control sequence consisting of a use sequence and a use time of each production facility / equipment in a production line or a production shop used in each process in the flow; and a facility in the production line or the production shop. A process control model definition program for defining, by using a computer, a process control model representing process processing contents provided to each manufacturing facility by a group control system or a start instruction system. 11. A first step for designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. For each control sequence consisting of the use order and use time of each manufacturing facility / equipment in the manufacturing line or shop used in each process in the flow, each parameter of each control sequence was collected from the manufacturing line or shop. A second step of specifying by associating with each parameter of an existing database, a process control representing a process processing content provided to each manufacturing facility by the facility group control system or the start instruction system in the manufacturing line or the manufacturing shop. Computer for model Process control model definition program in order to define have. 12. A first step of designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of designating any one or more of a model / equipment of a manufacturing facility in a manufacturing line or a manufacturing shop used in each process in the flow, and a manufacturing method thereof, after being specified in the second step, A third step of designating each control sequence consisting of a use order and a use time of each of the manufacturing facilities / equipment used in each process in the process flow, and a facility group control system in the manufacturing line or the manufacturing shop or Process control model that represents the contents of process processing provided to each manufacturing facility by the start instruction system The process control model definition program for defining using a computer. 13. A first step of specifying a type of a process control model, a second step of specifying a type of a target workpiece, and a type of the process control model specified in the first step. A third step of designating a process flow representing each process and its processing procedure in accordance with the type of workpiece to be processed specified in the second step, and a process flow in the process flow designated in the third step. A fourth step of designating any one or more of a model / supply of a manufacturing facility in a manufacturing line or a manufacturing shop used in each process, and a method of manufacturing the same, after being specified in the first to fourth steps Designate each control sequence including the use order and use time of each of the manufacturing facilities / equipment used in each process in the process flow. And using a computer to define a process control model representing process processing contents provided to each manufacturing facility by the facility group control system or the start instruction system in the manufacturing line or shop. Process control model definition program for 14. A first step for designating a process flow representing each process and its processing procedure in accordance with a type of a workpiece in a desired process control model type, and a process designated in the first step. A second step of specifying each control sequence consisting of a use sequence and a use time of each manufacturing facility / equipment used in each process in the flow; a parameter item in each control sequence specified in the second step; A third step of assigning recipe parameters by associating each parameter of a recipe that defines a process in each manufacturing facility; a parameter item in each control sequence specified in the second step; Parameter assignment by associating with database items obtained based on the performance of process And using a computer to define a process control model representing process processing contents at each of the manufacturing facilities in a facility group control system or a start instruction system for a manufacturing line or a manufacturing shop. Process control model definition program. 15. The process control model definition program according to claim 10, wherein, when the process control model is further defined, information on the defined process control model and information on each manufacturing facility are defined. A process control model definition program having a step of evaluating a process control model using a database obtained based on the results of process processing. 16. A process control model defining program according to claim 10, wherein, when defining a process control model, information on the defined process control model and a process process in each manufacturing facility. Process capability index using a database obtained based on the results of
A process control model definition program having a step of evaluating a process control model by calculating a process processing time, an operation rate of a manufacturing facility, or a life of equipment of the manufacturing facility. 17. The process control model definition program according to claim 10, wherein a simulation is performed on the defined process control model by calculating desired parameters in the process control model. A process control model definition program having a step of correcting and redefining the process control model if the simulation result is not desirable. 18. A result data collection unit for collecting a database obtained based on a result of process processing in each manufacturing facility in a manufacturing line or a manufacturing shop; and a configuration of the manufacturing line or the manufacturing shop and the result data collecting unit. A process control model defining unit that defines a process control model in consideration of the configuration of the collected database, and evaluates the production line or the shop based on the defined process control model; and a process control model definition unit. A process control system comprising: a facility group control system unit or a start instruction system unit that determines a recipe based on the evaluated process control model and operates each manufacturing facility in the manufacturing line or the manufacturing shop. .