JP2002321332A - 平版材料のオン−プレスコーテイングおよびオン−プレス処理 - Google Patents
平版材料のオン−プレスコーテイングおよびオン−プレス処理Info
- Publication number
- JP2002321332A JP2002321332A JP2002038363A JP2002038363A JP2002321332A JP 2002321332 A JP2002321332 A JP 2002321332A JP 2002038363 A JP2002038363 A JP 2002038363A JP 2002038363 A JP2002038363 A JP 2002038363A JP 2002321332 A JP2002321332 A JP 2002321332A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- image
- recording layer
- ink
- fluid ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
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- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01000018.0 | 2001-02-16 | ||
| EP01000018 | 2001-02-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002321332A true JP2002321332A (ja) | 2002-11-05 |
| JP2002321332A5 JP2002321332A5 (https=) | 2005-08-04 |
Family
ID=8176013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002038363A Pending JP2002321332A (ja) | 2001-02-16 | 2002-02-15 | 平版材料のオン−プレスコーテイングおよびオン−プレス処理 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2002321332A (https=) |
| DE (1) | DE60200058T2 (https=) |
-
2002
- 2002-01-10 DE DE2002600058 patent/DE60200058T2/de not_active Expired - Lifetime
- 2002-02-15 JP JP2002038363A patent/JP2002321332A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE60200058D1 (de) | 2003-11-20 |
| DE60200058T2 (de) | 2004-08-05 |
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