JP2002301412A - Method and apparatus for coating metalic substrate - Google Patents
Method and apparatus for coating metalic substrateInfo
- Publication number
- JP2002301412A JP2002301412A JP2001105797A JP2001105797A JP2002301412A JP 2002301412 A JP2002301412 A JP 2002301412A JP 2001105797 A JP2001105797 A JP 2001105797A JP 2001105797 A JP2001105797 A JP 2001105797A JP 2002301412 A JP2002301412 A JP 2002301412A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- corona discharge
- coating liquid
- base material
- discharge treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Coating Apparatus (AREA)
- Materials For Photolithography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は金属製基材の塗布方
法および塗布装置に関する。The present invention relates to a method and an apparatus for applying a metal substrate.
【0002】[0002]
【従来の技術】従来より金属製基材の塗布方法として、
図2(a)(b)に示すように、金属製基材Wに対して
溶剤噴射装置11から溶剤12を吹き付けて基材W上を
溶剤12で濡らし、その後過剰な溶剤12をローラ13
でしごく方法が知られている。ここで図2(a)は金属
製基材の塗布方法を示す概略図であり、図2(b)は図
2(a)のA部拡大図である。2. Description of the Related Art Conventionally, as a method of applying a metal base material,
As shown in FIGS. 2A and 2B, a solvent 12 is sprayed onto the metal base material W from a solvent spraying device 11 to wet the base material W with the solvent 12.
There is a known method. Here, FIG. 2A is a schematic view showing a method of applying a metal base material, and FIG. 2B is an enlarged view of a portion A in FIG. 2A.
【0003】溶剤12により表面が濡らされた金属製基
材Wは、その後塗布液2が収納されたディップ槽4内へ
進入し、案内ローラ4aを経て外方へ放出される。この
間、基材Wの表面に、溶剤12と塗布液2とが積層して
塗布される(図2(b))。[0003] The metal base material W whose surface is wet by the solvent 12 then enters the dip tank 4 containing the coating liquid 2 and is discharged outward through the guide rollers 4a. During this time, the solvent 12 and the coating liquid 2 are laminated and applied to the surface of the base material W (FIG. 2B).
【0004】あるいは図3に示すように、金属製基材W
を塗布液2が収納されたディップ槽4内へ送り込み、複
数の案内ローラ4aにより基材Wを塗布液2に対して数
回出入りさせ、この間基材W上に塗布液2を塗布する方
法もある。[0004] Alternatively, as shown in FIG.
Is fed into the dip tank 4 in which the coating liquid 2 is stored, and the substrate W is moved in and out of the coating liquid 2 several times by a plurality of guide rollers 4a. is there.
【0005】[0005]
【発明が解決しようとする課題】図2に示す塗布方法で
は、基材Wに予め溶剤12を塗布しておくため、基材W
と塗布液2との間に空気が巻き込まれることはない。し
かしながら基材Wと塗布液2との間に溶剤12を介在さ
せるため、溶剤12と塗布液2とからなる塗膜の膜厚方
向に濃度分布が生じ、基材Wからなる製品の精度が悪化
してしまう。In the coating method shown in FIG. 2, since the solvent W is previously applied to the substrate W, the substrate W
No air is trapped between the coating liquid 2 and the coating liquid 2. However, since the solvent 12 is interposed between the base material W and the coating liquid 2, a concentration distribution occurs in the thickness direction of the coating film composed of the solvent 12 and the coating liquid 2, and the accuracy of the product formed of the base material W deteriorates. Resulting in.
【0006】また図3に示す塗布方法では、ディップ槽
4内の塗布液2中へ基材Wを数回出入りさせるため、基
材Wと塗布液2との間に空気が巻き込まれることはない
が、案内ローラ4aを複数設ける必要があり、ディップ
槽4が大型化してしまう。またディップ槽4内の塗布液
2の劣化も予想される。In the coating method shown in FIG. 3, since the base material W moves in and out of the coating liquid 2 in the dipping tank 4 several times, no air is trapped between the base material W and the coating liquid 2. However, it is necessary to provide a plurality of guide rollers 4a, and the dip tank 4 becomes large. It is also expected that the coating solution 2 in the dip tank 4 will deteriorate.
【0007】本発明はこのような点を考慮してなされた
ものであり、基材と塗布液との間の空気の巻き込みを防
ぐことができ、かつ良好な塗膜を得ることができる金属
製基材の塗布方法および塗布装置を提供することを目的
とする。[0007] The present invention has been made in view of such a point, and it is possible to prevent the entrainment of air between the base material and the coating solution and to obtain a good metal coating film. An object of the present invention is to provide a method and an apparatus for applying a substrate.
【0008】[0008]
【課題を解決するための手段】本発明は、金属製基材の
表面にコロナ放電処理を施す工程と、コロナ放電処理さ
れた金属製基材を塗布液が収納されたディップ槽に浸し
て基材表面に塗布液を塗布する工程と、を備えたことを
特徴とする金属製基材の塗布方法である。SUMMARY OF THE INVENTION The present invention comprises a step of subjecting a surface of a metal substrate to a corona discharge treatment, and immersing the metal substrate subjected to the corona discharge treatment in a dip tank containing a coating liquid. And a step of applying a coating liquid to the surface of the material.
【0009】本発明は、基材表面にディップ槽に収納さ
れたレジスト液を塗布することを特徴とする、金属製基
材の塗布方法である。The present invention is a method for applying a metal substrate, which comprises applying a resist solution contained in a dipping tank to the surface of the substrate.
【0010】本発明は、金属製基材の表面にコロナ放電
処理を施すコロナ放電処理装置と、塗布液が収納され、
金属製基材を浸して基材の表面に塗布液を塗布するディ
ップ槽と、を備えたことを特徴とする金属製基材の塗布
装置である。According to the present invention, there is provided a corona discharge treatment apparatus for performing a corona discharge treatment on a surface of a metal substrate, wherein a coating liquid is stored,
A coating apparatus for a metal substrate, comprising: a dip tank for immersing a metal substrate and applying a coating solution to a surface of the substrate.
【0011】本発明によれば、金属製基材の表面にコロ
ナ放電処理を施すことにより基材表面の濡れ性を向上さ
せることができ、これによって基材表面に空気を巻き込
むことなく塗布液を確実に塗布することができる。According to the present invention, the surface of a metal substrate is subjected to a corona discharge treatment to improve the wettability of the substrate surface, whereby the coating liquid can be applied without entrapping air on the substrate surface. It can be applied reliably.
【0012】[0012]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態について説明する。図1は本発明による金属製
基材の塗布方法を示す概略図である。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic view showing a method for applying a metal substrate according to the present invention.
【0013】図1に示すように、金属製基材の塗布装置
10は金属製基材Wの表面にコロナ放電処理を施す一対
のコロナ放電処理装置8と、塗布液(例えばレジスト)
2が収納されるとともに基材Wを浸して基材Wの表面に
塗布液2を塗布するディップ槽4とを備えている。As shown in FIG. 1, a metal substrate coating device 10 includes a pair of corona discharge treatment devices 8 for performing a corona discharge treatment on the surface of a metal substrate W, and a coating liquid (eg, a resist).
And a dip tank 4 for immersing the substrate W and applying the coating liquid 2 to the surface of the substrate W.
【0014】各コロナ放電処理装置8は、電極5と、誘
電体ロール6とを有し、電極5と誘電体ロール6には、
電極5と誘電体ロール6との間に高電圧を印加する電源
7が接続されている。Each corona discharge treatment device 8 has an electrode 5 and a dielectric roll 6, and the electrode 5 and the dielectric roll 6
A power supply 7 for applying a high voltage is connected between the electrode 5 and the dielectric roll 6.
【0015】またディップ槽4内には、基材Wを案内す
る案内ローラ4aが配置されている。In the dip tank 4, a guide roller 4a for guiding the base material W is disposed.
【0016】次にこのような構成からなる本実施の形態
の作用について説明する。Next, the operation of the embodiment having the above-described configuration will be described.
【0017】図1に示すように、まず例えば鉄板のよう
な金属製基材Wが供給され、この基材Wは電極5と誘電
体ロール6からなる一対のコロナ放電処理装置8へ送ら
れる。As shown in FIG. 1, first, a metal base material W such as an iron plate is supplied, and the base material W is sent to a pair of corona discharge treatment devices 8 including electrodes 5 and dielectric rolls 6.
【0018】各コロナ放電処理装置8の電極5と誘電体
ロール6との間には、電源7により高電圧が印加され、
電極5と誘電体ロール6との間にコロナ放電が発生す
る。A high voltage is applied between the electrode 5 and the dielectric roll 6 of each corona discharge treatment device 8 by a power supply 7,
Corona discharge occurs between the electrode 5 and the dielectric roll 6.
【0019】電極5を誘電体ロール6との間に生じたコ
ロナ放電領域を基材Wが通過すると、基材W表面に付着
する油分等が除去されるとともに、基材Wの表面に電子
が衝突して基材Wの表面において分子レベルでの凹凸が
形成される。さらに基材Wの表面に電子が衝突する際の
衝突エネルギにより、基材Wの表面に分子結合が変化
し、このことにより基材Wの表面の親水基が生成され
る。When the substrate W passes through the corona discharge region generated between the electrode 5 and the dielectric roll 6, oil and the like adhering to the surface of the substrate W are removed, and electrons are deposited on the surface of the substrate W. As a result of the collision, irregularities at the molecular level are formed on the surface of the substrate W. Further, the molecular bond changes on the surface of the substrate W due to the collision energy when electrons collide with the surface of the substrate W, thereby generating a hydrophilic group on the surface of the substrate W.
【0020】基材Wは電極5と誘電体ロール6との間
で、上述のようなコロナ放電を受け、その結果として基
材Wの表面に濡れ性が向上する。The substrate W is subjected to the above-described corona discharge between the electrode 5 and the dielectric roll 6, and as a result, the wettability of the surface of the substrate W is improved.
【0021】次に基材Wがディップ槽4内へ送られ、案
内ローラ4aにより案内された後外方へ排出される。こ
の間、濡れ性が向上した基材Wの表面に、ディップ槽4
内に収納された塗布液2が塗布される。Next, the substrate W is fed into the dip tank 4, guided by the guide rollers 4a, and then discharged outward. During this time, a dipping tank 4 is placed on the surface of the substrate W having improved wettability.
The application liquid 2 stored in the inside is applied.
【0022】以上のように本実施の形態によれば、濡れ
性が向上した基材Wの表面に、空気を巻き込むことなく
塗布液2を確実に塗布することができる。As described above, according to the present embodiment, the coating liquid 2 can be reliably applied to the surface of the substrate W having improved wettability without involving air.
【0023】[0023]
【実施例】次に本発明の具体的実施例について説明す
る。EXAMPLES Next, specific examples of the present invention will be described.
【0024】本実施例では、以下の条件にて基材に対し
てコロナ放電処理を施し、その後基材の表面に塗布液を
塗布した。In this embodiment, the substrate was subjected to a corona discharge treatment under the following conditions, and then a coating solution was applied to the surface of the substrate.
【0025】 (2)塗布結果 上述した塗布条件により基材に塗布液を塗布した場合、
コロナ放電を行うことで基材の表面に濡れ性が向上し
た。この結果として、基材表面に空気が巻き込まれるこ
となく塗布液を確実に塗布することができた。また基材
上の塗布液の表面は均一となった。[0025] (2) Application result When the application liquid is applied to the base material under the application conditions described above,
By performing the corona discharge, the wettability on the surface of the substrate was improved. As a result, it was possible to reliably apply the coating liquid without air being caught in the surface of the base material. Further, the surface of the coating liquid on the substrate became uniform.
【0026】(3)濡れ性の判定 上述した塗布条件により基材に対してコロナ放電処理を
施して塗布液を塗布した。この際、基材と塗布液との間
の接触角を測定して基材の濡れ性を判定した。(3) Judgment of wettability Under a coating condition described above, the substrate was subjected to a corona discharge treatment to apply a coating solution. At this time, the contact angle between the substrate and the coating solution was measured to determine the wettability of the substrate.
【0027】その結果、コロナ放電処理前の基材と塗布
液との接触角は70.3°であるのに対し、コロナ放電
処理後の基材と塗布液との接触角は46.9°となっ
た。As a result, the contact angle between the substrate and the coating solution before the corona discharge treatment was 70.3 °, whereas the contact angle between the substrate and the coating solution after the corona discharge treatment was 46.9 °. It became.
【0028】この結果、コロナ放電処理による基材の濡
れ性向上が確認された。As a result, it was confirmed that the wettability of the substrate was improved by the corona discharge treatment.
【0029】[0029]
【発明の効果】以上のように本発明によれば、基材表面
に空気を巻き込むことなく、塗布液を確実に塗布するこ
とができる。このため塗布液の膜厚を均一に保つことが
できる。As described above, according to the present invention, the coating liquid can be applied reliably without entraining air on the surface of the substrate. Therefore, the thickness of the coating solution can be kept uniform.
【図1】本発明による金属製基材の塗布方法および塗布
装置を示す図。FIG. 1 is a diagram showing a method and an apparatus for applying a metal substrate according to the present invention.
【図2】従来の金属製基材の塗布方法を示す図。FIG. 2 is a view showing a conventional method of applying a metal substrate.
【図3】従来の金属製基材の塗布方法を示す図。FIG. 3 is a view showing a conventional method of applying a metal base material.
2 塗布液 4 ディップ槽 5 電極 6 誘電体ロール 7 電源 8 コロナ放電処理装置 10 塗布装置 W 基材 2 Coating liquid 4 Dip tank 5 Electrode 6 Dielectric roll 7 Power supply 8 Corona discharge treatment device 10 Coating device W Base material
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) B05D 7/24 301 B05D 7/24 301R G03F 7/16 501 G03F 7/16 501 (72)発明者 相 澤 栄 次 東京都新宿区市谷加賀町一丁目1番1号 大日本印刷株式会社内 Fターム(参考) 2H025 AA18 DA18 EA01 EA04 4D075 AB03 AB32 BB49X CA35 CA47 DA04 DB02 EA19 4F040 AA24 AB04 AC02 BA42 DB09 DB10 4F042 AA22 CA01 DA05 ED05 Continued on the front page (51) Int.Cl. 7 Identification FI FI Theme Court II (Reference) B05D 7/24 301 B05D 7/24 301R G03F 7/16 501 G03F 7/16 501 (72) Inventor Eiji Aizawa Tokyo 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo F-term (reference) in Dai Nippon Printing Co., Ltd. 2H025 AA18 DA18 EA01 EA04 4D075 AB03 AB32 BB49X CA35 CA47 DA04 DB02 EA19 4F040 AA24 AB04 AC02 BA42 DB09 DB10 4F042 AA22 CA01 DA05 ED05
Claims (3)
工程と、 コロナ放電処理された金属製基材を塗布液が収納された
ディップ槽に浸して基材表面に塗布液を塗布する工程
と、 を備えたことを特徴とする金属製基材の塗布方法。1. A step of applying a corona discharge treatment to the surface of a metal base material, and dipping the metal base material subjected to the corona discharge treatment into a dip tank containing a coating liquid to apply the coating liquid to the surface of the base material. A method for applying a metal substrate, comprising:
ト液を塗布することを特徴とする、金属製基材の塗布方
法。2. A method for applying a metal substrate, comprising applying a resist solution contained in a dipping tank to the surface of the substrate.
コロナ放電処理装置と、 塗布液が収納され、金属製基材を浸して基材の表面に塗
布液を塗布するディップ槽と、 を備えたことを特徴とする金属製基材の塗布装置。3. A corona discharge treatment device for performing a corona discharge treatment on a surface of a metal base material, a dip tank containing a coating liquid, dipping the metal base material and applying the coating liquid to the surface of the base material, A coating device for a metal substrate, comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2001105797A JP2002301412A (en) | 2001-04-04 | 2001-04-04 | Method and apparatus for coating metalic substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001105797A JP2002301412A (en) | 2001-04-04 | 2001-04-04 | Method and apparatus for coating metalic substrate |
Publications (1)
Publication Number | Publication Date |
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JP2002301412A true JP2002301412A (en) | 2002-10-15 |
Family
ID=18958419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2001105797A Withdrawn JP2002301412A (en) | 2001-04-04 | 2001-04-04 | Method and apparatus for coating metalic substrate |
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Country | Link |
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JP (1) | JP2002301412A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105727872A (en) * | 2016-04-19 | 2016-07-06 | 长葛市汇达感光材料有限公司 | Defoaming offset printing plate material oxidation tank |
-
2001
- 2001-04-04 JP JP2001105797A patent/JP2002301412A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105727872A (en) * | 2016-04-19 | 2016-07-06 | 长葛市汇达感光材料有限公司 | Defoaming offset printing plate material oxidation tank |
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