JP2002299324A5 - - Google Patents

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Publication number
JP2002299324A5
JP2002299324A5 JP2001105442A JP2001105442A JP2002299324A5 JP 2002299324 A5 JP2002299324 A5 JP 2002299324A5 JP 2001105442 A JP2001105442 A JP 2001105442A JP 2001105442 A JP2001105442 A JP 2001105442A JP 2002299324 A5 JP2002299324 A5 JP 2002299324A5
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JP
Japan
Prior art keywords
substrate
plasma processing
antenna
vacuum
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001105442A
Other languages
English (en)
Japanese (ja)
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JP2002299324A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001105442A priority Critical patent/JP2002299324A/ja
Priority claimed from JP2001105442A external-priority patent/JP2002299324A/ja
Priority to US09/968,810 priority patent/US20020038791A1/en
Priority to US10/207,183 priority patent/US6830653B2/en
Publication of JP2002299324A publication Critical patent/JP2002299324A/ja
Priority to US10/983,670 priority patent/US7406925B2/en
Publication of JP2002299324A5 publication Critical patent/JP2002299324A5/ja
Pending legal-status Critical Current

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JP2001105442A 2000-10-03 2001-04-04 プラズマ処理方法及び装置 Pending JP2002299324A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001105442A JP2002299324A (ja) 2001-04-04 2001-04-04 プラズマ処理方法及び装置
US09/968,810 US20020038791A1 (en) 2000-10-03 2001-10-03 Plasma processing method and apparatus
US10/207,183 US6830653B2 (en) 2000-10-03 2002-07-30 Plasma processing method and apparatus
US10/983,670 US7406925B2 (en) 2000-10-03 2004-11-09 Plasma processing method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001105442A JP2002299324A (ja) 2001-04-04 2001-04-04 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JP2002299324A JP2002299324A (ja) 2002-10-11
JP2002299324A5 true JP2002299324A5 (cg-RX-API-DMAC10.html) 2005-09-02

Family

ID=18958137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001105442A Pending JP2002299324A (ja) 2000-10-03 2001-04-04 プラズマ処理方法及び装置

Country Status (1)

Country Link
JP (1) JP2002299324A (cg-RX-API-DMAC10.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6548484B2 (ja) * 2015-07-01 2019-07-24 東京エレクトロン株式会社 プラズマ処理装置およびそれに用いる排気構造

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