JP2002294497A - Continuous plating equipment with device for collecting and concentrating rinse water for plating - Google Patents
Continuous plating equipment with device for collecting and concentrating rinse water for platingInfo
- Publication number
- JP2002294497A JP2002294497A JP2001094523A JP2001094523A JP2002294497A JP 2002294497 A JP2002294497 A JP 2002294497A JP 2001094523 A JP2001094523 A JP 2001094523A JP 2001094523 A JP2001094523 A JP 2001094523A JP 2002294497 A JP2002294497 A JP 2002294497A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tank
- washing water
- exchange membrane
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electroplating Methods And Accessories (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電気機器用接合部
品であるコネクタなどの各種端子、ICリードフレーム
などのリード材などに用いられる長尺の金属条に金、ニ
ッケル、錫、はんだ等のめっきを施すためのめっき装置
であって、めっきした材料にめっき液が付着し、めっき
槽から外へ持ち出されためっき液を回収濃縮機構により
回収リサイクルする連続めっき装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a long metal strip used for various terminals such as a connector which is a connecting part for electric equipment and a lead material for an IC lead frame and the like, which is made of gold, nickel, tin, solder or the like. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous plating apparatus for performing plating, in which a plating solution adheres to a plated material and a plating solution taken out of a plating tank is collected and recycled by a collecting and concentrating mechanism.
【0002】[0002]
【従来の技術】従来、電気機器用接合部品であるコネク
タなどの各種端子やICリードフレームなどのリード材
などに用いられる長尺金属条の連続めっき装置におい
て、めっきした材料に付着し、めっき槽から外へ持ちだ
されためっき液は、回収され、再利用される場合もある
が、大半は、めっき材料を洗浄する洗浄水により、金属
イオン濃度を環境基準以下まで希釈し、排水として流さ
れていた。めっき液を再利用する方法としては、めっき
洗浄水をそのままめっき槽に戻す方法や、めっき洗浄水
を蒸発・濃縮させ、めっき液として、めっき槽内に戻す
方法、キレート樹脂やイオン交換樹脂により不純物金属
イオンを除去し、除去しためっき洗浄水をアノード液と
して、イオン交換膜を介する隔膜電解槽で電解し、金属
が溶解しためっき液として、めっき槽に循環する方法が
ある。また、めっき成分の回収技術としては、キレート
樹脂による吸着回収技術、イオン交換樹脂による吸着回
収技術があった。しかし、めっき液をそのままめっき槽
に戻す方法は、めっき液の操業温度が十分に高く、液量
の自然蒸発の十分見込める系で有効であり、操業温度が
低い系では、めっき槽の液量がオーバーする。 まため
っき液を加熱濃縮して再利用する方法は、加熱蒸発させ
る系が別に必要となり、ラインコストが増加し、効率的
な方法ではない。2. Description of the Related Art Conventionally, in a continuous plating apparatus for a long metal strip used for various terminals such as connectors, which are joint parts for electric equipment, and lead materials for IC lead frames, etc., it adheres to a plated material and forms a plating tank. The plating solution taken out of the plant may be collected and reused, but in most cases, the metal ion concentration is diluted to below environmental standards with washing water that cleans the plating material, and is then discharged as wastewater. I was The plating solution can be reused by returning the plating washing water to the plating tank as it is, by evaporating and concentrating the plating washing water and returning it to the plating tank as a plating solution, or by using a chelating resin or ion exchange resin to remove impurities. There is a method in which metal ions are removed, the removed plating washing water is used as an anolyte, and electrolysis is performed in a diaphragm electrolytic cell via an ion exchange membrane, and the resulting solution is circulated to the plating tank as a plating solution in which metal is dissolved. Further, as a technique for recovering plating components, there are an adsorption and recovery technique using a chelate resin and an adsorption and recovery technique using an ion exchange resin. However, the method of returning the plating solution to the plating bath as it is is effective in a system where the operating temperature of the plating solution is sufficiently high and natural evaporation of the solution volume can be sufficiently expected. Over. In addition, the method of heating and concentrating and reusing the plating solution requires a separate system for heating and evaporating, increasing the line cost, and is not an efficient method.
【0003】キレート樹脂やイオン交換樹脂を用いてめ
っき液を循環する技術は、キレート樹脂やイオン交換樹
脂の短期的な樹脂の交換作業を必要とするため、めっき
装置の通板速度を速くした長期連続運転には適した技術
ではない。 また強酸のめっき液の場合、隔膜は劣化
し、その交換頻度が多く効率が悪かった。そして、めっ
き槽外へ持ち出されためっき液は、大量の洗浄水により
希釈されているため、めっき金属イオンの濃度が低く、
回収装置を設置しても、回収効率が悪く、設備上のメリ
ットがなく、めっきを含む洗浄水の回収、再利用は殆ど
行われてなかった。一方、めっき効率を向上させるた
め、ライン速度を速くし、長期間連続運転する場合、め
っき液中に含有され、流出する金属イオン量は多くな
り、薬品原料コストが高騰する主要因となり、めっき液
を効率よく回収、再利用する技術が待ち望まれていた。The technique of circulating a plating solution by using a chelate resin or an ion exchange resin requires a short-term resin exchange operation of the chelate resin or the ion exchange resin, and therefore requires a long-term increase in the plating machine passing speed. It is not a suitable technology for continuous operation. Also, in the case of a plating solution of a strong acid, the membrane deteriorated, and the replacement frequency was large, and the efficiency was poor. And since the plating solution taken out of the plating tank is diluted by a large amount of washing water, the concentration of plating metal ions is low,
Even if a recovery device is installed, recovery efficiency is poor, there is no merit in equipment, and recovery and reuse of cleaning water including plating has hardly been performed. On the other hand, when the line speed is increased to improve plating efficiency and continuous operation is performed for a long period of time, the amount of metal ions contained in the plating solution and flowing out increases, which is a main factor in soaring the cost of chemical raw materials. There has been a long-awaited need for a technology for efficiently collecting and reusing wastewater.
【0004】[0004]
【発明が解決しようとする課題】こうした状況から、短
期的な保守・点検作業を必要としなく、めっき装置の通
板速度向上や長期連続運転に適し、かつ、大掛かりな設
備を必要とせず、手間のかからない設備により、めっき
洗浄水の回収濃縮を行う技術が待ち望まれている。Under these circumstances, short-term maintenance / inspection work is not required, the plating speed of the plating apparatus is improved, and long-term continuous operation is suitable, and large-scale equipment is not required. There is a long-awaited need for a technique for recovering and concentrating plating cleaning water using a facility that does not require any effort.
【0005】[0005]
【課題を解決するための手段】本発明者は上記課題対
し、鋭意検討し、めっき槽から外へ持ちだされためっき
洗浄水を、カチオン交換膜とアニオン交換膜を介する電
気透析槽で回収し、当該槽内で電気透析処理によりめっ
き洗浄水を回収濃縮し、新たなめっき液として供給する
ことを特徴とするめっき洗浄水の回収濃縮機構を備えた
連続めっき装置を開発した。すなわち本発明は、 (1)連続めっき装置であって、めっき液の付着した材
料を洗浄した後の、めっき液を含有した洗浄水をカチオ
ン交換膜とアニオン交換膜を介する電気透析槽にて電気
透析することによりめっき金属イオンを濃縮し、新たな
めっき液としてめっき槽に供給することを特徴とする、
めっき洗浄水の回収濃縮機構を備えた連続めっき装置。 (2)電気透析槽が、アニオン交換膜とカチオン交換膜
が交互に並べられて、隔室を形成していることを特徴と
する(1)に記載のめっき洗浄水の回収濃縮機構を備え
た連続めっき装置。 (3)電気透析槽のカチオン交換膜がナトリウム基及び
アニオン交換膜が塩素基を配合した炭化水素系有機膜
で、該交換膜の補強材として、ポリプロピレンを用いた
ことを特徴とする(1)乃至(2)に記載のめっき洗浄
水の回収濃縮機構を備えた連続めっき装置。 (4)電気透析層にて、脱塩しためっき洗浄水を洗浄槽
の洗浄水として使うことを特徴とする(1)乃至(3)
に記載のめっき洗浄水の回収濃縮機構を備えた連続めっ
き装置。 (5)めっき槽の後の洗浄槽にて、二流体ノズルにより
純水と気体のミスト状混合物をめっきした材料に噴霧
し、めっき洗浄水の高濃度化することを特徴とする
(1)乃至(4)に記載のめっき洗浄水の回収濃縮機構
を備えた連続めっき装置。である。Means for Solving the Problems The present inventors have diligently studied the above-mentioned problems, and collect plating washing water taken out of the plating tank in an electrodialysis tank via a cation exchange membrane and an anion exchange membrane. A continuous plating apparatus equipped with a plating and washing water collecting and concentrating mechanism characterized by collecting and concentrating plating washing water in the tank by electrodialysis treatment and supplying it as a new plating solution has been developed. That is, the present invention provides: (1) a continuous plating apparatus, in which washing water containing a plating solution after washing a material to which a plating solution is adhered is passed through an electrodialysis tank via a cation exchange membrane and an anion exchange membrane. It is characterized in that plating metal ions are concentrated by dialysis and supplied to the plating tank as a new plating solution.
Continuous plating equipment with a plating water recovery and concentration mechanism. (2) The electrodialysis tank is provided with a mechanism for collecting and concentrating plating washing water according to (1), wherein an anion exchange membrane and a cation exchange membrane are alternately arranged to form a compartment. Continuous plating equipment. (3) The cation exchange membrane of the electrodialysis tank is a hydrocarbon organic membrane containing a sodium group and an anion exchange membrane containing chlorine groups, and polypropylene is used as a reinforcing material for the exchange membrane. A continuous plating apparatus provided with a mechanism for collecting and concentrating plating cleaning water according to any one of (1) to (2). (4) In the electrodialysis layer, the desalted plating washing water is used as washing water for the washing tank (1) to (3).
4. A continuous plating apparatus provided with a collecting and concentrating mechanism for plating washing water according to 1. (5) In a washing tank after the plating tank, a mist-like mixture of pure water and gas is sprayed onto the plated material by a two-fluid nozzle to increase the concentration of plating washing water. (4) A continuous plating apparatus provided with a mechanism for collecting and concentrating plating cleaning water according to (4). It is.
【0006】この装置により、定期的な保守でイオン交
換膜を管理することができ、めっき装置の通板速度の向
上や長期連続運転に対応でき、小規模な電気透析槽のみ
でめっき洗浄水の回収濃縮を行うことができる。 また
強酸のめっき液にも耐久性のあるイオン交換膜を用い、
どんなめっき液に対しても電気透析による回収濃縮が行
えるようになる。[0006] With this apparatus, the ion exchange membrane can be managed by periodic maintenance, the plating speed of the plating apparatus can be increased, and long-term continuous operation can be supported. Recovery and concentration can be performed. Also, a durable ion exchange membrane is used for the strong acid plating solution,
Recovery and concentration by electrodialysis can be performed on any plating solution.
【0007】[0007]
【発明の実施の形態】以下に本発明の実施の形態を説明
する。図1は本発明のめっき装置の該略図である。 め
っき槽から出た材料は、めっき液が付着している。 材
料に付着しためっき液は、洗浄槽にて洗浄液により洗浄
され、めっき液を含有した洗浄後の洗浄液は電気透析槽
にて処理され、めっき金属イオンが濃縮された濃縮液
と、脱塩し、金属イオン濃度が低くなった脱塩液に分け
られ、濃縮液はストレージタンクに溜められ、めっき液
として再利用される。 また、脱塩液は洗浄液として再
利用される。そして、請求項1、2の発明は、めっき液
の含有した洗浄水をカチオン交換膜とアニオン交換膜を
介する電気透析槽にて電気透析することによりめっき金
属イオンを濃縮し、新たなめっき液としてめっき槽に供
給することを特徴とする。Embodiments of the present invention will be described below. FIG. 1 is a schematic view of the plating apparatus of the present invention. The plating solution adheres to the material that has come out of the plating tank. The plating solution attached to the material is washed with a washing solution in a washing tank, and the washing solution containing the plating solution after the washing is treated in an electrodialysis tank, and is desalted with a concentrated solution in which plating metal ions are concentrated, The concentrate is divided into a desalinated solution having a low metal ion concentration, and the concentrated solution is stored in a storage tank and reused as a plating solution. Further, the desalted solution is reused as a washing solution. The inventions of claims 1 and 2 concentrate the plating metal ions by electrodialyzing the washing water containing the plating solution in an electrodialysis tank via a cation exchange membrane and an anion exchange membrane, and as a new plating solution. It is characterized in that it is supplied to a plating tank.
【0008】図3を基に説明すると、イオン交換膜の1
種であるアニオン交換膜24は有機酸イオンを透過し、
めっき廃液中の金属イオンに対しては高いイオンブロッ
ク率を有する。 一方カチオン交換膜23は上記アニオ
ン交換膜とは対称的にめっき液中の金属イオンを透過
し、有機酸イオンに対しては高いイオンブロック率を有
する。電気透析槽はアニオン交換膜とカチオン交換膜が
交互に並べてあり、カチオン膜を隔てて陽極側の室液と
して、25にはめっきした材料に付着しためっき液を含
有する洗浄水を入れる。 一方、カチオン膜を隔てて陰
極側の室液として、26にはイオン交換膜を介して濃縮
した濃縮液を入れる。 これらイオン交換膜と室液を多
段に組み合わせ、通電するとイオン交換膜を各種イオン
が選択的に透過する。 カチオン交換膜を透過しなかっ
た金属イオンを含有する液は、次の室液として利用し、
めっき洗浄水中の多くの金属イオンを回収濃縮する。
一方、濃縮液も、次の室液に廻し、更なるめっき液の濃
縮回収を行う。本電気透析システムにより、めっき洗浄
水の再利用機構を備えためっき装置となる。 また電気
透析処理を終えたほぼ純水に近いめっき洗浄水は、請求
項4に記載のように、洗浄水として再利用し、いっそう
のクローズドシステムにする。Referring to FIG. 3, one of the ion exchange membranes will be described.
The seed anion exchange membrane 24 is permeable to organic acid ions,
It has a high ion block rate for metal ions in the plating waste liquid. On the other hand, the cation exchange membrane 23 transmits metal ions in the plating solution symmetrically to the anion exchange membrane, and has a high ion block rate with respect to organic acid ions. In the electrodialysis tank, anion exchange membranes and cation exchange membranes are alternately arranged, and a washing liquid containing a plating solution adhered to the plated material is put in 25 as room fluid on the anode side across the cation membrane. On the other hand, a concentrated liquid concentrated via an ion-exchange membrane is put into 26 as a chamber liquid on the cathode side across the cation membrane. When these ion exchange membranes and chamber liquids are combined in multiple stages, and when electricity is supplied, various ions selectively pass through the ion exchange membrane. The solution containing metal ions that did not pass through the cation exchange membrane is used as the next chamber solution,
Collect and concentrate many metal ions in plating wash water.
On the other hand, the concentrated solution is also transferred to the next chamber solution to further concentrate and recover the plating solution. The electrodialysis system provides a plating apparatus having a mechanism for reusing plating washing water. Further, the plating cleaning water, which is substantially pure water after the electrodialysis treatment, is reused as the cleaning water as described in claim 4 to form a more closed system.
【0009】請求項3の発明は、電気透析槽のカチオン
交換膜がナトリウム基及びアニオン交換膜が塩素基を配
合した炭化水素系有機膜で、該交換膜の補強材として、
ポリプロピレン(以下PPという)を用いたことを特徴
とする。 イオン交換膜補強材として一般的に用いられ
るポリ塩化ビニル(PVC)は、強酸のめっき液には耐
久性が悪く、長期の安定した操業には適していない。
しかし、PPは耐酸性があり、補強剤として使用する
と、強酸のめっき液にも適用が可能である。 また炭化
水素系の有機膜を使用したのは、他にフッ素系のイオン
交換膜があるが、フッ素系膜は非常に耐久性が優れてい
るが、膜のコストが炭化水素系と比較すると約20倍か
かるため、安価な炭化水素系有機膜の膜を選定した。According to a third aspect of the present invention, the cation exchange membrane of the electrodialysis tank is a hydrocarbon-based organic membrane containing a sodium group and the anion exchange membrane contains a chlorine group.
It is characterized by using polypropylene (hereinafter referred to as PP). Polyvinyl chloride (PVC), which is generally used as an ion exchange membrane reinforcing material, has poor durability with a strong acid plating solution and is not suitable for long-term stable operation.
However, PP has acid resistance, and when used as a reinforcing agent, can be applied to a plating solution of a strong acid. Another reason for using a hydrocarbon-based organic membrane is that there is another fluorine-based ion-exchange membrane.The fluorine-based membrane is very excellent in durability, but the cost of the membrane is about Since it takes 20 times, an inexpensive hydrocarbon organic film was selected.
【0010】請求項5の発明は、めっき槽の後の洗浄槽
にて、二流体ノズルにより純水と気体のミスト状混合物
をめっきした材料に噴霧することを特徴とし、該混合物
をめっきした材料に噴霧することにより、洗浄効率を向
上させ、洗浄後の洗浄水中のめっき金属イオンの濃度を
高め、効率的にめっき金属イオンを回収し、洗浄水を再
利用できるようにする。 図2は二流体ノズルを使用し
た洗浄槽の該略図であるが、二流体ノズルを使用する場
合、水と気体(空気等)の混合比は1:0.5〜1:2
であり、圧力0.1kg/cm2以上にて噴霧すること
が好ましい噴霧条件である。以上、これら電気透析シス
テムと二流体ノズルを用いた洗浄槽を設けることによ
り、めっき廃液濃度を効果的に高められ、めっき廃液の
再利用が可能な設備となる。[0010] The invention of claim 5 is characterized in that a mist-like mixture of pure water and gas is sprayed on the plated material by a two-fluid nozzle in a washing tank after the plating tank, and the mixture is plated. By spraying, the cleaning efficiency is improved, the concentration of plating metal ions in the cleaning water after cleaning is increased, the plating metal ions are efficiently collected, and the cleaning water can be reused. FIG. 2 is a schematic view of a cleaning tank using a two-fluid nozzle. When a two-fluid nozzle is used, the mixing ratio of water and gas (such as air) is 1: 0.5 to 1: 2.
It is preferable to spray at a pressure of 0.1 kg / cm 2 or more. As described above, by providing the electrodialysis system and the washing tank using the two-fluid nozzle, the concentration of the plating waste liquid can be effectively increased, and the plating waste liquid can be reused.
【0011】[0011]
【実施例】以下に本発明の最良は実施形態を、錫めっき
について、具体例をもって説明する。めっき素材に付着
しためっき液の付着量は1mL/dm2であり、錫めっ
き条件ら算出しためっき液の持ち出し量は6.3L/h
rであり、めっき素材に付着しためっき廃液中の錫は約
360g/hr排出される。 めっき後の素材の洗浄は
従来700mL/minで行っており、めっき洗浄水中
の錫濃度は0.5〜3g/Lになっていた。 即ち7〜
40%の錫が洗浄水中に回収され、残りの錫を含有する
付着液は後工程に持ち出された。本発明ではこの洗浄に
二流体ノズルを用いることにより、1/10の量である
70mL/minの洗浄水量で、同等の洗浄が可能で、
二流体ノズルを使用しためっき洗浄水中の錫濃度を5〜
30g/Lにすることができ、高効率な洗浄が行えた。
この二流体ノズルにて洗浄した後の洗浄水を洗浄水槽、
濃縮槽各室50室からなる電気透析システムの洗浄液と
して用い、極室液として有機酸溶液を用いて透析処理行
うと、透析約20時間後にはめっき槽と同じ錫濃度であ
る60g/Lまで濃縮することができた。 また洗浄液
は10mg/L以下まで脱塩することが可能となり、透
析後の洗浄液は純水に近い状態となり、約95%以上の
錫を回収濃縮することができた。透析後の濃縮液はスト
レージタンクへ循環し、再びめっき液として使用した。
一方脱塩液は二流体ノズルの洗浄水として再利用した。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The best mode for carrying out the present invention will be described below with reference to tin plating. The amount of the plating solution adhered to the plating material was 1 mL / dm 2 , and the carried-out amount of the plating solution calculated from the tin plating conditions was 6.3 L / h.
r, and about 360 g / hr of tin in the plating waste liquid adhering to the plating material is discharged. Conventionally, cleaning of the material after plating has been performed at 700 mL / min, and the tin concentration in the plating cleaning water has been 0.5 to 3 g / L. That is, 7 ~
Forty percent of the tin was recovered in the wash water, and the remaining tin-containing deposit was taken to a subsequent step. In the present invention, by using a two-fluid nozzle for this cleaning, equivalent cleaning is possible with a cleaning water amount of 70 mL / min, which is 1/10 of the amount.
Tin concentration in plating wash water using a two-fluid nozzle
It was 30 g / L, and highly efficient washing was performed.
Wash water after washing with this two-fluid nozzle, washing water tank,
When used as a washing solution of an electrodialysis system consisting of 50 chambers in each of the concentration tanks and dialysis using an organic acid solution as an electrode solution, after about 20 hours of dialysis, it is concentrated to the same tin concentration of 60 g / L as the plating tank We were able to. Further, the washing solution can be desalted to 10 mg / L or less, and the washing solution after dialysis is in a state close to pure water, and about 95% or more of tin can be recovered and concentrated. The concentrated solution after dialysis was circulated to a storage tank and used again as a plating solution.
On the other hand, the desalted liquid was reused as washing water for the two-fluid nozzle.
【0012】[0012]
【発明の効果】電気透析槽を設置し、イオン交換膜の補
強剤として、ポリプロピレン(PP)を使用し、更にめ
っき液の洗浄の際、二流体ノズルを使用することによ
り、強酸のめっき液にも適用でき、めっき液の効率的な
回収・濃縮が可能となった。According to the present invention, an electrodialysis tank is installed, polypropylene (PP) is used as a reinforcing agent for the ion-exchange membrane, and a two-fluid nozzle is used for cleaning the plating solution. Can also be applied, and efficient recovery and concentration of the plating solution has become possible.
【図1】本発明の連続めっき装置概略図FIG. 1 is a schematic diagram of a continuous plating apparatus of the present invention.
【図2】洗浄槽概略図[Figure 2] Schematic diagram of cleaning tank
【図3】電気透析システム内概略図FIG. 3 is a schematic diagram of an electrodialysis system.
【符号の説明】 1.めっき槽 2.めっき素材洗浄槽 3.電気透析槽 4.ストレージタンク 5.洗浄水 6.濃縮液 7.脱塩液 8.めっき素材 11.二流体ノズル 12.液切りロール 13.めっき素材 14.エアの流れ 15.洗浄水の流れ 21.陽極 22.陰極 23.カチオン交換膜 24.アニオン交換膜 25.洗浄水槽 26.濃縮水槽 27.極室[Explanation of Codes] Plating tank 2. 2. Plating material washing tank Electrodialysis tank 4. Storage tank 5. Wash water 6. Concentrate 7. Desalting solution 8. Plating material 11. Two-fluid nozzle 12. Drainer roll 13. Plating material 14. Air flow 15. Wash water flow 21. Anode 22. Cathode 23. Cation exchange membrane 24. Anion exchange membrane 25. Washing water tank 26. Concentrated water tank 27. Pole room
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C02F 1/469 C23G 3/00 A C23G 3/00 B C25D 5/48 C25D 5/48 7/00 H 7/00 21/18 B 21/18 H01L 23/50 D H01L 23/50 C02F 1/46 103 Fターム(参考) 4D006 GA17 MA13 MA14 MC73 MC77 PA02 PB08 PB27 PC22 4D061 DA08 DB13 EA09 EB13 EB19 FA09 4K024 AA07 BB10 BB13 BC01 CB26 DB10 GA16 4K053 PA12 QA06 RA07 SA04 XA22 YA13 YA15 5F067 DC01 DC05 Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C02F 1/469 C23G 3/00 A C23G 3/00 B C25D 5/48 C25D 5/48 7/00 H 7/00 21 / 18 B 21/18 H01L 23/50 D H01L 23/50 C02F 1/46 103 F term (reference) 4D006 GA17 MA13 MA14 MC73 MC77 PA02 PB08 PB27 PC22 4D061 DA08 DB13 EA09 EB13 EB19 FA09 4K024 AA07 BB10 BB13 BC16 CB26 DB10 GA10 4K053 PA12 QA06 RA07 SA04 XA22 YA13 YA15 5F067 DC01 DC05
Claims (5)
した材料を洗浄した後の、めっき液を含有した洗浄水を
カチオン交換膜とアニオン交換膜を介する電気透析槽に
て電気透析することによりめっき金属イオンを濃縮し、
新たなめっき液としてめっき槽に供給することを特徴と
する、めっき洗浄水の回収濃縮機構を備えた連続めっき
装置。In a continuous plating apparatus, washing water containing a plating solution after washing a material to which a plating solution is attached is electrodialyzed in an electrodialysis tank via a cation exchange membrane and an anion exchange membrane. To concentrate the plating metal ions,
A continuous plating apparatus equipped with a mechanism for collecting and concentrating plating washing water, which is supplied to a plating tank as a new plating solution.
交換膜が交互に並べられて、隔室を形成していることを
特徴とする請求項1に記載のめっき洗浄水の回収濃縮機
構を備えた連続めっき装置。2. The mechanism for collecting and concentrating plating washing water according to claim 1, wherein the electrodialysis tank has a compartment formed by alternately arranging anion exchange membranes and cation exchange membranes. Equipped continuous plating equipment.
基及びアニオン交換膜が塩素基を配合した炭化水素系有
機膜で、該交換膜の補強材として、ポリプロピレンを用
いたことを特徴とする請求項1又は2に記載のめっき洗
浄水の回収濃縮機構を備えた連続めっき装置。3. The cation exchange membrane of the electrodialysis tank is a hydrocarbon-based organic membrane containing a sodium group and an anion exchange membrane containing a chlorine group, and polypropylene is used as a reinforcing material of the exchange membrane. Item 3. A continuous plating apparatus provided with a collecting and concentrating mechanism for plating washing water according to Item 1 or 2.
洗浄槽の洗浄水として使うことを特徴とする請求項1乃
至3に記載のめっき洗浄水の回収濃縮機構を備えた連続
めっき装置。4. The continuous plating method according to claim 1, wherein the desalted plating washing water is used as washing water in the washing tank in the electrodialysis tank. apparatus.
により純水と気体のミスト状混合物をめっきした材料に
噴霧し、めっき洗浄水の高濃度化することを特徴とする
請求項1乃至4に記載のめっき洗浄水の回収濃縮機構を
備えた連続めっき装置。5. A plating tank, wherein a mist-like mixture of pure water and gas is sprayed onto the plated material by a two-fluid nozzle in a washing tank after the plating tank, thereby increasing the concentration of plating washing water. 5. A continuous plating apparatus comprising the plating and washing water recovery and concentration mechanism according to any one of 1 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001094523A JP2002294497A (en) | 2001-03-29 | 2001-03-29 | Continuous plating equipment with device for collecting and concentrating rinse water for plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001094523A JP2002294497A (en) | 2001-03-29 | 2001-03-29 | Continuous plating equipment with device for collecting and concentrating rinse water for plating |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002294497A true JP2002294497A (en) | 2002-10-09 |
Family
ID=18948702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001094523A Pending JP2002294497A (en) | 2001-03-29 | 2001-03-29 | Continuous plating equipment with device for collecting and concentrating rinse water for plating |
Country Status (1)
Country | Link |
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JP (1) | JP2002294497A (en) |
-
2001
- 2001-03-29 JP JP2001094523A patent/JP2002294497A/en active Pending
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