JP2002275112A - Binaphthol compound and method for producing the same - Google Patents
Binaphthol compound and method for producing the sameInfo
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- JP2002275112A JP2002275112A JP2001072627A JP2001072627A JP2002275112A JP 2002275112 A JP2002275112 A JP 2002275112A JP 2001072627 A JP2001072627 A JP 2001072627A JP 2001072627 A JP2001072627 A JP 2001072627A JP 2002275112 A JP2002275112 A JP 2002275112A
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、不斉合成触媒の配
位子として有用な新規なビナフトール化合物及びその製
造法に関する。TECHNICAL FIELD The present invention relates to a novel binaphthol compound useful as a ligand of an asymmetric synthesis catalyst and a method for producing the same.
【0002】[0002]
【従来の技術】本発明化合物に類似の化合物を配位子と
して有するキラルジルコニウム触媒としては、例えば、
特開平11−33407号公報、特開平11−2538
13号公報に、このものが不斉イミノアルドール反応、
不斉シアノ化反応等に有用である旨が記載されている。
また、本発明化合物に類似のビナフトール化合物の製造
法が、Tetrahedron Lett.,40,2
161−2164(1999)、Tetrahedro
n Lett.,39,7917−7920(199
8)に報告されている。BACKGROUND ART Chiral zirconium catalysts having a compound similar to the compound of the present invention as a ligand include, for example,
JP-A-11-33407, JP-A-11-2538
No. 13, the asymmetric imino aldol reaction,
It is described that it is useful for asymmetric cyanation reaction and the like.
Further, a method for producing a binaphthol compound similar to the compound of the present invention is described in Tetrahedron Lett. , 40 , 2
161-2164 (1999), Tetrahedro
n Lett. , 39 , 7917-7920 (199).
8).
【0003】[0003]
【発明が解決しようとする課題】本発明は工業的に有利
に合成でき、不斉合成触媒の配位子として有用な新規化
合物及びその製造法を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a novel compound which can be synthesized industrially advantageously and which is useful as a ligand of an asymmetric synthesis catalyst, and a process for producing the same.
【0004】[0004]
【課題を解決するための手段】本発明は第1に、一般式
[I]SUMMARY OF THE INVENTION The present invention firstly provides a compound of the general formula
[I]
【0005】[0005]
【化5】 Embedded image
【0006】(式中、R1、R2はそれぞれ独立して、
水素原子、ハロゲン原子又はC1〜C 3ハロアルキル基
を表し、R3、R4はそれぞれ独立して、水素原子、C
1〜C 3アルキル基、C1〜C3アルコキシ基又は置換
されてもよいベンジルオキシ基を表し、R5、R6、R
7、R8はそれぞれ独立して、水素原子、ハロゲン原
子、C1〜C6アルキル基又はアリール基を表す。ま
た、R5とR6は一緒になって飽和若しくは不飽和結合
を有する炭素環を形成してもよい。)で表されるビナフ
トール化合物を提供する。また、本発明は第2に、一般
式[II](Where R1, R2Are each independently
Hydrogen atom, halogen atom or C1~ C 3Haloalkyl group
And R3, R4Is independently a hydrogen atom, C
1~ C 3Alkyl group, C1~ C3Alkoxy group or substitution
Represents a benzyloxy group which may be5, R6, R
7, R8Are each independently a hydrogen atom, a halogen atom
Child, C1~ C6Represents an alkyl group or an aryl group. Ma
R5And R6Are saturated or unsaturated bonds together
May be formed. Binaf represented by)
A toll compound is provided. In addition, the present invention secondly provides a general
Formula [II]
【0007】[0007]
【化6】 Embedded image
【0008】(式中、R1、R2は前記と同じ意味を表
し、Lは水酸基の保護基を表す。)で表される化合物
と、一般式[III](Wherein R 1 and R 2 have the same meanings as described above, and L represents a hydroxyl-protecting group), and a compound represented by the general formula [III]
【0009】[0009]
【化7】 Embedded image
【0010】(R5、R6、R7及びR8は前記と同じ
意味を表し、L’は水酸基の保護基を表す。)で表され
る化合物とを反応させることを特徴とする一般式[IV]Wherein R 5 , R 6 , R 7 and R 8 have the same meanings as described above, and L ′ represents a hydroxyl-protecting group. [IV]
【0011】[0011]
【化8】 Embedded image
【0012】(式中、R1、R2、R5、R6、R7、
R8、L及びL’は、前記と同じ意味を表す。)で表わ
されるビナフトール化合物の製造法を提供する。(Wherein R 1 , R 2 , R 5 , R 6 , R 7 ,
R 8 , L and L ′ represent the same meaning as described above. The present invention provides a method for producing a binaphthol compound represented by the formula:
【0013】[0013]
【発明の実施の形態】前記一般式[I]において、
R1、R2、R5、R6、R7、R8は、不斉触媒の配
位子として用いたとき、不斉触媒としての機能を阻害し
ないものであれば特に限定されるものではない。その好
ましい具体例としては、R1及びR2としては、それぞ
れ独立して、水素原子;フッ素、臭素、塩素、ヨウ素等
のハロゲン原子;トリフルオロメチル、ペンタフルオロ
エチル基等のC1〜C3ハロアルキル基;が挙げられ
る。R3及びR4としては、それぞれ独立して、水素原
子;メチル、エチル、プロピル、イソプロピル基等のC
1〜C3アルキル基;メトキシ、エトキシ、n−プロポ
キシ、イソプロポキシ基等のC1〜C3アルコキシ基;
又は置換されてもよいベンジルオキシ基;等が挙げられ
る。ベンジルオキシ基の置換基としては、例えば、フッ
素、塩素、臭素等のハロゲン原子;メチル、エチル基等
のC1〜C6のアルキル基;メトキシ、エトキシ、n−
プロピル、イソプロピル基等のC1〜C6のアルコキシ
基;ニトロ基;等が挙げられる。また、ベンゾイルオキ
シ基は、同一又は相異なる複数の置換基を有していても
よい。BEST MODE FOR CARRYING OUT THE INVENTION In the general formula [I],
R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are not particularly limited as long as they do not inhibit the function as an asymmetric catalyst when used as ligands of the asymmetric catalyst. Absent. As preferred specific examples thereof, R 1 and R 2 each independently represent a hydrogen atom; a halogen atom such as fluorine, bromine, chlorine and iodine; and C 1 to C 3 such as a trifluoromethyl and pentafluoroethyl group. A haloalkyl group; R 3 and R 4 each independently represent a hydrogen atom; C such as methyl, ethyl, propyl, isopropyl, etc.
1 -C 3 alkyl group; methoxy, ethoxy, n- propoxy, C 1 -C 3 alkoxy groups such as an isopropoxy group;
Or a benzyloxy group which may be substituted; Examples of the substituent of the benzyloxy group include a halogen atom such as fluorine, chlorine, and bromine; a C 1 to C 6 alkyl group such as a methyl and ethyl group; methoxy, ethoxy, n-
A C 1 -C 6 alkoxy group such as a propyl and isopropyl group; a nitro group; and the like. Further, the benzoyloxy group may have a plurality of the same or different substituents.
【0014】R5、R6、R7及びR8はとしては、そ
れぞれ独立して、水素原子;フッ素、臭素、塩素、ヨウ
素等のハロゲン原子;メチル、エチル、プロピル、イソ
プロピル、n−ブチル、ターシャリブチル、n−ヘキシ
ル基等のC1〜C6のアルキル基;フェニル基、ナフチ
ル基等のアリール基;等が挙げられる。また、R5とR
6は一緒になって、−CH2−CH2−CH2−CH2
−、又は−CH=CH−CH=CH−等で表される炭素
数5〜8(芳香環の炭素原子を含む)の炭素環を形成し
てもよい。R 5 , R 6 , R 7 and R 8 are each independently a hydrogen atom; a halogen atom such as fluorine, bromine, chlorine and iodine; methyl, ethyl, propyl, isopropyl, n-butyl, And C 1 -C 6 alkyl groups such as tertiary butyl and n-hexyl groups; and aryl groups such as phenyl and naphthyl groups. Also, R 5 and R
6 together, -CH 2 -CH 2 -CH 2 -CH 2
A carbon ring having 5 to 8 carbon atoms (including carbon atoms of an aromatic ring) represented by-or -CH = CH-CH = CH- or the like may be formed.
【0015】一般式[I]で表される本発明化合物は、下
記反応式に示すように、R3及びR 4の表す基によって
適宜反応方法を選択して製造することができる。 1)製造法1:R3及びR4が水素原子である化合物の
製造The compound of the present invention represented by the general formula [I] is as follows:
As shown in the above reaction formula, R3And R 4Depending on the group represented by
It can be produced by appropriately selecting a reaction method. 1) Production method 1: R3And R4Is a hydrogen atom
Manufacture
【0016】[0016]
【化9】 Embedded image
【0017】(式中、R1、R2、R5、R6、R7及
びR8は前記と同じ意味を表し、L、L’は水酸基の脱
離基を表す。水酸基の保護基としては、メトキシメチ
ル、2−(2−エトキシ)エチル基等のアルコキシアル
キル基;テトラヒドロフラニル基、テトラヒドロピラニ
ル基等の含酸素ヘテロ環基;トリチル基;トリメチルシ
リル基、t−ブチルジメチルシリル基等のシリル基;等
が挙げられる。)(Wherein, R 1 , R 2 , R 5 , R 6 , R 7 and R 8 have the same meanings as described above, and L and L ′ each represent a leaving group for a hydroxyl group. Is an alkoxyalkyl group such as methoxymethyl or 2- (2-ethoxy) ethyl group; an oxygen-containing heterocyclic group such as tetrahydrofuranyl group or tetrahydropyranyl group; a trityl group; a trimethylsilyl group or a t-butyldimethylsilyl group. A silyl group; and the like.)
【0018】一般式[I]で表される化合物のうち、R3
及びR4が水素原子である化合物[I−1]は、化合物
[II]と化合物[III]とを、有機溶媒中、塩基の存在
下に、−100℃〜50℃で1時間〜数十時間反応させ
ることによって式[VI]で表される化合物を得た後、加水
分解を行って保護基を脱離させ、その後還元することに
より製造することができる。Among the compounds represented by the general formula [I], R 3
And compound [I-1] wherein R 4 is a hydrogen atom, can be obtained by reacting compound [II] and compound [III] in an organic solvent in the presence of a base at −100 ° C. to 50 ° C. for 1 hour to several tens of hours. The compound represented by the formula [VI] can be obtained by reacting for a period of time, followed by hydrolysis to remove the protecting group, followed by reduction.
【0019】この反応に用いられる有機溶媒としては、
反応に不活性な溶媒であれば特に制限はないが、例え
ば、ジエチルエーテル、テトラヒドロフラン(THF)
等のエーテル系溶媒;n−ペンタン、n−ヘキサン、シ
クロヘキサン等の炭化水素系溶媒;ベンゼン、トルエ
ン、キシレン等の芳香族炭化水素系溶媒;N,N−ジメ
チルホルムアミド(DMF)、N,N−ジメチルアセタ
ミド等のアミド系溶媒;等を用いることができる。The organic solvents used in this reaction include:
There is no particular limitation as long as the solvent is inert to the reaction. For example, diethyl ether, tetrahydrofuran (THF)
Ether solvents such as n-pentane, n-hexane and cyclohexane; aromatic hydrocarbon solvents such as benzene, toluene and xylene; N, N-dimethylformamide (DMF), N, N- Amide solvents such as dimethylacetamide; and the like.
【0020】また、塩基としては、メチルリチウム、エ
チルリチウム、n−ブチルリチウム、sec−ブチルリ
チウム、t−ブチルリチウム、リチウムジイソプロピル
アミド、リチウムヘキサメチルジシラジドの等有機リチ
ウム等を用いることができる。As the base, organic lithium such as methyllithium, ethyllithium, n-butyllithium, sec-butyllithium, t-butyllithium, lithium diisopropylamide and lithium hexamethyldisilazide can be used. .
【0021】保護基を脱離させる加水分解反応は、アル
コール系溶媒、エーテル系溶媒、炭化水素系溶媒、ハロ
ゲン系溶媒等の有機溶媒中、塩酸、硫酸、硝酸等の鉱酸
と0℃〜室温で反応させることにより行なわれる。アル
コール系溶媒としては、例えば、メタノール、エタノー
ル、プロピルアルコール等が挙げられる。エーテル系溶
媒としては、例えば、ジエチルエーテル、THF、1,
2−ジメトキシエタン等が挙げられる。炭化水素系溶媒
としては、例えば、n−ヘキサン、シクロヘキサン、ベ
ンゼン、トルエン等が挙げられる。ハロゲン系溶媒とし
ては、例えば、ジクロロメタン、クロロホルム、四塩化
炭素等が挙げられる。、The hydrolysis reaction for removing the protecting group is carried out by using a mineral acid such as hydrochloric acid, sulfuric acid or nitric acid in an organic solvent such as an alcohol-based solvent, an ether-based solvent, a hydrocarbon-based solvent or a halogen-based solvent at 0 ° C. to room temperature. The reaction is performed by Examples of the alcohol-based solvent include methanol, ethanol, propyl alcohol and the like. Examples of the ether solvent include diethyl ether, THF, 1,
2-dimethoxyethane and the like. Examples of the hydrocarbon solvent include n-hexane, cyclohexane, benzene, toluene and the like. Examples of the halogen-based solvent include dichloromethane, chloroform, carbon tetrachloride and the like. ,
【0022】還元反応は、トリフルオロ酢酸等の溶媒
中、還元剤としてリチウムアルミニウムヒドリド、水素
化ホウ素ナトリウム、ボラン等の還元剤を用いて、0℃
〜室温で行うことができる。The reduction reaction is carried out at 0 ° C. in a solvent such as trifluoroacetic acid using a reducing agent such as lithium aluminum hydride, sodium borohydride or borane as a reducing agent.
To room temperature.
【0023】2)製造法2:R3及びR4がC1〜C3
アルコキシ基又は置換されてもよいベンジルオキシ基で
ある化合物の製造2) Production method 2: R 3 and R 4 are C 1 -C 3
Preparation of a compound that is an alkoxy group or an optionally substituted benzyloxy group
【0024】[0024]
【化10】 Embedded image
【0025】一般式[I]で表される化合物のうち、R
3及びR4がC1〜C3アルコキシ基又は置換されても
よいベンジルオキシ基である化合物([I-3]、[I-
4])は、前記で得られた一般式[IV]で表される化合
物を、有機溶媒中、塩基の存在下にアルキルハライド、
べンジルハライド等の式R9−X(R9はC1〜C3ア
ルコキシ基又は置換されてもよいベンジルオキシ基を表
し、Xはハロゲン原子を表す。)で表される化合物と反
応させた後、加水分解して保護基を脱離させることによ
り製造することができる。Among the compounds represented by the general formula [I], R
Compounds in which 3 and R 4 are a C 1 -C 3 alkoxy group or an optionally substituted benzyloxy group ([I-3], [I-
4]) converts the compound represented by the general formula [IV] obtained above into an alkyl halide in an organic solvent in the presence of a base,
After reacting with a compound represented by the formula R 9 -X (R 9 represents a C 1 -C 3 alkoxy group or an optionally substituted benzyloxy group, and X represents a halogen atom) such as benzyl halide. , By hydrolysis to remove the protecting group.
【0026】この反応に用いられる溶媒としては、n−
ペンタン、n−ヘキサン、n−ヘプタン、シクロヘキサ
ン等の脂肪族炭化水素系溶媒;ベンゼン、トルエン、キ
シレン、ジクロロベンゼン等の芳香族炭化水素系溶媒;
ジエチルエーテル、THF、1,2−ジメトキシエタ
ン、ジオキサン等のエーテル系溶媒;DMF、N,N−
ジメチルアセタミド等のアミド系溶媒;ジメチルスルホ
キシド(DMSO)、アセトニトリル等が挙げられる。The solvent used in this reaction is n-
Aliphatic hydrocarbon solvents such as pentane, n-hexane, n-heptane and cyclohexane; aromatic hydrocarbon solvents such as benzene, toluene, xylene, dichlorobenzene;
Ether solvents such as diethyl ether, THF, 1,2-dimethoxyethane and dioxane; DMF, N, N-
Amide solvents such as dimethylacetamide; dimethylsulfoxide (DMSO), acetonitrile and the like.
【0027】塩基としては、トリエチルアミン、ジイソ
プロピルエチルアミン、ピペリジン、ピリジン、トルイ
ジン、ピコリン等の有機塩基;水酸化ナトリウム、水酸
化カリウム等のアルカリ金属水酸化物;水酸化マグネシ
ウム、水酸化カルシウム等のアルカリ土類金属水酸化
物;炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭
酸塩、炭酸マグネシウム、炭酸カルシウム等のアルカリ
土類金属炭酸塩;等を用いることができる。Examples of the base include organic bases such as triethylamine, diisopropylethylamine, piperidine, pyridine, toluidine and picoline; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; alkaline earth metals such as magnesium hydroxide and calcium hydroxide. Alkali metal carbonates such as sodium carbonate and potassium carbonate; alkaline earth metal carbonates such as magnesium carbonate and calcium carbonate; and the like.
【0028】反応終了後は、通常の精製手段により目的
物を得ることができる。本発明化合物の構造は、NMR
スペクトル、IRスペクトル、MSスペクトル及び元素
分析(EA)等で決定することができる。After completion of the reaction, the desired product can be obtained by ordinary purification means. The structure of the compound of the present invention is represented by NMR
It can be determined by spectrum, IR spectrum, MS spectrum, elemental analysis (EA) and the like.
【0029】本発明化合物は、不斉触媒の配位子として
有用である。例えば特開平11−33407号公報記載
の方法に従って、ジルコニウムを活性中心原子として不
斉ジルコニウム触媒としてもよいし、その他の金属化合
物の配位子として用いて不斉合成触媒を得ることができ
る。The compounds of the present invention are useful as ligands for asymmetric catalysts. For example, according to the method described in JP-A-11-33407, zirconium may be used as an asymmetric zirconium catalyst as an active center atom, or an asymmetric synthesis catalyst may be obtained by using it as a ligand of another metal compound.
【0030】[0030]
【実施例】次に実施例を挙げ、本発明化合物を更に詳細
に説明する。 実施例1 (R)−3−(2’’−ヒドロキシ−3’’−イソプロ
ピルフェニル)メチル−1,1’−ビ−2−ナフトール
(化合物番号5)の製造The compounds of the present invention are described in more detail with reference to the following examples. Example 1 Production of (R) -3- (2 ″ -hydroxy-3 ″ -isopropylphenyl) methyl-1,1′-bi-2-naphthol (Compound No. 5)
【0031】[0031]
【化11】 Embedded image
【0032】(式中、MOMはメトキシメチル基を表
す) (R)−2,2’−ビス(メトキシメチルオキシ)−
1,1’−ビナフタレン(8.92mmol)のジエチ
ルエーテル(150 ml)溶液に、1.56Mヘキサ
ン溶液のn−ブチルリチウム(10.8mmol)と
N,N,N’,N’−テトラメチルエチレンジアミン
(TMEDA,10.9mmol)の混合物を室温で加
え、1時間攪拌した。この溶液を−78℃に冷却し、2
−(メトキシメチルオキシ)−3−イソプロピルベンズ
アルデヒド(5.09mmol)のジエチルエーテル
(15 ml)溶液を滴下した。更にこの混合物を−7
8℃から徐々に室温まで昇温しながら終夜で攪拌した。
その後飽和塩化アンモニウム水溶液(120 ml)を
加え、有機層を分離した後、ジエチルエーテル(100
ml)で2度抽出した。全ての有機層を合わせ、無水硫
酸ナトリウムで乾燥した後、ろ過し、ろ液を減圧濃縮し
た。得られた粗生成物をシリカゲルカラムクロマトグラ
フィーにより精製し、化合物[I]を収率58%で得
た。(Wherein MOM represents a methoxymethyl group) (R) -2,2'-bis (methoxymethyloxy)-
In a solution of 1,1′-binaphthalene (8.92 mmol) in diethyl ether (150 ml), 1.56 M hexane solution of n-butyllithium (10.8 mmol) and N, N, N ′, N′-tetramethylethylenediamine (TMEDA, 10.9 mmol) was added at room temperature and stirred for 1 hour. The solution was cooled to -78 ° C and
A solution of-(methoxymethyloxy) -3-isopropylbenzaldehyde (5.09 mmol) in diethyl ether (15 ml) was added dropwise. Further, the mixture was added to -7
The mixture was stirred overnight while gradually warming from 8 ° C. to room temperature.
Thereafter, a saturated aqueous ammonium chloride solution (120 ml) was added, and the organic layer was separated.
ml) twice. All organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure. The obtained crude product was purified by silica gel column chromatography to obtain compound [I] at a yield of 58%.
【0033】化合物[I](2.74mmol)のジク
ロロメタン(3ml)溶液を0℃に冷却し、そこに飽和
HCl/メタノール(2ml)を加えた。この混合物を
2時間攪拌し、飽和炭酸水素ナトリウム水溶液(20m
l)を加えた。これをジクロロメタン(20ml)で3
度抽出し、有機層を無水硫酸ナトリウムで乾燥後、ろ
過、ろ液を減圧濃縮した。得られた粗生成物[II]をジ
クロロメタン(10ml)に溶解させた。そこへ、水素
化ホウ素ナトリウム(27.5mmol)を加え、0℃
に冷却し、この懸濁液にトリフルオロ酢酸(TFA,1
0ml)のジクロロメタン(10ml)溶液をゆっくり
滴下し、室温まで徐々に昇温しながら一晩攪拌した。そ
の後再び0℃に冷却し、飽和炭酸水素ナトリウム水溶液
(40ml)を加え、ジクロロメタン(20ml)で3
度抽出した。全ての有機層を合わせ、無水硫酸ナトリウ
ムで乾燥した後、ろ過し、ろ液を減圧濃縮することによ
り粗生成物を得た。これをシリカゲルカラムクロマトグ
ラフィー及び再結晶により精製し、標記化合物を収率5
5%(2工程)で得た。A solution of compound [I] (2.74 mmol) in dichloromethane (3 ml) was cooled to 0 ° C., and saturated HCl / methanol (2 ml) was added thereto. The mixture was stirred for 2 hours, and saturated aqueous sodium hydrogen carbonate solution (20 m
l) was added. This is diluted with dichloromethane (20 ml)
After extraction, the organic layer was dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure. The obtained crude product [II] was dissolved in dichloromethane (10 ml). Thereto, sodium borohydride (27.5 mmol) was added, and 0 ° C.
And the suspension was added to trifluoroacetic acid (TFA, 1
(0 ml) in dichloromethane (10 ml) was slowly added dropwise, and the mixture was stirred overnight while gradually warming to room temperature. Thereafter, the mixture was cooled again to 0 ° C., a saturated aqueous sodium hydrogen carbonate solution (40 ml) was added, and the mixture was added with dichloromethane (20 ml).
Extracted. All organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure to obtain a crude product. This was purified by silica gel column chromatography and recrystallization to give the title compound in a yield of 5%.
5% (two steps).
【0034】ベンズアルデヒドの代わりにケトンを用い
れば、R3、R4がアルキル基である化合物が同様に合
成できる。When a ketone is used in place of benzaldehyde, a compound in which R 3 and R 4 are alkyl groups can be synthesized in the same manner.
【0035】実施例2 3−(S)−[1−(2−ヒドロキシ−3−イソプロピ
ルフェニル)−1−メトキシメチル]−(R)−1,
1’−ビ−2−ナフトール(化合物番号13,14)の
製造Example 2 3- (S)-[1- (2-hydroxy-3-isopropylphenyl) -1-methoxymethyl]-(R) -1,
Production of 1'-bi-2-naphthol (Compound Nos. 13, 14)
【0036】[0036]
【化12】 Embedded image
【0037】化合物[I](0.956mmol)のD
MF(10ml)溶液を0℃に冷却し、水素化ナトリウ
ム(3.3mmol)を加え、室温で30分攪拌した。
この溶液を再び0℃に冷却し、ヨウ化メチル(10.7
mmol)を滴下した。更に同温で1.5時間攪拌した
後、飽和塩化アンモニウム水溶液(40ml)を加え、
ジエチルエーテル(40ml)で3度抽出した。有機層
を全て合わせ、水及び飽和食塩水で洗浄し、無水硫酸ナ
トリウムで乾燥後、ろ過し、ろ液を減圧濃縮し、化合物
[III]の粗生成物を得た。この粗生成物をジクロロメ
タン(14ml)に溶解させ、0℃に冷却した。そこ
へ、飽和HCl/メタノール(4ml)を滴下して2.
5時間同温で攪拌した。反応混合物に飽和炭酸水素ナト
リウム水溶液(30ml)を加え、ジクロロメタン(3
0ml)で3度抽出した。全ての有機層を合わせ、無水
硫酸ナトリウムで乾燥した後、ろ過し、ろ液を減圧濃縮
して粗生成物を得た。これをシリカゲルカラムクロマト
グラフィーで精製することにより、各ジアステレオマー
を合わせて収率75%(2工程)で得た。上記実施例を
含め本発明化合物の代表例を第1表に示す。また、物性
データを第2表に示す。表中の略号は、次の意味を表
す。 Me:メチル、Et:エチル、Ph:フェニル、t−B
u:ターシャリブチル、i−Pr:イソプロピル、B
n:ベンジルCompound D of compound [I] (0.956 mmol)
The MF (10 ml) solution was cooled to 0 ° C., sodium hydride (3.3 mmol) was added, and the mixture was stirred at room temperature for 30 minutes.
The solution was cooled again to 0 ° C and methyl iodide (10.7
mmol) was added dropwise. After further stirring at the same temperature for 1.5 hours, a saturated aqueous ammonium chloride solution (40 ml) was added.
Extracted three times with diethyl ether (40 ml). All the organic layers were combined, washed with water and saturated saline, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure to obtain a crude product of compound [III]. This crude product was dissolved in dichloromethane (14ml) and cooled to 0 ° C. Thereto, saturated HCl / methanol (4 ml) was added dropwise.
The mixture was stirred at the same temperature for 5 hours. A saturated aqueous sodium hydrogen carbonate solution (30 ml) was added to the reaction mixture, and dichloromethane (3
0 ml). All organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure to obtain a crude product. This was purified by silica gel column chromatography to obtain a diastereomer in a combined yield of 75% (two steps). Table 1 shows typical examples of the compounds of the present invention including the above Examples. Table 2 shows physical property data. The abbreviations in the table represent the following meanings. Me: methyl, Et: ethyl, Ph: phenyl, tB
u: tert-butyl, i-Pr: isopropyl, B
n: benzyl
【0038】[0038]
【表1】 [Table 1]
【0039】[0039]
【表2】 [Table 2]
【0040】[0040]
【表3】 [Table 3]
【0041】[0041]
【発明の効果】本発明化合物を不斉合成触媒の配位子と
して用いて、不斉合成を行なった例を以下に示す。 (参考例1)The following is an example of performing asymmetric synthesis using the compound of the present invention as a ligand of an asymmetric synthesis catalyst. (Reference Example 1)
【0042】[0042]
【化13】 Embedded image
【0043】Zr(Ot−Bu)4(0.0454mm
ol)、配位子として実施例1で得られた化合物(Li
gand,0.0681mmol)及びN−メチルイミ
ダゾール(NMI,0.135mmol)をトルエン
(1ml)中で室温下混合し、1時間攪拌することで触
媒を調製した。その後、この溶液を−20℃に冷却し、
イミン(VII,0.454mmol)のトルエン溶液
(0.5ml)及びケテンシリルアセタール(VIII,
0.564mmol)のトルエン溶液(0.5ml)を
加え、同温で20時間反応させた。反応混合物に飽和炭
酸水素ナトリウム水溶液(15ml)を注ぎ、ジクロロ
メタン(15ml)で3度抽出した。全ての有機層を合
わせ、無水硫酸ナトリウムで乾燥した後、ろ過し、ろ液
を減圧濃縮した。得られた残渣を氷浴で冷却し、そこへ
1N−HCl/THF=1/20溶液10mlを加え、
0℃で1.5時間反応させた。反応混合物に飽和炭酸水
素ナトリウム水溶液(15ml)を注ぎ、ジクロロメタ
ン(15ml)で3度抽出した。全ての有機層を合わ
せ、無水硫酸ナトリウムで乾燥した後、ろ過し、ろ液を
減圧濃縮して得られた残渣をシリカゲルカラムクロマト
グラフィーにより精製し、生成物128.7mg(収率
95%)を得た。また、生成物のエナンチオ過剰率を液
体クロマトグラフィー(Daicel;Chiralc
el AD,n−ヘキサン/2−プロパノール=9/
1)より分析したところ、94%ee(S)であった。 (参考例2)Zr (Ot-Bu) 4 (0.0454 mm
ol), the compound obtained in Example 1 as a ligand (Li
gand, 0.0681 mmol) and N-methylimidazole (NMI, 0.135 mmol) were mixed in toluene (1 ml) at room temperature and stirred for 1 hour to prepare a catalyst. Thereafter, the solution was cooled to -20 ° C,
A solution of imine (VII, 0.454 mmol) in toluene (0.5 ml) and ketene silyl acetal (VIII,
0.564 mmol) of a toluene solution (0.5 ml) was added and reacted at the same temperature for 20 hours. A saturated aqueous sodium hydrogen carbonate solution (15 ml) was poured into the reaction mixture, and the mixture was extracted three times with dichloromethane (15 ml). All organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was cooled in an ice bath, and thereto was added 10 ml of a 1N-HCl / THF = 1/20 solution,
The reaction was performed at 0 ° C. for 1.5 hours. A saturated aqueous sodium hydrogen carbonate solution (15 ml) was poured into the reaction mixture, and the mixture was extracted three times with dichloromethane (15 ml). All the organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain 128.7 mg (yield: 95%) of a product. Obtained. The enantiomeric excess of the product was determined by liquid chromatography (Daicel; Chiralc).
el AD, n-hexane / 2-propanol = 9 /
As a result of analysis from 1), it was 94% ee (S). (Reference Example 2)
【0044】[0044]
【化14】 Embedded image
【0045】Zr(Ot−Bu)4(0.0422mm
ol)、実施例1で得られた化合物配位子(Ligan
d,0.0845mmol)及びN−メチルイミダゾー
ル(NMI,0.128mmol)をベンゼン(1m
l)中で室温下混合し、1時間攪拌することで触媒を調
製した。この触媒の溶液にイミン(VII,0.422m
mol)のベンゼン溶液(0.5ml)及びケテンシリ
ルアセタール(VIII,0.550mmol)のベンゼン
溶液(0.5ml)を室温で加え、同温で20時間反応
させた。反応混合物に飽和炭酸水素ナトリウム水溶液
(15ml)を注ぎ、ジクロロメタン(15ml)で3
度抽出した。有機層を合わせて無水炭酸ナトリウムで乾
燥後、ろ過、ろ液を減圧濃縮した。得られた残渣を氷浴
で冷却し、そこへ1N−HCl/THF=1/20溶液
10mlを加え、0℃で2時間反応させた。反応混合物
に飽和炭酸水素ナトリウム水溶液(15ml)を注ぎ、
ジクロロメタン(15ml)で3度抽出した。有機層を
合わせて無水硫酸ナトリウムで乾燥後、ろ過、ろ液を減
圧濃縮して得られた残渣をシリカゲルカラムクロマトグ
ラフィーにより精製し、生成物(120.5mg)を収
率95%で得た。また、生成物のエナンチオ過剰率を液
体クロマトグラフィー(Daicel;Chiralc
el AD,n−ヘキサン/2−プロパノール=9/
1)より分析したところ、92%ee(S)であった。Zr (Ot-Bu) 4 (0.0422 mm)
ol), the compound ligand obtained in Example 1 (Ligan
d, 0.0845 mmol) and N-methylimidazole (NMI, 0.128 mmol) in benzene (1 m
In 1), the mixture was mixed at room temperature and stirred for 1 hour to prepare a catalyst. Imine (VII, 0.422 m
mol) of benzene (0.5 ml) and a benzene solution (0.5 ml) of ketene silyl acetal (VIII, 0.550 mmol) were added at room temperature, and reacted at the same temperature for 20 hours. A saturated aqueous sodium hydrogen carbonate solution (15 ml) was poured into the reaction mixture, and the mixture was diluted with dichloromethane (15 ml).
Extracted. The organic layers were combined, dried over anhydrous sodium carbonate, filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was cooled in an ice bath, 10 ml of a 1N-HCl / THF = 1/20 solution was added thereto, and the mixture was reacted at 0 ° C. for 2 hours. A saturated aqueous sodium hydrogen carbonate solution (15 ml) was poured into the reaction mixture,
Extracted three times with dichloromethane (15 ml). The organic layers were combined, dried over anhydrous sodium sulfate, filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography to obtain the product (120.5 mg) in a yield of 95%. The enantiomeric excess of the product was determined by liquid chromatography (Daicel; Chiralc).
el AD, n-hexane / 2-propanol = 9 /
As a result of analysis from 1), it was 92% ee (S).
【0046】以上説明したように、本発明化合物は容易
に製造でき、不斉合成触媒として有用である。As described above, the compound of the present invention can be easily produced and is useful as an asymmetric synthesis catalyst.
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C07C 43/178 C07C 43/178 D 43/23 43/23 C // B01J 31/22 B01J 31/22 Z Fターム(参考) 4G069 AA06 AA08 BA27B BC51B BE13B BE36B BE38B CB57 DA02 FA01 4H006 AA01 AA02 AB40 AC41 FC52 FC54 FE11 FE13 GP01 GP03Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C07C 43/178 C07C 43/178 D 43/23 43/23 C // B01J 31/22 B01J 31/22 Z F term ( Reference) 4G069 AA06 AA08 BA27B BC51B BE13B BE36B BE38B CB57 DA02 FA01 4H006 AA01 AA02 AB40 AC41 FC52 FC54 FE11 FE13 GP01 GP03
Claims (2)
ロゲン原子又はC1〜C 3ハロアルキル基を表し、
R3、R4はそれぞれ独立して、水素原子、C1〜C 3
アルキル基、C1〜C3アルコキシ基又は置換されても
よいベンジルオキシ基を表し、R5、R6、R7及びR
8はそれぞれ独立して、水素原子、ハロゲン原子、C1
〜C6アルキル基又はアリール基を表す。また、R5と
R6は一緒になって飽和若しくは不飽和結合を有する炭
素環を形成してもよい。)で表されるビナフトール化合
物。1. A compound of the formula [I](Where R1, R2Are each independently a hydrogen atom,
Logen atom or C1~ C 3Represents a haloalkyl group,
R3, R4Is independently a hydrogen atom, C1~ C 3
Alkyl group, C1~ C3Alkoxy or substituted
Represents a good benzyloxy group,5, R6, R7And R
8Is independently a hydrogen atom, a halogen atom, C1
~ C6Represents an alkyl group or an aryl group. Also, R5When
R6Is a coal having a saturated or unsaturated bond
It may form a ring. Binaphthol compound represented by)
object.
ロゲン原子又はC1〜C 3ハロアルキル基を表し、Lは
水酸基の保護基を表す。)で表される化合物と、式[II
I] 【化3】 (式中、R5、R6、R7及びR8はそれぞれ独立し
て、水素原子、ハロゲン原子、C1〜C3アルキル基又
はアリール基を表し、L’は水酸基の保護基を表す。ま
た、R5とR6は一緒になって飽和若しくは不飽和結合
を有する炭素環を形成してもよい。)で表される化合物
とを反応させることを特徴とする一般式[IV] 【化4】 (式中、R1、R2、R5、R6、R7、R8、L及び
L’は、前記と同じ意味を表す。)で表わされるビナフ
トール化合物の製造法。2. A compound of the formula [II](Where R1, R2Are each independently a hydrogen atom,
Logen atom or C1~ C 3Represents a haloalkyl group, and L is
Represents a protecting group for a hydroxyl group. ) And a compound of the formula [II
I](Where R5, R6, R7And R8Are independent
And a hydrogen atom, a halogen atom, C1~ C3Alkyl group
Represents an aryl group, and L 'represents a hydroxyl-protecting group. Ma
R5And R6Are saturated or unsaturated bonds together
May be formed. Compound represented by)
With the general formula [IV] characterized by reacting(Where R1, R2, R5, R6, R7, R8, L and
L 'has the same meaning as described above. Binaf represented by)
A method for producing a tall compound.
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