JP2002270477A - Method for manufacturing ceramic electronic component, method for forming corrugated section, and ceramic electronic component - Google Patents

Method for manufacturing ceramic electronic component, method for forming corrugated section, and ceramic electronic component

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Publication number
JP2002270477A
JP2002270477A JP2001063592A JP2001063592A JP2002270477A JP 2002270477 A JP2002270477 A JP 2002270477A JP 2001063592 A JP2001063592 A JP 2001063592A JP 2001063592 A JP2001063592 A JP 2001063592A JP 2002270477 A JP2002270477 A JP 2002270477A
Authority
JP
Japan
Prior art keywords
forming
wavy
conductive paste
ceramic body
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001063592A
Other languages
Japanese (ja)
Other versions
JP4834913B2 (en
Inventor
Teppei Akiyoshi
哲平 穐吉
Kunihiko Hamada
邦彦 浜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP2001063592A priority Critical patent/JP4834913B2/en
Publication of JP2002270477A publication Critical patent/JP2002270477A/en
Application granted granted Critical
Publication of JP4834913B2 publication Critical patent/JP4834913B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a ceramic electronic component for simplifying an apparatus and process for forming an electrode film to be a terminal electrode by using conductive paste, and those ceramic electronic components having the terminal electrode including less bubble in the terminal electrode. SOLUTION: The method for manufacturing a ceramic electronic component comprises: a first process for forming a corrugated section including convex and/or concave section on the surface; a second process for forming a first electrode film to be the terminal electrode, by mutually contacting a tapered section consisting of top of the convex section, or convex and/or concave section; to the end face of the ceramic raw material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種電子回路に使
用されるセラミック電子部品の製造方法、波状形成部の
形成方法ならびにセラミック電子部品に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a ceramic electronic component used for various electronic circuits, a method for forming a corrugated portion, and a ceramic electronic component.

【0002】[0002]

【従来の技術】従来、例えば積層セラミックコンデン
サ、積層インダクタ及び抵抗器等で代表される電子部品
からなるセラミック電子部品を製造する場合、その端子
電極を形成する手法としては、例えば以下に説明するよ
うな方法により形成されている。
2. Description of the Related Art Conventionally, in the case of manufacturing a ceramic electronic component including an electronic component represented by, for example, a multilayer ceramic capacitor, a multilayer inductor, a resistor, and the like, a method of forming terminal electrodes thereof will be described below, for example. It is formed by a suitable method.

【0003】まず、図13(a)に示すように、平滑面
を有するフィルム2上に導電性ペーストを与え、これを
例えばドクターブレード等によって一定の厚みの平滑な
表面を有する平面形成部13を形成する。その後、セラ
ミック素体1を平面形成部13上に配置し、セラミック
素体1を重力方向であるD1方向に押し(引き)下げ、
あるいは平面形成部13を重力とは逆方向であるU1方
向に押し(引き)上げ、あるいはこれらを同時に行い、
セラミック素体1の端部に電極膜を形成し、その後これ
を硬化もしくは焼付ける、あるいはセラミック素体と同
時焼成して、端子電極を備えるセラミック電子部品を得
る。
[0003] First, as shown in FIG. 13 (a), a conductive paste is applied to a film 2 having a smooth surface, and this is formed into a flat forming portion 13 having a smooth surface with a constant thickness by a doctor blade or the like. Form. Thereafter, the ceramic body 1 is placed on the plane forming portion 13, and the ceramic body 1 is pushed (pulled) down in the direction of gravity D1, and
Alternatively, the plane forming part 13 is pushed (pulled) up in the U1 direction opposite to the gravity, or simultaneously,
An electrode film is formed on the end of the ceramic body 1 and then hardened or baked or fired simultaneously with the ceramic body to obtain a ceramic electronic component having terminal electrodes.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記の
ような方法では、図13(b)に示すように、セラミッ
ク素体1の端面が平面形成部13に接触する際に、端面
外辺部1b,1cが端面中央部1aに先んじて平面形成
部13に接して導電性ペーストが濡れ始めることによ
り、端面中央部1aと平面形成部13のとの間に外気を
含む濡れ残り部を形成してしまうことがあった。この濡
れ残り部に取り込まれた外気は、図13(c)に示すよ
うに、セラミック素体1の端面をさらにD1方向に押し
(引き)下げ、あるいは平面形成部13をさらにU1方
向に押し(引き)上げ、あるいはこれらを同時に行うこ
とにより、セラミック素体1がフィルム2に接する程度
まで浸漬されると、横に押し出されて気泡5となるが、
セラミック素体1と平面形成部13とを引き離す際に、
流動して図14(a)に示すようにセラミック素体1の
端面近傍に引き戻され、図14(b)のように電極膜2
3中に気泡5として内包されてしまう。このような気泡
を含む電極膜23を焼付ける(セラミック素体と同時焼
成を含む)と、焼付け(焼成)によって得られる端子電
極に陥没部分が生じ、あるいは内部電極との接合を阻害
することで、セラミック電子部品の電気特性の低下、耐
湿性の低下といった問題が生じる恐れがあった。
However, in the above-described method, as shown in FIG. 13 (b), when the end face of the ceramic body 1 comes into contact with the plane forming portion 13, the end face outer edge 1b , 1c come into contact with flat surface forming portion 13 prior to end surface center portion 1a, and the conductive paste starts to wet, thereby forming a remaining wet portion including outside air between end surface center portion 1a and flat surface forming portion 13. There was sometimes. As shown in FIG. 13C, the outside air taken into the remaining wet portion further pushes (pulls) down the end face of the ceramic body 1 in the D1 direction, or pushes the flat surface forming portion 13 further in the U1 direction ( When the ceramic body 1 is immersed to the extent that the ceramic body 1 comes into contact with the film 2 by pulling or raising them at the same time, the ceramic body 1 is extruded sideways to form bubbles 5,
When separating the ceramic body 1 and the plane forming portion 13,
It flows and is pulled back to the vicinity of the end face of the ceramic body 1 as shown in FIG.
3 are included as bubbles 5. When the electrode film 23 containing such bubbles is baked (including simultaneous firing with the ceramic body), a depression portion is formed in the terminal electrode obtained by sintering (firing), or the bonding with the internal electrode is hindered. In addition, there is a possibility that problems such as a decrease in electrical characteristics of the ceramic electronic component and a decrease in moisture resistance may occur.

【0005】このような問題を解決する手段としては、
特開平7−201687号公報において開示されている
ように、ホルダーに固定されたセラミック素体を傾いた
状態で平面形成部に接触させた後、セラミック素体の端
面を平面形成部の表面に平行になるように押し当てる端
子電極形成法がある。しかしながら、この方法では、装
置が複雑になり、また一回の操作で塗布できるチップ型
電子部品の数が限られるという問題があった。
[0005] To solve such a problem,
As disclosed in Japanese Patent Application Laid-Open No. 7-201687, after a ceramic body fixed to a holder is brought into contact with a plane forming part in an inclined state, an end face of the ceramic body is parallel to the surface of the plane forming part. There is a method of forming a terminal electrode in such a way that the pressure is adjusted so that However, this method has problems that the apparatus becomes complicated and the number of chip-type electronic components that can be applied in one operation is limited.

【0006】また、特許第2847980号公報におい
て開示されているように、端子電極中に形成される気泡
は平面形成部とセラミック素体とを引き離す際に生じる
キャビテーションによるとして、定盤(フィルム)に凹
凸加工を施す方法がある。しかしながら、この方法で
は、上述したような端面外辺部から塗れ上がり端子電極
に気泡が内包されるという問題を解決することができな
い。
Further, as disclosed in Japanese Patent No. 2,847,980, bubbles formed in a terminal electrode are formed on a surface plate (film) on the basis of cavitation generated when a plane forming portion and a ceramic body are separated from each other. There is a method of performing uneven processing. However, this method cannot solve the problem that air bubbles are included in the terminal electrode which is painted from the outer peripheral portion of the end face as described above.

【0007】また、特開平8−69950号公報におい
て開示されているように、端子電極中に内包された気泡
を、電極膜が固化する前にこれを押し上げ、超音波振動
を与えることにより気泡を除去する方法があるが、この
方法では装置が複雑になるばかりでなく、工程数が増え
るという問題を抱えており、量産には適さないという問
題があった。
Further, as disclosed in Japanese Patent Application Laid-Open No. 8-69950, air bubbles contained in the terminal electrode are pushed up before the electrode film is solidified, and the air bubbles are given by applying ultrasonic vibration. Although there is a method of removing, there is a problem that this method not only complicates the apparatus but also increases the number of steps, which is not suitable for mass production.

【0008】本発明は上記のような問題に鑑み、導電性
ペーストを用いて端子電極となるべき電極膜を形成する
工程において、装置ならびに工程を簡素化し、なおかつ
端子電極内における気泡の内包が減少された端子電極を
備える、セラミック電子部品の製造方法ならびにこのよ
うなセラミック電子部品を提供することを目的とするも
のである。
In view of the above problems, the present invention simplifies an apparatus and a process in a step of forming an electrode film to be a terminal electrode using a conductive paste, and reduces the inclusion of bubbles in the terminal electrode. It is an object of the present invention to provide a method of manufacturing a ceramic electronic component having the terminal electrode described above, and to provide such a ceramic electronic component.

【0009】本発明の目的は、上述の問題点を解消すべ
くなされたもので、端子電極内に気泡が内包されないよ
うに端子電極が形成されたセラミック電子部品の製造方
法、端子電極の製造過程で気泡が内包されないような波
状形成部の形成方法、ならびにこのようなセラミック電
子部品を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems, and a method of manufacturing a ceramic electronic component in which a terminal electrode is formed so that air bubbles are not included in the terminal electrode, and a manufacturing process of the terminal electrode It is an object of the present invention to provide a method of forming a wavy forming portion such that no bubbles are included therein, and such a ceramic electronic component.

【0010】[0010]

【課題を解決するための手段】上記目的を達成するため
に、本発明のセラミック電子部品の第1の製造方法は、
導電性ペーストを用いて、表面に凸部または/および凹
部を備える波状形成部を形成する第1工程と、凸部の頂
点部あるいは凸部または/および凹部により構成される
傾斜部と、セラミック素体の端面と、を互いに接触さ
せ、セラミック素体の端面に端子電極となるべき第1電
極膜を形成する第2工程と、を備えることを特徴とす
る。
In order to achieve the above object, a first method of manufacturing a ceramic electronic component according to the present invention comprises:
A first step of using a conductive paste to form a wavy forming portion having a convex portion and / or concave portion on the surface, an apex portion of the convex portion or an inclined portion formed by the convex portion and / or concave portion, and a ceramic element And a second step of forming a first electrode film to be a terminal electrode on the end face of the ceramic body by bringing the end faces of the body into contact with each other.

【0011】また、本発明のセラミック電子部品の第2
の製造方法は、導電性ペーストを用いて、重力方向に垂
直な平面に対して傾斜した平面上に平面形成部を形成す
る第1工程と、平面形成部と、セラミック素体の端面
と、を重力方向あるいは重力とは逆方向に接近させて接
触させ、セラミック素体の端面に端子電極となるべき第
1電極膜を形成する第2工程と、を備えることを特徴と
する。
Further, the second aspect of the ceramic electronic component of the present invention is as follows.
The manufacturing method of (1) includes, using a conductive paste, a first step of forming a plane forming portion on a plane inclined with respect to a plane perpendicular to the direction of gravity, a flat forming section, and an end face of the ceramic body. A second step of forming a first electrode film to be a terminal electrode on the end face of the ceramic body by bringing the electrodes into contact with each other in a direction of gravity or in a direction opposite to gravity.

【0012】また、本発明のセラミック電子部品の第3
の製造方法は、上述した第2の製造方法における第2工
程の後に、傾斜を備える平面形成部を、重力方向に垂直
な平面となるように作動させる後工程をさらに備えるこ
とを特徴とする。
The third aspect of the ceramic electronic component of the present invention is as follows.
Is characterized by further comprising, after the second step in the above-described second manufacturing method, a post-step of operating the inclined plane forming section to be a plane perpendicular to the direction of gravity.

【0013】本発明の波状形成部の第1の形成方法は、
導電性ペーストを与えた後に、櫛歯状のスキージを用い
て、表面に凸部または/および凹部を備える波状形成部
を形成することを特徴とする。
A first method of forming a wavy forming portion of the present invention is as follows.
After applying the conductive paste, a corrugated portion having a convex portion and / or a concave portion on the surface is formed using a comb-shaped squeegee.

【0014】また、本発明の波状形成部の第2の形成方
法、導電性ペーストを注出して、表面に凸部または/お
よび凹部を備える波状形成部を形成することを特徴とす
る。
Further, the second aspect of the present invention is a method of forming a wavy part, wherein a conductive paste is poured out to form a wavy part having a convex part and / or a concave part on the surface.

【0015】また、本発明の波状形成部の第3の形成方
法は、導電性ペーストを与えた後に、スキージを用いて
波状形成部を形成する方法であって、波状形成部に対し
て垂直方向に一定間隔で振動するスキージを用いて、表
面に凸部または/および凹部を備える波状形成部を形成
することを特徴とする。
A third method of forming a wavy forming portion of the present invention is a method of forming a wavy forming portion using a squeegee after applying a conductive paste, wherein the wavy forming portion is formed in a direction perpendicular to the wavy forming portion. A squeegee vibrating at regular intervals is used to form a wavy forming portion having a convex portion and / or a concave portion on the surface.

【0016】また、本発明の波状形成部の第4の形成方
法は、導電性ペーストを用いて平面形成部を形成した
後、平面形成部の下部の一部を押し上げまたは/および
引き下げることにより、表面に凸部または/および凹部
を備える波状形成部を形成することを特徴とする。
In a fourth method of forming a wavy forming portion according to the present invention, after forming a planar forming portion using a conductive paste, a part of the lower portion of the planar forming portion is pushed up and / or lowered. It is characterized in that a wavy forming portion having a convex portion and / or a concave portion on the surface is formed.

【0017】また、本発明の波状形成部の第5の形成方
法は、一対の閉じた櫛歯型プレート上に導電性ペースト
を用いて平面形成部を形成した後、櫛歯型プレートを互
いに離間する方向に摺動させて櫛歯を開き、櫛歯の間隙
に平面形成部を構成する導電性ペーストを流入させ、表
面に凸部または/および凹部を備える波状形成部を形成
することを特徴とする。
According to a fifth method of forming a wavy forming portion of the present invention, a planar forming portion is formed using a conductive paste on a pair of closed comb-tooth plates, and then the comb-tooth plates are separated from each other. In such a manner that the comb-teeth are opened by sliding in a direction in which the comb-teeth are formed, and the conductive paste forming the planar forming part is caused to flow into the gap between the comb-teeth to form a wavy forming part having a convex part and / or a concave part on the surface. I do.

【0018】また、本発明の波状形成部の第6の形成方
法は、一対の開いた櫛歯型プレート上に導電性ペースト
を用いて平面形成部を形成した後、櫛歯型プレートを互
いに間挿しあう方向に摺動させて櫛歯を閉じ、櫛歯の間
隙に流入していた導電性ペーストを押し上げ、表面に凸
部または/および凹部を備える波状形成部を形成するこ
とを特徴とする。
According to a sixth aspect of the present invention, there is provided a method of forming a wavy forming portion, comprising: forming a planar forming portion on a pair of open comb-shaped plates by using a conductive paste; The method is characterized in that the comb teeth are closed by sliding in the inserting direction, the conductive paste that has flowed into the gap between the comb teeth is pushed up, and a wavy forming section having a convex portion and / or a concave portion on the surface is formed.

【0019】また、本発明の波状形成部の第7の形成方
法は、貫通孔を備えるプレート上に導電性ペーストを用
いて平面形成部を形成した後、プレートの下部より導電
性ペーストを押し出して、表面に凸部または/および凹
部を備える波状形成部を形成することを特徴とする。
According to a seventh aspect of the present invention, in the method of forming a wavy forming portion, a flat forming portion is formed on a plate having a through hole using a conductive paste, and then the conductive paste is extruded from a lower portion of the plate. And a wavy forming portion having a convex portion and / or a concave portion on the surface.

【0020】また、本発明の波状形成部の第8の形成方
法は、表面に所定の間隔を以って配置された複数の突起
を備える可撓性のあるプレートの裏面側を、回転するロ
ールを用いてキャタピラ状に支持し、曲面を帯びたプレ
ートの表面に導電性ペーストを用いて平面形成部を形成
した後、平面形成部が形成されたプレートの裏面側が直
線平面となるように支持することで、複数の突起の間隙
に充填された導電性ペーストを平面形成部の表面に押し
出して、表面に凸部または/および凹部を備える波状形
成部を形成することを特徴とする。
An eighth method of forming a wavy forming portion according to the present invention is directed to a roll for rotating a back surface of a flexible plate having a plurality of protrusions arranged on a front surface at predetermined intervals. After forming a flat portion using a conductive paste on the surface of a curved plate using a conductive paste, the back surface side of the plate on which the flat portion is formed is supported so as to be a straight plane. Thus, the conductive paste filled in the gaps between the plurality of protrusions is extruded onto the surface of the planar forming portion to form a wavy forming portion having a convex portion and / or a concave portion on the surface.

【0021】また、本発明のセラミック電子部品の第4
の製造方法は、上述したセラミック電子部品の第1の製
造方法であって、第1工程において形成される波状形成
部が、上述した波状形成部の第1〜8の形成方法の何れ
かにより形成されることを特徴とする。
Further, the fourth aspect of the ceramic electronic component of the present invention.
Is the first method for manufacturing a ceramic electronic component described above, wherein the corrugated portion formed in the first step is formed by any one of the first to eighth corrugated portion forming methods described above. It is characterized by being performed.

【0022】また、本発明のセラミック電子部品の第5
の製造方法は、貫通孔を備えるプレートの下部より導電
性ペーストを押し出して、プレート上にペースト溜めを
形成する第1工程と、ペースト溜めの頂点部あるいはペ
ースト溜めにより構成される傾斜部と、セラミック素体
の端面と、を互いに接触させ、セラミック素体の端面に
端子電極となるべき第1電極膜を形成する第2工程を備
えることを特徴とする。
Further, the fifth aspect of the ceramic electronic component of the present invention.
The method comprises: a first step of extruding a conductive paste from a lower portion of a plate having a through hole to form a paste reservoir on the plate; an apex portion of the paste reservoir or an inclined portion formed by the paste reservoir; A second step of forming a first electrode film to be a terminal electrode on the end face of the ceramic body by bringing the end faces of the body into contact with each other.

【0023】また、本発明のセラミック電子部品の第6
の製造方法は、上述した第1〜5の製造方法における第
2工程の後に、導電性ペーストを用いて平面形成部を形
成する第3工程と、平面形成部と、第1電極膜を備える
セラミック素体と、を互いに接触させ、第1電極膜上に
第2電極膜を形成する第4工程と、をさらに備えること
を特徴とする。
Further, the sixth aspect of the ceramic electronic component of the present invention.
Is a third step of forming a plane forming portion using a conductive paste after the second step in the above-described first to fifth manufacturing methods, a ceramic including the plane forming portion, and the first electrode film. And a fourth step of forming the second electrode film on the first electrode film by bringing the element body into contact with each other.

【0024】本発明のセラミック電子部品は、上述した
セラミック電子部品の製造方法によって得られたことを
特徴とする。
A ceramic electronic component according to the present invention is characterized by being obtained by the above-described method for manufacturing a ceramic electronic component.

【0025】[0025]

【発明の実施の形態】〔実施形態1〕本発明に係る第1
の実施形態について、図1に基づいて詳細に説明する。
第1の実施形態は、セラミック素体に電極膜を形成する
方法を具体的に示したものである。
[Embodiment 1] The first embodiment according to the present invention.
The embodiment will be described in detail with reference to FIG.
The first embodiment specifically shows a method of forming an electrode film on a ceramic body.

【0026】まず、図1(a)に示すように、セラミッ
ク素体1と、フィルム2上に導電性ペーストが与えられ
てなる、表面に凸部3aを備える波状形成部3を準備す
る。
First, as shown in FIG. 1 (a), a wavy forming portion 3 having a ceramic body 1 and a film 2 provided with a conductive paste on the surface and having a convex portion 3a is prepared.

【0027】次いで、セラミック素体1を波状形成部3
の凸部3a上に配置し、セラミック素体1を重力方向で
あるD1方向に押し(引き)下げ、あるいは波状形成部
3を重力とは逆方向であるU1方向に押し(引き)上
げ、あるいはこれらを同時に行い、図1(b)に示すよ
うに、セラミック素体1と波状形成部3を接触させる。
この段階において、波状形成部3の凸部3aはセラミッ
ク素体1の端面中央部1a付近から接触しはじめること
から、気泡が波状形成部3内に浸入することはない。
Next, the ceramic body 1 is moved to the wavy forming section 3.
And pushes (pulls) down the ceramic body 1 in the direction of gravity D1 or pushes (pulls) the wavy forming portion 3 in the direction U1 opposite to the direction of gravity, or These operations are performed simultaneously, and the ceramic body 1 and the corrugated portion 3 are brought into contact with each other as shown in FIG.
At this stage, the projections 3a of the corrugated portion 3 start to come into contact with the vicinity of the center 1a of the end face of the ceramic body 1, so that no bubbles enter the corrugated portion 3.

【0028】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは波状形成部3をさらに押し(引
き)上げ、あるいはこれらを同時に行うことにより、波
状形成部3を構成する導電性ペーストが、セラミック素
体1の端面中央部1aに続いて端面周辺部1b,1cへ
と濡れ進む。この段階においても、気泡が波状形成部3
内に浸入することはない。
Next, by further pushing (pulling) down the ceramic body 1 or further pushing (pulling) up the wavy forming portion 3, or by performing these simultaneously, the conductive paste constituting the wavy forming portion 3 becomes Following the end surface center 1a of the ceramic body 1, the end surface peripheral portions 1b and 1c are wetted. Also at this stage, bubbles are generated in the wavy forming portion 3.
It does not penetrate inside.

【0029】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは波状形成部3をさらに押し(引
き)上げ、あるいはこれらを同時に行うことにより、図
1(c)に示すように、波状形成部3を構成する導電性
ペーストが、セラミック素体1の側面濡れ上がり位置1
d,1dまで達する。
Next, the ceramic body 1 is further pushed (pulled) down, or the wavy forming part 3 is further pushed (pulled) up, or by simultaneously performing these, as shown in FIG. The conductive paste forming the portion 3 is located at the side surface wetting position 1 of the ceramic body 1.
d, 1d.

【0030】次いで、セラミック素体1をD1と逆方向
に引き(押し)上げ、あるいは波状形成部3をU1と逆
方向に引き(押し)下げ、あるいはこれらを同時に行う
ことにより、セラミック素体1の端面近傍に電極膜が形
成され、これを焼付けることにより、端子電極が形成さ
れる。なお、セラミック素体と共に同時焼成して端子電
極を形成しても構わない。以下の全ての実施例において
も同様である。
Next, the ceramic body 1 is pulled (pushed) up in the direction opposite to D1, or the wavy forming portion 3 is pulled (pushed) down in the direction opposite to U1, or these operations are performed simultaneously. An electrode film is formed in the vicinity of the end face of the substrate, and the electrode film is baked to form a terminal electrode. The terminal electrodes may be formed by simultaneous firing together with the ceramic body. The same applies to all the following embodiments.

【0031】〔実施形態2〕本発明に係る第2の実施形
態について、図2に基づいて詳細に説明する。第2の実
施形態も、同じくセラミック素体に電極膜を形成する方
法を具体的に示したものである。
[Second Embodiment] A second embodiment according to the present invention will be described in detail with reference to FIG. The second embodiment also specifically shows a method for forming an electrode film on a ceramic body.

【0032】まず、図2(a)に示すように、セラミッ
ク素体1と、フィルム2上に導電性ペーストが与えられ
てなる、表面に凸部あるいは凹部を備える波状形成部3
を準備する。なお、このような波状形成部3は、凸部と
凹部の間に傾斜部3bを備える。
First, as shown in FIG. 2 (a), a wavy forming portion 3 having a ceramic body 1 and a film 2 provided with a conductive paste on the surface and having convex portions or concave portions on the surface.
Prepare Note that such a wavy forming portion 3 includes an inclined portion 3b between the convex portion and the concave portion.

【0033】次いで、セラミック素体1を波状形成部3
の傾斜部3b上に配置し、セラミック素体1を重力方向
であるD1方向に押し(引き)下げ、あるいは波状形成
部3を重力とは逆方向であるU1方向に押し(引き)上
げ、あるいはこれらを同時に行い、図2(b)に示すよ
うに、セラミック素体1と波状形成部3の傾斜部3bを
接触させる。この段階において、波状形成部3の傾斜部
3bはセラミック素体1の端面周辺部1b付近から接触
しはじめることから、気泡が波状形成部3内に浸入する
ことはない。
Next, the ceramic body 1 is moved
And pushes (pulls) down the ceramic body 1 in the direction of gravity D1 or pushes (pulls) the wavy forming portion 3 in the direction U1 opposite to the direction of gravity, or These operations are performed simultaneously to bring the ceramic body 1 into contact with the inclined portion 3b of the corrugated portion 3, as shown in FIG. At this stage, since the inclined portion 3b of the corrugated portion 3 starts to come into contact with the vicinity of the peripheral portion 1b of the end surface of the ceramic body 1, bubbles do not enter the corrugated portion 3.

【0034】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは波状塗布膜3をさらに押し(引
き)上げ、あるいはこれらを同時に行うことにより、波
状形成部3を構成する導電性ペーストが、セラミック素
体1の端面周辺部1b,端面中央部1aに続いて端面周
辺部1cへと濡れ進む。この段階においても、気泡が波
状形成部3内に浸入することはない。
Then, the ceramic paste 1 is further pushed (pulled) down, or the wavy coating film 3 is further pushed (pulled) up or at the same time, so that the conductive paste constituting the wavy forming portion 3 becomes After the end surface peripheral portion 1b and the end surface central portion 1a of the ceramic body 1, the wettability proceeds to the end surface peripheral portion 1c. Even at this stage, the bubbles do not enter the wavy forming portion 3.

【0035】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは波状塗布膜3をさらに押し(引
き)上げ、あるいはこれらを同時に行うことにより、図
2(c)に示すように、波状形成部3を構成する導電性
ペーストが、セラミック素体1の側面濡れ上がり位置1
e,1fまで達する。
Next, the ceramic body 1 is further pushed (pulled) down, or the corrugated coating film 3 is further pushed (pulled) up or simultaneously, thereby forming a corrugated film as shown in FIG. 2 (c). The conductive paste forming the portion 3 is located at the side surface wetting position 1 of the ceramic body 1.
e, 1f.

【0036】次いで、セラミック素体1をD1と逆方向
に引き(押し)上げ、あるいは波状形成部3をU1と逆
方向に引き(押し)下げ、あるいはこれらを同時に行う
ことにより、セラミック素体1の端面近傍に電極膜が形
成され、これを焼成することにより、端子電極が形成さ
れる。
Next, the ceramic body 1 is pulled (pushed) up in the direction opposite to D1, or the wavy forming portion 3 is pulled (pushed) down in the direction opposite to U1, or these operations are performed simultaneously. An electrode film is formed in the vicinity of the end face, and the electrode film is baked to form a terminal electrode.

【0037】〔実施形態3〕本発明に係る第3の実施形
態について、図3に基づいて詳細に説明する。第3の実
施形態も、同じくセラミック素体に電極膜を形成する方
法を具体的に示したものである。
Third Embodiment A third embodiment according to the present invention will be described in detail with reference to FIG. The third embodiment also specifically shows a method of forming an electrode film on a ceramic body.

【0038】まず、図3(a)に示すように、セラミッ
ク素体1と、フィルム2上に導電性ペーストが与えられ
てなる平面形成部13を準備する。なお、平面形成部1
3は、重力方向に垂直な平面に対して傾斜した平面上に
形成されている。また、傾斜した平面上に形成された平
面形成部13を得る方法は、特に限定はしないが、例え
ば、あらかじめ傾斜した平面を準備し、その上にフィル
ム2を準備し、フィルム2上に平面形成部13を形成し
てもよく、重力方向に垂直な平面状に準備したフィルム
2上に平面形成部13を形成し、その後フィルム2の一
方端部をU2方向に押し(引き)上げ、あるいはフィル
ム2の一方端部をD2方向に押し(引き)下げても構わ
ない。
First, as shown in FIG. 3A, a ceramic substrate 1 and a plane forming portion 13 in which a conductive paste is provided on a film 2 are prepared. In addition, the plane forming part 1
3 is formed on a plane inclined with respect to a plane perpendicular to the direction of gravity. The method of obtaining the plane forming portion 13 formed on the inclined plane is not particularly limited. For example, an inclined plane is prepared in advance, the film 2 is prepared thereon, and the plane is formed on the film 2. The portion 13 may be formed, and the plane forming portion 13 is formed on the film 2 prepared in a plane perpendicular to the direction of gravity, and then one end of the film 2 is pushed (pulled) up in the U2 direction, or 2 may be pushed (pulled) down in the direction D2.

【0039】次いで、セラミック素体1を平面形成部1
3上に配置し、セラミック素体1を重力方向であるD1
方向に押し(引き)下げ、あるいは平面形成部13を重
力とは逆方向であるU1方向に押し(引き)上げ、ある
はこれらを同時に行い、図3(b)に示すように、セラ
ミック素体1と平面形成部13を接触させる。この段階
において、平面形成部13はセラミック素体1の端面周
辺部1b付近から接触しはじめることから、気泡が平面
形成部13内に浸入することはない。
Next, the ceramic body 1 is placed in the plane forming portion 1.
3 and the ceramic body 1 is placed in the direction of gravity D1.
3 (b), or pushes (pulls) down or pushes up the plane forming portion 13 in the U1 direction opposite to the direction of gravity, or simultaneously performs these operations, as shown in FIG. 3 (b). 1 and the plane forming portion 13 are brought into contact with each other. At this stage, air bubbles do not enter the flat surface forming portion 13 because the flat surface forming portion 13 starts to come into contact with the vicinity of the end surface peripheral portion 1b of the ceramic body 1.

【0040】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは平面形成部13をさらに押し
(引き)上げ、あるいはこれらを同時に行うことによ
り、平面形成部13を構成する導電性ペーストが、セラ
ミック素体1の端面周辺部1b,端面中央部1aに続い
て端面周辺部1cへと濡れ進む。この段階においても、
気泡が平面形成部13内に浸入することはない。
Next, by further pushing (pulling) down the ceramic body 1 or further pushing (pulling) up the plane forming portion 13, or by simultaneously performing these operations, the conductive paste constituting the plane forming portion 13 becomes After the end surface peripheral portion 1b and the end surface central portion 1a of the ceramic body 1, the wettability proceeds to the end surface peripheral portion 1c. At this stage,
Bubbles do not enter the planar forming portion 13.

【0041】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは平面形成部13をさらに押し
(引き)上げ、あるいはこれらを同時に行うことによ
り、図3(c)に示すように、平面形成部13を構成す
る導電性ペーストが、セラミック素体1の側面濡れ上が
り位置1g,1hまで達する。
Next, the ceramic body 1 is further pushed (pulled) down, or the plane forming section 13 is further pushed (pulled) up, or these operations are performed at the same time, thereby forming a plane as shown in FIG. The conductive paste forming the portion 13 reaches the side surface wet-up positions 1 g and 1 h of the ceramic body 1.

【0042】次いで、セラミック素体1をD1と逆方向
に引き(押し)上げ、あるいは平面形成部13をU1と
逆方向に引き(押し)下げ、あるいはこれらを同時に行
うことにより、セラミック素体1の端面近傍に電極膜が
形成され、これを焼成することにより、端子電極が形成
される。
Next, the ceramic body 1 is pulled (pushed) up in the direction opposite to D1, or the plane forming portion 13 is pulled (pushed) down in the direction opposite to U1, or these operations are performed simultaneously. An electrode film is formed in the vicinity of the end face, and the electrode film is baked to form a terminal electrode.

【0043】〔実施形態4〕本発明に係る第4の実施形
態について、図4に基づいて詳細に説明する。第4の実
施形態は、上述した第3の実施形態を発展させた、セラ
ミック素体に電極膜を形成する方法を具体的に示したも
のである。
[Fourth Embodiment] A fourth embodiment according to the present invention will be described in detail with reference to FIG. The fourth embodiment specifically shows a method for forming an electrode film on a ceramic body, which is a development of the third embodiment described above.

【0044】まず、図4(a)に示すように、セラミッ
ク素体1と、フィルム2上に導電性ペーストが与えられ
てなる平面形成部13を準備する。なお、平面形成部1
3は、重力方向に垂直な平面に対して傾斜した平面上に
形成されている。平面形成部13を傾斜させる方法は、
上述の第3の実施形態と同様である。
First, as shown in FIG. 4A, a plane forming portion 13 in which a conductive paste is provided on a ceramic body 1 and a film 2 is prepared. In addition, the plane forming part 1
3 is formed on a plane inclined with respect to a plane perpendicular to the direction of gravity. The method of inclining the plane forming part 13 is as follows.
This is the same as the third embodiment described above.

【0045】次いで、セラミック素体1を平面形成部1
3上に配置し、セラミック素体1を重力方向であるD1
方向に押し(引き)下げ、あるいは平面形成部13を重
力とは逆方向であるU1方向に押し(引き)上げ、ある
はこれらを同時に行い、図4(b)に示すように、セラ
ミック素体1と平面形成部13を接触させる。この段階
において、平面形成部13はセラミック素体1の端面周
辺部1b付近から接触しはじめることから、気泡が平面
形成部13内に浸入することはない。
Next, the ceramic body 1 is moved to the plane forming portion 1.
3 and the ceramic body 1 is placed in the direction of gravity D1.
4 (b), or pushes (pulls) the plane forming part 13 in the U1 direction which is opposite to the direction of gravity, or simultaneously performs these operations, as shown in FIG. 4 (b). 1 and the plane forming portion 13 are brought into contact with each other. At this stage, air bubbles do not enter the flat surface forming portion 13 because the flat surface forming portion 13 starts to come into contact with the vicinity of the end surface peripheral portion 1b of the ceramic body 1.

【0046】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは平面形成部13をさらに押し
(引き)上げ、あるいはこれらを同時に行うことによ
り、平面形成部13を構成する導電性ペーストが、セラ
ミック素体1の端面周辺部1b,端面中央部1aに続い
て端面周辺部1cへと濡れ進む。この段階においても、
気泡が平面形成部13内に浸入することはない。
Next, by further pushing (pulling) down the ceramic body 1 or further pushing (pulling) up the plane forming portion 13, or by simultaneously performing these operations, the conductive paste constituting the plane forming portion 13 becomes After the end surface peripheral portion 1b and the end surface central portion 1a of the ceramic body 1, the wettability proceeds to the end surface peripheral portion 1c. At this stage,
Bubbles do not enter the planar forming portion 13.

【0047】次いで、セラミック素体1をさらに押し
(引き)下げ、あるいは平面形成部13をさらに押し
(引き)上げ、あるいはこれらを同時に行うとともに、
平面形成部13の傾斜を元の平面、すなわち重力方向に
垂直な平面となるように作動させる。こうして、図4
(c)に示すように、平面形成部13を構成する導電性
ペーストが、セラミック素体1の側面濡れ上がり位置1
i,1iまで達する。
Next, the ceramic body 1 is further pushed (pulled) down, or the plane forming portion 13 is further pushed (pulled) up, or simultaneously.
The plane forming section 13 is operated so that the inclination of the plane forming section 13 becomes an original plane, that is, a plane perpendicular to the direction of gravity. Thus, FIG.
As shown in (c), the conductive paste forming the plane forming portion 13 is placed on the side surface wetting position 1 of the ceramic body 1.
i, 1i.

【0048】次いで、セラミック素体1をD1と逆方向
に引き(押し)上げ、あるいは平面形成部13をU1と
逆方向に引き(押し)下げ、あるいはこれらを同時に行
うことにより、セラミック素体1の端面近傍に電極膜が
形成され、これを焼成することにより、端子電極が形成
される。
Next, the ceramic body 1 is pulled (pushed) up in the direction opposite to D1, or the plane forming portion 13 is pulled (pushed) down in the direction opposite to U1, or these operations are performed simultaneously. An electrode film is formed in the vicinity of the end face, and the electrode film is baked to form a terminal electrode.

【0049】〔実施形態5〕本発明に係る第5の実施形
態について、図5ならびに図6に基づいて詳細に説明す
る。第5の実施形態は、表面に凸部ならびに凹部を備え
る波状形成部を形成する方法を具体的に示したものであ
る。
Embodiment 5 A fifth embodiment according to the present invention will be described in detail with reference to FIGS. The fifth embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface.

【0050】図5に示すように、フィルム2上に導電性
ペーストを投与した後、スキージ14を用いてこれをM
1方向に移動させることにより、所定の厚みの波状形成
部3を形成する。この時、スキージ14が櫛歯状である
ことから、波状形成部3の表面は、凸部ならびに凹部が
形成される。なお、スキージ14の櫛歯形状は、特に限
定はしないが、例えば図6(a)に示すような角型15
a、図6(b)に示すような扇型15b、図6(c)に
示すような波型15c、図6(d)に示すようなV字型
15dであってもよく、すなわちスキージ14a,14
b,14c,14dを用いることができる。
As shown in FIG. 5, after the conductive paste is applied onto the film 2, the squeegee 14
By moving in one direction, the wavy forming part 3 having a predetermined thickness is formed. At this time, since the squeegee 14 has a comb-like shape, the surface of the wavy forming portion 3 has a convex portion and a concave portion. The comb tooth shape of the squeegee 14 is not particularly limited, but for example, a square 15 as shown in FIG.
a, a fan shape 15b as shown in FIG. 6 (b), a corrugated shape 15c as shown in FIG. 6 (c), and a V-shaped shape 15d as shown in FIG. 6 (d), that is, the squeegee 14a , 14
b, 14c and 14d can be used.

【0051】なお、角型15a,V字型15dを備える
スキージ14a,14dを用いて波状形成部3を形成す
ると、波状形成部3が一定の粘度を備えることから、そ
の形状が経時変化して、一定時間後に例えば扇型15
b,波型15cを備えるスキージ14b、14cを用い
て形成した波状形成部3と略同じ形状となる。
When the wavy forming part 3 is formed by using the squeegees 14a and 14d having the square 15a and the V-shaped 15d, the shape changes with time because the wavy forming part 3 has a constant viscosity. After a certain time, for example, a fan 15
b, the shape is substantially the same as that of the wavy part 3 formed using the squeegees 14b and 14c having the corrugations 15c.

【0052】また、上述の第5の実施形態において、ペ
ースト供給管16を通じて導電性ペーストを一定速度で
ノズル15eに供給し、ノズル15eから一定速度で導
電性ペーストを注出する構造を備えるスキージ14eを
用いることにより、扇型15b,波型15cを備えるス
キージ14b、14cを用いて形成した波状形成部3と
略同じ形状の波状形成部3を形成することができる。こ
の時、スキージ14を引く手前で導電性ペーストを与え
ていなくても、表面に凸部ならびに凹部を備える波状形
成部3を形成することができる。
In the fifth embodiment, the squeegee 14e has a structure in which the conductive paste is supplied to the nozzle 15e at a constant speed through the paste supply pipe 16 and the conductive paste is discharged from the nozzle 15e at a constant speed. By using this, it is possible to form the wavy forming portion 3 having substantially the same shape as the wavy forming portion 3 formed by using the squeegees 14b and 14c having the fan shape 15b and the wave shape 15c. At this time, even if the conductive paste is not applied just before the squeegee 14 is pulled, it is possible to form the wavy forming portion 3 having the convex portion and the concave portion on the surface.

【0053】また、図示していないが、導電性ペースト
を与えた後に、スキージを用いて波状形成部を形成する
際に、波状形成部に対して垂直方向に一定間隔で振動す
るスキージを用いることで、表面に凸部または/および
凹部を備える波状形成部を形成することができる。
Although not shown, a squeegee that vibrates at regular intervals in a direction perpendicular to the wavy forming portion when forming the wavy forming portion using the squeegee after applying the conductive paste is used. Thus, a wavy forming portion having a convex portion and / or a concave portion on the surface can be formed.

【0054】〔実施形態6〕本発明に係る第6の実施形
態について、図7に基づいて詳細に説明する。第6の実
施形態は、表面に凸部ならびに凹部を備える波状形成部
を形成する方法と、セラミック素体に電極膜を形成する
方法を具体的に示したものである。
Embodiment 6 A sixth embodiment according to the present invention will be described in detail with reference to FIG. The sixth embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface and a method of forming an electrode film on a ceramic body.

【0055】まず、図7(a)に示すように、支点21
aを中心に可動する複数の保持部21の上面が略平面と
なるように設置する。次いで、上述の複数の保持部21
上にフィルム2を敷き、このフィルム2上に導電性ペー
ストを与え、スキージ24を用いて所定の厚みを備える
平面形成部13を形成する。
First, as shown in FIG.
The plurality of holding units 21 that are movable around a are installed such that the upper surfaces thereof are substantially flat. Next, the plurality of holding units 21 described above are used.
The film 2 is laid thereon, a conductive paste is applied on the film 2, and the squeegee 24 is used to form the plane forming portion 13 having a predetermined thickness.

【0056】次いで、図7(b)に示すように、支点2
1aを中心に複数の保持部21を作動させ、フィルム2
と保持部21の接点を、重力とは逆方向であるU1方向
に押し(引き)上げることで、表面に凸部3aならびに
凹部を備える波状形成部3を形成する。なお、このよう
な波状形成部3は、凸部3aと凹部の間に傾斜部3bを
備える。なお、図7(b)では、フィルム2と保持部2
1の接点をU1方向に押し(引き)上げているが、U1
とは逆方向に押し(引き)下げても構わない。
Next, as shown in FIG.
A plurality of holding portions 21 are operated around the center 1a, and the film 2
By pushing (pulling) up the contact point of the holding portion 21 in the U1 direction opposite to the gravity, the corrugated forming portion 3 having the convex portion 3a and the concave portion on the surface is formed. Note that such a wavy forming portion 3 includes an inclined portion 3b between the convex portion 3a and the concave portion. In FIG. 7B, the film 2 and the holding unit 2
1 contact is pushed (pulled) up in the U1 direction.
You can push (pull) down in the opposite direction.

【0057】次いで、図7(c)に示すように、支持部
25に取り付けられた複数のセラミック素体1を波状形
成部3の凸部3a上に配置し、セラミック素体1を重力
方向であるD1方向に押し(引き)下げ、あるいは波状
形成部3をU1方向に押し(引き)上げ、あるはこれら
を同時に行い、図7(d)に示すように、セラミック素
体1と波状形成部3を接触させる。
Next, as shown in FIG. 7C, the plurality of ceramic bodies 1 attached to the support portion 25 are arranged on the projections 3a of the corrugated forming section 3, and the ceramic body 1 is moved in the direction of gravity. Pushing (pulling) down in a certain D1 direction or pushing (pulling) up the wavy forming portion 3 in the U1 direction, or simultaneously performing these operations, as shown in FIG. 7 (d), the ceramic body 1 and the wavy forming portion 3 is brought into contact.

【0058】次いで、図7(e)に示すように、支点2
1aを中心に複数の保持部21を作動させ、図7(b)
でU1方向に押し(引き)上げた(あるいはU1とは逆
方向に押し(引き)下げた)フィルム2と保持部21の
接点を元の位置に戻して、再び平面形成部13とした
後、セラミック素体1をD1と逆方向に引き(押し)上
げ、あるいは、平面形成部13をU1と逆方向に引き
(押し)下げ、あるいはこれらを同時に行うことによ
り、セラミック素体1の端面近傍に電極膜が形成され、
これを焼成することにより、端子電極が形成される。
Next, as shown in FIG.
A plurality of holding parts 21 are operated around 1a, and FIG.
Then, the contact between the film 2 pushed (pulled) up in the U1 direction (or pushed (pulled down) in the opposite direction to U1) and the holding unit 21 is returned to the original position, and the plane forming unit 13 is formed again. By pulling (pushing) the ceramic body 1 in the direction opposite to D1 and pulling (pushing) the plane forming portion 13 in the direction opposite to U1, or by simultaneously performing these, the vicinity of the end face of the ceramic body 1 An electrode film is formed,
By firing this, a terminal electrode is formed.

【0059】なお、上述の第6の実施形態において、支
持部25に取り付けられた複数のセラミック素体1を波
状形成部3の凸部3a上に配置し、セラミック素体1を
D1方向に押し(引き)下げ、あるいは波状形成部3を
U1方向に押し(引き)上げ、あるいはこれらを同時に
行い、セラミック素体の端面近傍に電極膜を形成した
が、電極膜の形成方法は、上述の第1の実施形態におけ
る電極膜の形成方法、すなわち、波状形成部3の凸部3
aとセラミック素体1とを接触させることによる電極膜
の形成方法、あるいは上述の第2の実施形態における電
極膜の形成方法、すなわち、波状形成部3の凸部3aと
凹部の間の傾斜部3bとセラミック素体1とを接触させ
ることによる電極膜の形成方法、あるいは本発明の範囲
内におけるその他の方法による電極膜の形成方法を用い
ても構わない。
In the sixth embodiment described above, the plurality of ceramic bodies 1 attached to the support portion 25 are arranged on the projections 3a of the wavy forming section 3, and the ceramic body 1 is pushed in the direction D1. The electrode film was formed near the end face of the ceramic body by (pulling) lowering or pushing (pulling) the wavy forming portion 3 in the U1 direction, or simultaneously. The method for forming the electrode film according to the first embodiment, that is, the convex portion 3 of the wavy forming portion 3
a and the method for forming an electrode film by contacting the ceramic body 1 or the method for forming an electrode film in the above-described second embodiment, that is, an inclined portion between the convex portion 3a and the concave portion of the wavy forming portion 3. A method for forming an electrode film by bringing 3b into contact with ceramic body 1, or a method for forming an electrode film by another method within the scope of the present invention may be used.

【0060】また、上述の第6の実施形態において、図
7(a)に示すように、複数の保持部21上にフィルム
2を敷き、このフィルム2上に導電性ペーストを与え、
スキージ24を用いて所定の厚みを備える平面形成部1
3を形成した後に、図7(b)に示すように、支点21
aを中心に複数の保持部21を作動させ、フィルム22
bと保持部21の接点をU1方向に押し(引き)上げる
(あるいはU1とは逆方向に押し(引き)下げる)こと
で、表面に凸部3aならびに凹部を備える波状形成部3
を形成したが、例えば、上述の複数の保持部21上にフ
ィルム2を敷き、予め支点21aを中心に複数の保持部
21を作動させ、フィルム2と保持部21の接点をU1
方向に押し(引き)上げた状態(あるいはU1とは逆方
向に押し(引き)下げた状態)で、このフィルム2上に
導電性ペーストを与え、スキージ24を用いて所定の厚
みを備える平面形成部13を形成した後に、支点21a
を中心に複数の保持部21を作動させ、U1方向に押し
(引き)上げた(あるいはU1とは逆方向に押し(引
き)下げた)フィルム2と保持部21の接点を元の位置
に戻して、表面に凸部3aならびに凹部を備える波状形
成部3を形成しても構わない。
In the sixth embodiment, as shown in FIG. 7A, a film 2 is laid on a plurality of holding portions 21 and a conductive paste is applied on the film 2.
Planar forming section 1 having predetermined thickness using squeegee 24
3 is formed, and as shown in FIG.
a, the plurality of holding portions 21 are operated around
By pushing (pulling) up in the U1 direction (or pushing (pulling) down in the opposite direction to U1) the contact between the b and the holding portion 21, the corrugated forming portion 3 having the convex portion 3 a and the concave portion on the surface.
For example, the film 2 is laid on the plurality of holding portions 21 described above, and the plurality of holding portions 21 are actuated in advance around the fulcrum 21a, and the contact point between the film 2 and the holding portion 21 is set to U1.
In a state where the film is pushed (pulled up) in the direction (or a state where the film is pushed (pulled) down in the opposite direction to U1), a conductive paste is applied on the film 2 and a flat surface having a predetermined thickness is formed using a squeegee 24. After forming the portion 13, the fulcrum 21a
, A plurality of holding portions 21 are operated, and the contact between the film 2 and the holding portion 21 which is pushed (pulled) up in the U1 direction (or pushed (pulled down) in the opposite direction to U1) is returned to the original position. Thus, the wavy forming portion 3 having the convex portion 3a and the concave portion on the surface may be formed.

【0061】また、上述の第6の実施形態において、図
7(d)に示すように、セラミック素体1と波状形成部
3を接触させた後、図7(e)に示すように、支点21
aを中心に複数の保持部21を作動させ、図7(b)で
U1方向に押し(引き)上げ(あるいはU1とは逆方向
に押し(引き)下げ)たフィルム2と保持部21の接点
を元の位置に戻して、再び平面形成部13としたが、セ
ラミック素体1をD1と逆方向に引き(押し)上げ、あ
るいは波状形成部3をU1と逆方向に引き(押し)下
げ、あるいはこれらを同時に行う前に、必ずしもフィル
ム2と保持部21の接点を元の位置に戻す必要はない。
In the above-described sixth embodiment, after the ceramic body 1 and the corrugated portion 3 are brought into contact with each other as shown in FIG. 7D, as shown in FIG. 21
7 (b), the contact between the film 2 and the holding unit 21 pushed (pulled) up (or pushed (pulled) down in the opposite direction to U1) in FIG. 7 (b). Is returned to the original position, and the plane forming portion 13 is again formed. However, the ceramic body 1 is pulled (pushed) up in the direction opposite to D1, or the wavy forming portion 3 is pulled (pushed) down in the direction opposite to U1, and Alternatively, it is not always necessary to return the contact point between the film 2 and the holding portion 21 to the original position before performing these at the same time.

【0062】〔実施形態7〕本発明に係る第7の実施形
態について、図8に基づいて詳細に説明する。第7の実
施形態は、表面に凸部ならびに凹部を備える波状形成部
を形成する方法を具体的に示したものである。
[Seventh Embodiment] A seventh embodiment according to the present invention will be described in detail with reference to FIG. The seventh embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface.

【0063】まず、図8(a)に示すように、固定部3
1aと複数の固定部31a間に設置された複数の可動部
31bの上面が略平面となるように設置する。次いで、
上述の複数の固定部31aと可動部31b上にフィルム
2を敷き、このフィルム2上に導電性ペーストを与え、
スキージ24を用いて所定の厚みを備える平面形成部1
3を形成する。
First, as shown in FIG.
The plurality of movable portions 31b provided between the first fixed portion 31a and the plurality of fixed portions 31a are installed such that the upper surfaces thereof are substantially flat. Then
The film 2 is laid on the plurality of fixed portions 31a and the movable portions 31b, and a conductive paste is applied on the film 2,
Planar forming section 1 having predetermined thickness using squeegee 24
Form 3

【0064】次いで、図8(b)に示すように、複数の
可動部31bを摺動させ、フィルム2と可動部31bの
接点を、重力とは逆方向であるU1方向に押し(引き)
上げることで、表面に凸部3aならびに凹部を備える波
状形成部3を形成する。また、このような波状形成部3
は、凸部3aと凹部の中間に傾斜部3bを備える。な
お、図8(b)では、フィルム2と可動部31bの接点
をU1方向に押し(引き)上げているが、U1とは逆方
向に押し(引き)下げても構わない。
Next, as shown in FIG. 8B, the plurality of movable parts 31b are slid, and the contact point between the film 2 and the movable parts 31b is pushed (pulled) in the direction U1 opposite to the direction of gravity.
By raising, the wavy forming part 3 provided with the convex part 3a and the concave part on the surface is formed. In addition, such a wavy forming portion 3
Has an inclined portion 3b between the convex portion 3a and the concave portion. In FIG. 8B, the contact point between the film 2 and the movable portion 31b is pushed (pulled) up in the U1 direction, but may be pushed (pulled) down in the direction opposite to U1.

【0065】次いで、セラミック素体を準備し、セラミ
ック素体の端面近傍に電極膜を形成するが、電極膜の形
成方法は、上述の第1の実施形態における電極膜の形成
方法、すなわち、波状形成部3の凸部3aとセラミック
素体1とを接触させることによる電極膜の形成方法、あ
るいは上述の第2の実施形態における電極膜の形成方
法、すなわち、波状形成部3の凸部3aと凹部の間の傾
斜部3bとセラミック素体1とを接触させることによる
電極膜の形成方法、あるいは本発明の範囲内におけるそ
の他の方法による電極膜の形成方法を用いても構わな
い。
Next, a ceramic body is prepared, and an electrode film is formed in the vicinity of the end face of the ceramic body. The method of forming the electrode film is the same as the method of forming the electrode film in the above-described first embodiment, that is, the wavy shape. The method of forming an electrode film by contacting the protrusion 3a of the forming portion 3 with the ceramic body 1, or the method of forming an electrode film in the above-described second embodiment, that is, the method of forming the electrode film in the second embodiment, A method of forming an electrode film by bringing the inclined portion 3b between the concave portions into contact with the ceramic body 1, or a method of forming an electrode film by another method within the scope of the present invention may be used.

【0066】なお、上述の第7の実施形態において、図
8(a)に示すように、固定部31aと複数の固定部3
1a間に設置された複数の可動部31bを、その上面が
略平面となるように設置し、複数の固定部31aと可動
部31b上にフィルム2を敷き、このフィルム2上に導
電性ペーストを与え、スキージ24を用いて所定の厚み
を備える平面形成部13を形成した後、図8(b)に示
すように、複数の可動部31bを摺動させ、フィルム2
と可動部31bの接点をU1方向に押し(引き)上げ
(あるいはU1とは逆方向に押し(引き)下げ)ること
で、表面に凸部3aならびに凹部を備える波状形成部3
を形成したが、例えば、複数の固定部31aと可動部3
1b上にフィルム2を敷き、予め複数の可動部31bを
摺動させ、フィルム2と可動部31bの接点をU1方向
に押し(引き)上げた状態(あるいはU1とは逆方向に
押し(引き)下げた状態)で、このフィルム2上に導電
性ペーストを与え、スキージ24を用いて所定の厚みを
備える平面形成部13を形成した後、U1方向に押し
(引き)上げた(あるいはU1とは逆方向に押し(引
き)下げた)フィルム2と可動部31bの接点を元の位
置に戻して、表面に凸部3aならびに凹部を備える波状
形成部3を形成しても構わない。
In the above-described seventh embodiment, as shown in FIG. 8A, a fixing portion 31a and a plurality of fixing portions 3
1a, a plurality of movable parts 31b are installed such that the upper surfaces thereof are substantially flat, a film 2 is spread on the plurality of fixed parts 31a and the movable parts 31b, and a conductive paste is applied on the film 2. After forming the plane forming portion 13 having a predetermined thickness using the squeegee 24, as shown in FIG.
By pushing (pulling) up (or pushing (pulling) down in the direction opposite to U1) the contact point of the movable portion 31b and the movable portion 31b, the corrugated forming portion 3 having the convex portion 3a and the concave portion on the surface.
Is formed, for example, a plurality of fixed parts 31a and movable parts 3
1b, the film 2 is spread, the plurality of movable parts 31b are slid in advance, and the contact point between the film 2 and the movable part 31b is pushed (pulled) in the U1 direction (or pushed (pulled) in the opposite direction to U1). (In a lowered state), a conductive paste is applied on the film 2 to form a plane forming portion 13 having a predetermined thickness using a squeegee 24, and then pushed (pulled) up in the U1 direction (or U1). The contact between the film 2 (pressed (pulled down) in the opposite direction) and the movable portion 31b may be returned to the original position, and the wavy forming portion 3 having the convex portion 3a and the concave portion on the surface may be formed.

【0067】また、図示していないが、波状形成部3と
セラミック素体を接触させ、波状形成部3を構成する導
電性ペーストが、セラミック素体の側面の所定の濡れ上
がり位置まで達する間に、複数の可動部31bを再び摺
動させ、図8(b)でU1方向に押し(引き)上げた
(あるいはU1とは逆方向に押し(引き)下げた)フィ
ルム2と可動部31bの接点を元の位置に戻して、再び
平面形成部13としても構わない。
Although not shown, the corrugated portion 3 and the ceramic body are brought into contact with each other so that the conductive paste constituting the corrugated portion 3 reaches a predetermined wet-up position on the side surface of the ceramic body. Then, the plurality of movable portions 31b are slid again, and the contact between the film 2 and the movable portion 31b pushed (pulled) up in the U1 direction (or pushed (pulled) down in the opposite direction to U1) in FIG. May be returned to the original position and the plane forming portion 13 may be formed again.

【0068】〔実施形態8〕本発明に係る第8の実施形
態について、図9に基づいて詳細に説明する。第9の実
施形態は、表面に凸部ならびに凹部を備える波状形成部
を形成する方法を具体的に示したものである。
[Eighth Embodiment] An eighth embodiment according to the present invention will be described in detail with reference to FIG. The ninth embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface.

【0069】まず、図9(a)に示すように、シート2
上に一対の櫛歯型プレート42a,42bを準備する。
この櫛歯型プレート42a,42bは、互いの櫛歯を間
挿させることにより、間隙が略なくなる構造を備える。
この状態を閉じた状態とする。他方、閉じた状態の一対
の櫛歯型プレートを、互いに離間する方向に摺動させる
ことにより、互いの櫛歯間に間隙が生じる。この状態を
開いた状態とする。
First, as shown in FIG.
A pair of comb-shaped plates 42a and 42b are prepared on the upper side.
The comb-shaped plates 42a and 42b have a structure in which a gap is substantially eliminated by inserting the comb teeth of each other.
This state is referred to as a closed state. On the other hand, by sliding the pair of comb-shaped plates in a closed state in a direction away from each other, a gap is created between the comb teeth. This state is referred to as an open state.

【0070】次いで、一対の閉じた櫛歯プレート42
a,42b上に導電性ペーストを与えた後、従来の平面
スキージ24を用いて平面形成部13を形成する。
Next, a pair of closed comb tooth plates 42
After the conductive paste is applied to a and b, the plane forming portion 13 is formed using a conventional plane squeegee 24.

【0071】次いで、図9(b)に示すように、櫛歯型
プレート42a,42bを互いに離間するM2,M3方
向に摺動させて櫛歯を開き、櫛歯の間隙42cに平面形
成部13を構成する導電性ペーストを流入させ、表面に
凸部ならびに凹部を備える波状形成部43を形成する。
なお、本実施形態による場合、互いの櫛歯間の間隙に導
電性ペーストが流入するため、平面形成部13に凹部が
形成される点に特徴があるが、凹部が形成されていない
部位を、便宜上凸部と呼ぶことにする。また、このよう
な波状形成部43は、凸部と凹部の間に傾斜部を備え
る。
Next, as shown in FIG. 9 (b), the comb teeth are opened by sliding the comb-shaped plates 42a and 42b in the directions M2 and M3 which are separated from each other, and the plane forming portion 13 is formed in the gap 42c between the comb teeth. Is formed, and a wavy forming portion 43 having a convex portion and a concave portion on the surface is formed.
According to the present embodiment, since the conductive paste flows into the gap between the comb teeth, a feature is that a concave portion is formed in the planar forming portion 13. For convenience, they will be referred to as convex portions. Further, such a wavy forming portion 43 includes an inclined portion between the convex portion and the concave portion.

【0072】次いで、セラミック素体を準備し、セラミ
ック素体の端面近傍に電極膜を形成するが、電極膜の形
成方法は、上述の第1の実施形態における電極膜の形成
方法、すなわち、波状形成部3の凸部とセラミック素体
1とを接触させることによる電極膜の形成方法、あるい
は上述の第2の実施形態における電極膜の形成方法、す
なわち、波状形成部3の凸部と凹部の間の傾斜部とセラ
ミック素体1とを接触させることによる電極膜の形成方
法、あるいは本発明の範囲内におけるその他の方法によ
る電極膜の形成方法を用いても構わない。
Next, a ceramic body is prepared, and an electrode film is formed near the end face of the ceramic body. The method for forming the electrode film is the same as the method for forming the electrode film in the above-described first embodiment, that is, the wavy shape. The method for forming an electrode film by contacting the convex portion of the forming portion 3 with the ceramic body 1, or the method for forming an electrode film in the above-described second embodiment, that is, the method of forming the convex portion and the concave portion of the wavy forming portion 3 A method of forming an electrode film by bringing the ceramic body 1 into contact with the inclined portion between them, or a method of forming an electrode film by another method within the scope of the present invention may be used.

【0073】なお、図示していないが、一対の開いた櫛
歯プレート上に導電性ペーストを与えた後、従来の平面
スキージを用いて平面形成部を形成し、次いで、櫛歯型
プレートを互いに間挿する方向に摺動させ櫛歯を閉じ、
櫛歯の間隙に流入していた平面形成部を構成する導電性
ペーストを押し上げて、表面に凸部ならびに凹部を備え
る波状形成部を形成し、次いで、セラミック素体を準備
し、セラミック素体の端面近傍に電極膜を形成を形成し
ても構わない。
Although not shown, after a conductive paste is applied to a pair of open comb-tooth plates, a plane forming portion is formed using a conventional flat squeegee. Slide in the inserting direction to close the comb teeth,
The conductive paste forming the plane forming portion that has flowed into the gap between the comb teeth is pushed up to form a wavy forming portion having a convex portion and a concave portion on the surface, and then a ceramic body is prepared. An electrode film may be formed near the end face.

【0074】〔実施形態9〕本発明に係る第9の実施形
態について、図10に基づいて詳細に説明する。第9の
実施形態は、表面に凸部ならびに凹部を備える波状形成
部を形成する方法ならびにセラミック素体に電極膜を形
成する方法を具体的に示したものである。
Embodiment 9 A ninth embodiment according to the present invention will be described in detail with reference to FIG. The ninth embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface and a method of forming an electrode film on a ceramic body.

【0075】まず、図10に示すように、複数の貫通孔
52bを備えるプレート52aを準備する。貫通孔52
bの形状,個数ならびに配置位置は、特に限定はしない
が、例えば、等間隔に配置された複数の円柱形状の貫通
孔52bを備えるプレート52aが好ましい。
First, as shown in FIG. 10, a plate 52a having a plurality of through holes 52b is prepared. Through hole 52
The shape, number, and arrangement position of b are not particularly limited. For example, a plate 52a having a plurality of cylindrical through holes 52b arranged at equal intervals is preferable.

【0076】次いで、プレート52aを上面とするケー
ス52の内部に導電性ペースト53を充填し、押圧支具
54を重力とは反対方向であるU1方向に作動させて、
複数の貫通孔52bから導電性ペースト53を押し出し
て、プレート52a上にペースト溜めを形成する。プレ
ート52a上に押し出されたペースト溜めは、凸型形状
をなす。
Next, the inside of the case 52 having the plate 52a as the upper surface is filled with the conductive paste 53, and the pressing member 54 is operated in the U1 direction opposite to the direction of gravity.
The conductive paste 53 is extruded from the plurality of through holes 52b to form a paste reservoir on the plate 52a. The paste reservoir extruded onto the plate 52a has a convex shape.

【0077】次いで、セラミック素体を準備し、セラミ
ック素体の端面近傍に電極膜を形成するが、電極膜の形
成方法は、上述の第1の実施形態における電極膜の形成
方法、すなわち、ペースト溜めとセラミック素体1とを
接触させることによる電極膜の形成方法、あるいは本発
明の範囲内におけるその他の方法による電極膜の形成方
法を用いても構わない。
Next, a ceramic body is prepared, and an electrode film is formed near the end face of the ceramic body. The method for forming the electrode film is the same as the method for forming the electrode film in the above-described first embodiment, that is, the paste method. A method of forming an electrode film by bringing the reservoir into contact with the ceramic body 1, or a method of forming an electrode film by another method within the scope of the present invention may be used.

【0078】なお、図示していないが、プレート52a
上に導電性ペーストを与えた後、従来の平面スキージを
用いて平面形成部を形成し,次いで、プレート52aを
上面とするケース52の内部に導電性ペースト53を充
填し、押圧支具54をU1方向に作動させて、複数の貫
通孔52bから導電性ペースト53を押し出して、表面
に凸部ならびに凹部を備える波状形成部形成し、次い
で、セラミック素体の端面近傍に電極膜を形成しても構
わない。
Although not shown, the plate 52a
After applying the conductive paste on the upper surface, a plane forming portion is formed using a conventional flat squeegee, and then the conductive paste 53 is filled in a case 52 having a plate 52a as an upper surface, and a pressing fixture 54 is formed. By operating in the U1 direction, the conductive paste 53 is extruded from the plurality of through-holes 52b to form a wavy forming portion having a convex portion and a concave portion on the surface, and then an electrode film is formed near the end face of the ceramic body. No problem.

【0079】また、上述の第9の実施形態において、複
数の貫通孔52bから導電性ペースト53を押し出す手
段として押圧支具54を用いたが、例えば、ポンプを準
備し、ケース52の内部に導電性ペースト53を充填す
る手段を用いても構わない。
In the ninth embodiment, the pressing support 54 is used as a means for extruding the conductive paste 53 from the plurality of through holes 52b. For example, a pump is prepared and the conductive Means for filling the conductive paste 53 may be used.

【0080】〔実施形態10〕本発明に係る第10の実
施形態について、図11に基づいて詳細に説明する。第
10の実施形態は、表面に凸部ならびに凹部を備える波
状形成部を形成する方法を具体的に示したものである。
[Embodiment 10] A tenth embodiment according to the present invention will be described in detail with reference to FIG. The tenth embodiment specifically shows a method of forming a wavy forming portion having a convex portion and a concave portion on the surface.

【0081】まず、図11に示すように、回転する小ロ
ール61a、大ロール61b、複数の突起62bを表面
に備える可塑性のあるプレート62a、従来のスキージ
24、導電性ペースト63を準備し、プレート62aの
裏面側を大ロール61bを用いてキャタピラ状に支持
し、支持されたプレート62aの表面の一部箇所を小ロ
ール51aに接近させる。次いで、小ロール61aの下
部を導電性ペースト63に浸しこれを回転させ、この小
ロール61aの回転とは逆方向に大ロール61bを回転
させることで、小ロール61aに付着した導電性ペース
ト63が曲面を帯びたプレート62aの表面に与えられ
る。次いで、スキージ24によってプレート62a上に
平面形成部13が形成される。
First, as shown in FIG. 11, a rotating small roll 61a, a large roll 61b, a plastic plate 62a having a plurality of protrusions 62b on its surface, a conventional squeegee 24, and a conductive paste 63 are prepared. The back side of 62a is supported in a caterpillar shape using a large roll 61b, and a part of the surface of the supported plate 62a is made to approach the small roll 51a. Next, the lower part of the small roll 61a is immersed in the conductive paste 63 and rotated, and the large roll 61b is rotated in a direction opposite to the rotation of the small roll 61a, so that the conductive paste 63 attached to the small roll 61a is removed. It is provided on the surface of the plate 62a having a curved surface. Next, the squeegee 24 forms the plane forming portion 13 on the plate 62a.

【0082】次いで、平面形成部13が形成されたプレ
ート62aの裏面側が直線平面となるように支持する。
具体的には、例えば、プレート62aを大ロール62a
の支持から離し、プレート62aの裏面側が直線平面と
なるように下部を支持する方法がある。この時、プレー
ト62a上の複数の突起62b同士の間隙が狭められる
ことにより、平面形成部13を構成し複数の突起62b
同士の間隙に充填されていた導電性ペースト63が平面
形成部13の表面に押し出され、表面に凸部3aまたは
/および凹部を備える波状形成部3が形成される。な
お、このような波状形成部3は、凸部3aと凹部の間に
傾斜部3bを備える。
Next, the plate 62a on which the plane forming portion 13 is formed is supported such that the rear surface side is a straight plane.
Specifically, for example, the plate 62a is
There is a method of supporting the lower portion of the plate 62a such that the lower surface is separated from the support of the plate 62a so that the back surface side of the plate 62a is a linear plane. At this time, the gap between the plurality of protrusions 62b on the plate 62a is narrowed, so that the planar forming portion 13 is formed and the plurality of protrusions 62b
The conductive paste 63 filled in the gap between them is extruded onto the surface of the planar forming portion 13 to form the wavy forming portion 3 having the convex portion 3a and / or the concave portion on the surface. Note that such a wavy forming portion 3 includes an inclined portion 3b between the convex portion 3a and the concave portion.

【0083】なお、小ロール61aならびに大ロール6
1bのサイズならびに材質、プレート62aならびに突
起62bの材質、複数の突起62b同士の間隔は、特に
限定されず、波状形成部3の凸部3aならびに傾斜部3
bが所望するサイズならびに形状となるよう適宜調整さ
れる。
The small roll 61a and the large roll 6
The size and material of the projection 1b, the material of the plate 62a and the projection 62b, and the interval between the plurality of projections 62b are not particularly limited.
b is appropriately adjusted so as to have a desired size and shape.

【0084】次いで、セラミック素体を準備し、セラミ
ック素体の端面近傍に電極膜を形成するが、電極膜の形
成方法は、上述の第1の実施形態における電極膜の形成
方法、すなわち、波状形成部3の凸部とセラミック素体
1とを接触させることによる電極膜の形成方法、あるい
は上述の第2の実施形態における電極膜の形成方法、す
なわち、波状形成部3の凸部と凹部の間の傾斜部とセラ
ミック素体1とを接触させることによる電極膜の形成方
法、あるいは本発明の範囲内におけるその他の方法によ
る電極膜の形成方法を用いても構わない。
Next, a ceramic body is prepared, and an electrode film is formed near the end face of the ceramic body. The method for forming the electrode film is the same as the method for forming the electrode film in the above-described first embodiment, that is, the wavy shape. The method for forming an electrode film by contacting the convex portion of the forming portion 3 with the ceramic body 1, or the method for forming an electrode film in the above-described second embodiment, that is, the method of forming the convex portion and the concave portion of the wavy forming portion 3 A method of forming an electrode film by bringing the ceramic body 1 into contact with the inclined portion between them, or a method of forming an electrode film by another method within the scope of the present invention may be used.

【0085】〔実施形態11〕第11の実施形態は、上
述した第1〜4ならびに第9の実施形態を発展させた、
セラミック素体に電極膜を形成する方法を具体的に示し
たものである。まず、上述した第1〜4ならびに第9の
実施形態の方法によって、セラミック素体の端面に端子
電極となるべき第1電極膜を形成する。この第1電極膜
は、本発明の製造方法によるため、端子電極中に気泡が
内包されていないが、従来技術のように導電性ペースト
の平面形成部に浸漬して形成した従来の端子電極と比較
して、セラミック素体の端面の濡れ上がり位置の精度が
低下する恐れがある。そこで、新たに導電性ペーストを
与えて平面形成部を形成し、この平面形成部と、第1電
極膜を備えるセラミック素体と、を互いに接触させ、第
1電極膜を覆うように第2電極膜を形成することが好ま
しい。セラミック素体のように、直線平面で囲まれた物
体の平面と平面形成部とを、従来例である図13(a)
に示すように面と面が接触するように浸漬すると、端子
電極中に気泡が内包する問題が生じるが、セラミック素
体の端面に本発明の製造方法によって第1電極膜を形成
すると、第1電極膜は塗布により形成された電極膜であ
るため僅かながらRを備えた曲面となり、この第1電極
膜を新たに形成した平面形成部中に浸漬しても、第2電
極膜中に気泡が内包する問題は生じない。また、このよ
うな方法で第2電極膜を形成することにより、第2電極
膜の濡れ上がり位置の精度は従来技術と同等となり、な
おかつ端子電極中に気泡が内包されていないという本発
明の効果も得られる。
[Eleventh Embodiment] The eleventh embodiment is obtained by developing the first to fourth and ninth embodiments described above.
It specifically shows a method of forming an electrode film on a ceramic body. First, a first electrode film to be a terminal electrode is formed on the end face of the ceramic body by the methods of the first to fourth and ninth embodiments described above. Since the first electrode film is formed by the manufacturing method of the present invention, no air bubbles are included in the terminal electrode. In comparison, the accuracy of the wetting position of the end face of the ceramic body may be reduced. Then, a new conductive paste is applied to form a planar forming portion, and the planar forming portion and the ceramic body having the first electrode film are brought into contact with each other, and the second electrode is formed so as to cover the first electrode film. Preferably, a film is formed. As shown in FIG. 13A, which is a conventional example, a plane of an object surrounded by a straight line plane and a plane forming portion, such as a ceramic body, are formed.
When the electrodes are immersed so that the surfaces come into contact with each other as shown in (1), there is a problem that air bubbles are included in the terminal electrode. However, when the first electrode film is formed on the end surface of the ceramic body by the manufacturing method of the present invention, Since the electrode film is an electrode film formed by coating, the electrode film has a slightly curved surface with R. Even if the first electrode film is immersed in the newly formed flat portion, bubbles are generated in the second electrode film. There is no problem of inclusion. Further, by forming the second electrode film by such a method, the accuracy of the wet-up position of the second electrode film becomes equivalent to that of the prior art, and the effect of the present invention that no air bubbles are included in the terminal electrode. Is also obtained.

【0086】なお、第1電極膜と第2電極膜を構成する
導電性ペーストは、同一材料からなるものであっても、
また異なる材料からなるものであっても構わない。
The conductive paste forming the first electrode film and the second electrode film may be made of the same material.
Also, they may be made of different materials.

【0087】[0087]

【実施例】まず、これらを図12(a)に示すように、
長さLが3.2mm、幅Wが2.5mm、厚さTが1.
5mmである複数のセラミック素体1を準備し、シリコ
ンゴムからなる素子ホルダ25にピッチP1が4.0m
mとなるようにそれぞれ20個ずつ固定した。なお、幅
Wと厚さTの対角線長さAは、2.92mmとなる。
[Embodiment] First, as shown in FIG.
The length L is 3.2 mm, the width W is 2.5 mm, and the thickness T is 1.
A plurality of ceramic element bodies 1 each having a length of 5 mm are prepared, and the pitch P1 is set to 4.0 m on the element holder 25 made of silicon rubber.
m were fixed to 20 pieces each. Note that the diagonal length A of the width W and the thickness T is 2.92 mm.

【0088】次いで、銅粉末20体積%と、ガラスフリ
ット5体積%と、アクリル樹脂とターピネオールを混合
してなる有機ビヒクル75体積%とを混合し、粘度が約
20Pa・sの導電性ペーストを作製した。
Next, 20% by volume of copper powder, 5% by volume of glass frit, and 75% by volume of an organic vehicle obtained by mixing an acrylic resin and terpineol are mixed to prepare a conductive paste having a viscosity of about 20 Pa · s. did.

【0089】次いで、上述した第5の実施形態における
図6(c)に示したスキージ14cを用いて、図12
(a)ならびに図12(b)に示すような試料1〜6の
波状形成部3をフィルム2上に形成した。なお、波状形
成部3のピッチP2(凸部の頂点部間距離)が、ピッチ
P1と同じ4.0mmである試料1〜3については、波
状形成部の凸部厚みH1、凹部厚みH2、波状形成部の
畝の高さΔh(H1とH2の差)を測定し、波状形成部
3のピッチP3がピッチP1の2倍にあたる8.0mm
である試料4〜6については、セラミック素体1が接触
する傾斜部の傾斜角θと、セラミック素体1が接触する
傾斜部における波状形成部の厚みH3を測定し、これら
を表1にまとめた。
Next, using the squeegee 14c shown in FIG. 6C in the fifth embodiment described above, FIG.
As shown in FIG. 12A and FIG. 12B, the corrugated portions 3 of the samples 1 to 6 were formed on the film 2. For samples 1 to 3 in which the pitch P2 (the distance between the apexes of the convex portions) of the wavy forming portion 3 is 4.0 mm, which is the same as the pitch P1, the convex portion thickness H1, the concave portion thickness H2 of the wavy forming portion, The height Δh (difference between H1 and H2) of the ridge of the forming portion was measured, and the pitch P3 of the wavy forming portion 3 was 8.0 mm, which is twice the pitch P1.
For Samples 4 to 6, the inclination angle θ of the inclined portion where the ceramic body 1 is in contact and the thickness H3 of the corrugated portion in the inclined portion where the ceramic body 1 is in contact are measured, and these are summarized in Table 1. Was.

【0090】[0090]

【表1】 [Table 1]

【0091】次いで、上述した導電性ペーストを用い
て、厚みが0.6mmの従来例である試料7の平面形成
部を形成した。
Next, using the above-mentioned conductive paste, a plane-formed portion of a conventional sample 7 having a thickness of 0.6 mm was formed.

【0092】次いで、図12(a)に示すように、試料
1〜3の波状形成部3の凸部3a上部に上述したセラミ
ック素体1を配置し、素子ホルダー25ごと5.0mm
/sの速度でセラミック素体1の端面がフィルム2に接
するまで下降させ、接した状態で3秒間静止させた後、
再び素子ホルダー25ごと5.0mm/sの速度でセラ
ミック素体1を上昇させて、セラミック素体1の端面に
試料1〜3の第1電極膜を形成した。
Next, as shown in FIG. 12 (a), the above-mentioned ceramic body 1 was placed above the convex portions 3a of the corrugated portions 3 of the samples 1 to 3, and the entire element holder 25 was 5.0 mm.
/ S until the end surface of the ceramic body 1 comes into contact with the film 2, and after standing still for 3 seconds in a state of contact,
Again, the ceramic body 1 was raised together with the element holder 25 at a speed of 5.0 mm / s, and the first electrode films of the samples 1 to 3 were formed on the end surfaces of the ceramic body 1.

【0093】同様に、試料4〜6の波状形成部3の傾斜
部3b上部に上述したセラミック素体1を配置し、素子
ホルダー25ごと5.0mm/sの速度でセラミック素
体1の端面がフィルム2に接するまで下降させ、接した
状態で3秒間静止させた後、再び素子ホルダー25ごと
5.0mm/sの速度でセラミック素体1を上昇させ
て、セラミック素体1の端面に試料4〜6の第1電極膜
を形成した。
Similarly, the above-described ceramic body 1 is arranged above the inclined portion 3b of the corrugated portion 3 of the samples 4 to 6, and the end face of the ceramic body 1 is moved together with the element holder 25 at a speed of 5.0 mm / s. After being lowered until it comes into contact with the film 2, and kept still for 3 seconds while in contact with the film 2, the ceramic body 1 is again raised together with the element holder 25 at a speed of 5.0 mm / s, and the sample 4 is placed on the end face of the ceramic body 1. To 6 first electrode films were formed.

【0094】また、重力方向に垂直な平面上に形成され
た試料7の平面形成部の平面上部に上述したセラミック
素体を配置し、素子ホルダーごと5.0mm/sの速度
でセラミック素体の端面がフィルム2に接するまで重力
方向に下降させ、接した状態で3秒間静止させた後、再
び素子ホルダーごと5.0mm/sの速度でセラミック
素体を上昇させて、セラミック素体の端面に試料7の第
1電極膜を形成した。
Further, the above-mentioned ceramic body is arranged on the upper surface of the plane forming portion of the sample 7 formed on the plane perpendicular to the direction of gravity, and the ceramic body is placed together with the element holder at a speed of 5.0 mm / s. After lowering in the direction of gravity until the end surface contacts the film 2 and resting for 3 seconds in the state of contact, the ceramic body together with the element holder is raised again at a speed of 5.0 mm / s. A first electrode film of Sample 7 was formed.

【0095】次いで、試料1〜7の電極膜を、100℃
で20分間乾燥させた後、大気中で750℃10分ピー
クの条件で焼付けして、本焼成することで端子電極とな
るべき第1乾燥電極膜を備える試料1〜7の試験サンプ
ルをそれぞれ100個ずつ得た。
Next, the electrode films of Samples 1 to 7 were heated at 100 ° C.
And then baking in air at 750 ° C. for 10 minutes under a peak condition, and 100% of each of the test samples 1 to 7 having the first dry electrode film to be a terminal electrode by baking. I got one by one.

【0096】次いで、試料1と試料4については、乾燥
前の第1電極膜を備えるセラミック素体を、さらに重力
方向に垂直な平面上に形成された厚みが0.6mmの平
面形成部上に配置し、上述した試料7と同様の方法によ
って第1電極膜上に第2電極膜を形成し、これを乾燥さ
せて、第2乾燥電極膜を備える試験サンプルを100個
ずつ得た。
Next, for Samples 1 and 4, the ceramic body having the first electrode film before drying was further placed on a plane forming portion having a thickness of 0.6 mm formed on a plane perpendicular to the direction of gravity. The second electrode film was formed on the first electrode film by the same method as that of the above-described sample 7, and was dried to obtain 100 test samples each including the second dry electrode film.

【0097】そこで、試料1〜7の試験サンプルについ
て、第1乾燥電極膜における気泡混入率ならびに形状不
良率を測定し、試料1および試料4については、第2乾
燥電極膜を備える試験サンプルの形状不良率を測定し、
これに評価を与えて、表2にまとめた。
Therefore, for the test samples of Samples 1 to 7, the bubble mixing ratio and the shape defect ratio in the first dry electrode film were measured, and for Samples 1 and 4, the shape of the test sample having the second dry electrode film was measured. Measure the defect rate,
This was evaluated and summarized in Table 2.

【0098】なお、気泡混入率は、第1乾燥電極膜中に
気泡を内包する試験サンプル数を計数し、全数100個
における発生割合とした。
The bubble mixing ratio was determined by counting the number of test samples including bubbles in the first dry electrode film and calculating the ratio of occurrence in all 100 samples.

【0099】また、形状不良率は、濡れ上がり位置(e
寸法)不良ならびに第1乾燥電極膜間のギャップ(g寸
法)不良が生じている試験サンプル数を計数し、全数1
00個における発生割合とした。
The shape defect rate is calculated based on the wetting position (e
Dimensions) The number of test samples having a defect and a gap (g dimension) defect between the first dry electrode films was counted, and the total number was 1
The occurrence rate was set at 00 pieces.

【0100】また、評価は、本発明の特に優れる範囲内
である試料については◎、次に優れる試料については
○、上述の◎○と比較して僅かに劣るが本発明の範囲内
である試料については△、本発明の範囲外である従来例
については×を付した。なお、試料1および試料4の評
価は、第2乾燥電極膜を備える試験サンプルの評価とし
た。
The evaluation was as follows: 試 料 for the sample within the particularly excellent range of the present invention, ○ for the next most excellent sample, and the sample slightly inferior to the above-mentioned ○ but within the range of the present invention. Is marked with Δ, and with respect to the conventional example outside the scope of the present invention, x is marked. In addition, the evaluation of the sample 1 and the sample 4 was the evaluation of the test sample provided with the second dry electrode film.

【0101】[0101]

【表2】 [Table 2]

【0102】表1および表2から明らかであるように、
波状形成部3の凸部3aにセラミック素体1の端面を接
触させて乾燥電極膜を形成した試料1〜3の試験サンプ
ルのうち、畝の高さΔhが対角線長さAの0.02倍で
ある0.06mmよりも大きい試料1および試料2の試
験サンプルは、気泡混入率が0%で低く優れた。なお、
第1乾燥電極膜の形状不良率は、畝の高さΔhが0.2
mmである試料2については0%であったが、畝の高さ
Δhが0.4mmである試料1については25%で高く
劣った。しかしながら、第2乾燥電極膜を形成した試料
1の試験サンプルの形状不良率は0%であった。これ
は、第2乾燥電極膜を形成することで、乾燥電極膜の濡
れ上がり位置を調整することができたことによるもので
ある。したがって、試料1および試料2の試験サンプル
は、いずれも気泡混入率が0%であり、端子電極となる
べき乾燥電極膜の形状不良率も0%であることから、本
発明の範囲内であるといえる。特に、試料2の試験サン
プルは、第一乾燥電極膜を形成した時点で形状不良率が
ないことから、本発明の特に優れる範囲内となった。
As is clear from Tables 1 and 2,
Among the test samples of Samples 1 to 3 in which the dry electrode film was formed by bringing the end face of the ceramic body 1 into contact with the projection 3a of the wavy forming portion 3, the height Δh of the ridge was 0.02 times the diagonal length A. The test samples of Sample 1 and Sample 2 which are larger than 0.06 mm, which is less than 0.06 mm, had an excellent rate of air bubbles of 0%. In addition,
The shape defect rate of the first dry electrode film is such that the ridge height Δh is 0.2
Sample 2 having a ridge height of 0.4 mm was 0%, whereas Sample 1 having a ridge height Δh of 0.4 mm was as high as 25%. However, the shape defect rate of the test sample of Sample 1 on which the second dry electrode film was formed was 0%. This is because the formation position of the second dry electrode film could adjust the wetted position of the dry electrode film. Therefore, the test samples of Sample 1 and Sample 2 both have a bubble mixing ratio of 0% and a defective shape ratio of a dry electrode film to be a terminal electrode of 0%, which is within the scope of the present invention. It can be said that. In particular, since the test sample of Sample 2 had no shape defect rate at the time when the first dry electrode film was formed, it was within the particularly excellent range of the present invention.

【0103】また、畝の高さΔhが対角線長さAの0.
02倍である0.06mmよりも小さい試料3の試験サ
ンプルは、第1乾燥電極膜の形状不良率は0%であった
が、気泡混入率が1%であり、上述した試料1および試
料2の試験サンプルと比較して、僅かに劣る結果となっ
た。しかしながら、従来例である試料7の試験サンプル
の気泡混入率と比較して明らかに低く優れることから、
試料3も本発明の範囲内であるといえる。
The height .DELTA.h of the ridge is 0.1 mm of the diagonal length A.
In the test sample of Sample 3 smaller than 0.06 mm, which is 02 times, the shape defect rate of the first dry electrode film was 0%, but the air bubble mixing rate was 1%. The result was slightly inferior to the test sample of No. However, since it is clearly lower and superior compared to the bubble incorporation rate of the test sample of Sample 7 which is a conventional example,
Sample 3 is also within the scope of the present invention.

【0104】また、波状形成部3の傾斜部3bにセラミ
ック素体1の端面を接触させて乾燥電極膜を形成した試
料4〜6の試験サンプルのうち、傾斜角θが1度を超え
る試料5および試料6の試験サンプルは、気泡混入率が
0%で低く優れた。なお、第1乾燥電極膜の形状不良率
は、傾斜角θが5度である試料5については0%であっ
たが、傾斜角θが8度である試料4については56%で
高く劣った。しかしながら、第2乾燥電極膜を形成した
試料4の試験サンプルの形状不良率は0%であった。し
たがって、試料4および試料5の試験サンプルは、いず
れも気泡混入率が0%であり、端子電極となるべき乾燥
電極膜の形状不良率も0%であることから、本発明の範
囲内であるといえる。特に、試料5の試験サンプルは、
第一乾燥電極膜を形成した時点で形状不良率がないこと
から、本発明の特に優れる範囲内となった。
Further, of the test samples 4 to 6 in which the end surface of the ceramic body 1 was brought into contact with the inclined portion 3b of the wavy forming portion 3 to form a dry electrode film, the sample 5 having an inclination angle θ of more than 1 degree In addition, the test sample of Sample 6 was excellent because the air bubble incorporation rate was 0%. The shape defect rate of the first dry electrode film was 0% for the sample 5 having the inclination angle θ of 5 degrees, but was 56% and high for the sample 4 having the inclination angle θ of 8 degrees. . However, the shape defect rate of the test sample of Sample 4 on which the second dry electrode film was formed was 0%. Therefore, the test samples of Sample 4 and Sample 5 both have a bubble mixing ratio of 0% and a defective shape ratio of a dry electrode film to be a terminal electrode of 0%, and thus are within the scope of the present invention. It can be said that. In particular, the test sample of Sample 5 is
Since there was no shape defect rate at the time of forming the first dry electrode film, it was within the particularly excellent range of the present invention.

【0105】また、傾斜角θが1度である試料6の試験
サンプルは、第1乾燥電極膜の形状不良率は0%であっ
たが、気泡混入率が1%であり、上述した試料4および
試料5の試験サンプルと比較して、僅かに劣る結果とな
った。しかしながら、従来例である試料7の試験サンプ
ルの気泡混入率と比較して明らかに低く優れることか
ら、試料6も本発明の範囲内であるといえる。
In the test sample 6 having an inclination angle θ of 1 degree, the shape defect rate of the first dry electrode film was 0%, but the air bubble mixing rate was 1%. And the result was slightly inferior to the test sample of Sample 5. However, the sample 6 is also within the scope of the present invention because it is clearly lower and superior to the test sample 7 as a conventional sample compared with the test sample.

【0106】これに対して、重力方向に垂直な平面上に
形成された平面形成部にセラミック素体の端面を接触さ
せて第1乾燥電極膜を形成した、従来例である試料7の
試験サンプルは、形状不良率は0%であったが、気泡混
入率が53.0%であり、高く劣った。
On the other hand, the test sample of the prior art sample 7, in which the first dry electrode film was formed by bringing the end face of the ceramic body into contact with the plane forming portion formed on the plane perpendicular to the direction of gravity, Although the defective shape rate was 0%, the air bubble mixing rate was 53.0%, which was very poor.

【0107】[0107]

【発明の効果】以上のように本発明のセラミック電子部
品の製造方法によれば、導電性ペーストを用いて、表面
に凸部または/および凹部を備える波状形成部を形成す
る第1工程と、凸部の頂点部あるいは凸部または/およ
び凹部により構成される傾斜部と、セラミック素体の端
面と、を互いに接触させ、セラミック素体の端面に端子
電極となるべき第1電極膜を形成する第2工程と、を備
えることを特徴とすることで、端子電極内に気泡が内包
されないように端子電極が形成されたセラミック電子部
品を提供することができるという効果が得られる。
As described above, according to the method for manufacturing a ceramic electronic component of the present invention, a first step of forming a corrugated portion having a convex portion and / or a concave portion on a surface thereof using a conductive paste; The top portion of the convex portion or the inclined portion formed by the convex portion and / or the concave portion and the end surface of the ceramic body are brought into contact with each other to form a first electrode film to be a terminal electrode on the end surface of the ceramic body. The second step is characterized in that it is possible to provide a ceramic electronic component in which the terminal electrode is formed such that bubbles are not included in the terminal electrode.

【0108】また、本発明のセラミック電子部品の製造
方法によれば導電性ペーストを用いて、重力方向に垂直
な平面に対して傾斜を備える平面形成部を形成する第1
工程と、平面形成部と、セラミック素体の端面と、を重
力方向あるいは重力とは逆方向に接近させて接触させ、
セラミック素体の端面に端子電極となるべき第1電極膜
を形成する第2工程と、を備えることを特徴とすること
で、端子電極内に気泡が内包されないように端子電極が
形成されたセラミック電子部品を提供することができる
という効果が得られる。
Further, according to the method of manufacturing a ceramic electronic component of the present invention, the first step of forming a plane forming portion having an inclination with respect to a plane perpendicular to the direction of gravity using a conductive paste.
The process, the plane forming portion, and the end face of the ceramic body are brought into contact with each other in the direction of gravity or in the direction opposite to gravity,
A second step of forming a first electrode film to be a terminal electrode on an end face of the ceramic body, wherein the terminal electrode is formed such that bubbles are not included in the terminal electrode. The effect that an electronic component can be provided is obtained.

【0109】また、本発明の波状形成部の製造方法によ
れば、上述したセラミック電子部品の製造方法で用いる
波状形成部を容易に形成することができ、端子電極内に
気泡が内包されないように端子電極が形成されたセラミ
ック電子部品を確実に提供することができるという効果
が得られる。
Further, according to the method of manufacturing a wavy forming portion of the present invention, the wavy forming portion used in the above-described method of manufacturing a ceramic electronic component can be easily formed, so that air bubbles are not included in the terminal electrodes. The effect is obtained that the ceramic electronic component on which the terminal electrodes are formed can be reliably provided.

【0110】また、本発明のセラミック電子部品の製造
方法は、導電性ペーストを用いて平面形成部を形成する
第3工程と、平面形成部と、第1電極膜を備えるセラミ
ック素体と、を互いに接触させ、第1電極膜上に第2電
極膜を形成する第4工程と、をさらに備えることを特徴
とすることで、気泡が内包されていない第1電極膜上
に、セラミック素体の端部の所望する位置まで正しく濡
れ上がった第2電極膜を備えるセラミック電子部品を提
供することができる効果が得られる。
Further, the method for manufacturing a ceramic electronic component of the present invention includes the third step of forming a plane forming portion using a conductive paste, and a ceramic body having a plane forming portion and a first electrode film. And a fourth step of forming a second electrode film on the first electrode film by contacting each other with each other. The effect of being able to provide a ceramic electronic component including the second electrode film that has been properly wetted to the desired position at the end is obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る第1の実施形態に関する説明図で
あり、図1(a)は波状形成部とセラミック素体とを接
触させる際の位置関係を示した断面図であり、図1
(b)は波状形成部とセラミック素体とが接触を開始す
る位置を示した断面図であり、図1(c)はセラミック
素体の側面の所定位置まで導電性ペーストが濡れ上がっ
た状態を示した断面図である。
FIG. 1 is an explanatory diagram relating to a first embodiment according to the present invention, and FIG. 1 (a) is a cross-sectional view illustrating a positional relationship when a corrugated portion and a ceramic body are brought into contact with each other;
FIG. 1B is a cross-sectional view showing a position where the corrugated portion and the ceramic body start contacting, and FIG. 1C shows a state in which the conductive paste has wetted to a predetermined position on the side surface of the ceramic body. FIG.

【図2】本発明に係る第2の実施形態に関する説明図で
あり、図2(a)は波状形成部とセラミック素体とを接
触させる際の位置関係を示した断面図であり、図2
(b)は波状形成部とセラミック素体とが接触を開始す
る位置を示した断面図であり、図2(c)はセラミック
素体の側面の所定位置まで導電性ペーストが濡れ上がっ
た状態を示した断面図である。
FIG. 2 is an explanatory view of a second embodiment according to the present invention, and FIG. 2 (a) is a cross-sectional view showing a positional relationship when a corrugated portion and a ceramic body are brought into contact with each other;
FIG. 2B is a cross-sectional view showing a position where the corrugated portion and the ceramic body start contacting, and FIG. 2C shows a state where the conductive paste has wetted to a predetermined position on the side surface of the ceramic body. FIG.

【図3】本発明に係る第3の実施形態に関する説明図で
あり、図3(a)は平面形成部とセラミック素体とを接
触させる際の位置関係を示した断面図であり、図3
(b)は平面形成部とセラミック素体とが接触を開始す
る位置を示した断面図であり、図3(c)はセラミック
素体の側面の所定位置まで導電性ペーストが濡れ上がっ
た状態を示した断面図である。
FIG. 3 is an explanatory diagram relating to a third embodiment according to the present invention, and FIG. 3 (a) is a cross-sectional view illustrating a positional relationship when a plane forming portion and a ceramic body are brought into contact with each other;
FIG. 3B is a cross-sectional view showing a position where the plane forming portion and the ceramic body start contacting, and FIG. 3C shows a state where the conductive paste has wetted to a predetermined position on the side surface of the ceramic body. FIG.

【図4】本発明に係る第4の実施形態に関する説明図で
あり、図4(a)は平面形成部とセラミック素体とを接
触させる際の位置関係を示した断面図であり、図4
(b)は平面形成部とセラミック素体とが接触を開始す
る位置を示した断面図であり、図4(c)はセラミック
素体の側面の所定位置まで導電性ペーストが濡れ上がっ
た状態を示した断面図である。
FIG. 4 is an explanatory view of a fourth embodiment according to the present invention, and FIG. 4 (a) is a cross-sectional view showing a positional relationship when a plane forming portion and a ceramic body are brought into contact with each other;
FIG. 4B is a cross-sectional view showing a position where the plane forming portion and the ceramic body start contacting each other, and FIG. 4C shows a state where the conductive paste has wetted to a predetermined position on the side surface of the ceramic body. FIG.

【図5】本発明に係る第5の実施形態における、表面に
凸部ならびに凹部を備える波状形成部の形成方法を示し
た斜視図である。
FIG. 5 is a perspective view illustrating a method of forming a wavy forming portion having a convex portion and a concave portion on a surface according to a fifth embodiment of the present invention.

【図6】本発明に係る第5の実施形態における、表面に
凸部ならびに凹部を備える波状形成部を形成する際に用
いるスキージの形状を示した説明図であり、図6(a)
は角型の櫛歯、図6(b)は扇型の櫛歯、図6(c)は
波型の櫛歯、図6(d)は山型の櫛歯、図6(e)はノ
ズルを各々備えるスキージの平面図である。
FIG. 6 is an explanatory view showing a shape of a squeegee used when forming a wavy forming portion having a convex portion and a concave portion on a surface according to a fifth embodiment of the present invention, and FIG.
6 (b) is a fan-shaped comb, FIG. 6 (c) is a wave-shaped comb, FIG. 6 (d) is a mountain-shaped comb, and FIG. 6 (e) is a nozzle. It is a top view of a squeegee provided with each.

【図7】本発明に係る第6の実施形態に関する説明図で
あり、図7(a)は平面形成部の形成方法を示した断面
図であり、図7(b)は表面に凸部ならびに凹部を備え
る波状形成部の形成方法を示した断面図であり、図7
(c)はセラミック素体を波状形成部上に配置した状態
を示した断面図であり、図7(d)は波状形成部とセラ
ミック素体の端面が接触した状態を示した断面図であ
り、図7(e)は保持部を定位置に戻して、表面に凸部
ならびに凹部を備える波状形成部を再び平面形成部とし
た状態を示した断面図である。
FIGS. 7A and 7B are explanatory views of a sixth embodiment according to the present invention. FIG. 7A is a cross-sectional view illustrating a method of forming a plane forming portion, and FIG. FIG. 7 is a cross-sectional view illustrating a method of forming a wavy forming portion having a concave portion, and FIG.
FIG. 7C is a cross-sectional view showing a state in which the ceramic body is disposed on the wavy forming portion, and FIG. 7D is a cross-sectional view showing a state in which the wavy forming portion and the end face of the ceramic body are in contact with each other. FIG. 7 (e) is a cross-sectional view showing a state in which the holding portion is returned to the home position, and the wavy forming portion having the convex portion and the concave portion on the surface is again a planar forming portion.

【図8】本発明に係る第7の実施形態に関する説明図で
あり、図8(a)は平面形成部の形成方法を示した断面
図であり、図8(b)は表面に凸部ならびに凹部を備え
る波状形成部の形成方法を示した断面図である。
8A and 8B are explanatory views of a seventh embodiment according to the present invention. FIG. 8A is a cross-sectional view illustrating a method of forming a plane forming portion, and FIG. It is sectional drawing which showed the formation method of the wave-shaped formation part provided with a recessed part.

【図9】本発明に係る第8の実施形態に関する説明図で
あり、図9(a)は平面形成部の形成方法を示した斜視
図であり、図9(b)は表面に凸部ならびに凹部を備え
る波状形成部の形成方法を示した斜視図である。
9A and 9B are explanatory views of an eighth embodiment according to the present invention. FIG. 9A is a perspective view illustrating a method of forming a plane forming portion, and FIG. It is the perspective view which showed the formation method of the wavy formation part provided with a recessed part.

【図10】本発明に係る第9の実施形態における、ペー
スト溜めの形成方法を示した斜視図である。
FIG. 10 is a perspective view showing a method for forming a paste reservoir in a ninth embodiment according to the present invention.

【図11】本発明に係る第10の実施形態における、表
面に凸部ならびに凹部を備える波状形成部の形成方法を
示した断面図である。
FIG. 11 is a cross-sectional view illustrating a method of forming a wavy forming portion having a convex portion and a concave portion on a surface according to a tenth embodiment of the present invention.

【図12】本発明の実施例の説明図であり、図12
(a)は波状形成部の凸部にセラミック素体の端面を接
触させ第1電極膜を形成する方法を示した断面図であ
り、図12(b)は波状形成部の傾斜部にセラミック素
体の端面を接触させ第1電極膜を形成する方法を示した
端面図である。
FIG. 12 is an explanatory diagram of an embodiment of the present invention.
FIG. 12A is a cross-sectional view illustrating a method of forming a first electrode film by bringing an end face of a ceramic body into contact with a convex portion of a wavy forming portion, and FIG. FIG. 4 is an end view showing a method of forming a first electrode film by bringing end surfaces of a body into contact with each other.

【図13】従来のセラミック電子部品の製造方法に関す
る説明図であり、図13(a)は平面形成部とセラミッ
ク素体とを接触させる際の位置関係を示した断面図であ
り、図13(b)は平面形成部とセラミック素体とが接
触を開始する位置を示した断面図であり、図13(c)
はセラミック素体の側面の所定位置まで導電性ペースト
が濡れ上がった状態を示した断面図である。
13A and 13B are explanatory views related to a conventional method for manufacturing a ceramic electronic component, and FIG. 13A is a cross-sectional view illustrating a positional relationship when a plane forming portion and a ceramic body are brought into contact with each other; FIG. 13B is a cross-sectional view showing a position where the plane forming portion and the ceramic body start contacting each other, and FIG.
FIG. 5 is a cross-sectional view showing a state in which the conductive paste has wetted up to a predetermined position on the side surface of the ceramic body.

【図14】従来のセラミック電子部品の製造方法に関す
る説明図であり、図14(a)は平面形成部に浸漬させ
たセラミック素体を引き上げる際に気泡が塗布電極膜中
に混入する過程を説明した断面図であり、図14(b)
は気泡を内包する塗布電極膜を備えるセラミック電子部
品の断面図である。
FIG. 14 is an explanatory view of a conventional method for manufacturing a ceramic electronic component, and FIG. 14 (a) illustrates a process in which bubbles are mixed into an applied electrode film when a ceramic body immersed in a plane forming portion is pulled up. FIG. 14 (b)
FIG. 3 is a cross-sectional view of a ceramic electronic component provided with a coating electrode film containing bubbles.

【符号の説明】[Explanation of symbols]

1 セラミック素体 3 波状形成部 3a 凸部 3b 傾斜部 13 平面形成部 14 櫛歯状のスキージ 42a 櫛歯型プレート 42b 櫛歯型プレート 42c 櫛歯の間隙 52a プレート 52b 貫通孔 Reference Signs List 1 ceramic body 3 wavy forming portion 3a convex portion 3b inclined portion 13 flat forming portion 14 comb tooth squeegee 42a comb tooth plate 42b comb tooth plate 42c gap between comb teeth 52a plate 52b through hole

Claims (15)

【特許請求の範囲】[Claims] 【請求項1】 導電性ペーストを用いて、表面に凸部ま
たは/および凹部を備える波状形成部を形成する第1工
程と、 前記凸部の頂点部あるいは前記凸部または/および凹部
により構成される傾斜部と、セラミック素体の端面と、
を互いに接触させ、前記セラミック素体の端面に端子電
極となるべき第1電極膜を形成する第2工程と、を備え
ることを特徴とする、セラミック電子部品の製造方法。
1. A first step of forming a corrugated portion having a convex portion and / or concave portion on a surface thereof using a conductive paste, and a vertex portion of the convex portion or the convex portion and / or concave portion. Inclined part, the end face of the ceramic body,
And forming a first electrode film to be a terminal electrode on the end face of the ceramic element body, the method comprising the steps of:
【請求項2】 導電性ペーストを用いて、重力方向に垂
直な平面に対して傾斜した平面上に平面形成部を形成す
る第1工程と、 前記平面形成部と、セラミック素体の端面と、を重力方
向あるいは重力とは逆方向に接近させて接触させ、前記
セラミック素体の端面に端子電極となるべき第1電極膜
を形成する第2工程と、を備えることを特徴とする、セ
ラミック電子部品の製造方法。
2. A first step of forming a plane forming part on a plane inclined with respect to a plane perpendicular to the direction of gravity using a conductive paste, the plane forming part, an end face of a ceramic body, A second step of forming a first electrode film to be a terminal electrode on an end face of the ceramic body by bringing the first electrode film into contact with a direction of gravity or a direction opposite to the direction of gravity. The method of manufacturing the part.
【請求項3】 前記第2工程の後に、傾斜を備える前記
平面形成部を、重力方向に垂直な平面となるように作動
させる工程をさらに備えることを特徴とする、請求項2
に記載のセラミック電子部品の製造方法。
3. The method according to claim 2, further comprising, after the second step, a step of operating the plane forming portion having an inclination to be a plane perpendicular to the direction of gravity.
3. The method for manufacturing a ceramic electronic component according to claim 1.
【請求項4】 導電性ペーストを与えた後に、櫛歯状の
スキージを用いて、表面に凸部または/および凹部を備
える波状形成部を形成することを特徴とする、波状形成
部の形成方法。
4. A method for forming a wavy forming portion, comprising: forming a wavy forming portion having a convex portion and / or a concave portion on a surface thereof using a comb-shaped squeegee after applying the conductive paste. .
【請求項5】 導電性ペーストを注出して、表面に凸部
または/および凹部を備える波状形成部を形成すること
を特徴とする、波状形成部の形成方法。
5. A method for forming a wavy forming portion, comprising: pouring out a conductive paste to form a wavy forming portion having a convex portion and / or a concave portion on a surface.
【請求項6】 導電性ペーストを与えた後に、スキージ
を用いて波状形成部を形成する方法であって、 前記波状形成部に対して垂直方向に一定間隔で振動する
スキージを用いて、表面に凸部または/および凹部を備
える波状形成部を形成することを特徴とする、波状形成
部の形成方法。
6. A method for forming a wave-shaped portion using a squeegee after applying a conductive paste, wherein the squeegee vibrates at regular intervals in a direction perpendicular to the wave-shaped portion, and the surface is formed on the surface. A method for forming a wavy forming portion, comprising forming a wavy forming portion having a convex portion and / or a concave portion.
【請求項7】 導電性ペーストを用いて平面形成部を形
成した後、前記平面形成部の下部の一部を押し上げまた
は/および引き下げることにより、表面に凸部または/
および凹部を備える波状形成部を形成することを特徴と
する、波状形成部の形成方法。
7. After forming a plane forming part using a conductive paste, a part of the lower part of the plane forming part is pushed up and / or lowered to form a convex part or / and
A method for forming a wavy forming portion, comprising: forming a wavy forming portion having a concave portion.
【請求項8】 一対の閉じた櫛歯型プレート上に導電性
ペーストを用いて平面形成部を形成した後、前記櫛歯型
プレートを互いに離間する方向に摺動させて櫛歯を開
き、前記櫛歯の間隙に前記平面形成部を構成する前記導
電性ペーストを流入させ、表面に凸部または/および凹
部を備える波状形成部を形成することを特徴とする、波
状形成部の形成方法。
8. After forming a plane forming portion using a conductive paste on a pair of closed comb-tooth-shaped plates, the comb-tooth-shaped plates are slid in a direction away from each other to open the comb teeth, A method for forming a wavy forming portion, comprising: flowing the conductive paste constituting the planar forming portion into a gap between comb teeth to form a wavy forming portion having a convex portion and / or a concave portion on a surface.
【請求項9】 一対の開いた櫛歯型プレート上に導電性
ペーストを用いて平面形成部を形成した後、前記櫛歯型
プレートを互いに間挿しあう方向に摺動させて櫛歯を閉
じ、櫛歯の間隙に流入していた前記導電性ペーストを押
し上げ、表面に凸部または/および凹部を備える波状形
成部を形成することを特徴とする、波状形成部の形成方
法。
9. After forming a plane forming portion using a conductive paste on a pair of open comb-tooth-shaped plates, the comb-tooth-shaped plates are slid in a direction to insert each other to close the comb teeth, A method for forming a wavy forming portion, comprising: pushing up the conductive paste flowing into the gap between the comb teeth to form a wavy forming portion having a convex portion and / or a concave portion on the surface.
【請求項10】 貫通孔を備えるプレート上に導電性ペ
ーストを用いて平面形成部を形成した後、前記プレート
の下部より導電性ペーストを押し出して、表面に凸部ま
たは/および凹部を備える波状形成部を形成することを
特徴とする、波状形成部の形成方法。
10. After forming a plane forming portion using a conductive paste on a plate having a through hole, the conductive paste is extruded from a lower portion of the plate to form a wavy shape having a convex portion and / or a concave portion on the surface. A method of forming a wavy forming portion, comprising forming a portion.
【請求項11】 表面に所定の間隔を以って配置された
複数の突起を備える可撓性のあるプレートの裏面側を、
回転するロールを用いてキャタピラ状に支持し、曲面を
帯びた前記プレートの表面に導電性ペーストを用いて平
面形成部を形成した後、前記平面形成部が形成された前
記プレートの裏面側が直線平面となるように支持するこ
とで、前記複数の突起の間隙に充填された導電性ペース
トを前記平面形成部の表面に押し出して、表面に凸部ま
たは/および凹部を備える波状形成部を形成することを
特徴とする、波状形成部の形成方法。
11. A back side of a flexible plate having a plurality of protrusions arranged on the front surface at predetermined intervals,
After supporting in a caterpillar shape using a rotating roll and forming a plane forming part using a conductive paste on the surface of the curved plate, the back side of the plate on which the plane forming part is formed is a linear flat surface. By extruding the conductive paste filled in the gaps between the plurality of protrusions onto the surface of the flat surface forming portion to form a wavy forming portion having a convex portion and / or a concave portion on the surface. A method for forming a wavy forming portion, characterized in that:
【請求項12】 前記第1工程において形成される波状
形成部は、請求項3〜11の何れかに記載の波状形成部
の形成方法により形成されることを特徴とする、請求項
1に記載のセラミック電子部品の製造方法。
12. The method according to claim 1, wherein the corrugated portion formed in the first step is formed by the method for forming a corrugated portion according to any one of claims 3 to 11. Of manufacturing ceramic electronic components.
【請求項13】 貫通孔を備えるプレートの下部より導
電性ペーストを押し出して、前記プレート上にペースト
溜めを形成する第1工程と、 前記ペースト溜めの頂点部あるいは前記ペースト溜めに
より構成される傾斜部と、セラミック素体の端面と、を
互いに接触させ、前記セラミック素体の端面に端子電極
となるべき第1電極膜を形成する第2工程を備えること
を特徴とする、セラミック電子部品の製造方法。
13. A first step of extruding a conductive paste from a lower portion of a plate having a through hole to form a paste reservoir on the plate, and a top portion of the paste reservoir or an inclined portion formed by the paste reservoir. And a end face of the ceramic body, and a second step of forming a first electrode film to be a terminal electrode on the end face of the ceramic body, the method comprising the steps of: .
【請求項14】 導電性ペーストを用いて平面形成部を
形成する第3工程と、 前記平面形成部と、前記第1電極膜を備える前記セラミ
ック素体と、を互いに接触させ、前記第1電極膜上に第
2電極膜を形成する第4工程と、をさらに備えることを
特徴とする、請求項1〜3,12,13の何れかに記載
のセラミック電子部品の製造方法。
14. A third step of forming a plane forming portion by using a conductive paste; bringing the plane forming portion and the ceramic body including the first electrode film into contact with each other; The method for manufacturing a ceramic electronic component according to claim 1, further comprising: a fourth step of forming a second electrode film on the film.
【請求項15】 請求項1〜3,12〜14の何れかに
記載の製造方法によって得られたことを特徴とする、セ
ラミック電子部品。
15. A ceramic electronic component obtained by the manufacturing method according to any one of claims 1 to 3 and 12 to 14.
JP2001063592A 2001-03-07 2001-03-07 Method for manufacturing ceramic electronic component, method for forming corrugated portion and ceramic electronic component Expired - Fee Related JP4834913B2 (en)

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JP2012209538A (en) * 2011-03-14 2012-10-25 Murata Mfg Co Ltd Manufacturing method of laminated ceramic electronic component
JP2021077828A (en) * 2019-11-13 2021-05-20 株式会社村田製作所 Multilayer ceramic capacitor

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JPH11102835A (en) * 1997-09-26 1999-04-13 Tdk Corp Laminated ceramic electronic component and manufacture thereof
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Publication number Priority date Publication date Assignee Title
JP2012209538A (en) * 2011-03-14 2012-10-25 Murata Mfg Co Ltd Manufacturing method of laminated ceramic electronic component
JP2021077828A (en) * 2019-11-13 2021-05-20 株式会社村田製作所 Multilayer ceramic capacitor

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