JP2002258285A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JP2002258285A
JP2002258285A JP2001053241A JP2001053241A JP2002258285A JP 2002258285 A JP2002258285 A JP 2002258285A JP 2001053241 A JP2001053241 A JP 2001053241A JP 2001053241 A JP2001053241 A JP 2001053241A JP 2002258285 A JP2002258285 A JP 2002258285A
Authority
JP
Japan
Prior art keywords
liquid crystal
substrates
display device
crystal display
pixel pitch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001053241A
Other languages
Japanese (ja)
Inventor
Hiromi Fukumori
博美 福森
Hirohide Fukumoto
浩英 福元
Hideaki Ishii
秀哲 石井
Tomonori Konya
智紀 紺屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2001053241A priority Critical patent/JP2002258285A/en
Priority to PCT/JP2002/001752 priority patent/WO2002069033A1/en
Publication of JP2002258285A publication Critical patent/JP2002258285A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing

Abstract

PROBLEM TO BE SOLVED: To reduce degradation of picture quality occurred in rubbing process even when a pixel pitch is decreased in order to realize a high definition and a high aperture factor. SOLUTION: In a manufacturing method for a liquid crystal display device 100A which comprises a paired substrates 1 and 2 facing each other, oriented films 5A and 7A formed respectively on surfaces facing to the paired substrates, a fixing spacer which supports the oriented films of the paired substrates with a predetermined interval and liquid crystal 3 which is supported between the oriented films of the paired substrates, at least, one of the oriented films 5A and 7A of the substrates is rubbing processed by using a buff material 22 of which diameter L1 is less than pixel pitches P1, P2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、特定の大きさのバ
フ材を用いてラビング処理を行うことにより、高精細、
高コントラストの表示を実現する液晶表示装置に関す
る。
BACKGROUND OF THE INVENTION The present invention relates to a rubbing process using a buff material having a specific size to provide a high-definition,
The present invention relates to a liquid crystal display device that realizes high-contrast display.

【0002】[0002]

【従来の技術】薄膜トランジスタ(Thin Film Transist
or: TFT)等のスイッチング素子を使用したマトリクス
型液晶表示装置としては、図4に示す液晶セル100を
用いたものが知られている。図5は、この液晶セル10
0の概略平面図であり、図6は、この液晶セル100を
上から見た拡大平面図である。
2. Description of the Related Art Thin film transistors
As a matrix type liquid crystal display device using a switching element such as a TFT (or: TFT), one using a liquid crystal cell 100 shown in FIG. 4 is known. FIG. 5 shows this liquid crystal cell 10.
FIG. 6 is an enlarged plan view of the liquid crystal cell 100 as viewed from above.

【0003】この液晶セル100は、対向して配置した
2枚の透明なガラス基板(上基板1、下基板2)の間
に、上下の基板1、2間でほぼ90°連続的に捩れた捩
れネマティック液晶3を封入したものである(TN−L
CD)。液晶セル100の外側は2枚の偏光子(図示せ
ず)で挟まれている。
The liquid crystal cell 100 is continuously twisted by approximately 90 ° between upper and lower substrates 1 and 2 between two transparent glass substrates (upper substrate 1 and lower substrate 2) arranged opposite to each other. Twisted nematic liquid crystal 3 is enclosed (TN-L
CD). The outside of the liquid crystal cell 100 is sandwiched between two polarizers (not shown).

【0004】上基板1の下面には、透明な共通電極4が
設けられ、その表面が配向膜5で覆われている。また下
基板2の上面には多数の画素電極6が設けられ、その表
面が配向膜7で覆われている。下基板2において、各画
素電極6には、TFT等のスイッチング素子(図示せ
ず)や、マトリクス状に配置された走査線及び信号線
(図示せず)が接続されている。
A transparent common electrode 4 is provided on the lower surface of the upper substrate 1, and its surface is covered with an alignment film 5. A large number of pixel electrodes 6 are provided on the upper surface of the lower substrate 2, and the surface thereof is covered with an alignment film 7. On the lower substrate 2, each pixel electrode 6 is connected to a switching element (not shown) such as a TFT, and scanning lines and signal lines (not shown) arranged in a matrix.

【0005】上下の基板1、2の配向膜5、7は、互い
に直交する方向(上基板:A方向、下基板:B方向)に
ラビング処理されている(図6)。このラビング処理
は、図7に示すように、ローラ20の外周にバフ布21
を巻き付けて粘着テープ等で固定したバフ材22を、配
向膜を塗布した基板1、2上で所定の圧力を加えながら
配向方向(X方向)に沿って移動させると共に、バフ材
22自体も所定の回転数で回転駆動(Y方向)させるこ
とにより行われる。
The alignment films 5 and 7 of the upper and lower substrates 1 and 2 are rubbed in directions perpendicular to each other (upper substrate: A direction, lower substrate: B direction) (FIG. 6). As shown in FIG. 7, this rubbing treatment is performed by
Is moved along the orientation direction (X direction) while applying a predetermined pressure on the substrates 1 and 2 on which the alignment film is applied, and the buff material 22 itself is also fixed. The rotation is performed at the number of rotations (Y direction).

【0006】また、上下の基板1、2間には、上下の基
板の配向膜間を所定間隔に保持し、表示品質を向上させ
るため、図5に示すように、信号線、走査線、補助容量
電極、遮光材等が配置されている遮光領域8上に固定ス
ペーサ9が配置されている。
As shown in FIG. 5, signal lines, scanning lines, and auxiliary lines are provided between the upper and lower substrates 1 and 2 in order to maintain a predetermined interval between the alignment films of the upper and lower substrates and improve display quality. A fixed spacer 9 is arranged on a light-shielding region 8 in which a capacitor electrode, a light-shielding material and the like are arranged.

【0007】ところで、特にノーマリーホワイトの液晶
表示装置においては、図6に示すように、固定スペーサ
9のB方向(下基板のラビング処理方向)側の領域では
液晶の配向が弱く、光漏れによる白抜け10が画素開口
部11にまで起こり、コントラストが低下する。
In a normally white liquid crystal display device, as shown in FIG. 6, the orientation of the liquid crystal is weak in the region of the fixed spacer 9 in the direction B (the rubbing direction of the lower substrate), and light leakage is caused. The white spots 10 occur up to the pixel openings 11, and the contrast is reduced.

【0008】この白抜け10を小さくするため、通常、
ラビング押し込み量を大きくすることによりラビング強
度を強くするか、または白抜け10の発生位置に応じて
遮光材を設けることにより光漏れを低減させている。
In order to reduce the white spot 10, usually,
The rubbing intensity is increased by increasing the rubbing pushing amount, or the light leakage is reduced by providing a light shielding material in accordance with the position where the white spot 10 occurs.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、白抜け
10の発生位置に応じて遮光材を設けると、開口率が低
下する。
However, if a light-shielding material is provided in accordance with the position where the white spot 10 occurs, the aperture ratio decreases.

【0010】一方、白抜け10を小さくするためにラビ
ング強度を強くすると、液晶分子の配向が安定化し、ま
た、白抜け10の発生位置が画素内の周辺域に移動する
ので、コントラスト比が向上する。しかしながら、ラビ
ング強度を強くすると、固定スペーサ9の一部が消失
し、液晶セル100の配向膜間を所定間隔に保てなくな
ったり、固定スペーサ9が画素内に残り、中間調表示に
した場合に点欠陥や表示ムラ等の画質不良が起こる。こ
のため、白抜け10を解消できる程度にラビング強度を
強くすることはできない。特に、高精細、高開口率を実
現するために遮光領域を小さくしたTN−LCDでは、
ラビング強度を強くすることによる画質不良が顕著に生
じる。
On the other hand, when the rubbing strength is increased to reduce the white spots 10, the alignment of the liquid crystal molecules is stabilized, and the position where the white spots 10 are generated moves to the peripheral area in the pixel, so that the contrast ratio is improved. I do. However, when the rubbing strength is increased, a part of the fixed spacers 9 disappears, and it becomes impossible to maintain a predetermined interval between the alignment films of the liquid crystal cell 100, or the fixed spacers 9 remain in the pixels to display a halftone image. Poor image quality such as point defects and display unevenness occurs. Therefore, the rubbing strength cannot be increased to such an extent that the white spots 10 can be eliminated. In particular, in a TN-LCD in which a light shielding area is reduced in order to realize a high definition and a high aperture ratio,
Inferior image quality caused by increasing the rubbing strength is remarkable.

【0011】また、ラビング処理で使用するバフ材22
の直径L1は18〜30μmであるため(図7)、高精
細を実現するために画素ピッチを15μm以下に小さく
すると、均一な配向を得られなくなり、白抜けの問題は
さらに顕著となる。
A buffing material 22 used in a rubbing process
Since the diameter L1 is 18 to 30 μm (FIG. 7), if the pixel pitch is reduced to 15 μm or less in order to realize high definition, uniform alignment cannot be obtained, and the problem of white spots becomes more remarkable.

【0012】このような問題に対し、本発明は、高精
細、高開口率を実現するために画素ピッチを小さくする
場合でも、ラビング処理に伴う画質不良を低減させるこ
とを目的とする。
[0012] In order to solve such a problem, an object of the present invention is to reduce image quality defects due to a rubbing process even when a pixel pitch is reduced in order to realize a high definition and a high aperture ratio.

【0013】[0013]

【課題を解決するための手段】上述の目的を達成するた
め、本発明は、対向して配置された一対の基板、一対の
基板の対向面にそれぞれ形成された配向膜、一対の基板
の配向膜間を所定間隔に保持する固定スペーサ、及び一
対の基板の配向膜間に挟持された液晶からなる液晶表示
装置であって、少なくとも一方の基板の配向膜に、画素
ピッチ以下の直径のバフ材を用いたラビング処理がなさ
れていることを特徴とする液晶表示装置を提供する。
In order to achieve the above-mentioned object, the present invention provides a pair of substrates arranged opposite to each other, an alignment film respectively formed on opposing surfaces of the pair of substrates, and an alignment of the pair of substrates. What is claimed is: 1. A liquid crystal display device comprising a fixed spacer for holding a film at a predetermined interval, and a liquid crystal sandwiched between alignment films of a pair of substrates, wherein at least one of the alignment films has a buff material having a diameter equal to or less than a pixel pitch. A liquid crystal display device characterized by performing a rubbing process using a liquid crystal display.

【0014】また、本発明は、対向して配置された一対
の基板、一対の基板の対向面にそれぞれ形成された配向
膜、一対の基板の配向膜間を所定間隔に保持する固定ス
ペーサ、及び一対の基板の配向膜間に挟持された液晶か
らなる液晶表示装置の製造方法であって、少なくとも一
方の基板の配向膜に、画素ピッチ以下の直径のバフ材を
用いてラビング処理を行うことを特徴とする液晶表示装
置の製造方法を提供する。
Further, the present invention provides a pair of substrates disposed to face each other, an alignment film formed on each of the opposing surfaces of the pair of substrates, a fixed spacer for holding a predetermined interval between the alignment films of the pair of substrates, and A method for manufacturing a liquid crystal display device including a liquid crystal sandwiched between alignment films of a pair of substrates, wherein a rubbing process is performed on at least one of the alignment films using a buff material having a diameter equal to or less than a pixel pitch. Provided is a method for manufacturing a liquid crystal display device characterized by the following.

【0015】[0015]

【発明の実施の形態】以下、図面を参照しつつ本発明を
詳細に説明する。なお、各図中、同一符号は同一または
同等の構成要素を表している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings. In each of the drawings, the same reference numerals represent the same or equivalent components.

【0016】図1は、本発明の液晶表示装置で使用する
液晶セルの一例を上から見た平面図であり、図2はその
断面図である。
FIG. 1 is a top plan view of an example of a liquid crystal cell used in the liquid crystal display device of the present invention, and FIG. 2 is a sectional view thereof.

【0017】この液晶セル100Aは、図4〜図6に示
した従来の液晶セル100と同様のTN−LCDであ
り、対向する2枚のガラス基板(上基板1、下基板2)
間に、上下の基板1、2間でほぼ90°連続的に捩れた
捩れネマティック液晶3を封入したものである。上下の
基板1、2にはそれぞれ配向膜5A、7Aが形成され、
それらには互いに直交する方向(上基板:A方向、下基
板:B方向)にラビング処理されている点でも従来の液
晶セル100と同様であるが、この配向膜5A、7Aの
ラビング処理が、画素ピッチ以下の直径L1のバフ材2
2(図7参照)を用いて行われていることが特徴的とな
っている。
This liquid crystal cell 100A is a TN-LCD similar to the conventional liquid crystal cell 100 shown in FIGS. 4 to 6, and has two glass substrates (upper substrate 1, lower substrate 2) opposed to each other.
Between them, a twisted nematic liquid crystal 3 that is continuously twisted by approximately 90 ° between the upper and lower substrates 1 and 2 is sealed. Alignment films 5A and 7A are formed on the upper and lower substrates 1 and 2, respectively.
They are also similar to the conventional liquid crystal cell 100 in that they are rubbed in directions perpendicular to each other (upper substrate: direction A, lower substrate: direction B), but the rubbing of the alignment films 5A and 7A is Buffing material 2 of diameter L1 less than pixel pitch
2 (see FIG. 7).

【0018】本発明において、このような直径のバフ材
を用いて行うラビング処理は、上下の基板の配向膜の少
なくとも一方に行うが、固定スペーサを形成した基板
(アクティブマトリクス型液晶表示装置においては、通
常、TFT等のスイッチング素子が形成された駆動基
板)上の配向膜に、このラビング処理を行うことが好ま
しい。また、上下の基板の双方を共通のバフ材でラビン
グ処理する点からは、上述の図1、図2の液晶セル10
0Aのように、上下の基板の配向膜の双方にこのラビン
グ処理を行うことが好ましい。
In the present invention, the rubbing treatment performed using a buff material having such a diameter is performed on at least one of the alignment films of the upper and lower substrates. Usually, it is preferable to perform this rubbing treatment on an alignment film on a drive substrate on which a switching element such as a TFT is formed. Further, in view of the fact that both the upper and lower substrates are rubbed with a common buff material, the liquid crystal cell 10 shown in FIGS.
It is preferable to perform this rubbing treatment on both the alignment films of the upper and lower substrates as in 0A.

【0019】バフ材の直径は、上下方向の画素ピッチP
1及び左右方向の画素ピッチP2のいずれよりも小さく
することが好ましく、特に画素ピッチが15μm以下の
場合、バフ材の直径は5〜15μmとすることが好まし
い。これにより、ラビング処理に伴う白抜けを、ラビン
グ強度を強くすることなく顕著に低減させることができ
る。より具体的には、ラビング押し込み量を0.2〜
0.3μmにしても白抜けを実質的になくすことができ
る。
The diameter of the buff material is equal to the pixel pitch P in the vertical direction.
1 and the pixel pitch P2 in the left-right direction are preferable. Particularly, when the pixel pitch is 15 μm or less, the diameter of the buff material is preferably 5 to 15 μm. As a result, white spots caused by the rubbing treatment can be significantly reduced without increasing the rubbing strength. More specifically, the rubbing pushing amount is 0.2 to
Even at 0.3 μm, white spots can be substantially eliminated.

【0020】バフ材の構造自体は、ラビング法で使用さ
れる公知のバフ材と同様にすることができ、ローラにレ
ーヨン繊維、フィラメント構造等からなるバフ布を巻き
付けたものを使用することができる。
The structure of the buffing material itself can be the same as that of a known buffing material used in the rubbing method, and a buffing cloth made of a rayon fiber, a filament structure or the like wound on a roller can be used. .

【0021】ラビング処理の方法も、図7に示した公知
の方法と同様に、配向膜が塗工された基板にバフ材を所
定の圧力で押し付け、バフ材を回転駆動させつつ配向方
向に移動させればよい。このとき、基板には、固定スペ
ーサ9が形成されていてもよい。
The rubbing method is similar to the known method shown in FIG. 7, in which a buff material is pressed against a substrate coated with an alignment film at a predetermined pressure, and the buff material is moved in the alignment direction while being rotationally driven. It should be done. At this time, the fixed spacer 9 may be formed on the substrate.

【0022】また、ラビング処理する配向膜5A、7A
としては、ポリイミド系、ポリアミック酸系等の公知の
配向膜材料を塗工することにより形成でき、プレチルト
角についても特に制限はない。
The alignment films 5A and 7A to be rubbed are also provided.
Can be formed by applying a known alignment film material such as a polyimide-based or polyamic acid-based material, and the pretilt angle is not particularly limited.

【0023】本発明において、固定スペーサ9は、その
高さを上下の配向膜5A、7Aの間の距離に応じて定め
ればよく、高精細の表示を行う場合には4μm以下とし
てもよい。また、固定スペーサ9の分布密度は、1個/
200mm〜1個/400mmとすることが好まし
い。このような固定スペーサ9は、感光性エポキシ樹
脂、感光性ポリイミド、感光性アクリル樹脂等の感光性
樹脂を用いてフォトリソグラフ法でパターニングするこ
とにより形成できる。
In the present invention, the height of the fixed spacer 9 may be determined in accordance with the distance between the upper and lower alignment films 5A and 7A, and may be 4 μm or less for high-definition display. The distribution density of the fixed spacers 9 is 1 piece /
It is preferable to 200 mm 2 to 1 or / 400 mm 2. Such a fixing spacer 9 can be formed by patterning by a photolithographic method using a photosensitive resin such as a photosensitive epoxy resin, a photosensitive polyimide, a photosensitive acrylic resin, or the like.

【0024】本発明の液晶表示装置は、上述のようにラ
ビング処理時にバフ材として、その直径が画素ピッチ以
下のものを使用する以外、公知の液晶表示装置と同様に
製造することができ、種々の液晶表示装置に適用するこ
とができる。例えば、本発明は、TFTをスイッチング
素子として有するマトリクス型液晶表示装置に限らず、
MIM(金属−絶縁膜−金属)等の非線形素子をスイッ
チング素子として有する液晶表示装置にも適用すること
ができる。また、液晶についても、捩れネマティック液
晶に限らず、スメチック液晶等を用いた液晶表示装置に
も好適に適用することができる。
The liquid crystal display device of the present invention can be manufactured in the same manner as a known liquid crystal display device, except that a buffing material having a diameter equal to or less than a pixel pitch is used as a buff material during the rubbing treatment as described above. Can be applied to the liquid crystal display device. For example, the present invention is not limited to a matrix type liquid crystal display device having a TFT as a switching element,
The present invention can be applied to a liquid crystal display device having a non-linear element such as an MIM (metal-insulating film-metal) as a switching element. Also, the liquid crystal is not limited to the twisted nematic liquid crystal, and can be suitably applied to a liquid crystal display device using a smectic liquid crystal or the like.

【0025】[0025]

【実施例】実施例1、比較例1 図1の液晶セル100A(実施例1)、または図4の液
晶セル100(比較例1)を作製した。この場合、上基
板1には、透明な共通電極4を形成し、下基板2にはT
FT素子をスイッチング素子とする画素電極6を形成し
た(画素ピッチ:上下、左右とも15μm)。また、下
基板2には、マトリクス状の遮光領域8のうち、各行と
一列おきの列との交叉領域に、固定スペーサ(直径3μ
m)を、感光性樹脂(オプトマーNN700、JSR
製)をフォトリソグラフ法を用いてパターニングするこ
とにより形成した(図5参照)。
EXAMPLES Example 1, Comparative Example 1 The liquid crystal cell 100A of FIG. 1 (Example 1) or the liquid crystal cell 100 of FIG. 4 (Comparative Example 1) was manufactured. In this case, a transparent common electrode 4 is formed on the upper substrate 1 and T
A pixel electrode 6 using an FT element as a switching element was formed (pixel pitch: 15 μm in both vertical and horizontal directions). In the lower substrate 2, fixed spacers (having a diameter of 3 μm) are provided in the matrix-shaped light-shielding regions 8 at the intersections between each row and every other column.
m) is replaced with a photosensitive resin (Optomer NN700, JSR
Was formed by patterning using a photolithographic method (see FIG. 5).

【0026】上下の基板の配向膜5A、7Aとしては、
それぞれプレチルト角が約5°のポリイミドの配向膜を
形成した。配向膜5A、7Aのラビング処理は、図8に
示すようにバフ繊維23(レーヨン繊維、1.5デニー
ル、(旭化成製、FINEX、120d/80f))がバフ下地24
に植えられているバフ布21を図7に示すようにローラ
20に巻き付けたバフ材(直径10μm)22を用い、
所定のラビング押し込み量となるようにラビング強度を
調整して行った(実施例1)。また、比較のため、直径
18μmのバフ材を使用して同様のラビング処理を行っ
た(比較例1)。なお、ラビング押し込み量としては、
基板に対するバフ材22の総厚のオーバーラップ量を測
定した。
As the alignment films 5A and 7A of the upper and lower substrates,
A polyimide alignment film having a pretilt angle of about 5 ° was formed. As shown in FIG. 8, the buffing fiber 23 (rayon fiber, 1.5 denier, (Asahi Kasei, FINEX, 120d / 80f)) is used as a rubbing treatment for the alignment films 5A and 7A.
As shown in FIG. 7, a buff material (diameter: 10 μm) 22 wound around a roller 20 is used.
The rubbing strength was adjusted so as to obtain a predetermined rubbing depression amount (Example 1). For comparison, a similar rubbing treatment was performed using a buff material having a diameter of 18 μm (Comparative Example 1). In addition, as the rubbing pushing amount,
The amount of overlap of the total thickness of the buff material 22 with respect to the substrate was measured.

【0027】上基板1と下基板2を対向させて貼り合わ
せ(上下の配向膜5A、7A間の距離3.5μm)、配
向膜間に左旋性のネマティック液晶(屈折率異方性Δn
=約0.13、誘電率異方性Δε=約10)を封入する
ことにより液晶セル100Aを得た。
The upper substrate 1 and the lower substrate 2 are adhered to each other (the distance between the upper and lower alignment films 5A and 7A is 3.5 μm), and a levorotatory nematic liquid crystal (refractive index anisotropy Δn) is formed between the alignment films.
= About 0.13 and dielectric anisotropy Δε = about 10) to obtain a liquid crystal cell 100A.

【0028】この液晶セル100Aを、画素電極が各行
ごとに反転駆動するライン反転駆動方式で駆動し、画素
開口部11における白抜け長さL2(図6参照)を、顕
微鏡による測微計により測定し、ラビング押し込み量と
白抜け長さとの関係図を作成した。結果を図3に示す。
The liquid crystal cell 100A is driven by a line inversion driving method in which the pixel electrodes are inverted for each row, and the white hole length L2 (see FIG. 6) in the pixel opening 11 is measured by a micrometer using a microscope. Then, a relationship diagram between the rubbing press-in amount and the blank length was created. The results are shown in FIG.

【0029】図3から、画素ピッチ以下の直径のバフ材
を用いてラビング処理した実施例1においては、画素ピ
ッチよりも大きい直径のバフ材を用いてラビング処理し
た比較例1に比して白抜け長さが顕著に短くなっている
ことがわかる。
FIG. 3 shows that the rubbing process using the buff material having a diameter equal to or less than the pixel pitch in Example 1 compared to the comparative example 1 in which the rubbing process was performed using a buff material having a diameter larger than the pixel pitch. It can be seen that the missing length is significantly shorter.

【0030】[0030]

【発明の効果】本発明の液晶表示装置によれば、高精
細、高開口率を実現するために画素ピッチを小さくする
場合でも、ラビング処理に伴う画質不良を顕著に低減さ
せることができる。
According to the liquid crystal display device of the present invention, even when the pixel pitch is reduced in order to realize a high definition and a high aperture ratio, it is possible to remarkably reduce image quality defects due to the rubbing process.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の液晶表示装置の液晶セルを上から見
た拡大平面図である。
FIG. 1 is an enlarged plan view of a liquid crystal cell of a liquid crystal display device of the present invention as viewed from above.

【図2】 本発明の液晶表示装置の液晶セルの断面図で
ある。
FIG. 2 is a sectional view of a liquid crystal cell of the liquid crystal display device of the present invention.

【図3】 実施例及び比較例における、ラビング押し込
み量と白抜け長さとの関係図である。
FIG. 3 is a diagram illustrating a relationship between a rubbing press-in amount and a white spot length in Examples and Comparative Examples.

【図4】 従来の液晶表示装置の液晶セルの断面図であ
る。
FIG. 4 is a sectional view of a liquid crystal cell of a conventional liquid crystal display device.

【図5】 従来の液晶表示装置の液晶セルの概略平面図
である。
FIG. 5 is a schematic plan view of a liquid crystal cell of a conventional liquid crystal display device.

【図6】 従来の液晶表示装置の液晶セルを上から見た
拡大平面図である。
FIG. 6 is an enlarged plan view of a liquid crystal cell of a conventional liquid crystal display device as viewed from above.

【図7】 一般的なラビング方法の説明図である。FIG. 7 is an explanatory diagram of a general rubbing method.

【図8】 実施例及び比較例で使用したバフ材の断面図
である。
FIG. 8 is a sectional view of a buff material used in Examples and Comparative Examples.

【符号の説明】[Explanation of symbols]

1…上基板、 2…下基板、 3…液晶、 4…共通電
極、 5A…配向膜、6…画素電極、 7A…配向膜、
8…遮光領域、 9…固定スペーサ、 10…白抜
け、 11…画素開口部、 20…ローラ、 21…バ
フ布、 22…バフ材、 23…バフ繊維、 24…バ
フ下地、 100A…液晶セル、 L1…バフ材の直
径、 L2…白抜け長さ、
DESCRIPTION OF SYMBOLS 1 ... Upper substrate, 2 ... Lower substrate, 3 ... Liquid crystal, 4 ... Common electrode, 5A ... Alignment film, 6 ... Pixel electrode, 7A ... Alignment film
8: light blocking area, 9: fixed spacer, 10: white spot, 11: pixel opening, 20: roller, 21: buffing cloth, 22: buffing material, 23: buffing fiber, 24: buffing base, 100A: liquid crystal cell, L1: diameter of buffing material, L2: length of blank area,

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石井 秀哲 鹿児島県国分市野口北5番1号 ソニー国 分株式会社内 (72)発明者 紺屋 智紀 鹿児島県国分市野口北5番1号 ソニー国 分株式会社内 Fターム(参考) 2H089 LA09 LA20 MA03X NA14 QA15 2H090 HB08Y MB03  ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Hidenori Ishii 5-1 Noguchi Kita, Kokubu City, Kagoshima Prefecture Inside Sony Kokubu Corporation (72) Inventor Tomoki Konya 5-1 Noguchi Kita, Kokubu City, Kagoshima Prefecture F term in reference (reference) 2H089 LA09 LA20 MA03X NA14 QA15 2H090 HB08Y MB03

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 対向して配置された一対の基板、一対の
基板の対向面にそれぞれ形成された配向膜、一対の基板
の配向膜間を所定間隔に保持する固定スペーサ、及び一
対の基板の配向膜間に挟持された液晶からなる液晶表示
装置であって、少なくとも一方の基板の配向膜に、画素
ピッチ以下の直径のバフ材を用いたラビング処理がなさ
れていることを特徴とする液晶表示装置。
A pair of substrates disposed opposite to each other; an alignment film formed on each of the opposing surfaces of the pair of substrates; a fixed spacer for maintaining a predetermined interval between the alignment films of the pair of substrates; What is claimed is: 1. A liquid crystal display device comprising a liquid crystal sandwiched between alignment films, wherein at least one of the alignment films has been subjected to a rubbing treatment using a buff material having a diameter equal to or less than a pixel pitch. apparatus.
【請求項2】 固定スペーサが形成された基板上の配向
膜が、画素ピッチ以下の直径のバフ材を用いてラビング
処理されている請求項1記載の液晶表示装置。
2. The liquid crystal display device according to claim 1, wherein the alignment film on the substrate on which the fixed spacers are formed is rubbed using a buff material having a diameter equal to or less than a pixel pitch.
【請求項3】 一方の基板が、スイッチング素子が形成
された駆動基板であり、その駆動基板上に固定スペーサ
と配向膜が設けられ、その配向膜が画素ピッチ以下の直
径のバフ材を用いてラビング処理されている請求項1記
載の液晶表示装置。
3. One of the substrates is a driving substrate on which a switching element is formed, on which a fixed spacer and an alignment film are provided, and the alignment film is formed using a buff material having a diameter equal to or less than a pixel pitch. 2. The liquid crystal display device according to claim 1, which has been subjected to a rubbing treatment.
【請求項4】 画素ピッチが15μm以下であり、バフ
材の直径が5〜15μmである請求項1〜3のいずれか
に記載の液晶表示装置。
4. The liquid crystal display device according to claim 1, wherein the pixel pitch is 15 μm or less, and the diameter of the buff material is 5 to 15 μm.
【請求項5】 対向して配置された一対の基板、一対の
基板の対向面にそれぞれ形成された配向膜、一対の基板
の配向膜間を所定間隔に保持する固定スペーサ、及び一
対の基板の配向膜間に挟持された液晶からなる液晶表示
装置の製造方法であって、少なくとも一方の基板の配向
膜に、画素ピッチ以下の直径のバフ材を用いてラビング
処理を行うことを特徴とする液晶表示装置の製造方法。
5. A pair of substrates arranged opposite to each other, an alignment film formed on each of the opposing surfaces of the pair of substrates, a fixed spacer for maintaining a predetermined interval between the alignment films of the pair of substrates, and a pair of substrates. A method of manufacturing a liquid crystal display device comprising a liquid crystal sandwiched between alignment films, wherein a rubbing process is performed on at least one of the alignment films using a buff material having a diameter equal to or less than a pixel pitch. A method for manufacturing a display device.
【請求項6】 一方の基板上に固定スペーサと配向膜を
順次形成し、その配向膜を、画素ピッチ以下の直径のバ
フ材を用いてラビング処理する請求項5記載の液晶表示
装置の製造方法。
6. The method according to claim 5, wherein a fixed spacer and an alignment film are sequentially formed on one of the substrates, and the alignment film is subjected to a rubbing treatment using a buff material having a diameter equal to or less than a pixel pitch. .
【請求項7】 一方の基板が、スイッチング素子が形成
された駆動基板であり、その駆動基板上に固定スペーサ
と配向膜を順次形成し、その配向膜を画素ピッチ以下の
直径のバフ材を用いてラビング処理する請求項5記載の
液晶表示装置の製造方法。
7. One of the substrates is a driving substrate on which a switching element is formed. A fixed spacer and an alignment film are sequentially formed on the driving substrate, and the alignment film is formed using a buff material having a diameter equal to or less than a pixel pitch. 6. The method for manufacturing a liquid crystal display device according to claim 5, wherein the rubbing treatment is performed.
【請求項8】 画素ピッチを15μm以下とし、直径5
〜15μmのバフ材を使用する請求項5〜7のいずれか
に記載の液晶表示装置の製造方法。
8. A pixel pitch of not more than 15 μm and a diameter of 5 μm.
The method for manufacturing a liquid crystal display device according to claim 5, wherein a buff material having a thickness of 15 μm to 15 μm is used.
JP2001053241A 2001-02-28 2001-02-28 Liquid crystal display device Pending JP2002258285A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001053241A JP2002258285A (en) 2001-02-28 2001-02-28 Liquid crystal display device
PCT/JP2002/001752 WO2002069033A1 (en) 2001-02-28 2002-02-26 Liquid crystal display unit and production method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001053241A JP2002258285A (en) 2001-02-28 2001-02-28 Liquid crystal display device

Publications (1)

Publication Number Publication Date
JP2002258285A true JP2002258285A (en) 2002-09-11

Family

ID=18913734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001053241A Pending JP2002258285A (en) 2001-02-28 2001-02-28 Liquid crystal display device

Country Status (2)

Country Link
JP (1) JP2002258285A (en)
WO (1) WO2002069033A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020071371A1 (en) * 2018-10-01 2020-04-09 大日本印刷株式会社 Transparent substrate and light adjustment member

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001075114A (en) * 1999-09-07 2001-03-23 Seiko Epson Corp Liquid crystal device and its manufacture, and electronic equipment using the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3396773B2 (en) * 1997-05-28 2003-04-14 松下電器産業株式会社 Method for manufacturing active matrix type liquid crystal display element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001075114A (en) * 1999-09-07 2001-03-23 Seiko Epson Corp Liquid crystal device and its manufacture, and electronic equipment using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020071371A1 (en) * 2018-10-01 2020-04-09 大日本印刷株式会社 Transparent substrate and light adjustment member
JP6711473B1 (en) * 2018-10-01 2020-06-17 大日本印刷株式会社 Transparent base material, light control member

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