JP2002246308A - コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置 - Google Patents

コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置

Info

Publication number
JP2002246308A
JP2002246308A JP2001376974A JP2001376974A JP2002246308A JP 2002246308 A JP2002246308 A JP 2002246308A JP 2001376974 A JP2001376974 A JP 2001376974A JP 2001376974 A JP2001376974 A JP 2001376974A JP 2002246308 A JP2002246308 A JP 2002246308A
Authority
JP
Japan
Prior art keywords
optical system
lens
lens group
condenser
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001376974A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002246308A5 (enExample
Inventor
Yutaka Suenaga
豊 末永
Koichi Hiraga
康一 平賀
Masahito Kumazawa
雅人 熊澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001376974A priority Critical patent/JP2002246308A/ja
Publication of JP2002246308A publication Critical patent/JP2002246308A/ja
Publication of JP2002246308A5 publication Critical patent/JP2002246308A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2001376974A 2000-12-14 2001-12-11 コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置 Withdrawn JP2002246308A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001376974A JP2002246308A (ja) 2000-12-14 2001-12-11 コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000379838 2000-12-14
JP2000-379838 2000-12-14
JP2001376974A JP2002246308A (ja) 2000-12-14 2001-12-11 コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置

Publications (2)

Publication Number Publication Date
JP2002246308A true JP2002246308A (ja) 2002-08-30
JP2002246308A5 JP2002246308A5 (enExample) 2005-08-04

Family

ID=26605807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001376974A Withdrawn JP2002246308A (ja) 2000-12-14 2001-12-11 コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置

Country Status (1)

Country Link
JP (1) JP2002246308A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057557A (ja) * 2001-08-09 2003-02-26 Yokogawa Electric Corp バイオチップ読取装置
JP2008539569A (ja) * 2005-04-26 2008-11-13 カール・ツアイス・エスエムテイ・アーゲー マイクロリソグラフィ露光装置のための照明システム
JP2009288438A (ja) * 2008-05-28 2009-12-10 Canon Inc 照明光学系、及びそれを用いた画像投影装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057557A (ja) * 2001-08-09 2003-02-26 Yokogawa Electric Corp バイオチップ読取装置
JP2008539569A (ja) * 2005-04-26 2008-11-13 カール・ツアイス・エスエムテイ・アーゲー マイクロリソグラフィ露光装置のための照明システム
JP2012103724A (ja) * 2005-04-26 2012-05-31 Carl Zeiss Smt Gmbh マイクロリソグラフィ露光装置のための照明システム
JP2009288438A (ja) * 2008-05-28 2009-12-10 Canon Inc 照明光学系、及びそれを用いた画像投影装置

Similar Documents

Publication Publication Date Title
US6913373B2 (en) Optical illumination device, exposure device and exposure method
US5675401A (en) Illuminating arrangement including a zoom objective incorporating two axicons
EP0770895A2 (en) Projection optical system and exposure apparatus provided therewith
US8274638B2 (en) Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
WO2003050856A1 (en) Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
US7706072B2 (en) Optical integrator, illumination optical device, photolithograph, photolithography, and method for fabricating device
JP4207478B2 (ja) オプティカルインテグレータ、照明光学装置、露光装置および露光方法
WO2007111146A1 (ja) 照明光学装置、露光装置、およびデバイス製造方法
JP2004022708A (ja) 結像光学系、照明光学系、露光装置及び露光方法
TW536735B (en) Optical condenser system, optical illumination system provided with the same, and exposure system
US8004658B2 (en) Lighting optical device, exposure system, and exposure method
US6600550B1 (en) Exposure apparatus, a photolithography method, and a device manufactured by the same
JP2004198748A (ja) オプティカルインテグレータ、照明光学装置、露光装置および露光方法
US6856377B2 (en) Relay image optical system, and illuminating optical device and exposure system provided with the optical system
JP4779394B2 (ja) 投影光学系、露光装置、および露光方法
JP2002222761A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JPWO2007086220A1 (ja) 反射屈折結像光学系、露光装置、およびデバイスの製造方法
US6700645B1 (en) Projection optical system and exposure apparatus and method
JP4300509B2 (ja) 投影光学系、露光装置、および露光方法
JP2002246308A (ja) コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置
KR20030038427A (ko) 투영 광학계, 노광 장치 및 디바이스의 제조 방법
JP2002118043A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2001176772A (ja) 照明光学装置および該照明光学装置を備えた投影露光装置
KR100932319B1 (ko) 결상 광학계, 그 결상 광학계를 구비한 노광 장치, 그 노광 장치를 이용한 마이크로디바이스 제조 방법 및 그 결상 광학계를 이용한 노광 방법
JP2005106897A (ja) 照明装置およびそれを用いた投影露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041213

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050111

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061017