JP2002240183A - High steam barrier film and method for manufacturing the same - Google Patents
High steam barrier film and method for manufacturing the sameInfo
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- JP2002240183A JP2002240183A JP2001042945A JP2001042945A JP2002240183A JP 2002240183 A JP2002240183 A JP 2002240183A JP 2001042945 A JP2001042945 A JP 2001042945A JP 2001042945 A JP2001042945 A JP 2001042945A JP 2002240183 A JP2002240183 A JP 2002240183A
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、食品、医薬品、精
密電子部品等の包装分野に用いられる透明なガスバリア
材に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent gas barrier material used in the field of packaging foods, pharmaceuticals, precision electronic parts and the like.
【０００２】[0002]
【従来の技術】近年、食品、医薬品、精密電子部品等の
包装に用いられる包装材料は、内容物の変質、特に食品
分野においては蛋白質や油脂等の酸化、変質を抑制し、
味覚や鮮度を保持するために、又医薬品分野においては
有効成分の変質を抑制し、効能を維持するために、さら
に、精密電子部品分野においては金属部分の腐食、絶縁
不良等を防止するために、包装材料を透過する酸素、水
蒸気、その他内容物を変質させる気体による影響を防止
する必要があり、これら気体を遮断するガスバリア性を
備えることが求められている。そのため、従来から温
度、湿度などに影響されないアルミニウムなどの金属箔
やアルミニウム蒸着フイルムあるいはポリビニルアルコ
ール、エチレン・ビニルアルコール共重合体、ポリ塩化
ビニリデン、ポリアクリロニトリルなどの樹脂フイルム
やこれらの樹脂を表面にコーティングしたフイルムなど
がガスバリア材として一般的に包装材料に用いられてき
た。2. Description of the Related Art In recent years, packaging materials used for packaging foods, pharmaceuticals, precision electronic parts, etc., suppress deterioration of contents, particularly oxidation and deterioration of proteins and oils and fats in the food field.
In order to maintain taste and freshness, to suppress deterioration of active ingredients and maintain efficacy in the pharmaceutical field, and to prevent corrosion of metal parts and insulation failure in the precision electronic parts field. In addition, it is necessary to prevent the influence of oxygen, water vapor, and other gases that alter the contents of the packaging material, and it is required to have a gas barrier property that blocks these gases. For this reason, the surface is coated with metal foil such as aluminum, aluminum-deposited film or resin film such as polyvinyl alcohol, ethylene-vinyl alcohol copolymer, polyvinylidene chloride, polyacrylonitrile, etc. Films and the like have been generally used as packaging materials as gas barrier materials.
【０００３】ところが、アルミニウムなどの金属箔やア
ルミニウム蒸着フイルムを用いた包装材料は、ガスバリ
ア性に優れるが、包装材料を透視して内容物を確認する
ことができないだけではなく、使用後の廃棄の際は不燃
物として処理しなければならない点や包装後の内容物な
どの検査の際に金属探知器が使用できない点などの欠点
を有していた。また、ガスバリア性樹脂フイルムやガス
バリア性樹脂をコーティングしたフイルムは、温湿度依
存性が大きく、高いガスバリア性を常時維持できない。
さらに、塩素を含む樹脂は廃棄や焼却の際に有害物質生
成の原因となる可能性などの問題があった。However, a packaging material using a metal foil such as aluminum or an aluminum vapor-deposited film has excellent gas barrier properties. However, not only cannot the contents be seen through the packaging material, but also the disposal of the waste material after use has occurred. In some cases, it has disadvantages such as that it must be treated as a non-combustible material and that a metal detector cannot be used when inspecting the contents after packaging. Further, a gas barrier resin film or a film coated with a gas barrier resin has a large temperature / humidity dependency and cannot always maintain high gas barrier properties.
Further, there is a problem that the resin containing chlorine may cause generation of harmful substances at the time of disposal or incineration.
【０００４】そこで、これらの欠点を克服した包装用材
料として、最近では酸化マグネシウム、酸化カルシウ
ム、酸化アルミニウム、酸化珪素などの無機酸化物を透
明な基材フイルム上に蒸着した蒸着フィルムが上市され
ている。これらの蒸着フイルムは透明性及び酸素、水蒸
気等のガス遮断性を有していることが知られ、金属箔な
どでは得る事が出来ない透明性、ガスバリア性の両方を
有する包装材料として好適とされている。Accordingly, as a packaging material which overcomes these drawbacks, a vapor deposition film in which an inorganic oxide such as magnesium oxide, calcium oxide, aluminum oxide, silicon oxide or the like is vapor-deposited on a transparent base film has recently been put on the market. I have. These vapor-deposited films are known to have transparency and gas barrier properties against oxygen, water vapor, etc., and are suitable as packaging materials having both transparency and gas barrier properties that cannot be obtained with metal foils and the like. ing.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上述し
た無機酸化物の内、酸化マグネシウム、酸化カルシウム
の蒸着原材料は、例えば酸化マグネシウムの沸点が３６
００℃、酸化カルシウムの沸点が２８５０℃等と昇華温
度が高く、そのために蒸着工程における蒸発速度が遅く
なる。そのためガスバリア性を発現させるのに十分な２
００Å程度の厚さの蒸着薄膜を付着させようとすると、
製膜時間が長時間になり、製造効率が悪く、高コストに
繋がるため商業的採算が合わない。また、酸化マグネシ
ウムあるいは酸化カルシウムを単層で透明な基材フイル
ム上に蒸着すると、経時で空気中の水分を吸湿してガス
バリア性が劣化し、ガスバリア材料としては不適当であ
った。However, among the above-mentioned inorganic oxides, the raw materials for vapor deposition of magnesium oxide and calcium oxide, for example, have a boiling point of 36% for magnesium oxide.
The sublimation temperature is as high as 00 ° C. and the boiling point of calcium oxide is 2850 ° C., so that the evaporation rate in the vapor deposition step becomes slow. Therefore, 2 which is sufficient to exhibit gas barrier properties
If you try to deposit a thin film of about 00mm thickness,
The film formation time is long, the production efficiency is low, and this leads to high cost, which is not commercially viable. Further, when magnesium oxide or calcium oxide is vapor-deposited in a single layer on a transparent base film, the moisture in the air is absorbed over time to deteriorate the gas barrier property, which is unsuitable as a gas barrier material.
【０００６】上記の理由などにより、現在上市されてい
る無機酸化物の蒸着フイルムは、酸化アルミニウムある
いは酸化珪素などの無機酸化物を基材フイルムに蒸着し
たものが主流であるが、これらの既存の蒸着フイルムは
酸素ガスバリア性は優れているが、水蒸気バリア性は酸
素ガスバリア性に比し、約１０，０００倍程度の透過性
があり、包装材料に使用するには不満足であった。[0006] For the above-mentioned reasons, most of the commercially available vapor-deposited films of inorganic oxides are those in which an inorganic oxide such as aluminum oxide or silicon oxide is vapor-deposited on a substrate film. The vapor-deposited film has an excellent oxygen gas barrier property, but has a water vapor barrier property that is about 10,000 times more permeable than the oxygen gas barrier property, and is unsatisfactory for use as a packaging material.
【０００７】本発明の課題は、透明で、酸素ガスバリア
性に優れ、かつ、温湿度に影響されない水蒸気バリア性
を有する高水蒸気バリアフイルムを提供するものであ
る。An object of the present invention is to provide a high-steam barrier film which is transparent, has excellent oxygen gas barrier properties, and has a steam barrier property which is not affected by temperature and humidity.
【０００８】[0008]
【課題を解決するための手段】本発明の請求項１に係る
発明は、透明な基材フイルムの少なくとも一方の面に蒸
着薄膜層を積層した積層体において、該蒸着薄膜層を構
成するアルミニウムの酸化物（ＡｌｘＯｙ）のｘとｙの
比が、基材フイルム側から膜厚方向にｘ：ｙ＝２：２〜
２：４に連続的に変化したものからなることを特徴とす
る高水蒸気バリアフイルムである。According to the first aspect of the present invention, there is provided a laminate in which a vapor deposition thin film layer is laminated on at least one surface of a transparent base film, and wherein the aluminum constituting the vapor deposition thin film layer is The ratio of x and y of the oxide (AlxOy) is such that x: y = 2: 2 from the substrate film side in the film thickness direction.
A high-water-vapor barrier film characterized by being continuously changed at 2: 4.
【０００９】次に、請求項２に係る発明は、上記請求項
１に係る発明において、前記蒸着薄膜層の厚さが５０〜
３０００Åの範囲であることを特徴とする高水蒸気バリ
アフイルムである。Next, according to a second aspect of the present invention, in the first aspect of the present invention, the thickness of the deposited thin film layer is 50 to 50.
A high water vapor barrier film characterized by having a range of 3000 °.
【００１０】次に、請求項３に係る発明は、上記請求項
１又は請求項２記載の高水蒸気バリアフイルムの製造時
に、蒸着装置内へ異なる量の酸素ガスを供給することに
より、無機元素と酸素元素の比を連続的に変化させた無
機酸化物の蒸着薄膜層を形成させることを特徴とする高
水蒸気バリアフイルムの製造方法である。Next, according to a third aspect of the present invention, an inorganic element is produced by supplying different amounts of oxygen gas into a vapor deposition apparatus during the production of the high steam barrier film according to the first or second aspect. A method for manufacturing a high vapor barrier film, comprising forming a vapor deposited thin film layer of an inorganic oxide in which the ratio of oxygen elements is continuously changed.
【００１１】[0011]
【作用】本発明によれば、基材フイルムのフイルムに近
い側に酸素元素の比率の小さい無機酸化物を形成させ、
膜厚の外側方向に連続的に酸素元素の比率の大きい無機
酸化物からなる蒸着薄膜層を設けているので、フイルム
に近い側の無機酸化物がフイルムに由来する水分や各種
放出ガス成分を遮断し、その上に積層される無機酸化物
の蒸着薄膜が非常に緻密に形成されることにより、透明
で、かつ、高い水蒸気バリア性を保持できる。According to the present invention, an inorganic oxide having a small ratio of oxygen element is formed on the side of the base film close to the film,
A vapor deposition thin film layer composed of an inorganic oxide with a large ratio of oxygen element is continuously provided in the outer direction of the film thickness, so that the inorganic oxide near the film blocks moisture and various released gas components derived from the film. In addition, since the vapor deposited thin film of the inorganic oxide laminated thereon is formed very densely, it is possible to maintain transparency and a high water vapor barrier property.
【００１２】[0012]
【発明の実施の形態】本発明の高水蒸気バリアフイルム
３を、実施の形態に沿って以下に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A high water vapor barrier film 3 of the present invention will be described below in accordance with an embodiment.
【００１３】図１は本発明の一実施の形態を示す側断面
図であり、基材フイルム１にアルミニウムの酸化物の蒸
着薄膜層２が形成されている。FIG. 1 is a side sectional view showing an embodiment of the present invention, in which a base film 1 is formed with a deposited thin film layer 2 of aluminum oxide.
【００１４】前記基材フイルム１は透明性を有する高分
子材料であり、とくに無色透明であればよく、通常、包
装材料として用いられるものが好ましい。例えば、二軸
延伸ポリプロピレンフイルム（ＯＰＰ）、二軸延伸ナイ
ロンフイルム（ＯＮｙ）、二軸延伸ポリエステルフイル
ム（ＰＥＴ）などが機械的強度、寸法安定性を有してい
るので好ましい。さらに、平滑性が優れ、かつ添加剤の
量が少ないフィルムが好ましい。また、前記基材フイル
ム１と蒸着薄膜層２の密着性を良くするために、基材フ
イルム１の蒸着面に前処理としてコロナ処理、低温プラ
ズマ処理、イオンボンバード処理を施しておいてもよ
く、さらに薬品処理、溶剤処理などを施してもよい。The base film 1 is a polymer material having transparency, and it is sufficient that the base film 1 is colorless and transparent. For example, a biaxially stretched polypropylene film (OPP), a biaxially stretched nylon film (ONy), a biaxially stretched polyester film (PET) and the like are preferable because they have mechanical strength and dimensional stability. Further, a film having excellent smoothness and a small amount of the additive is preferable. Further, in order to improve the adhesion between the base film 1 and the deposited thin film layer 2, the deposition surface of the base film 1 may be subjected to corona treatment, low-temperature plasma treatment, or ion bombardment treatment as a pretreatment, Further, chemical treatment, solvent treatment, or the like may be performed.
【００１５】前記基材フイルム１は、厚さはとくに制限
を受けるものではないが、包装材料としての適性、他の
層を積層する場合の加工性を考慮すると、５〜１００μ
ｍの範囲が好ましい。Although the thickness of the base film 1 is not particularly limited, it is 5 to 100 μm in consideration of suitability as a packaging material and workability in laminating other layers.
The range of m is preferred.
【００１６】前記蒸着薄膜層２に形成したアルミニウム
の酸化物（ＡｌｘＯｙ）のｘとｙの比を基材フイルム側
から膜厚方向に、ｘ：ｙ＝２：２〜２：４に連続的に変
化させていることを特徴としている。一般的にアルミニ
ウムの酸化物（ＡｌｘＯｙ）のｙの値が小さくなればな
るほど金属的な性質に近くなり、ガスバリア性はよくな
るが透明性は悪くなる。本発明では基材フイルム１に近
い側のアルミニウムの酸化物のｘとｙの比が膜厚方向に
ｘ：ｙ＝２：２〜２：２．５に連続的に変化させた薄膜
を形成させており、さらに膜厚の外側方向に酸化物のｘ
とｙの比が連続的にｘ：ｙ＝２：２．５〜２：４に変化
させた蒸着薄膜を積層する形で形成させているので、蒸
着薄膜層２の加工時に基材フイルムに近い側の無機酸化
物がフイルムに由来する水分や各種ガス成分を遮断する
役目を果たし、その上に積層されるアルミニウムの酸化
物の蒸着薄膜が非常に緻密な状態で形成されることにな
り、透明で、ガスバリアー性に優れ、かつ、温湿度に影
響されない高い水蒸気ガスバリアー性を有することが出
来る。The ratio of x and y of the oxide of aluminum (AlxOy) formed in the vapor-deposited thin film layer 2 is continuously changed from the substrate film side in the film thickness direction, x: y = 2: 2 to 2: 4. It is characterized by being changed. In general, the smaller the y value of aluminum oxide (AlxOy), the closer to metallic properties, the better the gas barrier properties, but the worse the transparency. In the present invention, a thin film in which the ratio of x and y of the aluminum oxide on the side close to the base film 1 is continuously changed in the thickness direction from x: y = 2: 2 to 2: 2.5 is formed. And the oxide x
And the ratio of y is continuously changed from x: y = 2: 2.5 to 2: 4, so that the deposited thin film is formed in a laminated form, so that the deposited thin film layer 2 is close to the base film at the time of processing. The inorganic oxide on the side plays a role of blocking moisture and various gas components derived from the film, and a deposited aluminum oxide thin film laminated thereon is formed in a very dense state, which is transparent. Thus, it is possible to have excellent gas barrier properties and high water vapor gas barrier properties which are not affected by temperature and humidity.
【００１７】前記蒸着薄膜層２の厚さは５０〜３０００
Åの範囲である必要がある。膜厚が５０Å以下であると
基材フイルム１の全面が膜にならないことがあり、ガス
バリア材としての機能を十分に果たすことができない場
合がある。また、膜厚を３０００Å以上にした場合は薄
膜にフレキシビリティを保持させることができず、成膜
後に折り曲げ、引っ張りなどの外的要因により、薄膜に
亀裂を生じるおそれがある。The thickness of the deposited thin film layer 2 is 50-3000.
Must be in the range of Å. If the film thickness is 50 ° or less, the entire surface of the base film 1 may not be formed into a film, and the function as a gas barrier material may not be sufficiently achieved. On the other hand, when the film thickness is 3000 ° or more, the flexibility of the thin film cannot be maintained, and the thin film may be cracked by external factors such as bending and stretching after the film is formed.
【００１８】図２は本発明の高水蒸気バリアフイルム３
の製造装置の概略図である。基材フイルム１を真空蒸着
装置１０の巻き出し部１２に装着し、蒸着金属原材料２
０を、るつぼ１９に装填後、真空ポンプ１８にて真空チ
ャンバー１１内を真空度１．３×１０-2〜１３×１０
-2 Ｐａの範囲で真空にした後、基材フイルム１を巻き
出し部１２からガイドロール１４を経て巻き取り部１３
に搬送しながら、るつぼ１９中の蒸着金属原材料２０を
電子線加熱方式（図示せず）により加熱蒸発させ、同時
に酸素ガス供給パイプ１７ａから酸素ガスを供給し、更
に酸素ガス供給パイプ１７ｂから前記供給パイプ１７ａ
よりも多い量の酸素ガスを供給する。その量は特に限定
されないが、例えば酸素ガス供給パイプ１７ａからの酸
素ガス供給量の２〜１０倍量の酸素ガスを供給パイプ１
７ｂから供給し反応させながら、基材フイルム１を巻き
出し部１２から巻き取り部１３方向へ搬送させて、基材
フイルム１に近い側は酸素元素の比率が小さい無機酸化
物を蒸着し、さらにその上に連続的に酸素元素の比率が
大きい無機酸化物を積層して蒸着加工することになり、
基材フイルム１の近い側から膜厚方向に無機酸化物の無
機元素と酸素元素の比が連続的に変化した蒸着薄膜層２
を形成させた高水蒸気バリアフイルム３を得ることがで
きる。FIG. 2 shows a high water vapor barrier film 3 of the present invention.
It is a schematic diagram of a manufacturing device of. The base film 1 is mounted on the unwinding section 12 of the vacuum deposition apparatus 10 and the deposition metal raw material 2
After loading 0 into the crucible 19, the vacuum pump 11 evacuates the inside of the vacuum chamber 11 to a degree of vacuum of 1.3 × 10 -2 to 13 × 10.
After evacuating to a pressure within the range of -2 Pa, the base film 1 is unwound from the unwinding unit 12 via the guide roll 14 to the winding unit 13.
The raw material 20 in the crucible 19 is heated and evaporated by an electron beam heating method (not shown) while supplying oxygen gas from an oxygen gas supply pipe 17a and further supplying the oxygen gas from an oxygen gas supply pipe 17b. Pipe 17a
Supply a greater amount of oxygen gas. Although the amount is not particularly limited, for example, the supply amount of the oxygen gas is 2 to 10 times the supply amount of the oxygen gas from the oxygen gas supply pipe 17a.
7b, the base film 1 is transported from the unwinding section 12 to the winding section 13 while reacting, and the side near the base film 1 is deposited with an inorganic oxide having a small ratio of oxygen element. On top of that, an inorganic oxide having a large ratio of oxygen element is continuously laminated and vapor-deposited,
A deposited thin film layer 2 in which the ratio of the inorganic element to the oxygen element of the inorganic oxide continuously changes from the near side of the base film 1 in the thickness direction.
Can be obtained.
【００１９】[0019]
【実施例】本発明の高水蒸気バリアフイルムを実施例を
挙げて説明する。EXAMPLES The high steam barrier film of the present invention will be described with reference to examples.
【００２０】〈実施例１〉基材フイルム１として厚さ１
２μｍの二軸延伸ポリエステルフイルムを使用し、その
基材フイルム１を図２の真空蒸着装置の巻き出し部１２
に装着した後に、るつぼ１９に装填した蒸着金属原材料
２０のアルミニウムを電子線加熱方式で加熱蒸発させ、
酸素ガス供給パイプ１７ａから酸素ガスを供給し、更に
酸素ガス供給パイプ１７ｂから酸素ガス供給パイプ１７
ａ供給量の５倍量の酸素ガスを供給し反応させながら、
基材フイルム１を巻き出し部１２から巻き取り部１３方
向へ１２０ｍ／ｍｉｎのスピードで搬送することによ
り、アルミニウムの酸化物（ＡｌｘＯｙ）のｘとｙの比
を基材フイルム１側から膜厚方向にｘ：ｙ＝２：２〜
２：４に連続的に変化させた厚さ２００Åの蒸着薄膜層
２を基材フイルム１の上に形成し、巻き取り部１３で巻
き取って本発明の高水蒸気バリアフイルム３を得た。Example 1 A substrate film 1 having a thickness of 1
A 2 μm biaxially stretched polyester film was used, and the base film 1 was fed to the unwinding section 12 of the vacuum evaporation apparatus shown in FIG.
After being attached to the crucible 19, the aluminum of the vapor deposition metal raw material 20 loaded in the crucible 19 is heated and evaporated by an electron beam heating method,
Oxygen gas is supplied from the oxygen gas supply pipe 17a, and is further supplied from the oxygen gas supply pipe 17b.
a While supplying and reacting 5 times the amount of oxygen gas with the supply amount,
By transporting the base film 1 from the unwinding unit 12 to the winding unit 13 at a speed of 120 m / min, the ratio of x and y of the aluminum oxide (AlxOy) is determined from the base film 1 side in the film thickness direction. X: y = 2: 2
A vapor-deposited thin film layer 2 having a thickness of 200 ° continuously changed to 2: 4 was formed on the base film 1 and wound up by the winding section 13 to obtain a high steam barrier film 3 of the present invention.
【００２１】〈比較例１〉基材フイルム１として厚さ１
２μｍの二軸延伸ポリエステルフイルムを使用し、その
基材フイルム１を図２の真空蒸着装置の巻き出し部１２
に装着した後に、るつぼ１９に装填した蒸着金属原材料
２０のアルミニウムを電子線加熱方式で加熱蒸発させ、
酸素ガス供給パイプ１７ａと１７ｂから同量の酸素ガス
を供給し反応させながら、基材フイルム１を巻き出し部
１２から巻き取り部１３方向へ１２０ｍ／ｍｉｎのスピ
ードで搬送させ、アルミニウムの酸化物（ＡｌｘＯｙ）
のｘとｙの比がｘ：ｙ＝２：４．５で、その膜厚が２０
０Åの蒸着薄膜層を基材フイルム１の上に形成した比較
用の水蒸気バリアフイルムを得た。<Comparative Example 1> The thickness of the base film 1 was 1
A 2 μm biaxially stretched polyester film was used, and the base film 1 was fed to the unwinding section 12 of the vacuum evaporation apparatus shown in FIG.
After being attached to the crucible 19, the aluminum of the vapor deposition metal raw material 20 loaded in the crucible 19 is heated and evaporated by an electron beam heating method,
While supplying and reacting the same amount of oxygen gas from the oxygen gas supply pipes 17a and 17b, the base film 1 is transported from the unwinding unit 12 to the winding unit 13 at a speed of 120 m / min, and the aluminum oxide ( AlxOy)
Is x: y = 2: 4.5 and the film thickness is 20
A comparative water vapor barrier film having a 0 ° vapor-deposited thin film layer formed on the base film 1 was obtained.
【００２２】〈評価〉実施例１及び比較例１の蒸着フィ
ルムの光線透過率、酸素透過率及び水蒸気透過率を以下
に示す測定方法で測定し、透明性及びガスバリア性を評
価した。その結果を表１に示す。 （１）光線透過率：分光光度計（島津製作所社製 ＵＶ
−３１００）を用いて、波長４００ｎｍの光の透過率を
測定した。 （２）酸素透過率：モダンコントロール社製（ＭＯＣＯ
Ｎ ＯＸＴＲＡＮ １０／５０Ａ）を用いて、２５℃−
１００％ＲＨ雰囲気下で測定した。 （３）水蒸気透過率（初期）：モダンコントロール社製
（ＭＯＣＯＮ ＰＥＲＭＡＴＲＡＮ Ｗ６）を用いて、
４０℃−９０％ＲＨ雰囲気下で各フィルムを蒸着直後に
測定した。 （４）水蒸気透過率（暴露後）：各フィルムを蒸着後に
２５℃、５０％ＲＨの雰囲気中に５日間保持した後にモ
ダンコントロール社製（ＭＯＣＯＮ ＰＥＲＭＡＴＲＡ
Ｎ Ｗ６）を用いて、４０℃−９０％ＲＨ雰囲気下で測
定した。<Evaluation> The light transmittance, oxygen transmittance and water vapor transmittance of the vapor-deposited films of Example 1 and Comparative Example 1 were measured by the following measuring methods, and the transparency and gas barrier properties were evaluated. Table 1 shows the results. (1) Light transmittance: spectrophotometer (UV manufactured by Shimadzu Corporation)
-3100), the transmittance of light having a wavelength of 400 nm was measured. (2) Oxygen permeability: manufactured by Modern Control (MOCO
N OXTRAN 10 / 50A) at 25 ° C.
The measurement was performed under a 100% RH atmosphere. (3) Water vapor permeability (initial): Using MOCON PERMATRAN W6 manufactured by Modern Control Co., Ltd.
Each film was measured immediately after vapor deposition in a 40 ° C.-90% RH atmosphere. (4) Water vapor transmission rate (after exposure): After each film was kept in an atmosphere of 25 ° C. and 50% RH for 5 days after vapor deposition, it was manufactured by Modern Control (MOCON PERMATRA).
Using NW6), the measurement was performed in a 40 ° C.-90% RH atmosphere.
【００２３】[0023]
【表１】 [Table 1]
【００２４】表１の結果より、実施例１は透明性もよ
く、蒸着直後及び２５℃、５０％ＲＨで５日間保持後
も、高温、高湿度条件（４０℃、９０％ＲＨ）での水蒸
気バリア性が低下しないで、良好な水蒸気バリア性を保
持している。なお、酸素ガスバリア性も良好ある。比較
例１は透明性、酸素ガスバリア性は良いが、２５℃、５
０％ＲＨで５日間保持後の高温、高湿度条件下での水蒸
気バリア性の低下が大きい。これらのことから、本発明
の実施例１の高水蒸気バリアフイルムは初期ばかりでな
く、経時でも良好な水蒸気バリア性を保持できることが
わかった。From the results shown in Table 1, it can be seen that Example 1 has good transparency, and immediately after vapor deposition and after holding at 25 ° C. and 50% RH for 5 days, water vapor under high temperature and high humidity conditions (40 ° C. and 90% RH). Good water vapor barrier properties are maintained without a decrease in barrier properties. In addition, the oxygen gas barrier property is also good. Comparative Example 1 has good transparency and oxygen gas barrier properties.
After holding at 0% RH for 5 days, the water vapor barrier property under a high temperature and high humidity condition is greatly reduced. From these facts, it was found that the high water vapor barrier film of Example 1 of the present invention can maintain good water vapor barrier properties not only in the initial stage but also over time.
【００２５】[0025]
【発明の効果】本発明の高水蒸気バリアフイルムは、透
明な基材フイルムの上に、基材フイルムに近い側から膜
厚方向にアルミニウムの酸化物（Ａｌｘ０ｙ）のｘとｙ
の比をｘ：ｙ＝２：２〜２：４に連続的に変化させた蒸
着薄膜層を形成させているので、内容物を透視できる透
明性を有すると共に、包装分野で要求される各種ガスバ
リア性にも優れ、特に温湿度に影響されない優れた水蒸
気バリア性を保持できるので、他の材質との貼り合わ
せ、製袋及び成形加工などの各種加工後も、内容物の品
質保存性に優れ、包装分野に於いて広く使用が可能であ
る。The high water vapor barrier film of the present invention is obtained by forming x and y of aluminum oxide (Alx0y) on a transparent base film in the thickness direction from the side close to the base film.
Is continuously changed from x: y = 2: 2 to 2: 4, so that it has transparency so that the contents can be seen through and various gas barriers required in the field of packaging. It has excellent water vapor barrier properties that are not affected by temperature and humidity, so even after various processes such as bonding with other materials, bag making and molding, it has excellent quality preservability of the contents, Can be widely used in the packaging field.
【図１】本発明の高水蒸気バリアフイルムの側断面図で
ある。FIG. 1 is a side sectional view of a high water vapor barrier film of the present invention.
【図２】本発明の高水蒸気バリアフイルムの製造装置の
概略説明図である。FIG. 2 is a schematic explanatory view of an apparatus for manufacturing a high steam barrier film of the present invention.
１…基材フイルム ２…蒸着薄膜層 ３…高水蒸気バリアフイルム １０…真空蒸着装置 １１…真空チャンバー １２…巻き出し部 １３…巻き取り部 １４…ガイドロール １５…冷却・電極ドラム １６…酸素供給部 １７ａ，１７ｂ…酸素ガス供給パイプ １８…真空ポンプ １９…るつぼ ２０…蒸着金属原材料 DESCRIPTION OF SYMBOLS 1 ... Substrate film 2 ... Evaporated thin film layer 3 ... High steam barrier film 10 ... Vacuum evaporation device 11 ... Vacuum chamber 12 ... Unwinding unit 13 ... Winding unit 14 ... Guide roll 15 ... Cooling / electrode drum 16 ... Oxygen supply unit 17a, 17b: oxygen gas supply pipe 18: vacuum pump 19: crucible 20: vapor-deposited metal raw material
Claims (3)
に蒸着薄膜層を積層した積層体において、該蒸着薄膜層
を構成するアルミニウムの酸化物（ＡｌｘＯｙ）のｘと
ｙの比が、基材フイルム側から膜厚方向にｘ：ｙ＝２：
２〜２：４に連続的に変化したものからなることを特徴
とする高水蒸気バリアフイルム。1. A laminate comprising a transparent base film and a deposited thin film layer laminated on at least one surface of the transparent base film, wherein the ratio of x to y of the oxide of aluminum (AlxOy) constituting the deposited thin film layer is set to X: y = 2 in the film thickness direction from the film side
2. A high-vapor barrier film characterized by being continuously changed in a ratio of 2: 2: 4.
の範囲であることを特徴とする請求項１記載の高水蒸気
バリアフイルム。2. The thickness of said vapor-deposited thin film layer is 50-3000３.
2. The high vapor barrier film according to claim 1, wherein
バリアフイルムの製造時に、蒸着装置内へ異なる量の酸
素ガスを供給することにより、無機元素と酸素元素の比
を連続的に変化させた無機酸化物の蒸着薄膜層を形成さ
せることを特徴とする高水蒸気バリアフイルムの製造方
法。3. The method according to claim 1, wherein the ratio of the inorganic element to the oxygen element is continuously changed by supplying different amounts of oxygen gas into the vapor deposition device during the production of the high water vapor barrier film. A method for producing a high water vapor barrier film, comprising forming a deposited inorganic oxide thin film layer.
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| Publication Number | Publication Date |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005335109A (en) * | 2004-05-25 | 2005-12-08 | Toppan Printing Co Ltd | Heat-resistant transparent barrier film |
| WO2012093182A1 (en) * | 2011-01-05 | 2012-07-12 | Asociación De La Industria Navarra (Ain) | Barrier coat and production method thereof |
| WO2013015315A1 (en) * | 2011-07-27 | 2013-01-31 | 株式会社ダイセル | Gas barrier film and device |
-
2001
- 2001-02-20 JP JP2001042945A patent/JP3956627B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005335109A (en) * | 2004-05-25 | 2005-12-08 | Toppan Printing Co Ltd | Heat-resistant transparent barrier film |
| WO2012093182A1 (en) * | 2011-01-05 | 2012-07-12 | Asociación De La Industria Navarra (Ain) | Barrier coat and production method thereof |
| WO2013015315A1 (en) * | 2011-07-27 | 2013-01-31 | 株式会社ダイセル | Gas barrier film and device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3956627B2 (en) | 2007-08-08 |
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