JP2002239317A - Filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a filter of such a structure that especially it endures a cleaning operation during manufacturing the filter and is free from a damage and a liquid leakage at a connection part and the like, in a filter part of the structure such as a microreactor, a chemical chip, a biochip, a lab-on-a-chip or a nanochip and also a filter part with a columned structure formed in a flow path by etching or some other means. SOLUTION: This filter comprises a first base material which is subjected to a chemical process such as dry etching or wet etching or an energy beam irradiation process using a laser, a fast atom beam or an ionic beam, applied to the surface of a substrate as a blank for working and has a plurality of island-shaped columned forms projecting from the face part in an integrated fashion and a second base material of a plain plate shape which joins the columned forms so that they are tightly closed and sandwiched in between. A gap between the island-shaped columned forms, tightly closed by the first base material and the second base material serves as a filter flow path, and the area of a part where the columned form is embedded in the first base material is controlled so that the area can withstand a high-purity water injection cleaning operation by a 1.5 MHz ultrasonic cleaning nozzle.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a microreactor, a chemical chip, a biochip, a Lab-on-a-chip,
A filter used for separation or filtration of a substance, or a filter used for separation or filtration of a substance, which is arranged in a microchannel formed in a structure such as a nanochip. Regarding the filter for the test piece,
In particular, the present invention relates to a filter formed of minute columnar structures.

[0002]

2. Description of the Related Art Microreactors, chemical chips,
Structures (also referred to simply as chips) intended to perform reactions, separations, and analyzes using very small amounts of solutions, such as biochips, Lab-on-a-chips, and nanochips, are usually made of silicon, quartz glass, Inorganic substances such as borosilicate glass and ceramics, and smooth substrates made of plastics such as polycarbonate and polyacrylamide, and organic substances such as silicone rubber and silicon resin, are subjected to chemical treatment such as dry etching and wet etching, or laser, A microchannel is formed by energy beam treatment with a first atom beam, an ion beam, or the like. In the case of plastic, a method is also used in which a mold is prepared and a molten plastic is poured into the mold. Although the width of the flow path varies depending on the application, it is generally about 40 μm to 500 μm and the depth is about 0.6 μm to 500 μm. Forming solution inlets and outlets on smooth substrates made of inorganic substances such as silicon, quartz glass, borosilicate glass and ceramics, or plastics such as polycarbonate and polyacrylamide, and organic substances such as silicone rubber and silicon resin, The ultrasonic wave, heat, pressure,
Bonding by chemical treatment to create structures such as microreactors, chemical chips, biochips, Lab-on-a-chips, and nanotips.

[0003] In a structure having such a flow path, in order to separate a substance contained in a solution flowing in the flow path or to separate a substance by electrophoresis,
Depending on the size of the substance to be separated, a method of filling a part of the flow channel with gel, polymer, zeolite, etc., dry etching, wet etching, etc. There is a method of physically providing a filter by providing a plurality of columnar structures formed by the above method.
However, the filling method requires time and effort for filling when used, and the packing having a desired size is not uniform in the molecular structure of the hole in the packing material and the separation function varies. It may be difficult to synthesize a product.
The method of forming a columnar structure in a flow channel by etching or the like to create a filter portion is based on the volume, cross-sectional area,
There is an advantage that the interval can be set arbitrarily.

[0004] In the above-described filter section formed by providing a columnar structure formed by etching or the like in the flow path, the resistance to the liquid flow increases when the ratio of the columnar structure rest to the cross section of the flow path increases. In addition, it is necessary to increase the liquid sending pressure, and there is a possibility that the connection portion and the like may be damaged or the liquid may leak. Therefore, it is desired to reduce the proportion of the columnar structure in the flow path. That is, it is desirable to form a columnar structure so as to have a desired interval and to make the columnar structure as thin as possible. In addition, when the columnar structure is formed by etching, a case in which a residue of the resist used in patterning, a foreign substance contained in an etching solution or a resist stripping agent, or an airborne substance adheres to the flow path or the columnar structure. Therefore, it is necessary to clean the substrate on which the columnar structure is formed. Normally, when cleaning a substrate having a fine pattern, foreign matter and dirt particles are extremely small, and it is necessary to overcome the intermolecular attractive force between the substrate and the foreign material and dirt. Physical cleaning, ultrasonic cleaning, high-pressure cleaning, and the like are used in combination because of incompleteness. However, there is a problem that the columnar structure is damaged or broken during cleaning. If the solution is allowed to flow through the flow path with foreign matter or dirt removed or incomplete, these foreign matter or dirt will elute into the solution,
It may contaminate the solution, contaminate the solution, reduce the accuracy of measurement or inspection, or hinder detection.

[0005]

As described above, microreactors, chemical chips, biochips, Lab-on
-a-chip, a filter part in a structure such as a nanochip, a filter part provided with a columnar structure flow path formed by etching or the like in the flow path, particularly, is resistant to cleaning during manufacturing and has a connection part. There is a demand for a structure that does not cause breakage or liquid leakage. The present invention corresponds to this, and is a filter portion in a structure such as a microreactor, a chemical chip, a biochip, a Lab-on-a-chip, a nanochip, and a columnar shape formed by etching or the like in a flow path. It is an object of the present invention to provide a filter section provided with a structure, which has a structure that withstands cleaning during manufacture and does not cause damage to a connection portion or liquid leakage.

[Problems to be solved by the invention]

[0006]

According to the present invention, there is provided a filter comprising:
Microreactors, chemical tips, biochips,
Lab-on-a-chip, a filter used for separation and filtration of substances, or a filter used for separation and filtration of substances, placed in a microchannel formed in a structure such as a nanochip This is a filter for test pieces used for testing, etc., and the surface of the substrate as a processing material is subjected to chemical treatment such as dry etching and wet etching, or energy by laser, first atom beam, ion beam, etc. A first base member integrally formed with a plurality of island-shaped pillars formed by projecting from the surface portion by performing a line irradiation treatment, and sealing the pillars so as to sandwich the pillars therebetween. A gap between island-shaped pillars sealed by the first and second base materials is formed as a filter flow path, and the first base material and the second base material are joined together. To base material , The area of implantation portion of the pillars,
It is characterized in that it is controlled so as to withstand ultrapure water jet cleaning by a 1.5 MHz ultrasonic cleaning nozzle. In the above, both the first base material and the second base material are made of an inorganic substance such as silicon, quartz glass, borosilicate glass or ceramic, a plastic such as polycarbonate or polyacrylamide, a silicone rubber or a silicon resin. Which is characterized by comprising an organic substance. Further, in the above, the first substrate is made of a material mainly composed of silicon oxide such as quartz glass, borosilicate glass, ceramics, aluminosilicate glass, or the like, and is processed by dry etching from the processed material. It is characterized by being formed.

Further, in the above, the first substrate is made of quartz glass, and the area of the landing portion of the columnar material on the first substrate having a plurality of island-like columnar materials is 0.2 square μm. (Μm
² ) The columnar object is characterized in that the shape of the landing portion is a rectangular or square prism, and one of the long sides of the rectangle or one of the sides of the square.
The side is a side in the direction of the flow path, and the minimum side length (length in the direction perpendicular to the flow path) is 0.4 μm or more, or a columnar shape. Things are
The shape of the landing part is circular and its diameter is 0.25mμ
The above is the feature.

[0008] Here, "withstands ultrapure water jet cleaning with a 1.5 MHz ultrasonic cleaning nozzle" means that a flow rate of 1.0 l / min is applied while applying 1.5 MHz vibration to the nozzle.
This is a cleaning method in which the ultrapure water sprayed from the nozzle is received by the surface of the first base material on the column formation side for one minute. This method uses a known commercially available fine jet system (Co., Ltd.
(Using a pre-tech generator and a fine jet nozzle), and in this application, it has been confirmed by this system. Also, the shape of the landing part is often rounded at the intended rectangular or square corner at the stage of patterning, but here, the length of one side is assumed to be that rounding of the corner did not occur , I.e., the intersection of two adjacent sides when the straight line portion is extended is regarded as the vertex of the rectangle or square.

[0009]

The filter of the present invention has a structure as described above, and can be used in a filter portion of a structure (chip) such as a microreactor, a chemical chip, a biochip, a Lab-on-a-chip, a nanochip, and the like. A filter with a columnar structure formed by etching or the like in the road, or a filter for test pieces for use in tests or the like used for separation or filtration of substances, especially when manufacturing It is possible to provide a structure that can withstand the cleaning of the substrate and does not cause breakage of the connection portion or the like or leakage of liquid. This makes it possible to prevent liquid leakage at the connection portion between the filter portion and the second base material. In particular, by controlling the shape and area of the landing portion of the columnar structure and securing the necessary strength in a buried manner, the conventional cleaning method can be applied without damaging or destroying the columnar structure. It is intended to be able to produce a filter for a microchannel made of a columnar structure that is clean and free of dirt. Further, the present invention does not significantly change the manufacturing process of the columnar structure by the conventional etching. In particular,
If the shape of the implantation part is rectangular, the side parallel to the flow of the solution is longer than the side perpendicular to the flow of the solution.If the shape of the implantation part is elliptical, the diameter parallel to the flow of the solution is the flow of the solution. Longer than the diameter perpendicular to, the proportion of the columnar structure in the cross section orthogonal to the flow of the flow path is reduced even if the same landing area, thereby, even if the same landing area, This allows the solution to flow with low pressure.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to the drawings. FIG. 1A is a cross-sectional view of an example of an embodiment of the filter of the present invention, and FIG. 1B is a sectional view of FIG.
FIG. 1C is a view of the first base material of the embodiment shown in FIG. 1 viewed from the A0 side, and FIG. 1C is a view showing a state where a large number of the first base materials are arranged on a large-size base material. FIG. 4 is a cross-sectional view of a manufacturing process of a first base material. FIG. 1A shows A1-
The direction of the flow of the liquid to be filtered is from the flow path inlet 130a to the flow path outlet 13 as viewed in the direction of the arrow from A2.
0b. FIG. 1B shows a part of the arrangement of the pillars. Each pillar has a staggered pattern, that is,
Except for the surrounding area, another columnar object is disposed at a predetermined position around the columnar object 111a. 1 and 2,
110 is a first base material, 110a is a landing part, 110A is a large-sized base material, 111 and 111a are columnar objects, 112 is a bank part, 113 is an etched surface, 120 is a second base material,
130 is a flow channel, 130a is a flow channel inlet, 130b is a flow channel outlet, 210 is a quartz substrate, 211 is a columnar material, 212 is a bank portion, 215 is an etching surface, 220 is a light shielding film, 220
A is a light shielding film pattern, and 230 is a resist pattern. Also, d1 is the column-direction interval of the column, d2 is the column interval of the column, d3 is the length of one side of the column in the column direction, and d4 is the length of one side in the direction orthogonal to the column of the column. is there.

An embodiment of the filter according to the present invention will be described with reference to FIG. The filters in this example are microreactor, chemical chip, biochip, Lab-on
-a-chip, a filter part for a microchannel used for separation and filtration of substances, which is arranged in a microchannel formed in a structure such as a nanochip, and a quartz substrate as a processing material A first base material 110 provided with a large number of predetermined arrangements by integrally forming island-shaped pillars 111 formed on the surface of the substrate by dry etching and projecting from the surface portion thereof;
An island sealed with a first base material and a second base material, the flat base material being joined to the columnar material 111 so as to sandwich the columnar material 111 therebetween; The gaps between the columnar objects are formed as filter channels. Then, the cross-sectional shape of the landing portion 111a of the pillar 111 on the first base material 110 is square, and the area of the cross-section is 0.2 μm ² (μm ² ) or more. This is controlled so as to withstand the ultrapure water jet cleaning by the 5 MHz ultrasonic cleaning nozzle.
In this example, the bank 112 of the first base material is
11 so as to surround the entire formation region.

During filtering, the fluid enters the flow channel 130 from the flow channel inlet 130a of the second substrate 120, and the columnar object 111 acts as an obstacle to the liquid flow, and the flow channel outlet 130b of the second substrate 120 The substance is separated and filtered during this time. In this example, in order to obtain a predetermined flow at a low pressure, one side of the cross section of the square of the columnar object 111 is adjusted to the flow direction (the direction from A1 to A2) to facilitate the flow. This prevents liquid leakage at an unnecessary high pressure.

Examples of the second base material 120 include inorganic materials such as silicon, quartz glass, borosilicate glass and ceramics, and plastic materials such as polycarbonate and polyacrylamide, and organic materials such as silicone rubber and silicon resin. Normally, as shown in this example, although not shown, the first base material 110 in which the fluid inlet and outlet are formed in the second base material 120 and the fluid inlet and outlet are formed.
Are bonded by ultrasonic, heat, pressure and chemical treatment. In this example, a quartz substrate was used as a material of the first base material 110, but the material is not limited to this. Examples of the material include, besides quartz glass, inorganic materials such as borosilicate glass and ceramics, and materials made of plastics such as polycarbonate and polyacrylamide and organic materials such as silicone rubber and silicon resin. , To the first substrate 110 according to the material,
It is only necessary to control the cross-sectional shape and area of the landing section 111a of 11 so as to withstand physical cleaning of the first base material 110.

In this embodiment, the landing portion 111 of the pillar 111
The cross-sectional shape of a is exemplified by a square, but is not limited thereto. In addition, a square shape whose sides can be matched with the flow direction of the fluid, for example, a square, a rectangle, or a circle Is mentioned. And the columnar object 111
In the case where the shape of the landing portion 111a is a rectangle or a square, it is preferable that one long side of the rectangle or one side of the square be a side in the flow path direction. In particular, first, when the base material is a quartz substrate, it is preferable that the length in the direction perpendicular to the flow direction of the fluid is 0.4 μm or more. First, when the material of the base material is a quartz substrate, and when the shape of the landing portion 111a of the columnar object 111 is circular, the diameter is preferably 0.25 μm or more.

Next, the first method of manufacturing the first base material 110 is as follows.
An example will be described with reference to FIG. First, a chromium-based film was provided on one surface of a quartz substrate 210 as a light-shielding film 220.
With respect to the photomask blank (FIG. 2A), an etching-resistant film (hereinafter, also referred to as a resist pattern) 230 for dry-etching the light-shielding film is formed on the light-shielding film 220 by a normal photolithography method. It is formed according to the specifications of the first base material. (FIG. 2B) Normally, FIG.
As shown in (c), in order to fabricate the first base material 110 in a state where a large number of first base materials 110 are arranged on the large-size base material 110A, the resist pattern 2 is mounted on one surface of the quartz substrate 210 while being imposed.
30 is manufactured, and the following processing is performed. Next, portions of the light-shielding film 220 exposed from the resist pattern 230 are removed by dry etching using a chlorine-based gas.
(FIG. 2C) Next, using the resist pattern 230 and the light-shielding film pattern 220A (light-shielding film 220) as an etching-resistant mask, the exposed portion of the quartz substrate 210 is dry-etched with a fluorine-based gas to obtain a columnar member having a predetermined shape. 21
1. A bank 212 is formed (FIG. 2D), the resist pattern 230 is removed with a predetermined stripper, and the light-shielding film pattern 220A is removed by wet etching with a ceric ammonium nitrate solution (FIG. 2 (D)). e)), further performing a washing treatment or the like to obtain a desired first base material. The first shown in FIG.
The method for manufacturing the base material is not limited to this example, but the etching for forming the light-shielding film pattern 220A and the etching for forming the pillars 211 and the bank 212 are formed by dry etching. It is preferable in terms of shape.

In this example, the second base material is also made of quartz, and the first base material 110 and the second base material 120 are attached to each other with the first base material 111 interposed therebetween. After the material and the second base material are combined, they are joined by heat treatment at, for example, 1000 ° C. or higher, but the present invention is not limited to this.

The filter of the present example is a microreactor, a chemical chip, a biochip, a Lab-on-a-chip,
A filter section for microchannels used for separation and filtration of substances placed in microchannels formed in a structure such as a nanochip.The same structure is used for separation and filtration of substances. It can also be used as a filter for a test piece for using the used one for a test or the like.

[0018]

EXAMPLES The filter of the present invention will be further described with reference to examples. (Example 1) In Example 1, a filter for a microchannel shown in FIG. 1 was produced using the base material produced in the step shown in FIG. A first substrate (110 in FIG. 1) was produced as follows. A description will be given based on FIG. The distance d between the columns in the column direction of the first base material to be manufactured.
1. Column-to-column spacing d2, one side of column d3, d
The corresponding target dimensions of the resist pattern for determining 4 were 3 μm, 3 μm, 0.6 μm, and d4 were 0.6 μm, respectively. First, a photomask blank (FIG. 2A) having a light-shielding film 220 in which a chromium film (90 nm thick) and a chromium oxide film (20 nm thick) are sequentially laminated on one surface of a quartz substrate 210 is used. After forming a positive resist IP3500 by spin coating on the substrate 220, the laser writing apparatus ALTA3500 (ETEC
After pattern drawing corresponding to the first base material to be produced is performed using
A resist pattern 230A corresponding to the shape shown in FIG.
Was formed. (FIG. 2B) Next, the light-shielding film 220 made of chromium oxide and chromium film exposed from the opening of the resist pattern 230A was dried with chlorine gas using a dry etcher (VLR70 manufactured by PTI).
0) to form a light-shielding film pattern 220A. (FIG. 2C) Next, a mixed gas of CF ₄ and O ₂ (volume ratio CF ₄ : O ₂₎
= 95: 5), and dry-etching was performed for 120 minutes to form a columnar object 111 and a bank 112 having a predetermined shape. (FIG. 2 (d)) Height of pillar 111 (depth of dug quartz substrate 210)
Was 0.7 μm. Next, after the remaining resist pattern 230A is ashed with oxygen plasma and removed with an alkaline solution, the light-shielding film pattern 230A made of a chromium film and a chromium oxide film remaining on the quartz All were removed with an etching solution containing a cerium ammonium aqueous solution as a main component. (FIG. 2 (e))

An image was taken with an electron microscope at a magnification of 25,000 from directly above the column 111, and the length of the side of the column was measured. As a result, the landing area was 0.593 μm and 0.589 μm.
It was 349 square μm (μm ² ). Next, the entire dug area was visually observed with an optical microscope of 1000 times, and it was confirmed that there was no broken or collapsed columnar object. Also,
It is detected that foreign matter is attached near the landing part 111a of the five pillars 111. After immersing the substrate on which the columnar structures are formed in a concentrated sulfuric acid solution containing a small amount of nitric acid for 3 minutes,
After washing with deionized water and removing concentrated sulfuric acid, pure water containing 0.1% of a surfactant was supplied to the outlet at a pressure of 60 kgf / cm ^2.
The substrate was dispersed 3 times in water. Further, the ultrapure water jetted from the nozzle at a flow rate of 1.0 l / min for 1 minute using a 1.5 MHz ultrasonic nozzle was applied to the surface of the first base material on the side on which the columnar material was formed. The substrate of No. 1 was spray-cleaned with ultrapure water for 500 seconds. After cleaning, the entire dug area was visually observed with a 1000 × optical microscope, and it was confirmed that the columnar structure was not damaged or collapsed, and that all foreign matters were removed. The ultrapure water spray cleaning time is determined by checking beforehand that removal of foreign matter in one minute is sufficient.

Thereafter, the first base material 110 made of quartz is used, and the second base material 120 made of quartz and having an inlet and an outlet for a fluid is heated at 1000 ° C. The filter for the micro flow path shown in FIG. 1A was formed by bonding by pressure bonding, and this filter was used.

(Embodiment 2) In Embodiment 2, the cross-sectional shape of the columnar member of the first base material is changed in Embodiment 1, and otherwise the same method and conditions as in Embodiment 1 are used. To prepare a columnar material, which was washed. The cross-sectional shape of the pillar is rectangular,
The arrangement is such that the corresponding target dimensions of the resist pattern for determining the column-to-column spacing d1 in the column direction, the column-to-column spacing d2, and the sides d3 and d4 of the column, respectively. 3 μm, 3 μm, 0.4 μm, d4 0.7 μm
And As in Example 1, a column was formed and 25,000
When the length of the side of the columnar structure was measured by using an electron microscope at a magnification of 0.391 μm and 0.687 μm, the landing area was 0.269 square μm (cm ² ). Example 1
After washing in the same manner as in the above, the entire dug area was visually inspected at a magnification of 1000 times, and it was confirmed that there were no broken or collapsed pillars.

Thereafter, similarly to the first embodiment, the first base material 110 made of quartz is used, and the second base material 120 made of quartz and having an inlet and an outlet for fluid is formed. 1
Adhesion was performed by thermocompression bonding at 000 ° C. to form a filter for a microchannel shown in FIG. 1A, which was used.
There was no liquid leakage and it could be used without any problem.

(Embodiment 3) In Embodiment 3, similarly to Embodiment 2, the cross-sectional shape of the columnar object is rectangular, and the arrangement is such that the column-to-column distance d1 in the column direction, the columnar column Row spacing d
2. The corresponding target dimensions of the resist pattern for determining one side d3 and d4 of the columnar object are 3 μm and 3 μm, respectively.
Columns were produced under the same method and conditions as in Example 2 with m, 0.4 μm, and d4 set to 0.5 μm. Further, after the resist pattern 230 was peeled off and the light-shielding film pattern 220A was removed by etching, wet etching with a hydrofluoric acid solution was performed. Is put in the whole. After the wet etching, the substrate was washed with water to form a columnar material as in Examples 1 and 2. The columnar structure was photographed with an electron microscope at a magnification of 25,000 and the length of the side of the columnar structure was measured. It was 0.630 μm and the landing area was 0.199 square μm (μm ² ). After washing in the same manner as in Example 1, the entire dug area was visually inspected at a magnification of 1000 times, and it was confirmed that there was no broken or collapsed columnar object.

(Comparative Example 1) Comparative Example 1 was prepared by changing the cross-sectional shape of the columnar material of the first base material in Example 1, except for the same method and conditions as in Example 1. To prepare a columnar material, which was washed. The cross-sectional shape of the pillar is rectangular,
The arrangement is such that the corresponding target dimensions of the resist pattern for determining the column-to-column spacing d1 in the column direction, the column-to-column spacing d2, and the sides d3 and d4 of the column, respectively. 3 μm, 3 μm, 0.4 μm, d4 0.5 μm
And After the formation of the columnar material, 25,000 as in Example 1.
When the length of the side of the columnar structure was measured with a scanning electron microscope at a magnification of 0.391 μm and 0.488 μm, the landing area was 0.191 square μm (μm ² ). Example 1
Similarly, after washing, the entire dug area was visually observed with an optical microscope of 11,000 times.
0, damaged, collapsed.

(Comparative Example 2) A comparative example was prepared by changing the cross-sectional shape of the columnar material of the first base material in Example 1, and was otherwise identical to that of Example 1 by the same method and conditions. Columns were made and washed. The cross-sectional shape of the pillar is rectangular,
The arrangement is such that the corresponding target dimensions of the resist pattern for determining the column-to-column spacing d1 in the column direction, the column-to-column spacing d2, and the sides d3 and d4 of the column, respectively. 3 μm, 3 μm, 0.4 μm, d4 is 0.4 μm
And In the same manner as in Example 1, an image was taken with an electron microscope at a magnification of 25000 and the length of the side of the columnar structure was measured.
0.391μm and 0.385μm for landing area of 0.15
Square μm (μm ² ). As in Example 1, after cleaning, the entire dug area was visually observed with an optical microscope of 11,000 times. As a result, it was found that about 300 columnar structural breaks were broken or collapsed.

According to Examples 1 to 3 and Comparative Examples 1 and 2, when the first substrate is made of quartz glass, the first substrate 110 is ultrasonically cleaned at 1.5 MHz. It can be seen that in order to withstand the ultrapure water spray cleaning by the nozzle, the area of the landing portion of the columnar material needs to be 0.2 square μm (μm ² ) or more. In addition, the physical resistance by the ultrapure water jet cleaning using the ultrasonic cleaning nozzle of 1.5 MHz substantially depends only on the cross-sectional area of the landing portion of the columnar object.

[0027]

As described above, the present invention provides a microreactor, a chemical chip, a biochip, a Lab-on-a-chi
p, a filter in a structure such as a nanochip, or a filter for a test piece for using a substance used for separation or filtration of a substance for a test or the like, and
It is possible to provide a filter provided with a columnar structure formed by etching or the like in a flow path, and which has a structure that withstands washing at the time of manufacturing and does not cause damage to a connection portion or the like and liquid leakage. As is clear from the above description, in the filter provided with the columnar material of the present invention, since the cross-sectional area of the landing portion of the columnar material integrated with the first base material is controlled, the filter is imbedded. Chemical and physical cleaning, where strength is maintained and used to clean the first substrate,
Ultrasonic cleaning, high pressure cleaning, etc. can be used together, and the columnar material will not be damaged or destroyed during cleaning. As a result, a filter for a microchannel having a pillar and a pillar having no foreign matter or dirt attached to the periphery thereof can be realized with good yield and at low cost.

[Brief description of the drawings]

FIG. 1 (a) is a cross-sectional view of an example of an embodiment of a microchannel filter according to the present invention, and FIG. 1 (b) is FIG.
FIG. 1A is a diagram of a first base material of the embodiment shown in FIG. 1A viewed from the A0 side, and FIG. 1C is a diagram illustrating a state in which a large number of the first base materials are arranged on a large-sized base material. is there.

FIG. 2 is a cross-sectional view of a manufacturing process of a first base material.

[Explanation of symbols]

110 1st base material 110a Landing section 110A Large size base material 111, 111a Column-shaped material 112 Bank portion 113 Etched surface 120 Second base material 130 Flow path 130a Flow path entrance 130b Flow path exit d1 Column direction of columnar substance Spacing d2 column spacing of columns d3 length of one side in column direction of columns d4 length of one side in direction orthogonal to column of columns 210 quartz substrate 211 columnar 212 bank 215 etching surface 220 light shielding film 220A Light shielding film pattern 230 Resist pattern

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H096 AA30 BA09 CA05 EA04 GA08 HA14 HA15 HA23 HA24 JA04 2H097 CA16 CA17 LA20 4D019 AA03 AA04 BA01 BA04 BA05 BA06 BA13 BB01 BD01 BD10 CB04 CB06

Claims (6)

[Claims] 1. A microreactor, a chemical chip,
A filter used for separation and filtration of substances, or used for separation and filtration of substances, placed in a microchannel formed in a structure such as a biochip, Lab-on-a-chip, or nanochip This is a filter for test pieces that is used for testing, etc., and the surface of the substrate, which is a processing material, is subjected to chemical treatment such as dry etching and wet etching, or a laser, first atom beam, ion beam, etc. The first base member integrally having a plurality of island-shaped pillars formed so as to protrude from the surface portion, and the pillars are hermetically sealed so as to sandwich the pillars therebetween. And a plate-like second base member joined in such a manner that a gap between island-shaped columnar members sealed by the first base member and the second base member is formed as a filter channel. To the first base member, a filter for the area of implantation portion of the pillars, to withstand ultra pure water jetting cleaning by the ultrasonic cleaning nozzle of 1.5 MHz, characterized in that it controls. 2. The method according to claim 1, wherein the first base material, the second base material,
Wherein the base material is made of an inorganic material such as silicon, quartz glass, borosilicate glass or ceramic; a plastic such as polycarbonate or polyacrylamide; or an organic material such as silicone rubber or silicon resin. 3. The processing material according to claim 1, wherein the first base material is a material mainly composed of silicon oxide, such as quartz glass, borosilicate glass, ceramics, or aluminosilicate glass. A filter formed by dry etching. 4. The method according to claim 1, wherein the first base material is made of quartz glass, and the area of the landing portion of the columnar material on the first base material having a plurality of island-like columnar materials is zero. .2 square μ
m (μm ² ) or more. 5. The columnar object according to claim 4, wherein the landing portion has a rectangular or square prismatic shape, and one long side of the rectangle or one side of the square is defined as a side in the flow direction. A length of the minimum side (length in a direction orthogonal to the flow path) is 0.4 μm or more. 6. The filter according to claim 4, wherein the columnar object has a circular shape at the landing portion and a diameter of 0.25 μm or more.