JP2002214619A - Liquid crystal display - Google Patents

Liquid crystal display

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Publication number
JP2002214619A
JP2002214619A JP2001006723A JP2001006723A JP2002214619A JP 2002214619 A JP2002214619 A JP 2002214619A JP 2001006723 A JP2001006723 A JP 2001006723A JP 2001006723 A JP2001006723 A JP 2001006723A JP 2002214619 A JP2002214619 A JP 2002214619A
Authority
JP
Japan
Prior art keywords
substrate
pixel
liquid crystal
color filter
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001006723A
Other languages
Japanese (ja)
Other versions
JP4099947B2 (en
Inventor
Yuji Okita
雄二 置田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP2001006723A priority Critical patent/JP4099947B2/en
Publication of JP2002214619A publication Critical patent/JP2002214619A/en
Application granted granted Critical
Publication of JP4099947B2 publication Critical patent/JP4099947B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display which can use spherical spacers to facilitate the working process steps as spacing holding means between a pair of substrates while having an excellent visual angle characteristic by forming the surface of liquid crystal boundaries in a curved surface shape. SOLUTION: The array substrate 1 and the color filter substrate 8 are maintained at a prescribed spacing by interposing the spherical spacers 7 between both substrates 1 and 8. The color filters 10 of the color filter substrate 8 are so formed that the entire part of the surface within one pixel has a projecting shape for every pixel. The spherical spacers 7 are portioned into recessed 14 segments between the color filters 10 of the mutually adjacent pixels.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は広視野角な液晶表示
装置に関する。
The present invention relates to a liquid crystal display device having a wide viewing angle.

【0002】[0002]

【従来の技術】液晶表示装置としてはTN方式が実用化
されているが、TN方式は視野角が狭いという問題があ
った。そこでECB方式やVA方式などの視角特性の優
れたものが研究され、更には1画素内を配向分割して各
領域の液晶分子により視角特性を互いに補償し合うもの
が提案されている。例えば、画素電極や対向電極に突起
又はスリットを形成して配向分割するものが特許第29
47350号公報、特許第3005418号公報に開示
されている。しかし突起やスリットを形成する場合はそ
の部分により開口率が低下してしまうため、できるだけ
微細な加工が求められが、製造上の歩留まりを下げない
ためにある程度の幅が必要となり、開口率が低下してし
まう。そこで部分的に突起やスリットを形成するもので
はなく、1画素毎に画素電極上の絶縁膜全体を曲面形状
にしたものが例えば特開2000−75275号公報に
開示されている。この形態を図8に基づいて説明する。
図8はこの従来の液晶表示装置の1画素を示す断面図で
あり、図8(a)はアレイ基板102側の表面を凹状に
した形態、図8(b)はアレイ基板102側の表面を凸
状にした形態である。
2. Description of the Related Art As a liquid crystal display device, a TN mode has been put to practical use, but the TN mode has a problem that a viewing angle is narrow. Therefore, those having excellent viewing angle characteristics, such as the ECB method and the VA method, have been studied. Further, a method has been proposed in which one pixel is aligned and divided so that the viewing angle characteristics are mutually compensated by liquid crystal molecules in each region. For example, a method in which a projection or a slit is formed on a pixel electrode or a counter electrode to perform alignment division is disclosed in Japanese Patent No. 2978.
No. 47350, and Japanese Patent No. 3005418. However, in the case of forming projections and slits, the aperture ratio is reduced by that part, so fine processing is required as much as possible, but a certain width is required to keep the production yield low, and the aperture ratio decreases. Resulting in. For example, Japanese Patent Application Laid-Open No. 2000-75275 discloses a structure in which a projection or a slit is not formed partially but the entire insulating film on a pixel electrode is curved for each pixel. This embodiment will be described with reference to FIG.
FIG. 8 is a cross-sectional view showing one pixel of this conventional liquid crystal display device. FIG. 8A shows a form in which the surface on the array substrate 102 side is concave, and FIG. This is a convex shape.

【0003】図8(a)では、ガラスなどの透明なアレ
イ基板102にゲート電極、ゲート配線を形成し、その
上層にゲート絶縁膜を形成する。ゲート電極上にアモル
ファスシリコンからなる半導体層を形成し、その後にド
レイン電極、ソース電極、ドレイン配線を形成する。次
に、ITOなどの透明導電膜からなる画素電極103を
ソース電極に接続させて形成し、その上層に透明な絶縁
膜104により凹状を形成する。これは絶縁膜104に
熱可塑性の材料である例えばアクリルまたはポリイミド
などを使用し、フォトレジスト工程により比較的膜厚の
厚い部分を形成し、その後、熱可塑性を利用し凹部の傾
斜面と底部を形成する。絶縁膜104上に垂直配向性を
有する配向膜105を形成し、凹部のほぼ中央に絶縁膜
からなる柱状スペーサ112を形成する。アレイ基板1
02の対向側にはCF基板110(カラーフィルタ基
板)が配置される。これは、ガラスなどの透明なCF基
板110上にカラーフィルタ109、ITOからなる対
向電極108、垂直配向性を有する配向膜107を順次
積層している。そして基板102、110間に誘電率異
方性が負の液晶106を封入し、電圧無印加時は液晶分
子106が垂直配列し、電圧印加時は液晶分子106が
絶縁膜104の凹状に沿って複数の方向に傾斜して配列
する。基板102、110の外側に直交ニコルの偏光板
101、111を貼付し、電圧無印加時に黒表示になる
ノーマリブラックモードになる。図8(b)は画素電極
103の上層の絶縁膜104を凸状に形成したものであ
り、その他の構成は図8(a)と同じである。
In FIG. 8A, a gate electrode and a gate wiring are formed on a transparent array substrate 102 such as glass, and a gate insulating film is formed thereon. A semiconductor layer made of amorphous silicon is formed over the gate electrode, and then a drain electrode, a source electrode, and a drain wiring are formed. Next, a pixel electrode 103 made of a transparent conductive film such as ITO is formed so as to be connected to the source electrode, and a concave shape is formed thereover by a transparent insulating film 104. This is done by using a thermoplastic material such as acrylic or polyimide for the insulating film 104, forming a relatively thick portion by a photoresist process, and then using thermoplasticity to remove the inclined surface and bottom of the concave portion. Form. An alignment film 105 having vertical alignment is formed on the insulating film 104, and a columnar spacer 112 made of an insulating film is formed substantially at the center of the concave portion. Array substrate 1
A CF substrate 110 (color filter substrate) is arranged on the side opposite to the surface 02. In this method, a color filter 109, a counter electrode 108 made of ITO, and an alignment film 107 having vertical alignment are sequentially stacked on a transparent CF substrate 110 made of glass or the like. A liquid crystal 106 having a negative dielectric anisotropy is sealed between the substrates 102 and 110. When no voltage is applied, the liquid crystal molecules 106 are vertically arranged. When a voltage is applied, the liquid crystal molecules 106 are arranged along the concave shape of the insulating film 104. Arrange in an inclined manner in a plurality of directions. Orthogonal Nicol polarizing plates 101 and 111 are attached to the outside of the substrates 102 and 110, and a normally black mode in which black display is performed when no voltage is applied is provided. FIG. 8B shows a configuration in which the insulating film 104 in the upper layer of the pixel electrode 103 is formed in a convex shape, and the other configuration is the same as that in FIG.

【0004】また特開平9−258208号公報には、
CF基板131側の表面を曲面形状にしたものが開示さ
れている。図9はこの従来の液晶表示装置の断面図であ
り、図9(a)はCF基板131側の表面を凹状にした
形態、図9(b)はCF基板131側の表面を凸状にし
た形態である。
Japanese Patent Application Laid-Open No. 9-258208 discloses that
A structure in which the surface on the CF substrate 131 side is a curved surface is disclosed. FIG. 9 is a cross-sectional view of this conventional liquid crystal display device. FIG. 9A shows a form in which the surface on the CF substrate 131 side is concave, and FIG. 9B shows a form in which the surface on the CF substrate 131 side is convex. It is a form.

【0005】図9(a)では、アレイ基板121とCF
基板131(カラーフィルタ基板)を対向配置し、この
一対の基板121、131間に液晶125を封入してい
る。ガラスなどの透明なアレイ基板121上には各画素
領域を包囲するように高分子壁124が形成され、各画
素内に画素電極122が配置されている。画素電極12
2の上層には、垂直配向性を有する配向膜123が形成
される。CF基板131には各画素領域のカラーフィル
タ129を凹状にするために、高分子壁124と対向す
る部分に突起130が形成されている。この突起130
はカラーフィルタ129を形成する材料と親和性が高い
下部層130aとカラーフィルタ129を形成する材料
と親和性が低い上部層130bを有し、所定の位置に下
部層130aと上部層130bが順次ホトリソグラフィ
法で形成される。この突起130の間にバブルジェット
(登録商標)法やインクジェット法によってインクを付
着させてカラーフィルタ129を形成するが、下部層1
30aの材料はインクと親和性が高いので下部層130
aの側面にインクが付着し、メニスカスによってインク
の表面が凹面となる。インクを乾燥させてカラーフィル
タ129を形成した後、オーバーコート層128、IT
Oなどの透明導電材料からなる対向電極127、垂直配
向膜126を順次形成する。液晶125には誘電率異方
性が負のものを用いるため、電圧無印加時は液晶分子1
25が垂直配列し、電圧印加時は液晶分子125がCF
基板131の表面の凹状に沿って複数の方向に傾斜して
配列する。基板121、131の外側に直交ニコルの偏
光板120、132を貼付し、電圧無印加時に黒表示に
なるノーマリブラックモードになる。
In FIG. 9A, an array substrate 121 and a CF
A substrate 131 (color filter substrate) is disposed to face, and a liquid crystal 125 is sealed between the pair of substrates 121 and 131. A polymer wall 124 is formed on a transparent array substrate 121 such as glass so as to surround each pixel region, and a pixel electrode 122 is arranged in each pixel. Pixel electrode 12
An alignment film 123 having a vertical alignment property is formed on the upper layer 2. A projection 130 is formed on the CF substrate 131 at a portion facing the polymer wall 124 to make the color filter 129 of each pixel region concave. This projection 130
Has a lower layer 130a having a high affinity for the material forming the color filter 129 and an upper layer 130b having a low affinity for the material forming the color filter 129, and the lower layer 130a and the upper layer 130b are sequentially arranged at predetermined positions. It is formed by a lithography method. Ink is deposited between the projections 130 by a bubble jet (registered trademark) method or an ink-jet method to form a color filter 129.
Since the material of 30a has a high affinity for the ink, the lower layer 130a
The ink adheres to the side surface of a, and the surface of the ink becomes concave due to the meniscus. After drying the ink to form the color filter 129, the overcoat layer 128, the IT
A counter electrode 127 and a vertical alignment film 126 made of a transparent conductive material such as O are sequentially formed. Since a liquid crystal 125 having a negative dielectric anisotropy is used, when no voltage is applied, the liquid crystal molecules 1
25 are arranged vertically, and when a voltage is applied, the liquid crystal molecules 125
The substrate 131 is inclined and arranged in a plurality of directions along a concave shape on the surface of the substrate 131. Orthogonal Nicol polarizing plates 120 and 132 are attached to the outside of the substrates 121 and 131, and a normally black mode in which black display is performed when no voltage is applied is provided.

【0006】図9(b)はカラーフィルタ129を凸状
に形成したものである。図9(b)の場合、突起133
を形成する下部層133aと上部層133bとの材料が
図9(a)の場合と逆になる。つまり突起133には、
カラーフィルタ129を形成する材料との親和性の低い
下部層133aとカラーフィルタ129と形成する材料
との親和性の高い上部層133bを用いる。このときイ
ンクジェット法によって突起133の間にインクを配置
すると、下部層133aがインクをはじくので、メニス
カスによってカラーフィルタ129の表面は凸状とな
る。
FIG. 9B shows a color filter 129 formed in a convex shape. In the case of FIG.
The materials of the lower layer 133a and the upper layer 133b that form are opposite to those in the case of FIG. That is, the protrusion 133 has
A lower layer 133a having a low affinity for the material forming the color filter 129 and an upper layer 133b having a high affinity for the material forming the color filter 129 are used. At this time, if the ink is arranged between the protrusions 133 by the inkjet method, the lower layer 133a repels the ink, so that the surface of the color filter 129 becomes convex due to the meniscus.

【0007】[0007]

【発明が解決しようとする課題】しかしながら上記の液
晶表示装置は、球状スペーサを散布してアレイ基板とC
F基板との間を所定間隔に保持する方法に不向きであ
り、各画素に対応して柱状スペーサや高分子壁を形成す
る必要があった。例えば上記の従来例に球状スペーサを
用いる場合、一対の基板の間隔が一定でないため、球状
スペーサの散布状態によっては基板間の間隔が一定にな
らない場合が生じる。また基板の間隔が最も狭い箇所に
球状スペーサが介在すると、間隔が広い箇所に存在する
球状スペーサは液晶中に浮いた状態になり、スペーサと
しても役割を果さなかった。また球状スペーサが画素領
域に存在する場合には、液晶の配向状態に悪影響を及ぼ
してしまう。そこで球状スペーサの代わりに柱状スペー
サや高分子壁を形成しているが、この製造工程は球状ス
ペーサを散布する工程よりも煩雑であり、また柱状スペ
ーサなどの高さや配置箇所などに精密さが求められるた
め歩留まりの面でも良くなかった。
However, in the above liquid crystal display device, a spherical spacer is scattered so that
It is not suitable for a method of maintaining a predetermined distance from the F substrate, and it is necessary to form a columnar spacer or a polymer wall corresponding to each pixel. For example, when a spherical spacer is used in the above-described conventional example, the distance between the pair of substrates is not constant, so that the distance between the substrates may not be constant depending on the state of dispersion of the spherical spacer. In addition, when the spherical spacer is interposed at the portion where the distance between the substrates is narrowest, the spherical spacer existing at the portion where the distance is wide floats in the liquid crystal, and does not play a role as a spacer. Further, when the spherical spacer exists in the pixel region, the alignment state of the liquid crystal is adversely affected. Therefore, instead of spherical spacers, columnar spacers or polymer walls are formed, but this manufacturing process is more complicated than the process of dispersing spherical spacers, and precision is required for the height and arrangement of the columnar spacers. Was not good in terms of yield.

【0008】そこで本発明は、一対の基板の間隔保持手
段として球状スペーサを用いることができる広視野角な
液晶表示装置を提供することを目的とする。
Accordingly, an object of the present invention is to provide a liquid crystal display device having a wide viewing angle in which a spherical spacer can be used as a means for maintaining a distance between a pair of substrates.

【0009】[0009]

【課題を解決するための手段】上記課題を解決するため
に本発明は、画素毎に画素電極が形成された第一基板
と、画素電極との間で電界を発生する対向電極が形成さ
れた第二基板と、第一基板と第二基板との間に介在して
前記両基板を所定間隔に維持する球状スペーサと、前記
両基板間に封入されると共に前記両電極間の電界に応じ
て配列状態が変化する液晶とを備えた液晶表示装置にお
いて、第二基板には画素毎に1画素内の表面全体が凸状
に形成されたカラーフィルタを設け、隣接する画素のカ
ラーフィルタとの間の窪み部分に前記球状スペーサが位
置することを特徴とする。
According to the present invention, there is provided a liquid crystal display device comprising: a first substrate on which a pixel electrode is formed for each pixel; and a counter electrode for generating an electric field between the pixel electrode and the first substrate. A second substrate, a spherical spacer interposed between the first substrate and the second substrate to maintain the two substrates at a predetermined distance, and sealed between the two substrates and according to an electric field between the two electrodes. In a liquid crystal display device having a liquid crystal whose arrangement state changes, a color filter in which the entire surface of one pixel is formed in a convex shape is provided for each pixel on the second substrate, and a color filter between adjacent pixels is provided. Is characterized in that the spherical spacer is located in the recess.

【0010】また、画素毎に画素電極が形成された第一
基板と、画素電極との間で電界を発生する対向電極が形
成された第二基板と、第一基板と第二基板との間に介在
して両基板を所定間隔に維持する球状スペーサと、前記
両基板間に封入されると共に前記両電極間の電界に応じ
て配列状態が変化する液晶とを備えた液晶表示装置にお
いて、第二基板には、各画素に応じて形成されたカラー
フィルタと、カラーフィルタ上に積層され且つ1画素内
の表面全体が凸状に形成された絶縁膜とを設け、隣接す
る画素の前記絶縁膜との間の窪み部分に球状スペーサが
位置することを特徴とする。
In addition, a first substrate on which a pixel electrode is formed for each pixel, a second substrate on which a counter electrode for generating an electric field between the pixel electrode is formed, and a first substrate and a second substrate A liquid crystal display device comprising: a spherical spacer interposed between the two substrates to maintain a predetermined distance between the two substrates; and a liquid crystal sealed between the two substrates and having a liquid crystal whose alignment state changes according to an electric field between the two electrodes. The two substrates are provided with a color filter formed in accordance with each pixel, and an insulating film laminated on the color filter and having an entire surface in one pixel formed in a convex shape, and the insulating film of an adjacent pixel is provided. And a spherical spacer is located in a recess between the two.

【0011】従って画素間に球状スペーサを保持するこ
とができ、カラーフィルタや絶縁膜の凸状によって液晶
の傾斜方向を規制する構成でありながら、基板の間隔保
持手段として組立工程が容易な球状スペーサを用いるこ
とができる。
Therefore, the spherical spacer can be held between the pixels, and the inclination direction of the liquid crystal is restricted by the convex shape of the color filter and the insulating film, but the spherical spacer is easy to assemble as the means for maintaining the distance between the substrates. Can be used.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施形態を図に基
づいて説明する。図1は第1の実施形態である液晶表示
装置の概略断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic sectional view of the liquid crystal display device according to the first embodiment.

【0013】1は第一基板に該当する透明なアレイ基板
であり、複数の走査線と複数の信号線2がマトリクス状
に配置され、走査線と信号線2の交差部にはスイッチン
グ素子であるTFT(薄膜トランジスタ)が、走査線と
信号線2で囲まれる1画素内には画素電極4がそれぞれ
形成されている。TFTは、ゲート電極が走査線に、ソ
ース電極が信号線2に、ドレイン電極が画素電極4にそ
れぞれ接続されている。画素電極4は信号線2やTFT
を覆う絶縁膜3上に形成されるため、TFTのドレイン
電極と画素電極4との接続は絶縁膜3に形成されたコン
タトクホールを介して行われる。絶縁膜3や画素電極4
上には垂直配向性を有する配向膜5が積層される。8は
第二基板に該当する透明なCF基板(カラーフィルタ基
板)であり、各画素を囲むように格子状のブラックマト
リックス9が形成され、各画素に対応して1画素全体が
凸状のカラーフィルタ10が形成されている。カラーフ
ィルタ10上にはITOなどの透明導電材である対向電
極11が形成され、その上層には垂直配向性を有する配
向膜12が積層されている。両基板1、8の間に球状ス
ペーサ7を介在させ、表示領域部分の周囲をシール材で
固着して、両基板1、8を所定の間隔に保持する。両基
板1、8の間に誘電率異方性が負の液晶6を封入して、
電圧無印加時には配向膜5、12の作用により液晶分子
6が垂直配列し、電圧印加時には液晶分子6がカラーフ
ィルタ10の表面形状に沿って1画素内で複数の方向に
傾斜する。そして基板1、8の外側に直交ニコルの偏光
板13a、13bを貼付すると、電圧無印加時に黒表示
になるノーマリブラックモードになる。
Reference numeral 1 denotes a transparent array substrate corresponding to a first substrate, in which a plurality of scanning lines and a plurality of signal lines 2 are arranged in a matrix, and a switching element is provided at an intersection of the scanning lines and the signal lines 2. A pixel electrode 4 is formed in one pixel in which a TFT (thin film transistor) is surrounded by a scanning line and a signal line 2. The TFT has a gate electrode connected to the scanning line, a source electrode connected to the signal line 2, and a drain electrode connected to the pixel electrode 4. The pixel electrode 4 is a signal line 2 or a TFT
The drain electrode of the TFT and the pixel electrode 4 are connected via a contact hole formed in the insulating film 3. Insulating film 3 and pixel electrode 4
An alignment film 5 having a vertical alignment property is laminated thereon. Numeral 8 denotes a transparent CF substrate (color filter substrate) corresponding to the second substrate, in which a lattice-shaped black matrix 9 is formed so as to surround each pixel, and one pixel as a whole corresponds to each pixel. A filter 10 is formed. A counter electrode 11, which is a transparent conductive material such as ITO, is formed on the color filter 10, and an alignment film 12 having a vertical alignment property is laminated thereon. A spherical spacer 7 is interposed between the two substrates 1 and 8, and the periphery of the display area is fixed with a sealing material to hold the two substrates 1 and 8 at a predetermined interval. A liquid crystal 6 having a negative dielectric anisotropy is sealed between the two substrates 1 and 8,
When no voltage is applied, the liquid crystal molecules 6 are vertically aligned by the action of the alignment films 5 and 12. When a voltage is applied, the liquid crystal molecules 6 are inclined in a plurality of directions within one pixel along the surface shape of the color filter 10. When the orthogonal Nicol polarizing plates 13a and 13b are attached to the outside of the substrates 1 and 8, a normally black mode in which black is displayed when no voltage is applied is provided.

【0014】第1の実施形態ではカラーフィルタ10を
1画素毎に凸状にして、その形状により液晶分子6の傾
斜方向を規制している。このときカラーフィルタ10は
図9のようなインクジェット法で形成するのではなくフ
ォトリソグラフィー法で形成され、隣接する画素のカラ
ーフィルタ10との間には図9のような突起130、1
33が存在しない。従って各カラーフィルタ10の間が
窪み14になり、球状スペーサ7がカラーフィルタ10
間に保持される。このカラーフィルタ10の製造工程を
図2に基づいて説明する。カラーフィルタ10の材料と
してはネガタイプのカラーレジスト15を用い、このカ
ラーレジスト15は例えば顔料をアクリル・エポキシ系
の紫外線硬化樹脂などに分散し、溶媒に溶かしたものを
用いる。
In the first embodiment, the color filter 10 is made convex for each pixel, and the inclination direction of the liquid crystal molecules 6 is regulated by the shape. At this time, the color filter 10 is formed not by the ink jet method as shown in FIG. 9 but by photolithography, and the projections 130 and 1 shown in FIG.
33 does not exist. Therefore, a depression 14 is formed between the color filters 10, and the spherical spacer 7 is
Held in between. The manufacturing process of the color filter 10 will be described with reference to FIG. As a material of the color filter 10, a negative type color resist 15 is used. For example, the color resist 15 is obtained by dispersing a pigment in an acrylic / epoxy UV curable resin or the like and dissolving it in a solvent.

【0015】まずカラーレジスト15をCF基板8に塗
布し[図2(a)]、その後にマスク16を介してカラ
ーレジスト15に紫外線を照射する[図2(b)]。こ
のときカラーレジスト15は紫外線が照射された部分が
硬化して各画素に対応したカラーフィルタ10になる
が、紫外線を透過するマスク16のパターン部分には透
過率の異なるパターンが施されている。例えば、カラー
フィルタ10の表面を凸状にするために、マスク16の
パターン部分はカラーフィルタ10の中央部分から周縁
部分に該当する領域に透過率が100%、80%、60
%の3段階の領域が順次設けられている。露光後に現像
処理を行うと、中央部分から周縁部分にかけて階段形状
のカラーフィルタ10が形成される[図2(c)]。そ
の後に熱処理を行うと、各段部分が丸みを帯びてカラー
フィルタ10の表面全体が滑らかな凸状になる[図2
(d)]。図3はカラーフィルタ10と画素電極4の配
置関係を示す図であり、図3(a)は熱処理前のカラー
フィルタ10の形状を示し、図3(b)は熱処理後のカ
ラーフィルタ10の形状を示す。なお、図3では画素電
極4とカラーフィルタ10の配置を分かり易くする為
に、画素電極4をほぼ長方形に簡略化し、走査線や信号
線2などを省略する。また、カラーフィルタ10内の点
線は露光処理時のマスクの透過率が異なる領域の境界を
示す。現像処理後のカラーフィルタ10は周縁部分が画
素電極4の外側に位置し、且つほぼ長方形の4隅を切り
欠いた八角形に形成され、熱処理後にはカラーフィルタ
10の角部分が丸みを帯びて若干楕円形状になる。熱処
理前のカラーフィルタ10の形状を八角形にして角部分
を多くすることで、熱処理後にカラーフィルタ10の表
面の曲面部分を多くすることができる。なおカラーフィ
ルタ10は図3のように画素電極4より大きな形状であ
れば特に八角形に限定するものではなく、例えば熱処理
前に既に楕円形に形成していもよい。
First, a color resist 15 is applied to the CF substrate 8 (FIG. 2A), and then the color resist 15 is irradiated with ultraviolet rays through a mask 16 (FIG. 2B). At this time, the portions of the color resist 15 irradiated with the ultraviolet rays are cured to become the color filters 10 corresponding to the respective pixels. However, patterns having different transmittances are applied to the pattern portions of the mask 16 that transmits the ultraviolet rays. For example, in order to make the surface of the color filter 10 convex, the pattern portion of the mask 16 has a transmittance of 100%, 80%, 60% from the central portion to the peripheral portion of the color filter 10.
% Are sequentially provided in three stages. When the developing process is performed after the exposure, a step-shaped color filter 10 is formed from the central portion to the peripheral portion [FIG. 2 (c)]. Thereafter, when heat treatment is performed, each step is rounded, and the entire surface of the color filter 10 becomes a smooth convex shape [FIG.
(D)]. 3A and 3B are diagrams showing the arrangement relationship between the color filter 10 and the pixel electrode 4. FIG. 3A shows the shape of the color filter 10 before the heat treatment, and FIG. 3B shows the shape of the color filter 10 after the heat treatment. Is shown. In FIG. 3, in order to make the arrangement of the pixel electrode 4 and the color filter 10 easy to understand, the pixel electrode 4 is simplified to a substantially rectangular shape, and the scanning lines and the signal lines 2 are omitted. Dotted lines in the color filter 10 indicate boundaries between regions where the transmittance of the mask during the exposure processing is different. The color filter 10 after the development processing is formed in an octagon in which the peripheral portion is located outside the pixel electrode 4 and the four corners of the rectangle are cut out, and after the heat treatment, the corners of the color filter 10 are rounded. It becomes slightly elliptical. By making the shape of the color filter 10 before the heat treatment octagonal and increasing the number of corners, the curved surface portion of the surface of the color filter 10 after the heat treatment can be increased. The color filter 10 is not particularly limited to an octagon as long as it is larger than the pixel electrode 4 as shown in FIG. 3, and may be formed into an ellipse before the heat treatment, for example.

【0016】図2に示す工程によって例えばR層のカラ
ーフィルタが形成され、その後G層、B層についても同
じ工程を繰り返して各画素に対応したカラーフィルタ1
0が形成される。カラーフィルタ10上にほぼ均一な厚
みの対向電極11、配向膜12が積層されるため、カラ
ーフィルタ10の表面形状がほぼ配向膜12界面の形状
になり、液晶6の傾斜方向を規制することができる。カ
ラーフィルタ10は各画素の中央部分が張出した凸状で
あるため、隣接する画素との間に窪み14ができ、球状
スペーサ7をCF基板8側に散布すれば大部分の球状ス
ペーサ7が画素間の窪み14に位置する。また散布した
際に画素内の位置する球状スペーサ7はアレイ基板1を
CF基板8に対向配置させるときにアレイ基板1によっ
て押圧されるため、凸状のカラーフィルタ10表面を転
がってカラーフィルタ10間の窪み14へ移動する。さ
らに両基板1、8の間隔は窪み14部分からカラーフィ
ルタ8の中央部分に対して徐々に狭くなるため、CF基
板8とアレイ基板1を貼り合わせることで球状スペーサ
7を画素間に保持することができ、球状スペーサ7が液
晶配向に悪影響を及ぼすことを防止できる。なお、全て
の球状スペーサ7が画素間の窪み14部分に保持される
必要はなく、大部分の球状スペーサ7が画素間の窪み1
4部分に保持されればよい。それは、球状スペーサ7は
加圧されると変形するため、散布時に画素内に位置する
球状スペーサ7がアレイ基板1で押圧された際に画素内
で変形して保持される場合もある。
A color filter of, for example, an R layer is formed by the process shown in FIG. 2. Thereafter, the same process is repeated for the G and B layers, and the color filter 1 corresponding to each pixel is formed.
0 is formed. Since the counter electrode 11 and the alignment film 12 having a substantially uniform thickness are laminated on the color filter 10, the surface shape of the color filter 10 becomes substantially the shape of the interface of the alignment film 12, and the tilt direction of the liquid crystal 6 can be regulated. it can. Since the color filter 10 has a convex shape in which the central portion of each pixel protrudes, a depression 14 is formed between adjacent pixels, and most of the spherical spacers 7 are dispersed by dispersing the spherical spacers 7 on the CF substrate 8 side. It is located in the recess 14 between them. Further, the spherical spacers 7 located in the pixels when being scattered are pressed by the array substrate 1 when the array substrate 1 is arranged to face the CF substrate 8, so that the spherical spacers 7 roll over the convex color filters 10 and To the depression 14 of FIG. Further, since the distance between the substrates 1 and 8 is gradually narrowed from the depression 14 to the center of the color filter 8, the spherical spacer 7 is held between the pixels by bonding the CF substrate 8 and the array substrate 1. This can prevent the spherical spacer 7 from adversely affecting the liquid crystal alignment. It is not necessary that all of the spherical spacers 7 be held in the recesses 14 between the pixels.
What is necessary is just to hold in four parts. Since the spherical spacers 7 are deformed when pressed, the spherical spacers 7 located in the pixels at the time of spraying may be deformed and held in the pixels when pressed by the array substrate 1.

【0017】ここまでカラーフィルタ10をカラーレジ
スト法により形成する場合を説明したが、エッチング法
により形成することもできる。これを図4に基いて説明
する。まずRの顔料をポリイミドなどの樹脂に分散させ
た着色樹脂17をCF基板8に塗布し[図4(a)]、
着色樹脂17上にポジレジスト18を塗布する。ポジレ
ジスト18に所定のパターンを有するマスクを介して露
光処理を行い、現像処理によってR層のカラーフィルタ
10に該当する部分のポジレジスト18を残す[図4
(b)]。そして1回目のエッチングを行いポジレジス
ト18で覆われていない着色樹脂17を除去する[図4
(c)]が、このときCF基板8に残された着色樹脂1
8は最終的に形成されるカラーフィルタ10とほぼ同等
の大きさになる。次に着色樹脂17上に残ったポジレジ
スト18に露光処理、現像処理を行い、ポジレジスト1
7の外周部分の一部を除去する[図4(d)]。そして
2回目のエッチング処理によりポジレジスト18のない
部分の着色樹脂17が除去されるが[図4(e)]、こ
のときポジレジスト18が存在しない部分の全ての着色
樹脂17が除去されるのではなく、例えばその厚み方向
の20%程度が除去される。その後、再びマスク露光、
現像処理を行い、着色樹脂17上に残存するポジレジス
ト18の外周部分の一部を除去する[図4(f)]。そ
の後に3回目のエッチング処理を行い[図4(g)]、
ポジレジスト18が存在しない部分の着色樹脂17を除
去する。この場合も2回目のエッチングと同様に着色樹
脂17は一部分が除去され、例えば2回目のエッチング
を行った部分は60%程度の厚みが、3回目のエッチン
グを行った部分は80%程度の厚みがそれぞれ残り、残
存した着色樹脂17は中央部分から周縁部に対して階段
状に薄くなる。有機溶剤によりポジレジスト18を剥離
し[図4(h)]、熱処理前のカラーフィルタが形成さ
れる。G層、B層についても同様の処理を繰返して各色
層の着色樹脂17を所定の位置に形成し、その後で熱処
理を行う[図4(i)]。熱処理によって着色樹脂17
の角部分が丸みを帯び、1画素毎に凸状のカラーフィル
タ10が形成される。
Although the case where the color filter 10 is formed by the color resist method has been described above, it can be formed by the etching method. This will be described with reference to FIG. First, a colored resin 17 in which the R pigment is dispersed in a resin such as polyimide is applied to the CF substrate 8 (FIG. 4A).
A positive resist 18 is applied on the coloring resin 17. An exposure process is performed on the positive resist 18 through a mask having a predetermined pattern, and a portion of the positive resist 18 corresponding to the color filter 10 of the R layer is left by a developing process [FIG.
(B)]. Then, the first etching is performed to remove the colored resin 17 not covered with the positive resist 18 [FIG.
(C)] is the colored resin 1 left on the CF substrate 8 at this time.
8 has a size substantially equal to that of the finally formed color filter 10. Next, the positive resist 18 remaining on the colored resin 17 is subjected to exposure processing and development processing,
7 is partially removed [FIG. 4 (d)]. Then, the second etching process removes the colored resin 17 in the portion without the positive resist 18 (FIG. 4E). At this time, all the colored resin 17 in the portion without the positive resist 18 is removed. Instead, for example, about 20% in the thickness direction is removed. After that, mask exposure again,
A developing process is performed to remove a part of the outer peripheral portion of the positive resist 18 remaining on the colored resin 17 (FIG. 4F). Thereafter, a third etching process is performed [FIG. 4 (g)].
The portion of the colored resin 17 where the positive resist 18 does not exist is removed. Also in this case, as in the second etching, a part of the colored resin 17 is removed. For example, the portion subjected to the second etching has a thickness of about 60%, and the portion subjected to the third etching has a thickness of about 80%. Respectively, and the remaining colored resin 17 becomes thinner stepwise from the central portion to the peripheral portion. The positive resist 18 is peeled off with an organic solvent [FIG. 4 (h)], and a color filter before heat treatment is formed. The same processing is repeated for the G layer and the B layer to form the colored resin 17 of each color layer at a predetermined position, and thereafter, heat treatment is performed [FIG. 4 (i)]. Colored resin 17 by heat treatment
Are rounded, and a convex color filter 10 is formed for each pixel.

【0018】第1の実施形態は図8の従来例と比較して
更に優れた点がある。図8の従来例では画素電極103
の絶縁膜104によって凹状又は凸状を形成するため、
画素電極103の場所によって絶縁膜104の厚みが異
なり、画素電極103と対向電極108間の電界の強さ
が均一にならない。しかし第1の実施形態は画素電極4
上に厚みが異なる絶縁膜を設ける必要がないため、画素
電極4と対向電極11間の電界の強さをほぼ均一に保つ
ことができる。また、図8の従来例の一形態として、凹
状又は凸状の絶縁膜104上に画素電極を形成する形態
があるが、この場合はTFTのドレイン電極と画素電極
との間の絶縁膜103が厚くなるため、第1の実施形態
の方がドレイン電極と画素電極4を確実に接続すること
ができる。
The first embodiment is more excellent than the conventional example shown in FIG. In the conventional example of FIG.
In order to form a concave or convex shape by the insulating film 104,
The thickness of the insulating film 104 varies depending on the location of the pixel electrode 103, and the electric field intensity between the pixel electrode 103 and the counter electrode 108 is not uniform. However, in the first embodiment, the pixel electrode 4
Since there is no need to provide an insulating film having a different thickness on the upper side, the intensity of the electric field between the pixel electrode 4 and the counter electrode 11 can be kept substantially uniform. In addition, as an example of the conventional example in FIG. 8, a pixel electrode is formed on a concave or convex insulating film 104. In this case, the insulating film 103 between the drain electrode of the TFT and the pixel electrode is formed. Since the thickness is increased, the drain electrode and the pixel electrode 4 can be more reliably connected in the first embodiment.

【0019】次に第2の実施形態を図5に基づいて説明
する。第2の実施形態ではカラーフィルタ19の表面を
ほぼ平坦にして、その上層に凸状の絶縁膜20を形成す
る。なお、その他の部分は第1の実施形態と同様の形態
であり、同一部分には第1の実施形態と同じ符号を用い
て説明を省略する。
Next, a second embodiment will be described with reference to FIG. In the second embodiment, the surface of the color filter 19 is made substantially flat, and a convex insulating film 20 is formed thereon. The other portions are the same as in the first embodiment, and the same portions are denoted by the same reference numerals as in the first embodiment, and description thereof is omitted.

【0020】CF基板8には各画素に応じてRGBのい
ずれかのカラーフィルタ19が形成され、各画素内では
カラーフィルタ19の表面がほぼ平坦になっている。そ
してカラーフィルタ19上に透明な絶縁膜20が積層さ
れ、その表面は第1の実施形態のカラーフィルタ10と
同様に1画素の中央部分が張出した凸状に形成される。
この絶縁膜20も図2や図3に示すようにフォトリソグ
ラフィー法によって形成することができる。例えば絶縁
膜20として感光性を有する透明樹脂(オプトマーPC
300、400シリーズ(ポジ)、NN500、600
シリーズ(ネガ):JSR(株)社製)を用いた場合、図
2と同様の工程で凸状の絶縁膜20を形成することがで
きる。つまりCF基板8に感光性の透明樹脂を塗布した
後、凸状を形成するために部分的に透過率の異なるパタ
ーンを有するマスクを介して露光処理を行い、熱処理に
よって表面が滑らかな凸状が形成される。第2の形態で
も図2と同様の工程によって絶縁膜20を凸状にする
が、第1の実施形態ではカラーフィルタ10を凸状に形
成するためRGBの色毎に図2の工程を繰返すのに対し
て、第2の実施形態では絶縁膜20を凸状にするため全
ての画素に対して同時に形成することができ、第1の実
施形態の場合とはマスクのパターンや工程数などが若干
異なる。さらに感光性の透明樹脂としてポジタイプとネ
ガタイプを使用する場合でマスクのパターンが異なる
が、部分的に透過率の異なるパターンのマスクを用いる
ことで1枚のマスクで絶縁膜20を凸状に形成すること
が可能になる。
Any one of RGB color filters 19 is formed on the CF substrate 8 in accordance with each pixel, and the surface of the color filter 19 is substantially flat in each pixel. Then, a transparent insulating film 20 is laminated on the color filter 19, and the surface thereof is formed in a convex shape in which the central portion of one pixel projects like the color filter 10 of the first embodiment.
This insulating film 20 can also be formed by a photolithography method as shown in FIGS. For example, as the insulating film 20, a transparent resin having photosensitivity (Optomer PC)
300, 400 series (positive), NN500, 600
When a series (negative: manufactured by JSR Corporation) is used, the convex insulating film 20 can be formed in the same process as in FIG. In other words, after a photosensitive transparent resin is applied to the CF substrate 8, an exposure process is performed through a mask having a pattern having a partially different transmittance in order to form a convex shape. It is formed. In the second embodiment, the insulating film 20 is made convex by a process similar to that of FIG. 2, but in the first embodiment, the process of FIG. 2 is repeated for each of RGB colors in order to form the color filter 10 in a convex shape. On the other hand, in the second embodiment, since the insulating film 20 is formed in a convex shape, the insulating film 20 can be formed simultaneously for all the pixels, and the mask pattern and the number of steps are slightly different from those in the first embodiment. different. Further, the pattern of the mask is different when the positive type and the negative type are used as the photosensitive transparent resin, but the insulating film 20 is formed in a convex shape with one mask by using a mask having a pattern partially different in transmittance. It becomes possible.

【0021】次に、絶縁膜20として感光性のない透明
樹脂を用いた場合、図4と同様の工程で凸状の絶縁膜2
0を形成することができる。つまりCF基板8に感光性
のない透明樹脂を塗布した後に透明樹脂上にレジストを
塗布し、マスク露光処理、現像処理を行って凸状部分に
該当するレジストを残し、エッチングにより不要な透明
樹脂を除去する。その後、残存するレジストに対してマ
スク露光処理、現像処理、エッチングを数回繰返し、画
素の中央部分から周縁部分に対して階段状に薄くなる透
明樹脂を形成する。そして熱処理によって透明樹脂の角
部分を丸くし、表面が滑らかな凸状の絶縁膜20が形成
される。
Next, when a non-photosensitive transparent resin is used as the insulating film 20, the convex insulating film 2 is formed in the same process as in FIG.
0 can be formed. In other words, after applying a non-photosensitive transparent resin to the CF substrate 8, a resist is applied on the transparent resin, mask exposure processing and development processing are performed to leave the resist corresponding to the convex portion, and unnecessary transparent resin is removed by etching. Remove. Thereafter, mask exposure processing, development processing, and etching are repeated on the remaining resist several times to form a transparent resin that becomes thinner stepwise from the central portion to the peripheral portion of the pixel. Then, the corner portions of the transparent resin are rounded by the heat treatment, and the convex insulating film 20 having a smooth surface is formed.

【0022】第2の実施形態も第1の実施形態と同様に
CF基板8の表面が画素に対応して凸状になるため、液
晶分子6の傾斜方向を規制できると共に球状スペーサ7
を画素間の窪み14部分に保持することができる。さら
に第2の実施形態であれば、1画素内のカラーフィルタ
19の厚みを均一にすることができるため、カラーフィ
ルタの厚みのバラツキに起因する画素内の濃度ムラを低
減させることもできる。
In the second embodiment, as in the first embodiment, the surface of the CF substrate 8 is convex corresponding to the pixel, so that the inclination direction of the liquid crystal molecules 6 can be restricted and the spherical spacers 7 can be formed.
Can be held in the recess 14 between the pixels. Furthermore, according to the second embodiment, since the thickness of the color filter 19 in one pixel can be made uniform, it is also possible to reduce density unevenness in the pixel due to the variation in the thickness of the color filter.

【0023】次に第3の実施形態を図6に基づいて説明
する。第3の実施形態ではアレイ基板1上に透明な絶縁
膜21を形成し、その絶縁膜21によって1画素の表面
を凹状に形成し、アレイ基板1とCF基板8との間隔を
全体的にほぼ一定にしている。なお、その他の部分は第
1の実施形態と同様の形態であり、同一部分には第1の
実施形態と同じ符号を用いて説明を省略する。
Next, a third embodiment will be described with reference to FIG. In the third embodiment, a transparent insulating film 21 is formed on the array substrate 1, the surface of one pixel is formed in a concave shape by the insulating film 21, and the distance between the array substrate 1 and the CF substrate 8 is almost entirely reduced. It is constant. The other portions are the same as in the first embodiment, and the same portions are denoted by the same reference numerals as in the first embodiment, and description thereof is omitted.

【0024】絶縁膜21の材料として第2の実施形態の
絶縁膜20と同じ材料を用い、図2又は図3と同様の工
程を行うことで絶縁膜20の表面を凹状にすることがで
きる。このときマスク露光時のマスクのパターンは、カ
ラーフィルタ10や絶縁膜21の材料がポジ型又はネガ
型などによって異なる。この実施形態のカラーフィルタ
6は第1の実施形態とカラーフィルタ6と同様に画素毎
にその中央部分が張出した凸状に形成され、アレイ基板
1の絶縁膜21表面はカラーフィルタ10の凸状に対応
してその間隔がほぼ均一になるように凹状に形成されて
いる。そしてCF基板8に球状スペーサ7を散布してか
らCF基板8とアレイ基板1を貼り合わせることで、大
部分の球状スペーサ7を隣接する画素間の窪み14部分
に位置させることができる。また、アレイ基板1とCF
基板8の間隔をほぼ均一にしているため、球状スペーサ
7が画素内に存在したときも両基板1、8の間隔を保持
する役割を果し、球状スペーサ7として作用する。また
絶縁膜21を凹状にすることでカラーフィルタ10と絶
縁膜21の両方の表面形状で液晶6の傾斜方向を規制で
き、優れた視角特性を得ることができる。なお、この実
施形態は画素電極4上に凹状の絶縁膜21を設けたが、
凹状の絶縁膜21上に画素電極4を配置してもよく、こ
の場合は画素電極4と対向電極11の間の電界をほぼ均
一にできる。
By using the same material as the insulating film 20 of the second embodiment as the material of the insulating film 21 and performing the same steps as in FIG. 2 or FIG. 3, the surface of the insulating film 20 can be made concave. At this time, the pattern of the mask at the time of mask exposure differs depending on whether the material of the color filter 10 or the insulating film 21 is a positive type or a negative type. The color filter 6 of this embodiment is formed in a convex shape with a central portion protruding for each pixel similarly to the color filter 6 of the first embodiment, and the surface of the insulating film 21 of the array substrate 1 is formed in a convex shape of the color filter 10. Are formed in a concave shape so that the interval becomes substantially uniform. Then, by dispersing the spherical spacers 7 on the CF substrate 8 and then bonding the CF substrate 8 and the array substrate 1, most of the spherical spacers 7 can be located in the depressions 14 between adjacent pixels. The array substrate 1 and CF
Since the distance between the substrates 8 is substantially uniform, the spherical spacer 7 serves to maintain the distance between the substrates 1 and 8 even when the spherical spacer 7 exists in the pixel, and acts as the spherical spacer 7. In addition, by making the insulating film 21 concave, the inclination direction of the liquid crystal 6 can be restricted by the surface shapes of both the color filter 10 and the insulating film 21, and excellent viewing angle characteristics can be obtained. In this embodiment, the concave insulating film 21 is provided on the pixel electrode 4.
The pixel electrode 4 may be arranged on the concave insulating film 21, and in this case, the electric field between the pixel electrode 4 and the counter electrode 11 can be made substantially uniform.

【0025】次に第4の実施形態を図7に基づいて説明
する。第4の実施形態ではカラーフィルタ19の表面を
ほぼ平坦にして、その上層に1画素全体に亘って形成さ
れ且つその中央部分が張出した凸状の絶縁膜20を配置
する。さらにアレイ基板1上には透明な絶縁膜21を形
成し、その絶縁膜21によって1画素の表面を凹状に形
成し、アレイ基板1とCF基板8との間隔を全体的にほ
ぼ均一にしている。この実施形態のCF基板8は第2の
実施形態のCF基板8と同様の形態であり、アレイ基板
1は第3の実施形態のアレイ基板1と同様の形態にな
る。第4の実施形態の絶縁膜20、21の材料として第
2の実施形態の絶縁膜20と同じ材料を用い、図2又は
図3と同様の工程を行うことで絶縁膜20、21の表面
を凸状又は凹状にすることができる。
Next, a fourth embodiment will be described with reference to FIG. In the fourth embodiment, the surface of the color filter 19 is made substantially flat, and a convex insulating film 20 which is formed over the entire pixel and whose central portion protrudes over the color filter 19 is disposed thereon. Further, a transparent insulating film 21 is formed on the array substrate 1, the surface of one pixel is formed in a concave shape by the insulating film 21, and the distance between the array substrate 1 and the CF substrate 8 is substantially uniform as a whole. . The CF substrate 8 of this embodiment has the same configuration as the CF substrate 8 of the second embodiment, and the array substrate 1 has the same configuration as the array substrate 1 of the third embodiment. By using the same material as the insulating film 20 of the second embodiment as the material of the insulating films 20 and 21 of the fourth embodiment, and performing the same process as in FIG. 2 or FIG. It can be convex or concave.

【0026】この実施形態でも上記の実施形態と同様に
CF基板8に球状スペーサ7を散布してからCF基板8
とアレイ基板1を貼り合わせることで、大部分の球状ス
ペーサ7を隣接する画素間の窪み14部分に位置させる
ことができる。また1画素内のカラーフィルタ19の厚
みを均一にすることができるため、カラーフィルタの厚
みのバラツキに起因する画素内の濃度ムラを低減でき
る。また、アレイ基板1とCF基板8の間隔をほぼ均一
にしているため、球状スペーサ7が画素内に存在したと
きも両基板1、8の間隔を保持する役割を果し、球状ス
ペーサ7として作用する。また絶縁膜21を凹状にする
ことでカラーフィルタ10と絶縁膜21の両方の表面形
状で液晶6の傾斜方向を規制でき、優れた視角特性を得
ることができる。
In this embodiment, as in the above-described embodiment, the spherical spacers 7 are scattered on the CF
By bonding the substrate and the array substrate 1, most of the spherical spacers 7 can be located in the recesses 14 between adjacent pixels. Further, since the thickness of the color filter 19 in one pixel can be made uniform, the density unevenness in the pixel due to the variation in the thickness of the color filter can be reduced. In addition, since the distance between the array substrate 1 and the CF substrate 8 is made substantially uniform, even when the spherical spacer 7 is present in the pixel, it serves to maintain the distance between the substrates 1 and 8 and acts as the spherical spacer 7. I do. In addition, by making the insulating film 21 concave, the inclination direction of the liquid crystal 6 can be restricted by the surface shapes of both the color filter 10 and the insulating film 21, and excellent viewing angle characteristics can be obtained.

【0027】なお、本発明の要旨を逸脱しない範囲であ
れば上記実施形態以外の形態も可能である。例えば、凸
状の頂点を1画素の中央部分以外に設定して凸状を左右
非対称に形成してもよい。また、本実施形態では信号線
などの保護する絶縁膜と凹状の絶縁膜を個別に設けた
が、信号線などを保護する絶縁膜によって凹状部分を形
成してもよい。
It should be noted that embodiments other than the above-described embodiment are possible without departing from the gist of the present invention. For example, the convex shape may be set aside from the central portion of one pixel, and the convex shape may be formed asymmetrically. In this embodiment, the insulating film for protecting the signal lines and the like and the concave insulating film are separately provided. However, the concave portions may be formed by the insulating films for protecting the signal lines and the like.

【0028】[0028]

【発明の効果】本発明によれば、第二基板のカラーフィ
ルタ又は絶縁膜を画素毎に1画素内の表面全体を凸状に
したため隣接する画素との間に窪みができ、球状スペー
サがその窪みに位置して、球状スペーサによる液晶の配
向状態への影響を低減できる。従って液晶層との界面に
あたる表面形状を曲面にして液晶分子の傾斜方向を規制
し、優れた視角特性を得る構成でありながら、一対の基
板の間隔保持手段として作業工程が容易で歩留まりのよ
い球状スペーサを用いることができ、製造効率が向上す
る。
According to the present invention, the color filter or the insulating film of the second substrate is formed so that the entire surface in one pixel is convex for each pixel, so that a depression can be formed between adjacent pixels, and the spherical spacer can be used as a spacer. Positioned in the depression, the influence of the spherical spacer on the alignment state of the liquid crystal can be reduced. Therefore, although the surface shape at the interface with the liquid crystal layer is curved to restrict the tilt direction of the liquid crystal molecules and obtain an excellent viewing angle characteristic, the spherical shape of the work process is easy and the yield is good as a means for maintaining the distance between a pair of substrates. Spacers can be used, and manufacturing efficiency is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施形態である液晶表示装置の
断面概略図である。
FIG. 1 is a schematic sectional view of a liquid crystal display device according to a first embodiment of the present invention.

【図2】カラーレジストを用いてカラーフィルタを凸状
に形成する工程を説明する図である。
FIG. 2 is a diagram illustrating a process of forming a color filter in a convex shape using a color resist.

【図3】カラーフィルタと画素電極の配置関係を示す図
である。
FIG. 3 is a diagram showing an arrangement relationship between a color filter and a pixel electrode.

【図4】エッチング法によりカラーフィルタを凸状に形
成する工程を説明する図である。
FIG. 4 is a diagram illustrating a process of forming a color filter in a convex shape by an etching method.

【図5】本発明の第2の実施形態である液晶表示装置の
断面概略図である。
FIG. 5 is a schematic sectional view of a liquid crystal display device according to a second embodiment of the present invention.

【図6】本発明の第3の実施形態である液晶表示装置の
断面概略図である。
FIG. 6 is a schematic sectional view of a liquid crystal display device according to a third embodiment of the present invention.

【図7】本発明の第4の実施形態である液晶表示装置の
断面概略図である。
FIG. 7 is a schematic sectional view of a liquid crystal display device according to a fourth embodiment of the present invention.

【図8】従来の液晶表示装置の断面概略図である。FIG. 8 is a schematic sectional view of a conventional liquid crystal display device.

【図9】従来の液晶表示装置の断面概略図である。FIG. 9 is a schematic sectional view of a conventional liquid crystal display device.

【符号の説明】[Explanation of symbols]

1 第一基板 4 画素電極 5、12、22 配向膜 7 球状スペーサ 8 第二基板 10、19 カラーフィルタ 14 窪み 20 絶縁膜 21 絶縁膜 REFERENCE SIGNS LIST 1 first substrate 4 pixel electrode 5, 12, 22 alignment film 7 spherical spacer 8 second substrate 10, 19 color filter 14 depression 20 insulating film 21 insulating film

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H089 LA07 LA12 NA09 QA12 QA14 SA16 TA05 TA09 TA12 TA13 2H091 FA02Y FA08X FA08Z FA35Y FB02 FC01 FC10 FC23 GA03 GA07 GA08 GA13 KA10 LA12 LA19 5C094 AA03 AA08 AA12 AA36 AA43 AA47 AA48 AA55 BA03 BA43 CA19 CA24 DA13 DB01 DB04 EA04 EA10 EB02 EC03 ED03 FA01 FA02 FB01 FB15 GB10 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H089 LA07 LA12 NA09 QA12 QA14 SA16 TA05 TA09 TA12 TA13 2H091 FA02Y FA08X FA08Z FA35Y FB02 FC01 FC10 FC23 GA03 GA07 GA08 GA13 KA10 LA12 LA19 5C094 AA03 AA08 AA43 A43 A43 CA19 CA24 DA13 DB01 DB04 EA04 EA10 EB02 EC03 ED03 FA01 FA02 FB01 FB15 GB10

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 画素毎に画素電極が形成された第一基板
と、前記画素電極との間で電界を発生する対向電極が形
成された第二基板と、前記第一基板と前記第二基板との
間に介在して前記両基板を所定間隔に維持する球状スペ
ーサと、前記両基板間に封入されると共に前記両電極間
の電界に応じて配列状態が変化する液晶とを備えた液晶
表示装置において、前記第二基板には画素毎に1画素内
の表面全体が凸状に形成されたカラーフィルタを設け、
隣接する画素のカラーフィルタとの間の窪み部分に前記
球状スペーサが位置することを特徴とする液晶表示装
置。
A first substrate on which a pixel electrode is formed for each pixel; a second substrate on which a counter electrode for generating an electric field between the pixel electrode; a first substrate and the second substrate A liquid crystal display comprising: a spherical spacer interposed between the two substrates to maintain the two substrates at a predetermined distance; and a liquid crystal sealed between the two substrates and having a state of arrangement that changes according to an electric field between the two electrodes. In the device, the second substrate is provided with a color filter in which the entire surface in one pixel is formed in a convex shape for each pixel,
The liquid crystal display device, wherein the spherical spacer is located in a concave portion between the color filters of adjacent pixels.
【請求項2】 画素毎に画素電極が形成された第一基板
と、前記画素電極との間で電界を発生する対向電極が形
成された第二基板と、前記第一基板と前記第二基板との
間に介在して前記両基板を所定間隔に維持する球状スペ
ーサと、前記両基板間に封入されると共に前記両電極間
の電界に応じて配列状態が変化する液晶とを備えた液晶
表示装置において、前記第二基板には、各画素に応じて
形成されたカラーフィルタと、前記カラーフィルタ上に
積層され且つ1画素内の表面全体が凸状に形成された絶
縁膜とを設け、隣接する画素の前記絶縁膜との間の窪み
部分に前記球状スペーサが位置することを特徴とする液
晶表示装置。
2. A first substrate on which a pixel electrode is formed for each pixel, a second substrate on which a counter electrode that generates an electric field between the pixel electrode, and the first substrate and the second substrate A liquid crystal display comprising: a spherical spacer interposed between the two substrates to maintain the two substrates at a predetermined distance; and a liquid crystal sealed between the two substrates and having a state of arrangement that changes according to an electric field between the two electrodes. In the device, the second substrate is provided with a color filter formed in accordance with each pixel, and an insulating film laminated on the color filter and having an entire surface in one pixel formed in a convex shape. A liquid crystal display device, wherein the spherical spacer is located in a concave portion between the pixel and the insulating film.
【請求項3】 前記カラーフィルタの厚みが1画素内で
ほぼ均一であることを特徴とする請求項2記載の液晶表
示装置。
3. The liquid crystal display device according to claim 2, wherein the thickness of the color filter is substantially uniform within one pixel.
【請求項4】 前記凸状の部分は1画素のほぼ中央部分
が最も張り出ていることを特徴とする請求項1乃至請求
項3記載の液晶表示装置。
4. The liquid crystal display device according to claim 1, wherein the convex portion has the most protruding portion substantially at the center of one pixel.
【請求項5】 前記第一基板には画素毎に1画素内の表
面全体が凹状に形成された絶縁膜を設けたことを特徴と
する請求項1乃至請求項4記載の液晶表示装置。
5. The liquid crystal display device according to claim 1, wherein the first substrate is provided with an insulating film in which the entire surface in one pixel is formed in a concave shape for each pixel.
【請求項6】 前記第一基板の凹状部分と前記第二基板
の凸状部分によって前記両基板の間隔がほぼ均一である
ことを特徴とする請求項5記載の液晶表示装置。
6. The liquid crystal display device according to claim 5, wherein the distance between the two substrates is substantially uniform due to the concave portion of the first substrate and the convex portion of the second substrate.
【請求項7】 前記第一基板及び前記第二基板に垂直配
向性を有する配向膜を積層し、前記両基板間に誘電率異
方性が負の液晶を封入したことを特徴とする請求項1乃
至請求項6記載の液晶表示装置。
7. The liquid crystal display device according to claim 1, wherein an alignment film having a vertical alignment property is laminated on the first substrate and the second substrate, and liquid crystal having a negative dielectric anisotropy is sealed between the two substrates. The liquid crystal display device according to claim 1.
JP2001006723A 2001-01-15 2001-01-15 Liquid crystal display Expired - Fee Related JP4099947B2 (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006126811A (en) * 2004-09-30 2006-05-18 Casio Comput Co Ltd Liquid crystal display element
JP2007178652A (en) * 2005-12-27 2007-07-12 Nec Lcd Technologies Ltd Liquid crystal panel and its manufacturing method
CN100388106C (en) * 2005-10-21 2008-05-14 友达光电股份有限公司 Multiple groups of substrates, liquid crystal display device and its assembling method
CN100504539C (en) * 2004-09-15 2009-06-24 乐金显示有限公司 Substrate for liquid crystal display device and method of fabricating the same
US7619711B2 (en) 2005-09-29 2009-11-17 Au Optronics Corp. Array substrate for LCD device
CN109116616A (en) * 2018-08-27 2019-01-01 上海天马微电子有限公司 A kind of liquid crystal display panel, 3 D-printing device and preparation method thereof
CN111554710A (en) * 2020-04-27 2020-08-18 京东方科技集团股份有限公司 Display panel and display device
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100504539C (en) * 2004-09-15 2009-06-24 乐金显示有限公司 Substrate for liquid crystal display device and method of fabricating the same
JP2006126811A (en) * 2004-09-30 2006-05-18 Casio Comput Co Ltd Liquid crystal display element
US7619711B2 (en) 2005-09-29 2009-11-17 Au Optronics Corp. Array substrate for LCD device
US8194225B2 (en) 2005-09-29 2012-06-05 Au Optronics Corp. Array substrate for LCD device
CN100388106C (en) * 2005-10-21 2008-05-14 友达光电股份有限公司 Multiple groups of substrates, liquid crystal display device and its assembling method
JP2007178652A (en) * 2005-12-27 2007-07-12 Nec Lcd Technologies Ltd Liquid crystal panel and its manufacturing method
US8264657B2 (en) 2005-12-27 2012-09-11 Nlt Technologies, Ltd. Liquid crystal display panel and method of manufacturing the same
CN109116616A (en) * 2018-08-27 2019-01-01 上海天马微电子有限公司 A kind of liquid crystal display panel, 3 D-printing device and preparation method thereof
CN111554710A (en) * 2020-04-27 2020-08-18 京东方科技集团股份有限公司 Display panel and display device
CN115061316A (en) * 2022-06-20 2022-09-16 深圳市华星光电半导体显示技术有限公司 Array substrate, preparation method thereof and display panel
CN115061316B (en) * 2022-06-20 2024-02-23 深圳市华星光电半导体显示技术有限公司 Array substrate, preparation method thereof and display panel

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