JP2002176019A - Work treating tank - Google Patents

Work treating tank

Info

Publication number
JP2002176019A
JP2002176019A JP2000370411A JP2000370411A JP2002176019A JP 2002176019 A JP2002176019 A JP 2002176019A JP 2000370411 A JP2000370411 A JP 2000370411A JP 2000370411 A JP2000370411 A JP 2000370411A JP 2002176019 A JP2002176019 A JP 2002176019A
Authority
JP
Japan
Prior art keywords
tank
processing
work
processing liquid
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000370411A
Other languages
Japanese (ja)
Inventor
Naofumi Mitsumune
宗 直 文 三
Yoshikazu Tsuchikura
倉 義 和 土
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SES Co Ltd
Original Assignee
SES Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SES Co Ltd filed Critical SES Co Ltd
Priority to JP2000370411A priority Critical patent/JP2002176019A/en
Publication of JP2002176019A publication Critical patent/JP2002176019A/en
Pending legal-status Critical Current

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Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent external heat radiation of a heat from a treating liquid through a work treating tank in the tank for dipping and treating the work in the high-temperature treating liquid. SOLUTION: The work treating tank 10 dips the work 11 in the heated high-temperature treating liquid 12 and treats the work. The tank 10 comprises an inner tank 13 for housing the liquid 12 in an overflowing state, a recovery tank 20 installed to surround an outer periphery of the upper end of the tank 13 to receive and recover the overflowing liquid 12, and an outer tank 21 continuously provided at a lower end of the tank 20 and surrounding the side face and the bottom of the tank 13, and a heat insulator 22 interposed between the tank 21 and the tank 13.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウエハなど
のワークを高温の処理液に浸漬して処理するためのワー
ク処理槽に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a work processing tank for processing a work such as a semiconductor wafer by immersing the work in a high-temperature processing liquid.

【0002】[0002]

【従来の技術】例えば半導体ウエハの製造工程において
は、該ウエハを加熱された高温の処理液中に浸漬して処
理する場合がある。このような処理には通常、図3に示
すような高温処理槽1が使用され、槽底に設けた複数の
ノズル2から高温の処理液3を槽内にオーバーフロー状
態となるように連続的に供給しながら、その処理液3中
にワーク4を浸漬して処理するように構成されている。
処理槽1をオーバーフローした処理液3は、該処理槽1
の上端部の回りに形成された回収槽5内に流入して回収
される。
2. Description of the Related Art For example, in a process of manufacturing a semiconductor wafer, there is a case where the wafer is immersed in a heated high-temperature processing solution for processing. Usually, a high-temperature processing tank 1 as shown in FIG. 3 is used for such processing, and a plurality of nozzles 2 provided at the bottom of the tank continuously feed high-temperature processing liquid 3 into the tank so as to overflow. While supplying, the workpiece 4 is immersed in the processing liquid 3 to be processed.
The processing liquid 3 overflowing the processing tank 1
And flows into a collecting tank 5 formed around the upper end of the tank.

【0003】ところが、上記従来の処理槽1は、高温の
処理液3からの熱が該処理槽1を通じて周囲にそのまま
放熱されるようになっているため、放熱量が多く効率が
悪いだけでなく、処理液3の温度管理も煩雑になるとい
った問題や、処理槽1の周辺に設置されている計器類や
スイッチ類、配線などの各部材が熱にさらされ、劣化が
早まって耐久性が低下するといったような問題があっ
た。また、作業者が高温の処理槽に接触する危険性もあ
った。
However, in the conventional processing tank 1, the heat from the high-temperature processing liquid 3 is radiated to the surroundings as it is through the processing tank 1, so that not only the amount of heat radiated is large but also the efficiency is low. In addition, the temperature control of the processing liquid 3 becomes complicated, and the instruments, switches, wiring, etc., which are installed in the vicinity of the processing tank 1, are exposed to heat, and deteriorate quickly due to deterioration. There was a problem such as doing. In addition, there is a danger that the worker comes into contact with the high-temperature processing tank.

【0004】[0004]

【発明が解決しようとする課題】本発明の技術的課題
は、高温の処理液にワークを浸漬して処理するためのワ
ーク処理槽において、上記処理液からの熱が該処理槽を
通じて外部に放熱されるのを防止することにある。
A technical object of the present invention is to provide a work processing tank for immersing a work in a high-temperature processing liquid for processing, wherein heat from the processing liquid is radiated to the outside through the processing tank. It is to prevent that.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するた
め、本発明によれば、加熱された高温の処理液中にワー
ークを浸漬させて処理するための処理槽であって、上記
処理液をオーバーフロー状態に収容するための平面視矩
形の内槽と、この内槽内に上記処理液を供給するための
ノズルと、上記内槽の上端部外周を取り囲むように設置
され、該内槽からオーバーフローする処理液を受けて回
収するための回収槽と、この回収槽の下端部に連設さ
れ、該回収槽の下方位置において上記内槽の側面及び底
面を取り囲む外槽とを有し、この外槽と内槽との間に、
該内槽から外槽への熱の伝達を遮断するための断熱材が
介設されてなるワーク処理槽が提供される。
According to the present invention, there is provided, in accordance with the present invention, a processing tank for immersing a work in a heated high-temperature processing liquid for processing. A rectangular inner tank for storing in an overflow state, a nozzle for supplying the processing liquid into the inner tank, and a nozzle installed to surround an outer periphery of an upper end portion of the inner tank, and overflow from the inner tank. A collecting tank for receiving and collecting the processing liquid to be treated, and an outer tank connected to the lower end of the collecting tank and surrounding the side and bottom surfaces of the inner tank at a position below the collecting tank. Between the tank and the inner tank,
There is provided a work processing tank provided with a heat insulating material for interrupting the transfer of heat from the inner tank to the outer tank.

【0006】上記構成を有するワーク処理槽は、高温の
処理液が収容される内槽の回りに外槽を設け、これらの
内槽と外槽との間に断熱材を介在させたので、処理液か
らの高熱が内槽を通じて外部に放出されることがなく、
これにより、熱効率が高められて処理液の温度管理も簡
単になるだけでなく、処理槽の周辺に設置されている計
器類やスイッチ類、配線などの各部材が熱にさらされる
ことにより劣化が早まって耐久性が低下するといった問
題や、作業者が高温の処理槽に接触する危険性などの問
題も確実に解消することができる。しかも、上記外槽を
回収槽の下端部に連設することにより該回収槽の下方位
置において内槽の回りに被設したので、この外槽を回収
槽の設置領域内にコンパクトに設置することができ、外
槽が側方に張り出してスペースを占有することがない。
In the work processing tank having the above structure, an outer tank is provided around an inner tank in which a high-temperature processing liquid is stored, and a heat insulating material is interposed between the inner tank and the outer tank. High heat from the liquid is not released outside through the inner tank,
This not only enhances the thermal efficiency and simplifies the temperature control of the processing solution, but also reduces the deterioration due to the exposure of each member such as instruments, switches, and wiring installed around the processing tank to heat. It is also possible to surely solve the problem that the durability is lowered early and the problem that the operator comes into contact with the high-temperature processing tank. In addition, since the outer tank is provided around the inner tank below the recovery tank by connecting the outer tank to the lower end of the recovery tank, the outer tank can be compactly installed in the installation area of the recovery tank. And the outer tub does not protrude to the side to occupy space.

【0007】本発明の具体的な実施形態によれば、上記
外槽が、上記内槽の一つの側面を除く他の側面と底面と
を覆うように被設されていて、該内槽の外槽で覆われて
いない側面に上記ノズルに連通する給液管が接続される
と共に、この側面の位置で上記回収槽に、該回収槽内の
処理液を回収するための回収管が接続されている。
According to a specific embodiment of the present invention, the outer tub is provided so as to cover the other side and the bottom except one side of the inner tub, and the outer tub is provided outside the inner tub. A liquid supply pipe communicating with the nozzle is connected to a side not covered by the tank, and a collection pipe for collecting the processing liquid in the collection tank is connected to the collection tank at the position of this side. I have.

【0008】[0008]

【発明の実施の形態】図1及び図2は本発明に係るワー
ク処理槽の好ましい一実施形態を概略的に示している。
このワーク処理槽10は、半導体ウエハなどの平面状を
したワーク11に、加熱された高温の処理液12による
エッチングや洗浄等の各種処理を施すためのもので、石
英ガラスなどの、化学薬液や純水あるいは市水などから
なる上記処理液に対する耐腐食性と耐熱性とを備えた素
材により形成されている。
1 and 2 schematically show a preferred embodiment of a work processing tank according to the present invention.
The work processing tank 10 is used to perform various processes such as etching and cleaning with a heated high-temperature processing liquid 12 on a planar work 11 such as a semiconductor wafer. It is formed of a material having corrosion resistance and heat resistance to the above-mentioned treatment liquid composed of pure water or city water.

【0009】上記処理槽10は、上記処理液12をオー
バーフロー状態に収容するための内槽13を有してい
る。この内槽13は、上半部が矩形状で、下半部は、相
対する側面13b,13cの下端部の間隔が槽底に向か
って次第に狭くなった形状を有し、その大きさは、複数
の円板形ワーク11をマガジン14に一定間隔で並立状
態に保持させて収容可能な大きさであり、この内槽13
の底部には、上記処理液12をオーバーフロー式に供給
するための複数のノズル15が設けられている。これら
のノズル15は、細長い筒体の側面にスリット状の噴射
口15aを備えたもので、上記内槽13の底部の相対す
る位置に該内槽13を横断するように配設され、各ノズ
ル15の噴射口15aは、ワーク11の中心かあるいは
それより上方に向けて処理液を噴出できるように斜め上
方に向けられている。
The processing tank 10 has an inner tank 13 for storing the processing liquid 12 in an overflow state. The inner tank 13 has a rectangular shape in the upper half, and the lower half has a shape in which the distance between the lower ends of the opposing side surfaces 13b and 13c gradually narrows toward the tank bottom. The inner tank 13 is large enough to hold a plurality of disk-shaped workpieces 11 in a magazine 14 at regular intervals in a parallel state.
A plurality of nozzles 15 for supplying the processing liquid 12 in an overflow manner are provided at the bottom of the nozzle. These nozzles 15 are provided with slit-shaped injection ports 15 a on the side surfaces of the elongated cylindrical body, and are disposed at positions opposite to the bottom of the inner tank 13 so as to cross the inner tank 13. The 15 injection ports 15a are directed obliquely upward so that the processing liquid can be ejected toward the center of the work 11 or upward.

【0010】上記マガジン14は、相対する一対のフレ
ーム17,17間に複数のワーク支持棒18を取り付け
たもので、各支持棒18の上端には複数の凹溝18aが
一定間隔で設けられ、これらの凹溝18a内にワーク1
1の外周部を嵌合させることにより、複数のワーク11
を一定間隔で並立状態に支持するものである。この場
合、上記各支持棒18は、各ノズル15からワーク11
の中心部に向けて噴射される処理液12の噴射の障害と
ならないような位置に配設されている。
The magazine 14 has a plurality of work support rods 18 mounted between a pair of opposed frames 17, 17, and a plurality of concave grooves 18a are provided at an upper end of each support rod 18 at regular intervals. Work 1 is placed in these concave grooves 18a.
By fitting the outer periphery of the plurality of workpieces 11
Are supported side by side at regular intervals. In this case, each of the support rods 18 is moved from each nozzle 15 to the work 11.
Are disposed so as not to hinder the ejection of the processing liquid 12 ejected toward the central portion.

【0011】上記マガジン14は内槽13内に固定的に
設置されていて、このマガジン14上に上記ワーク11
が、前工程から図示しない搬送機構により搬送されてセ
ットされるようになっている。そして、処理液12に浸
漬されることにより所定の処理が施されたワーク11
は、内槽13から取り出されて次工程に送られる。
The magazine 14 is fixedly installed in the inner tank 13, and the work 11 is placed on the magazine 14.
Are transported and set by a transport mechanism (not shown) from the previous process. Then, the workpiece 11 which has been subjected to predetermined processing by being immersed in the processing liquid 12
Is taken out of the inner tank 13 and sent to the next step.

【0012】上記内槽13の上端部には、該内槽13か
らオーバーフローする処理液12を受けて回収するため
の矩形の回収槽20が、該内槽13の外周を取り囲むよ
うに設置されている。この回収槽20は、内槽13の4
つの側面のうち第1〜第3側面13a〜13cに対応す
る槽部分20a〜20cが、槽幅を狭く且つ深さを浅く
形成され、第4側面13dに対応する槽部分20dが、
この槽部分20dを通じて処理液12を外部に排出でき
るように、槽幅を広く且つ深さを深く形成されている。
そして、上記各槽部分20a〜20cに流れ込んだ処理
液12を槽部分20dに流入し易くするため、槽部分2
0b,20cの底面20eは槽部分20d側に向けて次
第に低くなるように傾斜している。なお、この回収槽2
0の上端は、内槽13をオーバーフローした処理液12
が外部に漏出することのないように、該内槽13の上端
より高く形成されている。
At the upper end of the inner tank 13, a rectangular collecting tank 20 for receiving and collecting the processing liquid 12 overflowing from the inner tank 13 is provided so as to surround the outer periphery of the inner tank 13. I have. This collection tank 20 is used for the inner tank 13
The tank portions 20a to 20c corresponding to the first to third side surfaces 13a to 13c are formed to have a narrow tank width and a small depth, and the tank portion 20d corresponding to the fourth side surface 13d is
The width and depth of the tank are formed so that the processing liquid 12 can be discharged to the outside through the tank portion 20d.
Then, in order to make it easier for the processing liquid 12 flowing into each of the tank portions 20a to 20c to flow into the tank portion 20d, the tank portion 2
The bottom surfaces 20e of 0b and 20c are inclined so as to gradually lower toward the tank portion 20d side. In addition, this collection tank 2
0 is the processing liquid 12 which overflowed the inner tank 13.
Is formed higher than the upper end of the inner tank 13 so as not to leak out.

【0013】上記回収槽20の下端部には、内槽13の
第1〜第3側面13a〜13cと底面13eとを覆うよ
うに外槽21が連設されている。この外槽21は、回収
槽20の各槽部分20a〜20cから真っ直ぐ下方に延
びる側壁部21aと、この側壁部21aの下端部に取り
付けられた底壁部21bとからなるもので、回収槽20
の平面領域内に納まって該回収槽20より外側に突出す
ることがないように設置され、この外槽21と内槽13
との間に、高温の処理液12からの熱が内槽13から外
槽21へと伝達するのを防止するための断熱材22が充
填されている。この断熱材22は、合成樹脂発泡体や合
成ゴム、繊維性物質など、熱電導度の小さいものであれ
ばどのような素材のものでも良い。
An outer tank 21 is connected to the lower end of the collecting tank 20 so as to cover the first to third side surfaces 13a to 13c and the bottom surface 13e of the inner tank 13. The outer tank 21 includes a side wall 21a extending straight downward from each of the tank portions 20a to 20c of the collection tank 20, and a bottom wall 21b attached to a lower end of the side wall 21a.
The outer tub 21 and the inner tub 13 are installed so as to be accommodated in the flat area of the
A heat insulating material 22 for preventing heat from the high-temperature processing liquid 12 from being transmitted from the inner tank 13 to the outer tank 21 is filled in between them. The heat insulating material 22 may be made of any material having a low thermal conductivity, such as a synthetic resin foam, a synthetic rubber, and a fibrous substance.

【0014】そして、上記外槽21で覆われていない内
槽13の第4側面13dに、上記ノズル15に連通する
給液管24が接続されると共に、この第4側面13dの
位置で上記回収槽20に、該回収槽20内の処理液12
を回収するための回収管25が接続されている。これら
の給液管24及び回収管25は、図示しない昇温装置に
接続されていて、回収管25から温度低下した状態で回
収された処理液が、この昇温装置においてヒーターによ
り所要の設定温度にまで昇温され、上記給液管24によ
りノズル15を通じて上記内槽13内に循環的に供給さ
れるようになっている。而してこのように、上記給液管
24や回収管25などの配管類を、外槽21と断熱材2
2とで覆われていない側面の位置で内槽13及び回収槽
20に、該回収槽20の最も槽幅の広い槽部分20dの
下部空間を利用して接続することにより、それらを簡単
にしかも一か所で集中的に接続することができる。
A liquid supply pipe 24 communicating with the nozzle 15 is connected to the fourth side surface 13d of the inner tank 13 which is not covered by the outer tank 21, and the collection is performed at the position of the fourth side surface 13d. The processing liquid 12 in the recovery tank 20 is placed in the tank 20.
Is connected to a collecting pipe 25 for recovering the. The liquid supply pipe 24 and the recovery pipe 25 are connected to a temperature raising device (not shown), and the processing liquid collected from the recovery pipe 25 in a state where the temperature is lowered is heated to a required temperature by a heater in the temperature raising apparatus. And the liquid is supplied to the inner tank 13 through the nozzle 15 through the liquid supply pipe 24 in a circulating manner. Thus, the pipes such as the liquid supply pipe 24 and the recovery pipe 25 are connected to the outer tank 21 and the heat insulating material 2.
By connecting to the inner tank 13 and the collecting tank 20 at the side positions not covered by the step 2 by using the lower space of the tank section 20d having the widest tank width of the collecting tank 20, they can be easily and simply connected. Centralized connection at one place.

【0015】上記構成を有するワーク11処理槽10に
おいて、前工程から送られてきた複数のワーク11が上
記マガジン14上に並立状態にセットされると、上記給
液管24から各ノズル15を通じて内槽13内に高温の
処理液12がオーバーフロー状態に供給され、この処理
液12に浸漬されることにより処理される。内槽13か
らオーバーフローする処理液12は回収槽20に流れ込
み、槽部分20dから回収管25を通じて回収される。
In the work tank 10 having the above-described structure, when a plurality of works 11 sent from the previous process are set in parallel on the magazine 14, the work 11 is supplied from the liquid supply pipe 24 through each nozzle 15. The high-temperature processing liquid 12 is supplied to the tank 13 in an overflow state, and is immersed in the processing liquid 12 to be processed. The processing liquid 12 overflowing from the inner tank 13 flows into the collecting tank 20 and is collected from the tank portion 20d through the collecting pipe 25.

【0016】一方、高温の処理液12による熱は、内槽
13の回りに外槽21を設けてこれらの内槽13と外槽
21との間に断熱材22を介在させたので、この断熱材
22によって内槽13から外槽21に伝達されるのが防
止され、外槽21を通じて外部に放出されることがな
い。これにより、熱効率が高められると共に、処理液1
2の温度管理も簡単になり、さらに、処理槽10の周辺
に設置されている計器類やスイッチ類、配線などの各部
材が熱にさらされることにより劣化が早まって耐久性が
低下するといった問題や、作業者が高温の処理槽10に
接触する危険性などの問題も確実に解消されることにな
る。しかも、上記外槽21が、回収槽20の下端部に連
設されることにより該回収槽20の下方位置において内
槽13の回りに被設されているので、この外槽21が回
収槽20の設置領域内にコンパクトに設置されことにな
り、外槽21が側方に張り出してスペースを占有するこ
とがない。
On the other hand, the heat generated by the high-temperature processing solution 12 can be controlled by providing an outer tank 21 around the inner tank 13 and interposing a heat insulating material 22 between the inner tank 13 and the outer tank 21. The material 22 prevents the inner tank 13 from being transmitted to the outer tank 21, and is not released to the outside through the outer tank 21. Thereby, the thermal efficiency is improved, and the processing liquid 1
(2) The temperature control is also simplified, and furthermore, the members installed around the processing tank 10, such as instruments, switches, wiring, etc., are exposed to heat, so that deterioration is accelerated and durability is reduced. In addition, problems such as the danger of the worker coming into contact with the high-temperature processing tank 10 can be reliably solved. Moreover, since the outer tank 21 is provided around the inner tank 13 at a position below the collecting tank 20 by being connected to the lower end of the collecting tank 20, the outer tank 21 is Therefore, the outer tank 21 does not protrude to the side and occupy the space.

【0017】図示した実施例では、内槽13の一つの側
面、すなわち第4側面13dを外槽21と断熱材22と
で覆うことなく、この側面の位置で給液管24や回収管
25などの配管類を接続するようにしているが、この側
面にも他の側面と同様に外槽21と断熱材22とを被設
しても良い。
In the illustrated embodiment, one side surface of the inner tank 13, that is, the fourth side surface 13d is not covered with the outer tank 21 and the heat insulating material 22. However, the outer tub 21 and the heat insulating material 22 may be provided on this side surface similarly to the other side surfaces.

【0018】[0018]

【発明の効果】このように本発明によれば、高温の処理
液にワークを浸漬して処理するためのワーク処理槽にお
いて、上記処理液からの熱が該処理槽を通じて外部に放
熱されるのを確実に防止することができ、これにより、
熱効率が高められて処理液の温度管理も簡単になるばか
りでなく、処理槽の周辺に設置されている計器類やスイ
ッチ類、配線などの各部材が熱にさらされることにより
劣化が早まって耐久性が低下するといった問題や、作業
者が高温の処理槽に接触する危険性などの問題も同時に
解消することができる。
As described above, according to the present invention, in a work processing bath for immersing a work in a high-temperature processing solution, heat from the processing solution is radiated to the outside through the processing bath. Can be reliably prevented,
Not only is the thermal efficiency increased and the temperature control of the processing liquid is simplified, but also the instruments, switches, wiring, etc., installed around the processing tank are exposed to heat, which leads to rapid deterioration and durability. In addition, problems such as a decrease in performance and a risk that an operator comes into contact with a high-temperature processing tank can be solved at the same time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るワーク処理槽の一実施例を概略的
に示す断面図である。
FIG. 1 is a sectional view schematically showing an embodiment of a work processing tank according to the present invention.

【図2】図1におけるII−II線での断面図である。FIG. 2 is a sectional view taken along line II-II in FIG.

【図3】従来のワーク処理槽の断面図である。FIG. 3 is a sectional view of a conventional work processing tank.

【符号の説明】[Explanation of symbols]

10 処理槽 11 ワーク 12 処理液 13 内槽 13a,13b,13c,13d 側面 13e 底面 15 ノズル 20 回収槽 21 外槽 22 断熱材 24 給液管 25 回収管 DESCRIPTION OF SYMBOLS 10 Processing tank 11 Work 12 Processing liquid 13 Inner tank 13a, 13b, 13c, 13d Side surface 13e Bottom 15 Nozzle 20 Recovery tank 21 Outer tank 22 Insulation material 24 Liquid supply pipe 25 Recovery pipe

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】加熱された高温の処理液中にワークを浸漬
させて処理するための処理槽であって、上記処理液をオ
ーバーフロー状態に収容するための平面視矩形の内槽
と、この内槽内に上記処理液を供給するためのノズル
と、上記内槽の上端部外周を取り囲むように設置され、
該内槽からオーバーフローする処理液を受けて回収する
ための回収槽と、この回収槽の下端部に連設され、該回
収槽の下方位置において上記内槽の側面及び底面を取り
囲む外槽とを有し、この外槽と内槽との間に、該内槽か
ら外槽への熱の伝達を遮断するための断熱材が介設され
ていることを特徴とするワーク処理槽。
1. A processing tank for immersing a workpiece in a heated high-temperature processing liquid to perform processing, the inner tank having a rectangular shape in plan view for storing the processing liquid in an overflow state, and A nozzle for supplying the processing liquid into the tank, and installed to surround the outer periphery of the upper end of the inner tank,
A collecting tank for receiving and collecting the processing liquid overflowing from the inner tank, and an outer tank connected to a lower end of the collecting tank and surrounding the side and bottom surfaces of the inner tank at a position below the collecting tank. A work processing tank, wherein a heat insulating material is provided between the outer tank and the inner tank to block heat transfer from the inner tank to the outer tank.
【請求項2】上記外槽が、上記内槽の一つの側面を除く
他の側面と底面とを覆うように被設されていて、この外
槽で覆われていない内槽の側面に上記ノズルに連通する
給液管が接続されると共に、この側面の位置で上記回収
槽に、該回収槽内の処理液を回収するための回収管が接
続されていることを特徴とする請求項1に記載のワーク
処理槽。
2. The nozzle according to claim 1, wherein the outer tub is provided so as to cover the other side and the bottom except one side of the inner tub, and the nozzle is provided on a side of the inner tub which is not covered by the outer tub. And a collection pipe for collecting the processing liquid in the collection tank is connected to the collection tank at a position of this side surface. Work processing tank as described.
JP2000370411A 2000-12-05 2000-12-05 Work treating tank Pending JP2002176019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000370411A JP2002176019A (en) 2000-12-05 2000-12-05 Work treating tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000370411A JP2002176019A (en) 2000-12-05 2000-12-05 Work treating tank

Publications (1)

Publication Number Publication Date
JP2002176019A true JP2002176019A (en) 2002-06-21

Family

ID=18840314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000370411A Pending JP2002176019A (en) 2000-12-05 2000-12-05 Work treating tank

Country Status (1)

Country Link
JP (1) JP2002176019A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7694688B2 (en) 2007-01-05 2010-04-13 Applied Materials, Inc. Wet clean system design
US7775219B2 (en) 2006-12-29 2010-08-17 Applied Materials, Inc. Process chamber lid and controlled exhaust
CN103990613A (en) * 2014-05-19 2014-08-20 上海大学 Automatic cleaning machine for impellers of smoke exhaust ventilator
CN107088543A (en) * 2017-05-08 2017-08-25 国家电网公司 Insulator cleaning decontamination robot spray system
CN112024519A (en) * 2020-09-01 2020-12-04 赣州市业润自动化设备有限公司 Silicon chip box on convertible cleaning machine

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7775219B2 (en) 2006-12-29 2010-08-17 Applied Materials, Inc. Process chamber lid and controlled exhaust
US7694688B2 (en) 2007-01-05 2010-04-13 Applied Materials, Inc. Wet clean system design
CN103990613A (en) * 2014-05-19 2014-08-20 上海大学 Automatic cleaning machine for impellers of smoke exhaust ventilator
CN107088543A (en) * 2017-05-08 2017-08-25 国家电网公司 Insulator cleaning decontamination robot spray system
CN107088543B (en) * 2017-05-08 2022-09-13 国家电网公司 Liquid spraying system of insulator cleaning and decontamination robot
CN112024519A (en) * 2020-09-01 2020-12-04 赣州市业润自动化设备有限公司 Silicon chip box on convertible cleaning machine
CN112024519B (en) * 2020-09-01 2021-08-06 孙丹清 Silicon chip box on convertible cleaning machine

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