JP2002174810A5

JP2002174810A5 -

Info

Publication number: JP2002174810A5
Application number: JP2000375135A
Authority: JP
Filing date: 2000-12-08
Publication date: 2007-02-01

Description

【特許請求の範囲】
【請求項１】厚さ０．７ｍｍ以下で、表面に深さ５０μｍ以上の圧縮応力層を有するディスプレイ用ガラス基板。
【請求項２】ＳｉＯ_２を４０〜７０重量％、Ａｌ_２Ｏ_３を０．１〜２０重量％、Ｎａ_２Ｏを０〜２０重量％、Ｌｉ_２Ｏを０〜１５重量％、ＺｒＯ_２を０．１〜９重量％含有し、Ｌｉ_２ＯとＮａ_２Ｏの合計含有量が３〜２０重量％であるガラス材料で形成されたガラス基板の表面に深さ５０μｍ以上の圧縮応力層を有するディスプレイ用ガラス基板。
【請求項３】前記ディスプレイ用ガラス基板の端面は前記圧縮応力層が形成される前に切断された面である請求項１又は２に記載のディスプレイ用ガラス基板。
【請求項４】携帯型ディスプレイ用に供される請求項１〜３のいずれか１項に記載のディスプレイ用ガラス基板。
【請求項５】表面に深さ５０μｍ以上の圧縮応力層を有する携帯型液晶ディスプレイ用基板。
【請求項６】表面に深さ５０μｍ以上の圧縮応力層を有する反射型液晶ディスプレイ用ガラス基板。
【請求項７】厚さ０．７ｍｍ以下のガラス基板を化学強化処理して、表面に深さ５０μｍ以上の圧縮応力層を形成する工程を備えたディスプレイ用ガラス基板の製造方法。
【請求項８】ＳｉＯ_２を４０〜７０重量％、Ａｌ_２Ｏ_３を０．１〜２０重量％、Ｎａ_２Ｏを０〜２０重量％、Ｌｉ_２Ｏを０〜１５重量％、ＺｒＯ_２を０．１〜９重量％含有し、Ｌｉ_２ＯとＮａ_２Ｏの合計含有量が３〜２０重量％であるガラス材料で形成されたガラス基板を化学強化処理して、表面に深さ５０μｍ以上の圧縮応力層を形成する工程を備えたディスプレイ用ガラス基板の製造方法。
【請求項９】請求項１〜６のいずれか1項に記載されたディスプレイ用ガラス基板又は請求項７又は８項記載の方法により製造されたディスプレイ用基板を備えたディスプレイ。
【請求項１０】携帯型ディスプレイである請求項９記載のディスプレイ。 [Claims]
    1. A display glass substrate having a thickness of 0.7 mm or less and a compressive stress layer with a depth of 50 μm or more on the surface.
    2. SiO 2₂From 40 to 70% by weight of Al₂O₃0.1-20% by weight of Na₂0 to 20% by weight of O, Li₂0 to 15% by weight of O, ZrO₂0.1 to 9% by weight, and Li₂O and Na₂A glass substrate for a display having a compressive stress layer with a depth of 50 μm or more on the surface of a glass substrate formed of a glass material having a total content of O of 3 to 20% by weight.
    3. The display glass substrate according to claim 1, wherein the end surface of the display glass substrate is a surface cut before the compression stress layer is formed.
    (4) The display glass substrate according to any one of claims 1 to 3, which is provided for a portable display.
    Claims5A substrate for a portable liquid crystal display having a compressive stress layer having a depth of 50 μm or more on the surface.
    Claims6A glass substrate for a reflection type liquid crystal display having a compressive stress layer having a depth of 50 μm or more on the surface.
    Claims7A method of manufacturing a glass substrate for a display, comprising a step of chemically strengthening a glass substrate having a thickness of 0.7 mm or less to form a compressive stress layer having a depth of 50 μm or more on the surface.
    Claims8] SiO₂From 40 to 70% by weight of Al₂O₃0.1 to 20% by weight of Na₂0 to 20% by weight of O, Li₂0 to 15% by weight of O, ZrO₂0.1 to 9% by weight, and Li₂O and Na₂A glass substrate for a display comprising a step of chemically strengthening a glass substrate formed of a glass material having a total content of O of 3 to 20% by weight to form a compressive stress layer with a depth of 50 μm or more on the surface. Production method.
    9.  Claim 16A glass substrate for a display according to any one of claims or claims.7Or814. A display comprising a display substrate manufactured by the method according to item 13.
    10.   The display according to claim 9, which is a portable display.