JP2002153729A5 - - Google Patents

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Publication number
JP2002153729A5
JP2002153729A5 JP2000350855A JP2000350855A JP2002153729A5 JP 2002153729 A5 JP2002153729 A5 JP 2002153729A5 JP 2000350855 A JP2000350855 A JP 2000350855A JP 2000350855 A JP2000350855 A JP 2000350855A JP 2002153729 A5 JP2002153729 A5 JP 2002153729A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000350855A
Other languages
Japanese (ja)
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JP2002153729A (en
JP4558176B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2000350855A priority Critical patent/JP4558176B2/en
Priority claimed from JP2000350855A external-priority patent/JP4558176B2/en
Publication of JP2002153729A publication Critical patent/JP2002153729A/en
Publication of JP2002153729A5 publication Critical patent/JP2002153729A5/ja
Application granted granted Critical
Publication of JP4558176B2 publication Critical patent/JP4558176B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000350855A 2000-11-17 2000-11-17 Halogen-containing gas processing method and processing apparatus Expired - Fee Related JP4558176B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000350855A JP4558176B2 (en) 2000-11-17 2000-11-17 Halogen-containing gas processing method and processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000350855A JP4558176B2 (en) 2000-11-17 2000-11-17 Halogen-containing gas processing method and processing apparatus

Publications (3)

Publication Number Publication Date
JP2002153729A JP2002153729A (en) 2002-05-28
JP2002153729A5 true JP2002153729A5 (en) 2007-01-11
JP4558176B2 JP4558176B2 (en) 2010-10-06

Family

ID=18824011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000350855A Expired - Fee Related JP4558176B2 (en) 2000-11-17 2000-11-17 Halogen-containing gas processing method and processing apparatus

Country Status (1)

Country Link
JP (1) JP4558176B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1716912A4 (en) * 2004-01-29 2008-02-06 Taiyo Nippon Sanso Corp Method and apparatus for treating exhaust gas
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
JP2007021290A (en) * 2005-07-12 2007-02-01 Taiyo Nippon Sanso Corp Method and apparatus for treating exhaust gas
JP2012213720A (en) * 2011-03-31 2012-11-08 Azbil Corp Gas treatment device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291624A (en) * 1987-05-23 1988-11-29 Showa Denko Kk Treatment of exhaust gas in dry etching of gallium-arsenide wafer
JPH09206555A (en) * 1996-01-31 1997-08-12 Takuma Co Ltd Treatment of organohalogen compound and device therefor
JPH11156156A (en) * 1997-11-27 1999-06-15 Seiko Epson Corp Method and apparatus for treatment of halogen-based gas, reaction treater and semi-conductor device
JP2000009037A (en) * 1998-06-18 2000-01-11 Fujitsu Ltd Exhaust device and exhaust method

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