JP2002134390A5 - - Google Patents
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- Publication number
- JP2002134390A5 JP2002134390A5 JP2000323095A JP2000323095A JP2002134390A5 JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5 JP 2000323095 A JP2000323095 A JP 2000323095A JP 2000323095 A JP2000323095 A JP 2000323095A JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5
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- JP
- Japan
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000323095A JP4405071B2 (en) | 2000-10-23 | 2000-10-23 | Feeding device and optical disc master recording device having the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000323095A JP4405071B2 (en) | 2000-10-23 | 2000-10-23 | Feeding device and optical disc master recording device having the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002134390A JP2002134390A (en) | 2002-05-10 |
JP2002134390A5 true JP2002134390A5 (en) | 2006-06-01 |
JP4405071B2 JP4405071B2 (en) | 2010-01-27 |
Family
ID=18800849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000323095A Expired - Fee Related JP4405071B2 (en) | 2000-10-23 | 2000-10-23 | Feeding device and optical disc master recording device having the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4405071B2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG2012031209A (en) | 2003-04-11 | 2015-07-30 | Nippon Kogaku Kk | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
CN101436003B (en) | 2003-06-19 | 2011-08-17 | 株式会社尼康 | Exposure apparatus and device manufacturing method |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
US20080192226A1 (en) * | 2004-06-07 | 2008-08-14 | Nikon Corporation | Stage Unit, Exposure Apparatus, and Exposure Method |
USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
JP5097166B2 (en) | 2008-05-28 | 2012-12-12 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus and method of operating the apparatus |
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2000
- 2000-10-23 JP JP2000323095A patent/JP4405071B2/en not_active Expired - Fee Related