JP2002107902A5 - - Google Patents
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- JP2002107902A5 JP2002107902A5 JP2000259008A JP2000259008A JP2002107902A5 JP 2002107902 A5 JP2002107902 A5 JP 2002107902A5 JP 2000259008 A JP2000259008 A JP 2000259008A JP 2000259008 A JP2000259008 A JP 2000259008A JP 2002107902 A5 JP2002107902 A5 JP 2002107902A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000259008A JP4663857B2 (en) | 2000-07-25 | 2000-08-29 | Layout pattern data correction method and semiconductor device manufacturing method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-223731 | 2000-07-25 | ||
| JP2000223731 | 2000-07-25 | ||
| JP2000259008A JP4663857B2 (en) | 2000-07-25 | 2000-08-29 | Layout pattern data correction method and semiconductor device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002107902A JP2002107902A (en) | 2002-04-10 |
| JP2002107902A5 true JP2002107902A5 (en) | 2007-10-11 |
| JP4663857B2 JP4663857B2 (en) | 2011-04-06 |
Family
ID=26596620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000259008A Expired - Fee Related JP4663857B2 (en) | 2000-07-25 | 2000-08-29 | Layout pattern data correction method and semiconductor device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4663857B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005533283A (en) * | 2002-07-12 | 2005-11-04 | ケイデンス デザイン システムズ インコーポレイテッド | Method and system for context specific mask writing |
| JP2006189724A (en) * | 2005-01-07 | 2006-07-20 | Toshiba Corp | Pattern extraction system, measuring point extraction method, pattern extraction method and pattern extraction program |
| KR100655428B1 (en) | 2005-10-24 | 2006-12-08 | 삼성전자주식회사 | Optical proximity correction system and method thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04212957A (en) * | 1990-10-19 | 1992-08-04 | Fujitsu Ltd | Reticl and exposing method |
| JP3268692B2 (en) * | 1993-08-05 | 2002-03-25 | 株式会社日立製作所 | Method for forming semiconductor integrated circuit pattern and method for manufacturing mask used therefor |
| US5472814A (en) * | 1994-11-17 | 1995-12-05 | International Business Machines Corporation | Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement |
| JP3512954B2 (en) * | 1996-03-06 | 2004-03-31 | 富士通株式会社 | Pattern proximity effect correction method, program, and apparatus |
| JP3583559B2 (en) * | 1996-09-30 | 2004-11-04 | 株式会社ルネサステクノロジ | Optical proximity correction method |
| JP3954216B2 (en) * | 1997-09-30 | 2007-08-08 | 株式会社東芝 | Mask data design method |
| JP2001174974A (en) * | 1999-12-20 | 2001-06-29 | Matsushita Electric Ind Co Ltd | Method for correcting optical proximity effect and light intensity simulation method |
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2000
- 2000-08-29 JP JP2000259008A patent/JP4663857B2/en not_active Expired - Fee Related