JP2002102319A - Sterilizing device and sterile processing device as well as sterilizing method - Google Patents
Sterilizing device and sterile processing device as well as sterilizing methodInfo
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- JP2002102319A JP2002102319A JP2000302705A JP2000302705A JP2002102319A JP 2002102319 A JP2002102319 A JP 2002102319A JP 2000302705 A JP2000302705 A JP 2000302705A JP 2000302705 A JP2000302705 A JP 2000302705A JP 2002102319 A JP2002102319 A JP 2002102319A
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- sterilized
- sterilization
- space
- sterilizing
- processing
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- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、被滅菌空間内を滅
菌する滅菌装置及び上記被滅菌空間を有する無菌加工装
置、並びに上記被滅菌空間の滅菌方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sterilizing apparatus for sterilizing a space to be sterilized, an aseptic processing apparatus having the space to be sterilized, and a method of sterilizing the space to be sterilized.
【０００２】[0002]
【従来の技術】被滅菌空間内の滅菌に用いられる薬剤の
一種に過酸化水素がある。従来、過酸化水素による滅菌
は、過酸化水素水の微細な水滴（ミスト）を被滅菌空間
内に浮遊させ、被滅菌空間内（被滅菌空間の内壁や内容
物等）に付着させることにより行われる。また、滅菌後
の残留過酸化水素は、例えば乾燥空気等の置換ガスを被
滅菌空間内に流通させることにより排除される。2. Description of the Related Art Hydrogen peroxide is one type of drug used for sterilization in a space to be sterilized. Conventionally, sterilization with hydrogen peroxide is performed by suspending fine droplets (mist) of hydrogen peroxide in the space to be sterilized and attaching the droplets to the space to be sterilized (the inner wall and contents of the space to be sterilized). Will be In addition, residual hydrogen peroxide after sterilization is removed by flowing a replacement gas such as dry air into the space to be sterilized.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来の過酸化水素による滅菌では、上記被滅菌空間の内壁
や内容物等に付着した過酸化水素水の微細な水滴を乾燥
させるために、上記置換ガスを長時間上記被滅菌空間内
に流通させる必要があり、その結果、ガス置換に要する
時間が長くなるという問題があった。However, in the above-mentioned conventional sterilization using hydrogen peroxide, in order to dry fine water droplets of hydrogen peroxide adhering to the inner wall and contents of the above-mentioned space to be sterilized, the above-mentioned replacement is performed. It is necessary to circulate gas in the space to be sterilized for a long time, and as a result, there is a problem that the time required for gas replacement becomes long.
【０００４】[0004]
【課題を解決するための手段】本発明は上記事情に鑑み
てなされたもので、被滅菌空間内を滅菌するための滅菌
装置であって、上記被滅菌空間に殺菌剤を供給する殺菌
剤供給装置と、滅菌完了後の上記被滅菌空間内に置換ガ
スを供給するガス供給装置とを備え、上記殺菌剤供給装
置が、殺菌剤として、過酸化水素蒸気濃度０．５ｍｇ／
リットル以上、湿度３５％以下の過酸化水素蒸気を上記
被滅菌空間に充満させることを特徴としている。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and is a sterilization apparatus for sterilizing an inside of a space to be sterilized. A gas supply device for supplying a replacement gas into the space to be sterilized after completion of the sterilization, wherein the disinfectant supply device has a hydrogen peroxide vapor concentration of 0.5 mg /
It is characterized in that the space to be sterilized is filled with hydrogen peroxide vapor having a liter or more and a humidity of 35% or less.
【０００５】また、上記滅菌装置により滅菌された上記
被滅菌空間内にて加工を行う場合には、加工の結果得ら
れた製品の品質管理を効率的に行う目的で、加工に使用
される無菌加工装置に、上記滅菌装置による滅菌条件、
上記被滅菌空間内に搬入される物品の状態、上記物品に
対する加工内容、上記滅菌及び加工の日時、上記滅菌及
び加工時における異常発生状況、並びに上記異常発生の
日時、から選択される条件を表示する表示手段を設置す
ることが望ましい。In the case where processing is performed in the space to be sterilized which has been sterilized by the sterilization apparatus, a sterile used for processing is efficiently used for quality control of a product obtained as a result of the processing. In the processing device, sterilization conditions by the above sterilization device,
The condition selected from the state of the article carried into the space to be sterilized, the contents of processing of the article, the date and time of the sterilization and processing, the status of occurrence of an abnormality during the sterilization and processing, and the date and time of the occurrence of the abnormality are displayed. It is desirable to provide a display means for performing the operation.
【０００６】更に、本発明には、上記滅菌装置または無
菌加工装置を用い、上記被滅菌空間内を滅菌する滅菌方
法も含まれる。Further, the present invention also includes a sterilization method for sterilizing the above-mentioned space to be sterilized using the above-mentioned sterilizing apparatus or aseptic processing apparatus.
【０００７】[0007]
【発明の実施の形態】以下、図面に基づき、本発明の実
施形態について説明する。本発明の滅菌装置が適用され
る無菌加工装置の例を図１に示す。この無菌加工装置１
は、物品に対する加工を行う加工室（被滅菌空間）２
と、加工室に連結された滅菌装置３と、後述する種々の
条件を表示する表示手段としてのモニタ４及びプリンタ
５とを備えている。また、滅菌装置３は、加工室２内に
殺菌剤を供給する殺菌剤供給装置６と、滅菌完了後の加
工室２内に置換ガスを供給するガス供給装置７と備えて
いる。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an example of an aseptic processing apparatus to which the sterilization apparatus of the present invention is applied. This aseptic processing device 1
Is a processing room (space to be sterilized) 2 for processing an article.
And a sterilizer 3 connected to the processing chamber, and a monitor 4 and a printer 5 as display means for displaying various conditions described later. Further, the sterilizer 3 includes a germicide supply device 6 that supplies a germicide into the processing chamber 2 and a gas supply device 7 that supplies a replacement gas into the processing chamber 2 after the sterilization is completed.
【０００８】殺菌剤供給装置６は、殺菌剤として、過酸
化水素蒸気濃度０．５ｍｇ／リットル以上、湿度３５％
以下の過酸化水素蒸気を上記被滅菌空間に供給、充満さ
せるものである。上記条件の過酸化水素蒸気は、加工室
２内に浮遊し、加工室２内（内壁や内容物等）に接触し
て、加工室２内を滅菌するものであるが、従来のミスト
と異なり乾燥ガスであるため、加工室２内に付着しな
い。換言するならば、過酸化水素蒸気濃度が０．５ｍｇ
／リットル未満となると、有効な滅菌効果が得られず、
また、湿度が３５％を越えると、過酸化水素蒸気がミス
ト化して加工室２内に付着し、乾燥に時間を要するとい
う不都合が生じる。[0008] The disinfectant supply device 6 is used as a disinfectant, with a hydrogen peroxide vapor concentration of 0.5 mg / liter or more and a humidity of 35%.
The following hydrogen peroxide vapor is supplied to and filled in the space to be sterilized. The hydrogen peroxide vapor under the above conditions floats in the processing chamber 2, comes into contact with the processing chamber 2 (the inner wall and contents, etc.), and sterilizes the processing chamber 2, but unlike the conventional mist. Since it is a dry gas, it does not adhere to the inside of the processing chamber 2. In other words, the hydrogen peroxide vapor concentration is 0.5 mg
/ Liter is less than the effective sterilization effect,
On the other hand, if the humidity exceeds 35%, the hydrogen peroxide vapor becomes mist and adheres to the inside of the processing chamber 2, which causes a disadvantage that it takes time for drying.
【０００９】ガス供給装置７は、上記過酸化水素蒸気に
よる滅菌後の加工室２内に、例えば乾燥空気等の置換ガ
スを供給することにより、上記過酸化水素蒸気を加工室
２内から排除するためのものである。ここで、本発明の
無菌加工装置１及び滅菌装置３の材質に特に制限はない
が、少なくとも過酸化水素蒸気が直接接触する配管系や
加工室２内部の材質には、過酸化水素の吸収や過酸化水
素との接触による変質等を考慮して、ポリプロピレン、
ポリエチレン、天然ゴム、バイトン、テフロン（登録商
標）等の樹脂類、ＳＵＳ３０４、ＳＵＳ３１６等のステ
ンレス、アルミニウム、ガラス、セラミック等を用いる
ことが望ましい。The gas supply device 7 removes the hydrogen peroxide vapor from the processing chamber 2 by supplying a replacement gas such as dry air into the processing chamber 2 after sterilization with the hydrogen peroxide vapor. It is for. Here, the material of the aseptic processing apparatus 1 and the sterilization apparatus 3 of the present invention is not particularly limited, but at least the material of the piping system or the inside of the processing chamber 2 which is directly in contact with the vapor of hydrogen peroxide absorbs or absorbs hydrogen peroxide. In consideration of deterioration due to contact with hydrogen peroxide, polypropylene,
It is desirable to use resins such as polyethylene, natural rubber, Viton, and Teflon (registered trademark), stainless steel such as SUS304 and SUS316, aluminum, glass, and ceramic.
【００１０】また、モニタ４及びプリンタ５は、滅菌装
置３による滅菌条件、加工室２内に搬入される物品の状
態、上記物品に対する加工内容、上記滅菌及び加工の日
時、上記滅菌及び加工時における異常発生状況、並びに
上記異常発生の日時等、から選択される条件を、画面表
示または印字によりそれぞれ表示するものである。The monitor 4 and the printer 5 are used to control the sterilization conditions of the sterilizer 3, the state of the articles carried into the processing chamber 2, the contents of processing of the articles, the date and time of the sterilization and processing, and the time of the sterilization and processing. The conditions selected from the abnormality occurrence status and the date and time of the abnormality occurrence are displayed on the screen or printed.
【００１１】更に、上記滅菌装置３からモニタ４及びプ
リンタ５に至る各構成の動作並びに加工室２内における
加工装置の動作等は、無菌加工装置１が備える制御装置
８により一元管理されている。すなわち、制御装置８に
は、滅菌装置３による滅菌条件及び上記加工装置の運転
条件が予め記憶されるとともに、加工室２内に搬入され
る物品の状態、加工内容、上記滅菌及び加工の日時等が
入力される。Further, the operation of each component from the sterilizer 3 to the monitor 4 and the printer 5 and the operation of the processing device in the processing chamber 2 are integrally managed by the control device 8 provided in the aseptic processing device 1. That is, the control device 8 stores in advance the sterilization conditions of the sterilization device 3 and the operating conditions of the processing device, as well as the state of the articles carried into the processing chamber 2, the processing contents, the date and time of the sterilization and processing, and the like. Is entered.
【００１２】加工室２の滅菌に際しては、まず、加工室
２内に加工すべき物品を搬入後、加工室２を閉鎖し、次
いで、殺菌剤供給装置６を作動させて上記条件の過酸化
水素蒸気を加工室２内に供給し、過酸化水素蒸気を加工
室２内に充満させる。過酸化水素蒸気が加工室２内に充
満したら、その状態を所定時間維持し、過酸化水素蒸気
を加工室２内（及び加工室２内に搬入された物品）に接
触させて、加工室２内を滅菌する。When sterilizing the processing chamber 2, first, an article to be processed is loaded into the processing chamber 2, the processing chamber 2 is closed, and then the disinfectant supply device 6 is operated to operate the hydrogen peroxide under the above conditions. Steam is supplied into the processing chamber 2, and hydrogen peroxide vapor is filled in the processing chamber 2. When the hydrogen peroxide vapor fills the processing chamber 2, the state is maintained for a predetermined time, and the hydrogen peroxide vapor is brought into contact with the processing chamber 2 (and the articles carried into the processing chamber 2), and Sterilize inside.
【００１３】この場合、加工室２内の温度は室温でも差
し支えないが、過酸化水素の滅菌効果は温度の上昇とと
もに向上するので、加工室２内及び／または加工室２内
に供給される過酸化水素蒸気を予め加温しておくことが
望ましい。また、この際の温度範囲は２０〜８０℃が望
ましく、より望ましくは３５〜８０℃である。更に、殺
菌剤供給装置６は、加工室２内における過酸化水素蒸気
の充満完了と同時に停止してもよいが、加工室２の気密
性や加工すべき物品の清浄度合等の状況に応じ、必要量
の過酸化水素蒸気を、連続して、または断続的に供給し
続けることが望ましい。In this case, the temperature in the processing chamber 2 may be room temperature, but the sterilization effect of hydrogen peroxide increases with the rise in temperature. It is desirable to preheat the hydrogen oxide vapor. In this case, the temperature range is preferably from 20 to 80 ° C, and more preferably from 35 to 80 ° C. Further, the disinfectant supply device 6 may be stopped at the same time as the completion of the filling of the hydrogen peroxide vapor in the processing chamber 2, but depending on the airtightness of the processing chamber 2, the degree of cleanness of the article to be processed, and the like, It is desirable to continuously or intermittently supply the required amount of hydrogen peroxide vapor.
【００１４】所定時間が経過し、加工室２内の滅菌が完
了したら、ガス供給装置７を作動させるとともに、加工
室２に設けられた排気バルブ（図示せず。）を開き、加
工室２内を置換ガスで置換して、加工室２内の過酸化水
素蒸気を、上記排気バルブを介して加工室２外に排除す
る。また、上記操作は全て、制御装置８に予め入力され
た滅菌条件に基づき、自動的に行われる。When a predetermined time has passed and sterilization in the processing chamber 2 is completed, the gas supply device 7 is operated, and an exhaust valve (not shown) provided in the processing chamber 2 is opened to open the processing chamber 2. Is replaced with a replacement gas, and the hydrogen peroxide vapor in the processing chamber 2 is excluded from the processing chamber 2 through the exhaust valve. In addition, all of the above operations are automatically performed based on the sterilization conditions input to the control device 8 in advance.
【００１５】そして、加工室内２内の過酸化水素蒸気が
完全に排除された後、加工室２内に搬入された物品を、
加工室２内に設置された加工装置により無菌的に加工す
る。また、滅菌装置３による滅菌条件、加工室２内に搬
入される物品の状態、上記物品に対する加工内容、上記
滅菌及び加工の日時、あるいは何らかの異常が生じた場
合には、上記滅菌及び加工時における異常発生状況、並
びに上記異常発生の日時等を、必要に応じ、モニタ４及
びプリンタ５に適宜表示させる。After the hydrogen peroxide vapor in the processing chamber 2 is completely eliminated, the articles carried into the processing chamber 2 are
Processing is performed aseptically by a processing device installed in the processing chamber 2. In addition, sterilization conditions by the sterilization device 3, the state of the article carried into the processing chamber 2, the processing content of the article, the date and time of the sterilization and processing, or if any abnormality occurs, the sterilization and processing The abnormality occurrence status, the date and time of the occurrence of the abnormality, and the like are displayed on the monitor 4 and the printer 5 as necessary.
【００１６】ここで、本発明に係る滅菌装置３の殺菌剤
供給装置６から供給される過酸化水素蒸気は、従来使用
される過酸化水素水と同様の殺菌能力を有し、しかも、
従来のミストと異なり乾燥ガスであるため、加工室２内
に付着しない。従って、滅菌完了後の置換ガス供給に際
し、加工室２内に付着した過酸化水素水を乾燥させるた
めに置換ガスを長時間加工室２内に流通させる必要がな
く、置換ガスによる加工室内２内の過酸化水素蒸気の排
除が完了した直後から加工室２が使用可能となる。すな
わち、本発明に係る滅菌装置３を無菌加工装置１に適用
することにより、滅菌完了後のガス置換に要する時間が
短縮し、無菌加工装置１の使用効率が向上するという効
果が得られる。Here, the hydrogen peroxide vapor supplied from the disinfectant supply device 6 of the sterilization device 3 according to the present invention has the same disinfection ability as conventionally used hydrogen peroxide water.
Unlike conventional mist, it is a dry gas and does not adhere to the processing chamber 2. Therefore, when supplying the replacement gas after completion of the sterilization, it is not necessary to circulate the replacement gas in the processing chamber 2 for a long time in order to dry the hydrogen peroxide solution adhered in the processing chamber 2, and the inside of the processing chamber 2 by the replacement gas is not required. Immediately after the removal of the hydrogen peroxide vapor is completed, the processing chamber 2 can be used. That is, by applying the sterilizer 3 according to the present invention to the aseptic processing apparatus 1, the time required for gas replacement after sterilization is completed is shortened, and the effect of improving the use efficiency of the aseptic processing apparatus 1 is obtained.
【００１７】また、本発明に係る無菌加工装置１では、
滅菌装置３による滅菌条件、加工室２内に搬入される物
品の状態、上記物品に対する加工内容、上記滅菌及び加
工の日時、上記滅菌及び加工時における異常発生状況、
並びに上記異常発生の日時等の条件を、必要に応じ、モ
ニタ４及びプリンタ５に適宜表示させることにより、加
工の結果得られた製品の品質管理に必要なデータを、こ
れらの表示結果から容易に取得することが可能となり、
製品の品質管理が効率化される。更に、これらの条件
を、製品のロット毎に制御装置８に格納しておき、必要
に応じて適宜表示する構成としてもよい。In the aseptic processing apparatus 1 according to the present invention,
Sterilization conditions by the sterilizer 3, the state of the article carried into the processing chamber 2, the contents of processing of the article, the date and time of the sterilization and processing, the status of abnormalities during the sterilization and processing,
In addition, by displaying conditions such as the date and time of occurrence of the abnormality on the monitor 4 and the printer 5 as necessary, data necessary for quality control of the product obtained as a result of processing can be easily obtained from these display results. Can be acquired,
Product quality control is made more efficient. Furthermore, these conditions may be stored in the control device 8 for each product lot, and may be appropriately displayed as needed.
【００１８】なお、本発明は上記実施形態に限定される
ものではなく、具体的な実施環境等に応じ、本発明の趣
旨を逸脱しない範囲で、任意に変更可能であることは言
うまでもない。例えば、モニタ４と制御装置８とを統合
し、制御装置８のモニタに上記条件を表示する構成とし
てもよい。It should be noted that the present invention is not limited to the above-described embodiment, and it is needless to say that the present invention can be arbitrarily changed without departing from the spirit of the present invention in accordance with a specific implementation environment and the like. For example, the monitor 4 and the control device 8 may be integrated, and the above condition may be displayed on the monitor of the control device 8.
【００１９】[0019]
【発明の効果】以上説明した通り、本発明に係る滅菌装
置から供給される過酸化水素蒸気は、従来使用される過
酸化水素水と同様の殺菌能力を有し、しかも、従来のミ
ストと異なり乾燥ガスであるため、滅菌完了後の置換ガ
ス供給に際し、被滅菌空間内に付着した過酸化水素水を
乾燥させるために置換ガスを長時間流通させる必要がな
い。その結果、置換ガスによる被滅菌空間内の過酸化水
素蒸気の排除が完了した直後から被滅菌空間が使用可能
となり、被滅菌空間の使用効率が向上する。As described above, the hydrogen peroxide vapor supplied from the sterilizer according to the present invention has the same sterilizing ability as the conventionally used hydrogen peroxide water, and is different from the conventional mist. Since it is a dry gas, it is not necessary to circulate the replacement gas for a long time to dry the hydrogen peroxide solution attached to the space to be sterilized when supplying the replacement gas after the completion of the sterilization. As a result, the space to be sterilized can be used immediately after the removal of the hydrogen peroxide vapor in the space to be sterilized by the replacement gas, and the use efficiency of the space to be sterilized is improved.
【００２０】また、本発明に係る無菌加工装置では、加
工の結果得られた製品の品質管理に必要なデータを表示
手段における表示結果から容易に取得することが可能と
なるため、製品の品質管理が効率化される。In the aseptic processing apparatus according to the present invention, data necessary for quality control of the product obtained as a result of the processing can be easily obtained from the display result on the display means. Is made more efficient.
【図１】 本発明に係る無菌加工装置の概略構成を示す
図である。FIG. 1 is a diagram showing a schematic configuration of an aseptic processing apparatus according to the present invention.
１ 無菌加工装置 ２ 加工室（被滅菌空間） ３ 滅菌装置 ４ モニタ（表示手段） ５ プリンタ（表示手段） ６ 殺菌剤供給装置 ７ ガス供給装置 DESCRIPTION OF SYMBOLS 1 Aseptic processing apparatus 2 Processing room (space to be sterilized) 3 Sterilizer 4 Monitor (display means) 5 Printer (display means) 6 Disinfectant supply apparatus 7 Gas supply apparatus
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松井 弘行 東京都中央区日本橋馬喰町１丁目４番16号 藤森工業株式会社内 Ｆターム(参考） 4C058 AA24 AA25 BB07 CC02 CC03 DD03 DD07 DD14 EE11 JJ16 JJ21 JJ29 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Hiroyuki Matsui 1-4-16-1 Nibashi-cho, Tokyo
Claims (3)
であって、上記被滅菌空間に殺菌剤を供給する殺菌剤供
給装置と、滅菌完了後の上記被滅菌空間内に置換ガスを
供給するガス供給装置とを備え、上記殺菌剤供給装置
が、殺菌剤として、過酸化水素蒸気濃度０．５ｍｇ／リ
ットル以上、湿度３５％以下の過酸化水素蒸気を上記被
滅菌空間に充満させることを特徴とする滅菌装置。1. A sterilizing apparatus for sterilizing a space to be sterilized, comprising a sterilizing agent supply device for supplying a sterilizing agent to the space to be sterilized, and a replacement gas to be supplied to the space to be sterilized after the sterilization is completed. A sterilizing agent supply device that fills the space to be sterilized with a hydrogen peroxide vapor having a hydrogen peroxide vapor concentration of 0.5 mg / liter or more and a humidity of 35% or less as a sterilizing agent. Characterized sterilizer.
れた上記被滅菌空間内にて加工を行う無菌加工装置であ
って、上記滅菌装置による滅菌条件、上記被滅菌空間内
に搬入される物品の状態、上記物品に対する加工内容、
上記滅菌及び加工の日時、上記滅菌及び加工時における
異常発生状況、並びに上記異常発生の日時、から選択さ
れる条件を表示する表示手段を備えることを特徴とする
無菌加工装置。2. An aseptic processing apparatus for performing processing in the sterilized space sterilized by the sterilizing apparatus according to claim 1, wherein the apparatus is carried into the sterilized space under sterilization conditions of the sterilizing apparatus. The state of the article, the content of processing on the article,
An aseptic processing apparatus, comprising: display means for displaying conditions selected from the date and time of the sterilization and processing, the state of occurrence of an abnormality during the sterilization and processing, and the date and time of the occurrence of the abnormality.
２に記載の無菌加工装置を用い、上記被滅菌空間内を滅
菌することを特徴とする滅菌方法。3. A sterilization method using the sterilization apparatus according to claim 1 or the aseptic processing apparatus according to claim 2 to sterilize the inside of the space to be sterilized.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000302705A JP2002102319A (en) | 2000-10-02 | 2000-10-02 | Sterilizing device and sterile processing device as well as sterilizing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000302705A JP2002102319A (en) | 2000-10-02 | 2000-10-02 | Sterilizing device and sterile processing device as well as sterilizing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002102319A true JP2002102319A (en) | 2002-04-09 |
Family
ID=18784014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000302705A Pending JP2002102319A (en) | 2000-10-02 | 2000-10-02 | Sterilizing device and sterile processing device as well as sterilizing method |
Country Status (1)
| Country | Link |
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| JP (1) | JP2002102319A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019506932A (en) * | 2016-01-15 | 2019-03-14 | シデル パルティシパションＳｉｄｅｌ Ｐａｒｔｉｃｉｐａｔｉｏｎｓ | Gaseous filtration means, in particular a method and apparatus for sterilizing blown air |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001518816A (en) * | 1997-04-08 | 2001-10-16 | ステリス コーポレイション | Gas phase decontamination isolator with integrated gas phase decontamination agent generation system |
-
2000
- 2000-10-02 JP JP2000302705A patent/JP2002102319A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001518816A (en) * | 1997-04-08 | 2001-10-16 | ステリス コーポレイション | Gas phase decontamination isolator with integrated gas phase decontamination agent generation system |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019506932A (en) * | 2016-01-15 | 2019-03-14 | シデル パルティシパションＳｉｄｅｌ Ｐａｒｔｉｃｉｐａｔｉｏｎｓ | Gaseous filtration means, in particular a method and apparatus for sterilizing blown air |
| JP7377602B2 (en) | 2016-01-15 | 2023-11-10 | シデル パルティシパション | Method and apparatus for sterilizing gaseous filtration means, especially blown air |
| US11964069B2 (en) | 2016-01-15 | 2024-04-23 | Sidel Participations | Process and device for sterilizing gas filtration means, in particular blowing air |
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