JP2002097226A - Water-soluble photosensitive polymer and water-soluble photosensitive resin composition - Google Patents
Water-soluble photosensitive polymer and water-soluble photosensitive resin compositionInfo
- Publication number
- JP2002097226A JP2002097226A JP2000289971A JP2000289971A JP2002097226A JP 2002097226 A JP2002097226 A JP 2002097226A JP 2000289971 A JP2000289971 A JP 2000289971A JP 2000289971 A JP2000289971 A JP 2000289971A JP 2002097226 A JP2002097226 A JP 2002097226A
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- Japan
- Prior art keywords
- water
- soluble
- resin composition
- soluble photosensitive
- polymer
- Prior art date
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
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- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は水溶性感光性ポリマ
ー及びその樹脂組成物に係り、光硬化に際して非露光部
は水のみで容易に洗浄除去することができ、露光部は不
溶性となる感光性樹脂組成物に係るものであり、印刷産
業、エレクトロニクス産業等に利用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water-soluble photosensitive polymer and a resin composition thereof. In photo-curing, a non-exposed portion can be easily washed away with water only, and an exposed portion becomes insoluble. It relates to a resin composition and is used in the printing industry, the electronics industry, and the like.
【０００２】[0002]
【従来の技術】感光性樹脂は金属加工産業、エレクトロ
ニクス産業、印刷産業、塗料・インキ産業などの発展と
ともにその利用分野を広範囲に拡大してきた。具体的用
途の主たるものは、（ａ）金属の部分的エッチングによ
る、銅張積層板の作成、ＬＳＩなどの精密な電子回路の
作成、（ｂ）印刷用樹脂版の作成、（ｃ）スクリーン印
刷用インキなどである。従って、最終の使用目的、条
件、作成者側の工程の簡素化、環境面への配慮などから
当然感光性樹脂組成物の変性化が要求される。現在で
は、特性の異なる多品種の感光性樹脂が市販・上市され
ている。これらの感光性樹脂を用いて金属箔などの部分
的エッチング液による回路作成、あるいは印刷用樹脂版
の作成を行う場合には次のような工程が用いられる。す
なわち、塗布された感光性樹脂組成物の薄膜上にネガマ
スクを置き、光照射して露光部を光硬化させ、非露光部
を洗浄によって除去した後、露出した金属部分はエッチ
ング液への浸漬によって溶出させ回路作成する。また、
印刷用製版では、エッチングの工程は不要である。従
来、上記の用途で用いられた水溶性感光性樹脂組成物と
しては、光架橋剤としての水溶性アジド化合物と、これ
により光架橋可能な水溶性ポリマーとを組み合わせたも
のが知られている。例えば重合体マトリックスとしてポ
リアクリルアミド、ポリビニルピロリドンを用いたもの
（特開昭４９−４３５６９号公報）、ビニルアルコール
−マレイン酸共重合体もしくはこれらの塩を用いたもの
（特開昭４８−９７６０２号公報）、ビニルアルコール
−アクリルアミドの共重合体を用いたもの（特開昭４８
−９７６０３号公報）、水溶性ポリビニルブチラートを
用いたもの（特開昭４８−９８９０５号公報）などがあ
るが、これらは低感度のため露光量を大きくしなければ
ならない、また、露光量を大きくするために露光時間が
長くなってしまい生産性が低下するなどの問題がある。
一方、水溶性アジド化合物とポリビニルピロリドンを組
み合わせたもの（特開昭４８−９０１８５号公報）で
は、十分な解像度が得られないという問題がある。更
に、感光性樹脂組成物は保存安定性が良好であることが
望ましい。2. Description of the Related Art The application fields of photosensitive resins have been widely expanded with the development of metal processing industry, electronics industry, printing industry, paint and ink industry, and the like. The main specific applications are (a) the production of copper-clad laminates by the partial etching of metals, the production of precision electronic circuits such as LSIs, (b) the production of printing resin plates, and (c) the screen printing. And inks for use. Therefore, it is naturally required to modify the photosensitive resin composition in view of the final purpose of use, conditions, simplification of the process on the creator side, consideration of the environment, and the like. At present, various kinds of photosensitive resins having different characteristics are commercially available and marketed. When a circuit is formed by using a partial etching solution such as a metal foil or a resin plate for printing using these photosensitive resins, the following steps are used. That is, a negative mask is placed on the thin film of the applied photosensitive resin composition, the exposed portion is light-cured by irradiating light, and the unexposed portion is removed by washing, and then the exposed metal portion is immersed in an etching solution. Elute and create a circuit. Also,
In printing plate making, an etching step is unnecessary. Conventionally, as a water-soluble photosensitive resin composition used for the above-mentioned applications, a combination of a water-soluble azide compound as a photo-crosslinking agent and a water-soluble polymer which can be photo-crosslinked by this is known. For example, those using polyacrylamide or polyvinylpyrrolidone as a polymer matrix (JP-A-49-43569), those using a vinyl alcohol-maleic acid copolymer or a salt thereof (JP-A-48-97602) ), Using a vinyl alcohol-acrylamide copolymer (JP-A-48
JP-A-97603) and those using a water-soluble polyvinyl butyrate (JP-A-48-98905). However, these have a low sensitivity and therefore require a large exposure. There is a problem that the exposure time becomes longer due to the increase, and the productivity is lowered.
On the other hand, a combination of a water-soluble azide compound and polyvinylpyrrolidone (JP-A-48-90185) has a problem that a sufficient resolution cannot be obtained. Furthermore, it is desirable that the photosensitive resin composition has good storage stability.
【０００３】[0003]
【発明が解決しようとする課題】本発明の目的とすると
ころは、水現像可能な、高感度、高解像性で保存安定性
も良好な、水溶性感光性ポリマー及びその樹脂組成物を
提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a water-soluble photosensitive polymer and a resin composition thereof, which are developable with water, have high sensitivity, high resolution and good storage stability. Is to do.
【０００４】[0004]
【課題を解決するための手段】請求項１の発明は、感光
性アジド基及び水溶性のアルカリ塩基及び水溶性非感光
性部を含む一般式（１）で表される化合物をモノマー単
位として含むことを特徴とする水溶性感光性ポリマーで
ある。The invention of claim 1 comprises, as a monomer unit, a compound represented by the general formula (1) containing a photosensitive azide group, a water-soluble alkali base and a water-soluble non-photosensitive portion. It is a water-soluble photosensitive polymer characterized by the following.
【化３】 式中、ＡＸは水溶性のアルカリ塩基を示す。Embedded image In the formula, AX represents a water-soluble alkali base.
【０００５】請求項２の発明は、前記アルカリ塩基が一
般式（４）で示されるスルホン酸アルカリ塩であること
を特徴とする請求項１記載の水溶性感光性ポリマーであ
る。[0005] The invention of claim 2 is the water-soluble photosensitive polymer according to claim 1, wherein the alkali base is an alkali salt of a sulfonic acid represented by the general formula (4).
【化４】 式中、Ｘはナトリウム又はカリウムを示す。Embedded image In the formula, X represents sodium or potassium.
【０００６】請求項３の発明は、前記請求項１、２の水
溶性感光性ポリマーと共重合可能なポリマーを含むこと
を特徴とする請求項１、２記載の水溶性感光性ポリマー
である。According to a third aspect of the present invention, there is provided the water-soluble photosensitive polymer according to the first or second aspect, comprising a polymer copolymerizable with the water-soluble photosensitive polymer according to the first or second aspect.
【０００７】請求項４の発明は、請求項１，２記載の水
溶性感光性ポリマーを主成分とすることを特徴とする水
溶性感光性樹脂組成物である。A fourth aspect of the present invention is a water-soluble photosensitive resin composition comprising the water-soluble photosensitive polymer according to the first and second aspects as a main component.
【０００８】請求項５の発明は、アジド化合物により架
橋可能な水溶性ポリマーを含むことを特徴とする、請求
項３記載の水溶性感光性樹脂組成物。The invention according to claim 5 is characterized in that the composition contains a water-soluble polymer which can be cross-linked by an azide compound.
【０００９】[0009]
【発明の実施の形態】本発明の水溶性感光性ポリマーの
出発物質としては、（Ｉ）Ｎ−ビニルアセトアミドを単
独で重合させることにより得られるポリマー（ＩＩ）Ｎ
−ビニルアセトアミドと、それ以外の水溶性モノマーと
の共重合体が挙げられる。BEST MODE FOR CARRYING OUT THE INVENTION As a starting material of the water-soluble photosensitive polymer of the present invention, (I) a polymer (II) N obtained by polymerizing N-vinylacetamide alone
-Copolymers of vinylacetamide and other water-soluble monomers.
【００１０】上記（ＩＩ）における水溶性モノマーとし
ては、例えばアクリル酸、メタクリル酸、マレイン酸、
Ｎ−ビニルピロリドン、アクリロアミド、ジメチルアク
リルアミド、アクリロイルモルホリンなどが挙げらる。
これらのモノマーは１種のみを使用しても２種以上を併
用してもよい。上記（ＩＩ）におけるＮ−ビニルアセト
アミドとそれ以外の水溶性モノマーとの共重合反応割合
は、Ｎ−ビニルアセトアミド１．０モルに対し、それ以
外の水溶性モノマー１０モル以下が好ましい。１０モル
を超えると、感光基の導入量が不足し、感光性が低下す
る恐れがあるからである。The water-soluble monomer in the above (II) includes, for example, acrylic acid, methacrylic acid, maleic acid,
N-vinylpyrrolidone, acrylamide, dimethylacrylamide, acryloylmorpholine and the like can be mentioned.
These monomers may be used alone or in combination of two or more. The copolymerization reaction ratio between N-vinylacetamide and the other water-soluble monomer in the above (II) is preferably 1.0 mol N-vinylacetamide and 10 mol or less of the other water-soluble monomer. If the amount exceeds 10 moles, the amount of the photosensitive group to be introduced becomes insufficient, and the photosensitivity may be reduced.
【００１１】本発明の水溶性感光性ポリマーは前記
（Ｉ）または（ＩＩ）で示されるポリマーに、４−アジ
ドベンズアルデヒド−２−スルホン酸アルカリ塩などの
アルカリ塩基を含むアジド化合物の少なくとも１種を水
酸化ナトリウム水溶液、水酸化カリウム水溶液、または
これらにアルコールを添加した溶液中で反応させるいわ
ゆるアルドール縮合反応によって導入することにより得
ることができる。なお、化合物合成方法はこれに限定さ
れるものではない。The water-soluble photosensitive polymer of the present invention is obtained by adding at least one azide compound containing an alkali base such as an alkali salt of 4-azidobenzaldehyde-2-sulfonic acid to the polymer represented by the above (I) or (II). It can be obtained by introducing by a so-called aldol condensation reaction in which a reaction is performed in an aqueous solution of sodium hydroxide, an aqueous solution of potassium hydroxide, or a solution obtained by adding an alcohol thereto. In addition, the compound synthesis method is not limited to this.
【００１２】本発明のポリマーの原料となるアルカリ塩
基を含むアジドベンズアルデヒド化合物としては水溶性
のアルカリ塩基を含めば何でも良いが、比較的入手容易
なスルホン酸アルカリ塩基を含む４−アジドベンズアル
デヒド−２−スルホン酸アルカリ塩が好ましい。As the azidobenzaldehyde compound containing an alkali base, which is a raw material of the polymer of the present invention, any compound including a water-soluble alkali base may be used, but 4-azidobenzaldehyde-2-containing a relatively easily available sulfonic acid alkali base. Alkali sulfonic acid salts are preferred.
【００１３】本発明の水溶性感光性樹脂組成物は、上記
水溶性感光性ポリマーとアジド化合物によって架橋可能
な他の水溶性ポリマーとの混合物として使用することが
できる。The water-soluble photosensitive resin composition of the present invention can be used as a mixture of the above-mentioned water-soluble photosensitive polymer and another water-soluble polymer which can be crosslinked by an azide compound.
【００１４】アジド化合物によって架橋可能な水溶性ポ
リマーとしては、ポリビニルブチラール、ポリビニルピ
ロリドン、アクリルアミド−ジアセトンアクリルアミド
共重合体、カゼインなどを用いることができる。これら
水溶性ポリマーは単独で用いても、２種以上を組み合わ
せて用いてもよい。As the water-soluble polymer which can be crosslinked by the azide compound, polyvinyl butyral, polyvinyl pyrrolidone, acrylamide-diacetone acrylamide copolymer, casein and the like can be used. These water-soluble polymers may be used alone or in combination of two or more.
【００１５】本発明の水溶性感光性樹脂組成物におい
て、アジド化合物によって架橋可能な水溶性ポリマー
（Ａ）と水溶性感光性ポリマー（Ｂ）との配合割合は、
（Ａ）固形分１００重量部に対して、（Ｂ）固形分５〜
４０重量部程度の範囲の割合で配合させるのが好まし
い。（Ｂ）固形分の配合割合が５重量部未満では感度が
落ち、一方、４０重量部を超えると基材に対する剥離性
が低下するからである。In the water-soluble photosensitive resin composition of the present invention, the mixing ratio of the water-soluble polymer (A) crosslinkable with an azide compound and the water-soluble photosensitive polymer (B) is as follows:
(A) 100 parts by weight of solid content, (B) 5 to 5 solid content
It is preferable to mix them in a ratio of about 40 parts by weight. If the blending ratio of the solid component (B) is less than 5 parts by weight, the sensitivity is lowered. On the other hand, if it exceeds 40 parts by weight, the releasability from the substrate is reduced.
【００１６】本発明の水溶性感光性樹脂組成物において
は、上記水溶性ポリマーの他に、必要に応じて相溶性の
ある増感剤、着色剤、可塑剤、界面活性剤、基板との密
着を高めるためのカップリング剤等の各種添加剤を適
宜、添加、配合させることができる。例えば、増感剤と
しては、１，５−ナフタレンジスルホン酸ジナトリウム
や１−［１−ベンゾイル−２−（ｐ−ジメチルアミノフ
ェノニル）エテニル］ピリジニウムプロミド等を用いる
ことができるIn the water-soluble photosensitive resin composition of the present invention, in addition to the above-mentioned water-soluble polymer, a sensitizer, a coloring agent, a plasticizer, a surfactant, and a compatibility which are compatible with the substrate, if necessary. Various additives such as a coupling agent for increasing the viscosity can be appropriately added and blended. For example, as a sensitizer, disodium 1,5-naphthalenedisulfonic acid and 1- [1-benzoyl-2- (p-dimethylaminophenonyl) ethenyl] pyridinium bromide can be used.
【００１７】本発明の感光性樹脂組成物を基板に数〜数
十μｍの膜厚に均一に塗布し、暗所で溶媒を揮散させた
後、所定のパターンを有するネガマスクを密着させ、超
高圧水銀灯、高圧水銀灯などで露光し、光照射部分を架
橋反応させる。その後、水道水にて非露光部分を洗い流
すと、マスクパターンに忠実な光硬化パターンを形成す
ることができる。The photosensitive resin composition of the present invention is uniformly coated on a substrate to a thickness of several to several tens of μm, and after the solvent is evaporated in a dark place, a negative mask having a predetermined pattern is brought into close contact with the substrate. Exposure is performed with a mercury lamp, high-pressure mercury lamp, or the like, and the light-irradiated portion is cross-linked. Thereafter, when the unexposed portion is washed away with tap water, a photo-cured pattern faithful to the mask pattern can be formed.
【００１８】[0018]
【実施例】以下、本発明を実施例により具体的に説明す
る。The present invention will be described below in more detail with reference to examples.
【００１９】＜合成例１＞ 水溶性感光性ポリマーの合
成 ポリ−Ｎ−ビニルアセトアミド（昭和電工（株）製
「ＧＥ−１９１ＬＬ」：平均分子量＝４０，０００、固
形分約４０重量％）１００重量部を純水３００重量部に
溶解させ、ここへ４−アジドベンズアルデヒド−２−ス
ルホン酸ナトリウム３５重量部を加えて完全に溶解さ
せ、さらに５重量％の水酸化ナトリウム水溶液５重量部
を加えた後、室温にて３日間攪拌した。攪拌終了後、希
塩酸にて中和し、さらに純水を２８０重量部加えて濃度
約１０重量％の水溶性感光性ポリマー溶液を得た。<Synthesis Example 1> Synthesis of water-soluble photosensitive polymer Poly-N-vinylacetamide (manufactured by Showa Denko KK)
“GE-191LL”: average molecular weight = 40,000, solid content: about 40% by weight) 100 parts by weight are dissolved in 300 parts by weight of pure water, and 35 parts by weight of sodium 4-azidobenzaldehyde-2-sulfonate are added thereto. Then, 5 parts by weight of a 5% by weight aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 3 days. After completion of the stirring, the mixture was neutralized with dilute hydrochloric acid, and 280 parts by weight of pure water was added to obtain a water-soluble photosensitive polymer solution having a concentration of about 10% by weight.
【００２０】＜合成例２＞ 水溶性感光性ポリマーの合
成 Ｎ−ビニルアセトアミド２６重量部およびＮ−ビニルピ
ロリドン７８重量部を純水１０００部に溶解させ、５５
℃に加熱した。これに重合開始剤として「ＶＡ−０４
４」（和光純薬製）を０．２重量部加えて５時間攪拌
し、濃度１０重量％の共重合体溶液を調製した。ここへ
４−アジドベンズアルデヒド−２−スルホン酸ナトリウ
ム７５重量部、純水７００重量部、および５重量％の水
酸化ナトリウム水溶液１０重量部を加えた後、室温にて
３日間攪拌した。攪拌終了後、希塩酸にて中和し、濃度
約１０重量％の水溶性感光性ポリマー溶液を得た。<Synthesis Example 2> Synthesis of Water-Soluble Photosensitive Polymer 26 parts by weight of N-vinylacetamide and 78 parts by weight of N-vinylpyrrolidone were dissolved in 1000 parts of pure water.
Heated to ° C. As a polymerization initiator, "VA-04
4 "(manufactured by Wako Pure Chemical Industries, Ltd.) was added in an amount of 0.2 part by weight, followed by stirring for 5 hours to prepare a copolymer solution having a concentration of 10% by weight. To this were added 75 parts by weight of sodium 4-azidobenzaldehyde-2-sulfonate, 700 parts by weight of pure water, and 10 parts by weight of a 5% by weight aqueous sodium hydroxide solution, followed by stirring at room temperature for 3 days. After completion of the stirring, the mixture was neutralized with dilute hydrochloric acid to obtain a water-soluble photosensitive polymer solution having a concentration of about 10% by weight.
【００２１】＜合成例３＞ 水溶性感光性樹脂組成物の
調製 カゼイン溶液（富士薬品（株）製「２Ｒ−５０」：固形
分１１．２％）１７００重量部に合成例１で得られた水
溶性感光性ポリマー溶液３５重量部を加えて攪拌し、固
形分約１１％の水溶性感光性樹脂組成物を得た。<Synthesis Example 3> Preparation of Water-Soluble Photosensitive Resin Composition Casein solution ("2R-50" manufactured by Fuji Pharmaceutical Co., Ltd .; solid content: 11.2%) was obtained in Synthesis Example 1 in 1700 parts by weight. 35 parts by weight of a water-soluble photosensitive polymer solution was added and stirred to obtain a water-soluble photosensitive resin composition having a solid content of about 11%.
【００２２】＜合成例４＞ 水溶性感光性樹脂組成物の
調製 カゼイン溶液（富士薬品（株）製「２Ｒ−５０」：固形
分１１．２％）１７００重量部に合成例２で得られた水
溶性感光性ポリマー溶液４０重量部を加えて攪拌し、固
形分約１１％の水溶性感光性樹脂組成物を得た。<Synthesis Example 4> Preparation of Water-Soluble Photosensitive Resin Composition Casein solution ("2R-50" manufactured by Fuji Pharmaceutical Co., Ltd .; solid content: 11.2%) was obtained in Synthesis Example 2 in 1700 parts by weight. 40 parts by weight of a water-soluble photosensitive polymer solution was added and stirred to obtain a water-soluble photosensitive resin composition having a solid content of about 11%.
【００２３】＜実施例１＞ガラス基板（９０ｘ９０ｍ
ｍ）を脱脂、水洗、乾燥させた後、合成例３で調製した
水溶性感光性樹脂組成物を１７０ｒｐｍにて回転塗布
し、８０℃にて１０分間乾燥を行い、感光膜（膜厚７μ
ｍ）を形成した。Example 1 A glass substrate (90 × 90 m
m) was degreased, washed with water, and dried, and thereafter, the water-soluble photosensitive resin composition prepared in Synthesis Example 3 was spin-coated at 170 rpm and dried at 80 ° C. for 10 minutes to obtain a photosensitive film (film thickness 7 μm).
m) was formed.
【００２４】この感光膜上にＫｏｄａｋ Ｐｈｏｔｏｇ
ｒａｐｈiｃ Ｓｔｅｐ Ｔａｂｌｅｔ Ｎｏ．２（以
下グレースケールと称する）を真空密着させながら超高
圧水銀灯を用いて１０００ｍＪの光量で露光を行った直
後に常温の水道水で現像したところ、グレースケール感
度は４で解像度は４０μｍであった。この感度は露光後
２４時間放置した後に現像した場合も変わらなかった。On this photosensitive film, Kodak Photog
raphic Step Table No. 2 (hereinafter referred to as gray scale) was exposed to light at 1000 mJ using an ultra-high pressure mercury lamp while being brought into close contact with the vacuum, and then developed with tap water at normal temperature. The gray scale sensitivity was 4 and the resolution was 40 μm. . This sensitivity did not change when developed after standing for 24 hours after exposure.
【００２５】＜実施例２＞水溶性感光性樹脂組成物を合
成例４で調製したものに置き換えた以外は実施例１と同
様の方法で塗布、乾燥、露光、現像を行ったところ、グ
レースケール感度は４で解像度は４０μｍであった。こ
の感度は露光後２４時間放置した後に現像した場合も変
わらなかった。<Example 2> Coating, drying, exposure and development were performed in the same manner as in Example 1 except that the water-soluble photosensitive resin composition was replaced with the one prepared in Synthesis Example 4. The sensitivity was 4 and the resolution was 40 μm. This sensitivity did not change when developed after standing for 24 hours after exposure.
【００２６】＜比較例１＞水溶性感光性樹脂組成物中の
感光性ポリマーを式（３）で表される４，４'−ジアジ
ドスチルベン−２，２'−ジスルホン酸ナトリウム１
９．７重量部（４水和物として）に置き換えた以外は実
施例１と同様の方法で塗布、乾燥、露光、現像を行った
ところ、グレースケール感度は３で解像度は５０μｍで
あった。Comparative Example 1 The photosensitive polymer in the water-soluble photosensitive resin composition was sodium 4,4'-diazidostilbene-2,2'-disulfonate 1 represented by the formula (3).
Coating, drying, exposure, and development were carried out in the same manner as in Example 1 except that 9.7 parts by weight (as tetrahydrate) was used. As a result, the gray scale sensitivity was 3 and the resolution was 50 μm.
【化５】 Embedded image
【００２７】[0027]
【発明の効果】以上説明したように、本発明によれば同
光量下でグレースケール感度が比較例の３に対し４とい
う高感度であり、かつ比較例の５０μｍという解像度に
対し４０μｍという高解像性で、保存安定性が良好な水
溶性感光性樹脂組成物が提供できる。As described above, according to the present invention, the gray scale sensitivity is as high as 4 compared to 3 in the comparative example under the same amount of light, and as high as 40 μm in comparison with the resolution of 50 μm in the comparative example. A water-soluble photosensitive resin composition having excellent image stability and storage stability can be provided.
フロントページの続き Ｆターム(参考） 2H025 AA01 AA02 AA04 AA11 AB15 AB20 AC01 AD01 BA08 BC03 BC84 CB53 FA17 4J002 AD02X BE06X BG01W BG13W BG13X BH02W BJ00W BJ00X GP03 4J100 AJ02Q AJ09Q AL08Q AM15Q AM24Q AN06P AN13P AQ08Q BA12H BA14P BA14Q BA44H BA56H BC43H BC79Q CA04 HA56 HC71 JA37 JA38 Front page of the continued F-term (reference) 2H025 AA01 AA02 AA04 AA11 AB15 AB20 AC01 AD01 BA08 BC03 BC84 CB53 FA17 4J002 AD02X BE06X BG01W BG13W BG13X BH02W BJ00W BJ00X GP03 4J100 AJ02Q AJ09Q AL08Q AM15Q AM24Q AN06P AN13P AQ08Q BA12H BA14P BA14Q BA44H BA56H BC43H BC79Q CA04 HA56 HC71 JA37 JA38
Claims (5)
及び水溶性非感光性部を含む一般式（１）で表される化
合物をモノマー単位として含むことを特徴とする水溶性
感光性ポリマー。 【化１】 式中、ＡＸは水溶性のアルカリ塩基を示す。1. A water-soluble photosensitive polymer comprising, as a monomer unit, a compound represented by the general formula (1) containing a photosensitive azide group, a water-soluble alkali base and a water-soluble non-photosensitive portion. Embedded image In the formula, AX represents a water-soluble alkali base.
るスルホン酸アルカリ塩基であることを特徴とする請求
項１記載の水溶性感光性ポリマー。 【化２】 式中、Ｘはナトリウム又はカリウムを示す。2. The water-soluble photosensitive polymer according to claim 1, wherein the alkali base is a sulfonic acid alkali base represented by the general formula (2). Embedded image In the formula, X represents sodium or potassium.
と共重合可能なポリマーを含むことを特徴とする請求項
１、２記載の水溶性感光性ポリマー。3. The water-soluble photosensitive polymer according to claim 1, further comprising a polymer copolymerizable with the water-soluble photosensitive polymer according to claim 1.
を主成分とすることを特徴とする水溶性感光性樹脂組成
物。4. A water-soluble photosensitive resin composition comprising the water-soluble photosensitive polymer according to claim 1 as a main component.
マーを含むことを特徴とする、請求項４記載の水溶性感
光性樹脂組成物。5. The water-soluble photosensitive resin composition according to claim 4, comprising a water-soluble polymer crosslinkable by an azide compound.
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| JP4826003B2 JP4826003B2 (en) | 2011-11-30 |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05113661A (en) * | 1991-10-23 | 1993-05-07 | Hitachi Ltd | Photosensitive composition, pattern forming method using the same, and formation of fluorescent screen |
| JPH0632823A (en) * | 1992-07-17 | 1994-02-08 | Mitsubishi Electric Corp | Production of water-soluble photosensitive polymeric compound and photosensitive resin composition |
| JPH0772620A (en) * | 1993-09-03 | 1995-03-17 | Hitachi Ltd | Photosensitive compound and formation of pattern by using the same |
| JPH07234504A (en) * | 1994-02-23 | 1995-09-05 | Toyo Gosei Kogyo Kk | Photosensitive resin composition |
| JPH0968796A (en) * | 1995-08-31 | 1997-03-11 | Tokyo Ohka Kogyo Co Ltd | Forming method of image hardened by light |
| JPH09185163A (en) * | 1995-12-29 | 1997-07-15 | Tokyo Ohka Kogyo Co Ltd | Water-soluble photosensitive resin composition and method for forming black matrix pattern using the same |
| JPH1124241A (en) * | 1997-07-09 | 1999-01-29 | Toyo Gosei Kogyo Kk | Photosensitive composition and pattern forming method |
-
2000
- 2000-09-25 JP JP2000289971A patent/JP4826003B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05113661A (en) * | 1991-10-23 | 1993-05-07 | Hitachi Ltd | Photosensitive composition, pattern forming method using the same, and formation of fluorescent screen |
| JPH0632823A (en) * | 1992-07-17 | 1994-02-08 | Mitsubishi Electric Corp | Production of water-soluble photosensitive polymeric compound and photosensitive resin composition |
| JPH0772620A (en) * | 1993-09-03 | 1995-03-17 | Hitachi Ltd | Photosensitive compound and formation of pattern by using the same |
| JPH07234504A (en) * | 1994-02-23 | 1995-09-05 | Toyo Gosei Kogyo Kk | Photosensitive resin composition |
| JPH0968796A (en) * | 1995-08-31 | 1997-03-11 | Tokyo Ohka Kogyo Co Ltd | Forming method of image hardened by light |
| JPH09185163A (en) * | 1995-12-29 | 1997-07-15 | Tokyo Ohka Kogyo Co Ltd | Water-soluble photosensitive resin composition and method for forming black matrix pattern using the same |
| JPH1124241A (en) * | 1997-07-09 | 1999-01-29 | Toyo Gosei Kogyo Kk | Photosensitive composition and pattern forming method |
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| Publication number | Publication date |
|---|---|
| JP4826003B2 (en) | 2011-11-30 |
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