JP2002080421A - Method for producing highly pure shikimic acid - Google Patents
Method for producing highly pure shikimic acidInfo
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- JP2002080421A JP2002080421A JP2000268629A JP2000268629A JP2002080421A JP 2002080421 A JP2002080421 A JP 2002080421A JP 2000268629 A JP2000268629 A JP 2000268629A JP 2000268629 A JP2000268629 A JP 2000268629A JP 2002080421 A JP2002080421 A JP 2002080421A
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- shikimic acid
- acid
- organic solvent
- crystallization
- concentration
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は高純度シキミ酸の製
造方法に関する。The present invention relates to a method for producing high-purity shikimic acid.
【0002】シキミ酸は医薬中間体として重要な化合物
であり、広い用途が期待されている。[0002] Shikimic acid is an important compound as a pharmaceutical intermediate, and is expected to be widely used.
【0003】[0003]
【従来の技術】従来醗酵法によるシキミ酸の単離、精製
法としては、水溶液を加熱還流した後に、活性炭処理お
よびイオン交換樹脂ー酢酸溶離液などにより精製する方
法が知られている。(ジャーナル オブ アメリカン
ケミカル ソサイティー,121巻,1603頁、19
99年)また、活性炭カラムにより精製する方法も知ら
れている(ジャーナル オブ バイオロジカル ケミス
トリー,220巻,477頁、1956年)。2. Description of the Related Art Conventionally, as a method for isolating and purifying shikimic acid by a fermentation method, a method is known in which an aqueous solution is heated to reflux and then purified by an activated carbon treatment and an ion exchange resin-acetic acid eluent. (Journal of American
Chemical Society, 121, 1603, 19
Also, a method of purifying with an activated carbon column is known (Journal of Biological Chemistry, 220, 477, 1956).
【0004】[0004]
【発明が解決しようとする課題】しかし、前者は水溶液
を加熱還流するために多大のエネルギーを必要とし、高
価な酢酸を大量に使用するために酢酸を濃縮し、回収し
なければならず、大量のエネルギーを必要とし、工業的
な生産に適さない。後者もカラムに使用した活性炭は再
生できず工業的な生産に適さない。However, the former requires a large amount of energy for heating and refluxing the aqueous solution, and requires the acetic acid to be concentrated and recovered in order to use a large amount of expensive acetic acid. It requires energy and is not suitable for industrial production. In the latter case, the activated carbon used in the column cannot be regenerated and is not suitable for industrial production.
【0005】さらに、発酵により得られたシキミ酸を単
離する際、発酵液中に含まれるプロトカテキュ酸や没食
子酸等の有機物、リン酸基や硫酸基を含んだ化合物がシ
キミ酸と同時に析出し単離したシキミ酸は粘土状の固形
物となって実質的に生産できないことが知られている。
このような傾向は、不純物濃度が大きくなる晶析母液に
おいて特に顕著である。Further, when isolating shikimic acid obtained by fermentation, organic substances such as protocatechuic acid and gallic acid contained in the fermentation liquor, and compounds containing phosphate groups and sulfate groups are precipitated simultaneously with shikimic acid. It is known that isolated shikimic acid cannot be substantially produced as a clay-like solid.
Such a tendency is particularly remarkable in the crystallization mother liquor in which the impurity concentration becomes large.
【0006】[0006]
【課題を解決するための手段】そこで、本発明者らは、
発酵法などにより得られたシキミ酸を含む水溶液から、
高純度シキミ酸を効率よく、高収率で単離する方法を鋭
意検討した結果、本発明に到達した。Means for Solving the Problems Accordingly, the present inventors have:
From an aqueous solution containing shikimic acid obtained by fermentation, etc.,
As a result of intensive studies on a method for efficiently isolating high-purity shikimic acid in high yield, the present invention has been achieved.
【0007】すなわち、本発明は、「シキミ酸を含む水
溶液からシキミ酸を単離する晶析プロセスにおいて、晶
析母液を水と混合しない有機溶媒で洗浄した後に再晶析
することを特徴とする高純度シキミ酸の製造方法。」で
ある。That is, the present invention is characterized in that in a crystallization process for isolating shikimic acid from an aqueous solution containing shikimic acid, the crystallization mother liquor is washed with an organic solvent immiscible with water and then recrystallized. Method for producing high-purity shikimic acid. "
【0008】[0008]
【発明の実施の形態】以下、本発明を詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
【0009】本発明で使用するシキミ酸を含む水溶液
は、特に限定されない。例えば、シキミ酸を生産するこ
とのできる微生物を用いて培養された液体培養液および
固体培養物を熱水抽出した固体培養抽出水溶液などが好
ましい。液体培養液を用いる場合は菌体を除去した方が
好ましい。また、上記液体培養液を陽イオン交換樹脂、
陰イオン交換樹脂、キレート樹脂、合成吸着剤、クロマ
ト分離用樹脂、活性炭などから選ばれる少なくとも1種
のカラムに通液して得られた素通り画分、もしくはカラ
ム単体に吸着せしめた後に、脱着して得られた、シキミ
酸を含む画分も好ましい。The aqueous solution containing shikimic acid used in the present invention is not particularly limited. For example, a liquid culture solution cultured using a microorganism capable of producing shikimic acid, a solid culture extraction aqueous solution obtained by extracting a solid culture with hot water, and the like are preferable. When a liquid culture solution is used, it is preferable to remove the cells. Further, the liquid culture solution is a cation exchange resin,
After passing through at least one column selected from anion exchange resin, chelate resin, synthetic adsorbent, chromatographic separation resin, activated carbon, etc. The fraction containing shikimic acid obtained by the above method is also preferable.
【0010】また、上記精製工程の途中に脱色のために
活性炭処理を行っても良い。活性炭処理を行う溶液のp
Hは特に限定されないが、中性付近で行うのが効率的で
あり好ましい。Further, an activated carbon treatment may be performed for decolorization during the above-mentioned purification step. P of solution to be treated with activated carbon
Although H is not particularly limited, it is preferable to perform H near neutrality because it is efficient.
【0011】本発明で見られる効果は、シキミ酸を晶析
により単離した後に得られる母液においてとくに顕著で
ある。水溶液はテトラヒドロフラン、1,4−ジオキサ
ン、メチルエチルケトン等を均一溶液である量まで含ん
でいても構わない。特に、晶析時に有機溶媒を添加して
シキミ酸の溶解度を低下させる方が効率が良く、この場
合晶析母液は有機溶媒を含んだ水溶液である。本発明
は、このような水溶液についても有効である。また、有
機溶媒で洗浄した後の水層はそのまま晶析に用いても良
いし、別の発酵液と混合して晶析に用いても良い。The effect of the present invention is particularly remarkable in the mother liquor obtained after isolating shikimic acid by crystallization. The aqueous solution may contain tetrahydrofuran, 1,4-dioxane, methyl ethyl ketone and the like up to a uniform solution amount. Particularly, it is more efficient to reduce the solubility of shikimic acid by adding an organic solvent during crystallization, and in this case, the crystallization mother liquor is an aqueous solution containing an organic solvent. The present invention is also effective for such an aqueous solution. The aqueous layer washed with an organic solvent may be used for crystallization as it is, or may be mixed with another fermentation solution and used for crystallization.
【0012】本発明で、晶析母液の洗浄に使用する有機
溶媒は、水と混合しない有機溶媒であれば晶析溶媒に応
じて各種のものが用いられる。In the present invention, as the organic solvent used for washing the crystallization mother liquor, various organic solvents can be used depending on the crystallization solvent as long as they are immiscible with water.
【0013】ここで、水と混合しない、晶析母液の洗浄
に使用する有機溶媒とは、晶析溶媒と相分離さえすれば
良く、例えば、有機溶媒の具体的例として、ベンゼン、
トルエン、o−キシレン、m−キシレン、p−キシレ
ン、エチルベンゼン、メシチレン、ヘキサン、ヘプタ
ン、オクタン、ノナン、デカン、酢酸エチル、塩化メチ
ル、塩化メチレン、クロロホルム、1,2−ジクロロエ
タン、クロロベンゼン、o−ジクロロベンゼン、m−ジ
クロロベンゼン、ブロモベンゼン、ヘキサノール、オク
タノール、ジエチルエーテル、イソプロピルエーテル、
ジブチルエーテル等が挙げられる。Here, the organic solvent used for washing the crystallization mother liquor, which does not mix with water, may be any phase as long as it is separated from the crystallization solvent, and specific examples of the organic solvent include benzene,
Toluene, o-xylene, m-xylene, p-xylene, ethylbenzene, mesitylene, hexane, heptane, octane, nonane, decane, ethyl acetate, methyl chloride, methylene chloride, chloroform, 1,2-dichloroethane, chlorobenzene, o-diene Chlorobenzene, m-dichlorobenzene, bromobenzene, hexanol, octanol, diethyl ether, isopropyl ether,
Dibutyl ether and the like.
【0014】もちろん、食塩や硫酸ナトリウムなどの無
機塩を添加した状態で相分離するような有機溶媒を用い
ることもできる。無機塩の添加量は、その後の濃縮等で
結晶が析出しないようにするため相分離を起こす最少の
量が好ましい。この場合に用いる有機溶媒の具体的例と
して、ブタノール、メチルエチルケトン、メチルイソブ
チルケトン、テトラヒドロフラン、テトラヒドロピラ
ン、ジオキサン、ジメトキシエタン等が挙げられる。Of course, it is also possible to use an organic solvent which separates phases with the addition of an inorganic salt such as salt or sodium sulfate. The addition amount of the inorganic salt is preferably the minimum amount that causes phase separation in order to prevent crystals from being precipitated by subsequent concentration or the like. Specific examples of the organic solvent used in this case include butanol, methyl ethyl ketone, methyl isobutyl ketone, tetrahydrofuran, tetrahydropyran, dioxane, dimethoxyethane and the like.
【0015】好ましくは、ベンゼン、トルエン、o−キ
シレン、m−キシレン、p−キシレン、エチルベンゼ
ン、酢酸メチル、酢酸エチル、酢酸n−プロピルなどで
あり、さらに好ましくは、酢酸メチル、酢酸エチル、酢
酸n−プロピルなどである。その他、有機溶媒は単独で
ある必要はなく、混合溶媒で有っても良い。例えば、ト
ルエン−酢酸エチル等が挙げられる。Preferred are benzene, toluene, o-xylene, m-xylene, p-xylene, ethylbenzene, methyl acetate, ethyl acetate, n-propyl acetate, and more preferably methyl acetate, ethyl acetate, n-acetate. -Propyl and the like. In addition, the organic solvent does not need to be used alone, and may be a mixed solvent. For example, toluene-ethyl acetate and the like can be mentioned.
【0016】本発明で使用する有機溶媒は、20℃にお
ける水との相互溶解度が10%以下であるものが好まし
く用いられる。The organic solvent used in the present invention preferably has a mutual solubility with water at 20 ° C. of 10% or less.
【0017】本発明で用いる有機溶媒量は特に限定され
ないが、シキミ酸を含む水溶液の重量に対して通常0.
1〜5倍、本発明を特に効果的に実施するためには0.
3〜2倍が使用される。シキミ酸を含む水溶液と有機溶
媒との接触方法は任意であり、バッチ法であっても連続
法であってもよい。Although the amount of the organic solvent used in the present invention is not particularly limited, it is generally 0.1 to the weight of the aqueous solution containing shikimic acid.
1 to 5 times, 0.1 to achieve the present invention particularly effectively.
Three to two times are used. The method of contacting the aqueous solution containing shikimic acid with the organic solvent is arbitrary, and may be a batch method or a continuous method.
【0018】抽出を効率的に行うために、および釜効率
を良くするためにシキミ酸を含む水溶液は濃縮するのが
好ましい。濃縮の程度は、無機塩およびシキミ酸が結晶
として析出しない程度が好ましい。水溶液中のシキミ酸
濃度、塩濃度によって濃縮の程度は変わるが、重量基準
で1/4以上まで濃縮するのが好ましく、1/10以上まで濃
縮するのがより好ましい。The aqueous solution containing shikimic acid is preferably concentrated for efficient extraction and for improving the pot efficiency. The concentration is preferably such that the inorganic salt and shikimic acid do not precipitate as crystals. Although the degree of concentration varies depending on the concentration of shikimic acid and salt in the aqueous solution, the concentration is preferably reduced to 1/4 or more, more preferably reduced to 1/10 or more on a weight basis.
【0019】本発明の精製方法は、シキミ酸を含む水溶
液に、不純物としてプロトカテキュ酸および/または没
食子酸が含まれている場合の精製に特に有効である。The purification method of the present invention is particularly effective for purification when an aqueous solution containing shikimic acid contains protocatechuic acid and / or gallic acid as impurities.
【0020】以上のようにしてシキミ酸を含む水溶液か
ら不純物が選択的に抽出され、高純度のシキミ酸を含む
水溶液が得られる。この水溶液から通常の方法により高
純度のシキミ酸を単離することができる。有機溶媒で洗
浄後、高純度のシキミ酸を回収する方法は、特に限定さ
れるものではない。例えば、シキミ酸を含む水溶液を適
当な濃度まで濃縮後、晶析すると高純度のシキミ酸が析
出する。濃縮の程度は、水溶液中のシキミ酸濃度によっ
て変わるが、重量基準で1/4以上まで濃縮するのが好ま
しく、1/10以上まで濃縮するのがより好ましい。晶析の
際、濃縮液をそのまま冷却しても良いし、また有機溶媒
を必要量添加してから冷却しても良い。濃縮方法は常圧
濃縮、減圧濃縮のいずれでもよいが、濃縮時の液温は通
常、用いる有機溶媒の沸点以下で行われる。かかる液温
とするとシキミ酸が分解する恐れがない。晶析により析
出した結晶を遠心分離などの通常の固液分離の方法によ
って単離すると高純度のシキミ酸を得ることができる。As described above, impurities are selectively extracted from the aqueous solution containing shikimic acid to obtain an aqueous solution containing shikimic acid with high purity. High-purity shikimic acid can be isolated from this aqueous solution by a usual method. The method of recovering shikimic acid of high purity after washing with an organic solvent is not particularly limited. For example, when an aqueous solution containing shikimic acid is concentrated to an appropriate concentration and then crystallized, high-purity shikimic acid is precipitated. The degree of concentration varies depending on the concentration of shikimic acid in the aqueous solution, but is preferably reduced to 1/4 or more, more preferably reduced to 1/10 or more on a weight basis. At the time of crystallization, the concentrated solution may be cooled as it is, or may be cooled after adding a necessary amount of an organic solvent. The concentration method may be either normal pressure concentration or reduced pressure concentration, but the liquid temperature during concentration is usually lower than the boiling point of the organic solvent used. With such a liquid temperature, there is no possibility that shikimic acid is decomposed. High purity shikimic acid can be obtained by isolating the crystals precipitated by crystallization by a usual solid-liquid separation method such as centrifugation.
【0021】濃縮工程でシキミ酸から分離された有機溶
媒は蒸留後にリサイクルすることが好ましい。The organic solvent separated from shikimic acid in the concentration step is preferably recycled after distillation.
【0022】次いで、濃縮工程で濃縮されたシキミ酸を
含む有機相を、晶析分離してシキミ酸を単離する。シキ
ミ酸を含む有機相からシキミ酸を単離する方法は特に限
定されない。例えば、濃縮液をそのまま冷却してシキミ
酸を晶析した後、固液分離するか、濃縮液に水と共沸す
る溶媒を加え、濃縮してから冷却晶析した後、固液分離
する方法などが挙げられる。Next, the organic phase containing shikimic acid concentrated in the concentration step is separated by crystallization to isolate shikimic acid. The method for isolating shikimic acid from the organic phase containing shikimic acid is not particularly limited. For example, a method of crystallizing shikimic acid by cooling the concentrated liquid as it is, followed by solid-liquid separation, or a method of adding a solvent azeotropic with water to the concentrated liquid, concentrating the liquid, cooling and crystallizing, and then performing solid-liquid separation. And the like.
【0023】かくして単離したシキミ酸は既知の晶析精
製方法で、つまり、有機溶媒で均一溶液とした後、その
均一液を冷却したり、熱時ろ過したろ液を冷却したり、
あるいは濃縮したり、濃縮後に有機溶媒を加えてシキミ
酸を結晶化させ、高純度品にできる。The shikimic acid thus isolated can be purified by a known crystallization purification method, that is, after forming a homogeneous solution with an organic solvent, cooling the homogeneous solution, or cooling the hot-filtrated filtrate,
Alternatively, the solution can be concentrated or, after concentration, an organic solvent can be added to crystallize shikimic acid to obtain a highly purified product.
【0024】抽出工程の抽出槽は特に限定されないが、
一般の抽出槽および抽出塔あるいは培養槽が使用され
る。その抽出槽は撹拌することが好ましい。回転数は槽
の型によるが100〜1,000rpm が好ましい。ま
た、その抽出槽の温度は特に限定されないが、0〜50
℃で管理されるのが好ましい。The extraction tank in the extraction step is not particularly limited.
A general extraction tank and an extraction tower or a culture tank are used. The extraction tank is preferably stirred. The rotation speed depends on the type of the tank, but is preferably 100 to 1,000 rpm. Further, the temperature of the extraction tank is not particularly limited, but may be 0 to 50.
It is preferred that the temperature be controlled at ° C.
【0025】[0025]
【実施例】以下実施例によって本発明を具体的に示す。The present invention will be specifically described below with reference to examples.
【0026】菌株BPR-3(FERM BP-6723)を、培地(バク
トトリプトン 10g/L、バクトイーストエキストラクト
5g/L、NaCl 5g/LをNaOHでpH7.5に調製)で30℃2
4時間振とうして前培養した後、あらかじめ115℃1
0分上記滅菌した培地(グルコース 50g/L、リン酸1
カリウム 1g/L、硫酸アンモニウム 25g/L、硫酸マグ
ネシウム7水和物 0.4g/L、Lーチロシン 0.1g/L、L
ーフェニルアラニン 0.1g/L、Lートリプトファン 0.
1g/L、p−アミノ安息香酸 1mg/L、硫酸第1鉄7水和
物 9.9g/L、硫酸マンガン4水和物 7.2mg/L、塩化亜
鉛 25mg/L、硫酸銅水和物 0.5mg/L、炭酸カルシウム
20g/L)3Lを含む30L溶フラスコに植え継ぎ、1
80rpm 、振幅30cmの条件下で144時間培養した。The strain BPR-3 (FERM BP-6723) was added to a medium (Bactotryptone 10 g / L, Bacto yeast extract).
5g / L, NaCl 5g / L adjusted to pH 7.5 with NaOH) at 30 ° C
After pre-incubation by shaking for 4 hours,
0 minutes The above sterilized medium (glucose 50g / L, phosphoric acid 1
Potassium 1g / L, Ammonium sulfate 25g / L, Magnesium sulfate heptahydrate 0.4g / L, L-tyrosine 0.1g / L, L
-Phenylalanine 0.1 g / L, L-tryptophan 0.
1g / L, p-aminobenzoic acid 1mg / L, ferrous sulfate heptahydrate 9.9g / L, manganese sulfate tetrahydrate 7.2mg / L, zinc chloride 25mg / L, copper sulfate hydrate 0.5mg / L, calcium carbonate
20g / L) Inoculate in a 30L dissolution flask containing 3L, 1
The cells were cultured for 144 hours under the conditions of 80 rpm and an amplitude of 30 cm.
【0027】培養終了後、菌体、炭酸カルシウムを除去
したろ液中のシキミ酸濃度をHPLC法(カラム:島津SCR-
101H、移動相:0.1Mリン酸 1 mL/min.、検出:254 n
m)で定量したところ、7g/Lのシキミ酸が蓄積してい
た。After completion of the culture, the concentration of shikimic acid in the filtrate from which the cells and calcium carbonate were removed was determined by an HPLC method (column: Shimadzu SCR-
101H, mobile phase: 0.1 M phosphoric acid 1 mL / min., Detection: 254 n
As determined by m), 7 g / L of shikimic acid was accumulated.
【0028】その培養液の上清をカチオン交換樹脂リバ
チットS100(ロームアンドハース社製)に通液し、
その素通り画分を集め、さらにアニオン交換樹脂ダイヤ
イオンWA30(三菱化学(株)製)に通液し、0.1N NaOH
で脱着し、シキミ酸を含有する画分を集めた。減圧下で
重量基準で約1/2になるまで濃縮した。その後、さら
にカチオン交換樹脂リバチットS100(ロームアンド
ハース社製)に通液し、減圧下で濃縮した(HPLC分
析値:シキミ酸濃度34.6wt%)。The supernatant of the culture solution was passed through a cation exchange resin Livatit S100 (manufactured by Rohm and Haas),
The flow-through fractions were collected, passed through an anion exchange resin Diaion WA30 (manufactured by Mitsubishi Chemical Corporation), and subjected to 0.1N NaOH
And the fractions containing shikimic acid were collected. The solution was concentrated under reduced pressure to about 1/2 by weight. Thereafter, the solution was further passed through a cation exchange resin Livatit S100 (manufactured by Rohm and Haas), and concentrated under reduced pressure (HPLC analysis value: shikimic acid concentration: 34.6 wt%).
【0029】次に、2L3つ口フラスコに、この濃縮液
1312.4gを取り、減圧下で水を留去した。スラリ
ーの粘度が上昇し攪拌操作性が悪化し始めたところで濃
縮を終了した(シキミ酸濃度51.8%)。素早く90
8.2gのテトラヒドロフラン(以下、THFと略記す
る)を加え、20℃まで冷却、熟成した。これを固液分
離(365.5gのTHFリンス使用)して193gの
含液結晶と母液約2Lを得た(以下、この操作を1晶析
と記載する)。Next, 1312.4 g of this concentrated solution was placed in a 2 L three-necked flask, and water was distilled off under reduced pressure. Concentration was terminated when the viscosity of the slurry increased and the stirring operability began to deteriorate (shikimic acid concentration: 51.8%). Quickly 90
8.2 g of tetrahydrofuran (hereinafter abbreviated as THF) was added, and the mixture was cooled to 20 ° C and aged. This was subjected to solid-liquid separation (using 365.5 g of THF rinse) to obtain 193 g of liquid-containing crystals and about 2 L of mother liquor (hereinafter, this operation is referred to as one crystallization).
【0030】実施例1 母液500g(シキミ酸63.7g)を温度計、コンデ
ンサー、攪拌器の付いた1L4つ口フラスコに取り、酢
酸エチル300gを加え10分間攪拌した。下層を温度
計、コンデンサー、攪拌器の付いた1L4つ口フラスコ
に取り、一晩静置後(既に結晶が少量析出していた)、
減圧下水を留去し濃縮した。スラリー粘度の上昇により
濃縮を終了した時点はシキミ酸濃度51.0%であっ
た。上記と同様にTHFを添加後、晶析、固液分離、乾
燥してシキミ酸の白色結晶26.1gを得た。仕込みシ
キミ酸基準のシキミ酸単離収率は40.9%、純度9
4.5%であった。Example 1 500 g of mother liquor (63.7 g of shikimic acid) was placed in a 1 L four-necked flask equipped with a thermometer, a condenser and a stirrer, and 300 g of ethyl acetate was added thereto, followed by stirring for 10 minutes. The lower layer was placed in a 1 L four-necked flask equipped with a thermometer, a condenser, and a stirrer, and allowed to stand overnight (a small amount of crystals had already precipitated).
The water was distilled off under reduced pressure and concentrated. The concentration of shikimic acid was 51.0% when the concentration was completed due to an increase in slurry viscosity. After adding THF in the same manner as described above, crystallization, solid-liquid separation and drying were performed to obtain 26.1 g of shikimic acid white crystals. The shikimic acid isolation yield based on the charged shikimic acid was 40.9%, purity 9
It was 4.5%.
【0031】実施例2 母液500g(シキミ酸63.7g)を温度計、コンデ
ンサー、攪拌器の付いた1L4つ口フラスコに取り、酢
酸エチル300gを加え10分間攪拌した。下層を温度
計、コンデンサー、攪拌器の付いた1L4つ口フラスコ
に取り、すぐに比較例と同様に濃縮を開始した。スラリ
ー粘度の上昇により濃縮を終了した時点はシキミ酸濃度
52.5%であった。上記と同様にTHFを添加後、晶
析、固液分離、乾燥してシキミ酸の白色結晶30.6g
を得た。仕込みシキミ酸基準のシキミ酸単離収率は4
8.0%、純度95.9%であった。Example 2 500 g of mother liquor (63.7 g of shikimic acid) was placed in a 1 L four-necked flask equipped with a thermometer, a condenser and a stirrer, 300 g of ethyl acetate was added, and the mixture was stirred for 10 minutes. The lower layer was placed in a 1-L four-necked flask equipped with a thermometer, a condenser, and a stirrer, and concentration was immediately started in the same manner as in the comparative example. The concentration of shikimic acid was 52.5% when the concentration was completed due to the increase in slurry viscosity. After adding THF in the same manner as above, crystallization, solid-liquid separation, and drying were performed to obtain 30.6 g of white crystals of shikimic acid.
I got The shikimic acid isolation yield based on the charged shikimic acid is 4
It was 8.0% and the purity was 95.9%.
【0032】比較例 得られた母液500g(シキミ酸63.7g)を温度
計、コンデンサー、攪拌器の付いた1L4つ口フラスコ
に取り、減圧下濃縮して水を留去した。濃縮途中、シキ
ミ酸濃度が45.1%となった時点でスラリー粘度が上
昇し、系全体が粘凋となって攪拌できなくなった。すぐ
に濃縮液と同重量のTHFを添加し、上記1晶析と同様
に処理してシキミ酸結晶35.0gを得た。仕込みシキ
ミ酸基準のシキミ酸単離収率は55.0%、純度83.
8%であり、粘土状であった。Comparative Example 500 g of the obtained mother liquor (63.7 g of shikimic acid) was placed in a 1 L four-necked flask equipped with a thermometer, a condenser and a stirrer, and concentrated under reduced pressure to distill off water. During the concentration, when the shikimic acid concentration became 45.1%, the viscosity of the slurry increased, and the whole system became viscous and could not be stirred. Immediately, THF of the same weight as the concentrated liquid was added, and the same treatment as in the above-mentioned crystallization was carried out to obtain 35.0 g of shikimic acid crystals. The shikimic acid isolation yield based on the charged shikimic acid was 55.0%, and the purity was 83.0%.
8%, clay-like.
【0033】[0033]
【発明の効果】本発明によれば、水溶液からシキミ酸を
単離する晶析プロセスにおいて、晶析母液を水と混合し
ない有機溶媒で洗浄した後、再晶析することで晶析母液
から高純度のシキミ酸を単離することが出来る。According to the present invention, in a crystallization process for isolating shikimic acid from an aqueous solution, the crystallization mother liquor is washed with an organic solvent immiscible with water, and then recrystallized to obtain a high yield from the crystallization mother liquor. Pure shikimic acid can be isolated.
Claims (3)
する晶析プロセスにおいて、晶析母液を水と混合しない
有機溶媒で洗浄した後に再晶析することを特徴とする高
純度シキミ酸の製造方法。In a crystallization process for isolating shikimic acid from an aqueous solution containing shikimic acid, the crystallization mother liquor is washed with an organic solvent immiscible with water and then recrystallized. Production method.
解度が10%以下であることを特徴とする請求項1記載
の高純度シキミ酸の製造方法。2. The method for producing high-purity shikimic acid according to claim 1, wherein the mutual solubility of the organic solvent with water at 20 ° C. is 10% or less.
酸および/または没食子酸を含むことを特徴とする請求
項1または2記載の高純度シキミ酸の製造方法。3. The method according to claim 1, wherein the aqueous solution containing shikimic acid contains protocatechuic acid and / or gallic acid.
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Publication Number | Publication Date |
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JP2002080421A true JP2002080421A (en) | 2002-03-19 |
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ID=18755385
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100386301C (en) * | 2006-04-12 | 2008-05-07 | 刘润民 | Convenient method for producing shikimic acid |
-
2000
- 2000-09-05 JP JP2000268629A patent/JP2002080421A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100386301C (en) * | 2006-04-12 | 2008-05-07 | 刘润民 | Convenient method for producing shikimic acid |
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