JP2002080212A - Method of generating onion fullerene - Google Patents
Method of generating onion fullereneInfo
- Publication number
- JP2002080212A JP2002080212A JP2000271822A JP2000271822A JP2002080212A JP 2002080212 A JP2002080212 A JP 2002080212A JP 2000271822 A JP2000271822 A JP 2000271822A JP 2000271822 A JP2000271822 A JP 2000271822A JP 2002080212 A JP2002080212 A JP 2002080212A
- Authority
- JP
- Japan
- Prior art keywords
- onion
- vacuum chamber
- fullerene
- gas
- onion fullerene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、オニオンフラーレ
ンの生成方法に関する。ここで、オニオンフラーレンと
は、タマネギのような多層構造を有するオニオン構造フ
ラーレンを意味する。このオニオンフラーレンは、潤滑
剤として、またはオニオンフラーレンに金属を配合した
磁性材料などとして利用され得る。[0001] The present invention relates to a method for producing onion fullerene. Here, the onion fullerene means an onion structure fullerene having a multilayer structure such as onion. The onion fullerene can be used as a lubricant or as a magnetic material in which a metal is mixed with onion fullerene.
【０００２】[0002]
【従来の技術】近年、オニオンフラーレンは、通常の雰
囲気以外に、宇宙空間のような真空雰囲気や、高温環境
などでも有効である潤滑剤としての利用が期待されてい
る。従来、オニオンフラーレンは、図１に示されるよう
な装置を用いて生成されていた。2. Description of the Related Art In recent years, onion fullerene has been expected to be used as a lubricant which is effective not only in a normal atmosphere but also in a vacuum atmosphere such as space or a high temperature environment. Conventionally, onion fullerene has been produced using an apparatus as shown in FIG.
【０００３】図１に示す従来のオニオンフラーレン生成
装置は、真空槽１と、該真空槽内に熱絶縁されて取り付
けられたルツボ２と、該ルツボの外周囲に配置された通
常の抵抗加熱装置３とを備えている。ルツボ２内にはオ
ニオンフラレーンの原料４が充填されて、加熱される。
この抵抗加熱装置３の抵抗体（発熱体）は高融点金属や
グラファイトなどで製作されている。抵抗加熱装置３の
外側周辺にはリフレクター５が配置され、加熱装置から
の放射光をルツボ方向へ反射できるように構成されてい
る。真空槽１には、仕切バルブ６を介して油回転ポンプ
７が取り付けられており、また、真空計８も取り付けら
れている。また、真空槽１には、ガス導入系９〜１３
が、上流に向かって、仕切バルブ９、ガス流量調節器
（以下、流量調節器と称す）１０、仕切バルブ１１、圧
力調節器１２、ガスボンベ１３の順序で取り付けられて
いる。このガスボンベには、原料の加熱中に流す雰囲気
ガス（例えば、ＡｒやＨｅ）が充填されている。さらに
また、真空槽１には、バルブ１４が取り付けられ、この
バルブは図中には示されていないが排気ダクトに接続さ
れており、大気圧よりも減圧された状態にある。A conventional onion fullerene generator shown in FIG. 1 is composed of a vacuum chamber 1, a crucible 2 which is thermally insulated and mounted in the vacuum chamber, and a normal resistance heating apparatus arranged around the crucible. 3 is provided. The crucible 2 is filled with a raw material 4 of onion fullerene and heated.
The resistor (heating element) of the resistance heating device 3 is made of a high melting point metal, graphite, or the like. A reflector 5 is arranged around the outside of the resistance heating device 3, and is configured to be able to reflect light emitted from the heating device in a crucible direction. An oil rotary pump 7 is attached to the vacuum tank 1 via a partition valve 6, and a vacuum gauge 8 is also attached. The vacuum chamber 1 has a gas introduction system 9 to 13.
Are installed in order of a partition valve 9, a gas flow controller (hereinafter, referred to as a flow controller) 10, a partition valve 11, a pressure controller 12, and a gas cylinder 13 toward the upstream. This gas cylinder is filled with an atmosphere gas (eg, Ar or He) flowing during heating of the raw material. Furthermore, a valve 14 is attached to the vacuum chamber 1, and this valve is connected to an exhaust duct (not shown in the figure), and is in a state where the pressure is reduced below the atmospheric pressure.
【０００４】従来のオニオンフラーレンの生成方法は、
上記生成装置を用いて、次のように行われる。まず、ル
ツボ２内に、原料としてクラスタダイヤモンド（粒径：
５〜１０ｎｍ）を充填する。次いで、真空槽を封止し、
仕切バルブ６を開にして、油回転ポンプ７を作動させ、
真空計８をモニターしながら真空槽内の圧力を１０-2Ｔ
ｏｒｒ（約１．３Ｐａ）台に達するようにする。ここ
で、一旦、仕切バルブ６を閉じて、抵抗加熱装置３に電
力を投入し、約１５００℃まで加熱する。この加熱中
に、好ましくはガス導入系より雰囲気ガスを導入する。
すなわち、雰囲気ガスが充填されたボンベ（Ａｒガス）
１３の元栓を開けて、圧力調整器１２によりＡｒガス圧
を大気圧よりやや高めに調節し、仕切バルブ１１、９を
開けて、流量調節器１０によりガス流量を調節し、真空
槽１内にＡｒガスを導入する。導入されたガスが真空槽
１内に充満した時点で、バルブ１４を開けて排気ダクト
へガスを引き込ませ、真空槽内の圧力が大気圧よりやや
高く維持できるようにする。この状態で２時間程度加熱
した後、抵抗加熱装置３の電力を落として真空槽１内を
室温に戻し、真空槽を開放する。ルツボ２内に粒径約１
０ｎｍのオニオンフラーレンが生成する。[0004] A conventional method for producing onion fullerene is as follows.
It is performed as follows using the above-described generation device. First, cluster diamond (particle diameter:
5-10 nm). Next, the vacuum chamber is sealed,
Open the gate valve 6, operate the oil rotary pump 7,
While monitoring the vacuum gauge 8, adjust the pressure in the vacuum chamber to 10 -2 T.
orr (about 1.3 Pa). Here, once the partition valve 6 is closed, power is supplied to the resistance heating device 3 to heat the resistance heating device 3 to about 1500 ° C. During this heating, an atmospheric gas is preferably introduced from a gas introduction system.
That is, a cylinder (Ar gas) filled with an atmospheric gas
13 is opened, the Ar gas pressure is adjusted slightly higher than the atmospheric pressure by the pressure adjuster 12, the partition valves 11 and 9 are opened, the gas flow rate is adjusted by the flow rate adjuster 10, and the Ar gas pressure is adjusted in the vacuum chamber 1. Ar gas is introduced. When the introduced gas is filled in the vacuum chamber 1, the valve 14 is opened to draw the gas into the exhaust duct, so that the pressure in the vacuum chamber can be maintained slightly higher than the atmospheric pressure. After heating for about 2 hours in this state, the power of the resistance heating device 3 is reduced to return the inside of the vacuum chamber 1 to room temperature, and the vacuum chamber is opened. About 1 particle size in crucible 2
0 nm onion fullerene is produced.
【０００５】[0005]
【発明が解決しようとする課題】従来のオニオンフラー
レン生成方法では粒径が１０ｎｍ程度の小さなものしか
得られず、これを潤滑剤として使用すると、Ｓｉ基板の
ような鏡面を有するものを対象とする場合には、摩擦係
数は下がるが、金属のようなミクロにみて凹凸があるよ
うなものを対象とする場合には、粒径が小さすぎるため
に、金属同士の表面の凹凸面での面接触が支配的になっ
てしまい、潤滑剤としての作用が低減するという問題が
生じる。また、従来の生成方法は、クラスタダイヤモン
ド（２万円／ｇ）を材料として使用するので、産業界に
流通させるにはコスト的に高くなるという問題もあっ
た。さらに、生成時間が２時間という長時間を要するの
で、生産コストが嵩むという問題もあった。The conventional method for producing onion fullerenes can provide only a small onion fullerene having a particle size of about 10 nm. If this is used as a lubricant, it is intended for a substrate having a mirror surface such as a Si substrate. In this case, the coefficient of friction is reduced, but if the object is microscopically uneven such as metal, the surface contact between the metal surfaces is uneven due to the particle size being too small. Becomes dominant, and the effect as a lubricant decreases. In addition, since the conventional production method uses cluster diamond (20,000 yen / g) as a material, there is also a problem that it is costly to distribute it to industry. In addition, there is a problem that the production cost increases because the generation time requires a long time of 2 hours.
【０００６】本発明の課題は、上記従来技術の問題点に
鑑み、短い生成時間で、安いコストで、優れた摩擦係数
を有する粒径の大きなオニオンフラーレンを生成する方
法を提供することにある。An object of the present invention is to provide a method for producing onion fullerene having a large particle size and having an excellent coefficient of friction at a short production time, at a low cost, in view of the above-mentioned problems of the prior art.
【０００７】[0007]
【課題を解決するための手段】本発明者らは、原料とし
て、クラスタダイヤモンドの代わりに所定の粒径を有す
るダイヤモンド微粉末を採用し、加熱機構として抵抗加
熱の代わりに赤外線ランプによる加熱を使用することに
より、従来技術の問題を解決し、本発明を完成するに至
った。Means for Solving the Problems The present inventors employ diamond fine powder having a predetermined particle size instead of cluster diamond as a raw material, and use heating by an infrared lamp instead of resistance heating as a heating mechanism. By doing so, the problems of the prior art were solved, and the present invention was completed.
【０００８】本発明のオニオンフラーレン生成方法は、
真空槽外に赤外線ランプが取り付けられ、該真空槽内に
黒体のグラファイト製ルツボが配置されたオニオンフラ
ーレン生成装置を用いて、該グラファイト製ルツボ内に
ダイヤモンド微粉末を充填し、該ダイヤモンド微粉末を
該赤外線ランプで加熱してオニオンフラーレンを得るこ
とからなる。粒径の大きなオニオンフラーレンを生成す
るためには、前記ダイヤモンド微粉末として粒径の大き
なものを用いればよい。潤滑剤として使用する場合、金
属のようなミクロにみて凹凸があるようなものを対象と
する時には、凹部の寸法よりも大きな粒径を有するオニ
オンフラーレンを形成することが必要である。金属同士
の凹凸面での面接触抵抗または金属と別の材料との面接
触抵抗が生じないようにすることができる範囲内の粒径
を有するオニオンフラーレンを生成することにより、潤
滑剤としての作用を効果的に発揮することができる。例
えば、５ｎｍ以上の粒径を有するダイヤモンド微粉末
（例えば、砥粒用ダイヤモンド）を使用することが好ま
しい。粒径が５ｎｍ未満のダイヤモンド微粉末から生成
されたオニオンフラーレンでは、金属面同士の潤滑性能
または金属と他の材料との間の潤滑性能が劣る。上限に
ついては、オニオン構造が形成され得る粒径を有するダ
イヤモンド微粉末を使用すればよく、特に制限されるわ
けではないが、例えば、好ましくは１００ｎｍ程度のダ
イヤモンド微粉末を用いれば、満足すべき潤滑性能を有
するオニオンフラーレンが得られる。[0008] The onion fullerene producing method of the present invention comprises:
Using an onion fullerene generator in which an infrared lamp is attached outside the vacuum chamber and a black body graphite crucible is arranged in the vacuum chamber, the graphite fine powder is filled in the graphite crucible, and the diamond fine powder is filled. Is heated by the infrared lamp to obtain onion fullerene. In order to generate onion fullerene having a large particle size, a diamond particle having a large particle size may be used as the diamond fine powder. When used as a lubricant, it is necessary to form an onion fullerene having a particle size larger than the size of the concave portion when targeting a microscopic material such as metal having irregularities. It acts as a lubricant by producing onion fullerene having a particle size within a range that can prevent surface contact resistance between metal irregularities or surface contact resistance between metal and another material from occurring. Can be effectively exhibited. For example, it is preferable to use diamond fine powder having a particle size of 5 nm or more (for example, diamond for abrasive grains). Onion fullerenes produced from diamond fine powder having a particle size of less than 5 nm have poor lubrication performance between metal surfaces or between a metal and another material. The upper limit may be a fine diamond powder having a particle size capable of forming an onion structure, and is not particularly limited. For example, if a fine diamond powder of preferably about 100 nm is used, satisfactory lubrication may be achieved. An onion fullerene having high performance is obtained.
【０００９】また、前記ダイヤモンド微粉末を加熱する
時に、雰囲気ガスとしてＡｒ、Ｈｅなどの不活性ガスを
流しながら加熱することが好ましい。というのは、オニ
オンフラーレンは加熱雰囲気中の残留酸素などと反応し
易いからである。さらに、前記加熱温度は１７００℃以
上であることが好ましい。温度が１７００℃未満である
とオニオンフラーレンの生成時間が長くかかり過ぎ、生
成コストが高くなるという問題がある。上限温度につい
ては、用いるオニオンフラーレン生成装置の材質、赤外
線ランプなどによる加熱性能に応じて適宜設定すること
ができる。[0009] When heating the diamond fine powder, it is preferable to heat while flowing an inert gas such as Ar or He as an atmosphere gas. This is because onion fullerene easily reacts with residual oxygen in the heating atmosphere. Further, the heating temperature is preferably 1700 ° C. or higher. When the temperature is lower than 1700 ° C., there is a problem that the generation time of onion fullerene is too long and the generation cost is increased. The upper limit temperature can be appropriately set according to the material of the onion fullerene generator used and the heating performance of an infrared lamp or the like.
【００１０】上記したように、例えば砥粒用ダイヤモン
ドを使用することにより、粒径の大きなオニオンフラー
レンを生成することができるので、このフラーレンを使
用することで金属同士の面の接触抵抗または金属と他の
材料との間の接触抵抗を大幅に下げることが可能であ
る。また、赤外線ランプを使用することで、上限温度と
して、例えば、１８００℃程度の高温まで短時間で加熱
することができるため、生成時間を短縮させることがで
きると共に、生成コストも安くなる。As described above, for example, onion fullerenes having a large particle size can be produced by using diamond for abrasive grains. It is possible to greatly reduce the contact resistance with other materials. In addition, by using an infrared lamp, heating can be performed in a short time to a high temperature of, for example, about 1800 ° C. as an upper limit temperature, so that the generation time can be shortened and the generation cost is reduced.
【００１１】[0011]
【発明の実施の形態】以下、本発明の実施の形態とし
て、本発明の実施例で用いるオニオンフラーレン生成装
置を、図２を参照して説明する。図中、図１と同じ構成
部品には同じ符号を付してある。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, as an embodiment of the present invention, an onion fullerene generator used in an embodiment of the present invention will be described with reference to FIG. In the figure, the same components as those in FIG. 1 are denoted by the same reference numerals.
【００１２】本発明のオニオンフラーレン生成方法を実
施するために用いる生成装置は、図２にその模式的構成
を示すように、真空槽１と、該真空槽内に熱絶縁されて
取り付けられたルツボ２と、該ルツボの外周囲であっ
て、該真空槽外に、真空槽の側壁に設けられた石英窓な
どを隔てて配置された加熱用赤外線ランプ３'とを備え
ている。ルツボ２内にはオニオンフラレーンの原料４が
充填されて、加熱される。この赤外線ランプ３'の外側
周辺にはリフレクター５が配置され、赤外線ランプから
の放射光をルツボ方向へ反射できるように構成されてい
る。赤外線ランプとリフレクタとを組み合わせたもの
は、ゴールドイメージ炉として真空理工（株）より市販
されている。この赤外線ランプによる加熱方法として
は、楕円体内部の一方の焦点に赤外線ランプを置き、も
う一方の焦点に原料を置き、集光加熱するように構成さ
れているものを用いることが好ましい。真空槽１には、
仕切バルブ６を介して油回転ポンプ７が取り付けられて
おり、また、真空計８も取り付けられている。真空計８
は、上記のように真空槽１に直接、単独で接続されてい
てもよいし、仕切バルブ６と真空槽１との間に設けられ
ていてもよい。真空槽１には、ガス導入系９〜１３が、
上流に向かって、仕切バルブ９、ガス流量調節器１０、
仕切バルブ１１、圧力調節器１２、ガスボンベ１３の順
序で取り付けられている。このガスボンベには、原料の
加熱中に流す雰囲気ガス（例えば、ＡｒやＨｅなどの不
活性ガス）が充填されている。さらに、真空槽１には、
バルブ１４が取り付けられ、このバルブは図中には示さ
れていないが排気ダクトに接続されており、大気圧より
も減圧された状態にある。As shown in FIG. 2, a generating apparatus used to carry out the onion fullerene generating method of the present invention has a vacuum chamber 1 and a crucible heat-insulated in the vacuum chamber. And a heating infrared lamp 3 ′ which is arranged around the crucible and outside the vacuum chamber and separated by a quartz window or the like provided on the side wall of the vacuum chamber. The crucible 2 is filled with a raw material 4 of onion fullerene and heated. A reflector 5 is arranged around the outside of the infrared lamp 3 'so that the light emitted from the infrared lamp can be reflected in the crucible direction. A combination of an infrared lamp and a reflector is commercially available from Vacuum Riko Co., Ltd. as a gold image furnace. As a heating method using this infrared lamp, it is preferable to use a method in which an infrared lamp is placed at one focal point inside the ellipsoid, a raw material is placed at the other focal point, and condensing heating is performed. In the vacuum chamber 1,
An oil rotary pump 7 is mounted via a partition valve 6, and a vacuum gauge 8 is also mounted. Vacuum gauge 8
May be directly and independently connected to the vacuum chamber 1 as described above, or may be provided between the partition valve 6 and the vacuum chamber 1. In the vacuum chamber 1, gas introduction systems 9 to 13 are provided.
Upstream, gate valve 9, gas flow controller 10,
The partition valve 11, the pressure regulator 12, and the gas cylinder 13 are installed in this order. This gas cylinder is filled with an atmosphere gas (for example, an inert gas such as Ar or He) flowing during heating of the raw material. Furthermore, in the vacuum chamber 1,
A valve 14 is mounted, and this valve is connected to an exhaust duct (not shown), and is in a state where the pressure is reduced below the atmospheric pressure.
【００１３】[0013]
【実施例】本発明のオニオンフラーレン生成方法は、図
２に示す生成装置を用いて、以下のようにして行われ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS The onion fullerene producing method of the present invention is carried out as follows using a producing apparatus shown in FIG.
【００１４】まず、ルツボ２内に、原料として市販の砥
粒用ダイヤモンド（デ・ビアス・インダストリアル社
製、商品名：Micron+MDA、粒径：０．１μｍ以下）を充
填した。次いで、真空槽１を封止し、仕切バルブ６を開
にして、油回転ポンプ７を作動させ、真空計８をモニタ
ーしながら真空槽内の圧力を１０-2Ｔｏｒｒ（約１．３
Ｐａ）台に達するようにした。ここで、一旦、仕切バル
ブ６を閉じて、赤外線ランプ３に電力を投入し、約１８
００℃まで加熱した。この加熱中に、ガス導入系より雰
囲気ガスを導入した。すなわち、雰囲気ガスが充填され
たボンベ（Ａｒガス）１３の元栓を開けて、圧力調整器
１２によりＡｒガス圧を大気圧よりやや高めに調節し、
仕切バルブ１１、９を開けて、流量調節器１０によりガ
ス流量を調節し、真空槽１内にＡｒガスを導入した。導
入されたガスが真空槽１内に充満した時点で、バルブ１
４を開けて排気ダクトへガスを引き込ませ、真空槽内の
圧力が大気圧よりやや高く（例えば、約１．５×１０5
Ｐａ）維持できるようにした。この状態で１分程度加熱
した後、赤外線ランプの電力を落として真空槽１内を室
温に戻し、真空槽を開放した。ルツボ２内に粒径約１０
０ｎｍのオニオンフラーレンが生成していた。First, the crucible 2 was filled with commercially available diamond for abrasive grains (trade name: Micron + MDA, particle size: 0.1 μm or less, manufactured by De Beers Industrial Co., Ltd.) as a raw material. Next, the vacuum chamber 1 is sealed, the partition valve 6 is opened, the oil rotary pump 7 is operated, and the pressure in the vacuum chamber is increased to 10 -2 Torr (about 1.3) while monitoring the vacuum gauge 8.
Pa). Here, once the partition valve 6 is closed, power is applied to the infrared lamp 3 and the
Heated to 00 ° C. During this heating, an atmosphere gas was introduced from the gas introduction system. That is, the main valve of the cylinder (Ar gas) 13 filled with the atmosphere gas is opened, and the Ar gas pressure is adjusted to slightly higher than the atmospheric pressure by the pressure regulator 12,
The partition valves 11 and 9 were opened, the gas flow was adjusted by the flow controller 10, and Ar gas was introduced into the vacuum chamber 1. When the introduced gas fills the vacuum chamber 1, the valve 1
4, the gas is drawn into the exhaust duct, and the pressure in the vacuum chamber is slightly higher than the atmospheric pressure (for example, about 1.5 × 10 5
Pa) It was made possible to maintain. After heating for about 1 minute in this state, the power of the infrared lamp was reduced, the inside of the vacuum chamber 1 was returned to room temperature, and the vacuum chamber was opened. Particle size about 10 in crucible 2
Onion fullerene of 0 nm was produced.
【００１５】このようにして得られたオニオンフラーレ
ンを用いて、ボール・オン・ディスク式摩擦試験装置で
潤滑特性を検討した。この際、ディスクにはシリコン基
板、ボールには３．２ｍｍ径のベアリング鋼球を用い、
ディスク上に生成オニオンフラーレン１０ｍｇを散布し
て行った。この結果、大気中での潤滑特性は４ｍまでの
滑り距離でも摩擦係数約０．１で安定し、真空中では負
荷加重が１．５Ｎまで優れた潤滑特性を示した。これ
は、シリコンに対する金属の面接触抵抗を大幅に改良し
たことを示す。Using the onionfullerene thus obtained, the lubrication characteristics were examined with a ball-on-disk friction tester. At this time, a silicon substrate was used for the disk, and a 3.2 mm diameter bearing steel ball was used for the ball.
Onion fullerene 10 mg was sprayed on a disk. As a result, the lubricating properties in the atmosphere were stable at a friction coefficient of about 0.1 even at a sliding distance of up to 4 m, and the lubricating properties were excellent in vacuum up to a load load of 1.5 N. This indicates that the surface contact resistance of the metal to silicon has been greatly improved.
【００１６】[0016]
【発明の効果】本発明によれば、砥粒用ダイヤモンドな
どを原料として使用することで、生成コストを大幅に下
げることができ、また、粒径の大きいオニオンフラーレ
ンを得ることができる。このため、金属同士の面接触抵
抗（摩擦係数）または金属と他の材料との間の面接触抵
抗を大幅に下げることが可能になると共に、熱源として
赤外線ランプを使用することで、例えば、約１８００℃
ほどの高温まで短時間で加熱することができ、オニオン
フラーレンの生成時間を従来の２時間から１分間程度に
まで短縮させることが可能となった。According to the present invention, the production cost can be greatly reduced and the onion fullerene having a large particle size can be obtained by using diamond for abrasive grains as a raw material. For this reason, the surface contact resistance between metals (coefficient of friction) or the surface contact resistance between a metal and another material can be significantly reduced, and by using an infrared lamp as a heat source, for example, about 1800 ° C
As a result, the onion fullerene generation time can be reduced from the conventional two hours to about one minute.
【図面の簡単な説明】[Brief description of the drawings]
【図１】 従来のオニオンフラーレン生成方法を実施す
るために用いる生成装置の模式的構成図。FIG. 1 is a schematic configuration diagram of a generation device used to carry out a conventional onion fullerene generation method.
【図２】 本発明のオニオンフラーレン生成方法を実施
するために用いる生成装置の模式的構成図。FIG. 2 is a schematic configuration diagram of a generation apparatus used to carry out the onion fullerene generation method of the present invention.
１ 真空槽 ２ ルツボ ３ 抵抗加熱装置 ３' 赤外線ラ
ンプ ４ 原料 ５ リフレクタ
ー ６ 仕切バルブ ７ 油回転ポン
プ ８ 真空計 ９ 仕切バルブ １０ ガス流量調節器 １１ 仕切バル
ブ １２ 圧力調節器 １３ ガスボン
ベ １４ バルブDESCRIPTION OF SYMBOLS 1 Vacuum tank 2 Crucible 3 Resistance heating device 3 'Infrared lamp 4 Raw material 5 Reflector 6 Partition valve 7 Oil rotary pump 8 Vacuum gauge 9 Partition valve 10 Gas flow controller 11 Partition valve 12 Pressure regulator 13 Gas cylinder 14 Valve
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山本 佳宏 神奈川県茅ヶ崎市萩園2500番地 日本真空 技術株式会社内 Ｆターム(参考） 4G046 CA00 CB01 CC02 CC09 4H104 AA04A ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yoshihiro Yamamoto 2500 Hagizono, Chigasaki-shi, Kanagawa Japan Vacuum Engineering Co., Ltd. F-term (reference) 4G046 CA00 CB01 CC02 CC09 4H104 AA04A
Claims (2)
れ、該真空槽内に黒体のグラファイト製ルツボが配置さ
れたオニオンフラーレン生成装置を用いて、該グラファ
イト製ルツボ内にダイヤモンド微粉末を充填し、該ダイ
ヤモンド微粉末を該赤外線ランプで加熱してオニオンフ
ラーレンを得ることを特徴とするオニオンフラーレンの
生成方法。1. An onion fullerene generator in which an infrared lamp is mounted outside a vacuum chamber and a black body graphite crucible is disposed in the vacuum chamber, diamond fine powder is filled in the graphite crucible. And heating the diamond fine powder with the infrared lamp to obtain onion fullerene.
に、雰囲気ガスとして不活性ガスを流しながら加熱する
ことを特徴とする請求項１記載のオニオンフラーレンの
生成方法。2. The method for producing onion fullerene according to claim 1, wherein the diamond fine powder is heated while flowing an inert gas as an atmosphere gas.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005350584A (en) * | 2004-06-11 | 2005-12-22 | National Institute Of Advanced Industrial & Technology | Solid lubricating film for vacuum, its manufacturing method, and vacuum equipment |
| JP2012245456A (en) * | 2011-05-26 | 2012-12-13 | Gunma Univ | Carbon catalyst, method for producing the same, cathode catalyst layer of fuel cell, and fuel cell |
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|---|---|---|---|---|
| US10920035B2 (en) | 2017-03-16 | 2021-02-16 | Lyten, Inc. | Tuning deformation hysteresis in tires using graphene |
| WO2018169889A1 (en) | 2017-03-16 | 2018-09-20 | Lyten, Inc. | Carbon and elastomer integration |
| US9862606B1 (en) | 2017-03-27 | 2018-01-09 | Lyten, Inc. | Carbon allotropes |
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| JPH1111917A (en) * | 1997-06-18 | 1999-01-19 | Canon Inc | Production of carbon nanotube |
| JPH11157818A (en) * | 1997-11-21 | 1999-06-15 | Masanori Yoshikawa | Production of onion graphite and graphite product |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1111917A (en) * | 1997-06-18 | 1999-01-19 | Canon Inc | Production of carbon nanotube |
| JPH11157818A (en) * | 1997-11-21 | 1999-06-15 | Masanori Yoshikawa | Production of onion graphite and graphite product |
Non-Patent Citations (1)
| Title |
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| JPN6010050831; 垣内孝宏、平田敦: 'クラスタダイヤモンドの加熱によるフラーレンの生成およびその潤滑特性' 第１３回ダイヤモンドシンポジウム講演要旨集 , 19991125, Ｐ．１６０-１６１ * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005350584A (en) * | 2004-06-11 | 2005-12-22 | National Institute Of Advanced Industrial & Technology | Solid lubricating film for vacuum, its manufacturing method, and vacuum equipment |
| JP2012245456A (en) * | 2011-05-26 | 2012-12-13 | Gunma Univ | Carbon catalyst, method for producing the same, cathode catalyst layer of fuel cell, and fuel cell |
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| JP5162061B2 (en) | 2013-03-13 |
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