JP2002063998A - Ion mixing ratio maintaining device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To permit stabilized elimination of an electrostatic charge on an object as a electrostatic charge eliminating device and increase the throughput of a reaction as a physicochemical reaction accelerating device. SOLUTION: The ion mixing ratio maintaining device comprises (1) a generation source 2 of variation in ion mixing ratio arranged in an ion mixed air mass 1 continuously formed, (2) a conductive member 3 which is arranged in the ion mixed air mass 1 and combines an ion absorbing electrode which sets the ion mixing ratio of the ion mixed air mass 1 according to voltage applied with an ion mixing ratio variation sensor which grasps a varied state of the ion mixing ratio as an electric signal through wave propagation, and (3) an ion mixing ratio control power source which analyzes ion mixing ratio variation information from the conductive member 3 to apply voltage for maintaining the ion mixing ratio of the ion mixed air mass 1 within a standard range to the conductive member 3, and always maintains the mixing ration of the ion mixed air mass 1 within the standard range.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion mixing ratio maintaining device, and more particularly to an ion mixing ratio maintaining device suitable as a static electricity removing device, a physicochemical reaction accelerating device (for example, an exhaust gas purifying device) and the like.

[0002]

2. Description of the Related Art Heretofore, as a static eliminator, there has been known a static eliminator which generates ions by using ionizing radiation such as X-rays and neutralizes and removes the electrostatic charge of an object by the generated ions. ing.

[0003] Conventionally, as a physicochemical reaction promoting device for promoting a physical-chemical reaction process of a gaseous substance or an aerosol-like substance, a gaseous substance or an aerosol-like substance is reacted alone or together with a carrier gas such as air. The physicochemical reaction process of the gaseous substance or the aerosol-like substance is promoted by contacting the accelerating function member, or the gaseous substance or the gaseous substance is brought into contact with the gaseous substance as described above by contacting the gaseous substance or the like with the substance to be reacted. There is known a physicochemical reaction accelerating device that causes a physicochemical reaction between the substance and an aerosol-like substance. For example, in an internal combustion engine or the like, an exhaust purification device is known as a physicochemical reaction promoting device. The exhaust gas purification device uses a filter and a catalyst as a reaction promoting function member,
Gaseous substances contained in exhaust gas as carrier gas and dust and gaseous substances as aerosol substances are treated by filtration and decomposition as physical and chemical reaction processes by filters and catalysts as reaction promoting functional members. .

[0004]

However, in the conventional static eliminator, when an object continuously generates a large amount of charged charges of the same polarity, the polarity opposite to the polarity of the charged charges of the object is continuously reduced. Polar ions continue to be consumed, so that there is a problem in that ions having the same polarity as the polarity of the charged electric charges become excessive and the electrostatic charge of the target object cannot be removed.

In the conventional physicochemical reaction accelerating device, the action of accelerating the physicochemical reaction process by the reaction accelerating function member and the reaction with the reaction target member are caused by the reaction of the gaseous substance, the aerosol substance, and the carrier gas. Since it is a property that is exhibited only when it comes into contact with the accelerating function member or the reaction target member, in order to increase this contact opportunity, the fineness of the carrier of the reaction accelerating function member or the reaction target member must be reduced. It is necessary to lengthen the passage. However, these countermeasures cause an increase in pressure loss and a reduction in the amount of a gaseous substance, an aerosol-like substance, or the like to be reacted.

SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and as a static electricity removing device, prevents the generation of excess ions to enable continuous removal of static electricity from a target object, and a physicochemical reaction. The purpose of the accelerating device is to increase the chance of contact with the reaction accelerating function member or the reaction target member without increasing the pressure loss, thereby increasing the reaction throughput.

[0007]

An ion mixing ratio maintaining apparatus according to the present invention comprises an ion mixing ratio fluctuation source disposed in a continuously formed ion mixing mass, and an ion mixing ratio fluctuation source disposed in the ion mixing mass. A conductive member, and an ion-absorbing electrode that sets the ion mixing ratio of the ion-mixing air mass according to the applied voltage, and the ion mixing ratio fluctuation source in the ion mixing ratio fluctuation source through a wave propagation. A conductive member also serving as an ion mixing ratio fluctuation sensor for capturing as an electric signal, and an ion mixing ratio control power supply electrically connected to the conductive member, wherein the ion mixing ratio fluctuation information from the conductive member is provided. And an ion mixing ratio control power source for applying a voltage to the conductive member to maintain the ion mixing ratio of the ion mixed gas mass within the reference range, and always maintain the ion mixing ratio of the ion mixed gas mass in the reference range. Characterized in that it is configured to maintain within.

Here, the ion mixture gas mass is formed by irradiation with ionizing radiation, and the ion mixing ratio fluctuation source is an electrostatically charged material.

Further, the ion mixture gas mass is formed by a flame in a combustion chamber, the ion mixture ratio fluctuation generating source is a grounded exhaust purification function member, and the ion mixture ratio control power source is A voltage having a polarity that deflects the ion mixture ratio of the ion mixture gas mass to the plus side or the minus side is applied to the conductive member.

[0010] The ion mixture gas mass is formed by a flame.

Further, the ion mixture ratio fluctuation source is electrically connected to an ion mixture ratio fluctuation generation power source, and the ion mixture gas mass is any of the following: one kind of gaseous substance; Mixture of gaseous substances One kind of aerosol-like substance Mixture of plural kinds of aerosol-like substances Mixture of one or more kinds of gaseous substances and one or more kinds of aerosol-like substances Carrier gas such as air Either one or both of the ion mixture ratio fluctuation source and the conductive member are any of the following, a reaction promoting function member, a reaction target member, a container, and a transport system. Either the mixing ratio fluctuation generating power source or the ion mixing ratio control power source is a grounding mode that always keeps the voltage applied to the ion mixing ratio fluctuation generating source or the conductive member at 0V. Is also included.

[0012] The container refers to a part or all of a substance containing a gaseous substance or an aerosol-like substance, and the transport system refers to a part or all of a duct for transporting the mixture. Good, "Specially arranged conductive members"
The term “conductive member” refers to a conductive member that does not have the functions described above and serves as both an ion-absorbing electrode and an ion-mixing-ratio sensor.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a conceptual configuration diagram of an ion mixing ratio maintaining device according to an embodiment of the present invention, and FIGS. 2 and 3 are configuration diagrams of a first static electricity removing device as an application example of the present invention. And FIGS. 4, 5, and 6 are configuration diagrams of a physicochemical reaction accelerating device as another application example of the present invention, respectively.

(1) First Embodiment (FIG. 1) In the ion mixing ratio maintaining apparatus shown in FIG. 1, the ion mixing ratio (mixing ratio of positive ions and negative ions) is previously set to a constant value on the positive side. When the ion mixture ratio fluctuation source 2 is present at one corner of the ion mixture mass 1, the ion mixture ratio of the ion mixture mass 1 is increased by the ion mixture ratio variation source 2 from the above set value (constant value on the positive side). It is configured to maintain the ion mixture ratio within the reference range of the above set value even if it tries to fluctuate. Here, the ion-mixed air mass 1 is continuously formed by ionizing radiation such as X-rays, flames, air discharge, and the like. The ion mixture ratio fluctuation source 2 causes the ion mixture ratio of the ion mixture mass 1 to fluctuate, such as an electrostatically charged material or a grounded exhaust gas purifying member as described later.

A conductive member 3 is disposed in the ion mixture gas mass 1, and an ion mixing ratio control power supply 4 is connected to the conductive member 3.

A positive reference voltage for setting the ion mixture ratio of the ion mixture mass 1 to a constant positive value is applied to the conductive member 3 by an ion mixture ratio control power supply 4. The conductive member 3 to which the plus reference voltage has been applied functions as an ion absorbing electrode, absorbs negative ions near the conductive member 3 and places the vicinity of the conductive member 3 into a positive ion deflection state. The positive ion deflection state of (1) propagates as a wave in the ion mixture gas mass 1, and the ion mixture ratio of the entire ion mixture gas mass 1 is deflected to a constant value on the positive side.

The ion mixing ratio fluctuation generating source 2 changes the ion mixing ratio of the ion mixed air mass 1 in the positive ion deflection state as described above in the vicinity thereof. The ion mixture ratio fluctuation state in the vicinity of the ion mixture ratio fluctuation source 2 propagates as a wave in the ion mixture mass 1, and is captured as an electric signal by the conductive member 3 functioning as an ion mixture ratio fluctuation sensor to control the ion mixture ratio. Input to the power supply 4.

The ion mixing ratio control power supply 4 analyzes this electric signal (ion mixing ratio fluctuation information or sensor information) (analysis processing a) and judges that the ion mixing ratio fluctuation state is within the reference range of the set value. When the determination is made (determination processing b), the positive reference voltage is continuously applied to the conductive member 3 (first application processing c). Also, an ion mixing ratio control power supply 4
In the case where it is determined that the ion mixture ratio fluctuation state exceeds the reference range on the plus side (determination processing b), after the applied voltage is switched to a voltage obtained by superimposing the minus voltage on the plus reference voltage for a certain period of time, Immediately return to the plus reference voltage (second
The application d) is performed to analyze the ion mixture ratio fluctuation information (analysis a). When it is determined from this analysis that the ion mixing ratio fluctuation state is still beyond the reference range on the plus side (determination process b), the applied voltage is switched again for a fixed time (second application process d). Then, when the ion mixing ratio fluctuation state returns within the reference range (determination process b), the plus reference voltage is applied without switching the applied voltage (first).
C). On the other hand, when it is determined that the ion mixing ratio fluctuation state is out of the reference range on the minus side (determination process b), the voltage superimposed on the plus reference voltage is changed to the plus voltage (third application process e). Except for this, the same operation as the above-described case where the light beam is deflected to the plus side is performed.

In this way, even if the ion mixture ratio of the ion mixture mass 1 is to be varied from the set value by the ion mixture ratio variation source 2, the ion mixture ratio is maintained within the reference range of the set value.

The reason why the conductive member 3 can capture the ion mixture ratio fluctuation state from the ion mixture ratio fluctuation source 2 while emitting the positive ion deflection state to the outside is that the positive ion deflection state and the ion mixture ratio fluctuation state. Each state propagates through the ion mixture mass 1 as a wave,
This is because waves have independence, that is, a property that a plurality of waves can simultaneously pass through the same point of the medium.

The behavior of the ion mixing ratio control power supply 4 when the ion mixing ratio fluctuation state is within the reference range will be described. When the ion mixing ratio control power supply 4 is generating the plus reference voltage, the minus pole side is grounded. In this state, it is assumed that the conductive member 3 has captured information that, for example, a slight positive deflection has occurred in the ion mixture mass 1 within the reference range. This means that a slight positive charge is superimposed on the conductive member 3 from the ion mixture mass 1. This excess positive charge flows to ground,
This means that the same amount of negative charge is supplied to the conductive member 3 from the ground and superimposed. The superimposed negative voltage causes the conductive member 3 to absorb the positive ions, so that the above slight positive deflection is eliminated. Contrary to the above, even when a slight negative deflection occurs in the ion mixture air mass 1 within the reference range, the ion mixing ratio control power supply 4 performs the same behavior as above (however, the plus and minus are reversed). Then a slight negative tendency is eliminated.

As described above, the ion-mixing-ratio maintaining apparatus according to the first embodiment includes an ion-mixing-ratio fluctuation source 2 disposed in an ion-mixed air mass 1 formed continuously.
A conductive member 3 disposed in the ion mixture gas mass 1, an ion absorbing electrode for setting the ion mixture ratio of the ion mixture gas mass 1 in accordance with an applied voltage, and an ion mixing ratio fluctuation generation source 2. A conductive member 3 also serving as an ion mixing ratio fluctuation sensor for capturing a fluctuation state of the ion mixing ratio as an electric signal via wave propagation, and an ion mixing ratio control power supply 4 electrically connected to the conductive member 3 The ion mixing ratio control that analyzes the ion mixing ratio fluctuation information from the conductive member 3 and applies a voltage to the conductive member 3 to maintain the ion mixing ratio of the ion mixed mass 1 within a reference range. The power supply 4 is provided so as to always maintain the ion mixing ratio of the ion mixed gas mass 1 within a reference range.

For this reason, according to the ion mixing ratio maintaining apparatus according to the first embodiment, as an electrostatic eliminator as described later, the generation of excess ions is prevented so that the electrostatic charge of the object can be continuously removed. In addition, the exhaust gas purifying apparatus as described later can increase the chance of contact with the filter and the catalyst without increasing the pressure loss, thereby increasing the amount of exhaust gas to be treated.

Further, according to the ion mixing ratio maintaining apparatus according to the first embodiment, since the conductive member 3 has both functions of an ion absorbing electrode and an ion mixing ratio fluctuation sensor, the ion mixing ratio fluctuation generating source is provided. 2, the number of components can be reduced, wiring can be simplified, and the like, as compared with the case where an electrostatic sensor is provided in the vicinity of 2.

(2) Second Embodiment (FIG. 2) Next, a first static electricity removing device shown in FIG. 2 will be described.

This first static electricity eliminator is used for a case where a positively charged material as an ion mixture ratio fluctuation source 2 is present in an ion mixture gas mass 1 in which an ion mixture ratio is previously set equal to a plus or minus amount. Even if the positively charged material 2 absorbs the negative ions in the ion mixture mass 1, the ion mixture ratio of the ion mixture mass 1 is deflected to the positive side, and the ion mixture ratio of the ion mixture mass 1 is set to the above-mentioned set value. By maintaining the positive charge within the reference range of (plus and minus the same amount), even if the positive charge continuously appears on the positively charged material 2, the static eliminator is configured to be able to continuously remove the positive charge. .

Here, the ion-mixed air mass 1 is an X-ray emitter 5
Are continuously formed within the X-ray irradiation area by the X-ray, and the X-ray directly irradiates the positively charged material 2. Further, a conductive ring as a conductive member 3 having both functions of an ion absorption electrode and an ion mixing ratio fluctuation sensor is arranged in the X-ray irradiation area, and an ion mixing ratio control power supply 4 is electrically connected to the conductive ring 3. It is connected to the.

When the positive charge does not appear on the positively charged material 2, the ion mixing ratio control power supply 4
, The ion mixture ratio of the ion mixture mass 1 is maintained at the set value (plus and minus the same amount). When a positive charge appears on the positively charged substance 2, negative ions near the positively charged substance 2 are attracted to the positively charged substance 2, and the ion mixture ratio of the ion mixture gas mass 1 is deflected to the positive side. This ion mixing ratio fluctuation state propagates as a wave in the ion mixing air mass 1, and is captured as an electric signal by the conductive ring 3 functioning as an ion mixing ratio fluctuation sensor.

The ion mixing ratio control power supply 4 analyzes this electric signal (ion mixing ratio fluctuation information or sensor information) (analysis processing a) and judges that the ion mixing ratio fluctuation state is within the reference range of the set value. In this case (determination process b), zero voltage is continuously applied to the conductive ring 3 (first application process c). The ion mixing ratio control power supply 4 is
If it is determined that the ion mixture ratio fluctuation state exceeds the reference range on the plus side (determination process b), the conductive ring 3
After a negative voltage is applied for a certain period of time, the voltage is immediately returned to zero (second application processing d), and the ion mixture ratio fluctuation information is analyzed (analysis processing a). If it is determined by this analysis that the ion mixture ratio fluctuation state is still beyond the reference range on the plus side (determination process b), the conductive ring 3
, A negative voltage is applied for a certain period of time (second application process d). Then, when the ion mixing ratio fluctuation state returns within the reference range (determination process b), zero voltage is applied to the conductive ring 3 (first application process c). On the other hand, when it is determined that the ion mixing ratio fluctuation state is out of the reference range on the negative side (determination process b), except that the voltage applied to the conductive ring 3 is switched to the positive voltage, the above-described positive side is changed. The same operation is performed as in the case where the light beam is deflected.

In this way, even if the ion mixture ratio of the ion mixture mass 1 is to be varied from the set value (plus and minus the same amount) by the positively charged material 2, the ion mixture ratio is maintained within the reference range of the set value. In other words, even if the positively charged material 2 is continuously charged with a positive charge, the positive charge can be continuously removed.

The reason why the conductive ring 3 can capture the ion mixture ratio fluctuation state from the ion mixture ratio fluctuation source 2 while emitting a positive ion deflection state to the outside, and that the ion mixture ratio fluctuation state is within the reference range The behavior of the ion mixing ratio control power supply 4 when the power is within the range is the same as described above.

As described above, the ion mixing ratio maintaining apparatus according to the second embodiment is different from the ion mixing ratio maintaining apparatus according to the first embodiment in that the ion mixed air mass 1 is formed of ionizing radiation (in FIG. 2, X-rays), and
The ion mixing ratio fluctuation source 2 is characterized by being an electrostatically charged material (a positively charged material in FIG. 2).

Therefore, according to the ion mixing ratio maintaining apparatus according to the second embodiment, it is possible to prevent the generation of excess ions and to continuously remove the electrostatic charge of the object.

(3) Third Embodiment (FIG. 3) Next, a second static electricity removing device shown in FIG. 3 will be described.

This second static electricity eliminator, like the first static electricity eliminator, is used as an ion mixture ratio fluctuation source 2 in an ion mixture mass 1 in which the ion mixture ratio is previously set to plus and minus equal amounts. In the case where the positively charged material exists, the positively charged material 2 absorbs the negative ions in the ion mixed gas mass 1 so that the ion mixing mass of the ion mixed gas mass 1 is deflected to the positive side, and thus the ion mixed gas mass is deflected. By maintaining the ion mixing ratio of 1 within the reference range of the above set value (plus and minus the same amount), even if the positively charged material 2 is continuously charged with the positive charge, the positive charge is continuously removed. It is a static eliminator configured to obtain.

However, in the second static electricity removing device, an ion mixture is generated inside the duct 6 by the X-ray emitter 5, and the ion mixture is blown by the blower 7 to the positively charged material 2 arranged outside the duct 6. The configuration is different from that of the first static electricity eliminator in that the constitution is the same, and the other constitution is the same as that of the first static eliminator.

The operation of the second static eliminator is the same as the operation of the first static eliminator. In addition, the ion mixing ratio fluctuation state when the positive charge appears on the positively charged material 2 is the wave propagating in the ion mixed air mass 1 toward the windward unless the wind speed by the blower exceeds the propagation speed of the wave, Captured by the conductive ring 3.

Even with the second static electricity removing device, even if the positively charged material 2 is continuously charged with a positive charge, the positive charge can be continuously removed.

The reason why the conductive ring 3 can capture the ion mixture ratio fluctuation state from the ion mixture ratio fluctuation source 2 while emitting the positive ion deflection state to the outside, and the reason that the ion mixture ratio fluctuation state is within the reference range The behavior of the ion mixing ratio control power supply 4 when the power is within the range is the same as described above.

As described above, the ion mixing ratio maintaining apparatus according to the third embodiment is different from the ion mixing ratio maintaining apparatus according to the first embodiment in that the ion mixed gas mass 1 is formed of ionizing radiation (in FIG. 3, X-rays), and
The ion mixing ratio fluctuation source 2 is characterized by being an electrostatically charged material (a positively charged material in FIG. 3).

Therefore, according to the ion mixing ratio maintaining apparatus of the third embodiment, it is possible to prevent the generation of excess ions and to continuously remove the electrostatic charge of the object.

(4) Fourth Embodiment (FIG. 4) Next, the physicochemical reaction promoting device shown in FIG. 4 will be described.

This physicochemical reaction accelerating device includes an engine,
Exhaust gas continuously generated by a flame in a combustion chamber 8 such as a boiler.
Is set in advance to a constant value on the negative side to charge the dust in the exhaust gas (aerosol-like substance) to a negative value, and as an ion mixing ratio fluctuation source 2 in the exhaust passage (in the ion mixed gas mass 1). Even if the exhaust gas purifying function member (reaction promoting function member) is grounded and the exhaust gas purifying function member 2 adsorbs negative ions and negatively charged dust in the exhaust gas, the ion mixture ratio of the exhaust gas is deflected to the plus side. By maintaining the ion mixture ratio of the exhaust gas within the reference range of the above set value (a constant value on the negative side), dust generated in the exhaust gas continuously generated is negatively charged and adsorbed by the exhaust gas purifying function member 2. It is an exhaust gas purification device configured. The other configurations and operations are the same as the configurations and operations of the ion mixing ratio maintaining device shown in FIG.

Here, the phenomenon that the negatively charged dust is adsorbed on the exhaust gas purifying function member 2 is caused by the fact that the positive side of the ion mixing ratio control power supply 4 is grounded similarly to the exhaust gas purifying function member 2, so that the negatively charged dust particles in the exhaust gas are exhausted. This is because the exhaust gas purifying function member 2 is on the plus side, and the exhaust gas purifying function member 2 exerts an electric attractive force on the negatively charged dust.

As described above, according to the exhaust gas purifying device, the use of the electric attraction increases the chance that the continuously generated dust in the exhaust gas comes into contact with the surface of the exhaust gas purifying function member 2 and the minute passage inside. Therefore, the processing exhaust gas amount can be increased without increasing the pressure loss.

As described above, the ion mixing ratio maintaining apparatus according to the fourth embodiment is different from the ion mixing ratio maintaining apparatus according to the first embodiment in that the ion mixed air mass 1 is caused by the flame in the combustion chamber 8. The formed ion mixing ratio fluctuation source 2 is the grounded exhaust gas purification function member 2, and
The ion mixing ratio control power supply 4 applies a voltage having a polarity that deflects the ion mixing ratio of the ion mixing mass 1 to the plus side or the minus side (the minus side in FIG. 4).

For this reason, according to the ion mixture ratio maintaining apparatus of the fourth embodiment, it is possible to increase the chances of contact with the filter and the catalyst without increasing the pressure loss, thereby increasing the amount of processing exhaust gas.

(5) Fifth Embodiment (FIG. 5) Next, the physicochemical reaction promoting device shown in FIG. 5 will be described.

The physicochemical reaction accelerating apparatus continuously forms the ion-mixed air mass 1 by irradiating the carrier gas air with X-rays from the X-ray emitter 5. Further, a positive voltage is applied to the specially arranged conductive member 3 by the ion mixing ratio control power supply 4 to set the ion mixing ratio to a constant value on the positive side. Then, in this state, the gaseous substance and the aerosol-like substance are combined and mixed to form a positively-biased gas flow of the mixture. A reaction promoting function member 2 as an ion mixing ratio fluctuation generating source is electrically isolated in the air flow (in the ion mixing mass 1), and the reaction promoting function member 2 A negative voltage is applied by the generating power supply 9 to adsorb the positively ionized gaseous substances and dust in the aerosol which has become a positively charged body due to the adherence of the positively charged gaseous substance, so that the ion mixture ratio in the ion mixture mass 1 becomes negative. Even if the ion mixture mass is deflected to the side, the ion mixture ratio in the ion mixture gas mass 1 is maintained within the reference range of the set value (the fixed value on the plus side). The other configuration and operation are the same as the configuration and operation of the ion mixing ratio maintaining device shown in FIG. 1 described above.

As described above, according to the physicochemical reaction accelerating apparatus shown in FIG. 5, the use of electric attraction increases the chance of bringing a gaseous substance or an aerosol-like substance into contact with the reaction accelerating function member 2. Therefore, it is possible to increase the reaction processing amount of the gaseous substance or the aerosol-like substance without increasing the pressure loss.

As described above, the ion mixture ratio maintaining apparatus according to the fifth embodiment includes the ion mixture ratio fluctuation source 2
Are electrically connected to an ion mixing ratio fluctuation generating power supply 9, the ion mixture mass 1 is a mixture of a gaseous substance, an aerosol substance, and air, and the conductive member 3 is specially arranged. The ion mixing ratio fluctuation source 2 is a conductive member.

(6) Sixth Embodiment (FIG. 6) Next, an exhaust gas purifying device as a physicochemical reaction accelerating device shown in FIG. 6 will be described.

The exhaust gas purifying apparatus is provided with a first side and a first side on the flame side and the exhaust port side, respectively, in the ion mixture mass 1 continuously formed by the flame in the combustion chamber 8 such as an engine or a boiler.
And a second reaction promoting function member (conductive member) 2B are disposed on the first reaction promoting function member 2A by an ion mixing ratio fluctuation generating power supply 9. A positive voltage is applied, and a negative voltage is applied to the second reaction promoting function member 2B by the ion mixing ratio control power supply 4.

In this exhaust gas purifying apparatus, the first reaction promoting function member 2A adsorbs negatively ionized gaseous substances in the combustion exhaust gas and negatively charged dust in the aerosol. By adsorbing positively ionized gaseous substances and positively charged dust by the second reaction promoting function member 2B, the ion mixture ratio of the combustion exhaust is maintained at a constant value.

As described above, according to the exhaust gas purification apparatus shown in FIG. 6, there is an opportunity to bring a gaseous substance or an aerosol-like substance into contact with the first and second reaction promoting function members 2A, 2B by utilizing electric attraction. Therefore, the amount of the gaseous substance or the aerosol-like substance to be reacted can be increased without increasing the pressure loss.

As described above, in the ion mixture ratio maintaining apparatus according to the sixth embodiment, the conductive member 2B is electrically connected to the ion mixture ratio control power supply 4 and the ion mixture ratio fluctuation generation source 2A is used. The ion mixture mass 1 is a mixture of a gaseous substance and an aerosol-like substance, and is electrically connected to an ion mixture ratio variation generation power supply 9. Both are reaction promoting functional members.

Although the embodiments have been described above, the present invention is not limited to the above embodiments, and the ion mixing ratio fluctuation generating source is electrically connected to the ion mixing ratio fluctuation generating power source. The ion-mixed air mass is one of the following to: One kind of gaseous substance Mixture of plural kinds of gaseous substances One kind of aerosol-like substance Mixture of plural kinds of aerosol-like substances One kind or plural kinds of gaseous A mixture of a substance and one or more kinds of aerosol-like substances, a carrier gas such as air, a mixture of the above and the above, and one or both of the ion mixing ratio fluctuation source and the conductive member are any of the following to Reaction promotion function member Reaction target member Container, transport system Specially arranged conductive member Also, either the ion mixing ratio fluctuation generation power supply or the ion mixing ratio control power supply is What is necessary is just to include the grounding form which always keeps the applied voltage to the ratio variation source or the conductive member at 0V.

[0059]

According to the present invention, as a static electricity removing device, it is possible to continuously remove static electricity from an object by preventing the generation of excess ions, and as a physical chemical reaction accelerating device such as an exhaust gas purifying device. Therefore, the chance of contact with the reaction promoting function member, the reaction target member, and the like is increased.
The reaction throughput of the gaseous substance or the aerosol substance can be increased without increasing the pressure loss.

[Brief description of the drawings]

FIG. 1 is a conceptual configuration diagram of an ion mixing ratio maintaining device according to an embodiment of the present invention.

FIG. 2 is a configuration diagram of a first static electricity removing device as an application example of the present invention.

FIG. 3 is a configuration diagram of a second static electricity removing device as an application example of the present invention.

FIG. 4 is a configuration diagram of an exhaust gas purification apparatus as another application example of the present invention.

FIG. 5 is a configuration diagram of a physicochemical reaction accelerating device as still another application example of the present invention.

FIG. 6 is a configuration diagram of a physicochemical reaction accelerating device as still another application example of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Ion mixture air mass 2 Ion mixture ratio fluctuation generating source (electrostatic charge, exhaust purification function member, reaction promotion function member) 2A reaction promotion function member 2B reaction promotion function member (conductive member) 3 Conductive member (conductive ring 4) Ion mixture ratio control power supply 9 Ion mixture ratio fluctuation generation power supply

Claims (5)

[Claims] 1. An ion mixing ratio fluctuation source arranged in an ion mixture mass formed continuously, and a conductive member arranged in the ion mixture mass, wherein the conductive member is arranged in accordance with an applied voltage. An ion-absorbing electrode that sets the ion-mixing ratio of the ion-mixing air mass, and an ion-mixing-ratio-variation sensor that captures the ion-mixing-ratio fluctuation state in the ion-mixing-ratio generator as an electric signal via wave propagation. A conductive member to be controlled, and an ion mixing ratio control power supply electrically connected to the conductive member, which analyzes ion mixing ratio fluctuation information from the conductive member and references the ion mixing ratio of the ion mixed air mass. An ion mixing ratio control power source for applying a voltage to the conductive member for maintaining the ion mixing ratio within the range, wherein the ion mixing ratio of the ion mixed gas mass is always maintained within the reference range. Down mixing ratio maintainer. 2. The ion mixing ratio maintaining apparatus according to claim 1, wherein said ion mixing air mass is formed by irradiation of ionizing radiation, and said ion mixing ratio fluctuation generating source is an electrostatically charged material. . 3. The ion mixture mass is formed by a flame in a combustion chamber, and the ion mixture ratio variation source is a grounded exhaust gas purifying function member. 2. The ion mixture ratio maintaining device according to claim 1, wherein a voltage having a polarity that deflects the ion mixture ratio of the ion mixture gas mass to the plus side or the minus side is applied to the conductive member. 4. The ion mixing ratio maintaining apparatus according to claim 1, wherein said ion mixture air mass is formed by a flame. 5. The ion mixing ratio fluctuation generating source is electrically connected to an ion mixing ratio fluctuation generating power source, wherein the ion mixing air mass is any one of the following: one kind of gaseous substance; Mixture of gaseous substances One kind of aerosol-like substance Mixture of plural kinds of aerosol-like substances Mixture of one or more kinds of gaseous substances and one or more kinds of aerosol-like substances Carrier gas such as air Either one or both of the ion mixture ratio fluctuation source and the conductive member are any of the following, a reaction promoting function member, a reaction target member, a container, and a transport system. Either the mixing ratio fluctuation generating power source or the ion mixing ratio control power source has a grounding mode that always keeps the voltage applied to the ion mixing ratio fluctuation generating source or the conductive member at 0V. Ion mixing ratio maintaining apparatus according to claim 1, characterized in that it is configured Nde.