JP2002062402A - Light absorbing antireflection body and display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light absorbing antireflection body capable of achieving high contrast and an electrically conductive antireflection film in a low-cost production process and to provide a display using the light absorbing antireflection body. SOLUTION: The light absorbing antireflection body 10 comprises a light absorbing film 12 formed on a substrate 11 and containing fine pigment particles and fine particles having a high refractive index and an antireflection multilayer film 13 formed on the light absorbing film 12 as a multilayer structure 14, 15 including an electrically conductive thin film as at least the layer 14. and having function to attenuate reflected light to incident light by interference. The display is obtained by forming the antireflection body 10 on the outer surface of a panel as an antireflection film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-absorptive antireflection body and a display device using the same, and more particularly, to a light-absorptive antireflection body for enhancing contrast corresponding to a display device such as a cathode ray tube using flat panel glass. The present invention relates to an antireflection body and a display device in which the antireflection body is formed as an antireflection film on an outer surface of a panel, for example, flat panel glass.

[0002]

2. Description of the Related Art In recent years, flattening of the outer surface of a face panel of a display device, for example, a cathode ray tube has been promoted. In the cathode ray tube, since the shape of the outer surface of the face panel is flattened, the difference between the thickness of the panel glass at the center portion and the thickness of the panel glass at the corner portion must be increased in order to oppose the external pressure.

[0003] The contrast of a cathode ray tube has conventionally been determined by the light absorption of the panel glass and the effect of reducing the reflectance of the phosphor screen. However, if the difference in transmittance is caused by the difference in wall thickness of the panel glass due to the flattening of the outer surface of the face panel, the uniformity of luminance is deteriorated due to this difference, and the center and corner of the panel are It is difficult to obtain an optimum contrast in both portions.

Therefore, by increasing the glass transmittance and imparting light absorption to the antireflection member formed on the surface of the panel glass, the total transmittance is made equivalent and a good contrast is obtained.

[0005] As this kind of antireflective body, a light-absorbing antireflective body having a two-layer structure and having the functions of antireflection, light absorption and conductivity (see JP-A-9-156964) is known. , Glass / SnO ₂ (tin oxide) / TiN (titanium nitride) / SnO ₂ / Tin / SiO ₂ (silicon dioxide) conductive light attenuating type anti-reflective coating (Tokuheihei 6)
-510382).

[0006]

The problem to be solved by the invention is disclosed in Japanese Patent Application Laid-Open No. 9-156.
In the light-absorbing anti-reflective body disclosed in Japanese Patent No. 964, equivalent transmittance is increased by increasing the transmittance of the panel glass from 50% to 80% and decreasing the transmittance of the film from 80% to 50%. It is possible to get

However, in order to obtain an equivalent contrast, the thickness of the light absorbing film must be increased, and when the difference in the refractive index between the panel glass and the film is large, the light (cathode ray) Since the light emitted from the fluorescent screen in the tube is reflected at the interface between the glass and the light absorbing film, and the reflected light hits the phosphor again to emit light, a problem has arisen in that the image appears double in the cathode ray tube.

On the other hand, in the conductive light attenuating type anti-reflection coating disclosed in Japanese Patent Publication No. 6-510382, the refractive index and the film thickness of the first transparent film from the glass side are optimized. Although it is possible to attenuate the incident light from the surface side, there are many disadvantages due to the increase in the film configuration.
Further, it is very difficult to obtain an optimal thin film material having light absorption in consideration of the wavelength dispersion of the optical constant. For example, R (red) G (green) B (blue) of a cathode ray tube It is not suitable for designing materials in consideration of the emission spectrum ratio.

In addition, in order to improve the display quality of the cathode ray tube, structures formed on the surface of the panel glass include:
Various configurations have been proposed which have functions of preventing light reflection, adjusting light transmittance, and adjusting the wavelength distribution of transmitted light to improve contrast and prevent unnecessary radiation. However, none of these functions was simultaneously satisfactory at a high level.

In order to solve the above-mentioned problems, the present invention provides a light-absorptive antireflection body capable of realizing a high contrast and a conductive antireflection film by an inexpensive manufacturing process, and a display device using the same. Things.

[0011]

The light-absorbing anti-reflective body of the present invention comprises a light-absorbing film formed on a substrate and containing pigment fine particles and high-refractive-index fine particles, and a multilayer film formed on the light-absorbing film. And at least one layer thereof is formed of a conductive thin film, and is formed of an antireflection multilayer film which attenuates reflected light with respect to incident light by light interference.

According to the structure of the light-absorbing anti-reflective body of the present invention, since the light-absorbing film contains fine pigment particles, it is possible to obtain a more flexible transmittance distribution by selecting a pigment. . Further, when the light absorbing film contains fine particles having a high refractive index, the refractive index of the light absorbing film can be adjusted. In addition, the antireflection multilayer film attenuates reflected light with respect to incident light due to light interference, and can prevent unnecessary radiation from leaking because at least one of the layers is made of a conductive thin film.

The light-absorptive antireflection body of the present invention comprises high-refractive-index fine particles, a first layer having a thickness of 5 nm or more containing only silicon oxide, pigment fine particles, high-refractive-index fine particles, and silicon oxide. A light absorbing film having a two-layer structure with the second layer;
On the light absorption film, a multilayer structure is formed, and at least one of the layers is made of a conductive thin film, and is made of an antireflection multilayer film that attenuates reflected light with respect to incident light by light interference.

According to the structure of the light-absorbing antireflection body of the present invention described above, since the light-absorbing film contains fine pigment particles and fine particles having a high refractive index, the transmittance and the refractive index of the light-absorbing film can be adjusted. Will be possible. Further, since the light absorbing film has the first layer containing no pigment and the second layer containing pigment, the first layer has no pigment, so that the adhesive strength to the base material below is increased. Since the second layer contains a pigment, the transmittance can be adjusted.

In the display device of the present invention, an antireflection film is formed on the outer surface of the panel, and the antireflection film includes a light absorbing film containing pigment fine particles and high refractive index fine particles formed on a base material; On the light absorbing film, a multilayer structure is formed, and at least one of the layers is made of a conductive thin film, and is made of an antireflection multilayer film that attenuates reflected light with respect to incident light by light interference.

According to the configuration of the display device of the present invention described above,
Since the antireflection film having the same configuration as that of the above-described light-absorbing antireflection body is provided on the outer surface of the panel, the light-absorbing film can constitute a selective absorption filter. Also,
Since the light absorbing film contains fine particles having a high refractive index, the refractive index of the light absorbing film can be adjusted to, for example, be equal to the refractive index of the base material. Therefore, by having the light absorbing film and the antireflection multilayer film, reflection of light (external light) due to backside incidence is suppressed, and leakage of unnecessary radiation is prevented by the conductive thin film.

In the display device according to the present invention, an antireflection film is formed on the outer surface of the panel, and the antireflection film includes a first layer containing only fine particles having a high refractive index and silicon oxide; A light-absorbing film having a two-layer structure of fine particles and a second layer made of silicon oxide, and a multilayer structure formed on the light-absorbing film, wherein at least one of the layers is formed of a conductive thin film and is formed by light interference. And an antireflection multilayer film for attenuating reflected light with respect to incident light.

According to the configuration of the display device of the present invention described above,
Since the anti-reflection film having the same configuration as that of the above-described light-absorbing anti-reflective member is provided on the outer surface of the panel, the light-absorbing film can form a selective absorption filter. Further, the adhesive strength of the antireflection film to the panel is increased by the first layer of the light absorbing film. Further, since the light absorbing film contains fine particles having a high refractive index, it is possible to adjust the refractive index of the light absorbing film to be equal to, for example, the refractive index of the base material. Therefore, by having the light absorbing film and the antireflection multilayer film, reflection of light (external light) due to backside incidence is suppressed, and leakage of unnecessary radiation is prevented by the conductive thin film.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention relates to a method for forming on a substrate,
A light-absorbing film containing pigment fine particles and high-refractive-index fine particles;
An anti-reflection anti-reflective body comprising one layer made of a conductive thin film and an anti-reflection multilayer film that attenuates reflected light with respect to incident light by light interference.

Further, according to the present invention, in the above-mentioned light-absorbing antireflection body, the physical thickness of the light-absorbing film is 10 nm or more and
nm or less.

The present invention also provides the above-mentioned light-absorbing antireflection body, wherein the light-absorbing film has a solid content ratio of 1.5 to the organic solvent.
It is configured to be formed by applying a sol-gel film in which silicon oxide of not less than wt% and not more than 4.5 wt% is dispersed.

According to the present invention, in the above-described light-absorbing antireflection body, the light-absorbing film contains fine particles having a high refractive index in a weight ratio of 20 wt% to 40 wt% of silicon oxide as a main material, and Is set to 1.40 or more and 1.65 or less.

According to the present invention, in the above-mentioned light-absorbing antireflection body, the light-absorbing film has a structure in which the ratio of pigment fine particles to silicon oxide is 5 wt% or less.

According to the present invention, there is provided a first layer having a thickness of 5 nm or more containing only high-refractive-index fine particles and silicon oxide, and a second layer comprising pigment fine particles, high-refractive-index fine particles, and silicon oxide. A light-absorbing film having a layer structure, and an antireflection multilayer film formed on the light-absorbing film in a multilayer structure, wherein at least one of the layers is formed of a conductive thin film and attenuates reflected light with respect to incident light by light interference. The light-absorbing anti-reflective body comprises:

The present invention relates to a display device in which an antireflection film is formed on the outer surface of a panel, wherein the antireflection film contains a pigment fine particle and a high refractive index fine particle formed on a substrate. And a multi-layer structure formed on the light absorbing film, at least one layer of which is made of a conductive thin film, and an anti-reflection multilayer film that attenuates reflected light with respect to incident light by light interference.

According to the present invention, there is provided a display device having an antireflection film formed on an outer surface of a panel, wherein the antireflection film includes a first layer containing only high-refractive-index fine particles and silicon oxide; High refractive index fine particles, and a second made of silicon oxide
A light-absorbing film having a two-layer structure of a light-absorbing film and an anti-reflection multilayer formed on the light-absorbing film in a multilayer structure, wherein at least one of the layers is made of a conductive thin film and attenuating reflected light with respect to incident light by light interference This is a display device comprising a film.

FIG. 1 is a sectional view showing the structure of a light-absorbing anti-reflection body according to one embodiment of the present invention.

The light-absorbing anti-reflection film 10 has a thickness of 10 nm or more containing fine pigment particles formed on the glass substrate 11.
000 nm or less, preferably 100 nm or more and 800 nm
The light absorbing film 12 has the following physical film thickness, and an antireflection multilayer film 13 formed on the light absorbing film 12 and attenuating reflected light with respect to incident light by light interference.

FIG. 2 shows the structure of the light absorbing film 12 of the light absorbing anti-reflection film 10 of FIG. The light absorbing film 12 is composed mainly of silicon oxide (SiO ₂ ), and fine particles of the silicon oxide serve as the binder 1 to form a film. And
The light absorbing film 12 contains pigment fine particles 2 and high refractive index fine particles 3 so as to obtain a desired refractive index distribution.

As the pigment fine particles 2, carbon fine particles (carbon black), inorganic pigment fine particles of a compound such as iron, cobalt, manganese, tin, ruthenium and the like, and organic pigment fine particles of an organic substance can be used.
By containing such pigment fine particles 2, the transmittance of the light absorbing film 12 can be adjusted.

The fine particles 3 having a high refractive index include tin oxide (refractive index: about 2.0) and titanium oxide (refractive index: about 2.
Fine particles of a high refractive material such as 6) can be used. By including such fine particles 3 having a high refractive index, the refractive index of the light absorbing film 12 can be adjusted.

The light-absorbing film 12 having the above structure is prepared by mixing silicon oxide as the binder 1, pigment fine particles 2, and high-refractive-index fine particles 3 in an organic solvent such as ethanol and dispersing them uniformly. The silicon alkoxide solvent is prepared, the silicon alkoxide solvent is applied to the surface of the glass substrate 11, and then baked at a predetermined temperature.

Since the particle size of the pigment fine particles 2 in the organic solvent is at least 10 nm, a film thickness D1 of 10 nm or more is required to form a uniform light absorbing film 12.
When an organic pigment is used as the pigment, the secondary particle size may be 50 nm or more in some cases. Therefore, a film thickness D1 of 100 nm or more is required to form a more stable light absorbing film 12. On the other hand, if the thickness D1 of the light absorbing film 12 is 1000 nm or more, it is not preferable because cracks may occur on the surface after film formation and drying. When the thickness D1 of the light absorbing film 12 is 800 nm or less, long-term stability has been confirmed regardless of the structure, film forming method, and storage method of the antireflection multilayer film thereon.

In order to form a uniform light absorbing film 12 having a sufficient adhesive strength with the glass substrate 11 on the glass substrate 11, the weight ratio of the pigment fine particles 2 to the silicon oxide of the binder 1 is required. Lower is desirable. Specifically, the weight ratio of the pigment fine particles 2 to silicon oxide needs to be 3 wt% or less. The weight ratio of the pigment fine particles 2 is 3 wt%
If it exceeds, the adhesive strength of the film to the glass substrate 11 may be insufficient, and the long-term reliability may be poor.

When it is desired to use 3% or more of the pigment fine particles 2 for adjusting the transmittance, a light absorbing film 12 (see FIG. 4) having a two-layer structure is formed as described later, and the glass substrate 11 is formed.
The first layer on the side may not contain pigment fine particles.

Further, the refractive index of the light absorbing film 12 is set to be 1.40 or more and 1.65 or less, which is close to the refractive index of the glass substrate 11, and preferably 1.45 to 1.55. High refractive index fine particles 3 such as tin oxide and titanium oxide are contained. The refractive index can be easily adjusted by changing the solid content ratio of the high refractive index fine particles 3 to the silicon oxide of the binder 1 from 20 wt% to 40 wt%.

The refractive index of the light absorbing film 12 is 1.40.
When the value is 1.65 or less, the phenomenon in which an image appears to be double can be avoided by optimizing the refractive index of the glass substrate 11. High transmittance glass used for recent flat glass panels has a refractive index of 1.45 to 1.5.
Since it is 5 or less, the refractive index of the light absorbing film 12 when the light absorbing antireflection body 10 of the present embodiment is applied to a flat glass panel is preferably 1.45 or more and 1.55 or less.

The fine particles 3 having a high refractive index have a particle diameter substantially equal to the primary particle diameter of the inorganic pigment. For this reason, the inclusion of the fine particles 3 having a high refractive index allows the light absorbing film 1
The optimum film thickness of No. 2 is not affected. Further, the antireflection function of the antireflection multilayer film 13 on the light absorption film 12 is not deteriorated by the high refractive index fine particles 3.

As a method for forming the light absorbing film 12, which is a coating film, a sol-gel method is employed. In this sol-gel method, spin coating is most suitable for obtaining a uniform film thickness. In addition to the spin coating method, a roll coating method, a dip coating method, a spray method, or the like can be used.
However, the present invention is not limited to these forming methods.

However, regardless of which method is employed, the solid content ratio at which a preferable viscosity is obtained is from 1.5 wt% to 4.5 wt%, preferably from 2.5 wt% to 3 wt%, in terms of the solid content ratio to the organic solvent. 0.5 wt%. A silicon alkoxide solvent in which silicon oxide is dispersed is adjusted to have this solid content ratio. When the solid content ratio is less than 1.5 wt%, the viscosity of the liquid becomes low, and even when the liquid is applied with the above-mentioned preferable film thickness (100 nm or more), the particles of the organic pigment are exposed. The hardness of the absorbing film 12 decreases. On the other hand, if the solid content ratio exceeds 4.5 wt%, the viscosity becomes too high, and the film thickness becomes non-uniform when applied to a large area of the glass substrate 11.

A specific example of forming the light absorbing film 12 can be, for example, as follows. The solid content ratio in the liquid of silicon oxide as the binder 1 was set to 3.0 wt%, the organic pigment as the pigment fine particles 2 was mixed in a weight ratio to silicon oxide of 3.0 wt%, and the tin oxide as the high refractive index fine particles 3 was tin oxide. The fine particles were 35.0 in weight ratio to silicon oxide.
wt% and adjust the alkoxide solvent. And
This alkoxide solvent is applied on the glass substrate 11 to a thickness of 200 nm by spin coating. The light absorbing film 12 is formed by firing this at a predetermined temperature.

On the light absorbing film 12, an antireflection film (antireflection multilayer film) 13 having a multilayer structure is formed. In FIG. 1, the antireflection multilayer film 13 has the simplest two-layer structure. At least one layer of the antireflection multilayer film 13 is formed of a conductive thin film 14 having a surface resistance of 10 Ω / □ to 1000 Ω / □. Examples of the material of the conductive thin film 14 include transparent ITO (indium tin oxide), SnO ₂ (tin oxide), ZnO _x (zinc oxide), or light absorbing TiN (titanium nitride).
Films, transition metal nitride films typified by NbN (niobium nitride) films, and metal thin films such as Ag (silver) films and Ni-Fe (nickel-iron alloy) are used.

When a non-conductive layer is provided in the antireflection multilayer film 13, for example, an SiO ₂ film 15 can be formed.

As a method for forming the antireflection multilayer film 13, for example, a DC active sputtering method is employed. For example, when the antireflection multilayer film 13 composed of the TiN film 14 and the SiO ₂ film 15 is formed, the sputtering apparatus has the following configuration. A first film formation chamber in which a mixed gas of nitrogen and argon is used as a reaction gas by disposing a metal titanium target, an isolation chamber having a gas replacement function, and a mixed gas of oxygen and argon by disposing a metal silicon target in a reaction gas A sputtering apparatus is composed of the second film forming chamber used for the above. With the sputtering apparatus having this configuration, the TiN film 14 is formed in the first film forming chamber, and the TiN film 14 is formed in the second film forming chamber.
An SiO ₂ film 15 is formed thereon.

Here, FIG. 3 shows a flow chart of the manufacturing process of the light-absorbing / reflecting body 10 of the present embodiment. First,
The surface of the glass substrate 11 is washed (Step 1). continue,
The light absorbing film 12 is applied on the glass substrate 11 by roll coating or the like (Step 2). Next, a predetermined temperature t (120
A baking treatment is performed at a temperature of <200 ° C. (Step 3). Then, a second-layer TiN film 14 is first formed by a sputtering method (Step 4), and then a third-layer TiN film 14 is formed.
An iO ₂ film 15 is formed (Step 5). Thereby, the antireflection multilayer film 13 having a two-layer structure is formed.

According to the above-described light-absorbing anti-reflection body 10 of the present embodiment, the refractive index of the light-absorbing film 12 can be adjusted by containing the fine particles 3 having a high refractive index. Will be possible. Thereby, for example, the refractive index of the light absorbing film 12 can be adjusted to be equal to the refractive index of the glass substrate 11.

When the light absorbing film 12 contains a pigment, the light transmittance of the light absorbing film 12 can be adjusted by selecting the pigment. Thus, for example, when the light-absorbing anti-reflection body 10 is used as an anti-reflection film of a face panel of a display device, a selective absorption filter in consideration of RGB luminance can be realized.

The antireflection multilayer film 13 is formed of the conductive thin film 1.
4, the leakage of unnecessary radiation is prevented.

According to the light-absorbing anti-reflection body 10 of the present embodiment, the first-layer light-absorbing film 12, the second-layer TiN film (conductive thin film) 14, and the third-layer With the three-layer structure composed of the SiO ₂ film 15, any refractive index can be set within a range of 1.45 to 1.55. Thereby, reflection of light due to backside incidence can be suppressed.

Next, FIG. 4 shows a schematic sectional view of a light-absorbing antireflection body according to another embodiment of the present invention. This light-absorbing anti-reflective body 20 has a two-layer structure of the light-absorbing film 12, and includes a first light-absorbing film 16 containing no pigment and a second light-absorbing film 17 containing pigment. Become. That is, the glass substrate 11
The first light absorbing film 16 on the side contains silicon oxide serving as binder 1 and fine particles 3 having a high refractive index, and the second light absorbing film 17 thereon has silicon oxide serving as binder 1 and pigment fine particles 2.
And fine particles 3 having a high refractive index. Other configurations are the same as those of the light-absorbing anti-reflection body 10 of FIG.
A duplicate description is omitted.

In the light-absorbing anti-reflection body 20 of the present embodiment, the first light-absorbing film 16 on the glass substrate 11 side does not contain a pigment.
And the adhesive strength with the adhesive increases. The thickness D2 of the first light absorbing film 16 is desirably 5 nm or more in order to secure sufficient adhesive strength.

When it is desired to use 3% or more of the pigment fine particles 2 for adjusting the transmittance, the weight ratio of the pigment fine particles 2 in the second light absorbing film 12 including the pigment fine particles 2 is set to the value shown in FIG. Slightly larger than one light absorbing film 12, for example, 5
% Or less by weight.

The light-absorbing anti-reflective member 20 shown in FIG. 4 can be formed, for example, as follows. First, a sol-gel liquid for the first light absorbing film 16 containing no pigment is applied on the glass substrate 11. That is, the solid content ratio in the sol-gel liquid of silicon oxide serving as the binder 1 is set to, for example, 3.0 wt%,
The alkoxide solvent is adjusted by mixing, for example, 35.0 wt% of tin oxide fine particles as the high refractive index fine particles 3 with respect to silicon oxide in a weight ratio to silicon oxide. Subsequently, the alkoxide solvent is applied to a thickness D2 of, for example, 5 nm by spin coating.

Next, a sol-gel liquid containing the pigment fine particles 2 for the second light absorbing film 17 is applied. That is, the solid content ratio of the silicon oxide as the binder 1 in the sol-gel liquid is, for example, 3.0.
wt%, tin oxide fine particles as the high refractive index fine particles 3 are mixed at a weight ratio to silicon oxide, for example, 35.0 wt%, and organic pigments as pigment fine particles 2 are mixed at a weight ratio to silicon oxide, for example, 3.5 wt%. To adjust the alkoxide solvent. Subsequently, this alkoxide solvent is applied to a thickness D3 of, for example, 200 nm by a spin coating method.

The adhesive strength of the film of the light-absorbing anti-reflective member 20 formed in this way was the same despite the fact that the pigment was greater than the specific example (3.0 wt%) of the previous embodiment.

By forming the light-absorbing anti-reflection members 10 and 20 of the above embodiments on the outer surface of the panel glass, it is possible to form a display device having an anti-reflection film formed on the panel glass. it can.

FIG. 5 is a schematic sectional view of a cathode ray tube as an embodiment of the display device of the present invention. The cathode ray tube 30 is formed by a glass cathode ray tube 21 having a panel portion 21a, a funnel portion 21b, and a neck portion 21c. As the panel portion 21a of the cathode ray tube 21, a panel glass 22 having a flat outer surface is joined to the glass of the funnel portion 21b by a sealing portion 21d. The panel glass 22 has a thicker peripheral portion (particularly, a corner portion) than a central portion in order to oppose the outside air pressure.

An electron gun 23 for emitting an electron beam is sealed in the neck 21c of the cathode ray tube 21. Also, from the neck 21c to the funnel 21b,
A deflection yoke 24 for deflecting the electron beam emitted from the electron gun 23 is attached.

Then, on the outer surface of the panel glass 22,
An antireflection film 25 is formed for the purpose of enhancing contrast. As the antireflection film 25, the light-absorbing antireflection body 10 or 20 of the above-described embodiment can be used.

The antireflection film 2 is formed on the outer surface of the panel glass 22.
5 can be formed by the same method as the method for forming the light-absorbing anti-reflective member 10 described above.

According to the above-described cathode ray tube 30 of the present embodiment, in the cathode ray tube 30 using the flat panel glass 22, the light absorption film 12 and the antireflection multilayer are used as the antireflection film 25 for enhancing the contrast. The use of the light-absorbing anti-reflective body 10 or 20 made of the film 13 allows the cathode ray tube 20
Glass 2 accompanying flattening of panel glass 22
2 can be eliminated.

Further, by preventing reflection of the anti-reflection multilayer film 13 by light interference, an unprecedented high contrast can be obtained, and leakage of unnecessary radiation can be prevented by the conductive thin film 14 provided on the anti-reflection multilayer film 13. Can be.

The light absorbing anti-reflection member 10 or 20
By selecting a pigment for the light absorbing film 12, a more free transmittance distribution can be obtained, so that the antireflection film 25 is designed in accordance with the luminance ratio of three colors (red, green, and blue) of the color cathode ray tube. The focus performance can be improved by optimizing the ratio of the current amounts of the three color electron beams.

The display device to which the present invention can be applied is not limited to the above-described cathode ray tube.
Liquid crystal display, FED (Field Emission Displa
The same can be applied to a display device such as y). By forming the light-absorbing antireflection body of the present invention as an antireflection film on the outer surface of the panel of these display devices, high contrast and conductive antireflection can be realized.

The present invention is not limited to the above-described embodiment, and may take various other configurations without departing from the gist of the present invention.

[0066]

According to the present invention described above, in a light-absorbing anti-reflection body and a display device using the same as an anti-reflection film for flat panel glass, the light-absorbing anti-reflection body has a light absorbing film with a pigment. With the configuration in which the refractive index material is added, it is possible to realize a selective absorption filter in consideration of the RGB luminance of the display device. Therefore, unprecedented high contrast and conductive reflection prevention can be realized by an inexpensive manufacturing process.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating a structure of a light-absorbing antireflection body according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view illustrating a configuration of a light absorbing film of the light absorbing anti-reflection body of FIG.

FIG. 3 is a flowchart showing a flow of a manufacturing process of the light-absorbing anti-reflection member of FIG.

FIG. 4 is a cross-sectional view illustrating a structure of a light-absorbing anti-reflection body according to another embodiment of the present invention.

FIG. 5 is a schematic sectional view of a cathode ray tube according to an embodiment of the display device of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Binder, 2 pigment fine particles, 3 high refractive index fine particles, 10, 20 light absorbing antireflective body, 11 glass base material, 12 light absorbing film, 13 antireflection multilayer film, 14 conductive thin film (TiN film), 15 SiO ₂ film, 16 1st
Light absorbing film, 17 second light absorbing film, 21 cathode ray tube,
22 panel glass, 23 electron gun, 24 deflection yoke, 25 anti-reflection film, 30 cathode ray tube

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Muneya Araki 30 Ibaraki, Oyacho, Inazawa, Aichi Prefecture Sony Inazawa Co., Ltd. F-term (reference) 2K009 AA05 BB02 CC02 CC03 CC09 CC14 DD04 EE01 EE03 4F100 AA20B AG00A AT00A BA04 BA07 BA10A CA13B CA13H DE01B DE01H EG00D GB41 JD06 JD06B JG01C JN06 JN06D JN18B JN18H 4G059 AA07 AB11 AC04 AC11 GA02 GA04 GA12 5C032 AA02 DD02 DE01 DE03 DF01 DF03 DG01 DG02

Claims (8)

[Claims] 1. A light absorbing film containing pigment fine particles and high refractive index fine particles formed on a base material, and a multilayer structure formed on the light absorbing film, and at least one of the layers is a conductive thin film. And an anti-reflection multilayer film for attenuating reflected light with respect to incident light by light interference. 2. The light-absorbing anti-reflective body according to claim 1, wherein the physical thickness of the light-absorbing film is 10 nm or more and 1000 nm or less. 3. The light-absorbing film is formed by applying a sol-gel film in which silicon oxide having a solid content ratio of 1.5 wt% or more and 4.5 wt% or less is dispersed in an organic solvent. The light-absorbing anti-reflective body according to claim 1. 4. The light absorbing film according to claim 1, wherein said high-refractive-index fine particles comprise at least 20 wt% and not more than 40 wt% of silicon oxide as a main material.
It is contained in the following weight ratio, and has a refractive index of 1.40 or more and 1.65.
The light-absorbing anti-reflective body according to claim 1, wherein: 5. The light-absorbing anti-reflective body according to claim 1, wherein the light-absorbing film has a ratio of the pigment fine particles to the silicon oxide of 5 wt% or less. 6. A two-layer structure of a first layer having a thickness of 5 nm or more containing only high-refractive-index fine particles and silicon oxide, and a second layer made of pigment fine particles, high-refractive-index fine particles, and silicon oxide. A light-absorbing film comprising: a light-absorbing film comprising: a light-absorbing film; a light-absorbing film formed of a conductive thin film; A light-absorptive antireflective body, characterized in that: 7. A display device in which an antireflection film is formed on an outer surface of a panel, wherein the antireflection film comprises: a light absorption film containing pigment fine particles and high refractive index fine particles formed on a substrate. A display formed on the light-absorbing film in a multilayer structure, wherein at least one of the layers is formed of a conductive thin film and an anti-reflection multilayer film for attenuating reflected light with respect to incident light by light interference. apparatus. 8. A display device having an antireflection film formed on an outer surface of a panel, wherein the antireflection film includes a first layer containing only fine particles having a high refractive index and silicon oxide;
A light-absorbing film having a two-layer structure of pigment fine particles, high-refractive-index fine particles, and a second layer made of silicon oxide; a multilayer structure formed on the light-absorbing film; A display device comprising: an anti-reflection multilayer film made of a conductive thin film and attenuating reflected light with respect to incident light by light interference.