JP2002062278A - Instrument for measuring gas purity - Google Patents

Instrument for measuring gas purity

Info

Publication number
JP2002062278A
JP2002062278A JP2000253972A JP2000253972A JP2002062278A JP 2002062278 A JP2002062278 A JP 2002062278A JP 2000253972 A JP2000253972 A JP 2000253972A JP 2000253972 A JP2000253972 A JP 2000253972A JP 2002062278 A JP2002062278 A JP 2002062278A
Authority
JP
Japan
Prior art keywords
gas
purity
radiation
measured
ammeter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000253972A
Other languages
Japanese (ja)
Inventor
Kazuhiro Watanabe
和弘 渡辺
Yoshikazu Okumura
義和 奥村
Osamu Yamamoto
修 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Atomic Energy Agency
Original Assignee
Japan Atomic Energy Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Atomic Energy Research Institute filed Critical Japan Atomic Energy Research Institute
Priority to JP2000253972A priority Critical patent/JP2002062278A/en
Publication of JP2002062278A publication Critical patent/JP2002062278A/en
Pending legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

PROBLEM TO BE SOLVED: To constitute an instrument for real-time measurement of gas purity, using a difference of strength of an ionization current which flows by ionization of gas by a radiation. SOLUTION: This instrument is constituted of a gas purity measuring chamber provided with a gas inlet and a gas outlet, positive and negative electrodes provided in a gas flow passage inside the measuring chamber, a radiation source for emitting the radiation toward the gas passing through a space between the electrodes, an ammeter provided in a circuit connected to both electrodes, and a measured purity processing circuit connected to the ammeter.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、放射線によってガ
スが電離して流れる電離電流の大きさの相違を利用し
て、ガスの純度のリアルタイムの測定装置を構成するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a real-time apparatus for measuring the purity of a gas by utilizing the difference in the magnitude of an ionization current flowing when gas is ionized by radiation.

【0002】[0002]

【従来技術】従来のガス分析では、真空に引いたチェン
バーに微小ガスを導入し、四重極質量分析器等によって
その成分を分析し、その分析結果から元のガスの成分を
算出する手法が用いられている。
2. Description of the Related Art In the conventional gas analysis, a method of introducing a small gas into a vacuum-evacuated chamber, analyzing the components using a quadrupole mass analyzer or the like, and calculating the components of the original gas from the analysis results is known. Used.

【0003】[0003]

【発明が解決しようとする課題】しかし、従来のこのよ
うな方法では、直接に高い圧力のガスを分析することは
不可能であり、又、即座にその成分を知ることも困難で
あった。本発明は、これらの不都合を解決するもので、
ガスの流路に取り付けてリアルタイムにガスの純度を測
定できるものである。
However, in such a conventional method, it is impossible to directly analyze a gas at a high pressure, and it is also difficult to know its components immediately. The present invention solves these disadvantages,
It can be installed in a gas flow path to measure gas purity in real time.

【0004】[0004]

【課題を解決するための手段】本発明のガス純度測定装
置は、ガス入口及びガス出口が設けられたガス純度測定
室、測定室内のガス流路に設けられた陽極電極及び負極
電極板、電極板間を通過するガスに放射線を照射するた
めの放射線源、両電極板を結合した回路に設けられた電
流計、並びに電流計に結合された計測純度処理回路から
構成されている。
According to the present invention, there is provided a gas purity measuring apparatus comprising: a gas purity measuring chamber provided with a gas inlet and a gas outlet; an anode electrode and a negative electrode plate provided in a gas flow path in the measuring chamber; It comprises a radiation source for irradiating the gas passing between the plates with radiation, an ammeter provided in a circuit connecting the two electrode plates, and a measurement purity processing circuit connected to the ammeter.

【0005】本発明のガス純度測定装置においては、被
測定ガスをガス入口から測定室内の電極間に導入し、電
極板間を流れる被測定ガスに放射線を照射して電離処理
してイオン化し、電極板間に電圧を印加して電極間に流
れる電流を測定し、その測定電流の大きさを予め測定し
ておいた同じガスの測定電流と比較することにより、電
極板間を流れる被測定ガスの純度を測定する。
In the gas purity measuring device of the present invention, the gas to be measured is introduced from the gas inlet to between the electrodes in the measuring chamber, and the gas to be measured flowing between the electrode plates is irradiated with radiation to ionize it by ionization. By applying a voltage between the electrode plates and measuring the current flowing between the electrodes, and comparing the magnitude of the measured current with the previously measured measurement current of the same gas, the gas to be measured flowing between the electrode plates is measured. The purity of is measured.

【0006】[0006]

【発明の実施の形態】ガスに放射線が当たるとガスは電
離し導電性を示す。そこに対向した電極板を置き電圧を
印加すると電極間に電流が流れる。この現象は従来の放
射線測定器に応用されている。流れる電流の大きさは、
印加電圧、放射線の量、ガスの圧力によって決まる。
又、ガスの種類によっても決まることから、ある種のガ
スに対して、予め定めた強度の放射線による電離電流を
測定しておくことにより、その電流値からのずれからガ
スの純度が分かる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS When a gas is irradiated with radiation, the gas is ionized and exhibits conductivity. When an opposing electrode plate is placed there and a voltage is applied, a current flows between the electrodes. This phenomenon has been applied to conventional radiation measuring instruments. The magnitude of the flowing current is
It depends on the applied voltage, the amount of radiation and the pressure of the gas.
In addition, since the ionization current is also determined by the type of gas, by measuring the ionization current of a certain gas due to radiation of a predetermined intensity, the purity of the gas can be determined from the deviation from the current value.

【0007】例えば、高電圧の絶縁ガスとして利用され
ているSF6(六フッ化イオウ)は、電気機器への使用
に際してその純度が重要であり、又、空気などの混合状
態から精製する際にも、その純度のモニターが不可欠で
ある。
For example, the purity of SF6 (sulfur hexafluoride), which is used as a high-voltage insulating gas, is important when used in electrical equipment, and also when purified from a mixed state of air or the like. Monitoring its purity is essential.

【0008】本発明のガス純度測定装置を図1に基づい
て説明する。ガス純度測定室1の1方の側壁にガス入口
が設けられ、その反対の側壁にガス出口が設けられる。
その測定室内のガス入口及びガス出口の間に2つの電極
板が配置され、その電極板間には回路が形成され、その
回路には電流計Aが挿入される。更にその測定室には、
電極板間を通過する被測定ガスに放射線を照射するため
の放射源が配置される。電流計には、計測純度処理回路
が結合され、その回路操作により測定電流に基づいて被
測定ガスの純度が測定される。
A gas purity measuring apparatus according to the present invention will be described with reference to FIG. A gas inlet is provided on one side wall of the gas purity measuring chamber 1, and a gas outlet is provided on the opposite side wall.
Two electrode plates are arranged between a gas inlet and a gas outlet in the measurement chamber, and a circuit is formed between the electrode plates, and an ammeter A is inserted into the circuit. Furthermore, in the measurement room,
A radiation source is provided for irradiating the gas to be measured passing between the electrode plates with radiation. A measurement purity processing circuit is coupled to the ammeter, and the circuit operation measures the purity of the gas to be measured based on the measurement current.

【0009】本発明の測定装置においては、ガスに放射
線が照射されると、そのガスは電離され導電性となる。
そこで対向電極板間に電圧を印加すると電極間に電流が
流れる。その際に流れる電流は、電極板間に印加された
電圧、照射された放射線の量、被測定ガスの圧力と種類
によって決定される。
In the measuring apparatus of the present invention, when a gas is irradiated with radiation, the gas is ionized and becomes conductive.
Therefore, when a voltage is applied between the opposing electrode plates, a current flows between the electrodes. The current flowing at that time is determined by the voltage applied between the electrode plates, the amount of irradiated radiation, and the pressure and type of the gas to be measured.

【0010】又、その際に流れる電流は、ガスの種類に
よっても相違する。そこで、被測定ガスと同種のガスに
対して、予め定めた強度の放射線によって電離させ、そ
の際の電極間の電流を測定しておくことにより、被測定
ガスの測定電流値をその予め測定しておいた電流値から
のずれに基づいて被測定ガスの純度を測定することがで
きる。
[0010] The current flowing at that time also differs depending on the type of gas. Therefore, a gas of the same kind as the gas to be measured is ionized by radiation of a predetermined intensity, and the current between the electrodes at that time is measured, whereby the measured current value of the gas to be measured is measured in advance. The purity of the gas to be measured can be measured based on the deviation from the set current value.

【0011】この電流値からのずれに基づいて被測定ガ
スの純度を測定するとは、例えば、まず、圧力の分った
種々の濃度のSF6ガスを標準ガスとし、これに対して
予め定めた強度の放射線を照射し、その種々の濃度のS
F6ガスに対応して測定される電極間電流を測定し、そ
の測定電流に基づいて濃度対電流値に関する表又はグラ
フを作成しておく。次に、この標準ガスと同じ圧力にし
た未知の濃度のSF6ガスに対し、標準ガスと同じ強度
の放射線を照射し、その際の電極間電流を測定する。こ
の未知の濃度のガスの測定電流値を、種々の濃度の標準
ガスに対して作成された表又はグラフの電流値と比較す
ることにより、そのガスのSF6濃度を知ることができ
る。
To measure the purity of the gas to be measured based on the deviation from the current value, for example, first, SF6 gas of various concentrations with a known pressure is used as a standard gas, and a predetermined intensity At various concentrations of S
The inter-electrode current measured corresponding to the F6 gas is measured, and a table or graph relating to concentration versus current value is created based on the measured current. Next, radiation of the same intensity as that of the standard gas is applied to the SF6 gas having an unknown concentration at the same pressure as that of the standard gas, and the current between the electrodes at that time is measured. By comparing the measured current value of the gas having the unknown concentration with the current value in a table or a graph prepared for standard gases having various concentrations, the SF6 concentration of the gas can be known.

【0012】[0012]

【発明の効果】本発明の装置をガス流路に取り付けるこ
とによって、そのガスの精製の状態や純度の状態を容易
に測定することが可能となる。又、本発明の装置はSF
6以外のガスの純度の測定においても使用可能であり、
その適用性は広い。
By attaching the apparatus of the present invention to a gas flow path, the state of purification and the state of purity of the gas can be easily measured. The apparatus of the present invention is SF
It can also be used to measure the purity of gases other than 6,
Its applicability is wide.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明のガス純度測定装置の構造を示す図で
ある。
FIG. 1 is a diagram showing a structure of a gas purity measuring device of the present invention.

【符号の説明】[Explanation of symbols]

1: ガス純度測定室 1: Gas purity measurement room

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガス入口及びガス出口が設けられたガス
純度測定室、測定室内のガス流路に設けられた陽極電極
及び負極電極板、電極板間を通過するガスに放射線を照
射するための放射線源、両電極板を結合した回路に設け
られた電流計、並びに電流計に結合された計測純度処理
回路から構成されることを特徴とするガス純度測定装
置。
A gas purity measuring chamber provided with a gas inlet and a gas outlet; an anode electrode and a negative electrode plate provided in a gas flow path in the measuring chamber; and a gas for irradiating a gas passing between the electrode plates with radiation. A gas purity measuring device comprising: a radiation source; an ammeter provided in a circuit in which both electrode plates are coupled; and a measurement purity processing circuit coupled to the ammeter.
【請求項2】 高電圧の絶縁ガスとして電気機器におい
て利用されるSF6(六フッ化イオウ)ガスの純度を測
定するために使用される請求項1記載の装置。
2. The apparatus according to claim 1, which is used for measuring the purity of SF6 (sulfur hexafluoride) gas used in electrical equipment as a high-voltage insulating gas.
JP2000253972A 2000-08-24 2000-08-24 Instrument for measuring gas purity Pending JP2002062278A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000253972A JP2002062278A (en) 2000-08-24 2000-08-24 Instrument for measuring gas purity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000253972A JP2002062278A (en) 2000-08-24 2000-08-24 Instrument for measuring gas purity

Publications (1)

Publication Number Publication Date
JP2002062278A true JP2002062278A (en) 2002-02-28

Family

ID=18742996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000253972A Pending JP2002062278A (en) 2000-08-24 2000-08-24 Instrument for measuring gas purity

Country Status (1)

Country Link
JP (1) JP2002062278A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100414291C (en) * 2006-03-17 2008-08-27 中国科学院安徽光学精密机械研究所 Portable ionization chamber of photoionization detector
CN103080742A (en) * 2010-08-27 2013-05-01 英派尔科技开发有限公司 Hydrofluorocarbon detection device
CN103675090A (en) * 2013-12-23 2014-03-26 中国电子科技集团公司第四十九研究所 Harmful gas detector with low detection limit
CN112326774A (en) * 2020-10-30 2021-02-05 四川赛康智能科技股份有限公司 High energy ray irradiation of SF6Ionization test method for gas
CN113289927A (en) * 2021-05-28 2021-08-24 浙江瑞亨电子材料有限公司 High-purity chlorine full-production line purity analysis system

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100414291C (en) * 2006-03-17 2008-08-27 中国科学院安徽光学精密机械研究所 Portable ionization chamber of photoionization detector
CN103080742A (en) * 2010-08-27 2013-05-01 英派尔科技开发有限公司 Hydrofluorocarbon detection device
JP2013540993A (en) * 2010-08-27 2013-11-07 エンパイア テクノロジー ディベロップメント エルエルシー Hydrofluorocarbon detection device
US8993338B2 (en) 2010-08-27 2015-03-31 Empire Technology Development Llc Hydrofluorocarbon detection device
US9835605B2 (en) 2010-08-27 2017-12-05 Empire Technology Development Llc Hydrofluorocarbon detection device
CN103675090A (en) * 2013-12-23 2014-03-26 中国电子科技集团公司第四十九研究所 Harmful gas detector with low detection limit
CN112326774A (en) * 2020-10-30 2021-02-05 四川赛康智能科技股份有限公司 High energy ray irradiation of SF6Ionization test method for gas
CN112326774B (en) * 2020-10-30 2024-04-23 四川赛康智能科技股份有限公司 SF is irradiated by high-energy rays6Ionization test method for gas
CN113289927A (en) * 2021-05-28 2021-08-24 浙江瑞亨电子材料有限公司 High-purity chlorine full-production line purity analysis system

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