JP2002060211A - Method for producing hetero-fullerene part of carbon skeleton of which is substituted with boron and nitrogen - Google Patents

Method for producing hetero-fullerene part of carbon skeleton of which is substituted with boron and nitrogen

Info

Publication number
JP2002060211A
JP2002060211A JP2000245739A JP2000245739A JP2002060211A JP 2002060211 A JP2002060211 A JP 2002060211A JP 2000245739 A JP2000245739 A JP 2000245739A JP 2000245739 A JP2000245739 A JP 2000245739A JP 2002060211 A JP2002060211 A JP 2002060211A
Authority
JP
Japan
Prior art keywords
boron
nitrogen
fullerene
substituted
carbon skeleton
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000245739A
Other languages
Japanese (ja)
Other versions
JP3353068B2 (en
Inventor
Takako Nakamura
挙子 中村
Yoshinori Koga
義紀 古賀
Keiichiro Ishikawa
啓一郎 石川
Tsuguyori Oohana
継頼 大花
Masanori Ishihara
正統 石原
Shuzo Fujiwara
修三 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Priority to JP2000245739A priority Critical patent/JP3353068B2/en
Publication of JP2002060211A publication Critical patent/JP2002060211A/en
Application granted granted Critical
Publication of JP3353068B2 publication Critical patent/JP3353068B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

PROBLEM TO BE SOLVED: To provide an industrially advantageous method for producing hetero- fullerene in higher yield by substituting part of the carbon skeleton with boron and nitrogen. SOLUTION: This hetero-fullerene producing method comprises reacting fullerene with boron nitride under irradiation with a laser beam.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、炭素骨格の一部が
ホウ素及び窒素で置換されたヘテロフラーレンの製造方
法に関する。
[0001] The present invention relates to a method for producing a heterofullerene in which a carbon skeleton is partially substituted with boron and nitrogen.

【0002】[0002]

【従来の技術】ダイヤモンド、グラファイトに次いで第
3の炭素同素体であるフラーレンは、その大量合成法が
開発されて以来、その特異な構造、性質から種々の分野
において注目されている。そして、その炭素骨格の一部
をホウ素、窒素などで置換させたヘテロフラーレンは、
超伝導、強磁性、耐食性、超高硬度性、非線形特性など
の新規な物理的、化学的性質が期待されている。
2. Description of the Related Art Fullerene, which is the third carbon allotrope next to diamond and graphite, has been attracting attention in various fields because of its unique structure and properties since its mass synthesis was developed. Then, heterofullerene in which part of the carbon skeleton is substituted with boron, nitrogen, etc.
New physical and chemical properties such as superconductivity, ferromagnetism, corrosion resistance, ultra-hardness, and nonlinear characteristics are expected.

【0003】しかしながら、従来、炭素骨格の一部をホ
ウ素及び窒素の二つの元素で実質的に置換させたヘテロ
フラーレンの具体的な報告例は極めて少なく、わずか
に、本発明者らが提案した特開平11−60222号公
報などがあるに過ぎない。この公報記載の発明は、「ア
ルゴン雰囲気下で、ホウ素と窒素含有グラファイトをパ
ルスレーザー照射下にアブレーションさせるか、或いは
窒素雰囲気下で、ホウ素含有グラファイトをパルスレー
ザー照射下にアブレーションさせて、上記ヘテロフラー
レンを製造する」ものである。この発明によれば、ホウ
素と窒素の2種類の元素を置換させたヘテロフラーレン
を得ることができるものの、その後の本発明者らの検討
によれば、目的とするヘテロフラーレンの生成量が十分
でなく、このものを用いた種々の応用を図る上で若干の
問題点があることが判明した。
However, heretofore, there are very few specific examples of heterofullerenes in which a part of the carbon skeleton is substantially substituted with two elements of boron and nitrogen, and there are only a few specific examples of heterofullerenes proposed by the inventors. There is only JP-A-11-60222. The invention described in this publication discloses that the above heterofullerene is prepared by ablating boron and nitrogen-containing graphite under pulsed laser irradiation under an argon atmosphere, or by ablating boron-containing graphite under pulsed laser irradiation under a nitrogen atmosphere. To manufacture. " According to the present invention, it is possible to obtain a heterofullerene obtained by substituting two elements of boron and nitrogen. However, according to studies by the present inventors, the amount of the target heterofullerene to be produced is sufficient. However, it has been found that there are some problems in various applications using this device.

【0004】[0004]

【発明が解決しようとする課題】本発明は、上記事情の
下でなされたものであって、特開平11−60222号
記載の発明を更に発展させ、炭素骨格の一部がホウ素及
び窒素で置換されたヘテロフラーレンをより高収率で得
ることのできる工業的に有利なヘテロフラーレンの製造
方法を提供することを目的とする。
The present invention has been made under the above circumstances, and further develops the invention described in JP-A-11-60222, in which a part of the carbon skeleton is substituted with boron and nitrogen. It is an object of the present invention to provide an industrially advantageous method for producing a heterofullerene which can obtain the obtained heterofullerene in a higher yield.

【0005】[0005]

【課題を解決するための手段】本発明者らは、原料とし
て、フラーレンと窒化ホウ素を選定し、これらの系にレ
ーザー光を照射すると、高収率で炭素骨格の一部がホウ
素及び窒素で置換されたヘテロフラーレンが得られるこ
とを知見し、本発明を完成するに至った。即ち、本発明
によれば、第一に、炭素骨格の一部がホウ素及び窒素で
置換されたヘテロフラーレンを製造するに当たり、フラ
ーレンと窒化ホウ素をレーザー照射下で反応させること
を特徴とする、ヘテロフラーレンの製造方法が提供され
る。第二に、第一の製造方法において、レーザー光がパ
ルス光であることを特徴とするヘテロフラーレンの製造
方法が提供される。
Means for Solving the Problems The present inventors have selected fullerene and boron nitride as raw materials, and when these systems are irradiated with laser light, a part of the carbon skeleton is formed of boron and nitrogen in high yield. The inventors have found that a substituted heterofullerene can be obtained, and have completed the present invention. That is, according to the present invention, first, in producing a heterofullerene in which part of the carbon skeleton is substituted with boron and nitrogen, the fullerene is reacted with boron nitride under laser irradiation, A method for producing fullerene is provided. Secondly, there is provided a method for producing a heterofullerene, wherein the laser light is pulsed light in the first production method.

【0006】本発明の原料であるフラーレンとしては、
従来公知のものが全て使用できる。このようなフラーレ
ンとしては、C60が代表的なものであるが、本発明で
はこれに限定されず、C70などの炭素数が60以上の
フラーレンも使用することができる。またこれらの2種
以上の混合物であっても差し支えない。これらのフラー
レンは周知のように、炭素質系材料を出発原料とする、
レーザー気化法、アーク放電法、プラズマ放電法、燃焼
法、放電プラズマ法などにより合成される。
[0006] The fullerene which is a raw material of the present invention includes:
All conventionally known ones can be used. Such fullerenes, although C 60 is of representative, not limited to this in the present invention, the number of carbon atoms, such as C 70 can be used more than 60 fullerenes. A mixture of two or more of these may be used. These fullerenes are, as is well known, starting from a carbonaceous material.
It is synthesized by a laser vaporization method, an arc discharge method, a plasma discharge method, a combustion method, a discharge plasma method, or the like.

【0007】本発明で用いる他方の原料である窒化ホウ
素は、純度の高いものが好ましく使用されるが、反応を
阻害しない範囲であれば、鉄、クロム、ニッケル、酸化
ホウ素などの不純物を含有したものも使用できる。
As the other raw material used in the present invention, boron nitride having a high purity is preferably used, but contains impurities such as iron, chromium, nickel and boron oxide as long as the reaction is not inhibited. Things can also be used.

【0008】フラーレンと窒化ホウ素の使用割合は、目
的とするヘテロフラーレンに含有される、ホウ素及び窒
素の置換割合に応じて適宜定められる。例えば、(ホウ
素及び窒素の炭素に対する含有量が1:1:58の割合
のヘテロフラーレンを合成する場合には、フラーレンと
窒化ホウ素の使用割合は1:571とされる。
[0008] The proportion of the fullerene and boron nitride used is appropriately determined according to the substitution rate of boron and nitrogen contained in the target heterofullerene. For example, when synthesizing a heterofullerene having a content ratio of boron and nitrogen to carbon of 1: 1: 58, the ratio of fullerene to boron nitride used is 1: 571.

【0009】本発明においては、これらの原料系は、レ
ーザー照射する前に、予め溶媒に溶解若しくは懸濁・分
散させておくことが好ましい。このような溶媒として
は、例えば、ヘキサン、トルエン等の広範囲な有機溶媒
が使用できる。
In the present invention, these raw material systems are preferably dissolved or suspended / dispersed in a solvent in advance before laser irradiation. As such a solvent, for example, a wide range of organic solvents such as hexane and toluene can be used.

【0010】次いで、本発明においては、好ましくは溶
媒に溶解若しくは懸濁・分散させた、フラーレンと窒化
ホウ素からなる原料系に、レーザー光を照射する。レー
ザー光は、連続光でもパルス光であってもよいが、パル
ス光を用いることが高収率の点からみて好ましい。この
ようなレーザー光としては、エキシマレーザー、窒素レ
ーザーまたはNd:YAGレーザー等が挙げられる。ま
た、波長は広範囲の波長の光を利用できるが、反応の高
効率化のためには、ArF(193nm)、KrF(2
48nm)、XeClエキシマレーザー(308n
m)、Nd:YAGレーザーにおいては第3高調波(3
55nm)、または第4高調波(266nm)の波長を
用いることが好ましい。
Next, in the present invention, a laser beam is irradiated to a raw material system composed of fullerene and boron nitride, preferably dissolved or suspended or dispersed in a solvent. The laser light may be continuous light or pulsed light, but it is preferable to use pulsed light from the viewpoint of high yield. Examples of such laser light include an excimer laser, a nitrogen laser, a Nd: YAG laser, and the like. Although light having a wide range of wavelengths can be used, ArF (193 nm) and KrF (2
48 nm), XeCl excimer laser (308 n)
m), the third harmonic (3
It is preferable to use a wavelength of 55 nm) or the fourth harmonic (266 nm).

【0011】本発明の反応温度は任意に設定されるが、
光照射下でのフラーレンと窒化ホウ素との反応は加熱し
なくても進行するので、通常は室温下で行われる。
Although the reaction temperature of the present invention is arbitrarily set,
Since the reaction between fullerene and boron nitride under light irradiation proceeds without heating, it is usually performed at room temperature.

【0012】本発明の反応は、不活性ガスの雰囲気下で
行うのが望ましく、特にラジカル反応を経由して進行す
る可能性があることから、アルゴン、または窒素雰囲気
下で行うことが好ましい。
The reaction of the present invention is preferably carried out in an atmosphere of an inert gas, and particularly preferably in an atmosphere of argon or nitrogen since it may proceed through a radical reaction.

【0013】[0013]

【実施例】以下、本発明を実施例により更に詳細に説明
する。
The present invention will be described in more detail with reference to the following examples.

【0014】実施例1 C60のヘキサン溶液(2×10−4mol/l, 7
ml)に窒化ホウ素(0.8mmol)を入れて懸濁液
を調製した。この懸濁液を合成石英製の反応容器に入
れ、アルゴン雰囲気下で攪拌しつつKrFエキシマレー
ザー(248nm, 1Hz, 200mJ/cm
を室温で1時間照射した。その後、沈殿物を除去し、沈
殿物からピリジン抽出を行い、得られた抽出液をHPL
Cで分離精製し、FAB−MS測定を行った。図1に示
すように、質量数721にホウ素および窒素置換フラー
レンBNC58の生成が確認された。収率30%。
[0014] hexane solution of Example 1 C 60 (2 × 10 -4 mol / l, 7
ml) with boron nitride (0.8 mmol) to prepare a suspension. This suspension is put into a synthetic quartz reaction vessel, and is stirred under an argon atmosphere with a KrF excimer laser (248 nm, 1 Hz, 200 mJ / cm 2 ).
Was irradiated at room temperature for 1 hour. Thereafter, the precipitate was removed, and the precipitate was subjected to pyridine extraction.
Separation and purification were performed using C, and FAB-MS measurement was performed. As shown in FIG. 1, generation of boron and nitrogen-substituted fullerene BNC 58 was confirmed at a mass number of 721. Yield 30%.

【0015】実施例2 C70のヘキサン溶液(2×10−4mol/l, 7
ml)に窒化ホウ素(0.8mmol)を入れて懸濁液
を調製した。この懸濁液を合成石英製の反応容器に入
れ、アルゴン雰囲気下で攪拌しつつKrFエキシマレー
ザー(248nm, 1Hz, 200mJ/cm
を室温で1時間照射した。その後、沈殿物を除去し、沈
殿物からピリジンで抽出を行い、得られた抽出液をHP
LCで分離精製し、FAB−MS測定を行った。質量数
841にホウ素および窒素置換フラーレンBNC68
生成が確認された。
The hexane solution (2 × 10 Example 2 C 70 -4 mol / l, 7
ml) with boron nitride (0.8 mmol) to prepare a suspension. This suspension is put into a synthetic quartz reaction vessel, and is stirred under an argon atmosphere with a KrF excimer laser (248 nm, 1 Hz, 200 mJ / cm 2 ).
Was irradiated at room temperature for 1 hour. Thereafter, the precipitate was removed, and the precipitate was extracted with pyridine.
Separation and purification were performed by LC, and FAB-MS measurement was performed. The formation of boron and nitrogen-substituted fullerene BNC 68 at a mass number of 841 was confirmed.

【0016】[0016]

【発明の効果】以上説明したように、本発明に従うと、
レーザー照射下にフラーレンおよび窒化ホウ素の反応を
行うことにより、従来、大量合成の困難であった、炭素
骨格の一部がホウ素及び窒素の2種類の元素で置換され
たヘテロフラーレンの製造が可能となる。
As described above, according to the present invention,
By performing the reaction of fullerene and boron nitride under laser irradiation, it is possible to produce a heterofullerene in which part of the carbon skeleton has been replaced by two types of elements, boron and nitrogen, which has been difficult to synthesize in the past. Become.

【図面の簡単な説明】[Brief description of the drawings]

【図1】C60および窒化ホウ素のヘキサン懸濁液をア
ルゴン雰囲気下、室温でKrFエキシマレーザー(24
8nm)を照射した場合の、生成物の質量スペクトルで
ある。
[1] C 60 and under an argon atmosphere hexane suspension of boron nitride, KrF excimer laser at room temperature (24
8 nm) is a mass spectrum of the product when irradiated.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 大花 継頼 茨城県つくば市東1丁目1番 工業技術院 物質工学工業技術研究所内 (72)発明者 石原 正統 茨城県つくば市東1丁目1番 工業技術院 物質工学工業技術研究所内 (72)発明者 藤原 修三 茨城県つくば市東1丁目1番 工業技術院 物質工学工業技術研究所内 Fターム(参考) 4G046 CB01 CC03  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tsuguori Ohana 1-1-1, Higashi, Tsukuba, Ibaraki Pref., National Institute of Advanced Industrial Science and Technology (72) Inventor Masanori Ishihara 1-1-1, Higashi, Tsukuba, Ibaraki Industrial Technology (72) Inventor Shuzo Fujiwara 1-1 1-1 Higashi, Tsukuba City, Ibaraki Pref. F-term (Reference) 4M046 CB01 CC03

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】炭素骨格の一部がホウ素及び窒素で置換さ
れたヘテロフラーレンを製造するに当たり、フラーレン
と窒化ホウ素をレーザー照射下で反応させることを特徴
とする、ヘテロフラーレンの製造方法。
1. A method for producing a heterofullerene, which comprises reacting fullerene and boron nitride under laser irradiation to produce a heterofullerene in which part of the carbon skeleton is substituted with boron and nitrogen.
【請求項2】レーザー光がパルス光であることを特徴と
する請求項1のヘテロフラーレンの製造方法。
2. The method according to claim 1, wherein the laser light is pulsed light.
JP2000245739A 2000-08-14 2000-08-14 Method for producing heterofullerene in which part of carbon skeleton is substituted by boron and nitrogen Expired - Lifetime JP3353068B2 (en)

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JP3353068B2 JP3353068B2 (en) 2002-12-03

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005054127A1 (en) * 2003-12-03 2005-06-16 Ideal Star Inc. Derivative fullerene producing apparatus and method
CN1308229C (en) * 2003-06-16 2007-04-04 索尼株式会社 Nitrogen-containing carbonaceous material and process for production thereof
KR100751350B1 (en) 2005-11-29 2007-08-22 삼성에스디아이 주식회사 Mesoporous carbon including heteroatom, manufacturing method thereof , and fuel cell using the same
CN111052429A (en) * 2017-08-31 2020-04-21 松下知识产权经营株式会社 P-type semiconductor film containing hetero fullerene and electronic device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1308229C (en) * 2003-06-16 2007-04-04 索尼株式会社 Nitrogen-containing carbonaceous material and process for production thereof
WO2005054127A1 (en) * 2003-12-03 2005-06-16 Ideal Star Inc. Derivative fullerene producing apparatus and method
JPWO2005054127A1 (en) * 2003-12-03 2008-04-17 株式会社イデアルスター Induction fullerene manufacturing apparatus and manufacturing method
KR100751350B1 (en) 2005-11-29 2007-08-22 삼성에스디아이 주식회사 Mesoporous carbon including heteroatom, manufacturing method thereof , and fuel cell using the same
US8043595B2 (en) 2005-11-29 2011-10-25 Samsung Sdi Co., Ltd. Mesoporous carbon including heteroatom, manufacturing method thereof, and fuel cell using the mesoporous carbon
CN111052429A (en) * 2017-08-31 2020-04-21 松下知识产权经营株式会社 P-type semiconductor film containing hetero fullerene and electronic device
CN111052429B (en) * 2017-08-31 2023-07-04 松下知识产权经营株式会社 P-type semiconductor film containing hetero fullerene and electronic device

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