JP2002047567A - Thermal cvd treatment method - Google Patents
Thermal cvd treatment methodInfo
- Publication number
- JP2002047567A JP2002047567A JP2000228750A JP2000228750A JP2002047567A JP 2002047567 A JP2002047567 A JP 2002047567A JP 2000228750 A JP2000228750 A JP 2000228750A JP 2000228750 A JP2000228750 A JP 2000228750A JP 2002047567 A JP2002047567 A JP 2002047567A
- Authority
- JP
- Japan
- Prior art keywords
- cvd
- masking
- fine particles
- thermal cvd
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Turbine Rotor Nozzle Sealing (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ガスタービンなど
に適用される高温耐食性を有する動・静翼（以下、単に
「翼」と称する）の熱ＣＶＤ処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermal CVD processing method for moving and stationary blades (hereinafter simply referred to as "blades") having high temperature corrosion resistance and applied to gas turbines and the like.
【０００２】[0002]
【背景技術】例えばコンバインド・サイクルプラントに
代表される高効率化された最近の産業用ガスタービンの
タービン入口温度は１３５０℃にも達している。このよ
うな高温の燃焼ガスに暴露されるガスタービンの１，２
段動・静翼はＭＣｒＡｌＹ合金（Ｍ：Ｃｏ，Ｎｉ，Ｃｏ
Ｎｉなど）やＺｒＯ2 −Ｙ2 Ｏ3 等のセラミックをコー
ティングすることによって、高温腐食損傷を防止する対
策がとられている。一方、３，４段動・静翼は燃焼ガス
温度が低下（６５０〜８００℃）することもあり、通常
は特に腐食防止対策はとられず、無処理のままで使用さ
れていた。2. Description of the Related Art The turbine inlet temperature of a recent industrial gas turbine of high efficiency represented by, for example, a combined cycle plant has reached 1350 ° C. 1, 2 of gas turbines exposed to such hot combustion gases
The stepped and stationary blades are made of MCrAlY alloy (M: Co, Ni, Co
Measures have been taken to prevent high temperature corrosion damage by coating a ceramic such as Ni or ZrO2 -Y2 O3. On the other hand, the combustion gas temperature of the three-stage and four-stage moving / stationary vanes may be lowered (650 to 800 ° C.), and therefore, no particular measures are taken to prevent corrosion, and the blades are used without any treatment.
【０００３】ところが、近年、４段動翼等で高温腐食が
原因でクリープ寿命が大幅に低下する事象が出現し、基
材であるＮｉ基又はＣｏ基合金の表面にＡｌやＡｌ・Ｓ
ｉを拡散浸透させることにより３，４段動翼へ耐食性を
付与する処理が行われるようになってきている。[0003] In recent years, however, a phenomenon has emerged in which the creep life is greatly reduced due to high-temperature corrosion in a four-stage rotor blade or the like, and Al or Al.S.
A process of imparting corrosion resistance to the three- and four-stage rotor blades by diffusing and infiltrating i has been performed.
【０００４】上記のＡｌやＡｌ・Ｓｉの拡散処理は、Ｎ
ｉ基又はＣｏ基合金である基材への耐食性付与に有効で
あるが、表層に形成されるＡｌやＡｌ・Ｓｉの拡散層は
延性が乏しく、ガスタービン運転中に生じる変形等によ
るクラックの発生が懸念されている。The above-mentioned diffusion treatment of Al or Al.Si is performed by N
It is effective for imparting corrosion resistance to a base material that is an i-based or Co-based alloy, but the diffusion layer of Al or Al.Si formed on the surface layer has poor ductility, and cracks occur due to deformation and the like generated during gas turbine operation. Is concerned.
【０００５】そこで、Ｎｉ基又はＣｏ基合金基材の表面
に、耐食性に優れた表面層を有し、しかも表面が平滑
で、かつ処理前と同等の基材強度を有する耐食性表面処
理合金の製造方法として、例えばＮｉ基又はＣｏ基合金
からなる基材（被処理材）の表面に耐食性に優れたＣｒ
拡散層を形成させる熱ＣＶＤ法が提案されている。[0005] Therefore, the production of a corrosion-resistant surface-treated alloy having a surface layer excellent in corrosion resistance on the surface of a Ni-base or Co-base alloy base material, and having a smooth surface and the same base strength as before the treatment. As a method, for example, Cr having excellent corrosion resistance is formed on the surface of a substrate (material to be treated) made of a Ni-based or Co-based alloy.
A thermal CVD method for forming a diffusion layer has been proposed.
【０００６】図４にタービン翼の取付けの一例を示す。
図４に示すように、ロータ円板１の側面から翼溝２内に
挿入するいわゆるツリー状の翼根部３を有したタービン
翼４が良く知られている。ここで、上記翼根部３はロー
タ円板１側に埋め込むのために、ＣＶＤ処理する必要が
ない非処理箇所である。FIG. 4 shows an example of installation of turbine blades.
As shown in FIG. 4, a turbine blade 4 having a so-called tree-shaped blade root portion 3 inserted into a blade groove 2 from a side surface of a rotor disk 1 is well known. Here, the blade root 3 is a non-processed portion that does not need to be subjected to the CVD process in order to be embedded in the rotor disk 1 side.
【０００７】一般にコーティング処理する場合に、処理
したくない箇所がある場合には、マスキング材料を該当
部分に塗布して処理しているが、しかしながら、上記熱
ＣＶＤ法では、９００〜１２００℃という高温で熱処理
するので、良好なマスキング材がなく、またマスキング
材を施した場合でも該マスキング材が剥離するなどし
て、結果的にＣＶＤ処理する必要がない箇所（根部）ま
で処理ガスが到達する場合がある。このため、図５に示
すような、結晶粒５が粒界腐蝕６するようなおそれがあ
る。In general, when a coating process is performed, if there is a portion that is not desired to be processed, a masking material is applied to the corresponding portion and the process is performed. However, in the thermal CVD method, a high temperature of 900 to 1200 ° C. is used. When there is no good masking material, and even when the masking material is applied, the masking material is peeled off, and as a result, the processing gas reaches a portion (root portion) where the CVD process is not necessary. There is. For this reason, as shown in FIG.
【０００８】以上の問題に鑑み、本発明は、タービン翼
の特定の箇所においてＣＶＤ処理せずに、しかも良好な
ＣＶＤ処理ができるようにしたタービン翼の熱ＣＶＤ処
理方法を提供することを目的とする。[0008] In view of the above problems, an object of the present invention is to provide a method of performing a thermal CVD process on a turbine blade that can perform a good CVD process without performing a CVD process at a specific portion of the turbine blade. I do.
【０００９】[0009]
【課題を解決するための手段】上記課題を解決する本発
明の［請求項１］の発明は、被処理材の表面をＣＶＤ処
理すると共に、該被処理材の基端部に形成された根部を
非処理する処理方法であって、上記被処理材の基端部と
根部との間に窪み部を形成し、被処理材を垂下させつつ
マスキング治具のフランジ部で上記窪み部を挟み込むと
共に、該治具と根部との間の空間部分に、上記根部を覆
うようにマスキング微粒子を充填し、ＣＶＤ処理ガスの
非処理部への侵入を防止することを特徴とする。According to a first aspect of the present invention, which solves the above-mentioned problems, a surface of a material to be treated is subjected to a CVD process, and a root formed at a base end of the material to be treated. A non-processing method, wherein a hollow portion is formed between a base end portion and a root portion of the material to be processed, and the hollow portion is sandwiched between flange portions of a masking jig while the material to be processed is hung down. The space between the jig and the root portion is filled with masking fine particles so as to cover the root portion, thereby preventing the CVD processing gas from entering the non-processing portion.
【００１０】［請求項２］の発明は、請求項１におい
て、上記被処理材がタービン翼であることを特徴とす
る。A second aspect of the present invention is characterized in that, in the first aspect, the workpiece is a turbine blade.
【００１１】［請求項３］の発明は、請求項１におい
て、上記マスキング微粒子が高純度のＡｌ2 Ｏ3 ，Ｓｉ
Ｃ，ＳｉＯ2 ，ＳｉＮ，Ｃｒ2 Ｏ3 のいずれか一種又は
これらの混合物であることを特徴とする。According to a third aspect of the present invention, in the first aspect, the masking fine particles have a high purity of Al 2 O 3 or Si.
C, SiO 2 , SiN, Cr 2 O 3 , or a mixture thereof.
【００１２】［請求項４］の発明は、請求項３におい
て、上記マスキング微粒子の粒径が、１０〜１００μｍ
であることを特徴とする。According to a fourth aspect of the present invention, in the third aspect, the particle size of the masking fine particles is 10 to 100 μm.
It is characterized by being.
【００１３】［請求項５］の発明は、請求項３におい
て、上記マスキング微粒子が、塩化物、有機物、鉛，亜
鉛等の重金属酸化物を含まないことを特徴とする。The invention of claim 5 is characterized in that, in claim 3, the masking fine particles do not contain chlorides, organic substances, and heavy metal oxides such as lead and zinc.
【００１４】［請求項６］の発明は、請求項１におい
て、上記ＣＶＤ処理がＣｒ拡散層を形成することを特徴
とする。According to a sixth aspect of the present invention, in the first aspect, the CVD process forms a Cr diffusion layer.
【００１５】［請求項７］の発明は、請求項６におい
て、上記ＣＶＤ処理が、金属Ｃｒ粉末と焼結防止剤とを
重量比で３０／７０〜８０／２０となるような割合で混
合した混合物に塩化アンモニウム粉末を０．５重量％以
上添加したＣｒ発生源粉末とを、上記被処理材とＣｒ発
生源粉末との間にＮｉ又はセラミックの多孔質体からな
る中間材を介在させて上記被処理材とＣｒ発生源粉末と
が直接接触しない状態でＣＶＤ（化学気相蒸着）容器内
に装填し、該ＣＶＤ容器を閉鎖し、該容器内に残留する
空気を水素又は不活性ガスと置換した後、水素ガスを流
通させながら９００〜１２００℃に昇温し、同温度で１
５〜２５時間保持して被処理材表面にＣｒ拡散層を形成
させることを特徴とする。According to a seventh aspect of the present invention, in the sixth aspect, the CVD treatment comprises mixing the metal Cr powder and the sintering inhibitor in a ratio such that the weight ratio is 30/70 to 80/20. The Cr source powder obtained by adding 0.5% by weight or more of ammonium chloride powder to the mixture is mixed with the intermediate material composed of a porous body of Ni or ceramic between the material to be treated and the Cr source powder. The material to be processed is loaded into a CVD (chemical vapor deposition) container in a state where the material does not directly contact the Cr source powder, the CVD container is closed, and the air remaining in the container is replaced with hydrogen or an inert gas. After that, the temperature was raised to 900 to 1200 ° C. while flowing hydrogen gas, and
It is characterized in that a Cr diffusion layer is formed on the surface of the material to be processed by holding for 5 to 25 hours.
【００１６】［請求項８］の発明は、請求項１におい
て、上記ＣＶＤ処理がＡｌ拡散層を形成することを特徴
とする。The invention according to claim 8 is characterized in that, in claim 1, the CVD process forms an Al diffusion layer.
【００１７】［請求項９］の発明は、請求項８におい
て、上記ＣＶＤ処理が、ニッケル、クロム、コバルト、
アルミニウムのうち少なくとも２種を含むと共に、少な
くとも１種の希土類元素を添加した金属材料のコーティ
ングを施し、その後コーティング面にＡｌ拡散層を形成
させることを特徴とする。According to a ninth aspect of the present invention, in the ninth aspect of the present invention, the CVD treatment is performed using nickel, chromium, cobalt,
It is characterized in that a coating of a metal material containing at least two kinds of aluminum and to which at least one kind of rare earth element is added is applied, and then an Al diffusion layer is formed on the coated surface.
【００１８】[0018]
【発明の実施の形態】以下、本発明の実施形態を説明す
るが、本発明はこれに限定されるものではない。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described, but the present invention is not limited thereto.
【００１９】［第１の実施の形態］図１は本実施の形態
にかかるＣＶＤ−Ｃｒ処理マスキング方法の概略図であ
り、図２は該処理装置の概略図である。これらの図面に
示すように、ＣＶＤ−Ｃｒ処理装置は、ＣＶＤ−Ｃｒ容
器３１内に設けられたガス透過性の中間材（例えばポー
ラスニッケル等）３２を配してなると共に、該中間材３
２の内部にＮＨ4 とＣｒとＡｌ2 Ｏ3 とからなる粉末を
充填してなり、内部にＨ2 を供給し、内部をＨ2 ガス雰
囲気としている。そして、図示しない加熱手段により所
定の処理温度（９００〜１２００℃）で処理することで
金属Ｃｒが翼１１の表面に処理され、Ｃｒ拡散層を形成
している。[First Embodiment] FIG. 1 is a schematic view of a CVD-Cr processing masking method according to the present embodiment, and FIG. 2 is a schematic view of the processing apparatus. As shown in these drawings, the CVD-Cr processing apparatus is provided with a gas-permeable intermediate material (for example, porous nickel or the like) 32 provided in a CVD-Cr container 31 and the intermediate material 3.
2 is filled with a powder composed of NH 4 , Cr, and Al 2 O 3 , H 2 is supplied to the inside, and the inside is an H 2 gas atmosphere. Then, the metal Cr is processed on the surface of the blade 11 by performing processing at a predetermined processing temperature (900 to 1200 ° C.) by a heating unit (not shown) to form a Cr diffusion layer.
【００２０】この処理において、本実施の形態では、タ
ービン翼１４の基端部１２と翼根部１３との間に設けた
窪み部１５を、上記翼根部１３を覆うように設けた天板
２０から垂下するマスキング治具（Ｎｉ合金等）１６の
フランジ部１７で挟み込み、密着させると共に、該治具
１６と翼根部１３との間の空間部分に、マスキング微粒
子２１を充填し、翼根部１３全体を上記マスキング微粒
子２１で覆うようにすることで、ＣＶＤ−Ｃｒ処理の処
理ガスの侵入を防止するようにしている。In this process, in the present embodiment, the recess 15 provided between the base end 12 of the turbine blade 14 and the blade root 13 is moved from the top plate 20 provided so as to cover the blade root 13. A hanging masking jig (Ni alloy or the like) 16 is sandwiched and adhered by a flange portion 17, and a space between the jig 16 and the blade root portion 13 is filled with masking fine particles 21 to clean the entire blade root portion 13. By covering with the masking fine particles 21, the intrusion of the processing gas of the CVD-Cr processing is prevented.
【００２１】このように、被処理材であるタービン翼１
４はフランジ部により垂下されていると共に、上記マス
キング微粒子２１が充填されているので、窪み部１５と
翼根部１３とが密着すると共に、マスキング微粒子２１
が細密充填されているので、該マスキング微粒子２１に
より、ＣＶＤ処理ガスが翼根部１３の表面に接触するこ
とがないので、ＣＶＤ−Ｃｒ処理をしたい翼１１及び翼
基部１２には良好なＣｒ拡散層が形成されると共に、翼
根部１３には処理がなされないので、当該箇所の結晶粒
の粒界腐蝕が発生しないものとなる。As described above, the turbine blade 1 as the material to be treated is
4 is suspended by the flange portion and is filled with the masking fine particles 21, so that the dent portion 15 and the blade root portion 13 come into close contact with each other, and the masking fine particles 21
Is finely packed, the masking fine particles 21 do not allow the CVD processing gas to contact the surface of the blade root portion 13. Therefore, a favorable Cr diffusion layer is provided on the blade 11 and the blade base 12 where CVD-Cr processing is to be performed. Is formed and the blade root portion 13 is not treated, so that the grain boundary corrosion of the crystal grain at the portion does not occur.
【００２２】ここで、本発明で上記マスキング微粒子と
は、例えば高純度Ａｌ2 Ｏ3 ，ＳｉＣ，ＳｉＯ2 ，Ｓｉ
Ｎ，Ｃｒ2 Ｏ3 のいずれか一種を挙げることができる。Here, the masking fine particles in the present invention are, for example, high-purity Al 2 O 3 , SiC, SiO 2 , Si
Any one of N and Cr 2 O 3 can be mentioned.
【００２３】本発明で高純度とは、ＣＶＤ処理において
皮膜形成に有害な有害ガスの要因となる物質を含まない
微粒子をいう。特に、マスキング微粒子内には、塩化
物、有機物、鉛，亜鉛等の重金属の酸化物を全く含まな
いことがより好ましい。In the present invention, the term "high purity" refers to fine particles that do not contain a substance that causes a harmful gas that is harmful to film formation in a CVD process. In particular, it is more preferable that the masking fine particles do not contain chlorides, organic substances, and oxides of heavy metals such as lead and zinc at all.
【００２４】また、上記マスキング微粒子の粒径は、１
０〜１００μｍであることが好ましい。これは、１０μ
ｍよりも細かいと、微少な隙間からマスキング微粒子２
１がこぼれ落ち、ＣＶＤ−Ｃｒ処理する翼１１の表面に
該微粒子が付着してしまうことを防ぐためであり、一
方、１００μｍを超えるような場合には、充填効果が低
く、処理ガスが侵入してくるおそれがあるからである。
よって、より好適には、５０〜７０μｍとするのがよ
い。The particle size of the masking fine particles is 1
It is preferably from 0 to 100 μm. This is 10μ
If it is smaller than m, masking fine particles 2
This is to prevent the particles 1 from spilling and adhering to the surface of the blade 11 to be subjected to the CVD-Cr treatment. On the other hand, when the diameter exceeds 100 μm, the filling effect is low, and the processing gas enters. This is because it may come.
Therefore, it is more preferable that the thickness be 50 to 70 μm.
【００２５】なお、微粒子の粒径分布を調整して、フラ
ンジ部１７側の空間部内を細密充填できるような粒度分
布とする場合には、上記粒径分布に限定されるものでは
ない。In the case where the particle size distribution of the fine particles is adjusted to obtain a particle size distribution capable of closely filling the space on the flange portion 17 side, the present invention is not limited to the above particle size distribution.
【００２６】本発明で熱ＣＶＤ処理とは、特に限定され
るものではないが、タービン翼表面に良好な皮膜を形成
する方法として、例えばＣｒ拡散層を形成する熱ＣＶＤ
−Ｃｒ処理を挙げることができる。In the present invention, the thermal CVD treatment is not particularly limited. As a method for forming a good coating on the turbine blade surface, for example, a thermal CVD process for forming a Cr diffusion layer
-Cr treatment.
【００２７】上記ＣＶＤ処理の一例として、例えば金属
Ｃｒ粉末と焼結防止剤とを重量比で３０／７０〜８０／
２０となるような割合で混合した混合物に塩化アンモニ
ウム粉末を０．５重量％以上添加したＣｒ発生源粉末と
を、上記被処理材とＣｒ発生源粉末との間にＮｉ又はセ
ラミックの多孔質体からなる中間材を介在させて上記被
処理材とＣｒ発生源粉末とが直接接触しない状態でＣＶ
Ｄ（化学気相蒸着）容器内に装填し、該ＣＶＤ容器を閉
鎖し、該容器内に残留する空気を水素又は不活性ガスと
置換した後、水素ガスを流通させながら９００〜１２０
０℃に昇温し、同温度で１５〜２５時間保持して被処理
材表面にＣｒ拡散層を形成させるようにすればよい。こ
れにより、被処理材であるタービン翼１４の表面に良好
なＣｒ拡散層を形成することができる。このように、高
温でＣＶＤ処理するに際し、コーティング処理する部分
と非処理部分とを区別する場合において、本発明方法が
好適に適用することができる。As an example of the CVD process, for example, a metal Cr powder and a sintering inhibitor are mixed in a weight ratio of 30/70 to 80/80.
A mixture of a Cr source powder obtained by adding 0.5% by weight or more of ammonium chloride powder to a mixture obtained by mixing at a ratio of 20 to obtain a porous body of Ni or ceramic between the material to be treated and the Cr source powder. CV in a state where the material to be treated and the Cr source powder are not in direct contact with each other with an intermediate material made of
D (chemical vapor deposition) container, the CVD container is closed, and the air remaining in the container is replaced with hydrogen or an inert gas.
The temperature may be raised to 0 ° C. and maintained at the same temperature for 15 to 25 hours to form a Cr diffusion layer on the surface of the material to be treated. Thereby, a favorable Cr diffusion layer can be formed on the surface of the turbine blade 14 as the material to be processed. As described above, when performing a CVD process at a high temperature, the method of the present invention can be suitably applied when a portion to be coated is distinguished from a non-processed portion.
【００２８】また、上記ＣＶＤ−Ｃｒ処理以外の処理と
しては、特に限定されるものではなく、例えばＣＶＤ−
Ａｌ処理を挙げることができる。このＣＶＤ−Ａｌ処理
は、ニッケル、クロム、コバルト、アルミニウムのうち
少なくとも２種を含むと共に、少なくとも１種の希土類
元素を添加した金属材料のコーティングを施し、その後
アルミニウムのＡｌ拡散層を形成させるようにしたもの
である。The treatment other than the above-mentioned CVD-Cr treatment is not particularly limited.
Al treatment can be mentioned. This CVD-Al treatment includes coating of a metal material containing at least two of nickel, chromium, cobalt, and aluminum and adding at least one rare earth element, and then forming an aluminum diffusion layer of aluminum. It was done.
【００２９】この熱ＣＶＤ−Ａｌ処理の実施の形態を以
下に示す。An embodiment of this thermal CVD-Al treatment will be described below.
【００３０】［第２の実施の形態］図３は本実施の形態
にかかるＣＶＤ−Ａｌ処理装置の概略図である。図３に
示すように、ＣＶＤ−Ａｌ処理装置は、内部に溶融Ａｌ
容器５１を設けたＣＶＤ容器５２と、該ＣＶＤ容器内に
ＡｌＣｌ3 （ガス状）を供給するＡｌ反応容器５３とか
ら構成されてなり、ＨＣｌとＨ2 との混合ガス５４を上
記Ａｌ反応容器５３内に供給することで、ガス状のＡｌ
Ｃｌ3 を形成して、ＣＶＤ容器５１内へ供給し、所定温
度で加熱することで溶融Ａｌ容器５２からのＡｌとＡｌ
Ｃｌ3 とからＡｌ蒸気５５を形成して、翼の表面にＡｌ
拡散層をする。[Second Embodiment] FIG. 3 is a schematic diagram of a CVD-Al processing apparatus according to the present embodiment. As shown in FIG. 3, the CVD-Al processing apparatus has a molten Al
The CVD vessel 52 having a container 51, the CVD AlCl 3 will consist (gaseous) to the Al reaction vessel 53 into the container, HCl and the Al reaction vessel 53 a mixed gas 54 of H 2 To supply gaseous Al
Cl 3 is formed, supplied into the CVD vessel 51, and heated at a predetermined temperature, whereby Al and Al from the molten Al vessel 52 are heated.
Al vapor 55 is formed from Cl 3 and Al
Do the diffusion layer.
【００３１】この処理において、本実施の形態では、タ
ービン翼１４の基端部１２と翼根部１３との間に設けた
窪み部１５を、上記翼根部１３を覆うように設けた天板
２０から垂下するマスキング治具１６のフランジ部１７
で挟み込むと共に、該治具１６と翼根部１３との間の空
間部分に、マスキング微粒子２１を充填し、表面処理ガ
スの侵入を防止するようにしている。In this process, in the present embodiment, the recess 15 provided between the base end 12 of the turbine blade 14 and the blade root 13 is moved from the top plate 20 provided so as to cover the blade root 13. Flange 17 of hanging masking jig 16
And the space between the jig 16 and the blade root 13 is filled with fine masking particles 21 to prevent the surface treatment gas from entering.
【００３２】本発明によれば、空冷翼の表面にはＮｉ，
Ｃｒ，Ｃｏ，Ａｌのうち少なくとも２種を含むと共に、
少なくとも１種の希土類元素を含む溶射層又は蒸着層が
形成され、ついでこのコーティング層の表層にＣＶＤ−
Ａｌ法によってＡｌが拡散付与され、Ａｌ濃度が増加し
ているため、ガスタービンでの使用の際、高温腐食の進
行に伴うＡｌの消耗が補われ、従って高温耐食性が向上
する。According to the present invention, Ni, Ni,
Containing at least two of Cr, Co, and Al;
A thermal spray layer or a vapor deposition layer containing at least one rare earth element is formed, and then a CVD-
Since Al is diffused by the Al method and the Al concentration is increased, when used in a gas turbine, the consumption of Al due to the progress of high-temperature corrosion is compensated, and therefore, the high-temperature corrosion resistance is improved.
【００３３】なお、上記方法によれば、ＣＶＤ−Ａｌ処
理が高温において水素を含む雰囲気中で実施されるた
め、溶射層又は蒸着層中の相互拡散が進行すると共に、
基材との相互拡散を生じ、密着性にすぐれた均一組織と
なるなど、膜質が改善される。According to the above method, since the CVD-Al treatment is performed at a high temperature in an atmosphere containing hydrogen, the interdiffusion in the thermal sprayed layer or the vapor deposition layer proceeds, and
The film quality is improved, for example, mutual diffusion with the substrate occurs, resulting in a uniform structure having excellent adhesion.
【００３４】この処理において、本発明のようにマスキ
ング微粒子２１で非処理部である翼根部１３を処理する
ことがないので、、ＣＶＤ−Ａｌ処理をしたい翼１１及
び翼基部１２には良好なＡｌ拡散層が形成されると共
に、翼根部１３には処理がなされないので、当該箇所の
結晶粒の粒界腐蝕が発生しないものとなる。In this process, the non-processed blade root 13 is not treated with the masking fine particles 21 unlike the present invention, so that the blade 11 and the blade base 12 to be subjected to the CVD-Al treatment have good Al. Since the diffusion layer is formed and the blade root portion 13 is not treated, the grain boundary corrosion of the crystal grain at the portion does not occur.
【００３５】[0035]
【発明の効果】以上、説明したように本発明の［請求項
１］の発明によれば、被処理材の表面をＣＶＤ処理する
と共に、該被処理材の基端部に形成された根部を非処理
する処理方法であって、上記被処理材の基端部と根部と
の間に窪み部を形成し、被処理材を垂下させつつマスキ
ング治具のフランジ部で上記窪み部を挟み込むと共に、
該治具と根部との間の空間部分に、上記根部を覆うよう
にマスキング微粒子を充填して熱ＣＶＤ処理するので、
ＣＶＤ処理ガスの非処理部への侵入を防止することがで
きる。As described above, according to the first aspect of the present invention, the surface of the material to be treated is subjected to the CVD treatment, and the root formed at the base end of the material to be treated is removed. A non-processing method, wherein a dent portion is formed between a base end portion and a root portion of the material to be processed, and the dent portion is sandwiched between flange portions of a masking jig while hanging the material to be processed,
Since the space between the jig and the root portion is filled with masking fine particles so as to cover the root portion and subjected to the thermal CVD process,
It is possible to prevent the CVD processing gas from entering the non-processing portion.
【００３６】［請求項２］の発明は、請求項１におい
て、上記被処理材がタービン翼とするので、タービン翼
の根部の結晶粒の粒界腐蝕が防止される。According to a second aspect of the present invention, in the first aspect, since the material to be processed is a turbine blade, grain boundary corrosion of a crystal grain at a root portion of the turbine blade is prevented.
【００３７】［請求項３］の発明は、請求項１におい
て、上記マスキング微粒子が高純度のＡｌ2 Ｏ3 ，Ｓｉ
Ｃ，ＳｉＯ2 ，ＳｉＮ，Ｃｒ2 Ｏ3 のいずれか一種又は
これらの混合物であるので、良好なマスキング効果を発
揮する。According to a third aspect of the present invention, in the first aspect, the masking fine particles are high-purity Al 2 O 3 , Si
Since it is any one of C, SiO 2 , SiN, and Cr 2 O 3 or a mixture thereof, a good masking effect is exhibited.
【００３８】［請求項４］の発明は、請求項３におい
て、上記マスキング微粒子の粒径が、１０〜１００μｍ
であるので、マスキング部分を良好に覆うようにして処
理ガスの侵入を防ぐことができる。According to a fourth aspect of the present invention, in the third aspect, the masking fine particles have a particle size of 10 to 100 μm.
Therefore, it is possible to prevent the invasion of the processing gas by properly covering the masking portion.
【００３９】［請求項５］の発明は、請求項３におい
て、上記マスキング微粒子が、塩化物、有機物、鉛，亜
鉛等の重金属酸化物を含まないので、マスキング部分へ
の腐蝕を防止することできる。According to a fifth aspect of the present invention, in the third aspect, the masking fine particles do not contain chlorides, organic substances, and heavy metal oxides such as lead and zinc, so that corrosion of the masking portion can be prevented. .
【００４０】［請求項６］の発明は、請求項１におい
て、上記ＣＶＤ処理がＣｒ拡散層を形成するので、耐蝕
性の優れたコーティングを施すことができる。According to the invention of claim 6, in claim 1, the CVD treatment forms a Cr diffusion layer, so that a coating having excellent corrosion resistance can be applied.
【００４１】［請求項７］の発明は、請求項６におい
て、上記ＣＶＤ処理が、金属Ｃｒ粉末と焼結防止剤とを
重量比で３０／７０〜８０／２０となるような割合で混
合した混合物に塩化アンモニウム粉末を０．５重量％以
上添加したＣｒ発生源粉末とを、前記被処理材とＣｒ発
生源粉末との間にＮｉ又はセラミックの多孔質体からな
る中間材を介在させて前記被処理材とＣｒ発生源粉末と
が直接接触しない状態でＣＶＤ（化学気相蒸着）容器内
に装填し、該ＣＶＤ容器を閉鎖し、該容器内に残留する
空気を水素又は不活性ガスと置換した後、水素ガスを流
通させながら９００〜１２００℃に昇温し、同温度で１
５〜２５時間保持して被処理材表面にＣｒ拡散層を形成
させるので、処理前と同等の基材強度を保持しつつ表面
を耐蝕性のコーティング面を形成することができる。According to a seventh aspect of the present invention, in the sixth aspect, the CVD treatment comprises mixing the metal Cr powder and the sintering inhibitor in a weight ratio of 30/70 to 80/20. A Cr source powder obtained by adding 0.5% by weight or more of ammonium chloride powder to the mixture is provided by interposing an intermediate material made of Ni or ceramic porous material between the material to be treated and the Cr source powder. The material to be processed is loaded into a CVD (chemical vapor deposition) container in a state where the material does not directly contact the Cr source powder, the CVD container is closed, and the air remaining in the container is replaced with hydrogen or an inert gas. After that, the temperature was raised to 900 to 1200 ° C. while flowing hydrogen gas, and
Since the Cr diffusion layer is formed on the surface of the material to be processed by holding for 5 to 25 hours, it is possible to form a corrosion-resistant coating surface while maintaining the same substrate strength as before the treatment.
【００４２】［請求項８］の発明は、請求項１におい
て、上記ＣＶＤ処理がＡｌ拡散層を形成するので、耐蝕
性の優れたコーティングを施すことができる。According to the invention of claim 8, in claim 1, the CVD process forms an Al diffusion layer, so that a coating having excellent corrosion resistance can be applied.
【００４３】［請求項９］の発明は、請求項８におい
て、上記ＣＶＤ処理が、ニッケル、クロム、コバルト、
アルミニウムのうち少なくとも２種を含むと共に、少な
くとも１種の希土類元素を添加した金属材料のコーティ
ングを施し、その後コーティング面にＡｌ拡散層を形成
させるので、密着性に優れたＡｌ拡散層のコーティング
を施すことができる。According to a ninth aspect of the present invention, in the ninth aspect of the present invention, the CVD treatment is performed by using nickel, chromium, cobalt,
A coating of a metal material containing at least two kinds of aluminum and to which at least one rare earth element is added, and then an Al diffusion layer is formed on the coated surface, so that an Al diffusion layer having excellent adhesion is applied. be able to.
【図１】第１の実施の形態にかかるＣＶＤ−Ｃｒ処理の
概略図である。FIG. 1 is a schematic diagram of a CVD-Cr process according to a first embodiment.
【図２】第１の実施の形態にかかるＣＶＤ−Ｃｒ処理装
置の概略図である。FIG. 2 is a schematic diagram of a CVD-Cr processing apparatus according to the first embodiment.
【図３】第２の実施の形態にかかるＣＶＤ−Ａｌ処理の
概略図である。FIG. 3 is a schematic view of a CVD-Al process according to a second embodiment.
【図４】粒界腐蝕の概念図である。FIG. 4 is a conceptual diagram of grain boundary corrosion.
【図５】タービン翼の取付け状態を示す概略図である。FIG. 5 is a schematic view showing an attached state of a turbine blade.
１１ 翼 １２ 基端部 １３ 翼根部 １４ タービン翼 １５ 窪み部 ２０ 天板 １６ マスキング治具 １７ フランジ部 ２１ マスキング微粒子 ３１ ＣＶＤ−Ｃｒ容器 ３２ 中間材 ５１ ＣＶＤ−Ｃｒ容器 ５２ 溶融Ａｌ容器 ５３ Ａｌ反応容器 ５４ 混合ガス ５５ Ａｌ蒸気 11 Blade 12 Base End 13 Blade Root 14 Turbine Blade 15 Depression 20 Top 16 Masking Jig 17 Flange 21 Masking Fine Particle 31 CVD-Cr Container 32 Intermediate Material 51 CVD-Cr Container 52 Melted Al Container 53 Al Reaction Container 54 Mixed gas 55 Al vapor
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｆ０１Ｄ 5/28 Ｆ０１Ｄ 5/28 (72)発明者 山▲崎▼ 孝尚 滋賀県甲賀郡甲西町大池町８番地 日本カ ロライズ工業株式会社内 Ｆターム(参考） 3G002 EA05 EA06 4K030 AA03 BA02 BA05 BA06 BA14 CA02 DA05 FA10 LA11 4K044 AA06 AB02 AB10 BA02 BA10 BB03 BB10 BC02 CA04 CA11 CA12 CA14 CA44 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) F01D 5/28 F01D 5/28 (72) Inventor Yama ▲ saki ▼ Takanao 8 Oikecho, Kosai-cho, Koga-gun, Shiga Prefecture Address Nippon Karolize Kogyo Co., Ltd. F-term (reference) 3G002 EA05 EA06 4K030 AA03 BA02 BA05 BA06 BA14 CA02 DA05 FA10 LA11 4K044 AA06 AB02 AB10 BA02 BA10 BB03 BB10 BC02 CA04 CA11 CA12 CA14 CA44
Claims (9)
に、該被処理材の基端部に形成された根部を非処理する
処理方法であって、 上記被処理材の基端部と根部との間に窪み部を形成し、
被処理材を垂下させつつマスキング治具のフランジ部で
上記窪み部を挟み込むと共に、 該治具と根部との間の空間部分に、上記根部を覆うよう
にマスキング微粒子を充填し、 ＣＶＤ処理ガスの非処理部への侵入を防止することを特
徴とする熱ＣＶＤ処理方法。1. A processing method for performing a CVD process on a surface of a material to be processed and non-treating a root formed at a base end of the material to be processed, the method comprising: Form a depression between
While the material to be processed is hung, the recess is sandwiched between the flanges of the masking jig, and the space between the jig and the root is filled with masking fine particles so as to cover the root. A thermal CVD processing method for preventing intrusion into a non-processing portion.
ＶＤ処理方法。2. The heat C according to claim 1, wherein the material to be processed is a turbine blade.
VD processing method.
ＳｉＯ2 ，ＳｉＮ，Ｃｒ2 Ｏ3 のいずれか一種又はこれ
らの混合物であることを特徴とする熱ＣＶＤ処理方法。3. The method according to claim 1, wherein the masking fine particles are high-purity Al 2 O 3 , SiC,
A thermal CVD processing method characterized by being any one of SiO 2 , SiN, Cr 2 O 3 or a mixture thereof.
ることを特徴とする熱ＣＶＤ処理方法。4. The thermal CVD method according to claim 3, wherein the particle size of the masking fine particles is 10 to 100 μm.
の重金属酸化物を含まないことを特徴とする熱ＣＶＤ処
理方法。5. The thermal CVD method according to claim 3, wherein the masking fine particles do not contain chlorides, organic substances, and heavy metal oxides such as lead and zinc.
る熱ＣＶＤ処理方法。6. The thermal CVD processing method according to claim 1, wherein said CVD processing forms a Cr diffusion layer.
比で３０／７０〜８０／２０となるような割合で混合し
た混合物に塩化アンモニウム粉末を０．５重量％以上添
加したＣｒ発生源粉末とを、上記被処理材とＣｒ発生源
粉末との間にＮｉ又はセラミックの多孔質体からなる中
間材を介在させて上記被処理材とＣｒ発生源粉末とが直
接接触しない状態でＣＶＤ（化学気相蒸着）容器内に装
填し、該ＣＶＤ容器を閉鎖し、該容器内に残留する空気
を水素又は不活性ガスと置換した後、水素ガスを流通さ
せながら９００〜１２００℃に昇温し、同温度で１５〜
２５時間保持して被処理材表面にＣｒ拡散層を形成させ
ることを特徴とする熱ＣＶＤ処理方法。7. The method according to claim 6, wherein the CVD treatment comprises adding a mixture of a metal Cr powder and a sintering inhibitor in a weight ratio of 30/70 to 80/20 by adding ammonium chloride powder to the mixture. 0.5 wt% or more of the Cr source powder and the intermediate material made of a porous body of Ni or ceramic interposed between the target material and the Cr source powder, Charged in a CVD (chemical vapor deposition) container without direct contact with the powder, closed the CVD container, replaced air remaining in the container with hydrogen or an inert gas, and then passed hydrogen gas The temperature is raised to 900 to 1200 ° C.
A thermal CVD processing method, wherein a Cr diffusion layer is formed on the surface of the material to be processed by holding for 25 hours.
る熱ＣＶＤ処理方法。8. The thermal CVD method according to claim 1, wherein said CVD process forms an Al diffusion layer.
ミニウムのうち少なくとも２種を含むと共に、少なくと
も１種の希土類元素を添加した金属材料のコーティング
を施し、その後コーティング面にＡｌ拡散層を形成させ
ることを特徴とする熱ＣＶＤ処理方法。9. The method according to claim 8, wherein the CVD process includes applying a coating of a metal material containing at least two of nickel, chromium, cobalt, and aluminum, and adding at least one rare earth element. Forming an Al diffusion layer on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000228750A JP3785028B2 (en) | 2000-07-28 | 2000-07-28 | Thermal CVD processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000228750A JP3785028B2 (en) | 2000-07-28 | 2000-07-28 | Thermal CVD processing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002047567A true JP2002047567A (en) | 2002-02-15 |
| JP3785028B2 JP3785028B2 (en) | 2006-06-14 |
Family
ID=18721984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000228750A Expired - Fee Related JP3785028B2 (en) | 2000-07-28 | 2000-07-28 | Thermal CVD processing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3785028B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004308009A (en) * | 2003-04-02 | 2004-11-04 | General Electric Co <Ge> | Method of applying environmental and bond coatings to turbine flowpath parts |
| JP2007506859A (en) * | 2003-07-11 | 2007-03-22 | エムテーウー・アエロ・エンジンズ・ゲーエムベーハー | Method and apparatus for forming a corrosion-resistant and oxidation-resistant coating layer, and a component having such a coating layer |
| JP2007508449A (en) * | 2003-10-11 | 2007-04-05 | エムティーユー エアロ エンジンズ ゲーエムベーハー | Local aluminizing, siliconizing or chromizing method for metal parts |
| JP2007146295A (en) * | 2005-11-28 | 2007-06-14 | Howmet Corp | Method of forming different aluminide-diffusion coating on different surface regions of a superalloy substrate, superalloy substrate on which coating is formed and gas turbine engine component on which coating is formed |
| JP2014224305A (en) * | 2013-03-13 | 2014-12-04 | ハウメット コーポレイションＨｏｗｍｅｔ Ｃｏｒｐｏｒａｔｉｏｎ | Maskant used for aluminizing turbine component |
| CN115491634A (en) * | 2022-09-20 | 2022-12-20 | 国营川西机器厂 | Device for preparing aluminized layer in inner cavity of blade of aero-engine |
-
2000
- 2000-07-28 JP JP2000228750A patent/JP3785028B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004308009A (en) * | 2003-04-02 | 2004-11-04 | General Electric Co <Ge> | Method of applying environmental and bond coatings to turbine flowpath parts |
| JP2007506859A (en) * | 2003-07-11 | 2007-03-22 | エムテーウー・アエロ・エンジンズ・ゲーエムベーハー | Method and apparatus for forming a corrosion-resistant and oxidation-resistant coating layer, and a component having such a coating layer |
| JP2007508449A (en) * | 2003-10-11 | 2007-04-05 | エムティーユー エアロ エンジンズ ゲーエムベーハー | Local aluminizing, siliconizing or chromizing method for metal parts |
| JP2007146295A (en) * | 2005-11-28 | 2007-06-14 | Howmet Corp | Method of forming different aluminide-diffusion coating on different surface regions of a superalloy substrate, superalloy substrate on which coating is formed and gas turbine engine component on which coating is formed |
| JP2014224305A (en) * | 2013-03-13 | 2014-12-04 | ハウメット コーポレイションＨｏｗｍｅｔ Ｃｏｒｐｏｒａｔｉｏｎ | Maskant used for aluminizing turbine component |
| CN115491634A (en) * | 2022-09-20 | 2022-12-20 | 国营川西机器厂 | Device for preparing aluminized layer in inner cavity of blade of aero-engine |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3785028B2 (en) | 2006-06-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6022632A (en) | Low activity localized aluminide coating | |
| EP1790753B1 (en) | Duplex gas phase coating | |
| EP2060653B1 (en) | Slurry diffusion aluminide coating composition and process | |
| US8147982B2 (en) | Porous protective coating for turbine engine components | |
| US20090134035A1 (en) | Method for forming platinum aluminide diffusion coatings | |
| EP2253464A2 (en) | Graded platinum diffusion aluminide coating | |
| JP4615677B2 (en) | Method for controlling the thickness and aluminum content of diffusion aluminide coatings | |
| JPH11172463A (en) | Aluminide diffusion coating system of superalloy | |
| JPH09176818A (en) | Method for coating metallic member with metal adhering layer for thermally sprayed ceramic thermally insulating layer and metal adhered layer | |
| WO1999018259A1 (en) | Thermal barrier coating with alumina bond inhibitor | |
| EP1445345A1 (en) | Aluminide coating of gas turbine engine blade | |
| US20080166589A1 (en) | Component having a coating | |
| Li et al. | Effect of water vapour on morphology of the Si/Ti-rich phase at the interface between oxide layer and aluminide coating | |
| JP2002047567A (en) | Thermal cvd treatment method | |
| US6485792B1 (en) | Endurance of NiA1 coatings by controlling thermal spray processing variables | |
| RU2276699C2 (en) | Method for applying on metallic substrate aluminide coating containing reactive element | |
| US20090035485A1 (en) | Method for forming active-element aluminide diffusion coatings | |
| EP2808418B1 (en) | Method for manufacturing gas turbine blade | |
| Dai et al. | Effect of the anti-seepage masking layer on the microstructure evolution of Ni-based superalloy during co-deposition of the Al-Si coating | |
| US20040115467A1 (en) | Method for protecting a surface with a silicon-containing diffusion coating | |
| US20090136664A1 (en) | Method for forming aluminide diffusion coatings | |
| RU2452791C2 (en) | METHOD OF PRODUCING COATING FROM CUBIC BODY-CENTERED NICKEL ALUMINIDE (NiAl) WITH CONTROLLED THICKNESS ON NICKEL-BASED ALLOY SURFACE | |
| Strakov et al. | Advanced chemical vapor aluminizing technology: co-deposition process and doped aluminized coatings | |
| Nikzad et al. | Mechanism of Al-Si codeposition on In738LC through single-step diffusion process | |
| Dai et al. | Study of Anti-Seepage Protective Coatings on the Microstructure Evolution of Ni-Based Superalloy Gh4169 During Co-Deposited Al-Si Coatings |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050614 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050628 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050826 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051108 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051209 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060221 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060316 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100324 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110324 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110324 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120324 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130324 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140324 Year of fee payment: 8 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |