JP2002043451A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2002043451A
JP2002043451A JP2000222340A JP2000222340A JP2002043451A JP 2002043451 A JP2002043451 A JP 2002043451A JP 2000222340 A JP2000222340 A JP 2000222340A JP 2000222340 A JP2000222340 A JP 2000222340A JP 2002043451 A JP2002043451 A JP 2002043451A
Authority
JP
Japan
Prior art keywords
semiconductor element
light
light receiving
resin
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000222340A
Other languages
Japanese (ja)
Inventor
Hisanao Horikawa
久直 堀川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000222340A priority Critical patent/JP2002043451A/en
Publication of JP2002043451A publication Critical patent/JP2002043451A/en
Pending legal-status Critical Current

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  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device that is small, light, and thin, and where resin does not infiltrate into a light receiving part of a semiconductor element and thus light receiving characteristics are not deteriorated. SOLUTION: This device comprises the semiconductor element 1 where the light receiving part 2 is equipped at a center region of a lower surface and an electrode 5 is formed at a peripheral region of the lower surface, a transparent member 3 where an outline dimension is larger than the light receiving part 2 and smaller than the lower surface of the semiconductor element 1, and a wiring board 7 where a through-hole is equipped which aperture dimension is larger than the transparent member 3 and smaller than the lower surface of the semiconductor element 1, and an electrode pad is equipped at a periphery of the through-hole of a top surface corresponding to the electrode 5. The transparent member 3 is attached to the lower surface of the semiconductor element 1 so as to cover the light receiving part 2, the transparent member 3 is inserted into the through hole, and the electrode 5 of the semiconductor element 1 and the electrode pad of the wiring board 7 are connected by using a conductive member so as to locate the lower surface of the member 3 within the through- hole.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、フォトダイオー
ド,ラインセンサ,イメージセンサ等の受光素子である
半導体素子またはこれらの受光部を有する半導体素子を
具備した半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device which is a light receiving element such as a photodiode, a line sensor, an image sensor or the like or a semiconductor device provided with a semiconductor element having these light receiving portions.

【0002】[0002]

【従来の技術】従来のフォトダイオード(PD),ライ
ンセンサ,イメージセンサ等の受光素子である半導体素
子またはこれらの受光部を有する半導体素子を具備した
半導体装置は、以下のように構成されていた。セラミッ
クス等から成り半導体素子を載置する底板としての基体
と、セラミックス等から成り基体の周縁部に半導体素子
を囲繞するように設けられた枠体とから構成される容器
本体の内部に半導体素子を載置して接着固定し、半導体
素子の電極と基体上面の外部接続用の電極パッドとを基
体上面に設けられたメタライズ層等で接続し、枠体上面
の外形と略同形状のガラス等から成る蓋体を枠体上部に
載置し樹脂により封止することによって作製される。
2. Description of the Related Art A conventional semiconductor device having a light receiving element such as a photodiode (PD), a line sensor, and an image sensor or a semiconductor device having a semiconductor element having these light receiving portions is configured as follows. . The semiconductor element is placed inside a container body composed of a base made of ceramics or the like as a bottom plate on which the semiconductor element is placed, and a frame made of ceramics or the like provided around the periphery of the base so as to surround the semiconductor element. Placed and bonded and fixed, the electrode of the semiconductor element and the electrode pad for external connection on the upper surface of the substrate are connected by a metallized layer or the like provided on the upper surface of the substrate, and a glass or the like having substantially the same shape as the outer shape of the upper surface of the frame body It is produced by placing the lid having the above structure on the upper part of the frame and sealing it with resin.

【0003】上記半導体装置をより小型軽量化および薄
型化するために様々な構造が提案されている。
Various structures have been proposed in order to make the semiconductor device smaller and lighter and thinner.

【0004】例えば、従来例1として、端子が設けられ
たガラス基板と、ガラス基板面上に離隔し、撮像面のマ
イクロレンズを対向させて搭載、配置された固体撮像素
子と、固体撮像素子端子およびガラス基板端子間を電気
的に接続するバンプと、対向する固体撮像素子のマイク
ロレンズ面およびガラス基板面間に空間を形成しながら
固体撮像素子周面部を一体的に封止する樹脂層とを具備
することにより、マイクロレンズ面に異材質が直接接触
することを回避する構成を採ることができ、マイクロレ
ンズ機能が常時十分に確保され、また組み立てが簡易化
されて生産性の高いものとなるというものが提案されて
いる(特開平7−231074号公報参照)。
For example, as a conventional example 1, a solid-state image pickup device in which a glass substrate provided with terminals, a microlens on an image pickup surface which is spaced apart on the glass substrate surface, and mounted and arranged facing each other, and a solid-state image pickup device terminal And a bump that electrically connects between the glass substrate terminals and a resin layer that integrally seals the peripheral surface of the solid-state imaging device while forming a space between the microlens surface and the glass substrate surface of the opposed solid-state imaging device. By providing the microlens surface, it is possible to adopt a configuration in which a different material is prevented from coming into direct contact with the microlens surface, the microlens function is always sufficiently ensured, the assembly is simplified, and the productivity is increased. (See Japanese Patent Application Laid-Open No. 7-231074).

【0005】また、従来例2として、PD,ラインセン
サ,イメージセンサ等の受光素子を有する半導体素子に
対して、ガラス,石英,サファイア,透明樹脂等の透光
性部材を、半導体素子の受光部表面との間に空間が形成
されるように半導体素子の受光部エリアにのみ配設し
て、受光部エリアを封止することにより、小型軽量化を
図ることができ、封止樹脂の受光部エリアへの侵入を防
止することができるものが提案されている(特開平11
−26782号公報参照)。
As a second conventional example, a light-transmitting member such as glass, quartz, sapphire, or transparent resin is used for a light-receiving portion of a semiconductor element, with respect to a semiconductor element having a light-receiving element such as a PD, a line sensor, and an image sensor. By arranging only in the light receiving area of the semiconductor element so that a space is formed between the light receiving area and the surface, and sealing the light receiving area, the size and weight can be reduced, and the light receiving section of the sealing resin can be achieved. One that can prevent intrusion into an area has been proposed (Japanese Patent Laid-Open No.
-26882).

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記の
従来例1においては、半導体素子とガラス基板とを電気
的に接続する電極端子をガラス基板上に設けており、こ
の電極端子は薄膜形成法等によって形成されパターン加
工されるので、電極端子をパターン加工する際のエッチ
ング液によってガラス基板の表面が侵されたり、受光部
エリアの上方に位置するガラス部分に端子を形成する薄
膜金属層が残ったりして、受光特性が劣化するという問
題が発生し易いものであった。また、ガラス基板に端子
を形成する工程が長いので、ガラス基板の表面にキズが
ついたり、異物が付着したり、誤って割ってしまったり
と製造するうえでの歩留まりが悪いという問題もあっ
た。
However, in the above-mentioned conventional example 1, an electrode terminal for electrically connecting the semiconductor element and the glass substrate is provided on the glass substrate, and this electrode terminal is formed by a thin film forming method or the like. Is formed and patterned, so that the surface of the glass substrate is attacked by an etchant when patterning the electrode terminals, or a thin film metal layer that forms the terminals remains in the glass portion located above the light receiving area. As a result, the problem that the light receiving characteristic deteriorates is likely to occur. In addition, since the process of forming the terminals on the glass substrate is long, the surface of the glass substrate is scratched, a foreign substance is attached, or the glass substrate is broken by mistake. .

【0007】他方、上記の従来例2においては、半導体
素子の受光部エリアにのみ透光性部材を配設して、受光
部エリアをポリイミド、エポキシ樹脂、フェノール樹脂
等の合成樹脂によって封止することが提案されている
が、この場合塗布された封止樹脂が毛管現象により受光
部エリアに侵入し、受光部エリアの一部が封止樹脂で覆
われて、受光特性が劣化するという問題が発生し易いも
のであった。また、半導体素子の受光部エリア上方に配
設された透光性部材の側面方向から光が入射して受光特
性が劣化したり、透光性部材が配設された半導体素子を
使用する際、誤って透光性部材の表面にキズがついた
り、異物が付着したりするという問題が発生し易いもの
であった。さらには、半導体素子を配線(端子)を施し
たガラス、石英、サファイアまたは透明樹脂等の透光性
部材にAu、ハンダ等を介して電気的に接続することが
提案されているが、透光性部材に配線を形成する際、従
来例1の場合と同様の問題が発生し易いものであった。
On the other hand, in the above conventional example 2, a light transmitting member is provided only in the light receiving area of the semiconductor element, and the light receiving area is sealed with a synthetic resin such as polyimide, epoxy resin or phenol resin. However, in this case, there is a problem that the applied sealing resin penetrates into the light receiving portion area by a capillary phenomenon, and a part of the light receiving portion area is covered with the sealing resin, thereby deteriorating light receiving characteristics. It was easy to occur. Further, when light enters from the side direction of the light-transmitting member disposed above the light-receiving portion area of the semiconductor element to deteriorate light receiving characteristics, or when a semiconductor element provided with the light-transmitting member is used, The problem that the surface of the translucent member is erroneously scratched or a foreign matter adheres easily is likely to occur. Furthermore, it has been proposed to electrically connect a semiconductor element to a light-transmitting member such as glass, quartz, sapphire, or transparent resin provided with wiring (terminals) via Au, solder, or the like. When the wiring is formed on the conductive member, the same problem as in the case of Conventional Example 1 is likely to occur.

【0008】従って、本発明は上記事情に鑑みて完成さ
れたものであり、その目的は、電極端子を施したガラス
等の透明性部材を用いずに小型軽量化および薄型化が達
成される半導体装置を提供するとともに、封止樹脂が半
導体素子の受光部エリアに侵入して受光特性が劣化する
のを防止し、透光性部材の側面方向から入射される光を
防止し、かつ透明性部材にキズがついたり、異物が付着
したりすることを防止することにある。
Accordingly, the present invention has been completed in view of the above circumstances, and an object of the present invention is to realize a semiconductor which can be reduced in size, weight and thickness without using a transparent member such as glass provided with electrode terminals. In addition to providing a device, it is possible to prevent a sealing resin from entering a light receiving portion area of a semiconductor element and to deteriorate light receiving characteristics, prevent light incident from a side direction of a light transmitting member, and a transparent member. An object of the present invention is to prevent scratches and foreign matter from adhering to the surface.

【0009】[0009]

【課題を解決するための手段】本発明の半導体装置は、
下面の中央領域に受光部が設けられ、かつ前記下面の周
辺領域に電極が形成された半導体素子と、外形寸法が前
記受光部よりも大きく前記半導体素子の下面よりも小さ
い透光性部材と、開口寸法が前記透光性部材よりも大き
く前記半導体素子の下面よりも小さい貫通孔が設けら
れ、かつ上面の前記貫通孔の周囲に前記電極に対応させ
て電極パッドが設けられた配線基板とを具備して成り、
前記半導体素子の下面に前記透光性部材を前記受光部を
覆うようにして取着するとともに、前記貫通孔に前記透
光性部材を挿入してその下面が前記貫通孔内に位置する
ように前記半導体素子の電極と前記配線基板の電極パッ
ドとを導電性部材で接続したことを特徴とする。
According to the present invention, there is provided a semiconductor device comprising:
A light-receiving portion is provided in a central region of the lower surface, and a semiconductor element in which an electrode is formed in a peripheral region of the lower surface; a translucent member whose outer dimensions are larger than the light-receiving portion and smaller than the lower surface of the semiconductor element; A through-hole having an opening dimension larger than the translucent member and smaller than the lower surface of the semiconductor element, and a wiring board provided with an electrode pad corresponding to the electrode around the through-hole on the upper surface; Comprising
The light-transmitting member is attached to the lower surface of the semiconductor element so as to cover the light-receiving portion, and the light-transmitting member is inserted into the through hole so that the lower surface is located in the through hole. An electrode of the semiconductor element and an electrode pad of the wiring board are connected by a conductive member.

【0010】本発明は、上記の構成により、半導体装置
を半導体素子と配線基板の総厚みと略同じ厚みになるよ
うにして作製できるため、きわめて小型軽量で薄型の半
導体装置と成し得る。また、透光性部材を取り囲むよう
に配置された配線基板によって、透光性部材の側面方向
から入射される光を防ぐことができる。
According to the present invention, since the semiconductor device can be manufactured so as to have substantially the same thickness as the total thickness of the semiconductor element and the wiring board, the semiconductor device can be made extremely small, light and thin. Further, the wiring board arranged so as to surround the light transmitting member can prevent light incident from the side surface direction of the light transmitting member.

【0011】また、紫外線硬化性樹脂により透光性部材
を半導体素子の下面に接着する場合、紫外線硬化性樹脂
は塗布後直ちに硬化させることができるため、半導体素
子の受光部に侵入するのを防ぐことができる。従って、
紫外線硬化性樹脂が半導体素子の受光部エリアに侵入し
て受光特性が劣化するのを防止し得、半導体素子接続用
の別個の枠体等を作製し配置する必要もないので、低コ
ストに製造でき、組み立ての作業性も良好となる。
Further, when the translucent member is adhered to the lower surface of the semiconductor element with the ultraviolet curable resin, the ultraviolet curable resin can be cured immediately after the application, so that it is prevented from entering the light receiving portion of the semiconductor element. be able to. Therefore,
It is possible to prevent the ultraviolet curable resin from entering the light receiving portion area of the semiconductor element and to deteriorate the light receiving characteristic, and it is not necessary to manufacture and arrange a separate frame for connecting the semiconductor element, thereby manufacturing at low cost. The workability of the assembly can be improved.

【0012】本発明において、好ましくは、前記透光性
部材の下面と前記配線基板の下面側の前記貫通孔の開口
との間隔を0.01〜2mmとしたことを特徴とする。
これにより、半導体装置を透光性部材を下方に向けた状
態で配置しても、透光性部材は配線基板の厚さの範囲内
にその下面が開口の下端に達しないように配置されてい
るため、透光性部材にキズがついたり、異物が付着した
りすることを防ぐことができる。
In the present invention, preferably, the distance between the lower surface of the translucent member and the opening of the through hole on the lower surface side of the wiring board is set to 0.01 to 2 mm.
Thus, even when the semiconductor device is arranged with the light-transmitting member facing downward, the light-transmitting member is arranged within the range of the thickness of the wiring board so that its lower surface does not reach the lower end of the opening. Therefore, it is possible to prevent the light-transmissive member from being scratched or from adhering foreign matter.

【0013】[0013]

【発明の実施の形態】本発明の半導体装置について以下
に説明する。図1の(A)、(B)は、本発明の半導体
装置の断面図および下面図である。同図において、1は
フォトダイオード(PD),ラインセンサ,イメージセ
ンサ,CCD(Charge Coupled Device),EPRO
M(Erasable Programmable ROM)等の受光素子で
ある半導体素子またはこれらの受光部を有する半導体素
子、2は半導体素子の受光部、3はガラス,石英,サフ
ァイア,透明樹脂等から成る透光性部材、4は、アクリ
ル系樹脂,エポキシ系樹脂,シリコーン系樹脂,ポリエ
ーテルアミド系樹脂等から成る紫外線硬化性樹脂であ
る。この紫外線硬化性樹脂は、熱硬化性も有する併用型
のものであってもよい。5は半導体素子1に形成された
電極、6は半導体素子1の電極5と配線基板7の電極パ
ッドとを接続する導電性部材としての導体バンプであ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A semiconductor device according to the present invention will be described below. 1A and 1B are a cross-sectional view and a bottom view of a semiconductor device of the present invention. In FIG. 1, reference numeral 1 denotes a photodiode (PD), a line sensor, an image sensor, a CCD (Charge Coupled Device), and an EPRO.
A semiconductor element which is a light receiving element such as an M (Erasable Programmable ROM) or a semiconductor element having these light receiving sections, 2 is a light receiving section of a semiconductor element, 3 is a light transmitting member made of glass, quartz, sapphire, transparent resin, etc. Reference numeral 4 denotes an ultraviolet curable resin made of an acrylic resin, an epoxy resin, a silicone resin, a polyetheramide resin, or the like. The ultraviolet curable resin may be a combination type having thermosetting properties. Reference numeral 5 denotes an electrode formed on the semiconductor element 1, and reference numeral 6 denotes a conductive bump as a conductive member that connects the electrode 5 of the semiconductor element 1 and an electrode pad of the wiring board 7.

【0014】本発明において、半導体素子1は、下面の
中央領域に受光部2が設けられており、その下面の周辺
領域には入出力用の電極5が形成されている。
In the present invention, the semiconductor element 1 is provided with a light receiving portion 2 in a central region on the lower surface, and an input / output electrode 5 is formed in a peripheral region on the lower surface.

【0015】透光性部材3は、受光部2を覆うように、
下面の受光部2の外周側において紫外線硬化性樹脂4に
より接着されて取着されており、外光を透過させる窓部
および蓋体として機能する。この透光性部材3の外形寸
法は、半導体素子1の受光部2よりも大きく半導体素子
1の下面よりも小さいものであり、その形状は、主面が
平面状とされた平板状に限らず、レンズ状に加工された
ものでもよい。透光性部材3の厚さは0.3〜1.0m
m程度が良く、0.3mm未満では、強度が小さいため
組み立て中に破損したり、樹脂封止によって反りが発生
し取り込んだ画像が歪むという問題が発生し易い。1.
0mmを超えると、小型軽量化および薄型化が成されず
実用性が低下する。
The translucent member 3 covers the light receiving section 2 so as to cover the light receiving section 2.
The lower surface of the light receiving section 2 is bonded and attached to the outer periphery of the light receiving section 2 with an ultraviolet curable resin 4 and functions as a window and a cover for transmitting external light. The outer dimensions of the translucent member 3 are larger than the light receiving portion 2 of the semiconductor element 1 and smaller than the lower surface of the semiconductor element 1, and the shape thereof is not limited to a flat plate having a main surface made flat. It may be processed into a lens shape. The thickness of the translucent member 3 is 0.3 to 1.0 m
If m is less than 0.3 mm, the strength is low, so that problems such as breakage during assembly and warping due to resin sealing and distortion of the captured image are likely to occur. 1.
When the thickness exceeds 0 mm, the size and weight and the thickness are not reduced, and the practicality is reduced.

【0016】また、透光性部材3の材料としては、光透
過率、製造のし易さ、化学的安定性、強度等の点で、ソ
ーダガラス等のガラス、プラスチック、サファイア(ア
ルミナの単結晶)、石英等が好ましい。
The light-transmitting member 3 may be made of glass such as soda glass, plastic, or sapphire (single crystal of alumina) in terms of light transmittance, ease of production, chemical stability, strength, and the like. ), Quartz and the like are preferred.

【0017】紫外線硬化性樹脂4の高さによって規定さ
れる、半導体素子1と透光性部材3との間隔は0.01
〜0.5mmが好ましく、0.01mm未満では、例え
ば受光部2のマイクロレンズに接触するといった不具合
を生じるおそれがあり、0.5mmを超えると、小型
化、薄型化が成されず実用性が低下する。
The distance between the semiconductor element 1 and the translucent member 3, which is defined by the height of the ultraviolet curable resin 4, is 0.01.
The thickness is preferably 0.5 mm or less, and if it is less than 0.01 mm, a problem such as contact with the microlens of the light receiving unit 2 may occur. descend.

【0018】また、紫外線硬化性樹脂4は、黒色、黒灰
色、茶色、褐色、黒褐色、濃緑色、濃青色、青緑色、濃
紫色、暗赤色等の暗色系に着色されているのがよく、こ
の場合染料、顔料等を紫外線硬化性樹脂4に混入させる
ことで容易に暗色系とし得る。このように、紫外線硬化
性樹脂4を暗色系とすることで、紫外線硬化性樹脂4の
表面における光の反射、散乱を抑制することができる。
The UV-curable resin 4 is preferably colored in a dark color such as black, black-gray, brown, brown, black-brown, dark green, dark blue, blue-green, dark purple, or dark red. In this case, a dark color system can be easily obtained by mixing a dye, a pigment and the like into the ultraviolet curable resin 4. As described above, by making the ultraviolet curable resin 4 a dark color, reflection and scattering of light on the surface of the ultraviolet curable resin 4 can be suppressed.

【0019】顔料としては、カーボン,チタン,酸化
鉄、またはこれらの2種以上の混合物がよく、この場合
黒色の顔料となり、最も光吸収性に富むものとなる。紫
外線硬化性樹脂4の全固形成分に対する顔料の含有量は
0.1〜50重量%がよく、0.1重量%未満では着色
が困難となり、50重量%を超えると紫外線硬化性樹脂
4に照射される紫外線が顔料により遮断されて紫外線硬
化性樹脂4の硬化が困難となる。また、カーボン等の導
電性粒子の場合その導電性粒子にアクリル樹脂等をコー
ティングしたものを用いることもできる。また、アルミ
ナ等の粒子を用いることもでき、これはCr等を混入す
ることで濃紫色とし得る。
As the pigment, carbon, titanium, iron oxide, or a mixture of two or more thereof is preferable. In this case, the pigment becomes a black pigment and has the highest light absorption. The content of the pigment with respect to the total solid components of the UV-curable resin 4 is preferably 0.1 to 50% by weight. If the content is less than 0.1% by weight, coloring becomes difficult. If the content exceeds 50% by weight, the UV-curable resin 4 is irradiated. The ultraviolet rays to be blocked are blocked by the pigment, and it becomes difficult to cure the ultraviolet curable resin 4. In the case of conductive particles of carbon or the like, those obtained by coating the conductive particles with an acrylic resin or the like can also be used. Further, particles of alumina or the like can be used, which can be made dark purple by mixing Cr or the like.

【0020】また、顔料用の粒子の平均粒径は約0.0
5〜約1μmがよく、0.05μm未満では粒子が凝集
して分散性が低下し易くなる。1μmを超えると、粒子
間の隙間が大きくなり、また紫外線が粒子で遮断され易
くなり、紫外線硬化性樹脂4の硬化性および接着性が低
下し易くなる。
The average particle size of the pigment particles is about 0.0
The thickness is preferably from 5 to about 1 μm, and if it is less than 0.05 μm, the particles aggregate and the dispersibility tends to decrease. If it exceeds 1 μm, the gap between the particles becomes large, the ultraviolet rays are easily blocked by the particles, and the curability and adhesiveness of the ultraviolet-curable resin 4 are easily reduced.

【0021】紫外線硬化性樹脂4の明度、彩度、光透過
性に関しては、全くの黒色等に着色すると紫外線が粒子
で遮断され易くなり、紫外線硬化性樹脂4の硬化性が低
下する。従って、半透過性にしたものや茶色系に着色し
たものが、紫外線硬化性樹脂4の硬化性を阻害しない点
で好ましい。
Regarding the lightness, chroma, and light transmittance of the ultraviolet curable resin 4, if the resin is colored completely black or the like, ultraviolet rays are easily blocked by the particles, and the curability of the ultraviolet curable resin 4 decreases. Therefore, those made semi-transparent or colored brown are preferable in that they do not impair the curability of the ultraviolet-curable resin 4.

【0022】また、染料を用いる場合、ゼラチン,グリ
ュー,ガゼイン等の天然樹脂あるいはアミン変性ポリビ
ニルアルコール等の合成樹脂から成る染色基材を酸性染
料等の染料で染色して、それを紫外線硬化性樹脂4に混
入させることにより着色し得る。
When a dye is used, a dye base made of a natural resin such as gelatin, glue or casein or a synthetic resin such as an amine-modified polyvinyl alcohol is dyed with a dye such as an acid dye, and the dye is then cured with an ultraviolet curable resin. 4 can be colored.

【0023】さらには、紫外線硬化性樹脂4の表面の光
の反射、散乱を抑制するために、艶消し剤を含有させて
もよい。
Further, a matting agent may be contained in order to suppress the reflection and scattering of light on the surface of the ultraviolet curable resin 4.

【0024】配線基板7は、開口寸法が透光性部材3の
主面の外形寸法より大きく半導体素子1の下面の外形寸
法より小さい貫通孔を具備しており、この貫通孔に透光
性部材3を挿入してその下面が貫通孔内に位置するよう
に配置する。また、半導体素子1に形成された電極5
と、配線基板7の上面の貫通孔の周囲に電極5に対応さ
せて設けられた電極パッドとを、半田等から成る導体バ
ンプ6で接続することによって、半導体素子1と配線基
板7とが電気的に接続される。
The wiring board 7 has a through hole having an opening size larger than the outer size of the main surface of the light transmitting member 3 and smaller than the outer size of the lower surface of the semiconductor element 1. 3 is inserted so that the lower surface thereof is located in the through hole. Also, the electrode 5 formed on the semiconductor element 1
The semiconductor element 1 and the wiring board 7 are electrically connected by connecting the electrode pads provided around the through holes on the upper surface of the wiring board 7 so as to correspond to the electrodes 5 by conductor bumps 6 made of solder or the like. Connected.

【0025】配線基板7には、アルミナ(Al23)セ
ラミックス,ムライト(3Al23・2SiO2)セラ
ミックス等のセラミックス材料、ガラスセラミックス材
料等の無機材料、または四ふっ化エチレン樹脂(ポリテ
トラフルオロエチレン;PTFE),四ふっ化エチレン
・エチレン共重合樹脂(テトラフルオロエチレン−エチ
レン共重合樹脂;ETFE),四ふっ化エチレン・パー
フルオロアルコキシエチレン共重合樹脂(テトラフルオ
ロエチレン−パーフルテロアルキルビニルエーテル共重
合樹脂;PFA)等のフッ素樹脂,ガラスエポキシ樹
脂,ビスマレイドトリアジン樹脂,ポリイミド等の樹脂
系材料が使用できる。
The wiring substrate 7 is made of a ceramic material such as alumina (Al 2 O 3 ) ceramic, mullite (3Al 2 O 3 .2SiO 2 ) ceramic, an inorganic material such as a glass ceramic material, or an ethylene tetrafluoride resin (polyethylene). Tetrafluoroethylene; PTFE), ethylene tetrafluoride / ethylene copolymer resin (tetrafluoroethylene-ethylene copolymer resin; ETFE), ethylene tetrafluoride / perfluoroalkoxyethylene copolymer resin (tetrafluoroethylene-perfluteroalkyl) Resin-based materials such as vinyl ether copolymer resin (PFA), fluorine resin, glass epoxy resin, bismaleid triazine resin, and polyimide can be used.

【0026】配線基板7の厚みは0.3mm〜3mm程
度が良く、0.3mmm未満では、配線基板7の強度が
小さくなり、組み立て中に破損したりする問題が生じや
すい。3mmを超えると、小型軽量化および薄型化が成
されず実用性が低下する。
The thickness of the wiring board 7 is preferably about 0.3 mm to 3 mm. If the thickness is less than 0.3 mm, the strength of the wiring board 7 is reduced, and the problem of breakage during assembly is likely to occur. When it exceeds 3 mm, the size and weight and the thickness are not reduced, and the practicality is reduced.

【0027】電極5は、Al、Ni、Pd、Pt、T
i、Cr、Au、AgまたはCu等のうち少なくとも1
種を含む金属または合金等から成り、各種の薄膜形成
法、メッキ法、メタライズ法等により形成される。
The electrode 5 is made of Al, Ni, Pd, Pt, T
at least one of i, Cr, Au, Ag, Cu, etc.
It is made of a metal or alloy containing seeds, and is formed by various thin film forming methods, plating methods, metallizing methods, and the like.

【0028】また、電極5と配線基板7とは、Auまた
はPb−Snハンダ等の金属バンプ、導電性樹脂、また
は異方性導電性樹脂等からなる導体バンプ6等の導電性
部材によって、電気的に接続される。
The electrode 5 and the wiring board 7 are electrically connected to each other by a conductive member such as a metal bump such as Au or Pb-Sn solder, or a conductive bump 6 made of a conductive resin or an anisotropic conductive resin. Connected.

【0029】本発明において、透光性部材3の下面と配
線基板7の下面側の貫通孔の開口(下端)との間隔を
0.01〜2mmとすることが好ましい。0.01mm
未満では、透光性部材3にキズがついたり、異物が付着
したりする問題が発生する傾向にあり、2mmを超える
と、受光部2に入射される光量が少なくなって、暗い画
像になってしまう。
In the present invention, the distance between the lower surface of the light transmitting member 3 and the opening (lower end) of the through hole on the lower surface side of the wiring board 7 is preferably 0.01 to 2 mm. 0.01mm
If the distance is less than 2 mm, there is a tendency that a problem occurs such that the light transmitting member 3 is scratched or a foreign substance adheres. If the distance exceeds 2 mm, the amount of light incident on the light receiving section 2 decreases, resulting in a dark image. Would.

【0030】また、本発明の半導体装置は、母基板に貫
通孔を有する配線基板7領域を多数個作製しておき、そ
の後透光性部材3を接着した半導体素子1を各貫通孔部
に実装し、最後にダイシング法等により個々の半導体装
置に切断し分割してもよい。
Further, in the semiconductor device of the present invention, a large number of wiring board 7 regions having through holes in the mother board are prepared, and then the semiconductor element 1 to which the translucent member 3 is adhered is mounted in each through hole portion. Finally, the semiconductor device may be cut and divided into individual semiconductor devices by a dicing method or the like.

【0031】さらに、半導体素子1と配線基板7との接
合強度を補うために、電極5と導体バンプ6と電極パッ
ドとの接合部と、その接合部の周囲の半導体素子1と配
線基板7の一部を覆って、フェノール系樹脂、シリコー
ン系樹脂、アクリル系樹脂、ポリエーテルアミド系樹
脂、尿素樹脂、メラミン樹脂、ポリエステル樹脂、エポ
キシ系樹脂、ケイ素樹脂、フタル酸ジアリル、またはポ
リウレタン等の熱硬化性樹脂を塗布し硬化させてもよ
い。
Further, in order to supplement the bonding strength between the semiconductor element 1 and the wiring board 7, a joint between the electrode 5, the conductor bump 6 and the electrode pad, and a connection between the semiconductor element 1 and the wiring board 7 around the joint are provided. Partly covered, thermosetting of phenolic resin, silicone resin, acrylic resin, polyetheramide resin, urea resin, melamine resin, polyester resin, epoxy resin, silicon resin, diallyl phthalate, or polyurethane The conductive resin may be applied and cured.

【0032】かくして、本発明は、半導体素子と配線基
板の総厚みと略同じ厚みに形成できるため、きわめて小
型軽量で薄型の半導体装置と成し得る。また、透光性部
材を取り囲むように配置された、好ましくは暗色系の配
線基板によって、透光性部材の側面方向から入射される
余分な外光を防ぐことができる。また、紫外線硬化性樹
脂により透光性部材を接着する場合、紫外線硬化性樹脂
の塗布後直ちに硬化させることができるため、半導体素
子の受光部にそれが侵入するのを防ぐことができる。従
って、紫外線硬化性樹脂が半導体素子の受光部エリアに
侵入して受光特性が劣化するのを防止し得、透光性部材
を半導体素子に接着するために別個の枠体等を作製し配
置する必要もないので、低コストに製造でき、組み立て
の作業性も良好となる。
As described above, the present invention can be formed to have a thickness substantially equal to the total thickness of the semiconductor element and the wiring board, so that a very small, light and thin semiconductor device can be obtained. In addition, an extraneous external light incident from the side of the light-transmitting member can be prevented by the wiring board of a dark color, which is arranged so as to surround the light-transmitting member. Further, when the translucent member is bonded with the ultraviolet curable resin, it can be cured immediately after the application of the ultraviolet curable resin, so that it can be prevented from entering the light receiving portion of the semiconductor element. Therefore, it is possible to prevent the ultraviolet curable resin from entering the light receiving portion area of the semiconductor element and to deteriorate the light receiving characteristic, and to prepare and arrange a separate frame or the like for bonding the light transmitting member to the semiconductor element. Since there is no necessity, it can be manufactured at low cost, and the workability of assembly is improved.

【0033】なお、本発明は上記実施形態に限定される
ものではなく、本発明の要旨を逸脱しない範囲内におい
て種々の変更を行なうことは何等差し支えない。
It should be noted that the present invention is not limited to the above embodiment, and that various changes may be made without departing from the spirit of the present invention.

【0034】例えば、上記実施形態では、図1(B)に
示すように、半導体素子1の形状は略長方形、略正方形
等の方形状であり、透光性部材3の形状および配線基板
7の貫通孔も方形状であるが、これらは方形状に限ら
ず、多角形状、円形状、長円形状等の種々の形状として
も構わない。また、配線基板7は全体が暗色系である必
要はなく、透明樹脂基板等の透明基板の場合、少なくと
も貫通孔の周囲を所定の幅で暗色系に着色したものとし
てもよい。
For example, in the above embodiment, as shown in FIG. 1B, the shape of the semiconductor element 1 is a rectangular shape such as a substantially rectangular shape or a substantially square shape. The through holes are also rectangular, but they are not limited to squares, and may be various shapes such as polygonal, circular, and elliptical. Further, the wiring substrate 7 does not need to be entirely of a dark color system, and in the case of a transparent substrate such as a transparent resin substrate, at least the periphery of the through hole may be colored with a predetermined width in a dark color system.

【0035】[0035]

【発明の効果】本発明は、下面の中央領域に受光部が設
けられ、かつ下面の周辺領域に電極が形成された半導体
素子と、外形寸法が受光部よりも大きく半導体素子の下
面よりも小さい透光性部材と、開口寸法が透光性部材よ
りも大きく半導体素子の下面よりも小さい貫通孔が設け
られ、かつ上面の貫通孔の周囲に電極に対応させて電極
パッドが設けられた配線基板とを具備して成り、半導体
素子の下面に透光性部材を受光部を覆うようにして取着
するとともに、貫通孔に透光性部材を挿入してその下面
が貫通孔内に位置するように半導体素子の電極と配線基
板の電極パッドとを導電性部材で接続したことにより、
半導体装置を半導体素子と配線基板の総厚みと略同じ厚
みにして作製できるため、きわめて小型軽量で薄型の半
導体装置と成る。また、透光性部材を取り囲むように配
置された配線基板によって、透光性部材の側面方向から
入射する外光を防ぐことができる。また、紫外線硬化性
樹脂により透光性部材を半導体素子に接着する場合、紫
外線硬化性樹脂は塗布後直ちに硬化させることができ、
半導体素子の受光部にそれが侵入するのを防ぐことがで
きる。従って、紫外線硬化性樹脂が半導体素子の受光部
エリアに侵入して受光特性が劣化するのを防止し得、透
光性部材の接着のために別個の枠体等を作製し配置する
必要もないので、低コストに製造でき、組み立ての作業
性も良好となる。
According to the present invention, there is provided a semiconductor device in which a light receiving portion is provided in a central region of a lower surface and an electrode is formed in a peripheral region of the lower surface, wherein the outer dimensions are larger than the light receiving portion and smaller than the lower surface of the semiconductor device. A wiring board in which a translucent member, a through-hole having an opening dimension larger than the translucent member and smaller than the lower surface of the semiconductor element, and an electrode pad corresponding to the electrode are provided around the through-hole on the upper surface; A light-transmitting member is attached to the lower surface of the semiconductor element so as to cover the light-receiving portion, and the light-transmitting member is inserted into the through hole so that the lower surface is located in the through hole. By connecting the electrode of the semiconductor element and the electrode pad of the wiring board with a conductive member,
Since the semiconductor device can be manufactured to have a thickness substantially equal to the total thickness of the semiconductor element and the wiring substrate, an extremely small, lightweight, and thin semiconductor device can be obtained. Further, the wiring board arranged so as to surround the translucent member can prevent external light from entering from the side of the translucent member. Further, when the light-transmitting member is bonded to the semiconductor element with the ultraviolet-curable resin, the ultraviolet-curable resin can be cured immediately after application,
It is possible to prevent the semiconductor element from entering the light receiving portion. Therefore, it is possible to prevent the ultraviolet curable resin from entering the light receiving portion area of the semiconductor element and to deteriorate the light receiving characteristic, and it is not necessary to prepare and arrange a separate frame or the like for bonding the translucent member. Therefore, it can be manufactured at low cost, and the workability of assembling is improved.

【0036】本発明において、好ましくは、透光性部材
の下面と配線基板の下面側の貫通孔の開口との間隔を
0.01〜2mmとしたことにより、半導体装置を透光
性部材を下方に向けた状態で他の透明基板や各種装置に
配置しても、透光性部材はその下面が配線基板の貫通孔
の下端に達しないように配置されているため、透光性部
材にキズがついたり、異物が付着したりすることを防ぐ
ことができる。
In the present invention, preferably, the distance between the lower surface of the translucent member and the opening of the through hole on the lower surface side of the wiring substrate is set to 0.01 to 2 mm, so that the semiconductor device can be moved downward. Even if the light-transmitting member is placed on another transparent substrate or various devices in the state of facing the light-transmitting member, the lower surface of the light-transmitting member is arranged so as not to reach the lower end of the through hole of the wiring board, so that the light-transmitting member is scratched And adhesion of foreign matter can be prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)、(B)は、本発明の半導体装置の断面
図および下面図である。
1A and 1B are a cross-sectional view and a bottom view of a semiconductor device of the present invention.

【符号の説明】[Explanation of symbols]

1:半導体素子 2:受光部 3:透光性部材 4:紫外線硬化性樹脂 5:電極 6:導体バンプ 7:配線基板 1: semiconductor element 2: light receiving part 3: translucent member 4: ultraviolet curable resin 5: electrode 6: conductive bump 7: wiring board

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】下面の中央領域に受光部が設けられ、かつ
前記下面の周辺領域に電極が形成された半導体素子と、
外形寸法が前記受光部よりも大きく前記半導体素子の下
面よりも小さい透光性部材と、開口寸法が前記透光性部
材よりも大きく前記半導体素子の下面よりも小さい貫通
孔が設けられ、かつ上面の前記貫通孔の周囲に前記電極
に対応させて電極パッドが設けられた配線基板とを具備
して成り、前記半導体素子の下面に前記透光性部材を前
記受光部を覆うようにして取着するとともに、前記貫通
孔に前記透光性部材を挿入してその下面が前記貫通孔内
に位置するように前記半導体素子の電極と前記配線基板
の電極パッドとを導電性部材で接続したことを特徴とす
る半導体装置。
A semiconductor device having a light receiving portion provided in a central region of a lower surface and an electrode formed in a peripheral region of the lower surface;
A light-transmitting member having an outer dimension larger than the light-receiving portion and smaller than the lower surface of the semiconductor element; and a through-hole having an opening dimension larger than the light-transmitting member and smaller than the lower surface of the semiconductor element; And a wiring substrate provided with electrode pads corresponding to the electrodes around the through hole. The light transmitting member is attached to the lower surface of the semiconductor element so as to cover the light receiving portion. And inserting the translucent member into the through-hole and connecting the electrode of the semiconductor element and the electrode pad of the wiring board with a conductive member such that the lower surface thereof is located in the through-hole. Characteristic semiconductor device.
【請求項2】前記透光性部材の下面と前記配線基板の下
面側の前記貫通孔の開口との間隔を0.01〜2mmと
したことを特徴とする請求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein the distance between the lower surface of the light-transmitting member and the opening of the through hole on the lower surface side of the wiring board is 0.01 to 2 mm.
JP2000222340A 2000-07-24 2000-07-24 Semiconductor device Pending JP2002043451A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000222340A JP2002043451A (en) 2000-07-24 2000-07-24 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000222340A JP2002043451A (en) 2000-07-24 2000-07-24 Semiconductor device

Publications (1)

Publication Number Publication Date
JP2002043451A true JP2002043451A (en) 2002-02-08

Family

ID=18716595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000222340A Pending JP2002043451A (en) 2000-07-24 2000-07-24 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2002043451A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737292B2 (en) * 2002-05-27 2004-05-18 Samsung Electro-Mechanics Co., Ltd. Method of fabricating an image sensor module at the wafer level and mounting on circuit board
JP2005056999A (en) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd Solid-state image pickup device and its manufacturing method
EP1699082A1 (en) * 2005-03-02 2006-09-06 Sharp Kabushiki Kaisha Solid-state image sensing device
JP2008199031A (en) * 2007-02-15 2008-08-28 Robert Bosch Gmbh Component element assembly
US7692720B2 (en) 2003-08-01 2010-04-06 Fujifilm Corporation Solid-state imaging device and method for manufacturing the same
US8233064B2 (en) 2007-12-03 2012-07-31 Sharp Kabushiki Kaisha Solid-state image pickup apparatus, method of manufacturing the same, and electronic device including the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737292B2 (en) * 2002-05-27 2004-05-18 Samsung Electro-Mechanics Co., Ltd. Method of fabricating an image sensor module at the wafer level and mounting on circuit board
JP2005056999A (en) * 2003-08-01 2005-03-03 Fuji Photo Film Co Ltd Solid-state image pickup device and its manufacturing method
US7688382B2 (en) 2003-08-01 2010-03-30 Fujifilm Corporation Solid-state imaging device and method for manufacturing the same
US7692720B2 (en) 2003-08-01 2010-04-06 Fujifilm Corporation Solid-state imaging device and method for manufacturing the same
JP4551638B2 (en) * 2003-08-01 2010-09-29 富士フイルム株式会社 Method for manufacturing solid-state imaging device
EP1699082A1 (en) * 2005-03-02 2006-09-06 Sharp Kabushiki Kaisha Solid-state image sensing device
KR100808962B1 (en) * 2005-03-02 2008-03-04 샤프 가부시키가이샤 Solid-state image sensing device
JP2008199031A (en) * 2007-02-15 2008-08-28 Robert Bosch Gmbh Component element assembly
US8233064B2 (en) 2007-12-03 2012-07-31 Sharp Kabushiki Kaisha Solid-state image pickup apparatus, method of manufacturing the same, and electronic device including the same

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