JP2002040223A - Holding member for objective body to be heated and heating furnace using the same - Google Patents

Holding member for objective body to be heated and heating furnace using the same

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Publication number
JP2002040223A
JP2002040223A JP2000221892A JP2000221892A JP2002040223A JP 2002040223 A JP2002040223 A JP 2002040223A JP 2000221892 A JP2000221892 A JP 2000221892A JP 2000221892 A JP2000221892 A JP 2000221892A JP 2002040223 A JP2002040223 A JP 2002040223A
Authority
JP
Japan
Prior art keywords
heated
heating furnace
holding member
heating
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000221892A
Other languages
Japanese (ja)
Other versions
JP2002040223A5 (en
Inventor
Tomonori Yamada
智紀 山田
Isao Narita
勲 成田
Tetsuo Suzuki
哲男 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP2000221892A priority Critical patent/JP2002040223A/en
Publication of JP2002040223A publication Critical patent/JP2002040223A/en
Publication of JP2002040223A5 publication Critical patent/JP2002040223A5/ja
Pending legal-status Critical Current

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  • Optical Filters (AREA)
  • Resistance Heating (AREA)
  • Furnace Charging Or Discharging (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a holding member for the objective body to be heated so as not to leave transfer traces on the objective body to be heated, and to provide a heating furnace. SOLUTION: The holding member is used to hold the objective body to be heated when the objective body is heated by using a heating source, and the holding member has <=2.0 mm2 cross section S1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液晶ディスプレイ
用カラーフィルター(以下、カラーフィルターと称す)
の製造工程等の製造工程において、基板をホットプレー
ト(以下、HPと称す)に近接させて熱処理を行うHP
式加熱炉のプロキシミティピン(以下、プロキシピンと
称す)として用いると、特に好適な被加熱体保持部材お
よびそれを用いた加熱炉に関するものである。
The present invention relates to a color filter for a liquid crystal display (hereinafter referred to as a color filter).
In a manufacturing process such as a manufacturing process, a heat treatment is performed by bringing a substrate close to a hot plate (hereinafter, referred to as an HP).
Particularly, the present invention relates to a member to be heated which is suitably used when used as a proximity pin (hereinafter, referred to as a proxy pin) of a heating furnace and a heating furnace using the same.

【0002】[0002]

【従来の技術】カラーフィルターの製造工程では、基板
上に顔料などで着色したポジ型またはネガ型の感光性樹
脂、あるいは着色した非感光性樹脂の上に感光性樹脂を
積層状態に塗布し、これを加熱炉によって乾燥、硬化さ
せた後にフォトリソグラフィー法によって所望のパター
ンに加工する方法が主流となっている。また、フォトリ
ソグラフィー加工後の基板表面にオーバーコート剤を塗
布し、乾燥、硬化させることも多く、カラーフィルター
製造工程では加熱炉による乾燥、硬化工程が重要な位置
を占めている。
2. Description of the Related Art In the process of producing a color filter, a photosensitive resin is coated in a laminated state on a positive or negative photosensitive resin colored with a pigment or the like on a substrate, or on a colored non-photosensitive resin. After drying and hardening this in a heating furnace, a method of processing it into a desired pattern by photolithography has become mainstream. In many cases, an overcoat agent is applied to the surface of the substrate after photolithography processing, dried and cured, and the drying and curing steps using a heating furnace occupy an important position in the color filter manufacturing process.

【0003】加熱炉の種類としては、HP方式、熱風オ
ーブン方式、真空乾燥方式など様々な方法があり、樹脂
の種類や目的に応じて適宜選択される。
There are various types of heating furnaces, such as an HP system, a hot air oven system, and a vacuum drying system, and are appropriately selected depending on the type and purpose of the resin.

【0004】HP方式は、電熱ヒーター等で加熱したプ
レート上に直接、もしくは、プレート上に設置したプロ
キシピン等の治具上に被加熱体を保持し、主にHPから
の輻射伝熱によって被加熱体を加熱する方式である。
In the HP system, the object to be heated is held directly on a plate heated by an electric heater or the like or on a jig such as a proxy pin installed on the plate, and is mainly heated by radiant heat transfer from the HP. This is a method of heating a heating body.

【0005】熱風オーブン方式は、電熱ヒーター等で加
熱した熱風を加熱炉内で循環させ、炉内に保持した被加
熱体を主に対流伝熱により加熱する方式である。
[0005] The hot-air oven system is a system in which hot air heated by an electric heater or the like is circulated in a heating furnace, and an object to be heated held in the furnace is heated mainly by convection heat transfer.

【0006】真空乾燥方式は、真空チャンバー内に乾燥
を要する物体を保持し、チャンバー内を減圧することに
よって、溶媒の気化を促進させる乾燥方式である。
[0006] The vacuum drying method is a drying method in which an object requiring drying is held in a vacuum chamber and the inside of the chamber is decompressed to promote the evaporation of the solvent.

【0007】しかしながら、従来の加熱炉では以下に示
すような問題点がみられた。
However, the conventional heating furnace has the following problems.

【0008】すなわち、加熱炉で被加熱体を加熱する
と、被加熱体中に被加熱体を保持する保持部に、被加熱
体保持部材の転写痕を生じ、製品品位の低下が問題とな
っていた。
That is, when the object to be heated is heated in the heating furnace, a transfer mark of the member to be heated is generated in the holding portion for holding the object to be heated in the object to be heated. Was.

【0009】ここで、転写痕とは、被加熱体に近接もし
くは接触した物体の形状が、被加熱体上に目視で確認で
きるムラとして残ったもののことであり、物体が近接も
しくは接触した部分とそれ以外の部分で被加熱体中に温
度差を生じることから発現する。
[0009] Here, the transfer mark means that the shape of an object approaching or in contact with the object to be heated remains as unevenness that can be visually confirmed on the object to be heated. It appears because a temperature difference occurs in the heated body in other parts.

【0010】転写痕を生じるメカニズムを、ガラス基板
上に塗布した樹脂層をHP方式加熱炉で加熱する工程を
例にとって説明する。
[0010] The mechanism of generating transfer marks will be described by taking, as an example, a step of heating a resin layer applied on a glass substrate in an HP heating furnace.

【0011】HP式加熱炉の場合、プロキシピンは雰囲
気温度より高温のHPに直接取り付けられているため、
プロキシピン温度が雰囲気温度より高温になりやすい。
被加熱体は、高温となったプロキシピンと接触するた
め、プロキシピンと接触している部分と接触していない
部分で温度差を生じ、この温度差に起因して被加熱体で
ある樹脂層が局部的に流動する。局部的に流動した樹脂
層が硬化することにより、均一であった膜面に膜厚分布
が生じ、この膜厚分布が転写痕として残る。
In the case of the HP type heating furnace, the proxy pin is directly attached to the HP at a temperature higher than the ambient temperature.
The proxy pin temperature is likely to be higher than the ambient temperature.
Since the object to be heated comes into contact with the proxy pin, which has become hot, a temperature difference occurs in a portion that is in contact with the portion that is not in contact with the proxy pin, and the resin layer that is the object to be heated is locally caused by the temperature difference. Fluid. When the locally flowing resin layer hardens, a film thickness distribution is formed on the uniform film surface, and this film thickness distribution remains as a transfer mark.

【0012】液晶ディスプレイ用カラーフィルターの場
合、例えば、赤色に着色した樹脂層を加熱する際に転写
痕を生じると、液晶ディスプレイで赤色表示する際に該
当部分に転写痕が表示され、全面均一な赤色表示ができ
ないという問題があった。
In the case of a color filter for a liquid crystal display, for example, when a transfer mark is generated when heating a resin layer colored in red, the transfer mark is displayed in a corresponding portion when displaying a red color on the liquid crystal display, and the entire surface is uniform. There was a problem that red display was not possible.

【0013】転写痕対策として、特開平8−23643
1号公報では、昇降自在な第2のHPを具備し、第2の
HPが被加熱体である基板全面に接触することで局部的
な温度勾配をなくす方法が提案されている。しかしなが
ら、第2のHPを具備することは装置のコスト高につな
がるだけでなく、部材の熱膨張を伴う加熱炉内でHPの
水平を保ち昇降するのは困難であった。
As measures against transfer marks, Japanese Patent Application Laid-Open No. 8-23643
No. 1 proposes a method of providing a second HP that can be moved up and down, and eliminating a local temperature gradient by bringing the second HP into contact with the entire surface of the substrate that is the object to be heated. However, the provision of the second HP not only increases the cost of the apparatus, but also makes it difficult to keep the HP horizontal and move it up and down in a heating furnace with thermal expansion of the members.

【0014】特開平8−69962号公報、特開平8−
279548号公報では、プロキシピンの抜け対策と同
時に、プロキシピン材質としてポリイミド樹脂等の合成
樹脂を用い、かつ、プロキシピンと被加熱体の接触面積
を0.008〜0.2mm2とすることで、基板面の温
度分布の不均一性の度合いをレジスト感度に悪影響を与
えない程度にまで下げることができることを提案してい
る。しかしながら、塗布装置の高スループット化のため
に塗液の粘度を低くすると、局所的な温度勾配による塗
液の流動が起こりやすくなり、プロキシピンと被加熱体
の接触面積を前記の範囲にすることだけでは、転写痕は
防止できなかった。
JP-A-8-69962 and JP-A-8-69962
In 279548, at the same time as the measure for removing the proxy pin, a synthetic resin such as a polyimide resin is used as the proxy pin material, and the contact area between the proxy pin and the object to be heated is set to 0.008 to 0.2 mm 2 . It proposes that the degree of non-uniformity of the temperature distribution on the substrate surface can be reduced to a level that does not adversely affect the resist sensitivity. However, when the viscosity of the coating liquid is reduced for the purpose of increasing the throughput of the coating apparatus, the flow of the coating liquid due to a local temperature gradient is likely to occur, and the contact area between the proxy pin and the object to be heated only falls within the above range. Did not prevent transfer marks.

【0015】[0015]

【発明が解決しようとする課題】本発明はかかる従来技
術の欠点を改良し、被加熱体中に被加熱体を保持する被
加熱体保持部材の転写痕が生じることを防止し、転写痕
による製品品位の低下を生じない被加熱体保持部材およ
び加熱炉を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned drawbacks of the prior art, and prevents transfer marks of a member to be heated holding a member to be heated from being formed in the object to be heated. It is an object of the present invention to provide a heated object holding member and a heating furnace that do not cause deterioration in product quality.

【0016】[0016]

【課題を解決するための手段】上記目的を達成する本発
明の被加熱体保持部材、加熱炉、およびカラーフィルタ
ーの製造方法は以下のとおりである。 (1)加熱源を用いて被加熱体を加熱するに際して該被
加熱体を保持する保持部材であって、該保持部材の断面
積S1 が2.0mm2 以下であることを特徴とする被加
熱体保持部材。 (2)熱伝導率が、0.25kcal/m hr ℃以
下であることを特徴とする前記(1)に記載の被加熱体
保持部材。 (3)構造がパイプ状構造であることを特徴とする前記
(1)〜(2)のいずれかに記載の被加熱体保持部材。 (4)パイプ状構造の外径Dと内径dの差が0.1〜
0.3mmであることを特徴とする前記(3)に記載の
被加熱体保持部材。 (5)パイプ状構造の外径Dが4.4mm以下であるこ
とを特徴とする前記(3)〜(4)のいずれかに記載の
被加熱体保持部材。 (6)パイプ状構造を形成する材質が耐熱性樹脂である
こと特徴とする前記(3)〜(5)のいずれかに記載の
被加熱体保持部材。 (7)耐熱性樹脂が、ポリイミド樹脂であることを特徴
とする前記(6)に記載の被加熱体保持部材。 (8)前記(1)〜(7)のいずれかに記載の被加熱体
保持部材を用いたことを特徴とする加熱炉。 (9)加熱炉の構造が、加熱源を有するホットプレート
と、該ホットプレートの対向側に設置した反射板との空
隙を被加熱体が通過することにより被加熱体を加熱する
構造であることを特徴とする前記(8)に記載の加熱
炉。 (10)被加熱体保持部材がホットプレート上に設置さ
れたプロキシピンであることを特徴とする前記(9)に
記載の加熱炉。 (11)加熱炉の構造が、加熱源により熱せられた熱風
がチャンバー内を循環することによりチャンバー内の被
加熱体を加熱する、いわゆる熱風オーブン式であること
を特徴とする前記(8)に記載の加熱炉。 (12)被加熱体が透明基体であることを特徴とする前
記(8)〜(11)のいずれかに記載の加熱炉。 (13)被加熱体がガラス基板であることを特徴とする
前記(8)〜(11)のいずれかに記載の加熱炉。 (14)被加熱体が液晶ディスプレイ用基体であること
を特徴とする前記(8)〜(11)のいずれかに記載の
加熱炉。 (15)被加熱体がカラーフィルターであることを特徴
とする前記(8)〜(11)のいずれかに記載の加熱
炉。 (16)前記(8)〜(15)のいずれかに記載の加熱
炉を使用することを特徴とするカラーフィルターの製造
方法。
A method for manufacturing a member to be heated, a heating furnace, and a color filter according to the present invention, which achieves the above objects, is as follows. (1) A holding member for holding the the heated body when heating materials using a heat source, the characterized in that the cross-sectional area S 1 of the holding member is 2.0 mm 2 or less Heated body holding member. (2) The heated member holding member according to (1), wherein the thermal conductivity is 0.25 kcal / m hr ° C or less. (3) The member-to-be-heated holding member according to any one of (1) and (2), wherein the structure is a pipe-like structure. (4) The difference between the outer diameter D and the inner diameter d of the pipe-shaped structure is 0.1 to
The heated object holding member according to the above (3), which is 0.3 mm. (5) The heated member holding member according to any one of (3) to (4), wherein the outer diameter D of the pipe-shaped structure is 4.4 mm or less. (6) The heated member holding member according to any one of (3) to (5), wherein the material forming the pipe-shaped structure is a heat-resistant resin. (7) The heated member holding member according to (6), wherein the heat-resistant resin is a polyimide resin. (8) A heating furnace using the member-to-be-heated held member according to any one of (1) to (7). (9) The heating furnace has a structure in which the object to be heated is heated by passing the object through a gap between a hot plate having a heating source and a reflection plate provided on the opposite side of the hot plate. The heating furnace according to the above (8), characterized in that: (10) The heating furnace according to (9), wherein the heated object holding member is a proxy pin installed on a hot plate. (11) The above-mentioned (8), wherein the structure of the heating furnace is of a so-called hot-air oven type in which hot air heated by a heating source circulates in the chamber to heat a body to be heated in the chamber. The heating furnace as described. (12) The heating furnace according to any of (8) to (11), wherein the object to be heated is a transparent substrate. (13) The heating furnace according to any one of (8) to (11), wherein the object to be heated is a glass substrate. (14) The heating furnace according to any one of (8) to (11), wherein the object to be heated is a substrate for a liquid crystal display. (15) The heating furnace according to any one of (8) to (11), wherein the object to be heated is a color filter. (16) A method for producing a color filter, comprising using the heating furnace according to any one of (8) to (15).

【0017】[0017]

【発明の実施の形態】次に本発明の好ましい実施の形態
について説明する。
Next, a preferred embodiment of the present invention will be described.

【0018】被加熱体保持部材の断面積S1 は、2.0
mm2 以下、好ましくは1.0mm 2 以下、さらに好ま
しくは0.7mm2 以下である。断面積S1 が2.0m
2より大きいと、加熱源から被加熱体保持部材を通じ
て、被加熱体保持部材と被加熱体の接触部への熱移動が
大きくなり、被加熱体に転写痕が生じるようになる。実
施例、比較例に示すとおり、断面積S1 が3.1mm2
では転写痕が発現し、断面積S1 が1.0mm2 では厚
膜に塗布した場合のみ転写痕が発現し、薄膜に塗布した
場合は転写痕が発現しなかった。断面積S1 が0.7m
2 以下では、テストした全ての膜厚水準で転写痕が発
現しなかった。
Sectional area S of heated member holding member1Is 2.0
mmTwoBelow, preferably 1.0 mm TwoLess preferred
Or 0.7mmTwoIt is as follows. Cross-sectional area S1Is 2.0m
mTwoIf it is larger than, from the heating source through the heated object holding member
As a result, heat transfer to the contact portion between the heated body holding member and the heated body is prevented.
As a result, transfer marks are formed on the object to be heated. Real
As shown in Examples and Comparative Examples, the cross-sectional area S1Is 3.1mmTwo
Transfer marks appear, and the cross-sectional area S1Is 1.0mmTwoThen thick
Transfer marks appeared only when applied to the film and applied to the thin film
In this case, no transfer mark appeared. Cross-sectional area S1Is 0.7m
mTwoIn the following, transfer marks occur at all tested film thickness levels.
Did not show.

【0019】被加熱体保持部材の熱伝導率は、好ましく
は0.25kcal/m hr ℃以下、より好ましく
は0.20kcal/m hr ℃以下、さらに好まし
くは0.15kcal/m hr ℃以下である。熱伝
導率が0.25kcal/mhr ℃より大きいと加熱
源から被加熱体保持部材を通じて、被加熱体保持部材と
被加熱体の接触部への熱移動が大きくなり、被加熱体に
転写痕が生じるようになるので好ましくない。
The thermal conductivity of the member to be heated is preferably not more than 0.25 kcal / m hr ° C, more preferably not more than 0.20 kcal / mhr ° C, and even more preferably not more than 0.15 kcal / mhr ° C. . If the thermal conductivity is greater than 0.25 kcal / mhr ° C., heat transfer from the heating source to the contact portion between the heated body holding member and the heated body through the heated body holding member increases, and transfer marks are formed on the heated body. It is not preferable because it is caused.

【0020】本発明においては、上記被加熱体保持部材
はパイプ状構造をとることが好ましい。ここで、パイプ
状構造とは、断面形状が円であるもの、三角形や多角形
であるものを問わず、中空構造をとるものを一般的に示
すものである。以下、断面形状が円であるものを代表例
とし、発明の詳細を説明する。
In the present invention, it is preferable that the heated object holding member has a pipe-like structure. Here, the pipe-like structure generally refers to a structure having a hollow structure regardless of a cross-sectional shape of a circle, a triangle, or a polygon. Hereinafter, the present invention will be described in detail with a circular cross section as a representative example.

【0021】被加熱体がパイプ状構造をとる場合、パイ
プ状構造の外径Dと内径dの差D−dは、被加熱体の材
質、重量等により様々であるが、好ましくは0.1〜
0.3mm、より好ましくは0.15〜0.25mm、
さらに好ましくは、0.15〜0.25mmである。上
記の差D−dが0.1mmより小さいと、強度不足とな
り被加熱体の安定保持がしにくくなってくる。また差D
−dが0.3mmより大きいと、加熱源から被加熱体保
持部材を通じて、被加熱体保持部材と被加熱体の接触部
への熱移動が大きくなり、被加熱体に転写痕を生じるよ
うになってくるので好ましくない。
When the object to be heated has a pipe-like structure, the difference D-d between the outer diameter D and the inner diameter d of the pipe-like structure varies depending on the material and weight of the object to be heated. ~
0.3 mm, more preferably 0.15 to 0.25 mm,
More preferably, it is 0.15 to 0.25 mm. If the above difference D-d is smaller than 0.1 mm, the strength becomes insufficient and it becomes difficult to stably hold the object to be heated. Also the difference D
When −d is larger than 0.3 mm, heat transfer from the heating source to the contact portion between the heated body holding member and the heated body through the heated body holding member increases, so that a transfer mark is generated on the heated body. It is not desirable because it becomes.

【0022】実施例に示すとおり、D−dが0.3mm
では厚膜に塗布した場合のみ転写痕が発現し、薄膜に塗
布した場合は転写痕が発現しなかった。D−dが0.2
mm以下では、テストした全ての膜厚水準で転写痕が発
現しなかった。ただし、D−dが0.1mmでは、被加
熱体保持部の一部に強度不足に起因する損傷が生じた。
すなわち、軽量の被加熱体に薄膜に塗布した塗膜の加
熱であればD−dは0.1〜0.3mmであれば良く、
塗膜の膜厚が厚くなれば0.1〜0.2mmとするのが
良い。被加熱体がガラス基板であり、ガラス基板に薄膜
に塗布した塗布膜の加熱であれば、被加熱体保持部材の
強度を考慮し、差D−dを0.2〜0.3mmとするの
が良い。本発明が好適に用いられるカラーフィルターの
製造工程ように、ガラス基板上に塗布したウエット膜厚
12μm以上のレジスト塗膜を加熱する場合には、D−
dは0.15〜0.25mmとするのが良い。
As shown in the embodiment, D−d is 0.3 mm
No transfer marks appeared only when applied to a thick film, and no transfer marks appeared when applied to a thin film. D-d is 0.2
When the thickness was equal to or less than mm, no transfer mark appeared at all the film thickness levels tested. However, when D-d was 0.1 mm, damage due to insufficient strength occurred in a part of the heated object holding portion.
That is, if heating a coating film applied to a thin film on a lightweight heating target, D-d may be 0.1 to 0.3 mm,
When the thickness of the coating film is large, the thickness is preferably 0.1 to 0.2 mm. If the object to be heated is a glass substrate, and if the heating of the coating film applied to the glass substrate as a thin film, the difference D−d is set to 0.2 to 0.3 mm in consideration of the strength of the member to be heated. Is good. When a resist film having a wet film thickness of 12 μm or more applied on a glass substrate is heated as in the process of manufacturing a color filter in which the present invention is preferably used, D-
d is preferably 0.15 to 0.25 mm.

【0023】パイプ状構造の外径Dは、被加熱体の材
質、重量等により様々であるが、好ましくは4.4mm
以下、より好ましくは、3.2m以下、さらに好ましく
は2.3mm以下である。外径Dが4.4mmより大き
いと、外径Dと内径dの差D−dを小さくしなければ、
パイプ状構造の断面積を小さくできなくなり、パイプ状
構造の強度が不足して好ましくない。前記したとおり、
パイプ状構造の強度を確保するためには、外径D、内径
dの差D−dは0.2mm以上にすることが好ましい。
外径Dが4.4mm以下であれば、差D−dを0.3m
mとしても断面積S1 を2.0mm2 以下とすることが
できる。外径Dが3.2mm以下であれば、差D−dを
0.2mmとしても断面積S1 を好適な1.0mm2
下とすることができ、さらに、外径Dが2.3mm以下
であれば、差D−dを0.2mmとしても断面積S1
特に好適な0.7mm2以下にすることができる。
The outer diameter D of the pipe-shaped structure varies depending on the material and weight of the object to be heated, but is preferably 4.4 mm.
Below, more preferably 3.2 m or less, still more preferably 2.3 mm or less. If the outer diameter D is larger than 4.4 mm, unless the difference D−d between the outer diameter D and the inner diameter d is reduced,
The cross-sectional area of the pipe-shaped structure cannot be reduced, and the strength of the pipe-shaped structure is insufficient. As mentioned above,
In order to secure the strength of the pipe-like structure, the difference D-d between the outer diameter D and the inner diameter d is preferably set to 0.2 mm or more.
If the outer diameter D is 4.4 mm or less, the difference D−d is 0.3 m.
Even if m, the cross-sectional area S 1 can be set to 2.0 mm 2 or less. If the outer diameter D is 3.2 mm or less, the cross-sectional area S 1 can be set to a suitable 1.0 mm 2 or less even when the difference D−d is 0.2 mm, and the outer diameter D is 2.3 mm or less. if the difference D-d can also be a cross-sectional area S 1 to a particularly preferred 0.7 mm 2 or less as 0.2 mm.

【0024】パイプ状構造を形成する材質は、部材の熱
伝導率が前記の範囲内のものであれば特に限定されない
が、ポリイミド、ポリアミドイミド、ポリエーテルエー
テルケトン、ポリフェニレンサルファイド等の耐熱性樹
脂が好適に用いられる。中でもポリイミドは耐熱性に優
れており、特に好適に用いられる。
The material for forming the pipe-like structure is not particularly limited as long as the thermal conductivity of the member is within the above-mentioned range, but heat-resistant resins such as polyimide, polyamideimide, polyetheretherketone, and polyphenylenesulfide are used. It is preferably used. Among them, polyimide is excellent in heat resistance and is particularly preferably used.

【0025】本発明に好適に用いられる耐熱性樹脂の熱
伝導率は、0.25kcal/m hr ℃以下であることが好ま
しい。本発明に特に好適に用いられるポリイミド樹脂の
熱伝導率は、例えば、”TI−5013”(東レ株式会
社製)で0.20kcal/m hr ℃である。ま
た、実施例に示すとおり、熱伝導率0.14kcal/
m hr ℃(at 75℃)、0.15kcal/m
hr ℃(at 200℃)の”カプトン”(東レ・
デュポン社製)を用いることにより、本発明の効果が得
られることを確認した。
The heat conductivity of the heat-resistant resin suitably used in the present invention is preferably 0.25 kcal / m hr ° C. or less. The thermal conductivity of the polyimide resin particularly preferably used in the present invention is, for example, "TI-5013" (manufactured by Toray Industries, Inc.) at 0.20 kcal / m hr ° C. Further, as shown in the examples, the thermal conductivity was 0.14 kcal /
m hr ° C (at 75 ° C), 0.15 kcal / m
"Kapton" (hours at 200 ° C)
It was confirmed that the effect of the present invention was obtained by using DuPont.

【0026】パイプ状構造の固定方法は特に限定されな
いが、固定したい位置にパイプ状構造の外径Dと同じ径
の取り付け穴を設け、取り付け穴に直接差し込む方法、
固定したい位置にパイプ状構造の内径dと同じ径の突起
を設け、突起にパイプ状構造を差し込む方法等があり、
突起を用いる方法では、固定した突起を用いる方法、特
開平11−263360号公報で提案されている方法等
により移動可能な突起を取り付ける方法があり、適宜選
択される。
The method of fixing the pipe-like structure is not particularly limited, but a method of providing a mounting hole having the same diameter as the outer diameter D of the pipe-like structure at a position to be fixed, and directly inserting the mounting hole into the mounting hole,
There is a method of providing a projection having the same diameter as the inner diameter d of the pipe-like structure at a position to be fixed, and inserting the pipe-like structure into the projection,
The method of using the projection includes a method of using a fixed projection, a method of attaching a movable projection by a method proposed in Japanese Patent Application Laid-Open No. H11-263360, and the like, and is appropriately selected.

【0027】パイプ状構造の内径dと同じ径の突起を設
ける場合、突起の高さは、パイプ状構造の高さの好まし
くは1/2、より好ましくは1/3、さらに好ましくは
1/4が良い。パイプ状構造の高さの1/2よりも突起
の高さが高いと、突起を伝わり被加熱体に熱が流入する
ので本発明の効果を損なう場合がある。
When a projection having the same diameter as the inner diameter d of the pipe-like structure is provided, the height of the projection is preferably 1 /, more preferably 1 /, more preferably 4 of the height of the pipe-like structure. Is good. If the height of the projection is higher than 1 / of the height of the pipe-like structure, the effect of the present invention may be impaired because heat is transmitted to the heated object through the projection.

【0028】本発明の被加熱体保持部材は、平板上に塗
布した樹脂層を硬化、乾燥するHP式加熱炉のプロキシ
ピンとして用いると効果的であり、カラーフィルターの
製造工程においてガラス基板上に塗布された感光性ある
いは非感光性のカラーペースト、レジスト等の樹脂層を
乾燥、硬化するHP式加熱炉のプロキシピンとして用い
ると特に効果的である。
The object-to-be-heated holding member of the present invention is effective when used as a proxy pin of an HP-type heating furnace for curing and drying a resin layer applied on a flat plate. It is particularly effective to use a coated resin layer such as a photosensitive or non-photosensitive color paste or a resist as a proxy pin of an HP type heating furnace for drying and curing.

【0029】HP式加熱炉は1枚、もしくは、複数枚の
HPから構成される。複数枚のHPで構成されるHP式
加熱炉の一例を図1に示す。1はHP、2は反射板、3
は被加熱体保持部材であるプロキシピン、4は被加熱体
であるガラス基板、5は搬送アーム、6はクーリングプ
レート(以下、CPと称す)、7は駆動系である。複数
枚のHPで構成される場合、ガラス板4は、まず、HP
1上に載置され、規定時間加熱された後に、駆動系7に
接続した搬送アーム5によってHP2上に搬送される。
つづいて、HP2上で同じく規定時間加熱された後に、
再び搬送アーム5によってHP3上に載置される。同様
にHP3、HP4で加熱された後、CPによって室温ま
で降温され、加熱炉外に搬出される。
The HP type heating furnace comprises one or a plurality of HPs. FIG. 1 shows an example of an HP type heating furnace composed of a plurality of HPs. 1 is HP, 2 is reflector, 3
, A proxy pin as a member to be heated, 4 a glass substrate as a member to be heated, 5 a transfer arm, 6 a cooling plate (hereinafter referred to as CP), and 7 a drive system. In the case of being composed of a plurality of HPs, the glass plate 4
After being placed on the upper surface 1 and heated for a specified time, the wafer is transported onto the HP 2 by the transport arm 5 connected to the drive system 7.
Next, after being heated on the HP2 for the specified time,
It is again placed on the HP 3 by the transfer arm 5. Similarly, after being heated by HP3 and HP4, the temperature is lowered to room temperature by CP and carried out of the heating furnace.

【0030】複数枚で構成されるHP式加熱炉の場合、
本発明のプロキシピンを複数枚の全部、もしくは、特に
選択した一部に使用しても良い。複数枚の一部に使用す
る場合、例えば、図1のHP1、HP2等、未乾燥状態
で流動する樹脂層を加熱する部分のHPに本発明のプロ
キシピンを用い、HP3、HP4等、乾燥し流動しなく
なった樹脂層を加熱する部分のHPに従来のプロキシピ
ンを用いるのが良い。
In the case of an HP type heating furnace composed of a plurality of sheets,
The proxy pin of the present invention may be used for all or a plurality of selected parts. When used for a part of a plurality of sheets, for example, the proxy pin of the present invention is used for the HP of a portion where the resin layer flowing in an undried state is heated, such as HP1 and HP2 in FIG. It is preferable to use a conventional proxy pin for the portion of the HP that heats the resin layer that has stopped flowing.

【0031】1枚のHPに複数個のプロキシピンを設置
する場合、複数個の全部、もしくは、特に選択した一部
に用いても良い。複数個の一部に用いる場合、カラーフ
ィルターの有効部とならない外周部を保持するプロキシ
ピンに従来のものを用い、カラーフィルターの有効部と
なる部分を保持するプロキシピンに本発明のプロキシピ
ンを用いるのが良い。
When a plurality of proxy pins are provided on one HP, the plurality of proxy pins may be used for all or a part selected in particular. When used for a plurality of parts, the proxy pin of the present invention is used for the proxy pin that holds the portion that becomes the effective portion of the color filter, using a conventional proxy pin that holds the outer peripheral portion that is not the effective portion of the color filter. Good to use.

【0032】プロキシピンの高さは、ガラス基板のサイ
ズ、被加熱体である樹脂層の種類、加熱の目的等により
様々であるが、620×750×0.7mm3 のガラス
基板上に塗布した樹脂層を加熱する場合、プロキシピン
の高さは5〜12mm程度が好ましい。上記の値より低
いと、フォンガーシャトル方式で搬送する場合、搬送不
良の原因となり、上記の値より高いとガラス基板内の温
度分布が広くなり好ましくない。
The height of the proxy pin varies depending on the size of the glass substrate, the type of the resin layer to be heated, the purpose of heating, and the like, but the height of the proxy pin is determined by coating on a 620 × 750 × 0.7 mm 3 glass substrate. When heating the resin layer, the height of the proxy pin is preferably about 5 to 12 mm. If the value is lower than the above value, it may cause a conveyance failure in the case of transporting by the Fonger shuttle method. If the value is higher than the above value, the temperature distribution in the glass substrate becomes undesirably wide.

【0033】HPの材質は、特に限定されないが、アル
ミニウム、鉄、銅等の金属類、金属の合金、さらに金属
類にセラミック等の表面処理を施したものが好ましく用
いられる。
The material of the HP is not particularly limited, but metals such as aluminum, iron, and copper, alloys of metals, and materials obtained by subjecting metals to surface treatment such as ceramics are preferably used.

【0034】HPの加熱源としては電熱ヒーターが好適
に用いられる。
An electric heater is preferably used as a heat source for HP.

【0035】HPの加熱温度範囲としては、被加熱体の
種類や目的により様々であり、室温〜200℃、室温〜
300℃、室温〜350℃など適宜選択すればよい。
The heating temperature range of the HP varies depending on the type and purpose of the object to be heated.
The temperature may be selected as appropriate, such as 300 ° C. or room temperature to 350 ° C.

【0036】HPの形状は、特に限定されないが被加熱
体と対向する面が平坦であることが望ましい。平坦でな
いとHP面から被加熱体までの距離のバラツキによっ
て、被加熱体を均一に加熱できない懸念がある。
The shape of the HP is not particularly limited, but it is desirable that the surface facing the object to be heated is flat. If it is not flat, there is a concern that the object to be heated cannot be heated uniformly due to the variation in the distance from the HP surface to the object to be heated.

【0037】反射板の材質は特に限定されないが、アル
ミニウム、鉄、銅等の金属類、金属の合金類が好適に用
いられる。
The material of the reflection plate is not particularly limited, but metals such as aluminum, iron and copper, and metal alloys are preferably used.

【0038】本発明によれば、プロキシピンの断面積、
材質を規定することにより、加熱源であるHPから、被
加熱体との接触部であるプロキシピン先端へに熱移動を
低く抑え、プロキシピン先端温度と雰囲気温度の差を小
さくすることによって、プロキシピンによる転写痕を抑
制することに成功した。
According to the present invention, the cross-sectional area of the proxy pin,
By defining the material, the heat transfer from the HP as the heating source to the tip of the proxy pin, which is in contact with the object to be heated, is suppressed low, and the difference between the temperature at the tip of the proxy pin and the ambient temperature is reduced. We succeeded in suppressing transfer marks caused by pins.

【0039】[0039]

【実施例】本発明を実施例に基づいて説明するが、実施
例によって本発明の効果はなんら制限されない。
EXAMPLES The present invention will be described based on examples, but the effects of the present invention are not limited by the examples.

【0040】[実施例1]図2は本発明の実施例、比較
例のテストに用いた加熱炉の概略図である。前記加熱炉
は1枚のHPから構成されている。1はHP、2はHP
の対向側に設置した反射板である。3は被加熱体の保持
部であるプロキシピンであり、1のHPに固定されてい
る。4は被加熱体として用いたガラス基板である。ガラ
ス基板は3のプロキシピン上に載置され、1のHPと2
の反射板の間で加熱される。
Example 1 FIG. 2 is a schematic view of a heating furnace used in tests of an example of the present invention and a comparative example. The heating furnace is composed of one HP. 1 is HP, 2 is HP
Is a reflection plate installed on the opposite side of the reflector. Reference numeral 3 denotes a proxy pin, which is a holding portion for the object to be heated, and is fixed to the HP 1. Reference numeral 4 denotes a glass substrate used as a heating target. The glass substrate is placed on the 3 proxy pins, 1 HP and 2
Is heated between the reflectors.

【0041】図3は本発明の実施例の1つであるプロキ
シピンの概略図であり、外径D=2.1mm、内径d=
2.0mm、断面積S1 =0.32mm2 、ガラス基板
との接触面積S2=0.32mm2、プロキシピン高さは
10mmとなっている。
FIG. 3 is a schematic view of a proxy pin according to an embodiment of the present invention, in which an outer diameter D = 2.1 mm and an inner diameter d =
2.0 mm, cross-sectional area S 1 = 0.32 mm 2 , contact area with glass substrate S 2 = 0.32 mm 2 , and proxy pin height is 10 mm.

【0042】プロキシピン材質としては、ポリイミド樹
脂である”カプトン”(東レ・デュポン社製)を用い
た。カプトンの熱伝導率は0.14kcal/m hr
℃(at 75℃)である。
As a material of the proxy pin, "Kapton" (manufactured by Du Pont-Toray Co., Ltd.) which is a polyimide resin was used. The thermal conductivity of Kapton is 0.14 kcal / m hr
° C (at 75 ° C).

【0043】フォトレジスト(シプレイ・ファーイース
ト株式会社製、SRC−100)を、プロピレングリコ
ールモノメチルエーテルアセテートで固形分15%(粘
度5mPa・s)に希釈したものを620×720×
0.7mm3 の無アルカリガラス(コーニングジャパン
株式会社製、#1737)にバーコータを用いて塗布
し、図2の加熱炉を用いて10分間加熱した。ウエット
膜厚は、6μm、9μm、12μm、15μmの4水準
とし、HPの設定温度は120℃とした。
A photoresist (SRC-100, manufactured by Shipley Far East Co., Ltd.) diluted with propylene glycol monomethyl ether acetate to a solid content of 15% (viscosity: 5 mPa · s) is 620 × 720 ×
It was applied to 0.7 mm 3 non-alkali glass (# 1737, manufactured by Corning Japan KK) using a bar coater, and heated for 10 minutes using the heating furnace shown in FIG. The wet film thickness was set to four levels of 6 μm, 9 μm, 12 μm, and 15 μm, and the set temperature of the HP was 120 ° C.

【0044】加熱後の基板を蛍光灯反射により目視観察
した。加熱後の基板には膜厚水準に依らずプロキシピン
の転写痕は観察されなかったが、プロキシピンの一部に
曲がり等の損傷が生じた。
The heated substrate was visually observed by reflection from a fluorescent lamp. No transfer traces of proxy pins were observed on the heated substrate regardless of the film thickness level, but some of the proxy pins were damaged such as bending.

【0045】[実施例2]プロキシピンとして、外径D
=2.2mm、内径d=2.0mm、断面積S1=0.
66mm2 、ガラス基板との接触面積S2 =0.66m
2 、プロキシピン高さは10mmのものを用い、実施
例1と同様にテストを行った。プロキシピンの材質は実
施例1と同じである。
[Embodiment 2] An outer diameter D is used as a proxy pin.
= 2.2 mm, inner diameter d = 2.0 mm, cross-sectional area S 1 = 0.
66 mm 2 , contact area S 2 = 0.66 m with glass substrate
A test was performed in the same manner as in Example 1 using m 2 and a proxy pin height of 10 mm. The material of the proxy pin is the same as that of the first embodiment.

【0046】その結果、膜厚水準に依らずプロキシピン
の転写痕は観察されず、また、プロキシピンの損傷もな
かった。
As a result, no transfer mark of the proxy pin was observed irrespective of the film thickness level, and there was no damage to the proxy pin.

【0047】[実施例3]プロキシピンとして、外径D
=2.3mm、内径d=2.0mm、断面積S1=1.
0mm2 、ガラス基板との接触面積S2 =1.4m
2 、プロキシピン高さは10mmのものを用い、実施
例1と同様にテストを行った。プロキシピンの材質は実
施例1と同じである。
[Embodiment 3] An outer diameter D is used as a proxy pin.
= 2.3 mm, inner diameter d = 2.0 mm, cross-sectional area S 1 = 1.
0 mm 2 , contact area with glass substrate S 2 = 1.4 m
A test was performed in the same manner as in Example 1 using m 2 and a proxy pin height of 10 mm. The material of the proxy pin is the same as that of the first embodiment.

【0048】その結果、ウエット膜厚6μm、9μmの
水準ではプロキシピンの転写痕は観察されなかったが、
ウエット膜厚12μm、15μmの水準ではプロキシピ
ンの転写痕が発現した。プロキシピンの損傷はなかっ
た。
As a result, no transfer marks of proxy pin were observed at the wet film thickness of 6 μm and 9 μm.
When the wet film thickness was 12 μm or 15 μm, transfer marks of proxypin appeared. There was no proxy pin damage.

【0049】[比較例1]図4は、比較例で用いたプロ
キシピンの概略図であり、直径D=2.0mm、断面積
1=3.1mm2、ガラス基板との接触面積S2 =0.
03mm2 、プロキシピン高さは10mmである。プロ
キシピンを構成する材質は、熱伝導率が0.20kcal/m
hr ℃であるポリイミド樹脂を用いた。
Comparative Example 1 FIG. 4 is a schematic view of a proxy pin used in a comparative example, having a diameter D = 2.0 mm, a sectional area S 1 = 3.1 mm 2 , and a contact area S 2 with a glass substrate. = 0.
03 mm 2 and the height of the proxy pin is 10 mm. The material constituting the proxy pin has a thermal conductivity of 0.20 kcal / m
A polyimide resin at hr ° C was used.

【0050】上記のプロキシピンを用い、実施例1と同
様にテストを行った。その結果、全ての膜厚水準で、加
熱後の基板に図5に示すようなプロキシピンの転写痕8
が観察された。プロキシピンの損傷はなかった。
Using the above proxy pin, a test was performed in the same manner as in Example 1. As a result, at all film thickness levels, transfer marks 8 of proxy pins as shown in FIG.
Was observed. There was no proxy pin damage.

【0051】実施例、比較例での検討結果を表1にまと
める。
Table 1 summarizes the results of the study in the examples and comparative examples.

【0052】[0052]

【表1】 [Table 1]

【0053】[0053]

【発明の効果】本発明によれば、被加熱体中に被加熱体
を保持する被加熱体保持部材の転写痕が生じることを防
止し、転写痕による製品品位の低下を生じない被加熱体
保持部材および加熱炉を提供できた。
According to the present invention, it is possible to prevent a transfer mark of a member to be heated holding a member to be heated from being formed in the member to be heated, and to prevent a decrease in product quality due to the transfer mark. The holding member and the heating furnace could be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る加熱炉の一例を示す概略図であ
る。
FIG. 1 is a schematic view showing an example of a heating furnace according to the present invention.

【図2】実施例、比較例のテストに用いた加熱炉の概略
図である。
FIG. 2 is a schematic view of a heating furnace used in tests of Examples and Comparative Examples.

【図3】本発明の実施例の1つであるプロキシピンの概
略図である。
FIG. 3 is a schematic view of a proxy pin according to an embodiment of the present invention.

【図4】本発明の比較例の1つであるプロキシピンの概
略図である。
FIG. 4 is a schematic view of a proxy pin which is one of comparative examples of the present invention.

【図5】プロキシピンの転写痕を示す概略図である。FIG. 5 is a schematic view showing a transfer mark of a proxy pin.

【符号の説明】[Explanation of symbols]

1:HP 2:反射板 3:プロキシピン 4:ガラス基板 5:搬送アーム 6:CP 7:駆動系 8:転写痕 1: HP 2: reflective plate 3: proxy pin 4: glass substrate 5: transfer arm 6: CP 7: drive system 8: transfer mark

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H048 BA11 BB32 BB42 3K092 PP09 PP20 QA05 QB47 RF03 RF09 SS47 SS48 TT40 VV22 VV40 4K055 AA05 HA01 HA11 HA27  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA11 BB32 BB42 3K092 PP09 PP20 QA05 QB47 RF03 RF09 SS47 SS48 TT40 VV22 VV40 4K055 AA05 HA01 HA11 HA27

Claims (16)

【特許請求の範囲】[Claims] 【請求項1】加熱源を用いて被加熱体を加熱するに際し
て該被加熱体を保持する保持部材であって、該保持部材
の断面積S1 が2.0mm2 以下であることを特徴とす
る被加熱体保持部材。
1. A holding member for holding an object to be heated when the object to be heated is heated using a heating source, wherein a cross-sectional area S 1 of the holding member is 2.0 mm 2 or less. To be heated.
【請求項2】熱伝導率が、0.25kcal/m hr
℃以下であることを特徴とする請求項1に記載の被加
熱体保持部材。
2. The thermal conductivity is 0.25 kcal / m hr.
The heated member holding member according to claim 1, wherein the temperature is not more than ° C.
【請求項3】構造がパイプ状構造であることを特徴とす
る請求項1〜2のいずれかに記載の被加熱体保持部材。
3. The member to be heated according to claim 1, wherein the structure is a pipe-like structure.
【請求項4】パイプ状構造の外径Dと内径dの差が0.
1〜0.3mmであることを特徴とする請求項3に記載
の被加熱体保持部材。
4. The difference between the outer diameter D and the inner diameter d of the pipe-like structure is 0.
The heated object holding member according to claim 3, wherein the length is 1 to 0.3 mm.
【請求項5】パイプ状構造の外径Dが4.4mm以下で
あることを特徴とする請求項3〜4のいずれかに記載の
被加熱体保持部材。
5. The member to be heated according to claim 3, wherein an outer diameter D of the pipe-shaped structure is 4.4 mm or less.
【請求項6】パイプ状構造を形成する材質が耐熱性樹脂
であること特徴とする請求項3〜5のいずれかに記載の
被加熱体保持部材。
6. A member to be heated according to claim 3, wherein the material forming the pipe-like structure is a heat-resistant resin.
【請求項7】耐熱性樹脂が、ポリイミド樹脂であること
を特徴とする請求項6に記載の被加熱体保持部材。
7. The member to be heated according to claim 6, wherein the heat-resistant resin is a polyimide resin.
【請求項8】請求項1〜7のいずれかに記載の被加熱体
保持部材を用いたことを特徴とする加熱炉。
8. A heating furnace using the member-to-be-heated holding member according to claim 1.
【請求項9】加熱炉の構造が、加熱源を有するホットプ
レートと、該ホットプレートの対向側に設置した反射板
との空隙を被加熱体が通過することにより被加熱体を加
熱する構造であることを特徴とする請求項8に記載の加
熱炉。
9. The heating furnace has a structure in which an object to be heated is heated by passing the object through a gap between a hot plate having a heating source and a reflection plate provided on an opposite side of the hot plate. The heating furnace according to claim 8, wherein:
【請求項10】被加熱体保持部材がホットプレート上に
設置されたプロキシミティーピンであることを特徴とす
る請求項9に記載の加熱炉。
10. The heating furnace according to claim 9, wherein the heated object holding member is a proximity pin installed on a hot plate.
【請求項11】加熱炉の構造が、加熱源により熱せられ
た熱風がチャンバー内を循環することによりチャンバー
内の被加熱体を加熱する、熱風オーブン式であることを
特徴とする請求項8に記載の加熱炉。
11. The structure of the heating furnace according to claim 8, wherein the structure of the heating furnace is a hot-air oven type in which the heated air heated by the heating source circulates in the chamber to heat the object to be heated in the chamber. The heating furnace as described.
【請求項12】被加熱体が透明基体であることを特徴と
する請求項8〜11のいずれかに記載の加熱炉。
12. The heating furnace according to claim 8, wherein the object to be heated is a transparent substrate.
【請求項13】被加熱体がガラス基板であることを特徴
とする請求項8〜11のいずれかに記載の加熱炉。
13. The heating furnace according to claim 8, wherein the object to be heated is a glass substrate.
【請求項14】被加熱体が液晶ディスプレイ用基体であ
ることを特徴とする請求項8〜11のいずれかに記載の
加熱炉。
14. The heating furnace according to claim 8, wherein the object to be heated is a substrate for a liquid crystal display.
【請求項15】被加熱体が液晶ディスプレイ用カラーフ
ィルターであることを特徴とする請求項8〜11のいず
れかに記載の加熱炉。
15. The heating furnace according to claim 8, wherein the object to be heated is a color filter for a liquid crystal display.
【請求項16】請求項8〜15のいずれかに記載の加熱
炉を使用することを特徴とするカラーフィルターの製造
方法。
16. A method for producing a color filter, comprising using the heating furnace according to any one of claims 8 to 15.
JP2000221892A 2000-07-24 2000-07-24 Holding member for objective body to be heated and heating furnace using the same Pending JP2002040223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000221892A JP2002040223A (en) 2000-07-24 2000-07-24 Holding member for objective body to be heated and heating furnace using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000221892A JP2002040223A (en) 2000-07-24 2000-07-24 Holding member for objective body to be heated and heating furnace using the same

Publications (2)

Publication Number Publication Date
JP2002040223A true JP2002040223A (en) 2002-02-06
JP2002040223A5 JP2002040223A5 (en) 2007-09-06

Family

ID=18716215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000221892A Pending JP2002040223A (en) 2000-07-24 2000-07-24 Holding member for objective body to be heated and heating furnace using the same

Country Status (1)

Country Link
JP (1) JP2002040223A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7214455B2 (en) 2002-05-29 2007-05-08 Toray Industries, Inc. Photosensitive resin composition and process for producing heat-resistant resin film
JP2007226128A (en) * 2006-02-27 2007-09-06 Toppan Printing Co Ltd Hot plate for manufacturing color filter, and method for manufacturing the color filter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000119737A (en) * 1998-10-16 2000-04-25 Nsk Warner Kk Method for setting work in furnace

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000119737A (en) * 1998-10-16 2000-04-25 Nsk Warner Kk Method for setting work in furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7214455B2 (en) 2002-05-29 2007-05-08 Toray Industries, Inc. Photosensitive resin composition and process for producing heat-resistant resin film
JP2007226128A (en) * 2006-02-27 2007-09-06 Toppan Printing Co Ltd Hot plate for manufacturing color filter, and method for manufacturing the color filter

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