JP2002036128A - Polishing sheet - Google Patents
Polishing sheetInfo
- Publication number
- JP2002036128A JP2002036128A JP2000228169A JP2000228169A JP2002036128A JP 2002036128 A JP2002036128 A JP 2002036128A JP 2000228169 A JP2000228169 A JP 2000228169A JP 2000228169 A JP2000228169 A JP 2000228169A JP 2002036128 A JP2002036128 A JP 2002036128A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- particles
- alumina
- layer
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、特に光コネクター
フェルールや光学ガラス、各種電子部品基板等のアルミ
ナ、ジルコニア、シリカ等の異なるセラミックやガラス
材料が露出する表面を精密に研磨する研磨シートに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing sheet for precisely polishing a surface on which different ceramics and glass materials such as alumina, zirconia and silica are exposed, particularly for optical connector ferrules, optical glass and various electronic component substrates.
【０００２】[0002]
【従来の技術】光コネクターフェルール、光学ガラス、
各種電子部品基板等のセラミック部品やガラス部品を精
密研磨又はクリーニングする方法として、従来は研磨布
と遊離砥粒を用いる方法、研磨シートを使う方法または
研磨シートと遊離砥粒を併用する方法等が用いられるい
る。2. Description of the Related Art Optical connector ferrules, optical glass,
Conventionally, as a method for precision polishing or cleaning of ceramic parts and glass parts such as various electronic parts substrates, a method using a polishing cloth and free abrasive grains, a method using a polishing sheet or a method using both polishing sheets and free abrasive grains, etc. Have been used.
【０００３】アルミナ研磨シートは従来から研磨に非常
に良く使われており、さらにアルミナ粒子の粒径を１μ
ｍ以下に微細にすることによって精密研磨に使用できる
ようになった。また、粒子を板状にすることによって、
表面の汚れを除去し、なおかつ被研磨物の超精密研磨が
できる技術も実用化されている。ただし、精密研磨を目
的として使用する場合、アルミナやシリカのコロイダル
液等の研磨液を共用することが多かった。[0003] Alumina polishing sheets have been used very often for polishing, and the particle size of alumina particles is 1 μm.
By making the particle size smaller than m, it can be used for precision polishing. Also, by making the particles plate-like,
Techniques for removing dirt on the surface and performing ultra-precise polishing of the object to be polished have also been put to practical use. However, when used for precision polishing, a polishing liquid such as a colloidal liquid of alumina or silica is often used in common.
【０００４】研磨分野において、シリカ粒子は弱アルカ
リ性のコロイダル液の状態で、研磨液として使用されて
いる。特に粒径０．５μｍ以下の超微細シリカ粒子はメ
カニカルポリッシングの効果を利用して被研磨物の精密
研磨に広く使用されている。また、研磨シートとしても
開発され、光コネクターフェルールの最終仕上げ研磨に
利用されている。In the polishing field, silica particles are used as a polishing liquid in the form of a weakly alkaline colloidal liquid. In particular, ultrafine silica particles having a particle diameter of 0.5 μm or less are widely used for precision polishing of an object to be polished by utilizing the effect of mechanical polishing. It has also been developed as a polishing sheet and is used for final polishing of optical connector ferrules.
【０００５】[0005]
【発明が解決しようとする課題】従来のアルミナ研磨シ
ートは、被研磨面が単一な材料ならば段差や表面の凹凸
のない精密研磨が可能であるが、アルミナ、ジルコニ
ア、シリカセラミックス等異なる材料が複数存在した場
合、研磨効果に違いを生じ、材料の境界に段差が生じて
しまう。特に材料の硬度に違いがあるとその段差は大き
い。Conventional alumina polishing sheets can be precisely polished without steps or surface irregularities if the surface to be polished is a single material. However, different materials such as alumina, zirconia, and silica ceramics can be used. When there are a plurality of, there is a difference in the polishing effect and a step occurs at the boundary of the material. In particular, if there is a difference in the hardness of the material, the step is large.
【０００６】例えば、光コネクターフェルールは、周辺
部はアルミナおよびジルコニアセラミックス、中心部は
ＳｉＯ2のファイバーで構成される。このフェルール端
面の研磨にアルミナのみの研磨シートを用いると、中心
部の摩耗が大きく、周辺部との境界に段差が生じやす
く、光通信ケーブル接続の際に大きな接続損失を発生し
てしまう等の問題を生じる。For example, an optical connector ferrule is formed of alumina and zirconia ceramics at a peripheral portion and SiO 2 fibers at a central portion. If a polishing sheet made of only alumina is used for polishing the ferrule end surface, the central portion is greatly worn, a step is likely to occur at the boundary with the peripheral portion, and a large connection loss occurs when connecting an optical communication cable. Cause problems.
【０００７】一方、超微細シリカ研磨液及びシリカ研磨
シートを始めとする軟質研磨粒子を用いた場合は、被研
磨物の材料による研磨効果の違いは小さい。ただし、被
研磨物の表面の汚れを除去する特性も少なく、研磨面表
面に異物が付着したり、有機物が粘着したりする場合、
軟質研磨粒子のみではその除去にかなりの時間を要する
ことになる。On the other hand, when soft abrasive particles such as an ultrafine silica polishing liquid and a silica polishing sheet are used, the difference in the polishing effect between the materials to be polished is small. However, there is little property to remove dirt on the surface of the object to be polished, and when foreign matter adheres to the polished surface or when organic matter sticks,
The removal of the soft abrasive particles alone requires a considerable amount of time.
【０００８】そこで、従来はアルミナ研磨シートで研磨
を行い、その上でシリカ研磨シート等の軟質研磨粒子シ
ートで研磨を行う２段階以上の工程を踏んで研磨を行っ
ていた。この場合、アルミナ研磨シート使用時には研磨
液の使用が必要であり、さらに研磨機のシート交換およ
び交換に伴う研磨条件変更を余儀なくされ、結果として
研磨時間が長く、研磨コストがかかる問題が生じてい
た。Therefore, polishing has conventionally been carried out by two or more steps of polishing using an alumina polishing sheet and then polishing using a soft polishing particle sheet such as a silica polishing sheet. In this case, when using the alumina polishing sheet, it is necessary to use a polishing liquid, and further, it is necessary to change the polishing conditions accompanying the replacement of the sheet of the polishing machine and the replacement, resulting in a problem that the polishing time is long and the polishing cost is high. .
【０００９】したがって、本発明の目的は、異なる材料
が複数存在する被研磨物の研磨の際、研磨シートの交換
を行わずに、材料の境界に段差をつけず精密研磨がで
き、さらに表面に付着する汚れ等も除去できる効果を持
つ研磨シートを提供することにある。Accordingly, it is an object of the present invention to precisely polish a polishing object having a plurality of different materials without changing a polishing sheet and without making a step at a boundary of the materials, in addition to polishing the object. An object of the present invention is to provide a polishing sheet having an effect of removing adhered dirt and the like.
【００１０】[0010]
【課題を解決するための手段】本発明は、下記のとおり
である。 （１）基材上に平均粒径０．２〜２０μｍ、粒径／粒子
の厚さで表現されるアスペクト比３〜２００である板状
アルミナ粒子と軟質研磨粒子とバインダとからなる研磨
層を形成してなることを特徴とする研磨シート。Means for Solving the Problems The present invention is as follows. (1) A polishing layer comprising plate-like alumina particles, soft abrasive particles, and a binder having an average particle diameter of 0.2 to 20 μm and an aspect ratio of 3 to 200 expressed by a particle diameter / particle thickness on a substrate. A polishing sheet characterized by being formed.
【００１１】（２）研磨層が、板状アルミナ粒子と軟質
研磨粒子とバインダとが混在した層である前記（１）記
載の研磨シート。(2) The polishing sheet according to (1), wherein the polishing layer is a layer in which plate-like alumina particles, soft polishing particles, and a binder are mixed.
【００１２】（３）研磨層が、板状アルミナ粒子とバイ
ンダとからなる層と軟質研磨粒子とバインダとからなる
層とから構成されている前記（１）記載の研磨シート。(3) The polishing sheet according to the above (1), wherein the polishing layer comprises a layer composed of plate-like alumina particles and a binder and a layer composed of soft abrasive particles and a binder.
【００１３】（４）研磨層を形成する粒子のうち、板状
アルミナ粒子の割合が１０．０〜９９．９ｗｔ％である
前記（１）ないし（３）のいずれかに記載の研磨シー
ト。(4) The polishing sheet according to any one of (1) to (3), wherein the proportion of plate-like alumina particles in the particles forming the polishing layer is 10.0 to 99.9 wt%.
【００１４】（５）アルミナ粒子がα−アルミナ（コラ
ンダム）粒子であり、軟質研磨粒子がシリカ粒子である
前記（１）ないし（４）のいずれかに記載の研磨シー
ト。(5) The polishing sheet according to any one of (1) to (4), wherein the alumina particles are α-alumina (corundum) particles, and the soft abrasive particles are silica particles.
【００１５】上記本発明において、アルミナ粒子は特に
はα−アルミナ（コランダム）粒子がよい。アルミナ粒
子の粒径は０．２μｍ〜２０μｍ、好ましくは０．５μ
ｍ〜１０μｍとする。粒径が０．２μｍ未満になると、
被研磨物が表面粗さの大きいものである場合、研磨時間
が長く必要となる。また、被研磨物の表面の汚れを除去
する効果が小さくなる。２０μｍを超える板状粒子を使
用した場合、研磨シートの表面粗さが大きくなり、研磨
の際、被研磨物に深い傷をつけ、精密研磨に使用できな
くなる。In the present invention, the alumina particles are particularly preferably α-alumina (corundum) particles. The particle size of the alumina particles is 0.2 μm to 20 μm, preferably 0.5 μm.
m to 10 μm. When the particle size is less than 0.2 μm,
When the object to be polished has a large surface roughness, a long polishing time is required. Further, the effect of removing dirt on the surface of the object to be polished is reduced. When plate-like particles having a particle size of more than 20 μm are used, the surface roughness of the polishing sheet becomes large, and the polishing object causes deep scratches during polishing, and cannot be used for precision polishing.
【００１６】アルミナ粒子の形状が板状である理由とし
て、粒子の薄肉なエッジ部で被研磨物を削ぎ落とすよう
に研磨ができる点と、粒子の平滑な面で被研磨物と面接
触しながら研磨ができる点にある。この２つの効果によ
り被研磨物に傷をつけない精密研磨を可能にする。ま
た、板状粒子は表面に付着する異物を浮かせ、それを除
去したり、シートの研磨層内に付着したりできるため、
表面の汚れ等を除去する特徴がある。これらの特徴を出
すためには、粒径／粒子の厚さで表わされる粒子のアス
ペクト比は３〜２００、好ましくは５以上がよい。The reason why the shape of the alumina particles is plate-like is that the polishing can be performed so as to scrape off the object to be polished at the thin edge portion of the particles, and that the alumina particles have a smooth surface so as to be in surface contact with the object to be polished. The point is that it can be polished. These two effects enable precise polishing without damaging the object to be polished. In addition, the plate-like particles can float foreign matter adhering to the surface, remove it, or adhere to the polishing layer of the sheet,
It has the feature of removing surface dirt and the like. In order to obtain these characteristics, the aspect ratio of the particles represented by the particle size / particle thickness is preferably 3 to 200, and more preferably 5 or more.
【００１７】本発明で使用する軟質研磨粒子としては、
使用する板状アルミナ粒子より硬度の低い粒子であっ
て、例えば酸化ケイ素（シリカ粒子、ＳｉＯ2）、ベー
マイト（ＡｌＯＯＨ）粒子（特には、板状ベーマイト粒
子）、酸化鉄（Ｆｅ２Ｏ３）、酸化クロム（Ｃｒ
２Ｏ３）、酸化セリウム（ＣｅＯ２）、二酸化マンガン
（ＭｎＯ２）、ジルコニア（ＺｒＯ２）、チタニア（Ｔ
ｉＯ２）などが適用できる。光コネクターフェルールの
研磨シートにあっては、シリカ粒子を用いることが特に
好ましい。The soft abrasive particles used in the present invention include:
Particles having a lower hardness than the plate-like alumina particles used, for example, silicon oxide (silica particles, SiO 2 ), boehmite (AlOOH) particles (particularly, plate-like boehmite particles), iron oxide (Fe 2 O 3 ), Chromium oxide (Cr
2 O 3 ), cerium oxide (CeO 2 ), manganese dioxide (MnO 2 ), zirconia (ZrO 2 ), titania (T
iO 2 ) can be applied. It is particularly preferable to use silica particles in the polishing sheet of the optical connector ferrule.
【００１８】軟質研磨粒子の粒径及び形状は特に限定し
ないが、板状アルミナ粒子の粒径以下、好ましくは２〜
１００ｎｍが効果的である。軟質研磨粒子が板状アルミ
ナと被研磨物の界面に存在することによって、板状アル
ミナがダイレクトに接触した場合に発生する材料による
境界段差の発生を防止する効果がある。その効果は、軟
質研磨粒子が砥粒全体に対して０．１ｗｔ％程度あれば
発現する。また、軟質研磨粒子が特にシリカ粒子の場
合、シリカの粒径が特に２〜１００ｎｍ程度であると効
果は大きい。ただし、軟質研磨粒子が９０ｗｔ％以上に
なると板状アルミナ粒子の特徴である表面の異物や汚れ
の除去効果を失ってしまう。The particle size and shape of the soft abrasive particles are not particularly limited, but are not more than the particle size of the plate-like alumina particles, preferably 2 to 2.
100 nm is effective. The presence of the soft abrasive particles at the interface between the plate-like alumina and the object to be polished has an effect of preventing generation of a boundary step due to a material generated when the plate-like alumina comes into direct contact. The effect is exhibited when the soft abrasive particles are about 0.1% by weight based on the entire abrasive grains. Further, when the soft abrasive particles are particularly silica particles, the effect is great if the particle size of silica is particularly about 2 to 100 nm. However, when the soft abrasive particles are 90 wt% or more, the effect of removing foreign matter and dirt on the surface, which is a characteristic of plate-like alumina particles, is lost.
【００１９】研磨シートの基材としては、ポリエチレ
ン、ポリイミド、ポリカーボネート、ポリエステル、ポ
リウレタン、ポリプロピレン、ポリスチレンなど及びそ
れらを表面処理した樹脂フィルムが適用でき、さらに
は、樹脂フィルム以外にも合成紙、不織布等を使用する
こともできる。As the base material of the polishing sheet, polyethylene, polyimide, polycarbonate, polyester, polyurethane, polypropylene, polystyrene and the like, and resin films obtained by surface-treating the same can be used. Can also be used.
【００２０】研磨層の構成は、具体的にはアルミナ、シ
リカ混合砥粒の場合、図１に示すように、樹脂フィルム
３の上に研磨層１を一層作製する。さらに研磨層１と樹
脂フィルム３の接着性を上げるためプライマー層２を間
に形成してもよい。研磨層の厚さは被研磨物の素材構
成、研磨時間を考慮して設定する。As for the structure of the polishing layer, specifically, in the case of mixed abrasive grains of alumina and silica, one polishing layer 1 is formed on the resin film 3 as shown in FIG. Further, a primer layer 2 may be formed between the polishing layer 1 and the resin film 3 in order to increase the adhesiveness. The thickness of the polishing layer is set in consideration of the material composition of the object to be polished and the polishing time.
【００２１】また、アルミナ粒子層およびシリカ粒子層
を複層形成しても良い。図２のようにシリカ粒子層４を
アルミナ粒子層５の上層にすると、シリカ粒子の効果を
活かすことができる。この場合、シリカ粒子層４はアル
ミナ粒子層５より薄く作製したほうが良い。Further, the alumina particle layer and the silica particle layer may be formed in multiple layers. When the silica particle layer 4 is formed on the alumina particle layer 5 as shown in FIG. 2, the effect of the silica particles can be utilized. In this case, it is better that the silica particle layer 4 is made thinner than the alumina particle layer 5.
【００２２】樹脂フィルムとの接着及び粒子の保持のた
めバインダと研磨粒子を混合して塗布する。バインダの
種類はセルロース系、アクリル系、エポキシ系、ウレタ
ン系、エステル系、メラミン系、塩化ビニル系樹脂塗料
等が使用できる。ただし、塗料中にアルミナ粒子、軟質
研磨粒子が均一分散できること、塗膜の硬度を増大でき
ること、基材例えば樹脂フィルムとの接着性が良好なこ
とが樹脂選定に必要である。塗膜の硬化のために、エス
テル系、ウレタン系等の樹脂にはイソシアネート等の硬
化剤を添加しても良い。A binder and abrasive particles are mixed and applied for adhesion to the resin film and retention of the particles. As the type of the binder, a cellulose-based, acrylic-based, epoxy-based, urethane-based, ester-based, melamine-based, or vinyl chloride-based resin paint can be used. However, it is necessary for resin selection that alumina particles and soft abrasive particles can be uniformly dispersed in the coating material, that the hardness of the coating film can be increased, and that adhesion to a base material such as a resin film be good. For curing the coating film, a curing agent such as an isocyanate may be added to an ester-based resin or a urethane-based resin.
【００２３】本発明の研磨シートは、研磨面を直接被研
磨物と接触させ使用しても良いし、冷却液を介在させて
使用しても良い。冷却液として特別のものは必要なく、
水道水でも十分研磨できる。また、精密研磨を行うため
に遊離砥粒を使用する必要がない点もこの研磨シートの
特徴である。The polishing sheet of the present invention may be used by bringing the polishing surface into direct contact with the object to be polished, or may be used with a cooling liquid interposed. No special coolant is required,
Can be sufficiently polished with tap water. Another characteristic of this polishing sheet is that it is not necessary to use loose abrasive grains for performing precision polishing.
【００２４】[0024]
【作用】本発明の研磨シートは、板状アルミナ粒子と軟
質研磨粒子の砥粒の研磨効果各々を併せ持つため、例え
ば光コネクターフェルール先端等のアルミナ、ジルコニ
ア、シリカセラミックス等異なる材料が複数存在する面
を研磨する際、以下の作用効果がある。The polishing sheet of the present invention has both the polishing effect of the abrasive particles of the plate-like alumina particles and the abrasive particles of the soft polishing particles. Therefore, for example, the surface of the optical connector ferrule tip where a plurality of different materials such as alumina, zirconia, and silica ceramics exist. The following operational effects are obtained when polishing.
【００２５】（１）研磨の際の傷、凹凸がない研磨面を
作製する。 （２）被研磨物の表面に存在する異物や汚れの除去がで
きる。 （３）被研磨物の研磨面にアルミナ、ジルコニア、シリ
カセラミックス等異なる材料が存在したとしても、その
境界に段差の生成を発生しない。 （４）遊離砥粒を使用せずに、研磨シート又は研磨シー
トと冷却液のみで研磨ができる。(1) A polished surface free of scratches and irregularities during polishing is prepared. (2) Foreign matter and dirt present on the surface of the object to be polished can be removed. (3) Even if different materials such as alumina, zirconia, and silica ceramic are present on the polished surface of the object to be polished, no step is generated at the boundary. (4) Polishing can be performed using only a polishing sheet or a polishing sheet and a coolant without using free abrasive grains.
【００２６】[0026]
【実施例】以下、実施例並びに比較例に基づき、本発明
を具体的に説明する。 実施例１ 板状α−アルミナ粒子（平均粒径５．０μｍ、アスペク
ト比３０）１００部とシリカ粒子（平均粒径２０ｎｍ）
２０部を混合した砥粒にウレタン系バインダー３０部を
加え、メチルエチルケトンとトルエンの混合溶液を加え
粘度調整した後、イソシアネート系硬化剤１０部を加
え、７５μｍのＰＥＴフィルム状に乾燥膜厚１２μｍの
研磨層を形成し研磨シートを得た。この研磨シートを使
用し、ジルコニアとシリカのセラミックス素材をエポキ
シ系接着剤で接着した被研磨物を水道水を冷却液にして
１０分間研磨した。その後研磨面の表面粗さ（評価長さ
はジルコニア１ｍｍ、シリカ１ｍｍになるように測定）
およびジルコニアとシリカの境界面段差を測定した。表
面粗さはＲａ＝０．０１２μｍ、境界面段差は０．０２
５μｍになった。また、境界面付近の接着剤の残留は認
められなかった。The present invention will be specifically described below based on examples and comparative examples. Example 1 100 parts of plate-like α-alumina particles (average particle diameter 5.0 μm, aspect ratio 30) and silica particles (average particle diameter 20 nm)
After adding 30 parts of a urethane-based binder to a mixture of 20 parts of abrasive grains, adding a mixed solution of methyl ethyl ketone and toluene to adjust the viscosity, adding 10 parts of an isocyanate-based curing agent, and polishing the film to a thickness of 12 μm on a 75 μm PET film. A layer was formed to obtain a polishing sheet. Using this polishing sheet, the object to be polished in which a ceramic material of zirconia and silica was bonded with an epoxy-based adhesive was polished for 10 minutes using tap water as a cooling liquid. Thereafter, the surface roughness of the polished surface (evaluation length is measured to be 1 mm zirconia and 1 mm silica).
And the step difference of the interface between zirconia and silica was measured. The surface roughness is Ra = 0.012 μm, and the boundary step is 0.02.
It became 5 μm. No adhesive remained near the boundary surface.
【００２７】実施例２ 板状α−アルミナ粒子を平均粒径０．６μｍ、アスペク
ト比１０の形状を持つものに変更して、上記実施例１と
同等に研磨層を形成し研磨シートを得て、研磨効果を測
定した。表面租さはＲａ＝０．０１０μｍ未満、境界面
段差は０．０１６μｍになった。また、境界面付近の接
着剤の残留は認められなかった。Example 2 The plate-like α-alumina particles were changed to those having an average particle size of 0.6 μm and an aspect ratio of 10, and a polishing layer was formed in the same manner as in Example 1 to obtain a polishing sheet. The polishing effect was measured. The surface roughness was less than Ra = 0.010 μm, and the boundary step was 0.016 μm. No adhesive remained near the boundary surface.
【００２８】実施例３ 板状α−アルミナ粒子（平均粒径５．０μｍ、アスペク
ト比３０）１００部とウレタン系バインダー２０部、イ
ソシアネート系硬化剤６部を加え、７５μｍのＰＥＴフ
ィルム状に乾燥膜厚１０μｍの研磨層を形成させた後、
シリカ粒子（平均粒径２０ｎｍ）２０部とウレタン系バ
インダー１０部、イソシアネート系硬化剤４部を加えた
塗料を作成し上塗りを行い、乾燥膜厚２μｍの研磨層を
形成、二重の研磨層を有する研磨シートを得て、上記実
施例１と同様に研磨効果を測定した。表面粗さはａ＝
０．０１０μｍ未満、境界面段差は０．０２１μｍにな
った。また、境界面付近の接着剤の残留は認められなか
った。Example 3 100 parts of plate-like α-alumina particles (average particle size: 5.0 μm, aspect ratio: 30), 20 parts of a urethane-based binder, and 6 parts of an isocyanate-based curing agent were added, and a dried film was formed into a 75 μm PET film. After forming a 10 μm thick polishing layer,
A paint was prepared by adding 20 parts of silica particles (average particle size: 20 nm), 10 parts of a urethane-based binder, and 4 parts of an isocyanate-based curing agent, and overcoated to form a polishing layer having a dry film thickness of 2 μm. A polishing sheet having the same was obtained, and the polishing effect was measured in the same manner as in Example 1 above. Surface roughness is a =
The boundary surface step was less than 0.010 μm, and the boundary step was 0.021 μm. No adhesive remained near the boundary surface.
【００２９】比較例１ 板状α−アルミナ粒子（平均粒径５．０μｍ、アスペク
ト比３０）１２０部のみを研磨砥粒として上記実施例１
と同様に研磨層を形成し研磨シートを得て、研磨効果を
測定した。表面粗さはＲａ＝０．０２４μｍまで下げら
れたが、境界面段差は０．０９５μｍあった。境界面付
近の接着剤の残留は認められなかった。Comparative Example 1 Only 120 parts of plate-like α-alumina particles (average particle size: 5.0 μm, aspect ratio: 30) were used as abrasive grains in Example 1 described above.
A polishing layer was formed in the same manner as in Example 1 to obtain a polishing sheet, and the polishing effect was measured. The surface roughness was reduced to Ra = 0.024 μm, but the interface step was 0.095 μm. No adhesive remained near the interface.
【００３０】比較例２ シリカ粒子（平均粒径２０ｎｍ）１２０部のみを研磨砥
粒として上記実施例１と同様に研磨層を形成し研磨シー
トを得て、研磨効果を測定した。表面粗さはＲａ＝０．
０１３μｍ、境界面段差は０．０１５μｍになった。た
だし、境界面付近に接着剤が残留して残り、境界面から
左右１．５ｍｍ程伸びて広がっているのが確認された。Comparative Example 2 A polishing layer was formed and a polishing sheet was obtained in the same manner as in Example 1 except that only 120 parts of silica particles (average particle size: 20 nm) were used as abrasive grains, and the polishing effect was measured. The surface roughness is Ra = 0.
013 μm and the step height at the interface was 0.015 μm. However, it was confirmed that the adhesive remained in the vicinity of the boundary surface, and extended 1.5 mm left and right from the boundary surface.
【００３１】以上５種類の方法で作成した研磨シートを
使用し、ジルコニアとシリカのセラミックス素材を接着
した被研磨物を研磨試験して得られた、研磨前後の表面
粗さの変化およびジルコニアとシリカの境界面段差さら
に接着剤の除去効果結果をまとめて次表に示す。Changes in surface roughness before and after polishing and zirconia and silica obtained by performing a polishing test on an object to be polished in which a ceramic material of zirconia and silica was bonded using the polishing sheets prepared by the above five methods. The following table summarizes the interface step and the effect of removing the adhesive.
【００３２】[0032]
【表１】 [Table 1]
【００３３】[0033]
【発明の効果】以上の説明のように本発明の研磨シート
は、例えば、光コネクターフェルール先端等のようなア
ルミナ、ジルコニア、シリカセラミックス等異なる材料
が複数存在する被研磨面を研磨しても、被研磨物に傷、
凹凸をつけず、材料の境界にも段差をつけない。さらに
表面に付着する異物を除去するのに優れた性質を併せ持
っている。また、研磨シート交換作業等の手間が省け、
遊離砥粒を使用せず水道水のような冷却液さえあれば研
磨できることから、簡便に研磨作業を実施できる効果が
有る。As described above, the polishing sheet of the present invention can be used for polishing a surface to be polished on which a plurality of different materials such as alumina, zirconia, and silica ceramics, such as an optical connector ferrule tip, exist. Scratches on the polished object,
No unevenness and no step at the material boundary. Furthermore, it has excellent properties for removing foreign substances adhering to the surface. In addition, the work of replacing the abrasive sheet, etc. can be omitted,
Polishing can be performed simply by using a coolant such as tap water without using free abrasive grains, so that there is an effect that the polishing operation can be easily performed.
【図１】本発明研磨シートの内、板状α−アルミナとシ
リカを混合砥粒として研磨層とした時の研磨テープ断面
拡大図である。FIG. 1 is an enlarged cross-sectional view of a polishing tape when a polishing layer is formed as a mixed abrasive of plate-like α-alumina and silica in the polishing sheet of the present invention.
【図２】本発明研磨シートの内、シリカ砥粒を研磨上
層、板状α−アルミナを研磨下層とした時の研磨テープ
断面拡大図である。FIG. 2 is an enlarged cross-sectional view of a polishing tape when silica abrasive grains are an upper polishing layer and plate-like α-alumina is a lower polishing layer in the polishing sheet of the present invention.
１ 板状α−アルミナ、シリカ混合砥粒層 ２ プライマー層 ３ 樹脂フィルム ４ シリカ砥粒層 ５ 板状α−アルミナ砥粒層 Reference Signs List 1 plate-like α-alumina and silica mixed abrasive layer 2 primer layer 3 resin film 4 silica abrasive layer 5 plate-like α-alumina abrasive layer
Claims (5)
径／粒子の厚さで表現されるアスペクト比３〜２００で
ある板状アルミナ粒子と軟質研磨粒子とバインダとから
なる研磨層を形成してなることを特徴とする研磨シー
ト。1. Polishing on a substrate comprising plate-like alumina particles having an average particle diameter of 0.2 to 20 μm and an aspect ratio expressed by particle diameter / particle thickness of 3 to 200, soft abrasive particles, and a binder. A polishing sheet characterized by forming a layer.
粒子とバインダとが混在した層である請求項１記載の研
磨シート。2. The polishing sheet according to claim 1, wherein the polishing layer is a layer in which plate-like alumina particles, soft polishing particles, and a binder are mixed.
とからなる層と軟質研磨粒子とバインダとからなる層と
から構成されている請求項１記載の研磨シート。3. The polishing sheet according to claim 1, wherein the polishing layer comprises a layer composed of plate-like alumina particles and a binder and a layer composed of soft abrasive particles and a binder.
ミナ粒子の割合が１０．０〜９９．９ｗｔ％である請求
項１ないし３のいずれかに記載の研磨シート。4. The polishing sheet according to claim 1, wherein the proportion of plate-like alumina particles in the particles forming the polishing layer is 10.0 to 99.9 wt%.
ム）粒子であり、軟質研磨粒子がシリカ粒子である請求
項１ないし４のいずれかに記載の研磨シート。5. The polishing sheet according to claim 1, wherein the alumina particles are α-alumina (corundum) particles, and the soft abrasive particles are silica particles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000228169A JP2002036128A (en) | 2000-07-28 | 2000-07-28 | Polishing sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000228169A JP2002036128A (en) | 2000-07-28 | 2000-07-28 | Polishing sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002036128A true JP2002036128A (en) | 2002-02-05 |
Family
ID=18721513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000228169A Pending JP2002036128A (en) | 2000-07-28 | 2000-07-28 | Polishing sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002036128A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019215571A1 (en) * | 2018-05-10 | 2019-11-14 | 3M Innovative Properties Company | Abrasive articles including soft shaped abrasive particles |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01109082A (en) * | 1987-10-19 | 1989-04-26 | Tokyo Jiki Insatsu Kk | Abrasive film |
| JPH04294979A (en) * | 1991-03-19 | 1992-10-19 | Hitachi Maxell Ltd | Polishing sheet |
| JPH06179174A (en) * | 1992-12-11 | 1994-06-28 | Fuji Photo Film Co Ltd | Polishing body |
| JPH07205030A (en) * | 1994-01-17 | 1995-08-08 | Agency Of Ind Science & Technol | Polishing material using twin crystal alpha-alumina particle |
| JPH08187666A (en) * | 1995-01-06 | 1996-07-23 | Dainippon Printing Co Ltd | Abrasive tape |
| JPH08187665A (en) * | 1995-01-06 | 1996-07-23 | Dainippon Printing Co Ltd | Abrasive tape |
| JPH09248770A (en) * | 1995-07-18 | 1997-09-22 | Nippon Micro Coating Kk | Polishing sheet |
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2000
- 2000-07-28 JP JP2000228169A patent/JP2002036128A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01109082A (en) * | 1987-10-19 | 1989-04-26 | Tokyo Jiki Insatsu Kk | Abrasive film |
| JPH04294979A (en) * | 1991-03-19 | 1992-10-19 | Hitachi Maxell Ltd | Polishing sheet |
| JPH06179174A (en) * | 1992-12-11 | 1994-06-28 | Fuji Photo Film Co Ltd | Polishing body |
| JPH07205030A (en) * | 1994-01-17 | 1995-08-08 | Agency Of Ind Science & Technol | Polishing material using twin crystal alpha-alumina particle |
| JPH08187666A (en) * | 1995-01-06 | 1996-07-23 | Dainippon Printing Co Ltd | Abrasive tape |
| JPH08187665A (en) * | 1995-01-06 | 1996-07-23 | Dainippon Printing Co Ltd | Abrasive tape |
| JPH09248770A (en) * | 1995-07-18 | 1997-09-22 | Nippon Micro Coating Kk | Polishing sheet |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019215571A1 (en) * | 2018-05-10 | 2019-11-14 | 3M Innovative Properties Company | Abrasive articles including soft shaped abrasive particles |
| CN112105705A (en) * | 2018-05-10 | 2020-12-18 | 3M创新有限公司 | Abrasive article including soft shaped abrasive particles |
| CN112105705B (en) * | 2018-05-10 | 2022-07-26 | 3M创新有限公司 | Abrasive article including soft shaped abrasive particles |
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