JP2002026507A - Heating furnace for reflow soldering - Google Patents

Heating furnace for reflow soldering

Info

Publication number
JP2002026507A
JP2002026507A JP2000200969A JP2000200969A JP2002026507A JP 2002026507 A JP2002026507 A JP 2002026507A JP 2000200969 A JP2000200969 A JP 2000200969A JP 2000200969 A JP2000200969 A JP 2000200969A JP 2002026507 A JP2002026507 A JP 2002026507A
Authority
JP
Japan
Prior art keywords
heating chamber
inert gas
substrate
section
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000200969A
Other languages
Japanese (ja)
Inventor
Gosuke Nakao
剛介 中尾
Taro Matsuoka
太郎 松岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP2000200969A priority Critical patent/JP2002026507A/en
Publication of JP2002026507A publication Critical patent/JP2002026507A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To eliminate the adhesion of flux to the substrate carrying-in section or substrate carrying-out section of a heating furnace for reflow soldering, to make adhering flux cleaning work easier, and to stably maintain the oxygen concentration in the heating chamber of the furnace at a low value. SOLUTION: This heating furnace for reflow soldering is provided with the heating chamber 5 in which an inert gas is filled up and a planar heater 1, a blower 3 for refluxing the inert gas, etc., are set up, and then, circuit boards 4 mounted with electronic parts are heated to a soldering temperature; the substrate carrying-in section 6 which carries the circuit boards 4 in the heating chamber 5; and the substrate carrying-out section 7 which carries out the circuit boards 4 from the chamber 5. In the heating furnace, a by-pass passage 13 through which part of the inert gas heated in the heating chamber 5 is refluxed to the chamber 5 after by-passing the substrate carrying-in section 6 or carrying- out section 7 is provided between at least either one of the sections 6 and 7 and the heating chamber 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品を回路基
板にリフロー半田付けするためのリフロー半田付け用加
熱炉に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflow soldering heating furnace for reflow soldering an electronic component to a circuit board.

【0002】[0002]

【従来の技術】電子部品を回路基板にリフロー半田付け
により実装する場合には、電子部品を所定の位置に搭載
した回路基板を加熱炉に通し、半田を溶融させて半田付
けを行う。この場合、加熱炉内には窒素ガス等の不活性
ガスを充満させて、回路基板や電子部品の酸化を防止し
ている。
2. Description of the Related Art When an electronic component is mounted on a circuit board by reflow soldering, the circuit board on which the electronic component is mounted at a predetermined position is passed through a heating furnace, and the solder is melted and soldered. In this case, the heating furnace is filled with an inert gas such as nitrogen gas to prevent oxidation of the circuit board and the electronic components.

【0003】従来のこの種の半田付け用加熱炉は、図3
に示すように、内部に不活性ガスが充満され、且つ、面
状ヒータ1、棒状ヒータ2、不活性ガスを還流させる送
風機3等が設置され、電子部品を搭載した回路基板4を
半田付け温度に加熱する加熱室5と、加熱室5に前記回
路基板4を搬入する基板搬入部6と、加熱室5から前記
回路基板4を搬出する基板搬出部7とを備えており、そ
の中を電子部品を搭載した回路基板4がチェーンコンベ
ア8により、両側縁を支持された状態で走行するように
なっている。チェーンコンベア8の代わりにメッシュコ
ンベアを使用する場合もある。
A conventional heating furnace for this type of soldering is shown in FIG.
As shown in the figure, the inside is filled with an inert gas, and a planar heater 1, a bar-shaped heater 2, a blower 3 for recirculating the inert gas, and the like are installed. A heating chamber 5 for heating the circuit board 4, a board loading section 6 for loading the circuit board 4 into the heating chamber 5, and a board unloading section 7 for unloading the circuit board 4 from the heating chamber 5. The circuit board 4 on which the components are mounted travels with both side edges supported by the chain conveyor 8. A mesh conveyor may be used instead of the chain conveyor 8.

【0004】加熱室5内には電子部品を搭載した回路基
板4の酸化を防止するために不活性ガスを充満させてあ
る。この不活性ガスは図示しない不活性ガス供給管から
供給され、外部から炉内に空気が侵入するのを防止する
ため、基板搬入部6及び基板搬出部7から常時少しずつ
不活性ガスが外部に流出するように、その供給量が調節
されている。また、この不活性ガスが外部に流出する量
を少なくするため、基板搬入部6及び基板搬出部7内に
は、ガスシール部材9を配置し、これによってこれら搬
入搬出部内を通る不活性ガスに抵抗を与え、不活性ガス
の流出を制限している。ガスシール部材9は通常、回路
基板4の走行方向に、所定の間隔をおいて配置した多数
の金属板等で構成されている。
The heating chamber 5 is filled with an inert gas to prevent oxidation of the circuit board 4 on which electronic components are mounted. The inert gas is supplied from an inert gas supply pipe (not shown). In order to prevent air from entering the furnace from the outside, the inert gas is gradually and gradually supplied to the outside from the substrate carry-in portion 6 and the substrate carry-out portion 7. The supply is regulated so that it flows out. In addition, in order to reduce the amount of the inert gas flowing out, a gas seal member 9 is disposed in the substrate carrying-in portion 6 and the substrate carrying-out portion 7, so that the inert gas passing through the carrying-in / out portion is reduced. Provides resistance and limits the flow of inert gas. The gas seal member 9 is usually composed of a large number of metal plates or the like arranged at predetermined intervals in the traveling direction of the circuit board 4.

【0005】また、リフロー半田付けの際、半田付けさ
れる金属表面の酸化膜を除去し、半田付け中に加熱で再
酸化するのを防止し、半田の表面張力を小さくして濡れ
をよくするため、フラックス(塗布材)が多く使用され
ている。このフラックスは、電子部品を搭載した回路基
板4が加熱室5を通るうちに半田付け温度に加熱される
と、気化して不活性ガス中に混入する。気化したフラッ
クスの濃度が高くなると、加熱室5内を汚染するので、
例えば、図4に示すように、加熱室5の側壁に不活性ガ
スのバイパス通路10を設け、該通路10に設けた還流
ファン11により、加熱室5内の不活性ガスの一部をバ
イパス通路10に導入し、冷却フィン等の放熱部12に
より、不活性ガスを冷却してガス中に含まれるフラック
スを凝縮させ通路内周面に付着させて回収することによ
り、加熱室5内の汚染を防止している。
Also, at the time of reflow soldering, an oxide film on the surface of the metal to be soldered is removed to prevent reoxidation by heating during soldering, and to reduce the surface tension of the solder to improve the wetting. Therefore, flux (coating material) is often used. When the circuit board 4 on which the electronic components are mounted is heated to the soldering temperature while passing through the heating chamber 5, the flux is vaporized and mixed into the inert gas. When the concentration of the vaporized flux increases, the inside of the heating chamber 5 is contaminated.
For example, as shown in FIG. 4, an inert gas bypass passage 10 is provided on a side wall of the heating chamber 5, and a part of the inert gas in the heating chamber 5 is bypassed by a recirculation fan 11 provided in the passage 10. 10, the inert gas is cooled by a heat radiating unit 12 such as a cooling fin, and the flux contained in the gas is condensed and adhered to the inner peripheral surface of the passage to be collected. Preventing.

【0006】[0006]

【発明が解決しようとする課題】この種の加熱炉では、
加熱室5内における不活性ガス中に含まれる気化したフ
ラックスをある程度回収することができる。しかしなが
ら、加熱室5内でフラックスを完全に除去することは困
難であり、気化したフラックスを含む不活性ガスが基板
搬入部6又は基板搬出部7の狭い通路を通って炉外に流
出する際、気化したフラックスが基板搬入部6又は基板
搬出部7内で凝縮し内壁面等に付着する。そして、加熱
炉の運転を長時間継続すると、基板搬入部6又は基板搬
出部7内に付着したフラックスが回路基板4上に滴下し
て、回路基板4や電子部品を汚し、性能を悪くする等の
不良が発生する。特に、加熱室5内に不活性ガスを補充
供給する箇所から遠く離れた基板搬入部又は基板搬出部
の方が、不活性ガスの補充供給によって生じる流体カー
テンの作用を受けにくいため、気化したフラックスを含
む不活性ガスが炉外へより多く流出し、フラックスが付
着し易いという問題がある。
In this type of heating furnace,
The vaporized flux contained in the inert gas in the heating chamber 5 can be recovered to some extent. However, it is difficult to completely remove the flux in the heating chamber 5, and when the inert gas containing the vaporized flux flows out of the furnace through the narrow passage of the substrate carrying-in portion 6 or the substrate carrying-out portion 7, The vaporized flux is condensed in the substrate carry-in section 6 or the substrate carry-out section 7 and adheres to the inner wall surface or the like. When the operation of the heating furnace is continued for a long time, the flux attached to the substrate carry-in portion 6 or the substrate carry-out portion 7 drops on the circuit board 4 and contaminates the circuit board 4 and electronic components, thereby deteriorating the performance. Failure occurs. In particular, the substrate carrying-in portion or the substrate carrying-out portion, which is far from the place where the inert gas is replenished and supplied into the heating chamber 5, is less susceptible to the action of the fluid curtain caused by the replenishment and supply of the inert gas. There is a problem that more inert gas containing ash flows out of the furnace, and the flux easily adheres.

【0007】また、フラックスが付着した基板搬入部6
又は基板搬出部7の清掃を頻繁に行う必要が生じるほ
か、これら搬入、搬出部6、7の通路が一般に狭いた
め、清掃も容易でなく、清掃作業が煩雑になるという問
題も生じる。
In addition, the substrate loading section 6 to which the flux has adhered
Alternatively, it is necessary to frequently clean the substrate unloading section 7, and since the passages of the loading and unloading sections 6 and 7 are generally narrow, cleaning is not easy and the cleaning work becomes complicated.

【0008】一方、基板搬入部6又は基板搬出部7内に
付着したフラックスの清掃を容易にするため、基板搬入
部6又は基板搬出部7の通路面積及び開口寸法を大きく
することも考えられる。しかしながら、図5に示すよう
に、例えば、基板搬出部7(基板搬入部6は図示省略)
内において、この通路を通る回路基板4を境にして該基
板4の上側では、加熱室5内の高温の不活性ガスが加熱
室5外へ流出し、該基板4の下側では、低温の外気が加
熱室5内へ流入する水平対流が生じ易く、加熱室5内へ
の外気侵入により、加熱室5内の酸素濃度が高くなり、
且つ、不安定になって、回路基板や電子部品が酸化し易
くなる問題が生じる。
On the other hand, in order to facilitate cleaning of the flux adhering to the inside of the substrate carrying-in section 6 or the substrate carrying-out section 7, the passage area and the opening size of the substrate carrying-in section 6 or the substrate carrying-out section 7 may be increased. However, as shown in FIG. 5, for example, the substrate carry-out unit 7 (the substrate carry-in unit 6 is not shown).
Inside, the high temperature inert gas in the heating chamber 5 flows out of the heating chamber 5 above the substrate 4 with the circuit board 4 passing through this passage as a boundary, and the low temperature Horizontal convection in which outside air flows into the heating chamber 5 is likely to occur, and the oxygen concentration in the heating chamber 5 increases due to invasion of the outside air into the heating chamber 5,
In addition, there is a problem that the circuit board and the electronic components are easily oxidized due to instability.

【0009】本発明は上記の課題を解決し、基板搬入部
又は基板搬出部へのフラックスの付着及びこれによる回
路基板等への悪影響をなくし、また、付着したフラック
スの清掃作業を容易にし、更に、加熱室内の酸素濃度を
低濃度且つ安定に保持するリフロー半田付け用加熱炉を
提供するものである。
The present invention solves the above-mentioned problems, eliminates the adhesion of the flux to the board carry-in section or the board carry-out section and the adverse effect on the circuit board and the like, and also facilitates the work of cleaning the adhered flux. Another object of the present invention is to provide a heating furnace for reflow soldering that stably maintains the oxygen concentration in a heating chamber at a low concentration.

【0010】[0010]

【課題を解決するための手段】上記課題を解決するた
め、本発明の請求項1に記載されたリフロー半田付け用
加熱炉は、内部に不活性ガスが充満され、且つ、面状ヒ
ータ、不活性ガスを還流させる送風機等が設置され、電
子部品を搭載した回路基板を半田付け温度に加熱する加
熱室と、加熱室に前記回路基板を搬入する基板搬入部
と、加熱室から前記回路基板を搬出する基板搬出部とを
備えたリフロー半田付け用加熱炉において、前記基板搬
入部又は基板搬出部の少なくとも一方と加熱室との間
に、加熱室内で加熱された不活性ガスの一部を前記基板
搬入部又は基板搬出部内にバイパスさせて加熱室内に還
流させるバイパス通路を設けることを特徴とする。
According to a first aspect of the present invention, there is provided a heating furnace for reflow soldering, wherein the inside of the heating furnace is filled with an inert gas. A blower or the like for circulating the active gas is installed, a heating chamber for heating the circuit board on which the electronic components are mounted to a soldering temperature, a board loading section for loading the circuit board into the heating chamber, and the circuit board from the heating chamber. In a heating furnace for reflow soldering having a substrate carrying-out part to carry out, between at least one of the substrate carrying-in part or the substrate carrying-out part and the heating chamber, a part of the inert gas heated in the heating chamber, It is characterized in that a bypass passage is provided for bypassing into the substrate carry-in portion or substrate carry-out portion and returning to the heating chamber.

【0011】このような構成により、基板搬入部又は基
板搬出部が加熱室内の高温の不活性ガスにより加熱され
るので、基板搬入部又は基板搬出部内でフラックスがガ
ス凝縮により付着することがなくなり、フラックスの滴
下による不良発生の問題が解消する。また、フラックス
が付着しにくいので、基板搬入部又は基板搬出部の清掃
作業が容易になり、メンテナンスが楽になる。更に、基
板搬入部又は基板搬出部にバイパスされた不活性ガスは
加熱室内に還流されるので、基板搬入部又は基板搬出部
の通路面積が広くなっても、この部分で縦方向(回路基
板の走行方向に垂直な方向)の流体カーテンが形成され
て水平対流が起こりにくくなり、不活性ガス(窒素ガス
等)の必要以上の流出及び外気の侵入を抑制して、加熱
室内の酸素濃度を低濃度且つ安定に保持することが可能
になり、回路基板や電子部品の酸化を防止することがで
きる。
[0011] With such a configuration, the substrate carry-in portion or the substrate carry-out portion is heated by the high-temperature inert gas in the heating chamber, so that the flux does not adhere to the substrate carry-in portion or the substrate carry-out portion due to gas condensation. The problem of defective generation due to flux dripping is eliminated. Further, since the flux is not easily adhered, the cleaning operation of the substrate carrying-in portion or the substrate carrying-out portion becomes easy, and maintenance becomes easy. Further, since the inert gas bypassed to the substrate carry-in portion or the substrate carry-out portion is recirculated into the heating chamber, even when the passage area of the substrate carry-in portion or the substrate carry-out portion becomes large, the inert gas flows in the vertical direction (for the circuit board). A fluid curtain in the direction perpendicular to the running direction is formed, and horizontal convection hardly occurs. Unnecessary outflow of inert gas (nitrogen gas, etc.) and intrusion of outside air are suppressed, and oxygen concentration in the heating chamber is reduced. It is possible to stably maintain the concentration and to prevent the oxidation of the circuit board and the electronic components.

【0012】また、本発明の請求項2に記載された加熱
炉は、請求項1記載のものにおいて、前記バイパス通路
を、前記基板搬入部又は基板搬出部の少なくとも一方と
加熱室内の送風機の吸引側部分との間に設けることを特
徴とする。このような構成により、送風機の吸引側は吐
出側の加熱室内及び基板搬入部又は基板搬出部内雰囲気
圧力より低くなるので、加熱室内で加熱された不活性ガ
スの一部を前記基板搬入部又は基板搬出部内にバイパス
させると共に、バイパス通路を通して加熱室内に還流さ
せることが容易となり、バイパス通路に別に不活性ガス
を還流する送風機を設ける必要がなくなり、動力費用を
節減することができるほか、加熱炉の小型化を図ること
ができる。
According to a second aspect of the present invention, there is provided a heating furnace according to the first aspect, wherein the bypass passage is connected to at least one of the substrate carrying-in portion and the substrate carrying-out portion and a blower of a blower in a heating chamber. It is characterized by being provided between the side part. With such a configuration, the suction side of the blower is lower than the atmospheric pressure in the heating chamber on the discharge side and in the substrate carry-in section or the substrate carry-out section, so that a part of the inert gas heated in the heating chamber is transferred to the substrate carry-in section or the substrate. In addition to the bypass in the carry-out section, it is easy to return to the heating chamber through the bypass passage, and it is not necessary to provide a separate blower for returning the inert gas to the bypass passage. The size can be reduced.

【0013】更に、本発明の請求項3に記載された加熱
炉は、請求項1又は請求項2記載のものにおいて、前記
バイパス通路の中間に、該通路内を還流する不活性ガス
を冷却し、不活性ガス中に含まれるフラックスをガス凝
縮により付着させて回収する冷却手段を設けることを特
徴とする。このような構成により、気化されたフラック
スが、基板搬入部又は基板搬出部内ではなく、バイパス
通路内にガス凝縮により付着するので、フラックスを効
率よく回収することが容易となり、加熱室内に充満され
た不活性ガス中のフラックス濃度を可及的に減少させる
ことができる。
Further, according to a third aspect of the present invention, in the heating furnace according to the first or second aspect, an inert gas circulating in the bypass passage is cooled in the middle of the bypass passage. And a cooling means for collecting and recovering the flux contained in the inert gas by gas condensation. With such a configuration, the vaporized flux adheres to the bypass passage, not in the substrate carry-in portion or the substrate carry-out portion, by gas condensation, so that it becomes easy to efficiently collect the flux, and the heating chamber is filled. The flux concentration in the inert gas can be reduced as much as possible.

【0014】[0014]

【発明の実施の形態】次に、本発明の実施形態を図面に
基づき詳細に説明する。図1において、先に説明した図
3乃至図5に示す加熱炉と同一構成部分には同一符号を
付してある。この実施形態のリフロー半田付け用加熱炉
は、内部に不活性ガスが充満され、且つ、面状ヒータ
1、棒状ヒータ2、不活性ガスを還流させる送風機3等
が設置され、電子部品を搭載した回路基板4を半田付け
温度に加熱する加熱室5と、加熱室5に前記回路基板4
を搬入する基板搬入部6と、加熱室5から前記回路基板
4を搬出する基板搬出部7とを備えており、その中を電
子部品を搭載した回路基板4がチェーンコンベア8によ
り、両側縁を支持された状態で走行するようになってい
る。送風機3としては、低圧で風量の大きい、例えば、
シロッコファン等の遠心羽根型送風機が用いられる。チ
ェーンコンベア8の代わりにメッシュコンベア等を使用
してもよい。
Next, embodiments of the present invention will be described in detail with reference to the drawings. 1, the same components as those of the heating furnace shown in FIGS. 3 to 5 described above are denoted by the same reference numerals. The reflow soldering heating furnace of this embodiment is filled with an inert gas, and is provided with a planar heater 1, a bar-shaped heater 2, a blower 3 for recirculating the inert gas, and the like, and electronic components are mounted thereon. A heating chamber 5 for heating the circuit board 4 to a soldering temperature;
And a board unloading section 7 for unloading the circuit board 4 from the heating chamber 5. The circuit board 4 on which the electronic components are mounted is separated by a chain conveyer 8 on both sides thereof. It travels in a supported state. The blower 3 has a low pressure and a large air volume, for example,
A centrifugal blade type blower such as a sirocco fan is used. A mesh conveyor or the like may be used instead of the chain conveyor 8.

【0015】加熱室5内には、電子部品を搭載した回路
基板4の酸化を防止するために、窒素ガス等の不活性ガ
スを大気圧より少し高めに加圧して充満させてある。こ
の不活性ガスは図示しない不活性ガス供給管から供給さ
れ、外部から炉内に空気が侵入するのを防止するため、
基板搬入部6及び基板搬出部7から常時少しずつ不活性
ガスが外部に流出するように、その供給量が調節されて
いる。また、この不活性ガスが外部に流出する量を少な
くするため、基板搬入部6及び基板搬出部7内には、ガ
スシール部材9を配置し、これによってこれら搬入、搬
出部6、7内を通る不活性ガスに抵抗を与え、不活性ガ
スの流出を制限している。ガスシール部材9は通常、回
路基板4の走行方向に、所定の間隔をおいて配置した多
数の金属板等で構成されている。なお、図示するのを省
略するが、従来の前記加熱炉と同様に、加熱室5の側壁
には、リフロー半田付けの際、気化して不活性ガス中に
混入したフラックスを除去して回収するために、バイパ
ス通路を設けて、該通路内に、還流ファンにより、加熱
室5内の不活性ガスの一部を導入し、これを通路途中で
放熱部により冷却し、フラックスを凝縮させて通路内周
面に付着させるようになっている。
The heating chamber 5 is filled with an inert gas such as nitrogen gas by pressurizing it slightly above atmospheric pressure in order to prevent oxidation of the circuit board 4 on which the electronic components are mounted. This inert gas is supplied from an inert gas supply pipe (not shown), and in order to prevent air from entering the furnace from outside,
The supply amount of the inert gas is adjusted so that the inert gas always flows out little by little from the substrate carry-in portion 6 and the substrate carry-out portion 7. In addition, in order to reduce the amount of the inert gas flowing out, a gas seal member 9 is disposed in the substrate carrying-in portion 6 and the substrate carrying-out portion 7, so that the insides of the carrying-in and carrying-out portions 6 and 7 are reduced. This provides resistance to the passing inert gas and limits the flow of the inert gas. The gas seal member 9 is usually composed of a large number of metal plates or the like arranged at predetermined intervals in the traveling direction of the circuit board 4. Although not shown, as in the case of the conventional heating furnace, on the side wall of the heating chamber 5, during the reflow soldering, the flux that has been vaporized and mixed into the inert gas is removed and collected. For this purpose, a bypass passage is provided, and a part of the inert gas in the heating chamber 5 is introduced into the passage by a recirculation fan, and is cooled by a heat radiating part in the middle of the passage to condense the flux. It is designed to adhere to the inner peripheral surface.

【0016】このような構成の加熱炉は従来のものと同
じである。本実施形態の加熱炉では、更に、前記基板搬
入部6及び基板搬出部7と加熱室5との間に、加熱室5
内で加熱された不活性ガスの一部を、前記基板搬入部6
及び基板搬出部7内にバイパスさせて加熱室5内に還流
させるバイパス通路13が設けられている。バイパス通
路13は、配管、ダクト等で構成される。
The heating furnace having such a configuration is the same as the conventional one. In the heating furnace according to the present embodiment, the heating chamber 5 is further provided between the substrate loading section 6 and the substrate unloading section 7 and the heating chamber 5.
A part of the inert gas heated in the substrate
In addition, a bypass passage 13 is provided for bypassing the inside of the substrate carrying-out section 7 and returning to the heating chamber 5. The bypass passage 13 includes a pipe, a duct, and the like.

【0017】このように、バイパス通路13が基板搬入
部6及び基板搬出部7に設けられることにより、基板搬
入部6及び基板搬出部7が加熱室内5の高温の不活性ガ
スにより加熱されることになり、このため、基板搬入部
6又は基板搬出部7の内壁面やガスシール部材9の表面
等に、フラックスがガス凝縮により付着することがなく
なり、フラックスの滴下による不良発生の問題が解消す
る。また、フラックスが付着しにくいので、基板搬入部
6及び基板搬出部7の清掃作業が容易になり、メンテナ
ンスが楽になる。更に、これら基板搬入、搬出部6、7
にバイパスされた不活性ガスは加熱室5内に還流される
ので、これら通路面積が広くなっても、この部分で縦方
向(回路基板4の走行方向に垂直な方向)の流体カーテ
ンが形成されて水平対流が起こりにくく、不活性ガスの
必要以上の流出及び外気の侵入を抑制して、加熱室5内
の酸素濃度を低濃度且つ安定に保持することが可能にな
り、回路基板や電子部品の酸化を防止することができる
利点がある。
As described above, since the bypass passage 13 is provided in the substrate carrying-in portion 6 and the substrate carrying-out portion 7, the substrate carrying-in portion 6 and the substrate carrying-out portion 7 are heated by the high-temperature inert gas in the heating chamber 5. Therefore, the flux does not adhere to the inner wall surface of the substrate carry-in portion 6 or the substrate carry-out portion 7 or the surface of the gas seal member 9 due to gas condensation, and the problem of the occurrence of defects due to the dripping of the flux is solved. . Further, since the flux is not easily adhered, the cleaning operation of the substrate carrying-in section 6 and the substrate carrying-out section 7 is facilitated, and the maintenance is facilitated. Further, these substrate loading / unloading units 6, 7
The inert gas that has been bypassed into the heating chamber 5 is returned to the heating chamber 5, so that even if the passage area becomes large, a fluid curtain in a vertical direction (a direction perpendicular to the running direction of the circuit board 4) is formed at this portion. Horizontal convection is unlikely to occur, and it is possible to suppress the outflow of the inert gas more than necessary and the invasion of the outside air, and it is possible to stably maintain the oxygen concentration in the heating chamber 5 at a low concentration. There is an advantage that the oxidation of can be prevented.

【0018】また、本実施形態では、バイパス通路13
が、基板搬入部6及び基板搬出部7と加熱室5内の送風
機3の吸引側部分との間に設けられている。このような
構成によると、送風機3の吸引側は吐出側の加熱室5内
及び基板搬入、搬出部6、7内雰囲気圧力より低くなる
ので、加熱室5内で加熱された不活性ガスの一部を前記
基板搬入部6及び基板搬出部7内にバイパスさせると共
に、バイパス通路13を通して加熱室5内に還流させる
ことが容易となり、バイパス通路13に不活性ガスを還
流する還流ファンを設ける必要がなくなり、動力費用を
節減することができるほか、加熱炉の小型化を図ること
ができる利点がある。
In the present embodiment, the bypass passage 13
Are provided between the substrate carry-in unit 6 and the substrate carry-out unit 7 and the suction side portion of the blower 3 in the heating chamber 5. According to such a configuration, the suction side of the blower 3 becomes lower than the atmospheric pressure in the heating chamber 5 on the discharge side and in the substrate loading / unloading sections 6 and 7. It is necessary to provide a recirculation fan that recirculates the inert gas to the bypass passage 13 by easily bypassing the part into the substrate carry-in part 6 and the substrate carry-out part 7 and circulating the inert gas into the heating chamber 5 through the bypass passage 13. This has the advantage that power costs can be reduced and the heating furnace can be downsized.

【0019】更に、本実施形態では、バイパス通路13
の中間に該通路内を還流する不活性ガスを冷却し、不活
性ガス中に含まれるフラックスを凝縮させて回収する冷
却手段14が設けられる。冷却手段14としては、冷却
フィン、ヒートパイプ、水冷ジャッケト等を利用した放
熱部が用いられる。このように構成されていると、気化
されたフラックスがバイパス通路13内でガス凝縮によ
り付着するので、フラックスを効率よく回収することが
容易となり、また、加熱室内に充満された不活性ガス中
のフラックス濃度を可及的に減少させることができる。
なお、フラックス付着回収部分はバイパス通路13から
取り外し容易な構造になっていると、メンテナンスがよ
り楽になり好ましい。
Further, in the present embodiment, the bypass passage 13
A cooling means 14 is provided in the middle of the cooling device 14 for cooling the inert gas refluxing in the passage and condensing and recovering the flux contained in the inert gas. As the cooling means 14, a radiator using a cooling fin, a heat pipe, a water-cooled jacket, or the like is used. With such a configuration, the vaporized flux adheres by gas condensation in the bypass passage 13, so that it is easy to efficiently collect the flux, and the flux in the inert gas filled in the heating chamber becomes easy. The flux concentration can be reduced as much as possible.
In addition, it is preferable that the flux adhesion recovery portion has a structure that can be easily removed from the bypass passage 13 because maintenance is easier.

【0020】前記本実施形態の加熱炉では、前記バイパ
ス通路13が、基板搬入部6及び基板搬出部7の両方に
設けられている構造になっている。ところで、基板搬入
部6及び基板搬出部7に付着するフラックスの量は、加
熱室5内に不活性ガスを補充供給する個所や加熱室5内
を流れる不活性ガスの流れ状態等によって異なることが
ある。例えば、不活性ガスを補充供給する箇所から遠い
方の基板搬入部6又は基板搬出部7の方にフラックスが
多く付着する傾向がある。このような場合には、フラッ
クスの多く付着する傾向のある基板搬入部6又は基板搬
出部7の方にのみ、バイパス通路13を設けるようにし
てもよく、このようにしても、前記したような効果が得
られ、本発明の目的を達成することができる。
The heating furnace of the present embodiment has a structure in which the bypass passage 13 is provided in both the substrate carrying-in section 6 and the substrate carrying-out section 7. By the way, the amount of the flux adhering to the substrate carry-in section 6 and the substrate carry-out section 7 may vary depending on the location where the inert gas is replenished and supplied into the heating chamber 5 and the flow state of the inert gas flowing through the heating chamber 5. is there. For example, a large amount of flux tends to adhere to the substrate carrying-in portion 6 or the substrate carrying-out portion 7 far from the location where the inert gas is replenished and supplied. In such a case, the bypass passage 13 may be provided only in the substrate carrying-in portion 6 or the substrate carrying-out portion 7 where a large amount of flux tends to adhere. The effect is obtained, and the object of the present invention can be achieved.

【0021】図2に示すものは、基板搬出部7と送風機
3が配置されない箇所の加熱室5との間にバイパス通路
13が設けられる構造の例である。この場合には、加熱
室5内で加熱された不活性ガスの一部を、図の矢印で示
すように、基板搬出部7内にバイパスさせ、更に、バイ
パス通路13を通して再び加熱室5内へ速やかに還流さ
せるために、バイパス通路13の中間に還流ファン15
を設けることが好ましい。このように不活性ガスを基板
搬出部7と加熱室5との間で還流させることにより、加
熱室5と基板搬出部7との境界部分には、不活性ガスに
よる縦方向(回路基板4の走行方向に垂直な方向)の流
体カーテンが形成される。このため、従来の加熱炉で起
きていたガスの水平対流が起こり難くなり、不活性ガス
の必要以上の流出及び外気の侵入を抑制して、加熱室内
の酸素濃度が安定且つ低濃度になって、回路基板や電子
部品の酸化を防止することができる。なお、図2に示す
構造は基板搬入部6、又は基板搬入部6及び基板搬出部
7の両方にも適用することができるものである。
FIG. 2 shows an example of a structure in which a bypass passage 13 is provided between the substrate unloading section 7 and the heating chamber 5 where the blower 3 is not disposed. In this case, a part of the inert gas heated in the heating chamber 5 is bypassed into the substrate unloading section 7 as shown by the arrow in FIG. In order to recirculate quickly, a recirculation fan 15
Is preferably provided. By circulating the inert gas between the substrate unloading section 7 and the heating chamber 5 in this manner, the boundary between the heating chamber 5 and the substrate unloading section 7 is formed in a vertical direction by the inert gas (for the circuit board 4). (A direction perpendicular to the running direction) is formed. For this reason, horizontal convection of gas, which has occurred in the conventional heating furnace, is unlikely to occur, and unnecessary outflow of inert gas and intrusion of outside air are suppressed, and the oxygen concentration in the heating chamber becomes stable and low. In addition, oxidation of the circuit board and the electronic components can be prevented. The structure shown in FIG. 2 can be applied to the substrate carrying-in section 6 or both the substrate carrying-in section 6 and the substrate carrying-out section 7.

【0022】[0022]

【発明の効果】以上説明したように、本発明によれば、
前記基板搬入部又は基板搬出部の少なくとも一方と加熱
室との間に、加熱室内で加熱された不活性ガスの一部を
前記基板搬入部又は基板搬出部内にバイパスさせて加熱
室内に還流させるバイパス通路を設けるので、基板搬入
部又は基板搬出部内にフラックスがガス凝縮により付着
することがなくなり、フラックスの滴下による不良発生
の問題が解消する。また、フラックスが付着しにくいの
で、基板搬入部又は基板搬出部の清掃作業が容易にな
り、メンテナンスが楽になる。更に、不活性ガスの必要
以上の流出及び外気の侵入が抑制されて、加熱室内の酸
素濃度を低濃度且つ安定に保持することが可能になり、
回路基板や電子部品の酸化を防止することができる。
As described above, according to the present invention,
A bypass that allows a part of the inert gas heated in the heating chamber to be bypassed in the substrate loading section or the substrate unloading section and to be returned to the heating chamber between at least one of the substrate loading section or the substrate unloading section and the heating chamber. Since the passage is provided, the flux does not adhere to the substrate carrying-in portion or the substrate carrying-out portion due to gas condensation, and the problem of the occurrence of defects due to the dripping of the flux is solved. Further, since the flux does not easily adhere to the substrate, the work of cleaning the substrate carry-in portion or the substrate carry-out portion becomes easy, and maintenance becomes easy. Furthermore, unnecessary outflow of inert gas and intrusion of outside air are suppressed, and the oxygen concentration in the heating chamber can be kept low and stable.
Oxidation of circuit boards and electronic components can be prevented.

【0023】また、前記バイパス通路を、前記基板搬入
部又は基板搬出部の少なくとも一方と加熱室内の送風機
の吸引側部分との間に設けるようにすると、加熱室内で
加熱された不活性ガスの一部を前記基板搬入部又は基板
搬出部内にバイパスさせると共に、バイパス通路を通し
て加熱室内に還流させることが容易となり、バイパス通
路に別に不活性ガスを還流する送風機を設ける必要がな
くなり、動力費用を節減することができるほか、加熱炉
の小型化を図ることができる。
Further, when the bypass passage is provided between at least one of the substrate carry-in portion and the substrate carry-out portion and the suction side of the blower in the heating chamber, one of the inert gas heated in the heating chamber is provided. In addition to bypassing the unit into the substrate carry-in unit or the substrate carry-out unit, it is easy to recirculate the heat into the heating chamber through the bypass passage, and it is not necessary to provide a separate blower for recirculating the inert gas in the bypass passage, thereby reducing power costs. In addition, the heating furnace can be reduced in size.

【0024】更に、前記バイパス通路の中間に、該通路
内を還流する不活性ガスを冷却し、不活性ガス中に含ま
れるフラックスをガス凝縮により付着させて回収する冷
却手段を設けるようにすると、気化されたフラックス
を、基板搬入部又は基板搬出部内ではなく、バイパス通
路内にガス凝縮により付着させることができるので、フ
ラックスを効率よく回収することが容易となり、加熱室
内に充満された不活性ガス中のフラックス濃度を可及的
に減少させることができる。
Further, a cooling means is provided in the middle of the bypass passage for cooling the inert gas circulating in the passage and for collecting and recovering the flux contained in the inert gas by gas condensation. The vaporized flux can be attached by gas condensation in the bypass passage, not in the substrate carry-in or substrate carry-out part, so that the flux can be easily collected efficiently, and the inert gas filled in the heating chamber can be easily collected. The flux concentration in the medium can be reduced as much as possible.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態に係るリフロー半田付け用加
熱炉を示す断面図である。
FIG. 1 is a cross-sectional view showing a heating furnace for reflow soldering according to an embodiment of the present invention.

【図2】本発明の加熱炉において、バイパス通路を基板
搬出部側に設ける場合の変形例を示す部分断面図であ
る。
FIG. 2 is a partial cross-sectional view showing a modification in the case where a bypass passage is provided on the substrate carry-out portion side in the heating furnace of the present invention.

【図3】従来のリフロー半田付け用加熱炉を示す断面図
である。
FIG. 3 is a sectional view showing a conventional heating furnace for reflow soldering.

【図4】従来の加熱炉におけるフラックスの回収手段を
示す断面図である。
FIG. 4 is a sectional view showing a flux collecting means in a conventional heating furnace.

【図5】従来の加熱炉において、基板搬出部における不
活性ガスの流出と外気の侵入状態を示す説明図である。
FIG. 5 is an explanatory view showing an outflow state of an inert gas and an intrusion state of outside air in a substrate carrying-out section in a conventional heating furnace.

【符号の説明】[Explanation of symbols]

1 面状ヒータ 2 棒状ヒータ 3 送風機 4 回路基板 5 加熱室 6 基板搬入部 7 基板搬出部 8 チェーンコンベア 9 ガスシール部材 10 バイパス通路 11 還流ファン 12 放熱部 13 バイパス通路 14 冷却手段 15 還流ファン DESCRIPTION OF SYMBOLS 1 Planar heater 2 Bar heater 3 Blower 4 Circuit board 5 Heating chamber 6 Substrate carry-in part 7 Substrate carry-out part 8 Chain conveyor 9 Gas seal member 10 Bypass passage 11 Reflux fan 12 Heat radiator 13 Bypass passage 14 Cooling means 15 Reflux fan

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // B23K 101:42 B23K 101:42 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // B23K 101: 42 B23K 101: 42

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 内部に不活性ガスが充満され、且つ、面
状ヒータ、不活性ガスを還流させる送風機等が設置さ
れ、電子部品を搭載した回路基板を半田付け温度に加熱
する加熱室と、加熱室に前記回路基板を搬入する基板搬
入部と、加熱室から前記回路基板を搬出する基板搬出部
とを備えたリフロー半田付け用加熱炉において、前記基
板搬入部又は基板搬出部の少なくとも一方と加熱室との
間に、加熱室内で加熱された不活性ガスの一部を前記基
板搬入部又は基板搬出部内にバイパスさせて加熱室内に
還流させるバイパス通路を設けることを特徴とするリフ
ロー半田付け用加熱炉。
1. A heating chamber in which an inert gas is filled, a planar heater, a blower for circulating the inert gas, and the like are installed, and a circuit board on which electronic components are mounted is heated to a soldering temperature. In a heating chamber for reflow soldering, comprising a board loading section for loading the circuit board into the heating chamber and a board loading section for unloading the circuit board from the heating chamber, at least one of the board loading section or the board loading section. Between the heating chamber and the heating chamber, a bypass passage for recirculating a part of the inert gas heated in the heating chamber into the substrate carrying-in portion or the substrate carrying-out portion and returning to the heating chamber is provided. heating furnace.
【請求項2】 前記バイパス通路を、前記基板搬入部又
は基板搬出部の少なくとも一方と加熱室内の送風機の吸
引側部分との間に設けることを特徴とする請求項1記載
のリフロー半田付け用加熱炉。
2. The heating for reflow soldering according to claim 1, wherein the bypass passage is provided between at least one of the substrate carry-in portion and the substrate carry-out portion and a suction side portion of a blower in a heating chamber. Furnace.
【請求項3】 前記バイパス通路の中間に、該通路内を
還流する不活性ガスを冷却し、不活性ガス中に含まれる
フラックスをガス凝縮により付着させて回収する冷却手
段を設けることを特徴とする請求項1又は2記載のリフ
ロー半田付け用加熱炉。
3. A cooling means for cooling an inert gas circulating in the bypass passage and collecting and collecting a flux contained in the inert gas by gas condensation is provided in the middle of the bypass passage. The reflow soldering heating furnace according to claim 1.
JP2000200969A 2000-07-03 2000-07-03 Heating furnace for reflow soldering Pending JP2002026507A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000200969A JP2002026507A (en) 2000-07-03 2000-07-03 Heating furnace for reflow soldering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000200969A JP2002026507A (en) 2000-07-03 2000-07-03 Heating furnace for reflow soldering

Publications (1)

Publication Number Publication Date
JP2002026507A true JP2002026507A (en) 2002-01-25

Family

ID=18698750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000200969A Pending JP2002026507A (en) 2000-07-03 2000-07-03 Heating furnace for reflow soldering

Country Status (1)

Country Link
JP (1) JP2002026507A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186060A (en) * 2004-12-27 2006-07-13 Oanesu:Kk Reflow soldering apparatus
CN103143798A (en) * 2011-12-07 2013-06-12 台湾积体电路制造股份有限公司 Ntegrated reflow and cleaning process and apparatus for performing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186060A (en) * 2004-12-27 2006-07-13 Oanesu:Kk Reflow soldering apparatus
CN103143798A (en) * 2011-12-07 2013-06-12 台湾积体电路制造股份有限公司 Ntegrated reflow and cleaning process and apparatus for performing the same

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