JP2002025880A5 - - Google Patents

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Publication number
JP2002025880A5
JP2002025880A5 JP1998067021A JP6702198A JP2002025880A5 JP 2002025880 A5 JP2002025880 A5 JP 2002025880A5 JP 1998067021 A JP1998067021 A JP 1998067021A JP 6702198 A JP6702198 A JP 6702198A JP 2002025880 A5 JP2002025880 A5 JP 2002025880A5
Authority
JP
Japan
Prior art keywords
optical system
exposure light
projection
photosensitive substrate
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998067021A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002025880A (ja
JP4029200B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP06702198A external-priority patent/JP4029200B2/ja
Priority to JP06702198A priority Critical patent/JP4029200B2/ja
Priority to PCT/JP1998/003319 priority patent/WO1999005710A1/ja
Priority to AU83581/98A priority patent/AU8358198A/en
Priority to DE69837483T priority patent/DE69837483T2/de
Priority to KR1020007000728A priority patent/KR100564437B1/ko
Priority to AT98933930T priority patent/ATE358888T1/de
Priority to EP98933930A priority patent/EP1009020B1/en
Priority to TW87117021A priority patent/TW429413B/zh
Priority to US09/490,781 priority patent/US6492649B1/en
Publication of JP2002025880A publication Critical patent/JP2002025880A/ja
Publication of JP2002025880A5 publication Critical patent/JP2002025880A5/ja
Publication of JP4029200B2 publication Critical patent/JP4029200B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP06702198A 1997-07-25 1998-03-17 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法 Expired - Lifetime JP4029200B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP06702198A JP4029200B2 (ja) 1997-12-08 1998-03-17 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法
EP98933930A EP1009020B1 (en) 1997-07-25 1998-07-24 Exposure method and exposure apparatus
AU83581/98A AU8358198A (en) 1997-07-25 1998-07-24 Projection aligner, projection exposure method, optical cleaning method and method of fabricating semiconductor device
DE69837483T DE69837483T2 (de) 1997-07-25 1998-07-24 Belichtungsverfahren und Belichtungsapparat
KR1020007000728A KR100564437B1 (ko) 1997-07-25 1998-07-24 투영 노광 장치, 투영 노광 방법, 광 세정 방법 및 반도체디바이스의 제조 방법
AT98933930T ATE358888T1 (de) 1997-07-25 1998-07-24 Belichtungsverfahren und belichtungsapparat
PCT/JP1998/003319 WO1999005710A1 (fr) 1997-07-25 1998-07-24 Aligneur de projection, procede d'exposition a une projection, procede de nettoyage optique et procede de fabrication de dispositifs a semi-conducteurs
TW87117021A TW429413B (en) 1997-12-08 1998-10-14 Projection exposure device, projection exposure method, optical cleaning method, and the method of fabricating semiconductor device
US09/490,781 US6492649B1 (en) 1997-07-25 2000-01-24 Projection exposure apparatus, projection exposure method, optical cleaning method and method of fabricating semiconductor device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33710497 1997-12-08
JP9-337104 1997-12-08
JP06702198A JP4029200B2 (ja) 1997-12-08 1998-03-17 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2002025880A JP2002025880A (ja) 2002-01-25
JP2002025880A5 true JP2002025880A5 (enrdf_load_stackoverflow) 2005-09-29
JP4029200B2 JP4029200B2 (ja) 2008-01-09

Family

ID=26408226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06702198A Expired - Lifetime JP4029200B2 (ja) 1997-07-25 1998-03-17 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法

Country Status (2)

Country Link
JP (1) JP4029200B2 (enrdf_load_stackoverflow)
TW (1) TW429413B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4586954B2 (ja) * 2003-04-04 2010-11-24 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US7671347B2 (en) * 2006-10-10 2010-03-02 Asml Netherlands B.V. Cleaning method, apparatus and cleaning system
JP5314433B2 (ja) * 2009-01-06 2013-10-16 ギガフォトン株式会社 極端紫外光源装置
JP5312959B2 (ja) * 2009-01-09 2013-10-09 ギガフォトン株式会社 極端紫外光源装置

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