JP2002016046A5 - - Google Patents

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Publication number
JP2002016046A5
JP2002016046A5 JP2000195201A JP2000195201A JP2002016046A5 JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5 JP 2000195201 A JP2000195201 A JP 2000195201A JP 2000195201 A JP2000195201 A JP 2000195201A JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000195201A
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Japanese (ja)
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JP2002016046A (en
JP4514291B2 (en
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Priority to JP2000195201A priority Critical patent/JP4514291B2/en
Priority claimed from JP2000195201A external-priority patent/JP4514291B2/en
Publication of JP2002016046A publication Critical patent/JP2002016046A/en
Publication of JP2002016046A5 publication Critical patent/JP2002016046A5/ja
Application granted granted Critical
Publication of JP4514291B2 publication Critical patent/JP4514291B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000195201A 2000-06-28 2000-06-28 Microwave plasma processing apparatus and plasma processing method Expired - Fee Related JP4514291B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000195201A JP4514291B2 (en) 2000-06-28 2000-06-28 Microwave plasma processing apparatus and plasma processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000195201A JP4514291B2 (en) 2000-06-28 2000-06-28 Microwave plasma processing apparatus and plasma processing method

Publications (3)

Publication Number Publication Date
JP2002016046A JP2002016046A (en) 2002-01-18
JP2002016046A5 true JP2002016046A5 (en) 2007-08-23
JP4514291B2 JP4514291B2 (en) 2010-07-28

Family

ID=18693895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000195201A Expired - Fee Related JP4514291B2 (en) 2000-06-28 2000-06-28 Microwave plasma processing apparatus and plasma processing method

Country Status (1)

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JP (1) JP4514291B2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2925535B2 (en) * 1997-05-22 1999-07-28 キヤノン株式会社 Microwave supplier having annular waveguide, plasma processing apparatus and processing method having the same
JP3979453B2 (en) * 1998-01-14 2007-09-19 東京エレクトロン株式会社 Microwave plasma processing equipment
JP4004154B2 (en) * 1998-10-20 2007-11-07 東京エレクトロン株式会社 Plasma processing equipment
JP2000173797A (en) * 1998-12-01 2000-06-23 Sumitomo Metal Ind Ltd Microwave plasma treating device

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