JP2002016046A5 - - Google Patents
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- JP2002016046A5 JP2002016046A5 JP2000195201A JP2000195201A JP2002016046A5 JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5 JP 2000195201 A JP2000195201 A JP 2000195201A JP 2000195201 A JP2000195201 A JP 2000195201A JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000195201A JP4514291B2 (en) | 2000-06-28 | 2000-06-28 | Microwave plasma processing apparatus and plasma processing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000195201A JP4514291B2 (en) | 2000-06-28 | 2000-06-28 | Microwave plasma processing apparatus and plasma processing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002016046A JP2002016046A (en) | 2002-01-18 |
JP2002016046A5 true JP2002016046A5 (en) | 2007-08-23 |
JP4514291B2 JP4514291B2 (en) | 2010-07-28 |
Family
ID=18693895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000195201A Expired - Fee Related JP4514291B2 (en) | 2000-06-28 | 2000-06-28 | Microwave plasma processing apparatus and plasma processing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4514291B2 (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2925535B2 (en) * | 1997-05-22 | 1999-07-28 | キヤノン株式会社 | Microwave supplier having annular waveguide, plasma processing apparatus and processing method having the same |
JP3979453B2 (en) * | 1998-01-14 | 2007-09-19 | 東京エレクトロン株式会社 | Microwave plasma processing equipment |
JP4004154B2 (en) * | 1998-10-20 | 2007-11-07 | 東京エレクトロン株式会社 | Plasma processing equipment |
JP2000173797A (en) * | 1998-12-01 | 2000-06-23 | Sumitomo Metal Ind Ltd | Microwave plasma treating device |
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2000
- 2000-06-28 JP JP2000195201A patent/JP4514291B2/en not_active Expired - Fee Related