JP2002006114A - Method for fabricating microlens substrate, microlens substrate, electro-optical device opposed substrate for liquid crystal panel, liquid crystal panel, and projection displaying device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a microlens substrate capable of reducing an aberration occurring in lens. SOLUTION: The micro lens substrate 1A includes a substrate with recessed part for microlens 2A that has a recessed part 31A and a first alignment mark 71, substrate with projected part for microlens 8A that has a projected part 32A and a second alignment mark 72, a resin layer 9A, a microlens 4A and a spacer 5. The micro lens 4A is composed of convex meniscus lenses that are made of resin material disposed between the recessed part 31A and the projected part 32A, and formed between the substrate with recessed part for microlens 2A and the substrate with projected part for microlens 8A in the micro lens substrate 1A.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for manufacturing a microlens substrate, a microlens substrate, an electro-optical device, a counter substrate for a liquid crystal panel, a liquid crystal panel, and a projection display device.

[0002]

2. Description of the Related Art Projection display devices for projecting an image on a screen are known. In this projection type display device, a liquid crystal panel is mainly used for image formation. Among such liquid crystal panels, there has been known a liquid crystal panel provided with a large number of minute microlenses at positions corresponding to respective pixels of the liquid crystal panel in order to enhance light use efficiency. Such a microlens is usually formed on a microlens substrate provided in a liquid crystal panel.

FIG. 19 is a longitudinal sectional view showing a conventional structure of a microlens substrate used for a liquid crystal panel. As shown in the figure, a microlens substrate 900 is bonded via a resin layer 909 to a glass substrate 902 provided with a large number of hemispherical concave portions 903 and a surface of the glass substrate 902 provided with the concave portions 903. In the resin layer 909, a micro lens 904 is formed by a resin filled in the concave portion 903.

However, in the microlens substrate 900 having such a structure, aberrations, especially spherical aberration, increase near the edge of the microlens 904.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to provide a method of manufacturing a microlens substrate capable of reducing lens aberrations,
A microlens substrate, an electro-optical device having such a microlens substrate, a counter substrate for a liquid crystal panel, a liquid crystal panel,
And a projection display device.

[0006]

This and other objects are achieved by the present invention which is defined below as (1) to (27).

(1) a first substrate having a plurality of concave curved surfaces;
A method for manufacturing a microlens substrate, comprising: bonding a second substrate having a plurality of convex curved surfaces to form a plurality of microlenses formed of a convex meniscus lens.

[0008] (2) A first substrate having a plurality of concave portions having a concave curved surface and a second substrate having a plurality of convex portions having a convex curved surface are resin-bonded so that the concave portions and the convex portions face each other. And forming a plurality of microlenses made of a convex meniscus lens between the first substrate and the second substrate.

(3) The method according to (1) or (2), wherein after joining the first substrate and the second substrate, at least one of the first substrate and the second substrate is adjusted in thickness. A manufacturing method of the microlens substrate according to the above.

(4) The above (1) to (3), wherein the thickness of the central part of the micro lens is 10 to 120 μm.
The method for producing a microlens substrate according to any one of the above.

(5) A resin including a spacer is provided outside a region of the first substrate and / or the second substrate where the lens curved surface is provided, and the first substrate and the second substrate are joined. The method for manufacturing a microlens substrate according to any one of the above (1) to (4).

(6) The method for manufacturing a microlens substrate according to the above (5), wherein the spacer is in the form of particles.

(7) An alignment mark is provided on each of the first substrate and the second substrate, and the alignment between the first substrate and the second substrate is performed using the alignment marks. A first substrate and the second substrate
The method for manufacturing a microlens substrate according to any one of the above (1) to (6), wherein the microlens substrate is bonded to a substrate.

(8) The concave curved surface of the first substrate and the second curved surface
The method of manufacturing a microlens substrate according to any one of the above (1) to (7), wherein the convex curved surface of the substrate is formed by a different forming method.

(9) A microlens substrate manufactured by the method for manufacturing a microlens substrate according to any one of (1) to (8).

(10) A microlens substrate having a plurality of microlenses provided on a substrate, wherein the microlens is constituted by a convex meniscus lens.

(11) A first substrate provided with a plurality of concave portions on its surface and a second substrate are joined via a resin layer, and a convex meniscus lens is provided between the first substrate and the second substrate. A microlens substrate, comprising a microlens comprising:

(12) A first substrate and a second substrate provided with a plurality of convex portions on the surface are joined via a resin layer, and a convex meniscus is provided between the first substrate and the second substrate. A microlens substrate comprising a microlens formed of a lens.

(13) A first substrate provided with a plurality of concave portions on the surface and a second substrate provided with a plurality of convex portions on the surface,
The concave portion and the convex portion are joined via a resin layer so as to face each other, and a microlens composed of a convex meniscus lens is configured between the first substrate and the second substrate. Microlens substrate.

(14) The microlens substrate according to any one of (11) to (13), wherein the substrate on the incident side is thicker than the substrate on the exit side.

(15) The microlens substrate according to any one of (11) to (14), wherein a spacer for defining the thickness of the resin layer is provided outside a region where the microlens is provided.

(16) The microlens substrate according to any one of (11) to (15), wherein the thickness of the resin layer in a region where the microlens is not provided is substantially equal to the edge thickness of the microlens. .

(17) The micro lens according to any one of (10) to (16), wherein the radius of curvature of the lens surface on the entrance side of the micro lens is larger than the radius of curvature of the lens surface on the exit side of the micro lens. Lens substrate.

(18) The microlens substrate according to any one of the above (10) to (17), wherein the thickness of the central part of the microlens is 10 to 120 μm.

(19) The microlens substrate according to any one of (10) to (18), wherein an alignment mark serving as an index for alignment is provided outside a region where the microlens is provided.

(20) An electro-optical device comprising the microlens substrate according to any one of (9) to (19).

(21) A counter substrate for a liquid crystal panel, wherein a conductive film is provided on the microlens substrate according to any one of (9) to (19).

(22) The microlens substrate according to any one of (9) to (19), a black matrix provided on the microlens substrate, and a conductive film covering the black matrix. Characteristic counter substrate for liquid crystal panels.

(23) A liquid crystal panel comprising the opposing substrate for a liquid crystal panel according to the above (21) or (22).

(24) A liquid crystal drive substrate provided with a pixel electrode, the opposing substrate for a liquid crystal panel according to the above (21) or (22) joined to the liquid crystal drive substrate, the liquid crystal drive substrate and the liquid crystal panel A liquid crystal panel, comprising: a liquid crystal sealed in a space between the liquid crystal panel and a counter substrate.

(25) The liquid crystal panel according to (24), wherein the liquid crystal drive substrate is a TFT substrate having the pixel electrodes arranged in a matrix and a thin film transistor connected to the pixel electrodes.

(26) A light valve provided with the liquid crystal panel according to any one of (23) to (25), wherein at least one light valve is used to modulate light and project an image. A projection type display device characterized by the above-mentioned.

(27) Three light valves corresponding to red, green, and blue for forming an image, a light source, and light from the light source is separated into red, green, and blue light, and the respective lights correspond to each other. A color separation optical system for guiding to the light valve, a color combining optical system for combining the images, and a projection display device having a projection optical system for projecting the combined image, wherein the light valve, A projection display device comprising the liquid crystal panel according to any one of (23) to (25).

[0034]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The substrate with concave portions for microlenses, the microlens substrate and the opposing substrate for liquid crystal panels according to the present invention include both individual substrates and wafers.

Hereinafter, the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings. Note that a case where a microlens substrate described in the following embodiment is used as a constituent member of a liquid crystal panel will be described as an example. FIG. 1 is a schematic longitudinal sectional view showing a first embodiment of the microlens substrate of the present invention.

As shown in the figure, a microlens substrate 1A of the present invention comprises a substrate 2A with concave portions for microlenses (first substrate), a substrate 8A with convex portions for microlenses (second substrate), a resin layer 9A, a micro lens 4A, and a spacer 5.

The substrate 2A with concave portions for microlenses has a plurality of concave portions (recesses for microlenses) 3 having concave curved surfaces (lens curved surfaces) on a first glass substrate (first transparent substrate) 29.
1A and a first alignment mark 71 are formed. The substrate with microlens projections 8A is
A plurality of convex portions (convex portions for microlenses) having convex curved surfaces (lens curved surfaces) on a second glass substrate (second transparent substrate) 89
32A and a second alignment mark 72 are formed.

The microlens substrate 1A has a resin layer (adhesive layer) such that the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses face the concave portions 31A and the convex portions 32A. It is configured to be joined via 9A. In the microlens substrate 1A, a concave portion 31A and a convex portion 32 are provided between the microlens concave substrate 2A and the microlens convex substrate 8A.
A micro lens 4A composed of a convex meniscus lens is formed of the resin provided between the micro lens 4A.

The microlens substrate 1A has two regions:
It has an effective lens area 99 and a non-effective lens area 100. The effective lens area 99 includes the concave portion 31A and the convex portion 3
Micro lens 4A formed of resin between 2A
Refers to a region that is effectively used as a microlens during use. On the other hand, the non-effective lens area 100 refers to an area other than the effective lens area 99.

Such a microlens substrate 1A is used, for example, by allowing light L to enter from the microlens concave substrate 2A side and emitting the light L from the microlens convex substrate 8A side.

In such a microlens substrate 1A,
The thickness of the substrate 2A with concave portions for microlenses, that is, the thickness T1 of the substrate on the incident side is larger than the thickness of the substrate 8A with convex portions for microlenses, that is, the thickness T2 of the substrate on the exit side. I have.

As described above, the micro lens 4A is
It is made of resin provided between the concave portion 31A and the convex portion 32A. For this reason, the curved surface (convex surface) of the entrance side of the microlens 4A corresponds to the shape of the concave surface of the concave portion 31A. The lens curved surface (concave curved surface) on the emission side of the micro lens 4A corresponds to the shape of the convex curved surface of the convex portion 32A.

In such a microlens substrate 1A,
Curvature radius R of the lens surface on the incident side of microlens 4A
1 is larger than the radius of curvature R2 of the exit-side lens curved surface. That is, the microlens substrate 1A
Thus, the radius of curvature of the concave portion 31A is larger than the radius of curvature of the convex portion 32A.

In the microlens substrate 1A, the distance between the opposing end faces of the microlens concave substrate 2A and the microlens convex substrate 8A (the part of the resin layer 9A where the microlenses 4A are not formed). Thickness) substantially coincides with and corresponds to the edge thickness of the microlens 4A.

When the microlens 4A is formed of a convex meniscus lens like the microlens substrate 1A of the present invention, the aberration (particularly, spherical aberration) of the microlens 4A can be reduced. Therefore, the incident light L incident not only near the center of the microlens 4A but also near the edge of the microlens 4A is suitably collected by the microlens 4A.

Moreover, when the aberration of the microlens 4A is reduced, it is possible to suitably prevent the outgoing light from being emitted in a direction largely shifted from the optical axis of the microlens 4A. Therefore, when the microlens substrate 1A is used for a liquid crystal panel, it is possible to appropriately prevent the outgoing light that has passed through the microlenses 4A from entering adjacent pixels. That is, crosstalk between pixels is prevented. Therefore, when an image is formed using the liquid crystal panel provided with the microlens substrate 1A of the present invention, the luminance of black becomes extremely low. Therefore, in the liquid crystal panel including the microlens substrate 1A of the present invention, a high contrast ratio can be obtained, and a more beautiful image can be formed.

In addition, the microlens substrate 1A of the present invention
When the micro lens 4A is formed of a convex meniscus lens as described above, the emitted light can be made to be close to parallel light.

In particular, the microlens substrate 1A shown in FIG.
Light L is incident from the concave portion 31A side as shown in FIG.
When the light L is emitted from the A side, total reflection at the outer peripheral portion (edge) of the microlens 4A (the concave portion 31A) can be prevented, and the light transmittance is improved.

Further, the microlens substrate 1A shown in FIG.
As described above, when the radius of curvature R1 of the curved lens surface on the incident side of the microlens 4A is larger than the radius of curvature R2 of the curved lens surface on the exit side, the aberration (particularly, spherical aberration) of the microlens 4A can be extremely reduced. Therefore, in the microlens 4A shown in FIG. 1, it is extremely suitably prevented that the outgoing light is emitted in a direction largely deviated from the optical axis of the microlens 4A.

Further, when the thickness T1 of the substrate on the incident side is made larger than the thickness T2 of the substrate on the exit side as in the microlens substrate 1A shown in FIG. Even if a black matrix is formed, it is possible to prevent the luminance of the emitted light L from being significantly reduced. In addition, it is possible to prevent the strength of the microlens substrate 1A from decreasing.

Further, like the microlens substrate 1A shown in FIG. 1, the concave portion 31A and the convex portion 32A are formed of the resin layer 9A.
Is in contact with the substrate 2A with concave portions for microlenses, the substrate 8A with convex portions for microlenses, and the resin layer 9A.
And the contact area with the contact increases. Therefore, the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses
Joint strength increases (anchor effect).

The microlens substrate 1A shown in FIG.
As described above, when the distance between the opposing end faces of the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses substantially coincides with and corresponds to the edge thickness of the microlenses 4A, desired optical characteristics are obtained. It becomes easy to design the microlens substrate 1A so that it can be obtained. From the viewpoint of more effectively obtaining the above-described effects, the microlens substrate 1A preferably satisfies the following conditions.

The thickness Tc at the center of the micro lens 4A
Is preferably about 10 to 120 μm, and 15
More preferably, it is about 60 μm. Thus, the microlenses 4A can collect light more appropriately.

In the microlens substrate 1A, the distance between the opposing end surfaces of the microlens concave substrate 2A and the microlens convex substrate 8A, that is, the edge thickness of the microlens 4A is 0.1 to 100 μm. About 1 μm, and more preferably about 1 to 20 μm. Thereby, the microlens substrate 1A
Can obtain the above-mentioned effect more effectively.

When the microlens substrate 1A is used for a liquid crystal panel or the like, the radius of curvature R1 of the lens surface on the incident side of the microlens 4A, that is, the radius of curvature of the concave portion 31A is preferably about 5 to 50 μm. Further, the radius of curvature R of the lens surface on the emission side of the micro lens 4A
2, that is, the radius of curvature of the convex portion 32A is 3 to 30 μm.
It is preferred that it is about. Thereby, a higher contrast ratio can be obtained in the liquid crystal panel. Further, the design of the liquid crystal panel becomes easy.

In the microlens substrate 1A, the radius of curvature R1 of the lens surface on the entrance side of the microlens 4A and the radius of curvature R1 of the lens surface on the exit side of the microlens 4A are set.
The relationship with 2 preferably satisfies the relationship of 1 <R1 / R2 ≦ 2.0, and more preferably satisfies the relationship of 1.05 ≦ R1 / R2 ≦ 1.5. Thereby, the microlens 4A can reduce the aberration more appropriately.

The thickness T1 of the substrate on the incident side (substrate 2A with concave portions for microlenses in this embodiment) slightly varies depending on the constituent material of the substrate, the refractive index, etc., but is preferably about 0.3 to 5 mm. , More preferably about 0.5 to 2 mm. This makes it easy to achieve both compactness and strength with the microlens substrate 1A.

When the microlens substrate 1A is used for a liquid crystal panel or the like, the thickness T2 of the substrate on the emission side (substrate 8A with convex portions for microlenses in this embodiment) is 5-10.
Preferably about 00 μm, and 10 to 150 μm
It is more preferable to set the degree. Thereby, an image can be formed more suitably.

The thickness T2 of the substrate on the emission side is preferably about 1/1000 to 1/2 of the thickness T1 of the substrate on the incidence side, and is preferably about 1/200 to 1/5. More preferred. Thereby, the microlens substrate 1A is
The emitted light can be preferably emitted while securing high intensity.

Such a microlens substrate 1A is used for a liquid crystal panel, and the liquid crystal panel is a glass substrate other than the first glass substrate 29 (for example, a glass substrate 17 described later).
1), the first glass substrate 29 has a coefficient of thermal expansion substantially equal to the coefficient of thermal expansion of the other glass substrate of the liquid crystal panel (for example, the ratio of the coefficient of thermal expansion to 1/10). To about 10). Thereby, in the obtained liquid crystal panel, warpage, bending, peeling, and the like caused by the difference in thermal expansion coefficient between the two when the temperature changes are prevented.

From this viewpoint, the first glass substrate 29
And the other glass substrate of the liquid crystal panel are preferably made of the same type of material. As a result, warpage, bending, peeling, and the like due to a difference in thermal expansion coefficient at the time of temperature change are effectively prevented.

In particular, when the microlens substrate 1A is used for a TFT liquid crystal panel made of high-temperature polysilicon, the first glass substrate 29 is preferably made of quartz glass. TFT liquid crystal panels use TF
It has a T substrate. For such a TFT substrate, quartz glass whose characteristics hardly change depending on the environment at the time of manufacturing is preferably used. Accordingly, in response to this, by forming the first glass substrate 29 of quartz glass, it is possible to obtain a TFT liquid crystal panel which is less likely to be warped or bent and has excellent stability.

In such a microlens substrate 1A,
The coefficient of thermal expansion of the second glass substrate 89 is
It is preferable that the coefficient of thermal expansion is substantially equal to the coefficient of thermal expansion (for example, the ratio of both coefficients of thermal expansion is about 1/10 to 10). Thus, warpage, bending, peeling, and the like caused by the difference in the thermal expansion coefficient between the first glass substrate 29 and the second glass substrate 89 are prevented. In particular, in the microlens substrate 1A, the first glass substrate 29 and the second glass substrate 89 are preferably made of the same type of material. Thereby, such an effect can be obtained more effectively.

The resin layer 9A covering the concave portion 31A and the convex portion 32A is formed, for example, of the first glass substrate 29 and the second glass substrate 29.
The glass substrate 89 can be made of a resin (adhesive) having a higher refractive index than that of the constituent material. For example, the resin layer 9A is made of an acrylic resin, an epoxy resin,
It can be suitably formed of an ultraviolet curable resin such as an acrylic epoxy resin.

In such a microlens substrate 1A,
A spacer 5 for defining the thickness of the resin layer 9A is provided outside the region where the microlenses 4A are provided, that is, in the non-effective lens region 100. The spacer 5 is made of, for example, spherical particles.

By providing the spacer 5 on the microlens substrate 1A, it becomes easy to set the thickness of the resin layer 9A to a predetermined thickness. In addition, the thickness unevenness of the resin layer 9A can be suppressed. In particular, as shown in FIG. 1, when the spacer 5 is disposed in the non-effective lens area 100, the spacer 5 is less likely to adversely affect the optical characteristics of the microlens 4A.

On the substrate 2A with concave portions for microlenses, a first alignment mark 71 serving as an index for alignment is provided outside the region where the microlenses 4A (concave portions 31A) are provided, that is, in the non-effective lens region 100. Is provided. Further, on the substrate 8A with the convex portion for microlenses, a second alignment mark serving as an index for positioning is provided outside the region where the microlenses 4A (the convex portions 32A) are provided, that is, in the non-effective lens region 100. 7
2 are provided. First alignment mark 71 and second alignment mark 7 are provided on microlens substrate 1A.
By providing 2, the alignment between the concave portion 31A and the convex portion 32A becomes easy.

The microlens substrate 1A shown in FIG.
Then, the thickness T1 of the substrate on the incident side is changed to the thickness T of the substrate on the exit side.
Although the thickness is larger than 2, both thicknesses may be the same.
Further, the thickness T2 may be larger than the thickness T1. Further, in the microlens substrate 1A shown in FIG. 1, the radius of curvature R1 of the lens surface on the entrance side of the microlens 4A is larger than the radius of curvature R2 of the lens surface on the exit side.
The two may have the same radius of curvature. Also, the radius of curvature R
2 may be larger than the radius of curvature R1. Note that the edge thickness of the microlenses 4A does not need to match or correspond to the distance between the opposing end faces of the microlens concave substrate 2A and the microlens convex substrate 8A. Further, in the microlens substrate 1A, the light L may be incident from the substrate 8A with the microlens convex portion, and the light L may be emitted from the substrate 2A with the microlens concave portion.

Although the spacers 5 are provided in the microlens substrate 1A of the present embodiment, the spacers need not be provided. Further, the alignment mark need not be provided on the microlens substrate. Note that different resins may be used for the resin contacting the concave portion 31A and the resin contacting the convex portion 32A. In the microlens substrate 1A described above, the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses are made of glass, but the substrate with concave portions for microlenses and the substrate with convex portions for microlenses are other than glass. , For example, resin.

Hereinafter, the second example of the microlens substrate of the present invention will be described.
An embodiment will be described. The description of the second embodiment of the microlens substrate described below focuses on the differences from the first embodiment, and the common items will not be described. FIG. 2 is a schematic longitudinal sectional view showing a second embodiment of the microlens substrate of the present invention.

As shown in the figure, a microlens substrate 1B of the present invention comprises a substrate 8B with microlens convex portions (second substrate) and a substrate with microlens concave portions (first substrate).
2B is configured to be joined via a resin layer 9B such that the convex portion 32B and the concave portion 31B face each other.
In the microlens substrate 1B, a resin provided between the convex portion 32B and the concave portion 31B constitutes a microlens 4B composed of a convex meniscus lens.

Such a microlens substrate 1B is used, for example, by allowing light L to enter from the substrate 8B with microlens projections and emitting light L from the substrate 2B with microlens depressions.

In such a microlens substrate 1B,
Lens curved surface (concave curved surface) on the incident side of micro lens 4B
Corresponds to the shape of the convex curved surface of the convex portion 32B. Also,
Lens curved surface (convex curved surface) on the exit side of the micro lens 4B
Corresponds to the shape of the concave curved surface of the concave portion 31B. In such a microlens substrate 1B, the radius of curvature of the convex portion 32B is larger than the radius of curvature of the concave portion 31B.

In the microlens substrate 1B, the thickness of the microlens-provided substrate 8B, that is, the thickness T1 of the incident-side substrate is the same as the microlens-concave substrate 2
The thickness B is greater than the thickness T2 of the substrate on the emission side.

As in the case of the microlens substrate 1B shown in FIG. 2, when the light L is incident from the convex portion 32B and the light L is emitted from the concave portion 31B, the microlens substrate 1B has a UV cut function. It becomes easier. This is because Neoceram (registered trademark) is provided on the second glass substrate 89.
When the substrate is used, the formation of the projections 32B is relatively easy, the manufacture of the substrate 8B with projections for microlenses is easy, and the neoceram substrate is excellent as a UV cut filter.

Hereinafter, the third example of the microlens substrate of the present invention will be described.
An embodiment will be described. Note that the description of the third embodiment of the microlens substrate described below focuses on matters that are different from the first embodiment, and description of common matters is omitted. FIG. 11 shows a third example of the microlens substrate of the present invention.
It is a typical longitudinal section showing an embodiment.

As shown in the figure, a microlens substrate 1C of the present invention comprises a substrate (first substrate) 2A with concave portions for microlenses and a glass layer (second substrate) 8 'formed of a first resin layer 95C. And a second resin layer 96C and a first resin layer 9C.
A plurality (many) of microlenses 4A are formed in 5C.

Regarding the first resin layer 95C, the same thing as described for the resin layer 9A of the microlens substrate 1A can be said. The spacer 5 is provided in the non-effective lens area 100 of the first resin layer 95C.

In the first resin layer 95C, the concave portions 31A
The micro lens 4A is provided at the portion where is provided. The incident-side lens curved surface (convex curved surface) of the microlens 4A corresponds to the shape of the concave curved surface of the concave portion 31A. Further, in the first resin layer 95C, a lens curved surface (concave curved surface) on the emission side is formed at a portion opposite to the portion where the concave portion 31A is provided.

Then, a second resin layer 96C is formed on the first resin layer 95C so as to cover the microlenses 4A. The second resin layer 96C is made of, for example, a resin having a lower refractive index than the resin constituting the first resin layer 95C. For example, the second resin layer 96C can be made of an ultraviolet curable resin such as an epoxy resin.

A glass layer (cover glass) 8 'is joined to the second resin layer 96C. In the microlens substrate 1C, the thickness T1 of the substrate 2A with concave portions for microlenses is larger than the thickness T3 of the glass layer 8 '.

In such a microlens substrate 1C,
The thickness of the first resin layer 95C in the portion where the microlenses 4A are not formed substantially matches and corresponds to the edge thickness of the microlenses 4A. Thereby, it becomes easy to design the microlens substrate 1C so as to obtain desired optical characteristics.

In the microlens substrate 1C, the resin layer 9C
Is not particularly limited, but is preferably about 5 to 200 μm, and more preferably about 10 to 70 μm.

In the resin layer 9C, the thickness of the second resin layer 96C (the portion where the microlenses 4A are not formed) is one of the thickness of the first resin layer 95C (the portion where the microlenses 4A are not formed). It is preferably about 0.5 to 20 times, more preferably about 2 to 10 times. Thus, when the microlens substrate 1C is used for a liquid crystal panel or the like, an image can be more suitably formed.
Further, in the microlens substrate 1C, when the microlens substrate 1C is used for a liquid crystal panel or the like, the thickness T3 of the glass layer 8 ′ is preferably about 2 to 1000 μm, more preferably about 5 to 150 μm. preferable.
The microlens substrate 1C having the glass layer 8 'having such a thickness is suitable for a liquid crystal panel or the like.

Further, the thickness T3 of the glass layer 8 'is 1/10 of the thickness T1 of the substrate 2A with concave portions for microlenses.
It is preferably about 00 to 1/4, and 1/200 to
More preferably, it is about 1/10. This allows
The microlens substrate 1C can more preferably emit outgoing light while securing high strength. Glass layer 8 '
Regarding the thermal expansion coefficient, constituent material, and the like, it can be said that, for the same reason as described above, the same as described for the substrate with microlens projections 8A.

Hereinafter, the fourth example of the microlens substrate of the present invention will be described.
An embodiment will be described. The description of the fourth embodiment of the microlens substrate described below is based on the second embodiment,
The description will focus on matters that differ from the third embodiment, and descriptions of common matters will be omitted. FIG. 12 is a schematic longitudinal sectional view showing a fourth embodiment of the microlens substrate of the present invention.

As shown in the figure, the microlens substrate 1D of the present invention comprises a substrate with microlens projections (second substrate) 8B and a glass layer (first substrate) 2 'formed of a first resin layer. 95D and a second resin layer 96D, and are joined via a resin layer 9D.
In 5D, a plurality (many) of microlenses 4B are formed.

In such a microlens substrate 1D,
Regarding the first resin layer 95D, the second resin layer 96D, and the glass layer 2 ', the first resin layer 9 of the microlens substrate 1C is formed.
5C, the second resin layer 96D and the glass layer 8 'can be said to be the same.

In the first resin layer 95D, the microlenses 4B are provided at the positions where the protrusions 32B are provided.
The curved lens surface (concave curved surface) on the incident side of the micro lens 4B corresponds to the shape of the convex curved surface of the convex portion 32B. In the first resin layer 95D, a lens curved surface (convex curved surface) on the emission side is formed at a portion opposite to the portion where the convex portion 32B is provided.

Then, a second resin layer 96D is formed on the first resin layer 95D so as to cover the microlenses 4B. A glass layer (cover glass) 2 ′ is joined to the second resin layer 96D. In the microlens substrate 1D, the thickness T1 of the substrate with microlens projections 8B is larger than the thickness T3 of the glass layer 2 '.

The microlens substrates 1C, 1D
Has an advantage that the microlenses 4A and 4B can be formed by the 2P method or the like, and thus can be manufactured at lower cost.

Hereinafter, the fifth example of the microlens substrate of the present invention will be described.
An embodiment will be described. The description of the fifth embodiment of the microlens substrate described below is based on the first embodiment,
The description will focus on matters that differ from the third embodiment, and descriptions of common matters will be omitted. FIG. 13 is a schematic longitudinal sectional view showing a fifth embodiment of the microlens substrate of the present invention.

As shown in the figure, a microlens substrate 1E of the present invention includes a substrate (first substrate) 2A having concave portions for microlenses and a substrate 2A having concave portions for microlenses.
It has a first resin layer 95C provided thereon and a second resin layer 96E provided on the first resin layer 95C, and the first resin layer 95C has a micro lens 4A.
Are formed (many). In the microlens substrate 1E, the first resin layer 95C and the second resin layer 96E constitute a resin layer 9E.

Regarding the second resin layer 96E, the same as described for the second resin layer 96C of the microlens substrate 1C can be said. In the resin layer 9E, the thickness of the second resin layer 96E (the portion where the microlenses 4A are not formed) is equal to the thickness of the first resin layer 95C (the microlenses 4A).
(A portion where A is not formed) is preferably about 3 to 40 times, more preferably about 5 to 20 times.

In the microlens substrate 1E, the resin layer 9E
Is not particularly limited, but is preferably about 10 to 400 μm, and more preferably about 20 to 150 μm. On the surface of such a resin layer 9E,
A barrier layer for protecting the resin layer 9E may be provided. This barrier layer can be made of, for example, ceramics or heat-resistant resin.

Hereinafter, the sixth embodiment of the microlens substrate of the present invention will be described.
An embodiment will be described. The description of the sixth embodiment of the microlens substrate described below is based on the second embodiment,
The description will focus on matters that are different from the fourth and fifth embodiments, and descriptions of common features will be omitted. FIG. 14 is a schematic longitudinal sectional view showing a sixth embodiment of the microlens substrate of the present invention.

As shown in the figure, a microlens substrate 1F of the present invention comprises a substrate (second substrate) 8B with microlens projections and a substrate 8B with microlens projections.
It has a first resin layer 95D provided thereon and a second resin layer 96F provided on the first resin layer 95D, and the first resin layer 95D has a micro lens 4B.
Are formed (many). In the microlens substrate 1F, the first resin layer 95D and the second resin layer 96F constitute a resin layer 9F.

Regarding the resin layer 9F, the same thing as described for the resin layer 9E of the microlens substrate 1E can be said.

The microlens substrates 1E, 1F
Has the advantage that the microlenses 4A and 4B can be formed by the 2P method or the like, and thus can be manufactured particularly inexpensively.

The microlens substrate 1A described above can be manufactured, for example, as follows. Hereinafter, FIG.
The method of manufacturing the microlens substrate 1A will be described with reference to FIGS.

When manufacturing the microlens substrate 1A, it is necessary to first prepare the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses. The substrate 2A with concave portions for microlenses can be manufactured and prepared, for example, as follows (see FIGS. 3 and 4).

In the method of manufacturing the substrate 2A with concave portions for microlenses described below, the concave portions 31A are formed on the first glass substrate 29 by using the mask layer 6, and a part of the mask layer 6 is used to form the concave portion 31A. One alignment mark 71 is formed. First, for example, an unprocessed first glass substrate 29 is prepared as a base material. The first glass substrate 29 includes
Those having a uniform thickness and no bends or scratches are preferably used.

<Concave-1> First, a mask layer 6 is formed on the surface of the first glass substrate 29, as shown in FIG. At the same time, a back surface protective layer 69 is formed on the back surface of the first glass substrate 29 (the surface opposite to the surface on which the mask layer 6 is formed). It is preferable that the mask layer 6 has resistance in an etching operation in a step <concave-4> described later.

From this point of view, the material constituting the mask layer 6 is, for example, Au / Cr, Au / Ti, Pt / Cr, Pt / Cr.
Examples include metals such as Ti, polycrystalline silicon (polysilicon), silicon such as amorphous silicon, and silicon nitride. In particular, when a metal is used for the mask layer 6, the visibility of the first alignment mark 71 formed is improved.

The thickness of the mask layer 6 is not particularly limited, but is preferably about 0.01 to 10 μm.
More preferably, the thickness is about 0.2 to 1 μm. If the mask layer 6 is too thin, the first glass substrate 29 may not be sufficiently protected, and if the mask layer 6 is too thick, the mask layer 6 may be easily peeled off due to internal stress of the mask layer 6. The mask layer 6 is formed, for example, by a chemical vapor deposition (CVD) method.
Method), a vapor deposition method such as a sputtering method and an evaporation method, and plating.

The back surface protective layer 69 formed on the back surface of the first glass substrate 29 is for protecting the back surface of the first glass substrate 29 in the subsequent steps. The back surface protective layer 69 suitably prevents erosion, deterioration, and the like of the back surface of the first glass substrate 29. The back surface protective layer 69 is made of, for example, the same material as the mask layer 6. For this reason, the back surface protective layer 69 can be provided at the same time as the formation of the mask layer 6, similarly to the mask layer 6.

<Concave-2> Next, as shown in FIG. 3B, an opening 61 is formed in the mask layer 6. The opening 61
For example, it is provided at a position where the concave portion 31A is formed. The shape (planar shape) of the opening 61 preferably corresponds to the shape (planar shape) of the recess 31A to be formed.

The opening 61 can be formed by, for example, photolithography. Specifically, first, a resist layer (not shown) having a pattern corresponding to the opening 61 is formed on the mask layer 6. Next, using the resist layer as a mask, a part of the mask layer 6 is removed. Next, the resist layer is removed. Thereby, an opening 61 is formed. Note that the partial removal of the mask layer 6 is performed as follows.
For example, it can be performed by dry etching with CF gas, chlorine-based gas or the like, immersion (wet etching) in a stripping solution such as an aqueous solution of hydrofluoric acid and nitric acid, or an aqueous alkaline solution.

<Concave-3> Next, as shown in FIG. 3C, a protective layer 75 is formed on the mask layer 6. The protective layer 75 is provided at a position where the first alignment mark 71 is formed. The shape of the protective layer 75 corresponds to the shape of the first alignment mark 71.

It is preferable that protective layer 75 has resistance to etching in step <concave-4> and removal of mask layer 6 in step <concave-5>. Thereby, the shape of the first alignment mark 71 can be accurately formed into a predetermined shape.

From this viewpoint, the protective layer 75 is made of a metal such as Au / Cr, Au / Ti, Pt / Cr, Pt / Ti, SiC, etc.
Silicon such as polycrystalline silicon and amorphous silicon,
It is preferable to be composed of a silicon compound such as silicon nitride or a resist such as a negative resist.

The protective layer 75 is preferably made of a material different from the constituent material of the mask layer 6. Therefore, for example, when the mask layer 6 is made of silicon, the protective layer 75 is preferably made of metal or the like. Also,
For example, when the mask layer 6 is made of metal, the protection layer 75
Is preferably made of silicon or the like. Thereby, when the mask layer 6 is removed in the step <concave-5>, it is possible to preferably prevent the protective layer 75 from being etched.

The protective layer 75 can be formed, for example, by a vapor deposition method such as vapor deposition (mask vapor deposition) and sputtering (mask sputtering). Further, a photolithography method may be combined with such a method. For example, a constituent material of the protective layer 75 is formed on the entire first glass substrate 29 so as to cover the mask layer 6, and then a resist corresponding to the position and shape of the first alignment mark 71 is patterned on the film. Then, by performing etching or the like, the first alignment mark 71 is formed.
Can be formed.

<Concave-4> Next, as shown in FIG. 4D, a concave 31A is formed on the first glass substrate 29. Examples of the method for forming the recess 31A include an etching method such as a dry etching method and a wet etching method. For example, by performing etching, the first glass substrate 29 is isotropically etched from the opening 61 to form a concave portion 31A having a lens shape.

In particular, according to the wet etching method, it is possible to form the concave portion 31A closer to a more ideal lens shape. In addition, as an etchant for performing wet etching, for example, a hydrofluoric acid-based etchant or the like is suitably used. At this time, if alcohol (especially polyhydric alcohol) such as glycerin is added to the etching solution,
The surface of the concave portion 31A becomes extremely smooth.

<Concave-5> Next, as shown in FIG. 4E, the mask layer 6 is removed. At this time, the mask layer 6
The back surface protective layer 69 is also removed together with the removal. This includes immersion (wet etching) in a stripping solution (removal solution) such as an alkaline aqueous solution (eg, tetramethylammonium hydroxide aqueous solution), hydrochloric acid + nitric acid aqueous solution, hydrofluoric acid + nitric acid aqueous solution, CF gas, chlorine-based gas Can be performed by dry etching or the like. In particular, when the mask layer 6 and the back surface protective layer 69 are removed by immersing the first glass substrate 29 in a removing liquid, the operation can be performed efficiently with a simple operation.
The mask layer 6 and the back surface protective layer 69 can be removed.

At this time, since the protective layer 75 protects the mask layer 6 in the portion where the protective layer 75 is formed, the mask layer 6 is not removed and remains on the glass substrate 5.

<Concave-6> Next, the protective layer 75 is removed.
This can be performed by, for example, wet etching using a mixed solution of hydrochloric acid and nitric acid, an aqueous alkaline solution, or the like as a stripping solution. As a result, as shown in FIG. 4F, the portion of the mask layer 6 protected by the protection layer 75 is exposed as the first alignment mark 71.

As described above, as shown in FIG. 4F, the substrate 2A with concave portions for microlenses in which a large number of concave portions 31A and first alignment marks 71 are formed at predetermined positions on the first glass substrate 29. Is obtained.

As described above, if the layer (component) that forms the first alignment mark 71 is formed on the first glass substrate 29 before the formation of the recess 31A, the recess 3
After the formation of 1A, it is not necessary to perform many processes on the first glass substrate 29. For this reason, the concave portion 31A is less likely to be adversely affected by the subsequent steps. The recess 31
The first alignment mark 71 may be formed in a separate step unrelated to the step of forming A.

The microlens-provided substrate 8A in which the projections 32A and the second alignment marks 72 are formed on the surface of the second glass substrate 89 can be manufactured and prepared, for example, as follows ( (See FIG. 5).

In the following method for manufacturing the substrate 8A with convex portions for microlenses, after the second alignment mark 72 is formed on the second glass substrate 89, the convex portion 32A is formed. First, for example, an unprocessed second glass substrate 89 is prepared as a base material. As the second glass substrate 89, a substrate having a uniform thickness and having no bending or scratch is preferably used.

<Convex-1> First, as shown in FIG. 5A, a second alignment mark 72 is formed on a second glass substrate 89 prepared as a base material.

It is preferable that the second alignment mark 72 has resistance in a step <convex-4> described later.

From this point of view, the second alignment mark 72 includes, for example, Au / Cr, Au / Ti, Pt / Cr, Pt / T
i, metals such as SiC, silicon such as polycrystalline silicon and amorphous silicon, and silicon compounds such as silicon nitride are preferably used.

At this time, the second alignment mark 72
Is made of the same type of material as the first alignment mark 71, the visibility is improved, and the alignment between the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses becomes easy. Therefore, for example, when the first alignment mark 71 is made of metal, the second alignment mark 72 is preferably made of metal. Also,
For example, when the first alignment mark 71 is made of silicon, the second alignment mark 72 is preferably made of silicon.

For example, the second alignment mark 72
It can be formed by a vapor phase film formation method such as vapor deposition (mask vapor deposition) and sputtering (mask sputtering). Further, a photolithography method may be combined with such a method. For example, the constituent material of the second alignment mark 72 is formed on the entire surface of the second glass substrate 89, and then the second alignment mark 7 is formed on the film.
Pattern the resist corresponding to the position and shape of 2,
Next, the second alignment mark 72 can be formed by performing etching or the like.

<Convex-2> Next, as shown in FIG. 5B, the second alignment mark 72 on the second glass substrate 89 is formed.
The core material 65 is provided in a pattern corresponding to the projection 32A to be formed on the surface on which is formed.

The core material 65 is a core (original shape) of the projection 32A to be formed, and can be made of, for example, a resist material. Such a core material 65 can be provided, for example, as follows. First, a resist layer (a positive resist, a negative resist, or the like) is formed on the surface of the second glass substrate 89 on which the protrusion 32A is to be formed. Next, the resist layer is exposed to a pattern corresponding to the projection 32A to be formed. Next, the resist layer is developed. The core material 65 may be made of, for example, resin.

<Convex-3> Next, as shown in FIG. 5C, the core material 65 is shaped into a shape having a convex curved surface.

At this time, if the core material 65 is made of a heat-deformable material (for example, a heat-deformable resist), the core material 65 can be formed into a shape having a convex curved surface only by heating the core material 65. Can be shaped. When shaping the core material 65 by heating, the heating temperature is preferably about 100 to 250 ° C. Thereby, it becomes easy to shape the core material 65 into a more ideal lens shape.

<Convex-4> Next, as shown in FIG. 5D, a convex portion 32A is formed on the second glass substrate 89.
This can be performed, for example, by performing dry etching on the second glass substrate 89 and transferring the shape (surface shape) of the core material 65 to the surface of the second glass substrate 89.

When the second glass substrate 89 is etched, the second glass substrate 89 is etched and its thickness is reduced. At the same time, the core material 65 is also etched. Therefore, when the second glass substrate 89 is etched, the core material 65 is etched away and disappears, and the shape of the core material 65 is transferred onto the second glass substrate 89. Thereby, the second glass substrate 8
9, a convex portion 32A having a convex shape is formed.

At this time, at the portion where the second alignment mark 72 is formed, the etching of the second glass substrate 89 is prevented. In such a portion, the thickness of the second glass substrate 89 before etching is favorably maintained. Therefore, in the portion where the thickness is maintained, a column 891 is formed as a result.

When the projections 32A are formed in this manner, the etching rate (etching rate) of the core material 65 is determined.
And the etching rate of the second glass substrate 89 is substantially the same (for example, the ratio of the etching rates of the two is 8:10 to 1).
0: 8), the shape of the core material 65 can be transferred to the second glass substrate 89 more faithfully. Therefore, when etching is performed under such conditions, it becomes easy to form the convex portion 32A having an ideal lens shape.

As described above, the microlens convex substrate 8A in which the convex portions 32A and the second alignment marks 72 are formed on the second glass substrate 89 is obtained.

As described above, when the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses are manufactured by different manufacturing methods, that is, when the concave portions 31A and the convex portions 32A are formed by different methods, the concave portions 31A are formed. In each of the convex portions 32A, an ideal lens curved surface is easily formed. In the above description, the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses were manufactured by etching. For example, the substrate 2A with concave portions for microlenses and the microlens The substrate 8A with a convex portion for use may be manufactured.

Using the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses, the microlens substrate 1A can be manufactured, for example, as follows.

<1A> First, as shown in FIG. 6, a predetermined refractive index (particularly the first refractive index An uncured resin 91 having a refractive index higher than that of the glass substrate 29 and the second glass substrate 89) is supplied, and the concave portion 31A is filled with the resin 91.
At this time, the uncured resin 92 including the spacer 5 is supplied onto the substrate 2A with concave portions for microlenses. The resin 92 is supplied to, for example, a portion where the spacer 5 is installed.

The resin 92 contains the spacer 5 in an amount of 1 to 50% by weight.
, And more preferably about 5 to 40% by weight. When the content of the spacer 5 is within this range, it is possible to regulate the thickness of the resin layer 9A with high accuracy while suppressing a decrease in the adhesiveness of the resin.

It is preferable that the resin 91 and the resin 92 are made of the same kind of material. Thus, in the manufactured microlens substrate 1A, the occurrence of warpage, deflection, or the like due to the difference in the thermal expansion coefficient between the resin 91 and the resin 92 is suitably prevented.

When the resin 92 is supplied onto the substrate 2 A with concave portions for microlenses, it is preferable that the spacers 5 are dispersed in the resin 92. When the spacers 5 are dispersed in the resin 92, it is easy to arrange the spacers 5 uniformly. Thereby, the thickness unevenness of the formed resin layer 9A can be more suitably suppressed.

When the spacer is in the form of particles, as in the spacer 5 of the present embodiment, it is possible to suitably prevent the adhesion between the resin and the substrate from being reduced. In addition, when the spacer is in the form of particles, it is easy to disperse the spacer 5 in the resin 92.

When the spacer is a spherical particle like the spacer 5, the spacer is preferably prevented from overlapping each other. For this reason, the accuracy of defining the thickness of the resin layer 9A can be further increased. In addition, unevenness in the thickness of the resin layer 9A can be prevented extremely favorably.

The average particle size of the spacer 5 can be, for example, substantially the same as the thickness of the resin layer 9A. The standard deviation of the particle size distribution of the spacer 5 is preferably within 20% of the average particle size of the spacer 5, more preferably within 5%. Thereby, the thickness unevenness of the resin layer 9A can be more appropriately suppressed.

Further, the density of the spacer 5 is set to ρ1 (g / c
m ³ ), and when the density of the resin constituting the resin layer 9A (for example, the density after curing) is ρ2 (g / cm ³ ), ρ1 / ρ2 is
It is preferably about 0.6 to 1.4, and 0.8 to 1.4.
More preferably, it is about 1.2. Thus, the spacers 5 can be more uniformly dispersed in the resin 92. For this reason, thickness unevenness of the resin layer 9A can be more suitably suppressed.

Note that the resin 91 and the resin 92 may be provided on the substrate 8A with convex portions for microlenses. Also, the resin 91 and the resin 92 are transferred to the substrate 2A with concave portions for microlenses.
It may be provided both on the upper side and on the substrate 8A with the convex portion for microlenses.

In the microlens substrate 1A of the present embodiment, the spacers 5 are spherical particles.
The particles need not be spherical particles. For example, the particle shape of the spacer may be needle-like, rod-like, oval, oval, or the like.
Further, the spacer need not be in the form of particles. For example, the spacer may be sheet-like, fiber-like, or the like.

<2A> Next, as shown in FIG.
The substrate with a convex portion for microlenses (counterpart) 8A is placed on the substrate 1 and the resin 92 (the substrate 8A with convex portions for microlenses is brought into close contact with the resin).

At this time, the microlens-provided substrate 8A is placed such that the concave portion 31A and the convex portion 32A face each other.
Install on resin. At this time, the microlens-provided substrate 8A is placed on the resin such that the microlens-provided substrate 8A abuts on the spacer 5.
As a result, the distance between the opposing end faces of the substrate 2A with concave portions for microlenses and the substrate 8A with convex portions for microlenses is defined by the spacers 5. Therefore, the edge thickness and the thickness of the center of the microlens 4A are defined with high accuracy.

<3A> Next, the first alignment mark 7
Using the first and second alignment marks 72, the recess 31
A and the projection 32A are aligned. As a result, the protrusion 32A can be accurately positioned at a position corresponding to the recess 31A. For this reason, the shape and optical characteristics of the formed micro lens 4 become closer to the design values.

For example, the positions of the first alignment mark 71 and the second alignment mark 72 on the plane are overlapped (or the distance between the first alignment mark 71 and the second alignment mark 72 is constant). The position can be adjusted by relatively moving the substrate with microlens projections 8A relative to the substrate with microlens depressions 2A.

When the spacer 5 is formed of spherical particles as in the present embodiment, the spacer 5 functions like a roller at the time of positioning. For this reason, it is easy to move the microlens convex substrate 8A in a direction parallel to the microlens concave substrate 2A during alignment. In other words, when the spacer 5 is formed of spherical particles, the microlens convex substrate 8A
Can be easily moved, and positioning can be easily performed.

<4A> Next, as shown in FIG.
1 and the resin 92 are cured to form a resin layer 9A.
As a result, the substrate with microlens projections 8A is bonded to the substrate with microlens recesses 2A via the resin layer 9A. Further, among the resins constituting the resin layer 9A, the resin filled between the concave portion 31A and the convex portion 32A allows
The micro lens 4A is formed. The curing of the resin can be performed by, for example, irradiating the resin with an ultraviolet ray or an electron beam, or heating the resin.

<5A> Next, the thickness of the microlens-provided substrate 8A is adjusted by, for example, grinding or polishing. Thereby, the microlens substrate 1A as shown in FIG. 1 can be obtained. When the microlens substrate 1A is manufactured in this manner, the microlens substrate can be manufactured with a relatively small number of steps.

Hereinafter, a method for manufacturing the microlens substrate 1B will be described. In the following description, description of items common to the method of manufacturing the microlens substrate 1A will be omitted.

First, a substrate 1B with concave portions for microlenses and a substrate 8B with convex portions for microlenses are prepared in the same manner as described above. Next, the above steps <1A> to <4A>
(See FIGS. 6 and 7).

<5B> Next, the thickness of the substrate 2B with concave portions for microlenses is adjusted by, for example, grinding and polishing. Thereby, the microlens substrate 1B as shown in FIG. 2 can be obtained.

Hereinafter, a method for manufacturing the microlens substrate 1C will be described. In the following description, description of items common to the method of manufacturing the microlens substrate 1A will be omitted.

In the method of manufacturing the microlens substrate 1C described below, the microlens 4A and the first resin layer 95C are formed by the 2P method using the microlens-provided substrate 8A as a mold.

First, a substrate 2A with concave portions for microlenses and a substrate 8A with convex portions for microlenses are prepared in the same manner as described above. Before performing the following steps, a release treatment may be applied to the surface of the substrate with microlens projections 8A by applying a release agent or the like.

<1C> First, the same step as the step <1A> is performed. That is, as shown in FIG. 6, uncured resins 91 and 92 are supplied to the surface of the substrate 2A with concave portions for microlenses where the concave portions 31A are formed. <2C> Next, as shown in FIG. 6, on the resin 91 and the resin 92, a substrate with a convex portion for microlenses (counterpart) 8A is set as a mold material (see the above step <2A>).

<3C> Next, the same step as the step <3A> is performed. That is, using the first alignment mark 71 and the second alignment mark 72, the positioning of the concave portion 31A and the convex portion 32A is performed. <4C> Next, the same step as the step <4A> is performed.
That is, as shown in FIG.
To cure. Thus, the first resin layer 95C and the microlenses 4A are formed. <5C> Next, as shown in FIG. 15, the substrate (mold material) 8A with the convex portion for microlenses is peeled off from the first resin layer 95C.

<6C> Next, as shown in FIG. 16, the glass layer 8 'is formed on the first resin layer 9 via the second resin layer 96C.
Join on 5C. Specifically, this step can be performed as follows. First, an uncured resin that forms the second resin layer 96C is provided on the first resin layer 95C. Next, the glass layer 8 'is bonded on the uncured resin. Next, the resin is cured to form a second resin layer 96.
Form C.

When the first resin layer 95C is made of an ultraviolet-curable resin, and when the second resin layer 96C is also made of an ultraviolet-curable resin, the manufacturing equipment for the microlens substrate 1C can be simplified. .

<7C> Next, the thickness of the glass layer 8 'is adjusted by, for example, grinding or polishing. As a result, FIG.
1 can be obtained. In the manufacturing method of the microlens substrate 1C described above, the substrate 8A with the convex portion for microlenses is used as the mold material. (Opposite body)
It is needless to say that may be used.

The micro lens substrate 1 shown in FIG.
A method for manufacturing E will be described. In the following description, description of items common to the method of manufacturing the microlens substrates 1A and 1C will be omitted.

In the method of manufacturing the microlens substrate 1E described below, the microlens 4A, the first resin layer 95C, and the second resin Layer 96E
Is formed.

First, a substrate 2A with concave portions for microlenses and a substrate 8A with convex portions for microlenses are prepared in the same manner as described above. Before performing the following steps, a release treatment may be performed by applying a release agent to the surfaces of the substrate 8A with convex portions for microlenses and the glass layer 8 '.

<1E> to <6E> First, the process <1C>
> To <6C>. As a result, FIG.
As shown in the figure, the second resin layer 96E is formed on the first resin layer 95C.
Is formed, and a second mold member (glass layer 8 ′) is bonded onto the second resin layer 96E.

<7E> Thereafter, the glass layer 8 'is peeled off from the second resin layer 96E. Thereby, a microlens substrate 1E as shown in FIG. 13 can be obtained.

Hereinafter, the microlens substrate 1 shown in FIG.
A method for manufacturing D will be described. In the following description, description of items common to the method of manufacturing the microlens substrates 1B and 1C will be omitted.

In the method for manufacturing the microlens substrate 1D described below, the microlens 4B and the first resin layer 95D are formed by the 2P method using the substrate 2B with concave portions for microlenses as a mold. First, as described above,
A substrate 2B with concave portions for microlenses and a substrate 8B with convex portions for microlenses are prepared.

<1D-4D> First, the above steps <1C>-
By performing the same steps as in <4C>, as shown in FIG.
The microlens-provided substrate (mold material) 2B and the microlens-convex substrate 8B are joined via the resin layer 95D.

<5D> Next, as shown in FIG. 17, the substrate 2B with concave portions for microlenses (counterpart) is peeled off from the first resin layer 95D.

<6D> Next, as shown in FIG. 18, the glass layer 2 'is formed on the first resin layer 9 via the second resin layer 96D.
Join on 5D. Specifically, this step can be performed as follows. First, an uncured resin that forms the second resin layer 96D is provided on the first resin layer 95D. Next, the glass layer 2 'is bonded on the uncured resin. Next, the resin is cured to form a second resin layer 96.
Form D.

<7D> Next, the thickness of the glass layer 2 'is adjusted by, for example, grinding and polishing. As a result, FIG.
2 can be obtained.

Hereinafter, the microlens substrate 1 shown in FIG.
A method for manufacturing F will be described. In the following description, description of items common to the method of manufacturing the microlens substrates 1A, 1B, and 1D will be omitted.

In the method of manufacturing the microlens substrate 1F described below, the microlens 4B, the first resin layer 95D and the second resin layer 95 are formed by the 2P method using the substrate 2B with concave portions for microlenses and the glass layer 2 'as mold members. 96F
Is formed.

First, a substrate 2B with concave portions for microlenses and a substrate 8B with convex portions for microlenses are prepared in the same manner as described above. Before performing the following steps, the surface of the substrate 2B with concave portions for microlenses and the surface of the glass layer 2 'may be subjected to a release treatment by applying a release agent or the like.

<1F> to <6F> First, the process <1D
> To <6D>. As a result, FIG.
As shown in the figure, the second resin layer 96F is formed on the first resin layer 95D.
Is formed, and the second mold member (glass layer 2 ′) is joined onto the second resin layer 96F.

<7F> Next, the glass layer 2 'is peeled off from the second resin layer 96F. Thereby, a microlens substrate 1F as shown in FIG. 14 can be obtained.

The microlens substrate of the present invention can be used in addition to a liquid crystal panel facing substrate and a liquid crystal panel described below.
For example, it goes without saying that the present invention can be used for various electro-optical devices such as a CCD and an optical communication device, and other devices. In the following description, the micro lens substrates 1A, 1
As for C and 1E, the microlens substrate 1A will be described as a representative. Also, the microlens substrates 1B, 1
Regarding D and 1F, the microlens substrate 1B will be described as a representative.

As shown in FIG. 8, for example, a black matrix having an opening 111 is formed on a substrate 8A (or a glass layer 8 'or a second resin layer 96E) of the microlens substrate 1A with microlenses. By forming a transparent conductive film (conductive film) 12 so as to cover the black matrix 11, the counter substrate 10A for a liquid crystal panel can be manufactured.

As shown in FIG. 9, for example, a black matrix 11 having an opening 111 is formed on a substrate 2B (or a glass layer 2 'or a second resin layer 96F) having concave portions for microlenses of a microlens substrate 1B. Is formed, and then a transparent conductive film (conductive film) 12 is formed so as to cover the black matrix 11, whereby the opposing substrate 10B for a liquid crystal panel can be manufactured.

The black matrix 11 has a light-shielding function and is made of, for example, a metal such as Cr, Al, an Al alloy, Ni, Zn, Ti, or a resin in which carbon, titanium, or the like is dispersed.

The transparent conductive film 12 has conductivity,
For example, it is composed of indium tin oxide (ITO), indium oxide (IO), tin oxide (SnO ₂ ), and the like.

The black matrix 11 is formed, for example, on the microlens substrates 1A and 1B by a vapor deposition method (for example, vapor deposition or sputtering).
1 is formed, and an opening 1 is formed on the thin film.
Forming a resist film having a pattern of 11;
An opening 111 can be formed in the thin film by performing wet etching, and then the resist film is removed to provide the opening. When forming the opening 111, the first alignment mark 71 or the second alignment mark 7
2, the micro lens 4A or 4B and the opening 11
1 may be aligned. Also, the transparent conductive film 1
2 can be provided by, for example, a vapor phase film forming method such as vapor deposition or sputtering.

As described above, a counter substrate for a liquid crystal panel can be obtained by forming a black matrix and a transparent conductive film on the microlens substrate. Note that the black matrix 11 may not be provided.

Hereinafter, a liquid crystal panel (electro-optical device) using such a counter substrate for a liquid crystal panel will be described with reference to FIGS.
It will be described based on.

As shown in FIG. 8, the liquid crystal panel (TFT liquid crystal panel) 16A of the present invention comprises a TFT substrate (liquid crystal driving substrate) 17, a liquid crystal panel facing substrate 10A joined to the TFT substrate 17, and a TFT substrate. Second spacer 19 defining distance between liquid crystal panel 17 and liquid crystal panel opposite substrate 10A
And a liquid crystal layer 18 made of liquid crystal sealed in a gap between the TFT substrate 17 and the opposing substrate 10 for a liquid crystal panel.

The opposing substrate 10A for the liquid crystal panel is provided on the microlens substrate 1A and the substrate 8A with the microlens projections of the microlens substrate 1A.
And a transparent conductive film (common electrode) 1 provided on the substrate 8A with convex portions for microlenses so as to cover the black matrix 11.
And 2.

The TFT substrate 17 is a substrate for driving the liquid crystal of the liquid crystal layer 18. The TFT substrate 17 includes a glass substrate 171 and a plurality (many) of which are provided on the glass substrate 171 and arranged in a matrix. The pixel electrode 172 includes a plurality of (many) thin film transistors (TFTs) 173 corresponding to the pixel electrodes 172. In the drawings, illustration of a seal material, an alignment film, wiring, and the like are omitted.

In the liquid crystal panel 16A, the TFT substrate 17 and the liquid crystal panel opposing substrate 10A are connected to each other so that the transparent conductive film 12 of the liquid crystal panel opposing substrate 10A and the pixel electrode 172 of the TFT substrate 17 face each other. 2 spacer 19
Are joined at a fixed distance from each other. Note that T
Opposite surfaces of the FT substrate 17 and the opposing substrate 10A for a liquid crystal panel are in contact with the second spacers 19, respectively.

The glass substrate 171 is preferably made of quartz glass for the above-described reason. The pixel electrode 172 drives the liquid crystal of the liquid crystal layer 18 by charging and discharging with the transparent conductive film (common electrode) 12. The pixel electrode 172 is made of, for example, the same material as the transparent conductive film 12 described above.

The thin film transistor 173 is connected to a corresponding pixel electrode 172 in the vicinity. The thin film transistor 173 is connected to a control circuit (not shown), and controls a current supplied to the pixel electrode 172. Thereby, charging and discharging of the pixel electrode 172 are controlled. The liquid crystal layer 18 contains liquid crystal molecules (not shown), and the orientation of the liquid crystal molecules, that is, the orientation of the liquid crystal changes according to the charging and discharging of the pixel electrode 172.

In such a liquid crystal panel 16A, the spacers 5 of the microlens substrate 1A have different physical properties (for example, at least one of elastic modulus, hardness, Poisson's ratio, specific gravity, etc.) from the second spacer 19. Is preferred. The spacer 5 and the second spacer 19 differ from each other in the nature of the substance in contact therewith. Further, the purpose of the spacer 5 and the second spacer 19 is as follows.
The functions are also different. Furthermore, the steps performed during the manufacture of the spacer 5 and the second spacer 19 are different. Therefore, if the physical properties of the spacer 5 and the physical properties of the second spacer 19 are different, it is possible to install spacers having optimal properties according to the respective purposes, functions, roles, and the like.

In particular, the elastic modulus of the spacer 5 (the elastic modulus of the constituent material of the spacer 5) is preferably lower than the elastic modulus of the second spacer 19 (the elastic modulus of the constituent material of the second spacer 19). Thereby, in the liquid crystal panel 16A, the uniformity of the thickness of the liquid crystal layer 18 is improved. This is due to the following mechanism. LCD panel 16
When manufacturing A, the TFT substrate 17 and the opposing substrate 10A for a liquid crystal panel are joined. At this time, a force is applied to the TFT substrate 17 against the liquid crystal panel counter substrate 10A, and a force is applied to the liquid crystal panel counter substrate 10A against the TFT substrate 17. In this case, ideally, the force applied to the TFT substrate 17 and the counter substrate for liquid crystal panel 10A completely coincides with the normal line of each substrate. However, in practice, the forces applied to these substrates are negligible, but may deviate from the normal. At this time, if the elastic modulus of the spacer 5 is lower than the elastic modulus of the second spacer 19, the spacer 5 contracts, and the contraction of the second spacer 19 is suppressed. As a result, a decrease in the uniformity of the thickness of the liquid crystal layer 18 is prevented. And the liquid crystal layer 1
When the uniformity of the thickness of No. 8 is high, unevenness in brightness of the formed image is extremely suitably suppressed, and the visibility is improved.

From the viewpoint of obtaining such effects more remarkably, the elastic modulus of the constituent material of the spacer 5 is set to 40 to 800, although it slightly differs depending on the properties of the second spacer 19 and the like.
It is preferable to be about kgf / mm ² .

In such a liquid crystal panel 16A, usually,
One micro lens 4A and the micro lens 4
One opening 111 of the black matrix 11 corresponding to the optical axis Q of A, one pixel electrode 172, and one thin film transistor 173 connected to the pixel electrode 172
Correspond to one pixel.

The incident light L incident from the counter substrate for liquid crystal panel 10A passes through the substrate 2A with concave portions for microlenses, and is collected while passing through the microlenses 4A.
A resin layer 9A, a substrate 8A with microlens projections, an opening 111 in the black matrix 11, a transparent conductive film 12,
The light passes through the liquid crystal layer 18, the pixel electrode 172, and the glass substrate 171. At this time, since a polarizing plate (not shown) is usually arranged on the incident side of the microlens substrate 1A, when the incident light L passes through the liquid crystal layer 18, the incident light L is linearly polarized. . At this time, the polarization direction of the incident light L is controlled according to the alignment state of the liquid crystal molecules in the liquid crystal layer 18. Therefore, by transmitting the incident light L transmitted through the liquid crystal panel 16A through a polarizing plate (not shown), it is possible to control the luminance of the output light.

As described above, in the liquid crystal panel 16A, the incident light L passing through the microlenses 4A is condensed and passes through the opening 111 of the black matrix 11. Therefore, the liquid crystal panel 16A can form a bright and clear image with a relatively small amount of light. Moreover, since the microlens substrate 1A includes the microlenses 4 having the above-described properties, the liquid crystal panel 16A can form an image having a high contrast ratio.

The liquid crystal panel 16A is formed, for example, by subjecting a TFT substrate 17 and a counter substrate for liquid crystal panel 10A manufactured by a known method to alignment treatment, and then forming a second spacer 19A.
And a sealing material (not shown) to join them together, and then inject liquid crystal into the gap from the sealing hole (not shown) in the gap formed by this, and then close the sealing hole. Can be manufactured. Thereafter, if necessary, a polarizing plate may be attached to the incident side or the outgoing side of the liquid crystal panel 16A. The counter substrate 1 for the liquid crystal panel
0A and the TFT substrate 17 are joined together by using the second alignment mark 72 or the like.
The alignment between 0A and the TFT substrate 17 may be performed.

Hereinafter, the differences between the liquid crystal panel 16B shown in FIG. 9 and the liquid crystal panel 16A will be mainly described.

As shown in FIG. 9, the liquid crystal panel 16B
A TFT substrate 17, a liquid crystal panel facing substrate 10B joined to the TFT substrate 17, and a second spacer 1 for defining a distance between the TFT substrate 17 and the liquid crystal panel facing substrate 10B.
9 and a liquid crystal layer 18 made of liquid crystal sealed in a space between the TFT substrate 17 and the opposing substrate 10B for a liquid crystal panel.

The opposing substrate 10B for the liquid crystal panel is provided on the microlens substrate 1B and the substrate 2B with the concave portion for the microlens of the microlens substrate 1B.
And a transparent conductive film (common electrode) 1 provided on the substrate 2 </ b> B with concave portions for microlenses so as to cover the black matrix 11.
And 2.

In such a liquid crystal panel 16B, the incident light L entering from the liquid crystal panel counter substrate 10B passes through the microlens-provided substrate 8B and is condensed when passing through the microlenses 4B. Resin layer 9B, microlens recessed substrate 2B, black matrix 1
1 through the opening 111, the transparent conductive film 12, the liquid crystal layer 18, the pixel electrode 172, and the glass substrate 171.

In the above liquid crystal panel, a TFT substrate is used as a liquid crystal driving substrate. However, a liquid crystal driving substrate other than the TFT substrate, for example, a TFD substrate or a STD substrate is used as the liquid crystal driving substrate.
An N substrate or the like may be used.

In the following description, the liquid crystal panel 16A will be described as a representative of the liquid crystal panel. Hereinafter, a projection type display (liquid crystal projector) using the liquid crystal panel 16A will be described. FIG. 10 is a diagram showing an optical system of the projection display device of the present invention.

As shown in FIG.
Is a light source 301, an illumination optical system including a plurality of integrator lenses, a color separation optical system (a light guiding optical system) including a plurality of dichroic mirrors, and a liquid crystal light valve corresponding to red (for red). (Liquid crystal optical shutter array)
24, a liquid crystal light valve (for liquid crystal shutter array) 25 for green (for green), a liquid crystal light valve (for liquid crystal shutter array) 26 for blue (for blue), and reflects only red light Dichroic prism (color synthesizing optical system) 21 having a dichroic mirror surface 211 and a dichroic mirror surface 212 that reflects only blue light, and a projection lens (projection optical system) 2
And 2.

Further, the illumination optical system has integrator lenses 302 and 303. The color separation optics
Mirrors 304, 306, 309, dichroic mirror 305 that reflects blue light and green light (transmits only red light), dichroic mirror 307 that reflects only green light, dichroic mirror that reflects only blue light (or blue light (Reflecting mirror) 308 and condensing lenses 310, 311, 312, 313 and 314.

The liquid crystal light valve 25 is composed of the above-described liquid crystal panel 16A and a first polarizing plate joined to the incident surface side of the liquid crystal panel 16A (the surface side where the microlens substrate is located, that is, the side opposite to the dichroic prism 21). (Not shown), and a second polarizing plate (not shown) joined to the exit surface side of the liquid crystal panel 16A (the surface facing the microlens substrate, that is, the dichroic prism 21 side). The liquid crystal light valves 24 and 26 have the same configuration as the liquid crystal light valve 25. The liquid crystal panel 16A of each of the liquid crystal light valves 24, 25 and 26 is connected to a drive circuit (not shown).

In the projection display device 300, the dichroic prism 21 and the projection lens 22 constitute the optical block 20. Also, this optical block 2
0, and liquid crystal light valves 24, 25 and 26 fixedly mounted on the dichroic prism 21,
The display unit 23 is configured.

Hereinafter, the operation of the projection display device 300 will be described.

The white light (white light flux) emitted from the light source 301 passes through the integrator lenses 302 and 303. The light intensity (luminance distribution) of this white light is made uniform by the integrator lenses 302 and 303.

Integrator lenses 302 and 303
10 is reflected to the left side in FIG. 10 by the mirror 304, and blue light (B) and green light (G) of the reflected light are respectively reflected by the dichroic mirror 305 in FIG.
The red light (R) which is reflected to the lower side in the middle of 0 passes through the dichroic mirror 305.

The red light transmitted through the dichroic mirror 305 is reflected by the mirror 306 to the lower side in FIG. 10, and the reflected light is shaped by the condenser lens 310 and enters the liquid crystal light valve 24 for red.

The green light of the blue light and the green light reflected by the dichroic mirror 305 is reflected by the dichroic mirror 307 to the left in FIG. 10, and the blue light passes through the dichroic mirror 307.

The green light reflected by the dichroic mirror 307 is shaped by the condenser lens 311 and enters the liquid crystal light valve 25 for green.

The blue light transmitted through the dichroic mirror 307 is transmitted to the dichroic mirror (or mirror).
At 308, the light is reflected to the left in FIG. 10, and the reflected light is reflected at the mirror 309 to the upper side in FIG. The blue light is shaped by the condenser lenses 312, 313, and 314, and enters the liquid crystal light valve 26 for blue.

As described above, the white light emitted from the light source 301 is color-separated into the three primary colors of red, green and blue by the color separation optical system, respectively, guided to the corresponding liquid crystal light valves, and entered.

At this time, each pixel (the thin film transistor 173 and the pixel electrode 172 connected thereto) of the liquid crystal panel 16A included in the liquid crystal light valve 24 is driven by a driving circuit (driving means) which operates based on a red image signal. , Switching control (ON / OFF), that is, modulation.

Similarly, the green light and the blue light enter the liquid crystal light valves 25 and 26, respectively, and are modulated by the respective liquid crystal panels 16A, thereby forming a green image and a blue image. At this time, each pixel of the liquid crystal panel 16A of the liquid crystal light valve 25 has:
Switching control is performed by a drive circuit that operates based on the image signal for green, and each pixel of the liquid crystal panel 16A included in the liquid crystal light valve 26 is controlled by a drive circuit that operates based on the image signal for blue.

Thus, the red light, green light and blue light are respectively transmitted to the liquid crystal light valves 24, 25 and 26.
, And a red image, a green image, and a blue image are respectively formed.

The image for red color formed by the liquid crystal light valve 24, that is, the red light from the liquid crystal light valve 24 enters the dichroic prism 21 from the surface 213 and is reflected by the dichroic mirror surface 211 to the left in FIG. Through the dichroic mirror surface 212,
The light exits from the exit surface 216.

The image for green color formed by the liquid crystal light valve 25, that is, the liquid crystal light valve 25
From the surface 214 enters the dichroic prism 21 from the surface 214, and the dichroic mirror surfaces 211 and 2
12 respectively, and exit from the exit surface 216.

The image for blue formed by the liquid crystal light valve 26, that is, the liquid crystal light valve 26
From the surface 215 is incident on the dichroic prism 21 from the surface 215, and is reflected by the dichroic mirror surface 212 as shown in FIG.
The light is reflected to the middle left side, passes through the dichroic mirror surface 211, and exits from the exit surface 216.

As described above, the liquid crystal light valve 24,
Light of each color from 25 and 26, ie, each image formed by the liquid crystal light valves 24, 25 and 26,
The images are synthesized by the dichroic prism 21, whereby a color image is formed. This image is projected on the screen 3 installed at a predetermined position by the projection lens 22.
20 is projected (enlarged projection).

[0229] At this time, the projection type display device 300 is a liquid crystal panel 16A having the microlens substrate 1A described above.
Therefore, an image having a high contrast ratio can be projected.

[0230]

EXAMPLES In the present specification, wt% means mass%. Prior to manufacturing a microlens substrate, a substrate with concave portions for microlenses and a substrate with convex portions for microlenses were manufactured and prepared as follows.

First, a substrate with concave portions for microlenses was manufactured as follows. First, as a base material, a thickness of 1.
A 2 mm rectangular unprocessed quartz glass substrate (first glass substrate) was prepared. Next, this quartz glass substrate was immersed in a cleaning liquid (a mixed liquid of sulfuric acid and hydrogen peroxide solution) at 85 ° C. to perform cleaning, thereby cleaning the surface.

-Concave 1- A 0.2 μm-thick film was formed on the front and back surfaces of the quartz glass substrate by sputtering.
An Au / Cr film was formed. This was performed by setting the sputtering pressure of the sputtering furnace to 5 mTorr and the power to 500 W.

-Concave 2- Next, an opening was formed in the formed Au / Cr film. This was performed as follows. First,
A resist layer having a pattern of concave portions to be formed was formed on the Au / Cr film. Next, the Au / Cr film was wet-etched with a mixture of nitric acid and hydrochloric acid to form an opening. Next, the resist layer was removed.

-Concave 3- Next, a 0.4 μm-thick polycrystalline silicon film having a shape corresponding to the shape of the alignment mark is formed on a portion of the Au / Cr film where an alignment mark (first alignment mark) is to be formed. (Protective layer) was formed. This was performed as follows. First, a polycrystalline silicon film was formed on the Au / Cr film by a CVD method. This CVD was performed by placing a quartz glass substrate in a CVD furnace set at 600 ° C. and 80 Pa, and supplying SiH ₄ at a rate of 300 mL / min. Next, a resist layer having a shape corresponding to the shape of the alignment mark was formed on the polycrystalline silicon film. Next, the polycrystalline silicon film was subjected to wet etching using a 15% aqueous solution of tetramethylammonium hydroxide. Next, the resist layer was removed.

-Concave 4- Next, the quartz glass substrate was immersed in an etching solution (a mixed aqueous solution of 10% hydrofluoric acid + 10% glycerin) and wet-etched to form a recess on the quartz glass substrate.

Next, the quartz glass substrate was immersed in a mixed solution of nitric acid and hydrochloric acid to remove the Au / Cr films formed on the front and back surfaces of the quartz glass substrate.

-Concave 6- Next, the quartz glass substrate was
The polycrystalline silicon film was removed by immersion in an aqueous solution of tetramethylammonium hydroxide.

Thus, the alignment mark (first alignment mark) and the matrix (1) are formed on the quartz glass substrate.
024 × 766), and a substrate with concave portions for microlenses, on which concave portions were formed.

Next, a substrate with convex portions for microlenses was manufactured as follows. First, as a base material, a thickness of 1.
A 2 mm rectangular unprocessed quartz glass substrate (second glass substrate) was prepared. Next, this quartz glass substrate was immersed in a cleaning liquid (a mixed liquid of sulfuric acid and hydrogen peroxide solution) at 85 ° C. to perform cleaning, thereby cleaning the surface.

-Projection 1- Next, an alignment mark (second alignment mark) was formed on the surface of the quartz glass substrate. This was performed as follows. First, a film having a thickness of 1 μm is formed on a polycrystalline silicon film by a sputtering method.
m / Au / Cr thin film was formed. In this sputtering, the sputtering pressure of the sputtering furnace is 5 mTorr and the power is 500 W.
I went to set. Next, a resist layer having a shape corresponding to the shape of the alignment mark was formed on the Au / Cr thin film. Next, the Au / Cr thin film was subjected to wet etching using a mixed solution of nitric acid and hydrochloric acid. Next, the resist layer was removed.

Next, a resist layer (nucleus material) having a pattern corresponding to the projection to be formed was formed on the surface of the quartz glass substrate on which the alignment mark was formed. This was performed as follows. First, a 8.0 μm-thick positive resist was spin-coated on a quartz glass substrate. Next, this positive resist was pre-baked in a clean oven. Next, the pattern corresponding to the convex part to be formed was exposed on the positive resist using an exposure machine.
Next, the positive resist was developed.

-Convex 3- Next, the quartz glass substrate is
The resist layer was heated (post-baked) in a clean oven set at 0 ° C. to reflow the resist layer into a lens shape.

-Protrusion 4- Next, dry etching was performed on the quartz glass substrate to form a projection on the quartz glass substrate. Dry etching is performed using CHF ₃ gas.
Performed for 0 minutes. At this time, the gas flow rate was 50 sccm, the pressure was 50 mTorr, and the RF output was 400 W. As a result, the etching rates of the quartz glass substrate and the resist layer were both 0.40 μm / min. The Au / Cr film was not etched and remained on the quartz glass substrate as an alignment mark.

Thus, an alignment mark (second alignment mark) and a matrix (1) are formed on the quartz glass substrate.
024 × 766), and a substrate with convex portions for microlenses on which convex portions arranged in the form were formed.

Using the substrate with concave portions for microlenses and the substrate with convex portions for microlenses obtained as described above, a microlens substrate was manufactured as follows.

Example 1 A microlens substrate having a structure as shown in FIG. 1 was manufactured.

First, a substrate with concave portions for microlenses having a concave portion with a curvature radius of 15 μm was prepared. This was obtained by setting the area of the opening in the step-concave 2 to 9.5 μm ² and setting the etching time in the step-concave 4 to 98 minutes. In addition, a substrate with a convex portion for a microlens having a convex portion with a radius of curvature of 11 μm was prepared. This was obtained by setting the area of the core material in the step-convex 2 to 201 μm ² and setting the heating time in the step-convex 3 to 20 minutes.

-1.1A- Next, an uncured ultraviolet (UV) curable acrylic optical adhesive (not shown) is provided on the surface of the substrate having the concave portion for microlenses other than where the spacer is provided. A refractive index of 1.59 and a cured density of 1.18 g / cm ³ ) were applied without bubbles using a dispenser.

-1.2A- Next, an adhesive in which spacers were uniformly dispersed was applied using a dispenser to portions of the substrate having concave portions for microlenses where no concave portions were formed.

In addition, this adhesive has the above-mentioned -1.1A-
The same one as described above was used. The content of the spacer in the adhesive was 10% by weight. Spherical plastic fine particles were used for the spacer. The average particle size of the spherical plastic fine particles is 10 μm, the standard deviation of the particle size distribution is 4.6% of the average particle size, the density is 1.19 g / cm ³ , and the elastic modulus is 480 kgf / mm ² . there were.

-2A- Next, the substrate with the microlens projections was bonded to the surface of the substrate with the microlens depressions coated with the resin. At this time, uniform pressure was applied to the entire substrate with microlens protrusions so that the substrate with microlens protrusions contacted the spacer.

-3A- Next, using the first alignment mark and the second alignment mark, alignment between the concave portion and the convex portion was performed.

-4A- Next, ultraviolet rays were irradiated to cure the resin, thereby forming a resin layer and a microlens. The thickness (Tc) of the center of the formed microlens
Was 10 μm, and the edge thickness (distance between opposing end surfaces of the substrate with concave portions for microlenses and the substrate with convex portions for microlenses) was 10 μm.

-5A- Lastly, the substrate with the microlens projections was ground and polished to a thickness of 30 μm to obtain a microlens substrate having a structure as shown in FIG.

Example 2 A microlens substrate having the structure shown in FIG. 2 was manufactured in the same manner as in Example 1 except for the following.

First, a substrate with concave portions for microlenses having a concave portion with a curvature radius of 11 μm was prepared. This was obtained by setting the area of the opening in the step-concave 2 to 9.5 μm ² and setting the etching time in the step-concave 4 to 80 minutes. In addition, a substrate with a convex portion for a microlens having a convex portion with a curvature radius of 15 μm was prepared. This was obtained by setting the area of the core material in the step-convex 2 to 201 μm ² and setting the heating time in the step-convex 3 to 20 minutes.

-1.1B to 4B- Then, the above-mentioned -1.1B
The same steps as in A- to -4A- were performed. The thickness (Tc) of the central part of the formed microlens is 10 μm,
Edge thickness (distance between opposing end faces of substrate with concave portion for microlens and substrate with convex portion for microlens) is 10 μm
Met.

-5B- Finally, the substrate with concave portions for microlenses was ground and polished to a thickness of 30 μm to obtain a microlens substrate having a structure as shown in FIG.

Example 3 A microlens substrate having the structure shown in FIG. 11 was manufactured in the same manner as in Example 1 except for the following. First, in the same manner as in Example 1, a substrate with concave portions for microlenses and a substrate with concave portions for microlenses (mold material) were prepared. Note that a silicone release agent was applied to the surface of the substrate with the microlens projections.

-1.1C to 4C- Next, the above-mentioned -1.1C
The same steps as in A- to -4A- were performed. Note that the thickness of the first resin layer was the same as the thickness of the resin layer of Example 1.

-5C- Next, the substrate with microlens projections was peeled off from the first resin layer.

-6C- Next, an uncured epoxy resin (refractive index: 1.39) is provided on the first resin layer, and then a cover glass (glass layer) is bonded on the uncured resin. Next, the resin was cured. Thereby, the cover glass was joined to the first resin layer via the second resin layer. At this time, the thickness of the second resin layer was set to 15 μm.

-7C- Finally, a cover glass having a thickness of 3
By grinding and polishing to 3 μm, a microlens substrate having a structure as shown in FIG. 11 was obtained.

Example 4 Example 1, except for the following,
In the same manner as in No. 3, a microlens substrate having a structure as shown in FIG. 13 was manufactured. First, in the same manner as in Example 1, a substrate with concave portions for microlenses and a substrate with concave portions for microlenses (mold material) were prepared. Note that a silicone-based release agent was applied to the surface of the substrate with the convex portion for microlenses and the cover glass.

-1.1E to 6E- Next, the above-mentioned -1.1E
The same steps as C- to -6C- were performed. Note that the thickness of the first resin layer was the same as the thickness of the first resin layer in Example 3. Further, the thickness of the second resin layer was set to 41 μm.

-7E- Finally, the cover glass (second mold) was peeled off from the second resin layer to obtain a microlens substrate having a structure as shown in FIG.

(Example 5) Except for the following, Example 1,
In the same manner as in Example 2, a microlens substrate having a structure as shown in FIG. 12 was manufactured. First, in the same manner as in Example 2, a substrate with concave portions for microlenses and a substrate with convex portions for microlenses (mold material) were prepared. The surface of the substrate with concave portions for microlenses was coated with a silicone release agent.

-1.1D to 4D- Next, the above-mentioned -1.1D
The same steps as in B- to -4B- were performed. Note that the thickness of the first resin layer was the same as the thickness of the resin layer of Example 2.

-5D- Next, the substrate with concave portions for microlenses was peeled off from the first resin layer.

-6D- Next, an uncured epoxy resin (refractive index: 1.39) is provided on the first resin layer, and then a cover glass (glass layer) is bonded onto the uncured resin. Next, the resin was cured. Thereby, the cover glass was joined to the first resin layer via the second resin layer. At this time, the thickness of the second resin layer was set to 15 μm.

-7D- Finally, cover glass having a thickness of 3
By grinding and polishing to 3 μm, a microlens substrate having a structure as shown in FIG. 12 was obtained.

Example 6 Example 1 was repeated except for the following.
A microlens substrate having a structure as shown in FIG. 14 was manufactured in the same manner as in steps 2 and 5. First, in the same manner as in Example 2, a substrate with concave portions for microlenses and a substrate with convex portions for microlenses (mold material) were prepared. Note that a silicone release agent was applied to the surface of the substrate having the concave portion for microlenses and the surface of the cover glass.

-1.1F to 6F- Next, the above-mentioned -1.1F
The same steps as D- to -6D- were performed. Note that the thickness of the first resin layer was the same as the thickness of the first resin layer in Example 5. Further, the thickness of the second resin layer was set to 41 μm.

-7F- Finally, the cover glass (second mold) was peeled off from the second resin layer to obtain a microlens substrate having a structure as shown in FIG.

For each microlens substrate manufactured in each of the examples, a substrate with a microlens convex portion (or a substrate with a microlens concave portion, a cover glass, or a second resin) was formed by a sputtering method and a photolithography method. Layer (layer) with openings (opening ratio 43%) at positions corresponding to the microlenses.
m light-shielding film (Cr film), that is, a black matrix was formed. Further, an ITO film (transparent conductive film) having a thickness of 0.15 μm was formed on the black matrix by a sputtering method, thereby manufacturing a counter substrate for a liquid crystal panel.

Then, these opposing substrates for a liquid crystal panel:
TFT substrate prepared separately (glass substrate is made of quartz glass)
Were subjected to an orientation treatment, and then bonded to each other via a spacer (elastic modulus of 7454 kgf / mm ² ) made of spherical silica fine particles and a sealing material. Next, the counter substrate for the liquid crystal panel and the TF
Liquid crystal is injected into the gap from the sealing hole of the gap formed between the substrate and the T substrate, and then the sealing hole is closed to form a structure as shown in FIG. 8 or 9 (or a structure as referred to therein). 3) TFT liquid crystal panels were manufactured.

When light was transmitted through the obtained TFT liquid crystal panel, bright outgoing light could be obtained. afterwards,
Using such a TFT liquid crystal panel, a liquid crystal projector (projection display device) having a structure as shown in FIG. 10 was assembled. As a result, each of the obtained liquid crystal projectors could project a bright and high contrast ratio image on the screen.

[0278]

As described above, according to the present invention, the aberration of the micro lens can be reduced. Therefore, for example, a liquid crystal panel including the microlens substrate of the present invention,
In the projection display device, a high contrast ratio can be obtained.

[Brief description of the drawings]

FIG. 1 is a schematic longitudinal sectional view showing a first embodiment of a microlens substrate of the present invention.

FIG. 2 is a schematic longitudinal sectional view showing a second embodiment of the microlens substrate of the present invention.

FIG. 3 is a view for explaining a method of manufacturing a substrate with concave portions for microlenses used for a microlens substrate.

FIG. 4 is a diagram for explaining a method of manufacturing a substrate with concave portions for microlenses used for a microlens substrate.

FIG. 5 is a diagram for explaining a method of manufacturing a substrate with microlens projections used for a microlens substrate.

FIG. 6 is a diagram for explaining a method for manufacturing a microlens substrate according to the present invention.

FIG. 7 is a diagram illustrating a method for manufacturing a microlens substrate according to the present invention.

FIG. 8 is a schematic longitudinal sectional view showing an embodiment of the liquid crystal panel of the present invention.

FIG. 9 is a schematic longitudinal sectional view showing another embodiment of the liquid crystal panel of the present invention.

FIG. 10 is a diagram illustrating an optical system of a projection display device according to an embodiment of the present invention.

FIG. 11 is a schematic longitudinal sectional view showing a third embodiment of the microlens substrate of the present invention.

FIG. 12 is a schematic longitudinal sectional view showing a fourth embodiment of the microlens substrate of the present invention.

FIG. 13 is a schematic longitudinal sectional view showing a fifth embodiment of the microlens substrate of the present invention.

FIG. 14 is a schematic longitudinal sectional view showing a sixth embodiment of the microlens substrate of the present invention.

FIG. 15 is a diagram illustrating a method for manufacturing a microlens substrate according to the present invention.

FIG. 16 is a view illustrating a method for manufacturing a microlens substrate according to the present invention.

FIG. 17 is a diagram illustrating a method for manufacturing a microlens substrate according to the present invention.

FIG. 18 is a view illustrating a method for manufacturing a microlens substrate according to the present invention.

FIG. 19 is a longitudinal sectional view showing a conventional microlens substrate.

[Explanation of symbols]

1A, 1B, 1C, 1D, 1E, 1F Micro lens substrate 99 Effective lens area 100 Non-effective lens area 2A, 2B Substrate with concave portion for micro lens 2 'Glass layer 29 First glass substrate 31A, 31B Recessed portion 32A, 32B Convex portion 4A, 4B Microlens 5 Spacer 6 Mask layer 61 Opening 65 Nuclear material 69 Backside protective layer 71 First alignment mark 72 Second alignment mark 75 Protective layer 8A, 8B Microlens convex substrate 8 'Glass layer 89 Second glass Substrate 891 Column 9A, 9B, 9C, 9D, 9E, 9F Resin layer 91, 92 Resin 95C, 95D First resin layer 96C, 96D, 96E, 96F Second resin layer L Light R1, R2 Radius of curvature T1, T2, T3 Thickness Tc Thickness of central portion 10A, 10B Opposing substrate for liquid crystal panel 11 Bra Matrix 111 opening 12 transparent conductive film 16A, 16B liquid crystal panel 17 TFT substrate 171 glass substrate 172 pixel electrode 173 thin film transistor 18 liquid crystal layer 19 second spacer 300 projection display device 301 light source 302, 303 integrator lens 304, 306, 309 mirror 305 , 307, 308 Dichroic mirrors 310 to 314 Condenser lens 320 Screen 20 Optical block 21 Dichroic prism 211, 212 Dichroic mirror surface 213 to 215 surface 216 Emission surface 22 Projection lens 23 Display unit 24 to 26 Liquid crystal light valve 900 Micro lens substrate 902 Glass substrate 903 Recess 908 Cover glass 909 Resin layer

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G02F 1/1333 500 G02F 1/1333 500 4F204 1/1335 1/1335 4K029 1/1368 G03B 21/00 E G03B 21/00 33/12 33/12 B29K 33:04 // B29K 33:04 B29L 11:00 B29L 11:00 G02F 1/136 500 F term (reference) 2H042 AA15 AA26 2H088 EA14 EA15 HA01 HA02 HA08 HA13 HA14 HA25 HA28 MA02 2H090 JA02 JB02 LA01 LA12 LA16 2H091 FA05Z FA29X FA29Z GA01 GA02 GA08 GA13 LA17 MA07 2H092 JA24 JB01 NA01 PA01 PA03 PA13 4F204 AA43 AA44 AD04 AD24 AD34 AG03 AG27 AG28 AH74 EA03 EA06 EB01 EB12 EB01 EB01 EB12 EB01 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB12 EB01 EB01

Claims (27)

[Claims] 1. A method of manufacturing a microlens substrate, comprising: bonding a first substrate having a plurality of concave curved surfaces to a second substrate having a plurality of convex curved surfaces to form a plurality of microlenses formed of a convex meniscus lens. . 2. A first substrate having a plurality of concave portions having a concave curved surface, and a second substrate having a plurality of convex portions having a convex curved surface,
A micro-lens comprising a plurality of micro-lenses formed of a convex meniscus lens between the first substrate and the second substrate, wherein the concave portion and the convex portion are bonded to each other via a resin so as to face each other; A method for manufacturing a lens substrate. 3. The microlens according to claim 1, wherein after joining the first substrate and the second substrate, the thickness of at least one of the first substrate and the second substrate is adjusted. Substrate manufacturing method. 4. The thickness of the central part of the micro lens is:
The method for manufacturing a microlens substrate according to claim 1, wherein the thickness is 10 to 120 μm. 5. The method according to claim 1, wherein a resin including a spacer is provided outside a region of the first substrate and / or the second substrate on which the lens curved surface is provided, and the first substrate and the second substrate are joined. Item 5. The method for manufacturing a microlens substrate according to any one of Items 1 to 4. 6. The method according to claim 5, wherein the spacer is in the form of particles. 7. The first substrate and the second substrate,
7. An alignment mark is provided, respectively, the first substrate and the second substrate are aligned using these alignment marks, and the first substrate and the second substrate are joined. A method for manufacturing the microlens substrate according to any one of the above. 8. The method of manufacturing a microlens substrate according to claim 1, wherein the concave curved surface of the first substrate and the convex curved surface of the second substrate are formed by different forming methods. . 9. A microlens substrate manufactured by the method for manufacturing a microlens substrate according to claim 1. Description: 10. A microlens substrate provided with a plurality of microlenses on a substrate, wherein the microlens is constituted by a convex meniscus lens. 11. A first substrate provided with a plurality of concave portions on its surface and a second substrate are joined via a resin layer, and a convex meniscus lens is provided between the first substrate and the second substrate. A microlens substrate, comprising: a microlens. 12. A first substrate and a second substrate having a plurality of convex portions provided on a surface thereof are joined via a resin layer, and a convex meniscus lens is provided between the first substrate and the second substrate. A microlens substrate, comprising a microlens comprising: 13. A first substrate provided with a plurality of concave portions on its surface and a second substrate provided with a plurality of convex portions on its surface via a resin layer such that the concave portions and the convex portions face each other. A micro lens comprising a convex meniscus lens formed between the first substrate and the second substrate. 14. The microlens substrate according to claim 11, wherein the substrate on the incident side is thicker than the substrate on the exit side. 15. The microlens substrate according to claim 11, wherein a spacer that defines the thickness of the resin layer is provided outside a region where the microlens is provided. 16. The microlens substrate according to claim 11, wherein a thickness of the resin layer in a region where the microlens is not provided is substantially equal to an edge thickness of the microlens. 17. The microlens substrate according to claim 10, wherein a radius of curvature of a lens curved surface on an entrance side of the microlens is larger than a radius of curvature of a lens curved surface on an exit side of the microlens. 18. The microlens substrate according to claim 10, wherein the thickness of the central part of the microlens is 10 to 120 μm. 19. The microlens substrate according to claim 10, wherein an alignment mark serving as an index for alignment is provided outside a region where the microlens is provided. 20. An electro-optical device comprising the microlens substrate according to claim 9. 21. An opposing substrate for a liquid crystal panel, wherein a conductive film is provided on the microlens substrate according to claim 9. Description: 22. A liquid crystal, comprising: the microlens substrate according to claim 9; a black matrix provided on the microlens substrate; and a conductive film covering the black matrix. Counter substrate for panel. 23. A liquid crystal panel comprising the counter substrate for a liquid crystal panel according to claim 21. 24. A liquid crystal driving substrate provided with a pixel electrode, the liquid crystal panel opposing substrate according to claim 21 joined to the liquid crystal driving substrate, the liquid crystal driving substrate and the liquid crystal panel opposing substrate. And a liquid crystal sealed in the voids. 25. The liquid crystal panel according to claim 24, wherein the liquid crystal driving substrate is a TFT substrate having the pixel electrodes arranged in a matrix and a thin film transistor connected to the pixel electrodes. 26. A light valve comprising the liquid crystal panel according to claim 23, wherein at least one light valve modulates light to project an image. Projection display device. 27. Three light valves corresponding to red, green, and blue for forming an image, a light source, and light from the light source separated into red, green, and blue light, and A projection type display device having a color separation optical system for leading to a light valve, a color synthesis optical system for synthesizing the respective images, and a projection optical system for projecting the synthesized image, wherein the light valve is Item 29. A projection display device comprising the liquid crystal panel according to any one of Items 23 to 25.