JP2002005586A5 - - Google Patents
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- JP2002005586A5 JP2002005586A5 JP2000189303A JP2000189303A JP2002005586A5 JP 2002005586 A5 JP2002005586 A5 JP 2002005586A5 JP 2000189303 A JP2000189303 A JP 2000189303A JP 2000189303 A JP2000189303 A JP 2000189303A JP 2002005586 A5 JP2002005586 A5 JP 2002005586A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000189303A JP2002005586A (ja) | 2000-06-23 | 2000-06-23 | 物体温度調節用熱交換装置、該熱交換装置を使用して製造した投影レンズ及び該熱交換装置を使用した光学系を具備する装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000189303A JP2002005586A (ja) | 2000-06-23 | 2000-06-23 | 物体温度調節用熱交換装置、該熱交換装置を使用して製造した投影レンズ及び該熱交換装置を使用した光学系を具備する装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002005586A JP2002005586A (ja) | 2002-01-09 |
| JP2002005586A5 true JP2002005586A5 (ja) | 2007-08-09 |
Family
ID=18688947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000189303A Withdrawn JP2002005586A (ja) | 2000-06-23 | 2000-06-23 | 物体温度調節用熱交換装置、該熱交換装置を使用して製造した投影レンズ及び該熱交換装置を使用した光学系を具備する装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002005586A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8363206B2 (en) | 2006-05-09 | 2013-01-29 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101945638B1 (ko) | 2004-02-04 | 2019-02-07 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
| DE102004047533A1 (de) * | 2004-09-30 | 2006-04-06 | Carl Zeiss Smt Ag | Vorrichtung zur Temperierung von Elementen |
| EP1873816A4 (en) * | 2005-04-18 | 2010-11-24 | Nikon Corp | EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENTS MANUFACTURING METHOD |
| KR101205715B1 (ko) | 2010-05-24 | 2012-11-28 | 한국과학기술원 | 플랫형 열 분산기 및 그 제조 방법 |
| JP2015008958A (ja) * | 2013-06-28 | 2015-01-19 | 下田 一喜 | 医療用人体温度調節装置 |
| JP6335480B2 (ja) * | 2013-11-11 | 2018-05-30 | キヤノン株式会社 | 露光装置、およびデバイスの製造方法 |
| CN107481965B (zh) * | 2017-09-06 | 2023-12-29 | 武汉市三选科技有限公司 | 晶圆切割保护膜结构及其制造方法与使用其之切割晶圆 |
| JP7366789B2 (ja) * | 2020-02-12 | 2023-10-23 | キヤノン株式会社 | 光学装置、露光装置、及び物品の製造方法 |
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2000
- 2000-06-23 JP JP2000189303A patent/JP2002005586A/ja not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
| US8363206B2 (en) | 2006-05-09 | 2013-01-29 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |